Loading and unloading device for double-layer reaction tube

Abstract

The invention discloses a loading and unloading device for a double-layer reaction tube, which comprises a lifting mechanism connected with a positioning base through a sealing door base so as to drive the positioning base to lift; the positioning base is used for limiting the circumferential freedom degrees of the outer pipe mounting structure and the inner pipe mounting structure which are arranged on the positioning base, the outer-layer reaction pipe is arranged on the outer pipe mounting structure for mounting, the inner-layer reaction pipe is arranged on the inner pipe mounting structure for mounting, the inner pipe mounting structure comprises a circumferential adjusting part and an axial indicating part, and the circumferential adjusting part is used for adjusting the circumferential direction of the inner-layer reaction pipe. The inner-layer reaction tube is rotated to a target mounting angle through the circumferential adjusting part, and it is confirmed that the inner-layer reaction tube extends to a target mounting depth through the axial indicating part. According to the invention, the positioning accuracy and uniqueness of the double-layer reaction tube in the mounting process can be improved, the repeatability of the mounting process is ensured, and meanwhile, the mounting position information of the inner-layer reaction tube in the furnace body can be visually represented, so that the safety and reliability of the mounting process of the inner-layer reaction tube are further ensured.

Description

Technical Field

[0001] This invention relates to the technical field of semiconductor equipment, and more specifically to a loading and unloading device for a double-layer reaction tube. Background Technology

[0002] Semiconductor thin film deposition equipment is one of the most important process equipment in chip manufacturing. It is widely used in low-pressure chemical vapor deposition, atmospheric pressure chemical deposition, and atomic layer deposition processes for growing various dielectric thin films, such as those for chips. The quartz reaction chamber is an important component of thin film deposition equipment.

[0003] During the process, the quartz reaction tube provides a closed chamber for the thin film deposition reaction. Reactive gases entering the tube not only deposit thin films on the wafer but also on the inner wall of the tube. With each processing iteration, the thin film on the inner wall of the reaction tube becomes increasingly thick and opaque, severely impacting the thermal radiation effect between the wafer and the heat source outside the reaction tube. Simultaneously, as the film thickness increases, the stress between the film layers gradually decreases, leading to film detachment from the inner wall of the reaction tube and consequently causing excessive dust particle levels on the wafer surface.

[0004] To ensure the continuous, efficient, and stable operation of semiconductor thin-film deposition equipment, regular maintenance is essential, particularly for its core component, the quartz reaction tube. Regular replacement and cleaning are necessary to improve the quality of the thin film on the wafer surface. Furthermore, since thin-film deposition requires a sealed environment, sealing rings are indispensable. Prolonged contact between the sealing rings and the chemical reaction gases inside the reaction tube can cause them to harden and lose elasticity, potentially leading to leakage and complete failure of the wafer film layer. This is absolutely unacceptable; therefore, regular replacement of sealing components is crucial.

[0005] In response to this, existing technologies typically design reaction chambers with a double-layer reaction tube structure to meet the demands of more advanced thin-film deposition processes. Due to the stringent floor space requirements of semiconductor manufacturers, equipment suppliers strive for maximum compactness, especially for furnace-tube coating equipment, resulting in limited space for operation, installation, and maintenance. However, quartz reaction tubes are relatively large and fragile. Therefore, inaccurate positioning of the double-layer reaction tubes during installation can easily lead to collisions and breakage. Furthermore, during the installation of the inner reaction tube, external personnel cannot accurately obtain its position within the furnace, further increasing the risk of breakage during installation and posing a greater challenge to subsequent maintenance.

[0006] To address the aforementioned problems in existing technologies, there is an urgent need in this field for a double-layer reaction tube loading and unloading technology that can improve the accuracy and uniqueness of the positioning of the double-layer reaction tube during installation, ensure the repeatability of the installation process, and visualize the installation position information of the inner layer reaction tube inside the furnace, thereby further ensuring the safety and reliability of the inner layer reaction tube installation process, significantly improving production efficiency, and reducing equipment costs. Summary of the Invention

[0007] The following provides a brief overview of one or more aspects to offer a basic understanding of them. This overview is not an exhaustive summary of all conceived aspects, nor is it intended to identify key or decisive elements of all aspects, nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed descriptions that follow.

[0008] To overcome the aforementioned deficiencies in the existing technology, this invention provides a loading and unloading device for a double-layer reaction tube, which can improve the accuracy and uniqueness of the positioning of the double-layer reaction tube during installation, ensure the repeatability of the installation process, and also visualize the installation position information of the inner layer reaction tube inside the furnace, thereby further ensuring the safety and reliability of the inner layer reaction tube installation process, significantly improving production efficiency and reducing equipment costs.

[0009] Specifically, the loading and unloading device for the double-layer reaction tube provided according to the first aspect of the present invention includes: a lifting mechanism connected to a positioning base via a sealing door base to drive the positioning base to lift; and a positioning base for respectively restricting the circumferential degrees of freedom of the outer tube mounting structure and the inner tube mounting structure disposed thereon, wherein the outer layer reaction tube is mounted on the outer tube mounting structure and the inner layer reaction tube is mounted on the inner tube mounting structure, wherein the inner tube mounting structure includes a circumferential adjustment part and an axial indication part, wherein the circumferential adjustment part is used to rotate the inner layer reaction tube to a target mounting angle, and the axial indication part is used to confirm that the inner layer reaction tube extends to a target mounting depth.

[0010] Furthermore, in some embodiments of the present invention, the circumferential adjustment part includes a rotating support and a self-lubricating friction ring, the self-lubricating friction ring being fixed on the positioning base, and the rotating support rotating circumferentially via the self-lubricating friction ring to drive the inner reaction tube placed thereon to rotate to the target installation angle.

[0011] Furthermore, in some embodiments of the present invention, the circumferential adjustment part further includes an inner tube support ring with a positioning pin hole at its bottom and the inner reaction tube placed at its upper end. The rotating support is provided with a telescopic pin shaft located below the inner tube support ring, including a positioning pin and a first spring located at its bottom. When the rotating support is not rotated to the positioning pin hole, the positioning pin is pressed down by the inner tube support ring to compress the first spring. When the rotating support is rotated to the positioning pin hole, the first spring is popped out by the release of its elastic potential energy, so that the positioning pin is inserted into the positioning pin hole, thereby fixing the inner tube support ring relative to the rotating support and allowing it to move with it.

[0012] Furthermore, in some embodiments of the present invention, the circumferential adjustment part further includes a guide ring, which is concentrically configured with the rotating support and disposed on the outer ring of the inner tube support ring, for radially restricting the placement position of the inner reaction tube.

[0013] Furthermore, in some embodiments of the present invention, the axial indicator includes a guide shaft and a floating block, the floating block being fixed to the positioning base, and a first end of the guide shaft being retractably inserted into the floating block via a second spring, and a second end being retractably fixed to the positioning base to extend beyond the positioning base by the length of the guide shaft, thereby confirming that the inner reaction tube has extended to the target installation depth.

[0014] Furthermore, in some embodiments of the present invention, the outer tube mounting structure includes a support flange on which the outer reaction tube is placed. The length of the guide shaft in its free state is the same as the thickness of the inner ring step of the support flange, so as to determine the extent of insertion of the inner reaction tube by means of the extension length of the guide shaft during the installation of the inner reaction tube.

[0015] Furthermore, in some embodiments of the present invention, the outer pipe mounting structure includes a flange support seat, so that the inner ring step of the supporting flange is supported on the upper end face of the flange support seat. The upper surface of the positioning base is provided with a conical ring structure. The bottom of the flange support seat or the bottom of the circumferential adjustment part is located inside the conical ring structure. By engaging with the annular conical surface formed by the conical ring structure, the circumferential degrees of freedom of the outer pipe mounting structure or the inner pipe mounting structure are restricted.

[0016] Furthermore, in some embodiments of the present invention, the supporting flange and the flange support seat are fitted with a clearance and fixed by a locating pin to restrict the circumferential degree of freedom of the supporting flange on the flange support seat, wherein a first buffer pad is provided in the clearance.

[0017] Furthermore, in some embodiments of the present invention, the loading and unloading device further includes a frame, which includes an outer tube mounting area. After the outer reaction tube placed on the outer tube mounting structure is raised to the outer tube mounting area via the lifting mechanism, it is locked and fixed on the frame by fixing studs to complete the outer tube installation. And by loosening the fixing studs, the outer reaction tube is lowered synchronously with the outer tube mounting structure to complete the outer tube disassembly.

[0018] Furthermore, in some embodiments of the present invention, a base with an inner tube mounting area is also included. The base includes a first limit position and a second limit position. After the outer tube is installed, the inner reaction tube placed on the inner tube mounting structure is rotated to the first limit position via the circumferential adjustment part. The inner reaction tube is then inserted into the outer reaction tube from bottom to top via the lifting mechanism. The axial indicator part confirms that the inner reaction tube has reached the target installation depth, thus completing the inner tube installation. The inner reaction tube is then rotated to the second limit position via the circumferential adjustment part so that the inner reaction tube descends synchronously with the inner tube mounting structure, thus completing the inner tube disassembly. Attached Figure Description

[0019] The above-described features and advantages of the present invention will be better understood after reading the following detailed description of embodiments of the present disclosure in conjunction with the accompanying drawings. In the drawings, components are not necessarily drawn to scale, and components having similar related characteristics or features may have the same or similar reference numerals.

[0020] Figure 1 A schematic diagram of the outer tube mounting structure of a loading and unloading device for a double-layer reaction tube provided according to some embodiments of the present invention is shown; Figure 2 A sectional view showing the positioning of an outer tube mounting structure provided according to some embodiments of the present invention is shown; Figure 3 A cross-sectional view of the inner tube mounting structure of a loading and unloading device for a double-layer reaction tube according to some embodiments of the present invention is shown. Figure 4 A tooling cross-sectional view of an inner tube mounting structure provided according to some embodiments of the present invention is shown; Figure 5 A tooling cross-sectional view of a circumferential adjustment part provided according to some embodiments of the present invention is shown; Figure 6 A tooling cross-sectional view of an axial indicator provided according to some embodiments of the present invention is shown; Figure 7 This diagram shows an external view of the inner tube mounting structure of a loading and unloading device for a double-layer reaction tube according to some embodiments of the present invention; and Figure 8 A top view of a double-layered reaction tube provided according to some embodiments of the present invention is shown.

[0021] Figure label: 100 Loading and unloading equipment; 110 Lifting mechanism; 120 Sealed door base; 130 racks; 131 Fixed stud; 132 First limit position; 133 Second limit position; 140 Positioning base; 150 External pipe installation structure; 151 Support flange; 152 Flange support; 153 First buffer pad; 154 slots; 155 swivel lugs; 160~163 locating pins; 210 Inner tube installation structure; 220 Circumferential Adjustment Section; 221 Rotary support; 222 Self-lubricating friction ring; 223 Inner tube support ring; 224 Telescopic pin; 2240 First spring; 2241 Spring support; 225 guide ring; 226 Base; 230 Axial indicator; 231 Guide shaft; 232 Floating blocks; 233 The second spring; 810 Support feet; 10. Outer reaction tube; and 20 Inner reaction tube. Detailed Implementation

[0022] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Although the description of the present invention is presented in conjunction with preferred embodiments, this does not mean that the features of the invention are limited to these embodiments. On the contrary, the purpose of describing the invention in conjunction with embodiments is to cover other options or modifications that may be derived based on the claims of the present invention. To provide a thorough understanding of the invention, many specific details will be included in the following description. The invention may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of the invention, some specific details will be omitted in the description.

[0023] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0024] Furthermore, the terms "upper," "lower," "left," "right," "top," "bottom," "horizontal," and "vertical" used in the following description should be understood as the orientations shown in the relevant paragraphs and accompanying drawings. These relative terms are for illustrative purposes only and do not imply that the described apparatus must be manufactured or operated in a specific orientation, and therefore should not be construed as limiting the invention.

[0025] It is understood that although terms such as "first," "second," and "third" may be used herein to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first components, regions, layers, and / or parts discussed below may be referred to as second components, regions, layers, and / or parts without departing from some embodiments of the present invention.

[0026] As mentioned above, in existing technologies, to meet the demands of more advanced thin-film deposition processes, the reaction chamber is typically designed with a double-layer reaction tube structure. Due to the stringent floor space requirements of major semiconductor manufacturers, equipment suppliers strive for maximum compactness, especially for furnace tube coating equipment, resulting in limited space for operation, installation, and maintenance. However, quartz reaction tubes are relatively large and fragile. Therefore, inaccurate positioning of the double-layer reaction tubes during installation can easily lead to collisions and breakage. Furthermore, during the installation of the inner reaction tube, external personnel cannot accurately obtain its position within the furnace, further increasing the risk of breakage during installation and posing a greater challenge to subsequent maintenance.

[0027] To address the aforementioned problems in the existing technology, this invention provides a loading and unloading device for a double-layer reaction tube, which can improve the accuracy and uniqueness of the positioning of the double-layer reaction tube during installation, ensure the repeatability of the installation process, and also visualize the installation position information of the inner layer reaction tube inside the furnace body, thereby further ensuring the safety and reliability of the inner layer reaction tube installation process, significantly improving production efficiency and reducing equipment costs.

[0028] The working principle of the above-mentioned double-layer reaction tube loading and unloading device will be described below with reference to some embodiments of the installation and disassembly methods of double-layer reaction tubes. Those skilled in the art will understand that these embodiments of the installation and disassembly methods of double-layer reaction tubes are merely some non-limiting implementations provided by the present invention, intended to clearly demonstrate the main concept of the invention and provide some specific solutions convenient for public implementation, rather than being intended to limit all operating methods or functions of the double-layer reaction tube loading and unloading device.

[0029] This invention provides a loading and unloading device for a double-layer reaction tube used in high-precision coating processes, consisting of two parts: an outer quartz tube and an inner quartz tube. As coating requirements become increasingly stringent, the need for uniformity of the film layers within and between wafers also grows. The double-layer quartz tube design effectively ensures pressure uniformity throughout the inner tube space containing the wafer, thereby guaranteeing consistent film thickness. Through precise positioning design, this invention ensures that both the inner and outer reaction tubes remain concentric with the furnace body during installation and removal, avoiding the risk of quartz collisions and movement during loading and unloading, and ensuring process repeatability.

[0030] Specifically, please combine Figure 1 and Figure 2 Common understanding Figure 1 This diagram illustrates the outer tube mounting structure of a loading and unloading device for a double-layer reaction tube according to some embodiments of the present invention. Figure 2A sectional view showing the positioning of an outer tube mounting structure provided according to some embodiments of the present invention is shown.

[0031] like Figure 1 and Figure 2 As shown, in some embodiments of the present invention, the loading and unloading device 100 for the double-layer reaction tube mainly includes a lifting mechanism 110 and a positioning base 140. The lifting mechanism 110 can be connected to the positioning base 140 via a sealing door base 120 to drive the positioning base 140 to rise and fall. Optionally, the lifting mechanism 110 can be a ball screw module for rapid lifting response and high-precision lifting positioning. Components above the sealing door base 120 can all move up and down together with the slider of the lifting mechanism 110.

[0032] The positioning base 140 can be used to restrict the circumferential degrees of freedom of the outer tube mounting structure 150 and the inner tube mounting structure 210 respectively. The outer reaction tube 10 can be installed on the outer tube mounting structure 150, and the inner reaction tube 20 can be installed on the inner tube mounting structure 210.

[0033] Specifically, such as Figure 2 As shown in the enlarged partial view B, the positioning base 140 can be placed on the sealing door base 120, and the two can be precisely positioned by the positioning pin 161. Preferably, the bottom of the positioning base 140 can be provided with four non-metallic wear-resistant columns ( Figure 2 (Not shown in the diagram) The wear-resistant post can extend 3mm above the bottom surface of the positioning base 140, but is not limited to this, to effectively prevent the flatness of the positioning base 140 from being affected by wear on the bottom surface of the positioning base 140. Furthermore, during long-term use, the wear-resistant post can be replaced periodically to save on the economic cost of replacing the entire positioning base 140.

[0034] Continue as Figure 2 As shown, in some embodiments, the outer pipe mounting structure 150 may include a support flange 151 and a flange support seat 152, and the inner ring step of the support flange 151 may be supported on the upper end face of the flange support seat 152. The upper surface of the positioning base 140 may be provided with a conical ring structure ( Figure 2 (Not shown in the figure), namely the annular inclined structure, the bottom of the flange support 152 can be located inside the conical annular structure. Positioned by engaging with the annular conical surface formed by the conical annular structure, the horizontal degree of freedom of the flange support 152 is restricted, thereby restricting the circumferential degree of freedom of the outer pipe mounting structure 150. As shown in the enlarged partial view A, the flange support 152 can be fixed to the positioning base 140 by the positioning pin 160, and simultaneously positioned by a fixed engagement with the hole on the flange support 152. This restricts the circumferential degree of freedom of the flange support 152, ensuring that the position of the flange support 152 is fixed and unique.

[0035] Furthermore, such as Figure 2 As shown in the enlarged partial view C, the support flange 151 and the flange support seat 152 can be clearance fitted and fixed by the locating pin 162 to limit the circumferential freedom of the support flange 151 on the flange support seat 152, so that the position of the support flange 151 is fixed and unique.

[0036] In some optional embodiments, a first buffer pad 153 may be provided in the gap between the inner ring step of the support flange 151 and the upper end face of the flange support seat 152. Optionally, a non-metallic second buffer pad (not shown in the figures) may also be provided on the support flange 151, and the second buffer pad may be higher than the upper surface of the support flange 151, on which the outer reaction tube may be placed. With the first buffer pad 153 and the second buffer pad, the outer reaction tube 10 can be prevented from being damaged or broken due to the lack of any buffering force during its placement on the metal support flange 151. Furthermore, the second buffer pad can also further prevent direct contact between the outer reaction tube 10 and the metal support flange 151, thereby reducing the risk of breakage of the outer reaction tube.

[0037] Combination Figure 1 It is understood that in some embodiments, the loading and unloading device 100 may further include a frame 130, which may include an outer tube mounting area, and the fixing stud 131 may be fixed to the frame 130 by bolts. The installation process of the outer reaction tube 10 may include the outer reaction tube 10 placed on the outer tube mounting structure 150 being raised to the outer tube mounting area via the lifting mechanism 110, that is, when the sealing door base 120 rises to the point where the lifting lug 155 of the support flange 151 is close to the lower end face of the fixing stud 131, the two are locked by bolts. At this time, the support flange 151 and the outer reaction tube 10 are completely fixed to the frame 130, thereby completing the outer tube installation. After the outer tube installation is completed, the outer tube mounting structure 150 will detach from the positioning base 140. Specifically, at this time, the positioning base 140 may descend together with the sealing door base 120 and detach from the support flange 151.

[0038] The disassembly process of the outer reaction tube 10 may include the following steps: after the lifting mechanism 110 drives the sealing door base 120 to rise and contact the lower edge of the support flange 151, the bolts of the fixing stud 131 and the support flange 151 can be loosened, so that the support flange 151 and other components fall on the sealing door base 120, so that the outer reaction tube 10 descends synchronously with the outer tube mounting structure 150 on the sealing door base 120, thereby completing the disassembly of the outer tube.

[0039] Next, please refer to Figure 3 , Figure 3A schematic diagram of the inner tube mounting structure of a loading and unloading device for a double-layer reaction tube according to some embodiments of the present invention is shown. The inner reaction tube 20 and the outer reaction tube 10 can use the same mounting base (including the positioning base 140 and the sealing door base 120), thereby saving material costs.

[0040] like Figure 3 As shown, in some embodiments, the inner tube mounting structure 210 in the double-layer reaction tube loading and unloading device 100 may include a circumferential adjustment part and an axial indicator part. The circumferential adjustment part can be used to rotate the inner layer reaction tube 20 to the target mounting angle, and the axial indicator part can be used to confirm that the inner layer reaction tube 20 extends to the target mounting depth.

[0041] Specifically, since the quartz reaction tube is placed vertically and moves up and down vertically, and the inner tube is smaller than the outer tube, the inner reaction tube 20 is usually installed after the outer reaction tube 10 is installed. Similar to the installation process of the outer reaction tube 10, firstly, the positioning base 140 and the sealing door base 120 are fitted together and positioned. Then, the inner tube installation structure 210 can also be positioned by fitting with the annular conical surface formed by the conical ring structure on the upper surface of the positioning base 140, thus restricting the horizontal freedom of the inner tube installation structure 210. Meanwhile, as... Figure 2 As shown in the enlarged partial view A, the circumferential rotation can also be restricted by the locating pin 160, so that the position of the inner tube mounting structure 210 is fixed and unique.

[0042] Furthermore, please combine Figure 4 and Figure 5 Common understanding Figure 4 A tooling cross-sectional view of an inner tube mounting structure provided according to some embodiments of the present invention is shown. Figure 5 A cross-sectional view of a tooling for a circumferential adjustment section provided according to some embodiments of the present invention is shown.

[0043] like Figure 5 As shown, in some embodiments, the circumferential adjustment part 220 may include a rotating support 221 and a self-lubricating friction ring 222. The self-lubricating friction ring 222 may be fixed to the positioning base 140 via a base 226, and the base 226 may also be positioned in conjunction with the positioning base 140. The rotating support 221 may rotate circumferentially via the self-lubricating friction ring 222 to drive the inner reaction tube 20 placed thereon to rotate to the target installation angle.

[0044] Specifically, such as Figure 5As shown, in some optional embodiments, after the self-lubricating friction ring 222 is positioned, it can be fixed to the base 226 by bolts. The sliding surfaces of the self-lubricating friction ring 222 are the two contact surfaces with the rotating support 221. Through the two mutually perpendicular sliding contact surfaces, the self-lubricating friction ring 222 can achieve circumferential sliding engagement with the rotating support 221, thereby preventing the rotating support 221 from moving in the horizontal plane, but allowing the rotating support 221 to rotate circumferentially.

[0045] like Figure 4 As shown, in some embodiments, the circumferential adjustment part 220 may further include an inner tube support ring 223, which has a positioning pin hole at its bottom and can be used to place the inner layer reaction tube 20 at its upper end. The inner tube support ring 223 can be concentrically fitted with the circumferential adjustment part 220 and can rotate relative to it.

[0046] Combination Figure 5 It is understood that in some embodiments, the rotating support 221 may be provided with a telescopic pin 224. The telescopic pin 224 may be located below the inner tube support ring 223 and concentrically installed with the hole of the rotating support 221. The telescopic pin 224 may include a locating pin 163 and a first spring 2240 located at its bottom. The elastic support of the locating pin 163 by the first spring 2240 ensures that the telescopic pin 224 has telescopic flexibility. In addition, the spring support 2241 may be threadedly connected to the rotating support 221, which can provide support for the first spring 2240.

[0047] Furthermore, such as Figure 5 As shown, in some preferred embodiments, the circumferential adjustment part 220 may further include a guide ring 225. The guide ring 225 can also be concentrically configured with the rotating support 221 and can be located on the outer ring of the inner tube support ring 223 to radially restrict the placement position of the inner reaction tube 20. Specifically, the outer diameter of the guide ring 225 can be approximately 0.5 mm larger than that of the rotating support 221, thereby allowing the inner reaction tube 20 to contact the non-metallic guide ring 225 and preventing it from contacting the rotating support 221, which could cause damage to the inner reaction tube 20.

[0048] Combination Figure 4 and Figure 5It is understood that in some embodiments, after the inner tube support ring 223 is installed on the rotating support 221, the telescopic pin 224 is compressed due to the gravity of the inner tube support ring 223. That is, before the rotating support 221 rotates to the positioning pin hole at the bottom of the inner tube support ring 223, the positioning pin 163 in the telescopic pin 224 is pressed down by the inner tube support ring 223, causing the first spring 2240 to be in a compressed state. When the rotating support 221 rotates to the positioning pin hole at the bottom of the inner tube support ring 223, the positioning pin 163 in the telescopic pin 224 can be ejected through the release of the elastic potential energy of the first spring 2240, allowing the positioning pin 163 to be inserted into the positioning pin hole, thereby ensuring that the inner tube support ring 223 is relatively fixed and moves with the rotating support 221.

[0049] Next, please refer to Figure 6 , Figure 6 A tooling cross-sectional view of an axial indicator provided according to some embodiments of the present invention is shown.

[0050] like Figure 6 As shown, in some embodiments of the present invention, the axial indicator 230 in the inner tube mounting structure 210 can be fixed to the base 226 by bolts. The axial indicator 230 may include a guide shaft 231 and a floating block 232, and the guide shaft 231 is also coaxially engaged with the base 226. The floating block 232 can be fixed to the positioning base 140 by the base 226, and the floating block 232 can be fixed to the guide shaft 231 by bolts. One end of the second spring 233 (the lower end) can be supported by the base 226, and the other end can be used to support the combination of the floating block 232 and the guide shaft 231, so that the combination can move with the extension and retraction of the second spring 233. Specifically, the first end (as shown at the top) of the guide shaft 231 can be telescopically inserted into the floating block 232 via the second spring 233, while its second end (as shown at the bottom) can be telescopically fixed to the base 226 on the positioning base 140, so that the guide shaft 231 extends beyond the base 226 on the positioning base 140 by a certain length, thereby confirming whether the inner reaction tube 20 has reached the target installation depth. In this embodiment, by providing an axial indicator 230 in the inner tube mounting structure 210, it is possible to effectively ensure that the inner reaction tube 20 is safely and reliably installed at the specified height, preventing the outer reaction tube 10 from shifting position due to overshoot.

[0051] Furthermore, combined Figure 3 and Figure 7 Common understanding Figure 7 The diagram shows an external view of the inner tube mounting structure of a loading and unloading device for a double-layer reaction tube according to some embodiments of the present invention.

[0052] Figure 3 and Figure 7As shown, during the upward movement of the inner reaction tube 20 driven by the lifting mechanism 110, the outer reaction tube 10 obstructs the view, and the sealing door base 120 is relatively large, making it impossible to observe the actual rising height of the inner reaction tube from the furnace opening (i.e., the bottom of the reaction tube). Therefore, in some preferred embodiments, [the text abruptly ends here]. Figure 6 As shown, the length of the guide shaft 231 in its free state can be the same as the thickness of the inner ring step of the support flange 151. Thus, the extension length of the guide shaft 231 during the installation process of the inner reaction tube 20 can be used to determine whether the inner reaction tube 20 has reached the target installation depth.

[0053] Specifically, combined Figure 4 and Figure 6 It is understood that, in some alternative embodiments, during the upward installation of the inner reaction tube 20, the floating block 232 contacts the inner ring step of the support flange 151 and is compressed, which will cause the guide shaft 231 to move downward and extend a certain distance beyond the base 226 (e.g., Figure 4 (As shown in region 230). Furthermore, by setting the length of the guide shaft 231 in its free state to be equal to the thickness of the inner ring step of the support flange 3A, the distance (i.e., the extension length) of the guide shaft 231 extending out of the base 226 can be quickly used to determine the distance of the inner tube support ring 213 above the upper surface of the support flange 151, which is whether the inner reaction tube 20 has extended to the target installation depth.

[0054] Optionally, the extension length of the guide shaft 231 can be greater than 3 mm, but is not specifically limited. The extension length of the guide shaft 231 should be clearly visible to a technician from the outside.

[0055] Combination Figure 7 It is generally understood that, in some embodiments, the base 226 of the loading and unloading device 100 may also be provided with an inner tube mounting area. Specifically, the inner tube mounting area may include a first limit position 132 and a second limit position 133, wherein the first limit position 132 and the second limit position 133 are respectively the positions where the inner reaction tube can be raised and lowered during the loading and unloading process.

[0056] Can be combined Figure 8 Common understanding Figure 8 A top view of a double-layered reaction tube according to some embodiments of the present invention is shown. Figure 8As shown, during the installation of the inner reaction tube 20, the circumferential adjustment part 220 can be rotated to the first limit position 132 along the first direction, so that the support foot 810 of the inner tube support ring 223 is exactly rotated to the slot 154 of the support flange 151, thereby allowing the inner reaction tube 20 to rise and extend into the positioning base 140 via the inner tube support ring 223. During the disassembly of the inner reaction tube 20, the circumferential adjustment part 220 can be rotated to the second limit position 133 along the second direction, so that the support foot 810 of the inner tube support ring 223 is again exactly rotated to the slot 154 of the support flange 151, thereby allowing the inner reaction tube 20 to descend and detach from the positioning base 140 via the inner tube support ring 223.

[0057] For example, since the circumferential adjustment section 220 can rotate 360°, the first limit position 132 and the second limit position 133 can be used to stop it after it reaches the target installation angle, which is exactly the position required by the process. For example, the first limit position 132 can be used to ensure that the circumferential adjustment section 220 rotates counterclockwise to 20° and stops, so as to meet the requirements of the process installation angle. In this embodiment, by setting the rotation start and stop limiting device, the uniqueness of the circumferential rotation angle of the inner reaction tube 20 can be ensured, thereby ensuring the repeatability of the process.

[0058] Specifically, such as Figure 7 As shown, the installation process of the inner reaction tube 20 may include rotating the rotating support 221 along a first direction (e.g., counterclockwise) to rotate the inner tube support ring 223 and the inner reaction tube 20 together to the first limit position 132. This first limit position 132 limits the inner tube support ring 223, ensuring its accurate and unique position. Then, the lifting mechanism 110 can be used to extend the inner reaction tube 20 from bottom to top into the outer reaction tube 10. At this time, as... Figure 4 As shown, the inner tube support ring 223 can be supported by the support flange 151. Since the distance (i.e., the extension length) of the guide shaft 231 in the axial indicator 230 extending out of the base 226 is equal to the distance of the inner tube support ring 223 extending out of the support flange 151, it can be confirmed that the inner reaction tube 20 extends to the target installation depth, ensuring the safety and reliability of the inner reaction tube 20 during the subsequent descent process, so that it can land accurately on the support flange 151.

[0059] The lifting mechanism 110 is controlled again to move the inner tube support ring 223 and the inner reaction tube 20 downwards, placing them on the upper surface of the support flange 151, thereby completing the installation of the inner reaction tube 20. In this embodiment, the inner reaction tube 20 is rotated to the first limit position 132 by the circumferential adjustment part 220, which can make the inner reaction tube 20 accurately positioned during installation, thereby providing strong support for the smooth progress of the subsequent process.

[0060] The disassembly process of the inner reaction tube 10 may include first assembling the sealing door base 120, the positioning base 140, and the circumferential adjustment part 220, then rotating the circumferential adjustment part 220 to the first limit position 132, and controlling the lifting mechanism 110 to drive the components on the sealing door base 120 to move upward synchronously until the guide shaft 231 in the axial indicator part 230 extends out of the base 226 by more than 3mm, thereby ensuring that the inner tube support ring 223 and the inner reaction tube 20 have been separated.

[0061] Specifically, this can be understood in conjunction with point 6: the floating block 232 is supported by the second spring 233 and can extend and retract with the second spring 233; the axial indicator 230 is fixedly connected to the circumferential adjustment part 220 by bolts. Therefore, during the installation of the inner reaction tube 20, when the circumferential adjustment part 220 moves upward along with the sealing door base 120, the axial indicator 230 also moves upward accordingly. Figure 4 As shown, when the floating block 232 begins to contact the inner edge of the support flange 151, the sealing door base 120 continues to rise. Therefore, the distance between the inner tube support ring 223 and the support flange 151 is determined by the degree of extension of the guide shaft 231.

[0062] like Figure 7 and Figure 8 As shown, in some optional embodiments, the rotating support 221 can be rotated along a second direction (such as counterclockwise or clockwise) to drive the inner tube support ring 223 and the inner reaction tube 20 located thereon to rotate together to the second limit position 133, so that the support foot 810 of the inner reaction tube 20 can be exactly at the slot 154 of the support flange 151. Then, by controlling the lifting mechanism 110 to move down, the inner reaction tube 20 is lowered synchronously with the inner tube installation structure to complete the disassembly of the inner tube.

[0063] Although the methods described above are illustrated and depicted as a series of actions for the sake of simplicity, it should be understood and appreciated that these methods are not limited by the order of the actions, as some actions may occur in a different order and / or concurrently with other actions from the illustrations and descriptions herein or not illustrated and described herein but which may be understood by those skilled in the art, according to one or more embodiments.

[0064] Through the above-described embodiments provided by the present invention, a set of lifting mechanism 110 and positioning base 140, in conjunction with different tooling, can simultaneously realize the installation of the inner reaction tube 20 and the outer reaction tube 10, significantly saving economic costs. Moreover, within a limited operating space, the rotatability of the tooling of the lifting mechanism 110 allows for relatively convenient installation and disassembly of the double-layer reaction tubes.

[0065] Furthermore, by employing a multi-level positioning method and a limiting mechanism, the installation position of the double-layer reaction tube can be accurate and unique, thereby improving the stability of the installation process and laying a solid foundation for the repeatability of subsequent processes. In addition, due to the limited operating space of the reaction tube, this invention cleverly visualizes the position information of the inner reaction tube inside the furnace body during installation through an external mechanical structure, ensuring the safety and reliability of the installation process and providing a method for precise positioning of quartz tubes.

[0066] In summary, this invention provides a loading and unloading device for a double-layer reaction tube, which can improve the accuracy and uniqueness of the positioning of the double-layer reaction tube during installation, ensure the repeatability of the installation process, and also visualize the installation position information of the inner reaction tube inside the furnace, thereby further ensuring the safety and reliability of the inner reaction tube installation process, significantly improving production efficiency and reducing equipment costs.

[0067] The prior description of this disclosure is provided to enable any person skilled in the art to make or use this disclosure. Various modifications to this disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of this disclosure. Therefore, this disclosure is not intended to be limited to the examples and designs described herein, but should be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A loading and unloading device for a double-layer reaction tube, characterized in that, include: The lifting mechanism is connected to the positioning base via the sealed door base to drive the positioning base to rise and fall; A positioning base is used to restrict the circumferential degrees of freedom of the outer tube mounting structure and the inner tube mounting structure mounted thereon, respectively. The outer reaction tube is mounted on the outer tube mounting structure, and the inner reaction tube is mounted on the inner tube mounting structure. The inner tube mounting structure includes a circumferential adjustment section and an axial indicator section. The circumferential adjustment section is used to rotate the inner reaction tube to a target mounting angle, and the axial indicator section is used to confirm that the inner reaction tube has extended to the target mounting depth.

2. The loading and unloading device as described in claim 1, characterized in that, The circumferential adjustment part includes a rotating support and a self-lubricating friction ring. The self-lubricating friction ring is fixed on the positioning base. The rotating support rotates circumferentially via the self-lubricating friction ring to drive the inner reaction tube placed on it to rotate to the target installation angle.

3. The loading and unloading device as described in claim 2, characterized in that, The circumferential adjustment section also includes an inner tube support ring, which has a positioning pin hole at its bottom and the inner reaction tube is placed at its upper end. The rotating support is provided with a telescopic pin, which is located below the inner tube support ring. The telescopic pin includes a positioning pin and a first spring located at its bottom. When the rotating support is not rotated to the positioning pin hole, the positioning pin is pressed down by the inner tube support ring to compress the first spring. When the rotating support is rotated to the positioning pin hole, the first spring is released and popped out to insert the positioning pin into the positioning pin hole, so that the inner tube support ring is relatively fixed to the rotating support and moves accordingly.

4. The loading and unloading device as described in claim 3, characterized in that, The circumferential adjustment part also includes a guide ring, which is concentrically configured with the rotating support and located on the outer ring of the inner tube support ring, for radially restricting the placement position of the inner reaction tube.

5. The loading and unloading device as described in claim 1, characterized in that, The axial indicator includes a guide shaft and a floating block. The floating block is fixed to the positioning base, and the first end of the guide shaft is retractably inserted into the floating block via a second spring, while the second end is retractably fixed to the positioning base to extend beyond the positioning base by the length of the guide shaft, thereby confirming that the inner reaction tube has reached the target installation depth.

6. The loading and unloading device as described in claim 5, characterized in that, The outer tube mounting structure includes a supporting flange on which the outer reaction tube is placed. The length of the guide shaft in its free state is the same as the thickness of the inner ring step of the support flange, so as to determine the extent of insertion of the inner reaction tube by means of the extension length of the guide shaft during the installation of the inner reaction tube.

7. The loading and unloading device as described in claim 6, characterized in that, The outer pipe mounting structure includes a flange support seat, so that the inner ring step of the supporting flange is supported on the upper end face of the flange support seat. The upper surface of the positioning base is provided with a conical ring structure. The bottom of the flange support or the bottom of the circumferential adjustment part is located inside the conical ring structure. By engaging with the annular conical surface formed by the conical ring structure, the circumferential degrees of freedom of the outer tube mounting structure or the inner tube mounting structure are restricted.

8. The loading and unloading device as described in claim 7, characterized in that, The support flange and the flange support seat are fitted with a clearance and fixed together by a locating pin to restrict the circumferential freedom of the support flange on the flange support seat. A first buffer pad is provided in the clearance.

9. The loading and unloading device as described in claim 1, characterized in that, It also includes a frame, which includes an outer tube mounting area. The outer reaction tube, which is placed on the outer tube mounting structure, is raised to the outer tube mounting area via the lifting mechanism and then locked onto the frame by fixing studs to complete the outer tube installation. The outer reaction tube is then disassembled by loosening the fixing studs so that it descends synchronously with the outer tube mounting structure.

10. The loading and unloading device as described in claim 9, characterized in that, It also includes a base with an inner tube installation area. The base includes a first limit position and a second limit position. After the outer tube is installed, the inner reaction tube placed on the inner tube installation structure is rotated to the first limit position via the circumferential adjustment part. It is then inserted into the outer reaction tube from bottom to top via the lifting mechanism. The axial indicator part confirms that the inner reaction tube has reached the target installation depth, thus completing the inner tube installation. The inner reaction tube is then rotated to the second limit position via the circumferential adjustment part so that it descends synchronously with the inner tube installation structure, thus completing the inner tube disassembly.

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