Patterned compositions, compounds, patterning methods, electronic devices, and applications
Patent Information
- Application Number
- CN202610511528.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-16
- Publication Date
- 2026-11-03
- Estimated Expiration
- 2046-04-16
AI Technical Summary
Existing metal cluster patterning materials suffer from difficulties in preparation, poor solubility, poor solution stability, and unsatisfactory exposure effects, making it difficult to meet the increasingly smaller critical size patterning requirements in semiconductor manufacturing.
Organometallic compounds with specific mixed ligands are used to improve the hydrolytic stability of patterned compositions and reduce the exposure dose, and patterning is performed by including compounds represented by formula (1).
This improved the hydrolytic stability of the patterning material, reduced the exposure dose, and met the patterning requirements for increasingly smaller critical dimensions in semiconductor manufacturing.
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Figure CN122063814B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of patterning, and more specifically, to a patterning composition, compound, patterning method, electronic device, and application. Background Technology
[0002] With the rapid development of semiconductor manufacturing processes, the requirements for the critical dimension (CD) of chip patterning are constantly shrinking. Traditional patterning materials have essentially reached their resolution limits, therefore the industry urgently needs to find new patterning materials to meet the increasingly smaller critical dimension patterning requirements. Since some metals exhibit good absorption under soft X-rays or electron beams with wavelengths less than 15 nm and possess high etching resistance, they have the potential to achieve high patterning resolution while simultaneously achieving good roughness and sensitivity. In recent years, metal-based patterning materials have received considerable attention; however, existing metal cluster patterning materials suffer from difficulties in preparation, poor solubility, poor solution stability, and unsatisfactory exposure effects. Therefore, a patterning material that improves hydrolytic stability and reduces exposure dose is needed. Summary of the Invention
[0003] This application discloses a patterning composition, compound, patterning method, electronic device, and application, which solves the problems of low hydrolytic stability and high exposure dose in the prior art of patterning compositions.
[0004] In a first aspect, this application provides a patterned composition comprising a compound represented by the following formula (1): (R a M) b (L1) x (L2) y (L3) z Equation (1), in: 1 a 3, 1 b 3, 1 x 6, 1 y 6, 0 z 6, Each R is independently selected from the following groups, either substituted or unsubstituted: C 1-30 Alkyl, C 2-30 alkenyl, C 2-30alkynyl group, C 1-30 Alkoxy, C 3-30 carbonyl group, C 2-30 Heterocyclic group, C 6-30 Aryl or C 1-30 Mixed aromatics; M is selected from one or more of indium, tin, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, niobium, molybdenum, palladium, platinum, silver, cadmium, antimony, tellurium, hafnium, tungsten, gold, lead, and bismuth; Each L1 is independently selected from the following ligands: -HOR', -HSR', -HNR'2, -OR', -SR', or -NR'2. R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl or C 1-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -HNR''2, -OR'', -SR'', or -NR''2. R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-20 Alkyl, C 3-20 alkenyl, C 3-20 alkynyl or C 3-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L3 is independently selected from the following ligands: -HOR''', -HSR''', -HNR'''2, -OR''', -SR''', or -NR'''2, and R''' is selected from the following groups, whether substituted or unsubstituted: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl group, C 1-20 Alkoxy, C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatic compounds.
[0005] The patterning composition of this application comprises a metal-organic compound with specific mixed ligand coordination, which can significantly improve the hydrolytic stability of the patterning composition during the patterning process and reduce the exposure dose during the patterning process.
[0006] In one possible implementation, in formula (1), each L1 is selected from one or more of the following coordination groups: each L1 is independently selected from the following coordination groups: -HOR', -HSR' or -HNR'2.
[0007] In one possible implementation, in formula (1), each L1 is independently selected from the following ligands: -HOR', -HSR', -OR' or -SR'.
[0008] In one possible implementation, in formula (1), each L1 is independently selected from the following coordinating groups: -HOR' or -OR'.
[0009] In one possible implementation, in equation (1), each L1 is -HOR'.
[0010] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -OR'', -SR'', or -NR''2.
[0011] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'', -HSR'', -OR'', or -SR''.
[0012] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'' or -OR''.
[0013] In one possible implementation, in equation (1), each L2 is -OR''.
[0014] In one possible implementation, in formula (1), each L3 is independently selected from the following coordinating groups: -HOR''' or -OR'''.
[0015] In one possible implementation, in formula (1), each R is independently selected from substituted or unsubstituted groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkoxy, C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0016] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 Alkyne group.
[0017] In one possible implementation, in equation (1), each R is a substituted or unsubstituted C. 1-10 alkyl.
[0018] In one possible implementation, in equation (1), each R is a substituted or unsubstituted C. 1-6 alkyl.
[0019] In one possible implementation, in equation (1), each R is a substituted or unsubstituted C. 1-4 alkyl.
[0020] In one possible implementation, in equation (1), each R is tert-butyl.
[0021] In one possible implementation, in equation (1), R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 alkoxy, or C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0022] In one possible implementation, in formula (1), R' is a substituted or unsubstituted straight-chain group of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkyl group.
[0023] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-10 alkyl.
[0024] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-6 alkyl.
[0025] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-4 alkyl.
[0026] In one possible implementation, in equation (1), R' is a straight chain of C.1-4 alkyl.
[0027] In one possible implementation, in formula (1), R' is methyl or n-propyl. In one possible implementation, in formula (1), R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl or C 3-10 alkoxy, or C 2-10 carbonyl group, C 4-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0028] In one possible implementation, in formula (1), R'' is a substituted or unsubstituted branched group of the following: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl group, C 3-10 Alkyl group.
[0029] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-10 alkyl.
[0030] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-6 alkyl.
[0031] In one possible implementation, in equation (1), R'' is the C of the branch. 3-6 alkyl.
[0032] In one possible implementation, in formula (1), R'' is isopropyl, sec-butyl, isobutyl, or tert-butyl.
[0033] In one possible implementation, R'' in formula (1) is isopropyl.
[0034] In one possible implementation, in equation (1), R''' is selected from substituted or unsubstituted C. 1-6 Alkyl or substituted or unsubstituted C 1-4 alkyl.
[0035] In one possible implementation, in equation (1), R''' is selected from C 1-6 Alkyl or C 1-4 alkyl.
[0036] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents independently selected from: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy, carboxyl, amide, cyano, nitro, ester, C 2-6 alkenyl, C 2-6 alkynyl group, C 3-8 carbonyl group, C 2-8 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0037] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy.
[0038] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, C1-C6 alkoxy.
[0039] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C4 alkyl, C1-C4 alkoxy.
[0040] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, antimony, tellurium, titanium, zirconium, hafnium, and zinc.
[0041] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, and antimony.
[0042] In one possible implementation, M is tin in equation (1).
[0043] In one possible implementation, in equation (1), 1 a 2 or a is 1.
[0044] In one possible implementation, in equation (1), 1 b 2 or b is 1.
[0045] In one possible implementation, in equation (1), 2 x 4 or x is 2.
[0046] In one possible implementation, in equation (1), 2 y 5 or y is 3.
[0047] In one possible implementation, in equation (1), 0 z 2 or z is 0.
[0048] In one possible implementation, the compound is t-BuSn(HOMe)2(O i Pr)3、t-BuSn(HOEt)2(O i Pr)3、t-BuSn(HO n Pr)2(O i Pr)3、t-BuSn(HO n Bu)2(O i Pr)3、t-BuSn(HOMe)2(O i Bu)3、t-BuSn(HOEt)2(O i Bu)3、t-BuSn(HO n Pr)2(O i Bu)3、t-BuSn(HO n Bu)2(O i Bu)3、t-BuSn(HOMe)2(O s Bu)3、t-BuSn(HOEt)2(O s Bu)3、t-BuSn(HO n Pr)2(O s Bu)3、t-BuSn(HO n Bu)2(O s Bu)3、t-BuSn(HOMe)2(O t Bu)3、t-BuSn(HOEt)2(O t Bu)3、t-BuSn(HO n Pr)2(O t Bu)3、t-BuSn(HO n Bu)2(O t Bu)3.
[0049] In one possible implementation, the patterning composition comprises a solvent.
[0050] In one possible implementation, the patterning composition contains only one solvent.
[0051] In one possible implementation, the patterned composition comprises 0.1-10 wt% of the compound represented by formula (1) based on the total weight of the patterned composition.
[0052] In one possible implementation, the patterned composition comprises 0.5-5 wt% of the compound represented by formula (1) based on the total weight of the patterned composition.
[0053] In one possible implementation, the patterned composition contains 90-99.9 wt% solvent based on the total weight of the patterned composition.
[0054] In one possible implementation, the patterned composition contains 95-99.5 wt% solvent based on the total weight of the patterned composition.
[0055] In one possible embodiment, the solvent is selected from one or more of the following: alcohol solvents, ketone solvents, ether solvents, ester solvents, acid solvents, tetrahydrofuran, N,N-dimethylformamide, dimethyl adipate, benzene, and toluene.
[0056] In one possible implementation, the solvent is selected from alcohol solvents, ester solvents, ketone solvents, ether solvents, acid solvents, tetrahydrofuran, N,N-dimethylformamide, dimethyl adipate, benzene, and toluene.
[0057] In one possible implementation, the solvent is selected from 4-methyl-2-pentanol, cyclohexanone, MIAK, MIBK, PGMEA, and PGME.
[0058] In one possible implementation, the solvent is selected from 4-methyl-2-pentanol.
[0059] Secondly, this application provides a compound represented by the following formula (1): (R a M) b (L1) x (L2) y (L3) z Equation (1), in: 1 a 3, 1 b 3, 1 x 6, 1 y 6, 0 z 6, Each R is independently selected from the following groups, either substituted or unsubstituted: C 1-30 Alkyl, C2-30 alkenyl, C 2-30 alkynyl group, C 1-30 Alkoxy, C 3-30 carbonyl group, C 2-30 Heterocyclic group, C 6-30 Aryl or C 1-30 Mixed aromatics; M is selected from one or more of indium, tin, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, niobium, molybdenum, palladium, platinum, silver, cadmium, antimony, tellurium, hafnium, tungsten, gold, lead, and bismuth; Each L1 is independently selected from the following ligands: -HOR', -HSR', -HNR'2, -OR', -SR', or -NR'2. R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl or C 1-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -HNR''2, -OR'', -SR'', or -NR''2. R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-20 Alkyl, C 3-20 alkenyl, C 3-20 alkynyl or C 3-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L3 is independently selected from the following ligands: -HOR''', -HSR''', -HNR'''2, -OR''', -SR''', or -NR'''2, and R''' is selected from the following groups, whether substituted or unsubstituted: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl group, C 1-20 Alkoxy, C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatic compounds.
[0060] The compounds of this application comprise organometallic compounds with specific mixed ligand coordination, which can significantly improve the hydrolytic stability of the patterned composition during the patterning process and reduce the exposure dose during the patterning process.
[0061] In one possible implementation, in formula (1), each L1 is independently selected from the following ligands: -HOR', -HSR', or -HNR'2.
[0062] In one possible implementation, in formula (1), each L1 is independently selected from the following ligands: -HOR', -HSR', -OR' or -SR'.
[0063] In one possible implementation, in formula (1), each L1 is independently selected from the following coordinating groups: -HOR' or -OR'.
[0064] In one possible implementation, L1 is -HOR' in equation (1).
[0065] In one possible implementation, in equation (1), R' is selected from... Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 alkoxy, or C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0066] In one possible implementation, in equation (1), R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 alkoxy, or C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0067] In one possible implementation, in formula (1), R' is selected from the following groups of substituted or unsubstituted straight chains: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 Alkyl group.
[0068] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-10 alkyl.
[0069] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-6 alkyl.
[0070] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-4 alkyl.
[0071] In one possible implementation, in equation (1), R' is a straight chain of C. 1-4 alkyl.
[0072] In one possible embodiment, R' in formula (1) is methyl or n-propyl. In one possible embodiment, each L2 in formula (1) is independently selected from the following coordinating groups: -OR'', -SR'', or -NR''2.
[0073] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'', -HSR'', -OR'', or -SR''.
[0074] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'' or -OR''.
[0075] In one possible implementation, in equation (1), each L2 is -OR''.
[0076] In one possible implementation, in equation (1), R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl or C 3-10 alkoxy, or C 2-10 carbonyl group, C 4-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0077] In one possible implementation, in formula (1), R'' is a substituted or unsubstituted branched group of the following: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl group, C 3-10 Alkyl group.
[0078] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-10 alkyl.
[0079] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-6 alkyl.
[0080] In one possible implementation, in equation (1), R'' is the C of the branch. 3-6 alkyl.
[0081] In one possible implementation, in formula (1), R'' is isopropyl, sec-butyl, isobutyl, or tert-butyl.
[0082] In one possible implementation, R'' in formula (1) is isopropyl.
[0083] In one possible implementation, in equation (1), R''' is selected from substituted or unsubstituted C. 1-6 Alkyl or substituted or unsubstituted C 1-4 alkyl.
[0084] In one possible implementation, in equation (1), R''' is selected from C 1-6 Alkyl or C 1-4 alkyl.
[0085] In one possible implementation, in formula (1), each R is independently selected from substituted or unsubstituted groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkoxy groups, and C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0086] In one possible implementation, in formula (1), each R is independently selected from substituted or unsubstituted groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 Alkyne group.
[0087] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-10 alkyl.
[0088] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-6 alkyl.
[0089] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-4 alkyl.
[0090] In one possible implementation, R in equation (1) is tert-butyl.
[0091] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents independently selected from: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy, carboxyl, amide, cyano, nitro, ester, C 2-6 alkenyl, C 2-6 alkynyl group, C 3-8 carbonyl group, C 2-8 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0092] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy.
[0093] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, C1-C6 alkoxy.
[0094] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C4 alkyl, C1-C4 alkoxy.
[0095] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, antimony, tellurium, titanium, zirconium, hafnium, and zinc.
[0096] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, and antimony.
[0097] In one possible implementation, M is tin in equation (1).
[0098] In one possible implementation, in equation (1), 1 a 2 or a is 1.
[0099] In one possible implementation, in equation (1), 1 b 2 or b is 1.
[0100] In one possible implementation, in equation (1), 2 x 4 or x is 2.
[0101] In one possible implementation, in equation (1), 2 y 5 or y is 3.
[0102] In one possible implementation, in equation (1), 0 z 2 or z is 0.
[0103] In one possible implementation, the compound is t-BuSn(HOMe)2(O i Pr)3、t-BuSn(HOEt)2(O i Pr)3、t-BuSn(HO n Pr)2(O i Pr)3、t-BuSn(HO n Bu)2(O i Pr)3、t-BuSn(HOMe)2(O i Bu)3、t-BuSn(HOEt)2(O i Bu)3、t-BuSn(HO n Pr)2(O i Bu)3、t-BuSn(HO n Bu)2(O i Bu)3、t-BuSn(HOMe)2(O s Bu)3、t-BuSn(HOEt)2(O s Bu)3、t-BuSn(HO n Pr)2(O s Bu)3、t-BuSn(HO n Bu)2(O s Bu)3、t-BuSn(HOMe)2(O t Bu)3、t-BuSn(HOEt)2(O t Bu)3、t-BuSn(HO n Pr)2(O t Bu)3、t-BuSn(HO n Bu)2(O t Bu)3.
[0104] Thirdly, this application provides a patterning method, which includes patterning using a patterning composition from an embodiment of this application or a coating formed using a compound from an embodiment of this application.
[0105] In one possible implementation, the exposure dose is less than 1000 μC / cm. 2 Or less than 400 μC / cm 2 Or 50-350 μC / cm 2 Or 100-350 μC / cm 2 Or 200-350 μC / cm 2 Or 250-350 μC / cm 2 .
[0106] Fourthly, this application provides a patterned film formed using the patterning composition or compound described in the embodiments of this application, or formed by the patterning method described in the embodiments of this application.
[0107] Fifthly, this application provides a method for fabricating an electronic device, the electronic device including a functional layer and an optional substrate, the method using a patterning method according to embodiments of this application to pattern the functional layer and / or the substrate, if present.
[0108] In a sixth aspect, this application provides an electronic device comprising a functional layer and an optional substrate; wherein the functional layer and / or, when present, the substrate contains a pattern formed using the patterning method described in the embodiments of this application; or the functional layer and / or, when present, the substrate has a pattern formed using the patterning method described in the embodiments of this application.
[0109] In one possible implementation, the electronic device is a semiconductor device.
[0110] In a seventh aspect, this application provides an electronic device, which includes electronic components as described in embodiments of this application, as well as at least one of a power supply unit, an interconnection structure, a structural packaging component, and an input / output component.
[0111] In one possible implementation, the electronic device is selected from: consumer electronic devices, home electronic appliances, vehicle electronic devices, communication and network equipment, industrial control equipment, medical electronic devices, security and Internet of Things equipment, office and financial equipment, agricultural electronic devices, educational and scientific research electronic devices, new energy and energy storage system equipment, robotics and automated execution equipment, rail transit and intelligent transportation system equipment, and environmental protection and environmental monitoring equipment.
[0112] Eighthly, this application provides the use of the compositions described in embodiments of this application in the manufacture of electronic devices. Attached Figure Description
[0113] The present application will now be described in more full and detail with reference to the accompanying drawings. Wherein: Figure 1 This is the ATR infrared spectrum of Sn1.
[0114] Figure 2 The ATR infrared peak position of Sn1 is 999 / 1150 cm⁻¹. -1 Graph showing changes over time.
[0115] Figure 3 This is the ATR infrared spectrum of Sn2.
[0116] Figure 4 The ATR infrared peak position of Sn2 is 1002 / 1150 cm⁻¹. -1 Graph showing changes over time.
[0117] Figure 5 The image shows the ATR infrared spectrum of Sn-R1.
[0118] Figure 6 The ATR infrared peak positions of Sn-R1 are 956 / 1032 / 1085 / 1132 cm⁻¹ -1 Graph showing changes over time.
[0119] Figure 7 The image shows the ATR infrared spectrum of Sn-R2.
[0120] Figure 8 The ATR infrared peak position of Sn-R2 is 964 / 1107 cm⁻¹. -1 Graph showing changes over time.
[0121] Figure 9 SEM image of Sn1.
[0122] Figure 10 SEM image of Sn2.
[0123] Figure 11 SEM images of Sn-R1.
[0124] Figure 12 Exposure SEM image of Sn-R2. Detailed Implementation
[0125] definition The following definitions and methods are provided to better define this application and to guide those skilled in the art in its practice. Unless otherwise stated, the terms are to be understood in accordance with their conventional usage by those skilled in the art. All patent documents, academic papers, and other published materials cited herein are incorporated herein by reference in their entirety.
[0126] The terms “comprising” or “including” shall be interpreted herein as having a non-exhaustive meaning and allowing for the addition or reference to further elements, such as adding features or method steps or members or components to anything that includes the listed elements. “Comprising” may be replaced by “including” if the practice of a given language variant requires it, or may be limited to “consistently consisting of” if other elements besides those listed are not essential to the practice of this application, or may be limited to “consisting of” in the absence of any other elements.
[0127] The term “optional” or “optionally” means that the event or situation described below may or may not occur, including both the occurrence and non-occurrence of the event or situation.
[0128] The numerical range representing the number of carbon atoms in this article refers to the integers within a given range, for example, "C1-C1". 20 "or "C 1-20 "" means that the group can have 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 or 20 carbon atoms.
[0129] The term "straight-chain" refers to a carbon skeleton in which carbon atoms are connected in a continuous, unbranched manner, the carbon skeleton having no carbon chain branches, the carbon chain branches being a branched structure containing at least one side-chain hydrocarbon carbon atom or side-chain ring carbon atom connected to the carbon skeleton.
[0130] In this document, "substituted straight-chain group" refers to a group having a "straight-chain" skeletal structure as defined herein, where one or more hydrogen atoms on the skeletal structure are replaced by a group that does not belong to the aforementioned carbon chain branching, for example, by a substituent selected from the group consisting of: halogen, hydroxyl, amino, cyano, nitro, sulfonic acid, alkoxy, carbonyl, carboxyl, ester, or substituted or unsubstituted aryl groups. The prerequisite is that the substitution does not introduce any substituent that would cause the carbon skeleton to produce the aforementioned carbon chain branching structure. Furthermore, it is understood that when a substituent is applied to a terminal carbon atom of the carbon skeleton, the resulting group can still be called a "substituted straight-chain group".
[0131] The term "branched" refers to a carbon skeleton having at least one of the aforementioned carbon chain branches.
[0132] In this document, "substituted branched group" means that the branched group itself has a "branched" skeleton structure as defined herein, and the branched group is further substituted, for example, one or more hydrogen atoms of the branched group are replaced by substituents selected from the group consisting of halogen, hydroxyl, amino, cyano, nitro, sulfonic acid, alkoxy, carbonyl, carboxyl, ester, or substituted or unsubstituted aryl or heteroaryl groups.
[0133] The terms “halogen,” “halogenated,” or “halogen” themselves or as part of another substituent represent fluorine (F), chlorine (Cl), bromine (Br), or iodine (I) atoms.
[0134] The term "alkyl" refers to a straight-chain or branched saturated hydrocarbon group. Examples of alkyl groups include, but are not limited to, C10. 1-4 Alkyl, C 1-6 Alkyl, C 1-8 Alkyl, C 1-10 Alkyl groups, such as methyl (Me), ethyl (Et), propyl (e.g., n-propyl and isopropyl), butyl (e.g., n-butyl, isobutyl, s-butyl, tert-butyl), pentyl (e.g., n-pentyl, isopentyl, neopentyl), etc.; for example, the term "C 1-6 "Alkyl" refers to an alkyl group containing 1 to 6 (e.g., 1, 2, 3, 4, 5, 6) carbon atoms (e.g., methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, neopentyl, hexyl, 2-methylpentyl, etc.).
[0135] The term "alkenyl" refers to a straight-chain or branched hydrocarbon group with at least one carbon-carbon double bond, which can be C 2-4 alkenyl, C 2-6 alkenyl, C 2-8 alkenyl, C 2-10 Alkenyl groups, such as vinyl, allyl, 1-propenyl, 2-propenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1,3-butadienyl, etc. For example, the term "C..." 2-6 "Alkenyl" refers to an alkenyl group containing 2 to 6 (e.g., 2, 3, 4, 5, 6) carbon atoms (e.g., vinyl, 1-propenyl, 2-propenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1,3-butadienyl, pentenyl, 1-methylbutenyl, 2-methylbutenyl, 3-methylbutenyl, hexenyl, 2-methylpentenyl, etc.).
[0136] The term "alkynyl" refers to a straight-chain or branched hydrocarbon group with at least one carbon-carbon triple bond, which can be C 2-4 alkynyl group, C 2-6 alkynyl group, C 2-8 alkynyl group, C 2-10 Alkyne groups, such as ethynyl, enynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1,3-butadiynyl, etc. For example, the term "C..." 2-6"Alkenyl" refers to an alkyne group containing 2 to 6 (e.g., 2, 3, 4, 5, 6) carbon atoms (e.g., ethynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1,3-butadiynyl, penynyl, 1-methylbutynyl, 2-methylbutynyl, 3-methylbutynyl, hexynyl, 2-methylpentynyl, etc.).
[0137] The term "alkoxy" refers to -O-alkyl, where "alkyl" is defined as above. Examples of "alkoxy" include, but are not limited to, methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, tert-butoxy, n-pentoxy, and isopentoxy. "Substituted or unsubstituted alkoxy" means that the alkyl group is substituted or unsubstituted.
[0138] The term "carbocyclic group" refers to a non-aromatic cyclic group composed of carbon and hydrogen atoms, having at least one saturated or unsaturated cyclic structure. Such carbocyclic groups include, but are not limited to, monocyclic, fused polycyclic, bridged, or spirocyclic structures. Non-limiting examples of carbocyclic groups include, but are not limited to, C1. 3-20 carbonyl group, C 3-18 carbonyl group, C 3-16 carbonyl group, C 3-12 carbonyl group, C 3-10 carbonyl group, C 3-8 carbonyl group, C 3-7 carbonyl group, C 3-6 Carbocyclic groups, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclopentenyl, cyclohexenyl, norbornel, adamantyl, bicyclo[2.2.2]octyl, etc.
[0139] The term "heterocyclic group" or "heterocycle" refers to a saturated, partially unsaturated, or unsaturated non-aromatic cyclic group consisting of a carbon atom and at least one heteroatom, and may exist as a monocyclic, fused polycyclic, bridged, or spirocyclic group. Unless otherwise indicated, the heterocycle is typically a ring containing 1 to 5 (e.g., 1, 2, 3, 4, 5) heteroatoms independently selected from sulfur, oxygen, and / or nitrogen. Non-limiting examples of heterocyclic groups include, but are not limited to, 1-membered, 2-membered, 3-membered, 4-membered, and 5-membered heterocycles, as well as azirmonocyclic butyl, pyrrolyl, tetrahydrofuranyl, tetrahydrothiophenyl, piperidinyl, piperazine, morpholinyl, thiomorpholinyl, 1,1-dioxo-thiomorpholinyl, homopiperazine, oxacyclopentyl, azirmonospiro[3.3]heptyl, and 8-azirbicyclo[3.2.1]octyl.
[0140] The term "C1-C" 20A "heterocyclic group" refers to a heterocyclic group that has, in addition to 1 to 20 carbon atoms (e.g., 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 or 20 carbon atoms), at least one heteroatom selected from N, O, and S as a cyclic atom (e.g., 1, 2, 3, 4, 5 heteroatoms).
[0141] The term "aryl" or "aromatic ring" refers to an aromatic ring or a ring system of all or some aromatic groups, consisting of carbon and hydrogen atoms. It can be a monocyclic ring or a polycyclic ring (such as a bicyclic ring or other rings with two or more rings) fused together or covalently linked. Non-limiting examples of aryl groups include, but are not limited to, phenyl, naphthyl, anthracene, and 1,2,3,4-tetrahydronaphthalene.
[0142] The term "C6-C" 20 "Aryl" or "aromatic ring" refers to an aryl or aromatic ring as defined above that has 6 to 20 carbon atoms (e.g., 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 or 20 carbon atoms).
[0143] "Heteroaryl" or "heteroary ring" refers to an aromatic ring group consisting of a carbon atom and at least one (e.g., 1 to 5, such as 1, 2, 3, 4, 5) heteroatoms selected from nitrogen, oxygen, and sulfur. The heteroaryl group can be a monocyclic, bicyclic, tricyclic, or tetracyclic ring system, which may include fused or bridged ring systems; and the nitrogen, carbon, or sulfur atom in the heteroaryl group can be arbitrarily oxidized; the nitrogen atom can be arbitrarily quaternized. Examples include, but are not limited to, azirrolyl, acridine, benzimidazolyl, benzothiazolyl, benzoindolyl, benzothiadiazolyl, benzonaphthuronyl, benzo[2]azolyl, benzo[m]dioxanepentenyl, benzodioxinyl, benzopyranyl, benzopyranoneyl, benzofuranyl, benzofuranoneyl, benzothiopheneyl (benzobenzenethio), benzotriazolyl, benzo[4,6]imidazo[1,2-a]pyridyl, carbazole, cenolinyl, dibenzofuranyl, furanyl, thiopheneyl, furanoneyl, isothiazolyl, imidazolyl, indolyl, Indazole, isoindolyl, dihydroindolyl, isodihydroindolyl, indene, isozolyl, naphthidyl, diazolyl, 2-oxoazapyrrolyl, diazolyl, ethylene oxide, phenazinyl, phenothiazinyl, phenothiazinyl, 2,3-diazanaphthyl, pteridinyl, purine, pyrrolyl, pyrazolyl, pyridinyl, pyrazinyl, pyrimidinyl, pyridazinyl, quinazolinyl, quinoxalinyl, quinolinyl, quininecycloyl, isoquinolinyl, thiazolyl, thiadiazolyl, triazolyl, tetrazolyl, triazinyl, thiazolyl, imidazolyl, triazolyl, tetrazolyl, and phenylthio.
[0144] The term "C1-C" 20"Heteroaryl" refers to an aromatic ring group having, in addition to 1 to 20 carbon atoms (e.g., 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 or 20 carbon atoms), at least one heteroatom selected from N, O, and S as a cyclic atom (e.g., 1, 2, 3, 4, 5 heteroatoms).
[0145] The term "ring" in this document includes carbocyclic rings, heterocyclic rings, aromatic rings, and heteroaromatic rings.
[0146] The term "amino" refers to -NH2.
[0147] The term "ester group" refers to a group having a -OCOR or -COOR structure. R represents the following groups, substituted or unsubstituted: alkyl, alkenyl, alkynyl, carbocyclic, heterocyclic, aryl or heteroaryl, wherein alkyl, alkenyl, alkynyl, carbocyclic, heterocyclic, aryl or heteroaryl are as defined above.
[0148] The term "acyl" refers to a group having a -C(=O)-R structure, where R represents hydrogen, or is a substituted or unsubstituted group of the following: alkyl, alkenyl, ynyl, carbocyclic, heterocyclic, aryl, or heteroaryl, wherein alkyl, alkenyl, ynyl, carbocyclic, heterocyclic, aryl, or heteroaryl are as defined above.
[0149] The term "sulfonyl" refers to a group having a -S(=O)2-R structure, where R represents a substituted or unsubstituted group of the following: alkyl, alkenyl, ynyl, carbocyclic, heterocyclic, aryl or heteroaryl, wherein alkyl, alkenyl, ynyl, carbocyclic, heterocyclic, aryl or heteroaryl are as defined above.
[0150] The term "cyano" refers to a group having a -CN structure.
[0151] The term "substituted or unsubstituted" means that a group is substituted or unsubstituted by one or more substituents (e.g., 1 to 4, 1 to 3, or 1 to 2), and when substituted, the substituent is individually and independently selected from one or more of the following groups: halogen, hydroxyl, C1-C. 10Alkyl, haloalkyl, hydroxyalkyl, alkenyl, alkynyl, cycloalkyl, aryl, heteroaryl, heterocyclic, alkoxy, aryloxy, heteroaryloxy, mercapto, alkylthio, arylthio, cyano, carbonyl, thiocarbonyl, O-carbamoyl, N-carbamoyl, O-thiocarbamoyl, N-thiocarbamoyl, C-amide, N-amide, S-sulfinylamide, N-sulfinylamide, carboxyl, C-carboxyl, O-carboxyl, isocyanate, cyanothio, isothiocyanate, nitro, ester, cyano, silyl, trihalomethanesulfonyl, or amino groups including mono- and di-substituted amino groups, and their protected derivatives, etc. Whenever a substituent is described as "substituted," the substituent can be substituted by one of the substituents listed above.
[0152] When a group is replaced by more than one substituent, the substituents can be the same or different. Any substituted functional group in this article can be substituted at 1 to 4 different positions, and those 1 to 4 substituted groups can be substituted independently at 1 to 4 positions.
[0153] The H atom is typically not shown in the general formula of the specification; however, those skilled in the art can understand the formula and identify the complete structure.
[0154] Throughout the specification, optional terms are used, such as optional embodiments or variations, where “specific” refers to embodiments or variations of particular interest, and “preferred” refers to embodiments or variations preferred for some reason.
[0155] Unless the context clearly specifies otherwise, the singular forms “a” and “the”, or at least “one”, include plural references.
[0156] [Patterned Composition] To address the problems of low hydrolytic stability and high exposure dose in existing patterned compositions, this application provides a patterned composition comprising a compound represented by the following formula (1): (R a M) b (L1) x (L2) y (L3) z Equation (1), in: 1 a 3, 1 b 3, 1 x 6, 1 y 6, 0 z 6, Each R is independently selected from the following groups, either substituted or unsubstituted: C 1-30 Alkyl, C 2-30 alkenyl, C 2-30 alkynyl group, C 1-30 Alkoxy, C 3-30 carbonyl group, C 2-30 Heterocyclic group, C 6-30 Aryl or C 1-30 Mixed aromatics; M is selected from one or more of indium, tin, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, niobium, molybdenum, palladium, platinum, silver, cadmium, antimony, tellurium, hafnium, tungsten, gold, lead, and bismuth; Each L1 is independently selected from the following ligands: -HOR', -HSR', -HNR'2, -OR', -SR', or -NR'2. R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl or C 1-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -HNR''2, -OR'', -SR'', or -NR''2. R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-20 Alkyl, C 3-20 alkenyl, C 3-20 alkynyl or C 3-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L3 is independently selected from the following ligands: -HOR''', -HSR''', -HNR'''2, -OR''', -SR''', or -NR'''2, and R''' is selected from the following groups, whether substituted or unsubstituted: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl group, C1-20 Alkoxy, C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatic compounds.
[0157] In one possible implementation, in formula (1), L1 is selected from one or more of the following coordination groups: each L1 is independently selected from the following coordination groups: -HOR', -HSR' or -HNR'2.
[0158] In one possible implementation, in formula (1), -HOR', -HSR', -OR', or -SR'.
[0159] In one possible implementation, in formula (1), each L1 is independently selected from the following coordinating groups: -HOR' or -OR'.
[0160] In one possible implementation, in equation (1), each L1 is -HOR'.
[0161] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -OR'', -SR'', or -NR''2.
[0162] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'', -HSR'', -OR'', or -SR''.
[0163] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'' or -OR''.
[0164] In one possible implementation, in equation (1), each L2 is -OR''.
[0165] In one possible implementation, in equation (1), R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 alkoxy, or C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0166] In one possible implementation, in formula (1), R' is a substituted or unsubstituted straight-chain group of the following: C 1-10 Alkyl, C2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkyl group.
[0167] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-10 alkyl.
[0168] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-6 alkyl.
[0169] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-4 alkyl.
[0170] In one possible implementation, in equation (1), R' is a straight chain of C. 1-4 alkyl.
[0171] In one possible implementation, in formula (1), R' is methyl or n-propyl. In one possible implementation, in formula (1), R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl or C 3-10 alkoxy, or C 2-10 carbonyl group, C 4-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0172] In one possible implementation, in formula (1), R'' is a substituted or unsubstituted branched group of the following: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl group, C 3-10 Alkyl group.
[0173] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-10 alkyl.
[0174] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-6 alkyl.
[0175] In one possible implementation, in equation (1), R'' is the C of the branch. 3-6 alkyl.
[0176] In one possible implementation, in formula (1), R'' is isopropyl, sec-butyl, isobutyl, or tert-butyl.
[0177] In one possible implementation, R'' in formula (1) is isopropyl.
[0178] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkoxy, C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0179] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 Alkyne group.
[0180] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-10 alkyl.
[0181] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-6 alkyl.
[0182] In one possible implementation, in formula (1), each R is a substituted or unsubstituted group of the following: C 1-4 alkyl.
[0183] In one possible implementation, R in equation (1) is tert-butyl.
[0184] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents independently selected from: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy, carboxyl, amide, cyano, nitro, ester, C 2-6 alkenyl, C 2-6 alkynyl group, C 3-8 carbonyl group, C 2-8 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0185] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy.
[0186] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, C1-C6 alkoxy.
[0187] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C4 alkyl, C1-C4 alkoxy.
[0188] In one possible implementation, in formula (1), each L3 is independently selected from the following coordinating groups: -HOR''' or -OR'''.
[0189] In one possible implementation, in equation (1), R''' is selected from substituted or unsubstituted C. 1-6 Alkyl or substituted or unsubstituted C 1-4 alkyl.
[0190] In one possible implementation, in equation (1), R''' is selected from C 1-6 Alkyl or C 1-4 alkyl.
[0191] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, antimony, tellurium, titanium, zirconium, hafnium, and zinc.
[0192] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, and antimony.
[0193] In one possible implementation, M is tin in equation (1).
[0194] In one possible implementation, in equation (1), a is 1, 2, or 3. Preferably, a is 1.
[0195] In one possible implementation, b is 1, 2, or 3 in equation (1). Preferably, b is 1.
[0196] In one possible implementation, x in equation (1) is 1 to 6. For example, x is 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, x is 2.
[0197] In one possible implementation, y in equation (1) is 1 to 6. For example, y is 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, y is 3.
[0198] In one possible implementation, z in equation (1) is from 0 to 6. For example, z is 0, 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, z is 0.
[0199] In one possible implementation, the patterning composition is t-BuSn(HOMe)2(O i Pr)3、t-BuSn(HOEt)2(O i Pr)3、t-BuSn(HO n Pr)2(O i Pr)3、t-BuSn(HO n Bu)2(O i Pr)3、t-BuSn(HOMe)2(O i Bu)3、t-BuSn(HOEt)2(O i Bu)3、t-BuSn(HO n Pr)2(O i Bu)3、t-BuSn(HO n Bu)2(O i Bu)3、t-BuSn(HOMe)2(O s Bu)3、t-BuSn(HOEt)2(O s Bu)3、t-BuSn(HO n Pr)2(O s Bu)3、t-BuSn(HO n Bu)2(O s Bu)3、t-BuSn(HOMe)2(O t Bu)3、t-BuSn(HOEt)2(O t Bu)3、t-BuSn(HO n Pr)2(O t Bu)3、t-BuSn(HO n Bu)2(O t Bu)3.
[0200] In one possible implementation, the patterning composition comprises a solvent.
[0201] In one possible implementation, the patterning composition contains only one solvent.
[0202] In one possible embodiment, the patterned composition comprises 0.1-10 wt% of the compound represented by formula (1) based on the total weight of the patterned composition. In another possible embodiment, the patterned composition comprises 0.5-5 wt% of the compound represented by formula (1) based on the total weight of the patterned composition. Exemplarily, the patterned composition comprises 0.1, 0.5, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 wt%, and values between any two of the above, of the compound represented by formula (1) based on the total weight of the patterned composition.
[0203] In one possible implementation, the patterned composition comprises 90-99.9 wt% solvent based on the total weight of the patterned composition. In another possible implementation, the patterned composition comprises 95-99.5 wt% solvent based on the total weight of the patterned composition. Exemplarily, the patterned composition comprises 90, 91, 92, 93, 94, 95, 96, 97, 98, 99, 99.5, 99.9 wt% solvent, and values between any two of the above, based on the total weight of the patterned composition.
[0204] In one possible embodiment, the solvent is selected from one or more of the following: alcohol solvents, ketone solvents, ether solvents, ester solvents, acid solvents, tetrahydrofuran, N,N-dimethylformamide, dimethyl adipate, benzene, and toluene.
[0205] In one possible implementation, the solvent is selected from alcohol solvents, ester solvents, ketone solvents, ether solvents, acid solvents, tetrahydrofuran, N,N-dimethylformamide, dimethyl adipate, benzene, and toluene.
[0206] In one possible implementation, the solvent is selected from 4-methyl-2-pentanol, cyclohexanone, MIAK, MIBK, PGMEA, and PGME.
[0207] In one possible implementation, the solvent is selected from 4-methyl-2-pentanol.
[0208] In one possible implementation, the patterning composition further comprises an additive, which includes one or more of a leveling agent and a surfactant.
[0209] For example, leveling agents include ethyl lactate, propylene glycol monomethyl ether acetate, and polyether-modified polydimethylsiloxane. For example, surfactants include polyether-modified siloxane, acetylenol, and fluoroalkyl ethylene oxide.
[0210] The patterning composition of this application comprises a metal-organic compound with specific mixed ligand coordination, which can significantly improve the hydrolytic stability of the patterning composition during the patterning process and reduce the exposure dose during the patterning process.
[0211] [Compound] This application provides a compound represented by the following formula (1): (R a M) b (L1) x (L2) y (L3) z Equation (1), in: 1 a 3, 1 b 3, 1 x 6, 1 y 6, 0 z 6, Each R is independently selected from the following groups, either substituted or unsubstituted: C 1-30 Alkyl, C 2-30 alkenyl, C 2-30 alkynyl group, C 1-30 Alkoxy, C 3-30 carbonyl group, C 2-30 Heterocyclic group, C 6-30 Aryl or C 1-30 Mixed aromatics; M is selected from one or more of indium, tin, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, niobium, molybdenum, palladium, platinum, silver, cadmium, antimony, tellurium, hafnium, tungsten, gold, lead, and bismuth; Each L1 is independently selected from the following ligands: -HOR', -HSR', -HNR'2, -OR', -SR', or -NR'2. R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl or C 1-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -HNR''2, -OR'', -SR'', or -NR''2. R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-20 Alkyl, C 3-20 alkenyl, C 3-20 alkynyl or C 3-20 alkoxy, or C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L3 is independently selected from the following ligands: -HOR''', -HSR''', -HNR'''2, -OR''', -SR''', or -NR'''2, and R''' is selected from the following groups, whether substituted or unsubstituted: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl group, C 1-20 Alkoxy, C 3-20 carbonyl group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatic compounds.
[0212] In one possible implementation, in formula (1), each L1 is independently selected from the following ligands: -HOR', -HSR' or -HNR'2; In one possible implementation, in formula (1), each L1 is independently selected from the following ligands: -HOR', -HSR', -OR' or -SR'; In one possible implementation, in formula (1), each L1 is independently selected from the following coordinating groups: -HOR' or -OR'.
[0213] In one possible implementation, L1 is -HOR' in equation (1).
[0214] In one possible implementation, in equation (1), R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 alkoxy groups, and C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C1-10 Mixed aromatic compounds.
[0215] In one possible implementation, in equation (1), R' is selected from: Substituted or unsubstituted straight-chain groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 alkoxy, or C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0216] In one possible implementation, in formula (1), R' is selected from the following groups of substituted or unsubstituted straight chains: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl or C 1-10 Alkoxy; In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-10 alkyl.
[0217] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-6 alkyl.
[0218] In one possible implementation, in equation (1), R' is a substituted or unsubstituted linear C 1-4 alkyl.
[0219] In one possible implementation, in equation (1), R' is a straight chain of C. 1-4 alkyl.
[0220] In one possible embodiment, R' in formula (1) is methyl or n-propyl. In one possible embodiment, each L2 in formula (1) is independently selected from the following coordinating groups: -OR'', -SR'', or -NR''2.
[0221] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'', -HSR'', -OR'', or -SR''.
[0222] In one possible implementation, in formula (1), each L2 is independently selected from the following coordinating groups: -HOR'' or -OR''.
[0223] In one possible implementation, in equation (1), each L2 is -OR''.
[0224] In one possible implementation, in equation (1), R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl or C 3-10 alkoxy, or C 2-10 carbonyl group, C 4-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0225] In one possible implementation, in formula (1), R'' is a substituted or unsubstituted branched group of the following: C 3-10 Alkyl, C 3-10 alkenyl, C 3-10 alkynyl group, C 3-10 Alkyl group.
[0226] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-10 alkyl.
[0227] In one possible implementation, in equation (1), R'' is the C of the substituted or unsubstituted branch. 3-6 alkyl.
[0228] In one possible implementation, in equation (1), R'' is the C of the branch. 3-6 alkyl.
[0229] In one possible implementation, in formula (1), R'' is isopropyl, sec-butyl, isobutyl, or tert-butyl.
[0230] In one possible implementation, R'' in formula (1) is isopropyl.
[0231] In one possible implementation, in formula (1), each L3 is independently selected from the following coordinating groups: -HOR''' or -OR'''.
[0232] In one possible implementation, in equation (1), R''' is selected from substituted or unsubstituted C. 1-6 Alkyl or substituted or unsubstituted C 1-4 alkyl.
[0233] In one possible implementation, in equation (1), R''' is selected from C 1-6 Alkyl or C 1-4 alkyl.
[0234] In one possible implementation, in formula (1), each R is independently selected from substituted or unsubstituted groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 alkynyl group, C 1-10 Alkoxy groups, and C 3-10 carbonyl group, C 2-10 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0235] In one possible implementation, in formula (1), each R is independently selected from substituted or unsubstituted groups of the following: C 1-10 Alkyl, C 2-10 alkenyl, C 2-10 Alkyne group.
[0236] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-10 alkyl.
[0237] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-6 alkyl.
[0238] In one possible implementation, in equation (1), each R is independently selected from substituted or unsubstituted C. 1-4 alkyl.
[0239] In one possible implementation, R in equation (1) is tert-butyl.
[0240] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents independently selected from: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy, carboxyl, amide, cyano, nitro, ester, C 2-6 alkenyl, C 2-6 alkynyl group, C 3-8 carbonyl group, C 2-8 Heterocyclic group, C 6-10 Aryl or C 1-10 Mixed aromatic compounds.
[0241] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, amino, hydroxyl, mercapto, C1-C6 alkoxy.
[0242] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, C1-C6 alkoxy.
[0243] In one possible implementation, "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C4 alkyl, C1-C4 alkoxy.
[0244] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, antimony, tellurium, titanium, zirconium, hafnium, and zinc.
[0245] In one possible implementation, in formula (1), M is selected from one or more of tin, indium, and antimony.
[0246] In one possible implementation, M is tin in equation (1).
[0247] In one possible implementation, in equation (1), a is 1, 2, or 3. Preferably, a is 1.
[0248] In one possible implementation, in equation (1), b is 1, 2, or 3. Preferably, a is 1.
[0249] In one possible implementation, x in equation (1) is 1 to 6. For example, x is 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, x is 2.
[0250] In one possible implementation, y in equation (1) is 1 to 6. For example, y is 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, y is 3.
[0251] In one possible implementation, z in equation (1) is from 0 to 6. For example, z is 0, 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, and any value between any two of the above. Preferably, z is 0.
[0252] In one possible implementation, the compound is t-BuSn(HOMe)2(O i Pr)3、t-BuSn(HOEt)2(O i Pr)3、t-BuSn(HO n Pr)2(O i Pr)3、t-BuSn(HO n Bu)2(O iPr)3、t-BuSn(HOMe)2(O i Bu)3、t-BuSn(HOEt)2(O i Bu)3、t-BuSn(HO n Pr)2(O i Bu)3、t-BuSn(HO n Bu)2(O i Bu)3、t-BuSn(HOMe)2(O s Bu)3、t-BuSn(HOEt)2(O s Bu)3、t-BuSn(HO n Pr)2(O s Bu)3、t-BuSn(HO n Bu)2(O s Bu)3、t-BuSn(HOMe)2(O t Bu)3、t-BuSn(HOEt)2(O t Bu)3、t-BuSn(HO n Pr)2(O t Bu)3、t-BuSn(HO n Bu)2(O t Bu)3.
[0253] The compound of formula (1) of this application is an organometallic compound containing a specific mixture of ligands. When the compound is used in a patterning composition, the structure can significantly improve the hydrolytic stability of the compound during the patterning process and reduce the exposure dose.
[0254] [Patterning methods and the patterns formed] This application provides a patterning method, which includes patterning using a patterning composition or a compound from an embodiment of this application.
[0255] In one possible implementation, the patterning method further includes an exposure step of exposing the patterned layer formed by the patterning method to light, wherein the light source in the exposure step is one or more of the following: ultraviolet light, soft X-rays, and electron beam.
[0256] In one possible implementation, the exposure dose of the ultraviolet light and soft X-rays is 10-300 mJ / cm². 2 Or 50-250 mJ / cm 2 Or 100-200 mJ / cm 2 Or 140-160 mJ / cm 2For example, the exposure doses of ultraviolet light and soft X-rays are 10, 50, 100, 150, 200, 250, and 300 mJ / cm². 2 , and any value between the two mentioned above.
[0257] In one possible implementation, the exposure dose of the electron beam is less than 1000 μC / cm. 2 Or less than 400 μC / cm 2 Or 50-350 μC / cm 2 Or 100-350 μC / cm 2 Or 200-350 μC / cm 2 Or 250-350μC / cm 2 For example, the exposure dose of the electron beam is 50, 100, 150, 200, 250, 280, 300, 320, or 350 μC / cm. 2 , and any value between the two mentioned above.
[0258] In one possible implementation, the patterning method includes the following steps: (1) The patterned composition of this application is uniformly coated onto a silicon substrate by spin coating to form a patterned composition film layer on the silicon substrate; (2) The patterned composition film is baked.
[0259] (3) Expose the baked film layer with a light source; (4) The exposed film is developed to form a pattern on the substrate.
[0260] Since the patterning composition of this application contains organometallic compounds with specific mixed ligand coordination, this structure can significantly improve the hydrolytic stability of the patterning composition and reduce the exposure dose during the patterning process.
[0261] This application provides a pattern formed using the patterning method described in the embodiments of this application.
[0262] This application provides a patterned film formed using the patterning composition or compound described in the embodiments of this application, or formed by the patterning method described in the embodiments of this application.
[0263] [Electronic devices and their fabrication methods, electronic devices] This application provides an electronic device including a functional layer and / or a substrate, wherein the functional layer and / or the substrate, when present, contains a pattern formed using the patterning method described in the embodiments of this application; or the functional layer and / or the substrate, when present, has a pattern formed using the patterning method described in the embodiments of this application.
[0264] It is understandable that electronic devices including the patterns described above have improved performance due to the high resolution and low LWR of the patterns.
[0265] In addition, this application provides a method for fabricating the electronic device in the embodiments of this application, the method comprising patterning a functional layer and / or a substrate, if present, using a patterning method according to the embodiments of this application.
[0266] In some implementations, the functional layers include, but are not limited to: semiconductor layers (e.g., active layers, channel layers), insulating layers, dielectric layers, piezoelectric layers, photoelectric layers, resistive layers, capacitor layers, storage layers, light-emitting layers, etc.
[0267] In some implementations, the electronic device may also include electrical connection components, such as electrodes, conductive layers, or leads.
[0268] In some implementations, the electronic device may also include a substrate.
[0269] In some implementations, the electronic device is a semiconductor device.
[0270] This application provides an electronic device that includes electronic components as described in embodiments of this application, as well as at least one of a power supply unit, an interconnect structure, a structural packaging component, and an input / output component.
[0271] In some implementations, the electronic device is selected from: consumer electronic devices, home electronic appliances, automotive electronic devices, communication and network equipment, industrial control equipment, medical electronic devices, security and Internet of Things (IoT) equipment, office and financial equipment, agricultural electronic devices, educational and scientific research electronic devices, new energy and energy storage system equipment, robotics and automated execution equipment, rail transit and intelligent transportation system equipment, and environmental protection and environmental monitoring equipment.
[0272] In some implementations, consumer electronic devices are portable or desktop electronic devices that integrate functions such as information processing, wireless communication, or multimedia playback, primarily designed to meet personal entertainment, information access, and social needs. For example, such consumer electronic devices may include, but are not limited to, smart bracelets, smartphones, tablets, smartwatches, true wireless stereo (TWS) earphones, game consoles, portable music players, e-book readers, desktop computers, laptops, and all-in-one computers.
[0273] In some implementations, household electronic appliances are home electronic devices used in home life scenarios that integrate core electronic components such as microprocessors, sensors, or communication modules, and possess data processing, automatic control, or network interaction capabilities. For example, such household electronic appliances may include, but are not limited to, smart air conditioners, smart refrigerators, smart washing machines, smart TVs, smart speakers, home theater systems, smart microwave ovens, smart rice cookers, dishwashers, air purifiers, smart door locks, LED smart ceiling lights, built-in ovens, high-speed blenders, and smart toilet seats.
[0274] In some implementations, in-vehicle electronic devices are electronic systems installed in various types of motor vehicles for vehicle power control, driving safety, or infotainment interaction. For example, these in-vehicle electronic devices may include, but are not limited to, engine control units (ECUs), battery management systems (BMS), advanced driver assistance systems (ADAS) millimeter-wave radar, in-vehicle infotainment systems, fully digital instrument clusters, in-vehicle Wi-Fi routers, power seat control modules, automatic parking system controllers, tire pressure monitoring systems (TPMS), and in-vehicle air conditioning controllers.
[0275] In some implementations, communication and network equipment refers to electronic devices used to achieve signal transmission, network networking, and data exchange. For example, such communication and network equipment may include, but is not limited to, 5G macro base stations, distributed base stations (RRUs), core network routers, Ethernet switches, optical modules, home gateways, satellite communication terminals, radio frequency power amplifiers, modems, and IoT gateways.
[0276] In some implementations, industrial control equipment is an electronic system applied in industrial production scenarios to achieve automated control of the production process, equipment status monitoring, or data acquisition. For example, such industrial control equipment may include, but is not limited to, programmable logic controllers (PLCs), servo motor drivers, industrial robot controllers, distributed control systems (DCS) modules, intelligent sensor gateways, industrial data acquisition cards, CNC machine tool control systems, frequency converters, industrial touchscreen human-machine interfaces (HMIs), and intelligent valve positioners.
[0277] In some implementations, medical electronic devices are electronic devices used for disease diagnosis, treatment, or monitoring and health management. Examples of such medical electronic devices include, but are not limited to, electrocardiogram (ECG) monitors, color Doppler ultrasound diagnostic instruments, fully automated biochemical analyzers, insulin pumps, implantable pacemakers, wearable dynamic ECG recorders, portable blood glucose meters, medical laser therapy machines, surgical navigation systems, rehabilitation training robots, patch-type ECG monitors, non-invasive blood glucose monitoring wristbands, electroencephalogram (EEG) monitoring headbands, smart sports chest straps, sleep monitors, wearable temperature patches, and smart prosthetic control modules.
[0278] In some implementations, security and IoT devices are electronic devices used for security, environmental monitoring, or interconnection with the Internet of Things. For example, such security and IoT devices may include, but are not limited to, smart network cameras, facial recognition access control systems, smoke detectors, gas leak detectors, smart door locks, IoT temperature and humidity sensors, LoRa wireless communication terminals, edge computing gateways, electronic fence controllers, and video surveillance NVR recorders.
[0279] In some implementations, office and financial equipment refers to electronic devices used in office and financial service scenarios to perform document processing, data management, or transaction services. Examples of such office and financial equipment include, but are not limited to, laser printers, multifunction printers, scanners, POS cash registers, ATMs, smart attendance machines, paper shredders, office projectors, conference tablets, encrypted USB drives, and electronic signature terminals.
[0280] In some implementations, agricultural electronic devices are electronic devices used in agricultural production and management scenarios to achieve environmental monitoring, precision planting, or breeding. For example, such agricultural electronic devices may include, but are not limited to, soil temperature and humidity sensors, light intensity monitors, intelligent irrigation controllers, livestock and poultry breeding environment monitoring systems, agricultural plant protection drone flight control systems, agricultural product traceability RFID readers, intelligent greenhouse environmental control hosts, and aquaculture water quality monitors.
[0281] In some implementations, educational and research electronic devices are electronic devices used in educational and scientific research scenarios to perform experimental measurements, simulation demonstrations, or data acquisition. For example, such educational and research electronic devices may include, but are not limited to, digital oscilloscopes, function generators, spectrum analyzers, electronic teaching experimental platforms, intelligent electronic whiteboards, VR teaching all-in-one machines, research-grade electron microscopes, mass spectrometer data acquisition systems, and astronomical telescope imaging controllers.
[0282] In some implementations, new energy and energy storage system equipment refers to electronic devices applied in new energy power generation and energy storage scenarios to achieve energy conversion, transmission, or management. For example, such new energy and energy storage system equipment may include, but is not limited to, solar photovoltaic inverters, wind power converters, power storage converters (PCS), electric vehicle DC charging piles, battery management systems (BMS), microgrid energy dispatch controllers, supercapacitor energy storage management systems, and fuel cell DC / DC converters.
[0283] In some implementations, robots and automated execution devices are automated devices with autonomous movement, environmental perception, or task execution capabilities. For example, such robots and automated execution devices may include, but are not limited to, industrial six-axis robots, service robots, sweeping robots, collaborative robots, AGVs (Automated Guided Vehicles), sorting robots, welding robots, inspection robots, humanoid robots, and drone flight controllers.
[0284] In some implementations, rail transit and intelligent transportation system equipment refers to electronic devices applied in rail transit and urban transportation scenarios to achieve train control, traffic management, or vehicle-road cooperation. For example, such rail transit and intelligent transportation system equipment may include, but is not limited to, high-speed rail traction converters, train operation control systems (CTCS), subway signaling systems, intelligent traffic lights, electronic police capture systems, ETC gantry controllers, V2X vehicle-road cooperative terminals, rail transit platform screen door controllers, and intelligent bus dispatching terminals.
[0285] In some implementations, environmental protection and monitoring equipment refers to electronic devices used in environmental quality monitoring and pollution control scenarios to collect, analyze, or issue early warnings of environmental parameters. For example, such environmental protection and monitoring equipment may include, but is not limited to, air quality monitoring stations, online water quality analyzers, noise monitors, volatile organic compound (VOC) detectors, dust monitoring systems, nuclear radiation detectors, ecological environment data acquisition terminals, and online pollution source monitoring equipment.
[0286] [Uses of Patterned Compositions] This application provides for the use of the compositions or compounds according to embodiments of this application in the manufacture of electronic devices.
[0287] To make the embodiments of this disclosure easier to understand, the present application will be described in detail below with reference to the embodiments. These embodiments are for illustrative purposes only and are not limited to the application scope of the present application.
[0288] Unless otherwise specified, the specific operations and processing methods or conditions not described in the following embodiments are conventional methods in the art or are performed in accordance with the techniques or conditions described in the literature in the art or in accordance with the product manual.
[0289] Unless otherwise specified, all reagents or instruments used in the following examples that do not specify the manufacturer are commercially available products and conventional instruments in the field.
[0290] Example 1 Synthesis and characterization of Sn1: 1 mmol of tert-butyltris(diethylamino)tin (t-BuSn(NEt2)3) was added to 10 mL of methanol and stirred thoroughly at room temperature for 1 hour. Excess methanol and diethylamine were removed by vacuum to obtain a methanol-coordinated intermediate. This intermediate was added to 10 mL of isopropanol and stirred at room temperature for 1 hour. Excess isopropanol and methanol ligands were removed by rotary evaporation. Another 10 mL of isopropanol was added, and the mixture was stirred at room temperature for 1 hour. Excess isopropanol and methanol ligands were removed by rotary evaporation. The resulting product, t-BuSn(HOMe)2(O), was obtained with mixed coordination of isopropanol and methanol. i Pr)3 structure (Sn1). High-purity product was obtained by vacuum redistillation.
[0291] The chemical shifts in the 1H NMR spectrum are as follows: δ 4.43–4.46 ppm (3H, O-CH- / OiPr); δ 3.81–3.84 ppm (6H, O-CH3 / MeOH); δ 1.18–1.53 ppm (18H, -CH3 / OiPr; 9H, -CH3 / tBu) (The methyl and tert-butyl peaks in isopropanol are close together and are calculated together). Based on the peak positions and integral ratios, the ligand ratio on this compound can be calculated to be t-Bu:O i Pr:MeOH=1:3:2.
[0292] The chemical shifts in the Sn NMR spectrum are: Sn NMR (400MHz, CDCl3) δ -485.49 - 484.25 ppm.
[0293] Example 2 Synthesis and characterization of Sn2: 1 mmol of t-BuSn(NEt2)3 was added to 10 mL of n-propanol and stirred thoroughly at room temperature for 1 hour. Excess n-propanol and diethylamine were removed by vacuum to obtain the n-propanol-coated intermediate. This intermediate was added to 10 mL of isopropanol and stirred at room temperature for 1 hour. Excess isopropanol and n-propanol ligands were removed by rotary evaporation. Another 10 mL of isopropanol was added, and the mixture was stirred at room temperature for 1 hour. Excess isopropanol and n-propanol ligands were removed by rotary evaporation. The product t-BuSn(HO)3, a mixture of isopropanol and n-propanol, was obtained. n Pr)2(O i Pr)3 structure (Sn2).
[0294] The chemical shift in the C10 NMR spectrum is: C10 NMR (CDCl3) δ 10.01 ppm (2C, -CH3 / O) n Pr); δ26.72-28.06ppm (6C,-CH3 / O iPr); δ 29.53-29.78 ppm (3C, -CH3 / t-Bu); Based on the peak position and integral ratio, the ligand ratio on this compound can be calculated to be t-Bu:O. i Pr:O n Pr=1:3:2.
[0295] The chemical shift in the Sn NMR spectrum is: Sn NMR (CDCl3) δ -473.19 - 471.85 ppm.
[0296] Comparative Example 1 Synthesis and characterization of Sn-R1: 1 mmol of t-BuSn(NEt2)3 was added to 10 ml of isopropanol and stirred thoroughly at room temperature for 1 hour. Excess isopropanol was removed by vacuum to obtain the isopropanol coordination product t-BuSn(O i Pr)3 structure (Sn-R1).
[0297] The chemical shifts in the 1H NMR spectrum are: δ 4.36-4.48 ppm (3H, O-CH- / O) NMR (400 MHz, CDCl3). i Pr); δ1.32-1.42ppm (18H, -CH3 / O i Pr); δ0.86-1.24ppm (9H, -CH3 / t Bu); Based on the peak position and integral ratio, the ligand ratio on this compound can be calculated as follows: t Bu:O i Pr=1:3.
[0298] The chemical shift in the C10 NMR spectrum is: C10 NMR (CDCl3) δ 27.55 ppm (6C, -CH3 / O) i Pr); δ28.79-29.06ppm (3C,-CH3 / t Bu); δ66.98 ppm (2C, O-CH- / O i Pr); Based on the peak position and integral ratio, the ligand ratio on this compound can be calculated as follows: t Bu:O i Pr=1:3.
[0299] The chemical shift in the Sn spectrum is: Sn NMR (CDCl3) δ -237.38 ppm.
[0300] Comparative Example 2 Synthesis and characterization of Sn-R2: 1 mmol of t-BuSn(NEt2)3 was added to 10 mL of n-propanol and stirred thoroughly at room temperature for 1 hour. Excess n-propanol was removed by vacuum to obtain the n-propanol coordination product t-BuSn(O n Pr)4 structure (Sn-R2).
[0301] The chemical shift in the C10 NMR spectrum is: C10 NMR (CDCl3) δ 10.01 ppm (4C, -CH3 / O) n Pr); δ 29.53-29.78ppm (3C, -CH3 / t-Bu); Based on the peak position and integral ratio, the ligand ratio on this compound can be calculated to be t-Bu:O. n Pr=1:4.
[0302] The chemical shift in the Sn spectrum is: Sn NMR (CDCl3) δ -472.52 ppm.
[0303] Hydrolysis stability test Test method: The samples from the above embodiments and comparative examples were drop-coated onto the substrate surface to simulate the process of spin-coating and contact with air moisture. The changes in their infrared transmission spectrum were measured using ATR total internal reflection infrared spectroscopy, once per minute, for a total of 60 minutes.
[0304] Test results: The infrared spectral results of the Sn1 structure are as follows: Figure 1 As shown in the figure. The test results of the infrared full spectrum of the Sn1 structure changing with time are as follows. Figure 2 As shown, the colors change from light to dark over time, with the lightest being the 0-minute chart and the darkest being the 60-minute chart. Figure 2 The 0-minute and 60-minute spectra almost overlap, indicating that no significant structural changes occurred. The 900-1200 cm⁻¹ region... -1 The characteristic peak is the peak value of the CH vibration of the ligand. Therefore, its change over time can indicate the ligand dissociation caused by hydrolysis and reflect the structural stability. The characteristic peak value of the CH vibration at 999 / 1150 cm⁻¹ was selected from the ATR spectrum of Sn1. -1 Plotting changes over time, such as Figure 2 As shown, the peak value did not decrease significantly within 60 minutes, indicating that the ligands did not dissociate and the structure remained stable.
[0305] The infrared spectral test results of the Sn2 structure are as follows: Figure 3 As shown in the figure. The test results of the infrared full spectrum of the Sn2 structure changing with time are as follows. Figure 4 As shown, the colors change from light to dark over time, with the lightest being the 0-minute chart and the darkest being the 40-minute chart. Figure 4The 0-minute and 40-minute spectra almost overlap, indicating that no significant structural changes occurred. The 900-1200 cm⁻¹ region... -1 The characteristic peak is the peak value of the CH vibration of the ligand. Therefore, its change over time can indicate the ligand dissociation caused by hydrolysis and reflect the structural stability. The characteristic peak value of the CH vibration at 1002 / 1150 cm⁻¹ was selected from the ATR spectrum of Sn₂. -1 Plotting changes over time, such as Figure 4 As shown, the peak value did not decrease significantly within 40 minutes, indicating that the ligands did not dissociate and the structure remained stable.
[0306] The infrared spectral results of the Sn-R1 structure are as follows: Figure 5 As shown in the figure. The test results of the infrared full spectrum of the Sn-R1 structure changing with time are as follows. Figure 6 As shown, the colors change from light to dark over time, with the lightest being the 0-minute chart and the darkest being the 60-minute chart. Figure 6 Significant changes were observed in the spectrum from 0 to 60 minutes during the test, indicating a significant alteration in the Sn-R1 structure. Specifically, the 900-1200 cm⁻¹ range... -1 The characteristic peaks are the peak values of the CH vibration of the ligands. Therefore, their changes over time can indicate the ligand dissociation caused by hydrolysis and reflect the structural stability. The characteristic peak values of the CH vibration in the Sn-R1 ATR spectrum are selected as 956 / 1032 / 1085 / 1132 cm⁻¹. -1 Plotting changes over time, such as Figure 6 As shown, the peak value decreased significantly within 60 minutes, indicating that the ligands dissociated and the structure was destroyed.
[0307] The infrared spectral test results of the Sn-R2 structure are as follows: Figure 7 As shown in the figure. The test results of the infrared full spectrum of the Sn-R2 structure changing with time are as follows. Figure 8 As shown, the colors change from light to dark over time, with the lightest being the 0-minute chart and the darkest being the 60-minute chart. Figure 8 Significant changes occurred in the spectrum during the 0-60 minute test, indicating a significant alteration in the Sn-R2 structure. Specifically, the spectrum from 900-1200 cm⁻¹ showed a marked change. -1 The characteristic peak is the peak value of the CH vibration of the ligand. Therefore, its change over time can indicate the ligand dissociation caused by hydrolysis and reflect the structural stability. The characteristic peak value of the CH vibration at 964 / 1107 cm⁻¹ was selected from the ATR spectrum of Sn-R₂. -1 Plotting changes over time, such as Figure 8 As shown, the peak value decreased significantly within 60 minutes, indicating that the ligands dissociated and the structure was destroyed.
[0308] Comparing the infrared spectra of Sn1 / Sn2 and Sn-R1 / R2 after hydrolysis in air, it can be seen that Sn1 / Sn2 has higher stability and basically no ligand dissociation due to hydrolysis, while Sn-R1 / R2 has poor stability and obvious ligand dissociation due to hydrolysis over time.
[0309] Exposure performance test Sn1 Exposure Process and Results: 20 mg of Sn1 sample was dissolved in 1 ml of 4-methyl-2-pentanol and shaken until completely dissolved. The solution was filtered to form Solution 1. An appropriate amount of Solution 1 was spin-coated onto a silicon substrate to form a uniform coating with a thickness of 20 nm. The coating was baked at 100°C for 1 minute before exposure. The baked coating was then exposed under electron beam etching. The exposed pattern was immersed in 2-heptanone solvent for one minute to remove the unexposed film layer, thus forming the pattern. The pattern was examined using a scanning electron microscope (SEM). Figure 9 As shown. The detection results are as follows: When the exposure pattern is a line with a CD of 17 nm, a pitch of 34 nm, and a duty cycle of 1:1, the exposure dose is 280 μC / cm. 2 .
[0310] Sn2 Exposure Process and Results: 20 mg of Sn2 sample was dissolved in 1 ml of 4-methyl-2-pentanol and shaken until completely dissolved. The solution was filtered to form Solution II. An appropriate amount of Solution II was spin-coated onto a silicon substrate to form a uniform coating with a thickness of 20 nm. The substrate was baked at 100°C for 1 minute before exposure. The baked coating was then exposed under electron beam etching. The exposed pattern was immersed in 2-heptanone solvent for one minute to remove the unexposed film layer, thus forming the pattern. The pattern was then inspected using SEM. Figure 10 As shown. The detection results are as follows: When the exposure pattern is a line with a CD 17nm diameter, a spacing of 34nm, and a duty cycle of 1:1, the exposure dose is 320 μC / cm. 2 .
[0311] Sn-R1 Exposure Process and Results: 20 mg of Sn-R1 sample was dissolved in 1 ml of 4-methyl-2-pentanol and shaken until completely dissolved. The solution was filtered to form solution three. An appropriate amount of solution three was spin-coated onto a silicon substrate to form a uniform coating with a thickness of 20 nm. The substrate was baked at 100℃ for 1 minute before exposure. The baked coating was then exposed under electron beam etching. The exposed pattern was immersed in 2-heptanone solvent for one minute to remove the unexposed film layer, thus forming the pattern. The pattern was then inspected using SEM. Figure 11 As shown. The detection results are as follows: When the exposure pattern is a line with a CD 17nm diameter, a spacing of 34nm, and a duty cycle of 1:1, the exposure dose is 400 μC / cm. 2 .
[0312] Sn-R2 Exposure Process and Results: 20 mg of Sn-R2 sample was dissolved in 1 ml of 4-methyl-2-pentanol and shaken until completely dissolved. The solution was filtered to form solution three. An appropriate amount of solution three was spin-coated onto a silicon substrate to form a uniform coating with a thickness of 20 nm. The substrate was baked at 100℃ for 1 minute before exposure. The baked coating was then exposed under electron beam etching. The exposed pattern was immersed in 2-heptanone solvent for one minute to remove the unexposed film layer, thus forming the pattern. The pattern was inspected using SEM. Figure 12 As shown. The detection results are as follows: When the exposure pattern is a line with a CD 17nm diameter, a spacing of 34nm, and a duty cycle of 1:1, the exposure dose is 350 μC / cm. 2 .
[0313] Comparing the exposure effects of Sn1 / Sn2 and Sn-R1 / Sn-R2, it can be seen that the exposure dose of Sn1 / Sn2 is significantly lower than that of Sn-R1 / Sn-R2, meaning that mixed ligand coordination can reduce the exposure dose. Furthermore, the comparative example Sn-R2 shows bridging defects between lines, while Sn1 / Sn2 shows virtually none, indicating that fully linear ligands introduce defects, while mixed ligands can improve bridging defects.
[0314] As can be seen from the above embodiments and comparative examples, since the patterning composition of this application contains a metal-organic compound with specific mixed ligand coordination, this structure can significantly improve the hydrolytic stability of the patterning composition and reduce the exposure dose during the patterning process.
Claims
1. A compound, characterized in that, The compound is represented by the following formula (1): (R a M) b (L1) x (L2) y (L3) z Formula (1), in: a=1, 1 b 3, 1 x 6, 1 y 3, 0 z 1, Each R is independently selected from the following groups, either substituted or unsubstituted: C 1-30 Alkyl, C 2-30 alkenyl, C 2-30 alkynyl group, C 1-30 Alkoxy, C 3-30 carbon cyclo group, C 2-30 Heterocyclic group, C 6-30 Aryl or C 1-30 Mixed aromatics; M is selected from tin; Each L1 is independently selected from the following ligands: -HOR', -HSR', -HNR'2, -OR', -SR', or -NR'2. R' is selected from: Unsubstituted straight-chain groups of the following: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl or C 1-20 alkoxy, or C 3-20 carbon cyclo group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -HNR''2, -OR'', -SR'', or -NR''2. R'' is selected from: The following groups in the substituted or unsubstituted branched chains: C 3-20 Alkyl, C 3-20 alkenyl, C 3-20 alkynyl or C 3-20 alkoxy, or C 3-20 carbon cyclo group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatics; Each L3 is independently selected from the following ligands: -HOR''', -HSR''', -HNR'''2, -OR''', -SR''', or -NR'''2, and R''' is selected from the following groups, whether substituted or unsubstituted: C 1-20 Alkyl, C 2-20 alkenyl, C 2-20 alkynyl group, C 1-20 Alkoxy, C 3-20 carbon cyclo group, C 2-20 Heterocyclic group, C 6-20 Aryl or C 1-20 Mixed aromatic compounds.
2. The compound according to claim 1, characterized in that, Each L1 is independently selected from the following ligands: -HOR', -HSR', -OR', or -SR'.
3. The compound according to claim 1, characterized in that, L1 is -HOR'.
4. The compound according to claim 1, characterized in that, R' is an unsubstituted linear C 1-6 alkyl.
5. The compound according to claim 1, characterized in that, R' is methyl or n-propyl.
6. The compound according to claim 1, characterized in that, Each L2 is independently selected from the following ligands: -HOR'', -HSR'', -OR'', or -SR''.
7. The compound according to any one of claims 1 to 5, characterized in that, Each L2 is -OR''.
8. The compound according to any one of claims 1 to 5, characterized in that, R'' is the C of the substituted or unsubstituted branch. 3-6 alkyl.
9. The compound according to any one of claims 1 to 5, characterized in that, R'' is isopropyl, sec-butyl, isobutyl, or tert-butyl.
10. The compound according to any one of claims 1 to 5, characterized in that, Each L3 is independently selected from the following ligands: -HOR''' or -OR'''.
11. The compound according to any one of claims 1 to 5, characterized in that, The R''' is selected from C 1-6 alkyl.
12. The compound according to any one of claims 1 to 5, characterized in that, Each R is independently selected from substituted or unsubstituted C. 1-6 alkyl.
13. The compound according to any one of claims 1 to 5, characterized in that, R stands for tert-butyl.
14. The compound according to any one of claims 1 to 5, characterized in that, The term "substituted or unsubstituted" means unsubstituted or substituted by one or more substituents selected independently from the following: halogen, C1-C6 alkyl, C1-C6 alkoxy.
15. The compound according to any one of claims 1 to 5, characterized in that, b is 1; And / or, x is 2; And / or, y is 3; And / or, z is 0.
16. The compound according to any one of claims 1 to 5, characterized in that, b is 1; And / or, x is 1; And / or, y is 2; And / or, z is 1.
17. The compound according to any one of claims 1 to 5, characterized in that, b is 1; And / or, x is 2; And / or, y is 2; And / or, z is 0.
18. The compound according to any one of claims 1 to 5, characterized in that, b is 3; And / or, x is 6; And / or, y is 3; And / or, z is 0.
19. The compound according to any one of claims 1 to 5, characterized in that, suǒshùhuàhéwùwèit-BuSn(HOMe)2(O i Pr)3、t-BuSn(HOEt)2(O i Pr)3、t-BuSn(HO n Pr)2(O i Pr)3、t-BuSn(HO n This is)2(O i Pr)3、t-BuSn(HOMe)2(O i Bu)3、t-BuSn(HOEt)2(O i Bu)3、t-BuSn(HO n Pr)2(O i Bu)3、t-BuSn(HO n This is)2(O i Bu)3、t-BuSn(HOMe)2(O s Bu)3、t-BuSn(HOEt)2(O s Bu)3、t-BuSn(HO n Pr)2(O s Bu)3、t-BuSn(HO n This is)2(O s Bu)3、t-BuSn(HOMe)2(O t Bu)3、t-BuSn(HOEt)2(O t Bu)3、t-BuSn(HO n Pr)2(O t Bu)3、t-BuSn(HO n This is)2(O t This is 3.
20. A patterned composition, characterized in that, The patterning composition comprises the compound according to any one of claims 1-19.
21. The patterned composition according to claim 20, characterized in that, The patterned composition also contains a solvent.
22. The patterned composition according to claim 20, characterized in that, The patterning composition contains only one solvent.
23. The patterned composition according to claim 20, characterized in that, Based on the total weight of the patterned composition, the patterned composition contains 0.1-10 wt% of the compound represented by formula (1).
24. The patterned composition according to claim 20, characterized in that, Based on the total weight of the patterned composition, the patterned composition contains 0.5-5 wt% of the compound represented by formula (1).
25. The patterned composition according to claim 20, characterized in that, Based on the total weight of the patterned composition, the patterned composition contains 90-99.9 wt% solvent.
26. The patterned composition according to claim 20, characterized in that... Based on the total weight of the patterned composition, the patterned composition contains 95-99.5 wt% solvent.
27. A patterning method, characterized in that, The patterning method includes patterning a coating formed using a compound according to any one of claims 1-19 or using a patterning composition according to any one of claims 20-26.
28. The patterning method according to claim 27, characterized in that, The patterning method further includes an exposure step of exposing the coating to light, wherein the exposure dose is less than 400 μC / cm. 2 .
29. The patterning method according to claim 27, characterized in that, The patterning method further includes an exposure step of exposing the coating to light, wherein the exposure dose is 100-350 μC / cm. 2 .
30. The patterning method according to claim 27, characterized in that, The patterning method further includes an exposure step of exposing the coating to light at an exposure dose of 250-350 μC / cm. 2 .
31. A patterned film, characterized in that, The patterned film is formed using a compound according to any one of claims 1-19 or a patterned composition according to any one of claims 20-26, or by a patterning method according to any one of claims 27-30.
32. An electronic device, characterized in that, The electronic device includes a functional layer and a substrate; the functional layer and / or the substrate contains a pattern formed using the patterning method according to any one of claims 27-30; or the functional layer and / or the substrate has a pattern formed using the patterning method according to any one of claims 27-30.
33. An electronic device, characterized in that, The electronic device includes a functional layer; the functional layer contains a pattern formed using the patterning method according to any one of claims 27-30; or the functional layer has a pattern formed using the patterning method according to any one of claims 27-30.
34. The electronic device according to claim 32 or 33, characterized in that, The electronic device is a semiconductor device.
35. An electronic device, characterized in that, The electronic device includes: The electronic device according to any one of claims 32-34; and At least one of a power supply unit, an interconnection structure, a structural packaging component, and an input / output component.
36. The electronic device according to claim 35, characterized in that, The electronic devices are selected from: consumer electronic devices, home electronic appliances, vehicle electronic devices, communication and network equipment, industrial control equipment, medical electronic devices, security and Internet of Things equipment, office and financial equipment, agricultural electronic devices, educational and scientific research electronic devices, new energy and energy storage system equipment, robotics and automated execution equipment, rail transit and intelligent transportation system equipment, and environmental protection and environmental monitoring equipment.
