High-pass cluster mass selector based on double-layer electrode and selection method
A high-pass cluster quality selector that uses a dual-layer electrode structure and a pulsed electric field to set the quality threshold solves the limitations of the four-layer electrode structure in terms of processing accuracy and transmission mode, achieving efficient and high-pass quality screening, and is suitable for compact and highly integrated cluster beam systems.
Patent Information
- Application Number
- CN202610536935.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-22
- Publication Date
- 2026-05-19
- Estimated Expiration
- 2046-04-22
AI Technical Summary
The existing four-layer electrode structure has limitations in machining accuracy, electronic control synchronization and transmission mode, making it difficult to achieve high-pass quality screening. In addition, the system is large in size and expensive, which limits its portable or miniaturized applications.
A high-pass cluster mass selector based on a double-layer electrode is adopted. By setting a mass threshold through a double-layer electrode structure and a pulsed electric field, ions with a mass higher than the set mass can pass through efficiently, which simplifies electrode processing and assembly and improves the uniformity and stability of the electric field.
It achieves high-throughput quality screening, reduces processing and assembly complexity, improves electric field uniformity and stability, adapts to the initial energy distribution of ions, supports large-mass ion aggregation and wide-range mass measurement, and is suitable for compact, highly integrated time-of-flight systems.
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Figure CN122067959A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the fields of atomic and molecular physics and nanotechnology, and to a device that can be widely used for high-pass quality selection of cluster beams, and in particular to a high-pass cluster quality selector and selection method based on a double-layer electrode. Background Technology
[0002] The selection of cluster beam size and the real-time measurement of cluster size distribution are crucial in basic cluster research and in the process of preparing cluster-assembled nanostructure materials and devices by cluster beam deposition. They are an indispensable component of various cluster beam systems.
[0003] In existing technologies, four-electrode time-of-flight mass selectors are a common component for ion mass screening. This component typically consists of four parallel electrode plates, with alternating high and low voltages applied to each electrode. By controlling the timing and width of the pulsed electric field, ions meeting preset mass and energy conditions are accelerated through the acceleration zone and enter the drift zone within a specific time window, while other ions are filtered out. Currently, this type of four-electrode structure has been applied in some scientific research and testing instruments, such as spray time-of-flight mass spectrometers and ion beam physics experimental devices.
[0004] However, the existing four-layer electrode structure still has several engineering and functional limitations. Its four-layer electrode layout requires high precision in machining and assembly; deviations in the parallelism and spacing between electrodes can easily cause electric field distortion, thus affecting the stability of the ion transmission window. Furthermore, the mass selection achieved by this structure is essentially "bandpass" transmission, allowing only ions within a narrow mass range to pass through, making it difficult to directly adapt to "high-pass" screening scenarios that require suppressing low-mass background and transmitting high-mass ions. Finally, the large number of electrodes and high-voltage pulse channels also lead to a larger system size and higher cost, limiting its application in portable or miniaturized systems. Summary of the Invention
[0005] To address the limitations of existing four-layer electrode structures in terms of process complexity, electrical control synchronization, and transmission modes, this invention aims to propose a high-pass cluster mass selector based on a dual-layer electrode structure. Employing a two-layer electrode structure, a mass threshold is set via a pulsed electric field to achieve "high-pass" mass screening, allowing ions with masses exceeding the set threshold to pass through efficiently. The dual-layer structure significantly simplifies electrode fabrication and assembly, and improves the uniformity and stability of the electric field.
[0006] To achieve the above objectives, the present invention provides a high-pass cluster quality selector based on a dual-layer electrode, comprising a first electrode plate, a second electrode plate, and a high-voltage pulse power supply;
[0007] The first and second electrodes are placed parallel to each other with a distance of d between them. The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is located at the distance d / 2 between the first and second electrodes.
[0008] The first and second plates are respectively connected to a high-voltage pulse power supply. The high-voltage pulse power supply is used to apply a high-voltage square wave pulse to the first and second plates. The high-voltage square wave pulses have the same period, but there is a pulse width in time.
[0009] A high-pass cluster quality selector based on a double-layer electrode is placed in a vacuum environment.
[0010] Furthermore, the high-voltage pulse power supply applies a high-voltage square wave pulse to the first electrode plate. The amplitude of the high-voltage pulse, and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate. The amplitude can be adjusted independently or synchronously.
[0011] Furthermore, both the first and second plates are made of stainless steel or aluminum and are electrically insulated from each other.
[0012] Furthermore, the first and second plates are rectangular flat plates, with a plate width greater than 1.5 times the plate spacing d between the first and second plates, and a plate length L satisfying... ,in, Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
[0013] Furthermore, the choice of the number of pulse width times n satisfies Where L is the length of the electrode plate, U is the magnitude of the high-voltage square wave pulse, and E is the initial kinetic energy of the particle. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone, and d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates.
[0014] Furthermore, the pulse width between the first and second electrodes Satisfy the formula Where e is the elementary charge 1.602 × 10⁻⁶ -19 m is the desired particle mass. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
[0015] Furthermore, the high-voltage pulse amplitude applied to the first and second plates is equal, with the high-voltage pulse amplitude ranging from ±5V to 3kV.
[0016] The present invention also provides a selection method for a high-pass cluster quality selector based on a double-layer electrode, comprising the following steps:
[0017] Step 1: Place the first and second plates parallel to each other with a plate spacing of d;
[0018] Step 2: Place the high-pass cluster quality selector based on double-layer electrodes in a vacuum environment;
[0019] Step 3: The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is set at the distance d / 2 between the first and second electrodes. The cluster beam to be analyzed enters the high-pass cluster quality selector based on the double-layer electrode parallel to the beam inlet.
[0020] Step 4: Start the high-voltage pulse power supply, select the pulse period, and output high-voltage square wave pulses to the first and second plates. The cluster beam flies along the transverse flight path.
[0021] Step 5: Adjust the pulse voltage timing of the high-pass cluster quality selector based on the double-layer electrode according to the cluster quality to be selected.
[0022] Furthermore, in step 1, the first and second plates are rectangular flat plates, the width of the plates is greater than 1.5 times the distance d between the first and second plates, and the plate length L satisfies... The choice of the number of pulse width times n satisfies , Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
[0023] Furthermore, in step 4, the high voltage pulse amplitude applied to the first and second plates is equal, and the high voltage pulse amplitude is ±5V~3kV.
[0024] Beneficial Effects: This invention provides a high-pass cluster mass selector and selection method based on a dual-layer electrode. Addressing the limitations of existing four-layer electrode structures in terms of processing accuracy, timing synchronization, transmission mode, and integration, this invention employs a dual-layer electrode structure. By setting a mass threshold through a pulsed electric field, it achieves "high-pass" mass screening, allowing ions with masses exceeding the set threshold to pass through efficiently. The dual-layer design significantly reduces processing and assembly complexity and improves electric field uniformity and edge field controllability. Furthermore, the dual-layer design exhibits good adaptability to initial ion energy distributions, maintaining stable screening performance under actual experimental conditions. This simplified dual-layer design not only supports applications such as high-mass ion aggregation and wide-range mass measurement but also provides a feasible technical path for realizing compact, highly integrated time-of-flight systems. Attached Figure Description
[0025] Figure 1 This is a schematic diagram of the structure and pulse voltage timing of the high-pass cluster quality selector based on a double-layer electrode according to the present invention;
[0026] Figure 2 This is a front view of the high-pass cluster quality selector based on a double-layer electrode according to the present invention;
[0027] Figure 3 This is a side view of the high-pass cluster quality selector based on a double-layer electrode according to the present invention;
[0028] Figure 4 This is a three-dimensional diagram of the high-pass cluster quality selector based on a double-layer electrode according to the present invention;
[0029] Figure 5 This is the embodiment 3 of the present invention. The timing diagram of a square wave pulse when the smallest size can pass through a particle;
[0030] Figure 6 This is an ion flight trajectory diagram related to Embodiment 3 of the present invention;
[0031] Figure 7 This is a schematic diagram of the particle transport rate simulation results involved in Embodiment 3 of the present invention;
[0032] Figure 8 It is the same initial energy involved in Embodiment 4 of the present invention. Ion flight trajectory diagram;
[0033] Figure 9 This refers to the different initial energies involved in Embodiment 4 of the present invention. Ion flight trajectory diagram;
[0034] Explanation of reference numerals in the attached figures:
[0035] 1 represents the first electrode; 2 represents the second electrode; 3 represents the high-voltage square wave pulse. ;4 represents a high-voltage square wave pulse ; 5 represents the cluster ion-filled region of the second electrode plate. 6 represents the pulse width. ; 7 is the first electrode plate filling area ; 8 represents a passable cluster ion; 9 represents an unselected cluster ion. Detailed Implementation
[0036] like Figures 1-9 As shown, the present invention provides a high-pass cluster quality selector and selection method based on a double-layer electrode.
[0037] It should be noted that the terms "first," "second," etc., in the embodiments are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to these processes, methods, products, or devices. The invention will now be described in further detail with reference to the accompanying drawings and computer simulations:
[0038] Example 1: This invention proposes a high-pass cluster quality selector based on a double-layer electrode, comprising a first electrode plate, a second electrode plate, and a high-voltage pulse power supply;
[0039] The first and second electrodes are placed parallel vertically with a spacing of d. The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is located at the electrode spacing d / 2 of the first and second electrodes. Both the first and second electrodes are made of stainless steel or aluminum and are electrically insulated from each other. A high-voltage square wave pulse is applied to the first electrode by a high-voltage pulse power supply. The amplitude of the high-voltage pulse, and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate. The amplitude of each pulse can be adjusted independently or synchronously. In this embodiment, the high-voltage square wave pulse applied by the high-voltage pulse power supply to the first electrode plate... The amplitude and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate The amplitudes are equal, with a magnitude of 1000V. The first and second plates are respectively connected to a high-voltage pulse power supply. The high-voltage pulse power supply is used to apply high-voltage square wave pulses to the first and second plates. The high-voltage square wave pulses have the same period, but there is a pulse width in time.
[0040] The first and second plates are rectangular flat plates. The width of the plates is greater than 1.5 times the distance d between the first and second plates. The plate length L should satisfy... The choice of the number of pulse width times n satisfies L is the length of the electrode plate. Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. Let d be the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse. In this embodiment of the invention, the first and second plates are rectangular flat plates with a length of 300 mm, a width of 100 mm, and a thickness of 2 mm. The distance between the two plates is 18 mm. Figures 2-4 As shown.
[0041] Second electrode plate cluster ion filling region Should meet ,in, This represents the total time the particle spends moving within the high-pass mass separator. Where is the pulse width time, n is the number of pulse width times, L is the electrode length, m is the required particle mass, E is the initial kinetic energy of the particle (eV), and e is the elementary charge 1.602 × 10⁻⁶. -19 .
[0042] Pulse width between the first and second electrodes Satisfy the formula Where e is the elementary charge 1.602 × 10⁻⁶ -19 m is the desired particle mass. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
[0043] The high-voltage pulse amplitude applied to the first and second plates is equal, and the magnitude of the high-voltage pulse amplitude is ±5V~3kV.
[0044] Example 2: This example provides a selection method for a high-pass cluster quality selector based on a double-layer electrode, including the following steps:
[0045] Step 1: Place the first and second plates parallel to each other with a plate spacing of d.
[0046] Step 2: Place the high-pass cluster quality selector based on double-layer electrodes in a vacuum environment;
[0047] Step 3: The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is set at the distance d / 2 between the first and second electrodes. The cluster beam to be analyzed enters the high-pass cluster quality selector based on the double-layer electrode parallel to the beam inlet.
[0048] Step 4: Start the high-voltage pulse power supply, select the pulse period, and output high-voltage square wave pulses to the first and second plates. The cluster beam flies along the transverse flight path.
[0049] Step 5: Adjust the pulse voltage timing of the high-pass cluster quality selector based on the double-layer electrode according to the cluster quality to be selected.
[0050] In step 1, the first and second plates are rectangular flat plates. The width of the plates is greater than 1.5 times the distance d between the first and second plates, and the plate length L satisfies... The choice of the number of pulse width times n satisfies , Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. Let d be the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse. In this embodiment of the invention, the first and second plates are rectangular flat plates with a length of 300 mm, a width of 100 mm, and a thickness of 2 mm. The distance between the two plates is 18 mm. Figures 2-4 As shown.
[0051] In step 4, the high-voltage pulse power supply applies a high-voltage square wave pulse to the first electrode. The amplitude of the high-voltage pulse, and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate. The amplitude of each pulse can be adjusted independently or synchronously. The amplitude of the high-voltage pulse applied to the first and second plates is equal, with a magnitude of ±5V to 3kV. In this embodiment, the high-voltage pulse power supply applies a high-voltage square wave pulse to the first plate. The amplitude and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate The amplitudes are equal, and the amplitude is 1000V.
[0052] Second electrode plate cluster ion filling region Should meet ,in, This represents the total time the particle spends moving within the high-pass mass separator. Where is the pulse width time, n is the number of pulse width times, L is the electrode length, m is the required particle mass, E is the initial kinetic energy of the particle (eV), and e is the elementary charge 1.602 × 10⁻⁶. -19 .
[0053] Pulse width between the first and second electrodes Satisfy the formula Where m is the required particle mass. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
[0054] Example 3: SIMION is an electromagnetic field simulation software primarily used to calculate electric fields and charged particle trajectories in electrode configurations. This example provides a high-pass cluster mass selector selection method based on a double-layer electrode, implemented in Simion using... Simulation was performed using the test particle; a dual-electrode mass selection structure device with high-pass characteristics, capable of selecting any cluster size within a range without changing the structure, includes the following steps:
[0055] Step 1: Prepare a first and second electrode plate that are parallel to each other. Both should be made of stainless steel or aluminum and electrically insulated from the connectors. Figures 2-4 As shown, both have a thickness of 2mm, a length of 300mm, a width of 100mm, and a distance of 18mm between the inner surfaces of the two parallel plate electrodes.
[0056] Step 2: Start the high-voltage pulse power supply, select the pulse period, and output a high-voltage square wave pulse to the first and second plates. The cluster flies along a transverse flight path. The high-voltage square wave pulse applied by the high-voltage pulse power supply to the first plate... The amplitude and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate The amplitudes are equal, both being 1000V. The high-voltage pulses output by the high-voltage pulse power supply to the two electrodes are square waves with the same period, but there is a certain pulse interval in time, such as... Figure 5 As shown;
[0057] The incident ions in the simulation are Each cycle releases 500 ions, each carrying a single unit of positive charge and an initial kinetic energy of E = 500 eV. Therefore, we can obtain the following: The time it takes for ions to travel during the entire flight of a high-pass mass separator As shown in Table 1.
[0058] .
[0059] During the mass separation process, the acceleration and deceleration distance of ions depends on the pulse duration and pulse voltage. An excessively long acceleration distance will result in either an excessively long pulse duration or an excessively high pulse voltage. Here, a ion acceleration distance of 4.5 mm and a pulse voltage of 1000 V are selected. Figure 5 As shown, it can be calculated The pulse voltage duration of the ions is shown in Table 2.
[0060] .
[0061] The entire movement time of ions The sum of the intervals between the pulse acceleration voltage and the pulse deceleration voltage received in the quality selector is Here, n=19 is chosen. The calculation yields... Ion filling acceleration time , As shown in Table 3.
[0062] .
[0063] Based on the parameters in Tables 1 to 3, the corresponding pulse voltage timing can be defined in the user program file. As mentioned earlier, the ion is selected as... The initial state settings of the ions are shown in Table 4.
[0064] .
[0065] The high-throughput quality selector model was tested based on the above parameters. When selecting... As the smallest mass ion that can pass through, its flight trajectory is as follows: Figure 6 As shown by line (a) in the text. , and The pass rate for all was 100%. (Selected) When it is the smallest mass ion that can pass through, its trajectory is as follows: Figure 6 As shown by line (b) in the middle, at this time The pass rate was 0%, while and The pass rate remains at 100%. Similarly, with When it is the smallest passable ion (e.g.) Figure 6 (as shown by line (c) in the text) and The pass rate for all of them was 0%. and The pass rate was 100%. Further selection... When it is the smallest passable ion (e.g.) Figure 6 (as shown by line (d) in the text), only The pass rate is 100%, and all quality levels below [a certain threshold] are [not specified]. All clusters were lost due to the collider walls. Specific particle transport rate simulation results are as follows: Figure 7As shown, the electrode structure enables effective ion transmission within the target mass range and collection at the outlet. However, the mass selection resolution is somewhat reduced for large-mass particles compared to small-mass test particles. The screening performance can be optimized by adjusting the electrode width L and electrode spacing d to meet different application requirements. The above results demonstrate that this mass selector exhibits good mass screening performance under various settings.
[0066] Example 4: This example provides a high-pass cluster quality selector selection method based on a double-layer electrode in Simion. Simulation was conducted using the test particle; a dual-electrode mass selection structure device with "high-pass characteristics" exhibits good energy distribution adaptability, comprising the following steps:
[0067] Step 1: Prepare a first and second electrode plate that are parallel to each other. Both should be made of stainless steel or aluminum and electrically insulated from the connectors. Figures 2-4 As shown, both have a thickness of 2mm, a length of 300mm, a width of 100mm, and a distance of 18mm between the inner surfaces of the two parallel plate electrodes.
[0068] Step 2: Start the high-voltage pulse power supply, select the pulse period, and output a high-voltage square wave pulse to the first and second plates. The cluster flies along a transverse flight path. The high-voltage square wave pulse applied by the high-voltage pulse power supply to the first plate... The amplitude and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate The amplitudes are equal, both being 1000V. The high-voltage pulses output from the high-voltage pulse power supply to the two electrodes are square waves with the same period, but there is a certain pulse interval in time. The square wave pulse timing diagram is as follows. Figure 5 As shown;
[0069] The ion with the smallest mass passing through in the simulation is Each cycle releases 200 ions, each carrying a single unit of positive charge and an initial kinetic energy of E = 500 eV. Therefore, we can obtain the following: The travel time of ions during the entire flight process of the high-pass mass separator is shown in Table 5.
[0070] .
[0071] The high-throughput mass sorting device of the present invention exhibits excellent adaptability to initial energy fluctuations of cluster particles under practical application conditions. In the preferred embodiment ( Figure 8 and Figure 9 ),by Verification can be performed using the smallest particle size that can be obtained through the device. For example... Figure 8As shown, when the initial energy of all particles is strictly set at 500 eV, , and The pass rates were 0%, 89%, and 100%, respectively. The initial energy distribution was extended to a uniform distribution in the range of 450 eV to 550 eV (e.g., Figure 9 As shown by the AC lines in the diagram, the throughput of the three types of particles is 0%, 90%, and 100%, respectively. The initial energy distribution is further extended to a uniform distribution in the range of 400 eV to 600 eV (as shown by the AC lines in the diagram). Figure 9 As shown by the df line in the diagram, the throughput of the three types of particles at this point is 0%, 88%, and 100%, respectively. The test results show that even with an initial energy fluctuation of ±20%, the throughput of particles of each size did not fluctuate significantly, indicating that the high-throughput mass separator has strong adaptability to the initial energy distribution of cluster particles and is suitable for conditions with wide energy distribution in actual experiments.
[0072] This invention provides a high-pass cluster mass selector and selection method based on a dual-layer electrode. Addressing the limitations of existing four-layer electrode structures in terms of fabrication accuracy, timing synchronization, transmission mode, and integration, this invention employs a dual-layer electrode structure. A mass threshold is set via a pulsed electric field, achieving "high-pass" mass screening and allowing ions with masses exceeding the set threshold to pass through efficiently. The dual-layer design significantly reduces fabrication and assembly complexity and improves electric field uniformity and edge field controllability. Furthermore, the dual-layer design exhibits good adaptability to initial ion energy distributions, maintaining stable screening performance under actual experimental conditions. This simplified dual-layer design not only supports applications such as high-mass ion aggregation and wide-range mass measurement but also provides a feasible technical path for realizing compact, highly integrated time-of-flight systems.
[0073] Finally, it should be noted that the above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. However, any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.
Claims
1. A high-pass cluster quality selector based on a double-layer electrode, characterized in that, Includes a first electrode plate, a second electrode plate, and a high-voltage pulse power supply; The first and second electrodes are placed parallel to each other with a distance of d between them. The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is located at the distance d / 2 between the first and second electrodes. The first and second plates are respectively connected to a high-voltage pulse power supply. The high-voltage pulse power supply is used to apply a high-voltage square wave pulse to the first and second plates. The high-voltage square wave pulses have the same period, but there is a pulse width in time. The high-pass cluster quality selector based on a double-layer electrode is placed in a vacuum environment.
2. The high-pass cluster quality selector based on a double-layer electrode according to claim 1, characterized in that, High-voltage square wave pulse applied to the first plate by the high-voltage pulse power supply The amplitude of the high-voltage pulse, and the high-voltage square wave pulse applied by the high-voltage pulse power supply to the second plate. The amplitude can be adjusted independently or synchronously.
3. The high-pass cluster quality selector based on a double-layer electrode according to claim 1, characterized in that, Both the first and second plates are made of stainless steel or aluminum and are electrically insulated.
4. The high-pass cluster quality selector based on a double-layer electrode according to claim 1, characterized in that, The first and second plates are rectangular flat plates. The width of the plates is greater than 1.5 times the distance d between the first and second plates, and the plate length L satisfies... ,in, Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
5. The high-pass cluster quality selector based on a double-layer electrode according to claim 4, characterized in that, The choice of the number of pulse width times n satisfies Where L is the length of the electrode plate, U is the magnitude of the high-voltage square wave pulse, and E is the initial kinetic energy of the particle. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone, and d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates.
6. The high-pass cluster quality selector based on a double-layer electrode according to claim 1, characterized in that, Pulse width between the first and second electrodes Satisfy the formula Where e is the elementary charge 1.602 × 10⁻⁶ -19 m is the desired particle mass. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
7. The high-pass cluster quality selector based on a double-layer electrode according to claim 1, characterized in that, The high-voltage pulse amplitude applied to the first and second plates is equal, and the magnitude of the high-voltage pulse amplitude is ±5V~3kV.
8. A selection method for a high-pass cluster quality selector based on a double-layer electrode, characterized in that, Includes the following steps: Step 1: Place the first and second plates parallel to each other with a plate spacing of d; Step 2: Place the high-pass cluster quality selector based on double-layer electrodes in a vacuum environment; Step 3: The beam inlet of the high-pass cluster quality selector based on the double-layer electrode is set at the distance d / 2 between the first and second electrodes. The cluster beam to be analyzed enters the high-pass cluster quality selector based on the double-layer electrode parallel to the beam inlet. Step 4: Start the high-voltage pulse power supply, select the pulse period, and output high-voltage square wave pulses to the first and second plates. The cluster beam flies along the transverse flight path. Step 5: Adjust the pulse voltage timing of the high-pass cluster quality selector based on the double-layer electrode according to the cluster quality to be selected.
9. The selection method for a high-pass cluster quality selector based on a double-layer electrode according to claim 8, characterized in that, In step 1, the first and second plates are rectangular flat plates. The width of the plates is greater than 1.5 times the distance d between the first and second plates, and the plate length L satisfies... The choice of the number of pulse width times n satisfies , Where E is the minimum number of ions that the high-pass filter can handle, and n is the initial kinetic energy of the particles. d is the distance the particle travels within a single pulse width in the vertical direction, i.e., the height of the acceleration zone; d is the total distance the particle travels in the vertical direction, i.e., the distance between the plates; and U is the magnitude of the high-voltage square wave pulse voltage.
10. The selection method for a high-pass cluster quality selector based on a double-layer electrode according to claim 8, characterized in that, In step 4, the high voltage pulse amplitude applied to the first and second plates is equal, and the high voltage pulse amplitude is ±5V~3kV.
