Large-angle oblique incidence near-to-eye display system and hologram generation method
By constructing a virtual oversampling grid and using the Shifted angular spectrum method for light field propagation calculation, combined with a phase prediction neural network, the problem of insufficient sampling bandwidth caused by the limited pixel spacing of the spatial light modulator under large-angle oblique incidence conditions is solved, achieving efficient hologram generation and image quality improvement.
Patent Information
- Application Number
- CN202610457042.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-08
- Publication Date
- 2026-05-26
AI Technical Summary
In existing technologies, the limited pixel spacing of spatial light modulators under large-angle oblique incidence conditions results in insufficient physical sampling bandwidth, which in turn causes spectral aliasing, bandwidth truncation, and significant degradation of high-frequency details and contrast in reconstructed images.
A method for generating holograms from off-axis projection at large angles of oblique incidence is proposed. This method involves obtaining the initial phase distribution of a reflective silicon-based liquid crystal spatial light modulator, constructing a virtual oversampling grid, building a modulated light field on the extended high-resolution grid, superimposing the linear phase term corresponding to the oblique incidence, performing propagation calculations using the Shifted angular spectrum method, and reconstructing the light field distribution by combining it with a phase prediction neural network.
While maintaining high quality, it significantly improves computational efficiency and accelerates generation capabilities, enabling rapid hologram generation and enhancing image computational efficiency and generation speed.