A cutting tool deposited with a multi-layer nanocomposite coating and a method of making the same

Abstract

The application discloses a cutting tool deposited with a multilayer nanocomposite coating and a preparation method thereof, and relates to the technical field of cutting blades. The spherical alumina sand particles are used in the application, different particle sizes of the sand particles are compounded, large particle size alumina sand particles A are introduced, the coating adhesion is improved, and then the wear resistance of the cutting tool is improved. The (TiZrHfNb)N alloy transition layer is deposited in the application, the element interdiffusion between the coating and the substrate is effectively blocked, the high-temperature stability of the cutting tool is improved, the internal stress of the coating is relieved, and the interface bonding force is improved. The Si element in the (TiAlSi)N layer deposited in the application forms an amorphous phase, the high-temperature stability of the cutting tool is improved; the (TiNbCN) layer generates an oxide phase with self-lubricating characteristics at high temperature, the wear resistance can be improved; the addition amount of Si is increased, a dense oxide film is formed at high temperature to protect the cutting tool, and thus the wear resistance is improved.

Description

Technical Field

[0001] This invention relates to the field of cutting tool technology, specifically a cutting tool with a multi-layer nanocomposite coating and its preparation method. Background Technology

[0002] With the rapid development of the aerospace and automotive manufacturing industries, extremely high requirements have been placed on the wear resistance, high-temperature oxidation resistance, impact resistance, and interfacial bonding strength of cutting tools. Currently, the hard coatings for cutting tools are mainly TiN and TiAlN, which still have significant defects in high-speed cutting scenarios. For example, insufficient interfacial bonding: the large difference in the coefficients of thermal expansion between the metal substrate and the ceramic coating means that the transition layer cannot effectively alleviate interfacial stress. Under the alternating thermal stress of high-speed cutting, the entire coating is prone to peeling off, leading to tool failure. Moreover, single-layer coatings or alternating multi-layer coatings with fixed compositions cannot simultaneously achieve high hardness and high fracture toughness. During high-speed intermittent cutting, microcracks are prone to occur and propagate rapidly, causing coating damage. The coating's oxidation resistance and thermal wear resistance are insufficient, resulting in a short tool life.

[0003] In summary, in order to solve the above problems and improve the hardness and wear resistance of cutting tools, this application provides a cutting tool with a multi-layer nanocomposite coating and its preparation method. Summary of the Invention

[0004] The purpose of this invention is to provide a cutting tool with a multilayer nanocomposite coating and its preparation method, so as to solve the problems raised in the prior art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: A method for preparing a cutting tool with a multilayer nanocomposite coating includes the following steps: Step 1: Using WC-Co cemented carbide as the tool substrate, sandblasting is performed with alumina sand particles, followed by cleaning and drying to obtain the pretreated substrate. Step 2: Place the pretreated substrate in the coating chamber, evacuate, introduce Ar gas, and etch the substrate surface to remove the residual oxide layer; Step 3: Turn on the TiZrHfNb alloy target, deposit a metal layer using multi-arc ion plating, and then introduce nitrogen gas to deposit a (TiZrHfNb)N alloy transition layer. Step 4: Using multi-arc ion plating, deposit (TiAlSi)N layer and (TiNb)(CN) layer in stack; Step 5: Turn on the TiAlCr target and V target, and deposit a (TiAlCrV)N layer under a nitrogen atmosphere. Stop the flow of reaction gas, cool, and obtain a cutting tool with a multi-layer nanocomposite coating.

[0006] More preferably, the alumina sand particles are spherical alumina sand particles; the alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm.

[0007] Ideally, the mass ratio of alumina sand particles A to alumina sand particles B is 1:(3-4).

[0008] In a more optimized manner, in step three, the atomic ratio of Ti:Zr:Hf:Nb in the TiZrHfNb alloy target is 25:25:25:25.

[0009] In a more optimized manner, during step four, when depositing the (TiAlSi)N layer, a TiAlSi alloy target is used; the arc power supply is turned on, nitrogen gas is introduced at a flow rate of 400~600 sccm, and the deposition thickness is 5-8 nm.

[0010] In a more optimized manner, the atomic ratio of Ti:Al:Si in the TiAlSi alloy target is (45-50):40:(10-15).

[0011] In a more optimized manner, in step four, when depositing the (TiNb)(CN) layer, a TiNbC alloy target is used; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, resulting in a deposition thickness of 2-5 nm.

[0012] In a more optimized manner, the atomic ratio of Ti:Nb:C in the TiNbC alloy target is (45-47):45:(8-10).

[0013] In a more optimized manner, in step five, the atomic ratio of Ti:Al:Cr in the TiAlCr target is 40:30:30.

[0014] Compared with the prior art, the beneficial effects of the present invention are: 1. This application uses spherical alumina abrasive particles, which are a mixture of alumina abrasive particles A with a particle size of 10-20μm and alumina abrasive particles B with a particle size of 100-300nm. The mass ratio of abrasive particles A to abrasive particles B is 1:(3-4). By using abrasive particles of different sizes for compounding, 10-20μm alumina abrasive particles A are introduced to improve the coating adhesion and thus improve the wear resistance of the tool.

[0015] 2. The (TiZrHfNb)N alloy transition layer deposited in this application effectively blocks the interdiffusion of elements between the coating and the substrate, improves the high-temperature stability of the tool, relieves the internal stress of the coating, and enhances the interfacial bonding force.

[0016] 3. This application deposits a (TiAlSi)N layer and a (TiNbCN) layer; the Si element in the (TiAlSi)N layer forms an amorphous phase, which improves the high-temperature stability of the tool; the (TiNbCN) layer generates a phase oxide with self-lubricating properties at high temperature, which can improve wear resistance; Increasing the Si content in a TiAlSi target allows for the formation of a dense oxide film at high temperatures to protect the cutting tool, thereby improving wear resistance. Excessive Si content leads to an overabundance of amorphous phases and reduced coating toughness. This application controls the Ti:Al:Si atomic ratio to be 45:40:15, at which the tool performance is optimal.

[0017] 4. Deposit (TiAlCr)VN layer: Deposit V element. During high-temperature friction, V element diffuses to the coating surface and oxidizes to form a phase oxide with self-lubricating properties. The dense (TiAlSi)N layer and (TiNbCN) layer inhibit excessive diffusion of V element into the coating interior, thus preserving the lubricating properties and improving the wear resistance of the tool while avoiding the deterioration of oxidation resistance. Detailed Implementation

[0018] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0019] Example 1: A method for preparing a cutting tool with a multilayer nanocomposite coating, comprising the following steps: Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 7%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:3.5. Step 2: Plasma etching activation: The pretreated substrate was placed in the coating chamber, vacuumed, heated to 400°C, Ar gas was introduced, and a negative bias voltage of -600V was applied to etch the substrate surface for 32 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 405℃ and the substrate bias voltage was -120V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 60nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 400nm. Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -80V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 45:40:15; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 500 sccm, and the deposition thickness was 6 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 3 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -80V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0020] Example 2: A method for preparing a cutting tool with a multilayer nanocomposite coating, comprising the following steps: Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 6%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:3. Step 2: Plasma etching activation: The pretreated substrate is placed in the coating chamber, vacuumed, heated to 400°C, Ar gas is introduced, and a negative bias voltage of -600V is applied to etch the substrate surface for 30 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 400℃ and the substrate bias voltage was -100V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 50nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 300nm. Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -50V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 45:40:15; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 400 sccm, and the deposition thickness was 5 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 3 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -60V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 0.5μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0021] Example 3: A method for preparing a cutting tool with a multilayer nanocomposite coating, comprising the following steps: Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 8%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:4. Step 2: Plasma etching activation: The pretreated substrate is placed in the coating chamber, vacuumed, heated to 400°C, Ar gas is introduced, and a negative bias voltage of -700V is applied to etch the substrate surface for 35 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 405℃ and the substrate bias voltage was -150V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 70nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 500nm. Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -100V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 45:40:15; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 600 sccm, and the deposition thickness was 8 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 5 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -100V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1.5μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0022] Comparative Example 1: No 10-20μm alumina sand particles were added; all other aspects were the same as in Example 1. Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 7%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. Spherical alumina sand particles are alumina sand particles with a particle size of 100-300nm; Step 2: Plasma etching activation: The pretreated substrate was placed in the coating chamber, vacuumed, heated to 400°C, Ar gas was introduced, and a negative bias voltage of -600V was applied to etch the substrate surface for 32 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 405℃ and the substrate bias voltage was -120V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 60nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 400nm. Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -80V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 45:40:15; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 500 sccm, and the deposition thickness was 6 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 3 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -80V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0023] Comparative Example 2: TiAlSi alloy target; the atomic ratio of Ti:Al:Si is 55:40:5, and the rest is the same as in Example 1: Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 7%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:3.5. Step 2: Plasma etching activation: The pretreated substrate was placed in the coating chamber, vacuumed, heated to 400°C, Ar gas was introduced, and a negative bias voltage of -600V was applied to etch the substrate surface for 32 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 405℃ and the substrate bias voltage was -120V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 60nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 400nm. Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -80V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 55:40:5; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 500 sccm, and the deposition thickness was 6 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 3 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -80V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0024] Comparative Example 3: (TiNb)(CN) not added, otherwise the same as Example 1: Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 7%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:3.5. Step 2: Plasma etching activation: The pretreated substrate was placed in the coating chamber, vacuumed, heated to 400°C, Ar gas was introduced, and a negative bias voltage of -600V was applied to etch the substrate surface for 32 minutes to remove the residual oxide layer. Step 3: Deposition of (TiZrHfNb)N alloy transition layer: The substrate temperature was maintained at 405℃ and the substrate bias voltage was -120V. The TiZrHfNb alloy target was turned on. The atomic ratio of Ti:Zr:Hf:Nb was 25:25:25:25. A 60nm metal layer was deposited by multi-arc ion plating. Then, nitrogen gas was introduced to deposit a (TiZrHfNb)N alloy transition layer with a thickness of 400nm. Step 4: Deposit (TiAlSi)N layer: Maintain the substrate temperature at 410℃, the substrate bias voltage at -80V, use multi-arc ion plating, and use a TiAlSi alloy target; the atomic ratio of Ti:Al:Si is 45:40:15; turn on the arc power supply, introduce nitrogen gas at a flow rate of 500sccm, and the deposition thickness is 900nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -80V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0025] Comparative Example 4: No (TiZrHfNb)N alloy transition layer was deposited; TiN was deposited instead. The rest was the same as in Example 1. Step 1: Preprocessing: WC-Co cemented carbide was used as the tool substrate with a Co content of 7%. The substrate was sandblasted with spherical alumina sand particles, then cleaned and dried to obtain the pretreated substrate. The spherical alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm, with a mass ratio of sand particles A to sand particles B of 1:3.5. Step 2: Plasma etching activation: The pretreated substrate was placed in the coating chamber, vacuumed, heated to 400°C, Ar gas was introduced, and a negative bias voltage of -600V was applied to etch the substrate surface for 32 minutes to remove the residual oxide layer. Step 3: Deposit TiN alloy transition layer: Maintain the substrate temperature at 405℃, the substrate bias voltage at -120V, turn on the Ti target, introduce nitrogen gas, and deposit a thickness of 400nm; Step 4: Deposit (TiAlSi)N and (TiNb)(CN) layers: Maintaining the substrate temperature at 410℃ and the substrate bias at -80V, multi-arc ion plating and stacked deposition were employed for a total of 100 cycles; each cycle consisted of one (TiAlSi)N layer deposition and one (TiNb)(CN) layer deposition. (TiAlSi)N layer deposition: TiAlSi alloy target was used; the atomic ratio of Ti:Al:Si was 45:40:15; the arc power supply was turned on, nitrogen gas was introduced at a flow rate of 500 sccm, and the deposition thickness was 6 nm. (TiNb)(CN) layer deposition: using a TiNbC alloy target; the atomic ratio of Ti:Nb:C is 45:45:10; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced, with a nitrogen flow rate of 400 sccm and a methane flow rate of 50 sccm, and the deposition thickness is 3 nm. Step 5: Deposition of (TiAlCrV) N layer: The substrate temperature was maintained at 420℃ and the substrate bias voltage was adjusted to -80V. The TiAlCr target and V target were turned on, and the atomic ratio of Ti:Al:Cr in the TiAlCr target was 40:30:30. A (TiAlCrV)N layer with a thickness of 1μm was deposited under a nitrogen atmosphere. The reaction gas was stopped and the mixture was cooled to obtain a cutting tool with a multilayer nanocomposite coating.

[0026] experiment: The cutting tools prepared in Examples 1-3 and Comparative Examples 1-4 were subjected to performance tests. The hardness of the cutting tools was tested using a nanoindenter, and the friction coefficient of the cutting tools was tested using a friction and wear tester. The data obtained are shown in Table 1 below: Table 1

[0027] Conclusion: The data comparison in the table shows that in Comparative Example 1, without the addition of alumina abrasive particles with a particle size of 100-300 nm, the coating adhesion decreased, affecting the tool's wear resistance. In Comparative Example 2, the decrease in the amount of Si added to the TiAlSi alloy target led to a decrease in the tool's wear resistance and hardness. In Comparative Example 3, without the (TiNbCN) layer, the tool's wear resistance decreased significantly. In Comparative Example 4, without depositing the (TiZrHfNb)N alloy transition layer, the deposition of TiN resulted in poor coating adhesion and a significant decrease in wear resistance. Examples 1-3 of this application used a blend of abrasive particles of different sizes, introducing 10-20 μm alumina abrasive particles A to improve coating adhesion, thereby enhancing the tool's wear resistance. The deposition of the (TiZrHfNb)N alloy transition layer effectively blocked elemental interdiffusion between the coating and the substrate, improved the tool's high-temperature stability, alleviated the coating's internal stress, and improved interfacial adhesion. Examples 1-3 involve the deposition of (TiAlSi)N and (TiNbCN) layers. In the (TiAlSi)N layer, Si forms an amorphous phase, enhancing the high-temperature stability of the cutting tool. The (TiNbCN) layer generates a self-lubricating oxide phase at high temperatures, improving wear resistance. Increasing the Si content in the TiAlSi target forms a dense oxide film at high temperatures to protect the cutting tool, thereby improving wear resistance. A (TiAlCr)VN layer is also deposited, depositing V elements. During high-temperature friction, V diffuses to the coating surface and oxidizes to form a self-lubricating oxide phase. The dense (TiAlSi)N and (TiNbCN) layers inhibit excessive diffusion of V into the coating interior, preserving lubrication properties while improving tool wear resistance.

[0028] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within the present invention.

Claims

1. A method for preparing a cutting tool with a multilayer nanocomposite coating, characterized in that: Includes the following steps: Step 1: Using WC-Co cemented carbide as the tool substrate, sandblasting is performed with alumina sand particles, followed by cleaning and drying to obtain the pretreated substrate. Step 2: Place the pretreated substrate in the coating chamber, evacuate, introduce Ar gas, and etch the substrate surface to remove the residual oxide layer; Step 3: Turn on the TiZrHfNb alloy target, deposit a metal layer using multi-arc ion plating, and then introduce nitrogen gas to deposit a (TiZrHfNb)N alloy transition layer. Step 4: Using multi-arc ion plating, deposit (TiAlSi)N layer and (TiNb)(CN) layer in stack; Step 5: Turn on the TiAlCr target and V target, and deposit a (TiAlCrV)N layer under a nitrogen atmosphere. Stop the flow of reaction gas, cool, and obtain a cutting tool with a multi-layer nanocomposite coating.

2. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 1, characterized in that: The alumina sand particles are spherical alumina sand particles; the alumina sand particles are a mixture of alumina sand particles A with a particle size of 10-20μm and alumina sand particles B with a particle size of 100-300nm.

3. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 2, characterized in that: The mass ratio of alumina sand particles A to alumina sand particles B is 1:(3-4).

4. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 1, characterized in that: In step three, the atomic ratio of Ti:Zr:Hf:Nb in the TiZrHfNb alloy target is 25:25:25:

25.

5. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 1, characterized in that: In step four, when depositing the (TiAlSi)N layer, a TiAlSi alloy target is used; the arc power supply is turned on, nitrogen gas is introduced at a flow rate of 400~600 sccm, and the deposition thickness is 5-8 nm.

6. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 5, characterized in that: In the TiAlSi alloy target, the atomic ratio of Ti:Al:Si is (45-50):40:(10-15).

7. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 1, characterized in that: In step four, when depositing the (TiNb)(CN) layer, a TiNbC alloy target is used; the arc power supply is turned on, and a mixture of nitrogen and methane is introduced. The flow rate of nitrogen is 400 sccm, the flow rate of methane is 50 sccm, and the deposition thickness is 2-5 nm.

8. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 7, characterized in that: In the TiNbC alloy target, the atomic ratio of Ti:Nb:C is (45-47):45:(8-10).

9. The method for preparing a cutting tool with a multilayer nanocomposite coating according to claim 1, characterized in that: In step five, the atomic ratio of Ti:Al:Cr in the TiAlCr target is 40:30:

30.

10. A cutting tool with a multi-layer nanocomposite coating prepared by the method for preparing a cutting tool with a multi-layer nanocomposite coating according to claims 1-9.

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