Monocrystal lithium niobate thin film, preparation and application thereof

The hydrothermal method for epitaxial growth of lithium niobate thin films on single-crystal substrates solves the problems of complex and costly preparation of lithium niobate thin films in existing technologies, and realizes the preparation of high-quality single-crystal thin films suitable for integrated optical devices.

CN122105624APending Publication Date: 2026-05-29ZHEJIANG UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ZHEJIANG UNIV
Filing Date
2026-03-21
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Existing methods for preparing lithium niobate thin films suffer from problems such as complex processes, high costs, and difficulty in obtaining high-quality single-crystal thin films. In particular, deviations in stoichiometry, amorphous phases, and grain boundary defects are prone to occur during epitaxial growth, affecting electro-optic performance.

Method used

A hydrothermal method is used to epitaxially grow a single-crystal lithium niobate thin film on a single-crystal lithium niobate or lithium tantalate substrate. A high-quality single-crystal lithium niobate thin film is formed on the substrate through a hydrothermal reaction of a mixed niobium source and a lithium source. The surface is flat and continuous, and the interface is atomically flat.

Benefits of technology

The fabrication of high-quality, large-area lithium niobate single-crystal thin films has been achieved, with smooth surfaces and atomically flat interfaces. This solves the problems of film quality and cost in existing technologies and is applicable to fields such as surface acoustic wave devices, electro-optic modulation devices, and photonic chips.

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Abstract

The application discloses a monocrystal lithium niobate thin film and a preparation and application thereof, and belongs to the field of monocrystal growth. The application adopts a hydrothermal method to epitaxially grow a large-area high-quality monocrystal lithium niobate thin film on a monocrystal lithium niobate and lithium tantalate substrate for the first time, the surface of the thin film is smooth and continuous, and the interface is even atom-level smooth, thereby solving the problem that a large-area high-quality monocrystal lithium niobate thin film cannot be epitaxially grown for a long time. Moreover, the preparation method can be used for obtaining high-quality epitaxial monocrystal lithium niobate thin films with different thicknesses. The application has the advantages of simple process, easy control, low cost and easy production. The high-quality monocrystal lithium niobate thin film can be applied to the information field such as a surface acoustic wave device, an electro-optic modulation device and a photonic chip.
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