A method for controlling the motion of a substrate resistant to disturbances in an adhesive coating equipment

Abstract

This invention discloses a method for controlling the motion of a substrate in an adhesive coating equipment, comprising: S1: establishing a dynamic model of the substrate motion platform and converting it into a standard form of active disturbance rejection control (ADRC) including lumped disturbances; S2: designing a cascaded extended state observer based on a preset nominal control gain and the standard form of ADRC, using the actual displacement output and system control quantity as inputs, and performing hierarchical observation and fusion of the total system disturbance through the cascaded extended state observer to obtain an estimated total disturbance value; S3: inputting the estimated total disturbance value into a PD controller, and calculating the actual control quantity according to the ADRC law in combination with the nominal control gain; S4: driving the substrate motion platform according to the actual control quantity, so that the actual displacement of the platform satisfies the dynamic relationship of the standard form of ADRC, thereby realizing dynamic compensation and adjustment of the substrate motion.

Description

Technical Field

[0001] This invention relates to the field of precision motion control and semiconductor manufacturing equipment technology, specifically to a method for controlling the motion of a substrate against disturbances in a coating equipment. Background Technology

[0002] In slot coating processes, the motion platform supporting the glass substrate must possess high-speed, long-stroke, high-precision, and high-stability motion capabilities. The smoothness of its motion directly determines the uniformity of the photoresist film. Currently, high-performance coating equipment generally faces challenges such as the tribolinearity of the drive system itself, time-varying resistance caused by changes in photoresist viscosity, and load variations due to different substrate specifications. Existing technologies often employ a "servo motor + ball screw" or linear motor as the drive scheme, coupled with traditional PID or Linear Active Disturbance Rejection Control (LADRC). Figure 1 The traditional LADRC structure shown relies on a single Linear State Observer (LESO) to estimate and compensate for the total disturbance. However, a single-layer LESO requires a low bandwidth to suppress high-frequency noise from the sensor, which leads to a lag in the estimation of rapidly time-varying disturbances; conversely, setting a high bandwidth to improve dynamic response amplifies noise. This contradiction makes it difficult for a single fixed-bandwidth LESO to accurately estimate wideband composite disturbances generated by the coupling of multiple physical sources, resulting in significant estimation residuals. Ultimately, this limits further improvements in substrate motion stability and coating uniformity. Therefore, existing technologies lack a drive control scheme that can effectively overcome these bottlenecks and achieve accurate observation and compensation of wideband disturbances.

[0003] Chinese invention application No. 200710123727.9 discloses a "Three-Dimensional Glue Coating System and Method." The system includes a main control unit, a motion control unit, a servo motion execution unit, a glue coating execution unit, an output unit, and a glue coating machine for mounting the servo motion execution unit. The main control unit directly reads three-dimensional surface signals or two-dimensional line signals from a three-dimensional or two-dimensional solid file, converts the three-dimensional surface signals and two-dimensional line signals into an ordered sequence of three-dimensional point signals, and inputs it to the motion control unit. The motion control unit converts the ordered sequence of three-dimensional point signals into a sequence of three-dimensional pulse signals and inputs it to the servo motion execution unit and the output unit. The glue coating execution unit, driven by the servo motion execution unit, performs three-dimensional movement relative to the object being coated in the X, Y, and Z axes, while simultaneously applying glue under the control of the output unit. This prior art aims to solve the problem of how to conveniently generate complex three-dimensional trajectories. Summary of the Invention

[0004] To address the technical problems of unstable motion and poor coating uniformity caused by insufficient disturbance estimation accuracy in existing substrate motion control methods for adhesive coating equipment, this invention provides an anti-disturbance substrate motion control method for adhesive coating equipment. The technical solution adopted by this invention is as follows: The first aspect of the present invention provides a method for controlling the motion of a substrate against disturbances in a coating equipment, the method comprising: S1: Establish a dynamic model of the substrate motion platform and transform it into a standard form of active disturbance rejection control that includes lumped disturbances; S2: Based on the preset nominal control gain and the standard form of active disturbance rejection control, a cascaded extended state observer is designed. The actual displacement output and system control quantity are used as inputs. The total disturbance of the system is observed and fused in layers through the cascaded extended state observer to obtain the estimated value of the total disturbance. S3: Input the total disturbance estimate into the PD controller, and calculate the actual control quantity according to the active disturbance rejection control law in combination with the nominal control gain; S4: Drive the substrate motion platform according to the actual control quantity, so that the actual displacement of the platform satisfies the dynamic relationship of the self-disturbance rejection control standard form, thereby realizing dynamic compensation and adjustment of the substrate motion.

[0005] As a preferred embodiment, the method for establishing a dynamic model of the substrate motion platform and converting it into a standard form of active disturbance rejection control that includes lumped disturbances includes: First, establish the dynamic model of the substrate motion platform:

[0006] Where m is the total mass of the substrate platform, and y is the platform displacement. These are driving force, nonlinear friction, fluid resistance, and external disturbance; all uncertainties are unified into a total disturbance. Therefore, the standard form of the active disturbance rejection control of the system is:

[0007] in, Given a known nominal control gain, The lumped disturbance contains the uncertainty of the model. as well as .

[0008] As a preferred embodiment, the standard form of the extended state-space equation for the active disturbance rejection control is: Define the state variables: position: x1 = y, velocity: x2 = dy / dt, and extended state: x3 = f Then we have: .

[0009] As a preferred embodiment, the method for designing a cascaded extended state observer based on a preset nominal control gain and the standard form of active disturbance rejection control, using the actual displacement output and system control quantity as inputs, and performing hierarchical observation and fusion of the total system disturbance through the cascaded extended state observer to obtain the total disturbance estimate includes: Configure the first-layer linear expansion state observer LESO1 and set its first bandwidth. ω 1. By observing the state of the LESO1 observation system and the main body of the lumped disturbance, the first-layer disturbance estimate z is obtained. 13 ; Configure a second-layer linearly extended state observer LESO2 and assign it a second bandwidth higher than the first bandwidth. ω 2. Using the observation residuals of LESO1 as the input of LESO2, the second-layer perturbation estimate z is obtained by observing the residual high-frequency perturbations through LESO2. 23 ; The first layer disturbance estimate z 13 Compared with the second-layer perturbation estimate z 23 We perform weighted fusion to generate the total perturbation estimate z.

[0010] As a preferred embodiment, the continuous-time state equation of the first layer LESO1 is:

[0011] in, These are the actual displacement output and the system control quantity, respectively. These represent the position estimate, velocity estimate, and first-layer disturbance estimate, respectively. This is the observer gain of LESO1; The observer gain of the first-layer LESO1 is configured using a bandwidth parameterization method, with all poles set at - ω At point 1, the gain is set to: .

[0012] As a preferred embodiment, the second layer LESO2 uses the estimated residuals of the first layer LESO1. Given the input, its continuous-time state equation is:

[0013] in, These represent the position estimate, velocity estimate, and second-level disturbance estimate, respectively. For the observer gain of LESO2; The observer gain of the second-layer LESO2 is configured using a bandwidth parameterization method, and the gain is set as follows: .

[0014] As a preferred embodiment, the formula for calculating the total disturbance estimate is as follows:

[0015] Among them, z 13 For the first-layer perturbation estimate, z 23 This is the estimated value for the second-layer disturbance. The weighting coefficients are dynamically adjusted based on the system operating conditions.

[0016] As a preferred embodiment, the method further includes a macro-micro switching step: Step A: Acquire the substrate displacement signal and compare it with the desired trajectory; Step B: If the error exceeds the set threshold, enter the macro motion mode and use stepping drive to achieve rapid positioning; Step C: If the error is less than the set threshold, switch to micro-motion mode and execute steps S2 to S4.

[0017] A second aspect of the present invention provides a computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, implements the steps of the aforementioned method for controlling the motion of an anti-disturbance substrate for a coating apparatus.

[0018] A third aspect of the present invention provides a computer device, including a storage medium, a processor, and a computer program stored in the storage medium and executable by the processor, wherein the computer program, when executed by the processor, implements the steps of the aforementioned method for controlling the motion of an anti-disturbance substrate for a coating apparatus.

[0019] Compared with the prior art, the beneficial effects of this invention are: This invention employs a cascaded extended state observer (LADRC-CESO) structure, comprising a first-layer low-bandwidth observer (LESO1) and a second-layer high-bandwidth observer (LESO2), which respectively estimate the total system disturbance at different levels. A disturbance fusion module (MUX) then weights and fuses the two estimates to generate the final total disturbance estimate, achieving high-precision estimation of wide-frequency domain composite disturbances. The low-bandwidth observer effectively suppresses high-frequency noise from sensors and robustly estimates the main disturbance; the high-bandwidth observer quickly tracks residual high-frequency disturbances, compensating for the estimation lag of the low-bandwidth observer. After fusion, the disturbance estimation accuracy and speed are significantly better than traditional single-layer LESO, resolving the contradiction between noise immunity and speed that a single fixed-bandwidth observer cannot simultaneously achieve. By feeding forward the total disturbance estimate to the PD controller and dynamically adjusting the actual control quantity according to the control law, the system can uniformly compensate for various disturbances such as model uncertainty, parameter perturbation, nonlinear friction, fluid resistance and external load changes, which significantly improves the robustness and anti-interference capability of the system. Attached Figure Description

[0020] Figure 1 A schematic diagram of a traditional LADRC structure is provided for the background art; Figure 2 This embodiment provides a flowchart of an anti-disturbance substrate motion control method for an adhesive coating equipment; Figure 3 This is a block diagram of the LADRC-CESO structure provided in this embodiment; Figure 4 This is a flowchart of the logic for dynamic adjustment of substrate movement provided in this embodiment; Figure 5 This is a comparison chart of step response tracking performance provided in this embodiment; Figure 6 This is a comparison chart of sine wave tracking performance provided in this embodiment; Figure 7 This is a comparison chart of the random trajectory tracking performance provided in this embodiment. Detailed Implementation

[0021] The accompanying drawings are for illustrative purposes only and should not be construed as limiting the invention. It should be understood that the described embodiments are merely some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of the embodiments of this application.

[0022] The terminology used in the embodiments of this application is for the purpose of describing particular embodiments only and is not intended to limit the embodiments of this application. The singular forms “a,” “the,” and “the” used in the embodiments of this application and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used herein refers to and includes any or all possible combinations of one or more of the associated listed items.

[0023] In the following description, when referring to the accompanying drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims. In the description of this application, it should be understood that the terms "first," "second," "third," etc., are used only to distinguish similar objects and are not necessarily used to describe a specific order or sequence, nor should they be construed as indicating or implying relative importance. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0024] Furthermore, in the description of this application, unless otherwise stated, "multiple" means two or more. "And / or" describes the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A alone, A and B simultaneously, or B alone. The character " / " generally indicates that the preceding and following related objects are in an "or" relationship. The invention will be further described below with reference to the accompanying drawings and embodiments.

[0025] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0026] Example 1 Please refer to Figure 2 This embodiment provides a method for controlling the motion of a substrate against disturbances in a coating equipment, the method comprising: S1: Establish a dynamic model of the substrate motion platform and transform it into a standard form of active disturbance rejection control that includes lumped disturbances; In one specific embodiment, the method of establishing a dynamic model of the substrate motion platform and converting it into a standard form of active disturbance rejection control that includes lumped disturbances includes: First, establish the dynamic model of the substrate motion platform:

[0027] Where m is the total mass of the substrate platform, and y is the platform displacement. These are driving force, nonlinear friction, fluid resistance, and external disturbance; all uncertainties are unified into a total disturbance. Therefore, the standard form of the active disturbance rejection control of the system is:

[0028] in, Given a known nominal control gain, The lumped disturbance contains the uncertainty of the model. as well as .

[0029] In one specific embodiment, the standard form of the extended state-space equation for the active disturbance rejection control is: Define the state variables: position: x1 = y, velocity: x2 = dy / dt, and extended state: x3 = f Then we have: .

[0030] S2: Based on the preset nominal control gain and the standard form of active disturbance rejection control, a cascaded extended state observer is designed. The actual displacement output and system control quantity are used as inputs. The total disturbance of the system is observed and fused in layers through the cascaded extended state observer to obtain the estimated value of the total disturbance. In a specific embodiment, the method for designing a cascaded extended state observer based on a preset nominal control gain and the standard form of active disturbance rejection control, using the actual displacement output and system control quantity as inputs, and performing hierarchical observation and fusion of the total system disturbance through the cascaded extended state observer to obtain the total disturbance estimate includes: Configure the first-layer linear expansion state observer LESO1 and set its first bandwidth. ω 1. By observing the state of the LESO1 observation system and the main body of the lumped disturbance, the first-layer disturbance estimate z is obtained. 13 ; Configure a second-layer linearly extended state observer LESO2 and assign it a second bandwidth higher than the first bandwidth. ω 2. Using the observation residuals of LESO1 as the input of LESO2, the second-layer perturbation estimate z is obtained by observing the residual high-frequency perturbations through LESO2. 23 ; The first layer disturbance estimate z 13 Compared with the second-layer perturbation estimate z 23 We perform weighted fusion to generate the total perturbation estimate z.

[0031] In a specific embodiment, the continuous-time state equation of the first layer LESO1 is:

[0032] in, These are the actual displacement output and the system control quantity, respectively. These represent the position estimate, velocity estimate, and first-layer disturbance estimate, respectively. This is the observer gain of LESO1; The observer gain of the first-layer LESO1 is configured using a bandwidth parameterization method, with all poles set at - ω At point 1, the gain is set to: .

[0033] In one specific embodiment, the second layer LESO2 uses the estimated residuals of the first layer LESO1. Given the input, its continuous-time state equation is:

[0034] in, These represent the position estimate, velocity estimate, and second-level disturbance estimate, respectively. For the observer gain of LESO2; The observer gain of the second-layer LESO2 is configured using a bandwidth parameterization method, and the gain is set as follows: .

[0035] In a specific embodiment, the formula for calculating the total disturbance estimate is as follows:

[0036] Among them, z 13 For the first-layer perturbation estimate, z 23 This is the estimated value for the second-layer disturbance. The weighting coefficients are dynamically adjusted based on the system operating conditions.

[0037] S3: Input the total disturbance estimate into the PD controller, and calculate the actual control quantity according to the active disturbance rejection control law in combination with the nominal control gain; S4: Drive the substrate motion platform according to the actual control quantity, so that the actual displacement of the platform satisfies the dynamic relationship of the self-disturbance rejection control standard form, thereby realizing dynamic compensation and adjustment of the substrate motion.

[0038] Please refer to Figure 4 In one specific embodiment, the method further includes a macro-micro switching step: Step A: Acquire the substrate displacement signal and compare it with the desired trajectory; Step B: If the error exceeds the set threshold, enter the macro motion mode and use stepping drive to achieve rapid positioning; Step C: If the error is less than the set threshold, switch to micro-motion mode and execute steps S2 to S4.

[0039] Example 2 Please refer to Figure 2 This embodiment provides a method for controlling the motion of a substrate against disturbances in a coating equipment, the method comprising: S1: Establish a dynamic model of the substrate motion platform and transform it into a standard form of active disturbance rejection control that includes lumped disturbances; Specifically, a mathematical model of the substrate motion platform of the adhesive coating equipment is first established. The dynamic equations of the platform can be expressed as:

[0040] Where m is the total mass of the substrate platform, and y is the platform displacement. These factors are driving force, nonlinear friction, fluid resistance, and external disturbance. To achieve self-disturbance control, all uncertainties are unified into a total disturbance. Therefore, the standard form of the active disturbance rejection control of the system is:

[0041] in It is a known nominal control gain. The lumped disturbance contains the uncertainty of the model. and the above .

[0042] Define the location of the state variable: ,speed: Expansion state Therefore, the extended state-space equation of the system is:

[0043] The above equations show that if lumped disturbances can be addressed... To make accurate and rapid estimates, and then to implement control laws. If we dynamically compensate for this, the controlled system can be simplified to a simple dual integrator. Therefore, stabilization and tracking can be easily achieved through a linear feedback controller. Thus, the key and bottleneck to achieving high-performance control lies in how to design a controller capable of accurately estimating the total disturbance. The observer.

[0044] S2: Based on the preset nominal control gain and the standard form of active disturbance rejection control, a cascaded extended state observer is designed. The actual displacement output and system control quantity are used as inputs. The total disturbance of the system is observed and fused in layers through the cascaded extended state observer to obtain the estimated value of the total disturbance. It should be noted that LESO estimates all perturbations as a whole, and its performance is heavily dependent on the bandwidth of a single observer. If a lower bandwidth is used While the observer possesses excellent low-pass filtering characteristics, effectively suppressing high-frequency noise from the sensor, it exhibits significant lag in estimating rapidly time-varying disturbances. Using a higher bandwidth... While observers can quickly track changes in disturbances, they also amplify measurement noise, causing drastic fluctuations in the estimated values ​​and thus deteriorating the compensation effect. To address this core technical challenge, this invention proposes a cascaded extended state observer structure. The core idea is to abandon the use of a single observer to handle all disturbances, instead cascading two LESOs with different bandwidth characteristics. Each LESO is responsible for estimating the disturbance components in different frequency bands, and finally, high-precision observation of the entire wideband disturbance is achieved through fusion.

[0045] It should be noted that the structure of LADRC-CESO is as follows: Figure 3 As shown, it consists of four parts: a linear differential controller (TD), a substrate motion platform, a CESO, and a PD controller. The CESO includes a first-layer observer (LESO1), a second-layer observer (LESO2), and a disturbance fusion module (MUX). LESO1 is configured with a lower bandwidth to estimate the system state and the main part of the overall disturbance. LESO2 is configured with a higher bandwidth to capture residual high-frequency disturbances that LESO1 fails to track. The MUX module performs weighted fusion of the disturbances obtained by LESO1 and LESO2 respectively to obtain the total disturbance, and then dynamically adjusts the substrate motion.

[0046] Specifically, A relatively low bandwidth ω1 is configured to robustly estimate the system state and the main body of the total disturbance, and its low-pass characteristics are used to effectively suppress high-frequency noise from the sensor. Its continuous-time state equation is as follows:

[0047] in These are the actual displacement output and the system control quantity, respectively; they serve as... Input, These represent the position estimate, velocity estimate, and first-layer disturbance estimate, respectively, which serve as... The output, yes The observer gains are used to adjust the convergence speed of the observer's estimated state and ensure the observer's stability. To simplify parameter tuning, this invention employs a bandwidth parameterization method. This method places all the observer's poles at... Therefore, the observer gain is:

[0048] by Estimated residuals As its input, a relatively high bandwidth is configured. It is specifically designed to accurately capture and estimate rapidly changing residual disturbances that the first-layer observers failed to track accurately.

[0049] Its continuous-time state equation is as follows:

[0050] in These represent the position estimate, velocity estimate, and second-level disturbance estimate, respectively. The output, yes The observer gain, the gain magnitude is:

[0051] Finally, it will come from Perturbation estimate With from Perturbation estimate And through fusion rules This generates a more accurate total disturbance estimate z for feedforward compensation. When the system is dominated by low-frequency, slowly varying disturbances, I trust the one with better noise immunity more. When the system faces the challenge of rapid, high-frequency disturbances, More dependent on faster response .

[0052] S3: Input the total disturbance estimate into the PD controller, and calculate the actual control quantity according to the active disturbance rejection control law in combination with the nominal control gain; S4: Drive the substrate motion platform according to the actual control quantity, so that the actual displacement of the platform satisfies the dynamic relationship of the self-disturbance rejection control standard form, thereby realizing dynamic compensation and adjustment of the substrate motion.

[0053] Specifically, to verify the disturbance rejection capability of the substrate motion control of the substrate platform proposed in this invention, step response, sinusoidal tracking, and random trajectory tracking were performed under the same conditions using LESO-based active disturbance rejection control and CESO-based active disturbance rejection control, respectively. The verification results are as follows: During the 1s step response tracking process, such as Figure 5 Both LADRC and LADRC-CESO shown can achieve zero steady-state error tracking and eventually converge to the target value. However, the settling time of LADRC is 0.45s, while that of LADRC-CESO is 0.18s, which reduces the settling time by 60%. Furthermore, the tracking error of LADRC-CESO is significantly lower than that of LADRC.

[0054] During the 5s sinusoidal tracking process, such as Figure 6 The phase lag of the LADRC-CESO sinusoidal trajectory tracking decreased from 0.02s to 0.005s, the amplitude attenuation decreased from 8% to 3%, and the maximum tracking error decreased from [previous value]. Reduce to

[0055] During 5-second tracking of a random trajectory, such as Figure 7 The traditional LADRC exhibits significant phase lag and amplitude decay, while LADRC-CESO essentially overlaps with the desired trajectory throughout the tracking process. By using LADRC-CESO for random trajectory tracking, the phase lag was reduced from 0.10s to 0.03s, the amplitude decay was reduced from 8% to 2%, and the maximum tracking error was reduced from [previous value missing]. Reduce to .

[0056] Through simulation tests under the three typical operating conditions described above, the control method based on LADRC-CESO proposed in this invention was comprehensively compared with the traditional LADRC method. All results consistently show that LADRC-CESO has significant advantages in dynamic response, tracking accuracy, anti-interference capability, and overall stability.

[0057] Example 3 This embodiment provides a computer-readable storage medium storing a computer program thereon, which, when executed by a processor, implements the steps of an anti-disturbance substrate motion control method for an adhesive coating apparatus as described in Embodiment 1 or 2.

[0058] Example 4 This embodiment provides a computer device, including a storage medium, a processor, and a computer program stored in the storage medium and executable by the processor. When the computer program is executed by the processor, it implements the steps of the anti-disturbance substrate motion control method for an adhesive coating device as described in Embodiment 1 or 2.

[0059] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. A method for controlling the motion of a substrate against disturbances in a coating equipment, characterized in that, The method includes: S1: Establish a dynamic model of the substrate motion platform and transform it into a standard form of active disturbance rejection control that includes lumped disturbances; S2: Based on the preset nominal control gain and the standard form of active disturbance rejection control, a cascaded extended state observer is designed. The actual displacement output and system control quantity are used as inputs. The total disturbance of the system is observed and fused in layers through the cascaded extended state observer to obtain the estimated value of the total disturbance. S3: Input the total disturbance estimate into the PD controller, and calculate the actual control quantity according to the active disturbance rejection control law in combination with the nominal control gain; S4: Drive the substrate motion platform according to the actual control quantity, so that the actual displacement of the platform satisfies the dynamic relationship of the self-disturbance rejection control standard form, thereby realizing dynamic compensation and adjustment of the substrate motion.

2. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 1, characterized in that, The method for establishing a dynamic model of the substrate motion platform and transforming it into a standard form of active disturbance rejection control that includes lumped disturbances includes: First, establish the dynamic model of the substrate motion platform: Where m is the total mass of the substrate platform, and y is the platform displacement. These are driving force, nonlinear friction, fluid resistance, and external disturbance; all uncertainties are unified into a total disturbance. Therefore, the standard form of the active disturbance rejection control of the system is: in, Given a known nominal control gain, The lumped disturbance contains the uncertainty of the model. as well as .

3. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 1, characterized in that, The standard form of the extended state-space equation for the active disturbance rejection control is: Define the state variables: position: x1 = y, velocity: x2 = dy / dt, and extended state: x3 = f Then we have: 。 4. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 1, characterized in that, The method for designing a cascaded extended state observer based on a preset nominal control gain and the standard form of active disturbance rejection control, using actual displacement output and system control quantity as inputs, and performing hierarchical observation and fusion of the total system disturbance through the cascaded extended state observer to obtain the total disturbance estimate includes: Configure the first-layer linear expansion state observer LESO1 and set its first bandwidth. ω 1. By observing the state of the LESO1 observation system and the main body of the lumped disturbance, the first-layer disturbance estimate z is obtained. 13 ; Configure a second-layer linearly extended state observer LESO2 and assign it a second bandwidth higher than the first bandwidth. ω 2. Using the observation residuals of LESO1 as the input of LESO2, the second-layer perturbation estimate z is obtained by observing the residual high-frequency perturbations through LESO2. 23 ; The first layer disturbance estimate z 13 Compared with the second-layer perturbation estimate z 23 We perform weighted fusion to generate the total perturbation estimate z.

5. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 4, characterized in that, The continuous-time state equation for the first layer LESO1 is: in, These are the actual displacement output and the system control quantity, respectively. These represent the position estimate, velocity estimate, and first-layer disturbance estimate, respectively. This is the observer gain of LESO1; The observer gain of the first-layer LESO1 is configured using a bandwidth parameterization method, with all poles set at - ω At point 1, the gain is set to: 。 6. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 5, characterized in that, The second layer LESO2 uses the estimated residuals of the first layer LESO1. Given the input, its continuous-time state equation is: in, These represent the position estimate, velocity estimate, and second-level disturbance estimate, respectively. For the observer gain of LESO2; The observer gain of the second-layer LESO2 is configured using a bandwidth parameterization method, and the gain is set as follows: 。 7. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 1, characterized in that, The specific formula for calculating the total disturbance estimate is as follows: Among them, z 13 For the first-layer perturbation estimate, z 23 This is the estimated value for the second-layer disturbance. The weighting coefficients are dynamically adjusted based on the system operating conditions.

8. The method for controlling the motion of a substrate against disturbance in a coating equipment according to claim 1, characterized in that, The method also includes a macro-micro switching step: Step A: Acquire the substrate displacement signal and compare it with the desired trajectory; Step B: If the error exceeds the set threshold, enter the macro motion mode and use stepping drive to achieve rapid positioning; Step C: If the error is less than the set threshold, switch to micro-motion mode and execute steps S2 to S4.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by the processor, it implements the steps of the anti-disturbance substrate motion control method for an adhesive coating apparatus as described in any one of claims 1 to 8.

10. A computer device, characterized in that: The device includes a storage medium, a processor, and a computer program stored in the storage medium and executable by the processor, wherein the computer program, when executed by the processor, implements the steps of a disturbance-resistant substrate motion control method for an adhesive coating apparatus as described in any one of claims 1 to 8.

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