Gas cluster ion beam apparatus

By introducing neutralizing gas and reflective electrodes into the gas cluster ion beam equipment, combined with an insulator-free lens structure, the problems of high cost and complex structure of existing equipment are solved, and efficient and flat material substrate surface processing is achieved.

CN122136244APending Publication Date: 2026-06-02IIPT INC
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Patent Information

Application Number
CN202511789169.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2025-11-07
Filing Date
2025-12-01
Publication Date
2026-06-02

AI Technical Summary

Technical Problem

Existing gas cluster ion beam equipment requires expensive vacuum pump systems and long deflection electrodes under high gas pressure, resulting in high equipment costs and complex structures, making it difficult to achieve extremely flat material substrate surface processing.

Method used

By introducing neutralizing gas into the beam delivery system, neutralizing gas is used to collide and dissociate with gas cluster ions to generate a neutral beam, which then reflects unneutralized ions at the reflecting electrode. Combined with an electrostatic lens structure that does not use insulators, stable neutralization and efficient processing are achieved.

Benefits of technology

This enables extremely flat processing on material substrates, reducing equipment costs and structural complexity while improving processing efficiency and surface smoothness.

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Abstract

The present invention provides a gas cluster ion beam apparatus capable of achieving flat processing by irradiating a material substrate with a neutral beam. A neutralizing gas introduction device (26) is provided for the vacuum container (2). By introducing a neutralizing gas into a neutralizing gas introduction device (26), a gas cluster ion beam (11) traveling along a beam line in a beam transfer system (BT) collides with the neutralizing gas, undergoes dissociation and neutralization to form a high-energy neutral beam (25). Further, a reflective electrode (28) is provided between the electrostatic lens (9b) and the material substrate (15), and a high voltage equal to the acceleration voltage is applied to the reflective electrode.
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