High stability anode layer ion source based on auxiliary regulation

Abstract

The application discloses a high-stability anode layer ion source based on auxiliary regulation, relates to the technical field of anode layer ion sources, and comprises an ion source mechanism, a bottom plate, a ring cylinder one and a ring cylinder two fixed on the bottom plate, and an insulation plate one and an insulation plate two fixed on the bottom plate. The ring cylinder two is located outside the ring cylinder one, the insulation plate one is located between the ring cylinder one and the ring cylinder two, the insulation plate two is located in the inner cavity of the ring cylinder one, and the main anode is fixed on the insulation plate one. The application prolongs the service life of the main cathode, reduces the substrate pollution, adopts the sputtering low-yield materials such as graphite and alumina ceramics for the auxiliary cathode, shields the easy-to-be-bombed area of the main cathode, shares the discharge current, reduces the etching rate of the main cathode, prolongs the service life by several times, greatly reduces the cathode sputtering material, effectively avoids the metal impurity deposition and substrate pollution, significantly improves the product yield, and reduces the maintenance cost and downtime of the cathode replacement.

Description

Technical Field

[0001] This invention relates to the field of anode layer ion source technology, and in particular to a highly stable anode layer ion source based on auxiliary regulation. Background Technology

[0002] Anode layer ion sources are core equipment in precision machining fields such as coating and etching.

[0003] However, in practical applications, there are still some unresolved problems. The following are some common problems of anode layer ion sources: First, the cathode sputtering is severe and the lifespan is short. The iron sputtered from the cathode will contaminate the substrate. The discharge ions bombard the inner and outer cathodes under the action of the electric field, causing the cathode material to sputter and mix into the beam to contaminate the workpiece (such as the deposition of metal impurities). Moreover, as the beam current increases, long-term etching leads to cathode wear, which requires frequent replacement, increasing maintenance costs and downtime.

[0004] Second, insufficient discharge stability and excessively high plasma density in the beam concentration area can cause arcing on the anode or cathode surface, leading to process interruption and parameter drift. Reactive gases such as oxygen and nitrogen can easily cause the deposition of insulating components and surface insulation failure, exacerbating discharge instability and affecting the ion-assisted deposition effect.

[0005] Third, the beam uniformity and film thickness uniformity are poor. The uniformity of the ion beam is greatly affected by the magnetic field and the gas supply structure. After long-term operation, it will lead to poor consistency of coating or etching processes, reduced product yield, and shortened equipment life.

[0006] Although ion beams can improve the aforementioned problems to some extent through structural optimization, material upgrades, improved gas path structures, and electromagnetic field control, they still cannot meet actual production needs in certain application scenarios. Summary of the Invention

[0007] The purpose of this section is to outline some aspects of embodiments of the present invention and to briefly describe some preferred embodiments. Simplifications or omissions may be made in this section, as well as in the abstract and title of this application, to avoid obscuring the purpose of these documents; however, such simplifications or omissions should not be construed as limiting the scope of the invention.

[0008] In view of the problems existing in the above and / or existing high-stability anode layer ion sources based on auxiliary electrode regulation, the present invention is proposed.

[0009] Therefore, the problem to be solved by this invention is how to address the issues of severe sputtering of the main cathode, short lifespan and sputtered material contamination of the substrate, high maintenance costs, electric field distortion and plasma diffusion in the discharge area, easy arcing, poor discharge stability, poor ion beam uniformity, uneven film thickness and etching effect, and low process consistency.

[0010] To solve the above-mentioned technical problems, the present invention provides the following technical solution: a highly stable anode layer ion source based on auxiliary regulation, comprising: an ion source mechanism including a base plate, on which a first annular cylinder and a second annular cylinder are respectively fixed, with the second annular cylinder located outside the first annular cylinder; an insulating plate first, located between the first annular cylinder and the second annular cylinder, and fixed to the base plate; an insulating plate second, located in the inner cavity of the first annular cylinder, and fixed to the base plate; a main anode, fixed to the insulating plate first; a main cathode unit, fixed to the first and second annular cylinders, including a main cathode first, a main cathode second, and a slit, wherein: the first main cathode is fixed to the second annular cylinder, the second main cathode is fixed to the first annular cylinder, and the slit is formed through the gap between the first and the second main cathodes; and an auxiliary electrode unit, disposed on the ion source mechanism.

[0011] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, the auxiliary electrode unit includes an auxiliary electrode, graphite, adjustment components, and a mounting base. The auxiliary electrodes are a plurality of units arranged in a circular array. The graphite is a plurality of units, each corresponding to and fixed on a plurality of auxiliary electrodes. The mounting base is fixed on an insulating plate. The adjustment components are a plurality of units arranged in a circular array and fixed on the mounting base. The plurality of auxiliary electrodes are respectively fixed on a plurality of adjustment components.

[0012] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, wherein: an annular groove is formed inside the auxiliary electrode, and a flow guide hole distributed in a circular array is formed on the auxiliary electrode, and the flow guide hole is connected to the annular groove; a connector is fixed on the auxiliary electrode, and one end of the connector is connected to the annular groove; an L-shaped arc plate is fixed on the outer ring surface of the auxiliary electrode; and a docking block is fixed on the inner ring surface of the auxiliary electrode, and the docking block is installed on the adjustment assembly.

[0013] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, the mounting base is provided with mounting grooves arranged in a circumferential array, and the inner wall of the mounting groove is provided with symmetrically distributed slots, the mounting grooves and slots respectively cooperating with the adjustment component.

[0014] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode control according to the present invention, the adjustment component includes cylinders arranged in a circumferential array, wherein: an adjustment component is installed on the cylinder, a knob is fixed on the adjustment component, a positioning component is installed on the knob and the positioning component cooperates with the knob, an unlocking ring is slidably sleeved on the knob, a locking component is fixed at one end of the cylinder and the locking component cooperates with the mounting groove and the slot respectively, a driving component is installed on the adjustment component, the knob and the locking component and the driving component cooperates with the locking component, and the unlocking ring cooperates with the positioning component and the driving component respectively.

[0015] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, wherein: circular grooves are provided inside both ends of the cylinder, and a positioning groove distributed in a circumferential array is provided on the surface of one end of the cylinder, and the positioning groove cooperates with the positioning component; the adjusting component includes a circular rod rotating on the cylinder, and one end of the circular rod is fixed to the surface of the knob, a screw groove is provided on the surface of the circular rod, a moving block slides on the cylinder, and the moving block is slidably sleeved on the surface of the circular rod, a ball is embedded in the inner wall of the moving block, and the ball slides in the screw groove; torsion springs are sleeved on both ends of the circular rod, and the two ends of the torsion springs are respectively fixed to the surface of the circular rod and the inner wall of the circular groove.

[0016] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, the knob has a groove inside, the positioning element includes slots arranged in a circular array on the knob, a positioning plate sliding in the slots and cooperating with the positioning grooves, a square groove arranged in a circular array on the knob and communicating with the slot, a square plate sliding in the square groove and penetrating the positioning plate, a guide hole on the positioning plate, short pillars symmetrically distributed on the surface of the square plate and sliding in the guide hole, a ball bearing embedded at one end of the square plate and cooperating with an unlocking ring, and a spring fixed between the end of the square plate away from the ball bearing and the inner wall of the square groove.

[0017] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation described in this invention, wherein: the surface of the unlocking ring is provided with an unlocking surface one and an unlocking surface two, and the unlocking surface one cooperates with a ball bearing one, the unlocking surface two cooperates with a driving component, and the unlocking ring is provided with a limiting groove distributed in a circumferential array, and the limiting groove cooperates with a square plate one.

[0018] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, the locking component includes a post inserted into the mounting groove and the post is fixed to one end of the cylinder. The post has a slot, and a locking block and a square block slide in the slot respectively. The locking block cooperates with the slot. The square block has a second guide hole on its surface. The locking block has a second short post fixed on its surface and slides in the second guide hole.

[0019] As a preferred embodiment of the high-stability anode layer ion source based on auxiliary electrode regulation according to the present invention, the driving component includes a cone that slides within the tank. A connecting rod slides on the round rod, knob, cylinder, and insert post, with one end of the connecting rod rotating on the cone and the other end rotating on the block. A second square plate arranged in a circular array slides on the knob, and a second ball bearing is embedded at one end of the second square plate. The second ball bearing cooperates with the second unlocking surface.

[0020] The beneficial effects of this invention are as follows: 1. It extends the lifespan of the main cathode and reduces substrate contamination. The auxiliary cathode uses materials with low sputtering yield, such as graphite and alumina ceramic, to shield the area of ​​the main cathode that is easily bombarded and share the discharge current, thereby reducing the etching rate of the main cathode and extending its lifespan by several times. At the same time, it significantly reduces cathode sputterings, effectively avoids the deposition of metal impurities that contaminate the substrate, significantly improves product yield, and reduces the maintenance cost and downtime of cathode replacement.

[0021] 2. Improve discharge stability, reduce arcing, and assist the anode to compensate for the electric field distortion at the edge of the main discharge area, confining the plasma in the core area and reducing ineffective discharge; at the same time, collect stray electrons and guide them back to the power supply circuit, reducing cathode temperature rise and substrate overheating, resulting in a lower substrate temperature rise and a more stable discharge current. The uniform gas supply structure matched with the auxiliary electrode avoids density fluctuations in the plasma due to uneven gas distribution, further improving discharge stability and significantly reducing arcing and process interruptions.

[0022] 3. Optimize beam uniformity and improve process consistency. The auxiliary electrodes are arranged in a circular array and equipped with independently adjustable adjustment components, which can accurately compensate for local electric field distortion and solve the problem of "strong center and weak edge" of ion beam. This improves the beam uniformity of large-area linear sources. The optimization of beam uniformity directly improves the consistency of film thickness and etching effect, improves the overall quality of coating, etching and other processes, and increases product yield. Attached Figure Description

[0023] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the following description of the embodiments will be briefly introduced. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 This is a scene diagram of a highly stable anode layer ion source based on auxiliary electrode regulation.

[0025] Figure 2 This is a partial cross-sectional plan view of a highly stable anode layer ion source based on auxiliary electrode regulation.

[0026] Figure 3 This is a three-dimensional cross-sectional view of a high-stability anode layer ion source based on auxiliary electrode regulation.

[0027] Figure 4 For a highly stable anolyte ion source based on auxiliary electrode regulation Figure 3 Enlarged view of region A in the middle.

[0028] Figure 5 For a highly stable anolyte ion source based on auxiliary electrode regulation Figure 3Enlarged view of region B in the middle.

[0029] Figure 6 A three-dimensional, analytical view of the local structure of a highly stable anode layer ion source based on auxiliary electrode regulation.

[0030] Figure 7 This is a partial cross-sectional stereoscopic view of the unlocking ring of a highly stable anode layer ion source based on auxiliary electrode regulation.

[0031] Figure 8 This is a partial cross-sectional three-dimensional view of the card block and insertion column of a high-stability anode layer ion source based on auxiliary electrode regulation.

[0032] Figure 9 This is a partial cross-sectional stereoscopic view of the auxiliary electrode of a highly stable anode layer ion source based on auxiliary electrode regulation.

[0033] Figure 10 Stereoscopic decomposition of block and card-shaped ion sources for high-stability anode layer ion sources based on auxiliary electrode modulation Figure 1 .

[0034] Figure 11 Stereoscopic decomposition of block and card-shaped ion sources for high-stability anode layer ion sources based on auxiliary electrode modulation Figure 2 .

[0035] In the diagram: 1. Ion source mechanism; 11. Base plate; 12. Ring cylinder one; 13. Ring cylinder two; 14. Insulating plate one; 15. Insulating plate two; 16. Main anode; 17. Main cathode unit; 171. Main cathode one; 172. Main cathode two; 173. Slit; 2. Auxiliary electrode unit; 21. Auxiliary electrode; 22. Graphite; 23. Adjustment assembly; 24. Mounting base; 211. Ring groove; 212. Guide hole; 213. Connector; 214. L-shaped arc plate; 2 15. Connecting block; 241. Mounting groove; 242. Slot; 231. Cylinder; 232. Adjusting component; 233. Knob; 234. Positioning component; 235. Unlocking ring; 236. Locking component; 237. Driving component; 238. Sealing retaining ring; 2311. Circular groove; 2312. Positioning groove; 2321. Circular rod; 2322. Moving block; 2323. Screw groove; 2324. Ball bearing; 2325. Torsion spring; 2326. Sealing curtain; 2331. 2341. Groove; 2342. Positioning plate; 2343. Square groove; 2344. Square plate one; 2345. Guide hole one; 2346. Short post one; 2347. Ball bearing one; 2348. Spring one; 2349. Slide groove one; 23410. Slider one; 23411. Spring piece; 23412. Anti-detachment groove; 23413. Anti-detachment block; 2351. Unlocking surface one; 2352. Unlocking surface two; 2353. Limiting groove; 2361. Insert post ; 2362, Hole and Groove; 2363, Locking Block; 2364, Square Block; 2365, Guide Hole II; 2366, Short Column II; 2367, Slide Groove II; 2368, Slider II; 2369, Spring II; 2371, Cone; 2372, Connecting Rod; 2373, Square Plate II; 2374, Ball Bearing II; 2375, Roller; 2376, Spring III; 2377, Slide Groove III; 2378, Slider III; 2379, Spring IV; 23710, Abutment Ring. Detailed Implementation

[0036] To make the above-mentioned objects, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0037] Many specific details are set forth in the following description in order to provide a full understanding of the invention. However, the invention may also be practiced in other ways different from those described herein, and those skilled in the art can make similar extensions without departing from the spirit of the invention. Therefore, the invention is not limited to the specific embodiments disclosed below.

[0038] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The phrase "in one embodiment" appearing in different places in this specification does not necessarily refer to the same embodiment, nor is it a single or selective embodiment that is mutually exclusive with other embodiments.

[0039] Example 1, referring to Figure 1 and Figure 2 This is the first embodiment of the present invention. This embodiment provides a highly stable anode layer ion source based on auxiliary control. The highly stable anode layer ion source based on auxiliary control includes an ion source mechanism 1 and an auxiliary electrode unit 2.

[0040] Specifically, the ion source mechanism 1 includes a base plate 11, on which a first annular cylinder 12 and a second annular cylinder 13 are fixed respectively, with the second annular cylinder 13 located outside the first annular cylinder 12; an insulating plate 14 located between the first annular cylinder 12 and the second annular cylinder 13 and fixed to the base plate 11; an insulating plate 15 located inside the first annular cylinder 12 and fixed to the base plate 11; a main anode 16 fixed to the insulating plate 14; a main cathode unit 17 fixed to the first annular cylinder 12 and the second annular cylinder 13, including a first main cathode 171, a second main cathode 172 and a slit 173, wherein: the first main cathode 171 is fixed to the second annular cylinder 13, the second main cathode 172 is fixed to the first annular cylinder 12, and the slit 173 is formed through the gap between the first main cathode 171 and the second main cathode 172; and an auxiliary electrode unit 2 disposed on the ion source mechanism 1.

[0041] When the auxiliary electrode unit 2 is at a positive potential, typically 0~+500V, it can be grounded or connected to an independent power supply. Its potential is higher than that of the main cathode and lower than that of the main anode 16, and it is the auxiliary anode. The auxiliary anode can be connected to an independent power supply or grounded. The material of the auxiliary electrode 21, which serves as the auxiliary anode, should be a metal with good electrical and thermal conductivity, such as stainless steel 304 / 316, copper, or molybdenum, and it should be resistant to plasma corrosion. The auxiliary anode is 5~10mm away from the surface of the main cathode unit 17 and is arranged along the edge or inner and outer sides of the main cathode unit 17 without obstructing the main discharge area.

[0042] When the auxiliary electrode unit 2 is at a negative potential, the same potential as the main cathode unit 17, or ≤-50V, the potential is lower than the main anode 16 and close to the main cathode unit 17, it is the auxiliary cathode. The auxiliary cathode can be at the same potential as the main cathode unit 17 or connected to an independent power supply. The material of the auxiliary cathode is a material with low sputtering yield, high temperature resistance or ion bombardment resistance, such as alumina ceramic, graphite, molybdenum alloy, tantalum. The auxiliary cathode is close to the easily bombarded area of ​​the main cathode unit 17, such as the end face or edge, or embedded in the structure of the main cathode unit 17 to form a "shielding sleeve or auxiliary electrode".

[0043] Example 2, refer to Figures 2-9 This is the second embodiment of the present invention, which is based on the previous embodiment.

[0044] Specifically, the auxiliary electrode unit 2 includes auxiliary electrodes 21, graphite 22, adjustment components 23, and mounting base 24. There are several auxiliary electrodes 21 arranged in a circular array, several graphite 22 are fixed on the multiple auxiliary electrodes 21 respectively, the mounting base 24 is fixed on the insulating plate 15, several adjustment components 23 are fixed on the mounting base 24 in a circular array, and the multiple auxiliary electrodes 21 are fixed on the multiple adjustment components 23 respectively.

[0045] Multiple auxiliary electrodes 21 can be combined to form a complete annular auxiliary electrode structure. When the graphite 22 is at a positive potential, it is the auxiliary anode. The functions of the auxiliary anode are: 1. To reduce edge discharge. The electric field between the main cathode unit 17 (negative) and the main anode 16 (positive) is easily distorted at the cathode edge, causing the plasma to diffuse towards the cathode edge and form ineffective discharge. The auxiliary anode (positive) can compensate for the edge electric field distortion and confine the plasma to the core region of the anode layer. The narrow slit between the main anode 16 and the main cathode unit 17 reduces non-uniform discharge at the cathode edge. With less edge sputtering, there is less contamination of the substrate film.

[0046] Second, it collects stray electrons and reduces the risk of arcing. High-energy electrons in the discharge zone are prone to deviate from the main path and bombard the cathode, substrate or cavity wall, resulting in cathode temperature rise, substrate overheating and discharge current fluctuation. The auxiliary anode (positive) attracts and collects stray electrons through Coulomb force and guides them back to the power supply circuit, reducing ineffective electron bombardment. The auxiliary anode can improve the controllability of substrate temperature, reduce temperature rise by 15% to 25%, and make the discharge current more stable.

[0047] Third, optimize the uniformity of ion beam. By adjusting the position, width and potential of the auxiliary anode, the lateral electric field distribution is balanced, avoiding the problem of "strong center and weak edge" of the ion beam. After adding the auxiliary anode, the beam uniformity of the large-area linear source can be improved to within ±5%, and the uniformity of film thickness or cleaning is significantly improved.

[0048] When graphite 22 is at a negative potential, it becomes the auxiliary cathode. The functions of the auxiliary cathode are: 1. To suppress the etching of the main cathode unit 17 and extend its lifespan. The main cathode unit 17 is usually made of stainless steel, molybdenum, etc., which are easily sputtered by high-energy ions, leading to material loss and film contamination. The auxiliary cathode uses materials with low sputtering yield, such as alumina ceramic, graphite, and molybdenum alloy, and is placed in the area of ​​the main cathode unit 17 that is easily bombarded. It shields the main cathode unit 17 from direct bombardment by high-energy ions and shares part of the discharge current. Under the same potential, the current is evenly distributed. The auxiliary cathode can reduce the etching rate of the main cathode unit 17 by 50% to 60%, extend its lifespan by several times, and significantly reduce film contamination and cathode sputtering.

[0049] 2. Correcting ion trajectories and improving beam directionality: By fine-tuning the magnetic field gradient, ions are guided to move perpendicularly to the anode layer along the main acceleration direction, reducing ion divergence. The auxiliary cathode can reduce the ion beam divergence angle, improve energy utilization, and provide better directionality for cleaning or deposition, making it suitable for deep holes and complex morphological workpieces.

[0050] With the segmented structure, the corresponding adjustment component 23 can independently adjust the radial position of the single-segment auxiliary electrode 21 to accurately compensate for local electric field distortion. For example, if the beam current is weak in a certain area, the corresponding anode plate is finely adjusted to be closer to the main cathode unit 17. Compared with the integral anode, the beam current uniformity is further improved. The adjustment component 23 is made of insulating material.

[0051] Specifically, the auxiliary electrode 21 has an annular groove 211 inside, and a flow guide hole 212 arranged in a circular array on the auxiliary electrode 21, and the flow guide hole 212 communicates with the annular groove 211. A connector 213 is fixed on the auxiliary electrode 21, and one end of the connector 213 communicates with the annular groove 211. An L-shaped arc plate 214 is fixed on the outer ring surface of the auxiliary electrode 21, and a docking block 215 is fixed on the inner ring surface of the auxiliary electrode 21, and the docking block 215 is installed on the adjustment component 23.

[0052] An inclined guide surface is provided on the inner side of the auxiliary electrode 21, facing the slit 173 of the main discharge area. The inclined guide surface guides the plasma to converge towards the main discharge area, reducing edge diffusion. The surface of the L-shaped arc plate 214 is provided with honeycomb grooves. The honeycomb grooves enhance the electron adsorption capacity and further reduce cathode bombardment and substrate temperature rise. The annular groove 211 is connected to the external gas supply pipe through the connector 213. After the gas is diverted through the annular groove 211, it is uniformly injected into the main discharge area through the guide hole 212. It works in conjunction with the electric field confinement of the auxiliary anode to avoid density fluctuations in plasma caused by uneven gas distribution and improve discharge stability.

[0053] Specifically, the mounting base 24 has mounting slots 241 arranged in a circular array, and the inner wall of the mounting slots 241 has symmetrically distributed slots 242. The mounting slots 241 and the slots 242 respectively cooperate with the adjustment components 23. The number of mounting slots 241 is the same as the number of adjustment components 23. Two slots 242 are provided in one mounting slot 241. The mounting slots 241 and the slots 242 provide positions for the installation of the adjustment components 23 and lock them together.

[0054] Specifically, the adjustment component 23 includes cylinders 231 arranged in a circumferential array. An adjustment component 232 is installed on the cylinder 231. By adjusting the adjustment component 232, the radial position of a single docking block 215, an auxiliary electrode 21, and the graphite 22 on it can be adjusted by rotating the knob 233. This accurately compensates for local electric field distortion. For example, if the beam current is weak in a certain area, the corresponding anode plate can be finely adjusted to be closer to the main cathode unit 17 or further away. Compared with the integral anode, the beam current uniformity is further improved. The adjustment component 232 is fixed with a knob 233.

[0055] A positioning element 234 is installed on the knob 233, and the positioning element 234 cooperates with the knob 233. The positioning element 234 enables the knob 233 to rotate in one direction. After the adjustment element 232 is adjusted, it limits the knob 233 and the adjustment element 232. An unlocking ring 235 is slidably sleeved on the knob 233. The unlocking ring 235 releases the limit on the knob 233 and the adjustment element 232 by operating the positioning element 234, which can automatically reset the knob 233. After a certain degree of operation, the knob 233 and the adjustment element 232 can be rotated in the opposite direction to adjust the radial position of the corresponding single auxiliary pole 21 and the graphite 22 on it.

[0056] A locking element 236 is fixed to one end of the cylinder 231, and the locking element 236 cooperates with the mounting groove 241 and the slot 242 respectively. By setting the locking element 236, it is inserted into the mounting groove 241 on the mounting base 24, which facilitates the installation of the entire adjustment assembly 23 and makes the installation convenient and quick. A driving element 237 is installed on the adjusting element 232, the knob 233 and the locking element 236, and the driving element 237 cooperates with the locking element 236. The unlocking ring 235 cooperates with the positioning element 234 and the driving element 237 respectively. A sealing ring 238 rotates between the surface of the cylinder 231 and the surface of the knob 233. By setting the driving element 237, when the unlocking ring 235 is operated to act on the driving element 237, the locking element 236 can be released from the fixing in the mounting groove 241 and the slot 242 on the mounting base 24, which facilitates individual disassembly, maintenance or replacement.

[0057] Example 3, referring to Figures 2 to 11 This is the third embodiment of the present invention, which is based on the first two embodiments.

[0058] Specifically, both ends of the cylinder 231 are provided with circular grooves 2311, and one end of the cylinder 231 is provided with positioning grooves 2312 arranged in a circumferential array, and the positioning grooves 2312 cooperate with the positioning component 234; the adjusting component 232 includes a circular rod 2321 that rotates on the cylinder 231, and one end of the circular rod 2321 is fixed to the surface of the knob 233. The surface of the circular rod 2321 is provided with a threaded groove 2323. A moving block 2322 slides on the cylinder 231 and is slidably sleeved on the surface of the circular rod 2321. The circular rod 2321 is rotatably connected to the cylinder 231 through a sealed bearing. The cylinder 231 is provided with a moving hole that cooperates with the movement of the moving block 2322, and the moving block 2322 and the moving hole are sealed.

[0059] The inner wall of the movable block 2322 is embedded with a ball 2324, which slides in the screw groove 2323. The ball 2324 is rotatably connected to the inner wall of the movable block 2322. Both ends of the round rod 2321 are fitted with torsion springs 2325, and the two ends of the torsion springs 2325 are respectively fixed to the surface of the round rod 2321 and the inner wall of the round groove 2311. A sealing curtain 2326 is provided between the surface of the movable block 2322 and the surface of the cylinder 231. The docking block 215 is inserted into the movable block 2322 and fixed by bolts. With the setting of the screw groove 2323, when the knob 233 is turned to rotate the round rod 2321, the round rod 2321 can move in the screw groove 2323, thereby moving and adjusting the position of the movable block 2322, the docking block 215, the auxiliary electrode 21 and the graphite 22.

[0060] By setting the torsion spring 2325, it deforms when the round rod 2321 rotates, providing a force for the round rod 2321 to reset. Under the unidirectional rotation positioning of the positioning member 234 and the positioning groove 2312, the round rod 2321 can be limited after rotation adjustment, thereby limiting the suspension of the ball 2324 and the moving block 2322, so that the corresponding auxiliary pole 21 and graphite 22 are in the adjusted position. The sealing curtain 2326 is located in the moving hole and will not leave the moving hole. It can seal the moving block 2322 with the moving hole on the cylinder 231 when the moving block 2322 moves. The moving block 2322 is provided with a slot for the mating block 215 to be inserted. The moving block 2322 and the mating block 215 are detachably fixed by bolts.

[0061] Specifically, the knob 233 has a groove 2331 inside, and the positioning component 234 includes slots 2341 arranged in a circular array on the knob 233. A positioning plate 2342 slides in the slots 2341 and cooperates with the positioning groove 2312. The knob 233 has square slots 2343 arranged in a circular array and communicates with the slots 2341. A square plate 2344 slides in the square slots 2343 and passes through the positioning plate 2342. A guide hole 2345 is provided on the positioning plate 2342. Short posts 2346 are fixed on the surface of the square plate 2344 and slide in the guide hole 2345.

[0062] One end of the square plate 2344 is fitted with a ball bearing 2347, which cooperates with the unlocking ring 235. A spring 2348 is fixed between the end of the square plate 2344 away from the ball bearing 2347 and the inner wall of the square groove 2343. A sliding groove 2349 is opened on the inner wall of the slot 2341. A slider 23410 is fixed on the positioning plate 2342 and slides in the sliding groove 2349. A spring piece 23411 is fixed between the surface of the positioning plate 2342 and the inner wall of the slot 2341. An anti-detachment groove 23412 is opened on the inner wall of the square groove 2343. An anti-detachment block 23413 is fixed on the square plate 2344 and slides in the anti-detachment groove 23412.

[0063] Both the positioning plate 2342 and the square plate 2344 are sealed to the knob 233. The positioning plate 2342 has an inclined surface at one end outside the knob 233 and inside the positioning groove 2312. With this design, when the knob 233 is rotated to make the round rod 2321 rotate, the positioning plate 2342 is rotated and squeezed by the positioning groove 2312, causing the positioning plate 2342 to move into the groove 2341. At the same time, the spring piece 23411 deforms. After the positioning plate 2342 is removed from the original positioning groove 2312, with the rotation, the spring piece 23411 causes the positioning plate 2342 to be inserted into the next positioning groove 2312. This process is repeated in one direction until the knob 233 rotates and drives the round rod 2321 to rotate, thus completing the adjustment of the position of the auxiliary pole 21 and the graphite 22.

[0064] During this process, when the short column 2346 moves relative to the guide hole 2345 on the moving positioning plate 2342, it will not obstruct the normal movement of the positioning plate 2342. The spring 2348 is compressed when the square plate 2344 moves, providing force for subsequent reset. The sliding groove 2349 and the slider 23410 guide and limit the positioning plate 2342. The spring piece 23411 deforms when the positioning plate 2342 moves, providing force for subsequent reset of the positioning plate 2342. The anti-detachment groove 23412 and the anti-detachment block 23413 guide and limit the square plate 2344, allowing the square plate 2344 to move within a certain range.

[0065] Specifically, the surface of the unlocking ring 235 is provided with an unlocking surface 2351 and an unlocking surface 2352, and the unlocking surface 2351 cooperates with the ball 2347, the unlocking surface 2352 cooperates with the drive component 237, and the unlocking ring 235 is provided with a limiting groove 2353 distributed in a circular array, and the limiting groove 2353 cooperates with the square plate 2344.

[0066] Both unlocking surface 2351 and unlocking surface 2352 are annular surfaces. The unlocking ring 235 can slide and rotate on the knob 233. The end of the square plate 2344 where the ball bearing 2347 is mounted is chamfered. Through the arrangement of the ball bearing 2347 and unlocking surface 2351, when it is necessary to reset or finely adjust a single auxiliary electrode 21 and graphite 22, the unlocking ring 235 is operated to bring the unlocking surface 2351 into contact with the surface of the ball bearing 2347. As it continues to move, it can compress the ball bearing 2347 and the square plate 2344, causing the short column 2346 to move within the guide hole 2345 and compress the positioning plate 2342. This causes the positioning plate 2342 to move away from the positioning groove 2312. Under the action of the torsion spring 2325, the ball bearing 2347, the round rod 2321, and the knob 233 rotate, thereby resetting the auxiliary pole 21 and the graphite 22. The ball bearing 2347 can reduce the resistance between them.

[0067] With the setting of the limiting groove 2353, when no reset is required and only the positions of the auxiliary pole 21 and graphite 22 need to be finely adjusted by moving back, the quick-moving unlocking ring 235 acts on the square plate 2344 and the ball bearing 2347, placing the end of the square plate 2344 with the ball bearing 2347 installed in the limiting groove 2353, and the positioning plate 2342 has been disengaged from the positioning groove 2312. The unlocking ring 235 can be rotated to make the square plate 2344 and the knob 233 rotate, which can be rotated in both directions, thereby making the round rod 2321 rotate, and adjusting the positions of the auxiliary pole 21 and graphite 22.

[0068] Specifically, the locking component 236 includes a post 2361 inserted into the mounting groove 241, and the post 2361 is fixed to one end of the cylinder 231. The post 2361 has a slot 2362, and a locking block 2363 and a square block 2364 slide in the slot 2362 respectively. The locking block 2363 cooperates with the slot 242. The surface of the square block 2364 has a guide hole 2365. A short post 2366 is fixed on the surface of the locking block 2363, and the short post 2366 slides in the guide hole 2365.

[0069] The insertion post 2361 and the mounting base 24 are sealed. One end of the insertion post 2361 is chamfered to facilitate insertion into the mounting groove 241. The end of the locking block 2363 that mates with the locking groove 242 is provided with a first inclined surface and a second inclined surface. With the first inclined surface, when the insertion post 2361 is inserted into the mounting groove 241, the first inclined surface on the locking block 2363 contacts the mounting base 24 and is squeezed, causing the locking block 2363 to move into the hole groove 2362. After the insertion post 2361 is inserted into the mounting groove 241, the locking block 2363 is inserted into the locking groove 242 under the action of the second spring 2369. During this process, the second short post 2366 moves in the second guide hole 2365, and the block 2364 will not move.

[0070] By setting the second inclined plane, when the block 2364 moves and drives the second guide hole 2365 to move, it can squeeze the second short post 2366 to move, thereby driving the locking block 2363 to move into the slot 2362, gradually disengaging from the slot 242. Then, under the squeezing action of the second inclined plane, the locking block 2363 is continuously moved into the slot 2362 and disengaged from the slot 242, so the insertion post 2361 can be removed to complete the disassembly.

[0071] The inner wall of the slot 2362 is provided with a second sliding groove 2367. A second slider 2368 is fixed on the surface of the locking block 2363, and the second slider 2368 slides in the second sliding groove 2367. A second spring 2369 is fixed between the surface of the second slider 2368 and the inner wall of the second sliding groove 2367. The second slider 2368 and the second sliding groove 2367 guide and limit the locking block 2363, so that the locking block 2363 can move within a certain range. With the setting of the second spring 2369, the second slider 2368 deforms when it moves with the locking block 2363, providing a force for the subsequent reset of the second slider 2368 and the locking block 2363.

[0072] Specifically, the driving component 237 includes a cone 2371 that slides in the groove 2331, a connecting rod 2372 that slides on the round rod 2321, the knob 233, the cylinder 231 and the insert 2361, one end of the connecting rod 2372 that rotates on the cone 2371 and the other end that rotates on the block 2364, a second square plate 2373 that slides on the knob 233 in a circular array, and a second ball 2374 that is embedded at one end of the second square plate 2373, the second ball 2374 that cooperates with the second unlocking surface 2352.

[0073] A seal is made between the square plate 2373 and the knob 233. The connecting rod 2372 passes through the round rod 2321, the knob 233, the cylinder 231 and the insert 2361 and is slidably connected to them. By setting the ball 2374, the unlocking ring 235 moves towards the square plate 2373, so that the unlocking surface 2352 contacts the surface of the ball 2374, thereby squeezing the ball 2374 and the square plate 2373 to move, so that the roller 2375 contacts the surface of the cone 2371 and squeezes the cone 2371 to move, thereby driving the connecting rod 2372 and the block 2364 to move, releasing the lock in the mounting groove 241 on the mounting base 24 of the locking part 236. It can be removed by pulling it outward. The ball 2374 can reduce the resistance between them.

[0074] A roller 2375 rotates at the end of the square plate 2373 away from the ball bearing 2374, and the roller 2375 cooperates with the cone 2371. A spring 2376 is sleeved on the surface of one end of the connecting rod 2372, and the two ends of the spring 2376 are respectively fixed to the inner wall of the groove 2331 and the surface of the cone 2371. A sliding groove 2377 is opened inside the knob 233. A slider 2378 is fixed on the square plate 2373, and the slider 2378 slides in the sliding groove 2377. A spring 2379 is fixed between the surface of the slider 2378 and the inner wall of the sliding groove 2377. A retaining ring 23710 is fixed on the inner wall of the groove 2331, and the retaining ring 23710 cooperates with the cone 2371.

[0075] The spring 2376 deforms the cone 2371 and connecting rod 2372 as they move, providing force for subsequent reset. The slide groove 2377 and slider 2378 guide and limit the square plate 2373, allowing it to move within a certain range. The spring 2379 deforms the slider 2378 as it moves with the square plate 2373, providing force for subsequent reset of the slider 2378 and square plate 2373. The abutment ring 23710 limits the position of the cone 2371, preventing it from deviating from its initial position during the return movement.

[0076] In use, it is composed of ion source mechanism 1 and auxiliary electrode unit 2 working together. The core achieves high stability and beam optimization of the ion source through potential regulation and position fine adjustment of auxiliary electrode 21. Ion source mechanism 1 is the basic discharge unit, which consists of base plate 11, ring cylinder one 12, ring cylinder two 13, main anode 16, and main cathode unit 17. Main cathode one 171 and main cathode two 172 form a slit 173, which constitutes the main discharge area. Auxiliary electrode unit 2 includes auxiliary electrode 21 in a circumferential array, graphite 22, adjustment component 23 and mounting base 24. The auxiliary electrode 21 has an annular groove 211 inside, and gas is supplied externally through connector 213. Gas is uniformly injected into the main discharge area through guide hole 212 to avoid plasma density fluctuation.

[0077] The auxiliary electrode 21 can switch its working mode through potential control: when the positive potential is 0~+500V, it acts as an auxiliary anode, arranged at the edge of the main cathode unit 17 to compensate for electric field distortion and collect stray electrons; when the negative potential is ≤-50V, it acts as an auxiliary cathode, closely attached to the easily bombarded area of ​​the main cathode unit 17 to shield ion bombardment and correct ion trajectories. At the same time, the adjustment component 23 can independently fine-tune the radial position of a single auxiliary electrode 21 to accurately compensate for local electric field distortion. With the cooperation of the positioning component 234, the unlocking ring 235, and the locking component 236, the auxiliary electrode 21 can also achieve unidirectional positioning, reverse fine-tuning, automatic reset, and quick disassembly and assembly, ensuring control accuracy and maintenance convenience.

[0078] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

Claims

1. A highly stable anolyte ion source based on assisted regulation, characterized in that: include, The ion source mechanism (1) includes a base plate (11), on which ring cylinder one (12) and ring cylinder two (13) are fixed respectively, and ring cylinder two (13) is located outside of ring cylinder one (12); Insulating plate one (14) is located between ring cylinder one (12) and ring cylinder two (13) and is fixed on the base plate (11); Insulating plate two (15) is located in the inner cavity of ring cylinder one (12) and is fixed on bottom plate (11); The main anode (16) is fixed on the insulating plate (14); The main cathode unit (17), which is fixed on the first ring cylinder (12) and the second ring cylinder (13), includes the first main cathode (171), the second main cathode (172), and the slit (173), wherein: The first main cathode (171) is fixed on the second ring cylinder (13), the second main cathode (172) is fixed on the first ring cylinder (12), and the slit (173) is formed through the gap between the first main cathode (171) and the second main cathode (172); An auxiliary electrode unit (2) is disposed on the ion source mechanism (1).

2. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 1, characterized in that: The auxiliary pole unit (2) includes an auxiliary pole (21), graphite (22), an adjustment component (23), and a mounting base (24), wherein: The number of auxiliary poles (21) is several and they are arranged in a circular array. The number of graphite (22) is several and they are respectively fixed on the multiple auxiliary poles (21). The mounting base (24) is fixed on the second insulating plate (15). The number of adjustment components (23) is several and they are arranged in a circular array and fixed on the mounting base (24). The multiple auxiliary poles (21) are respectively fixed on the multiple adjustment components (23).

3. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 2, characterized in that: The auxiliary pole (21) has an annular groove (211) inside. The auxiliary pole (21) has a flow guide hole (212) arranged in a circular array, and the flow guide hole (212) is connected to the annular groove (211). The auxiliary pole (21) is fixed with a connector (213), and one end of the connector (213) is connected to the annular groove (211). The outer ring surface of the auxiliary pole (21) is fixed with an L-shaped arc plate (214), and the inner ring surface of the auxiliary pole (21) is fixed with a docking block (215), and the docking block (215) is installed on the adjustment component (23).

4. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 2, characterized in that: The mounting base (24) has mounting grooves (241) arranged in a circular array, and the inner wall of the mounting grooves (241) has symmetrically distributed slots (242). The mounting grooves (241) and slots (242) respectively cooperate with the adjustment component (23).

5. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 4, characterized in that: The adjustment component (23) includes cylinders (231) arranged in a circumferential array, wherein: An adjusting component (232) is installed on the cylinder (231). A knob (233) is fixed on the adjusting component (232). A positioning component (234) is installed on the knob (233), and the positioning component (234) cooperates with the knob (233). An unlocking ring (235) is slidably sleeved on the knob (233). A locking component (236) is fixed at one end of the cylinder (231), and the locking component (236) cooperates with the mounting groove (241) and the card groove (242) respectively. A driving component (237) is installed on the adjusting component (232), the knob (233) and the locking component (236), and the driving component (237) cooperates with the locking component (236). The unlocking ring (235) cooperates with the positioning component (234) and the driving component (237) respectively.

6. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 5, characterized in that: The cylinder (231) has circular grooves (2311) inside both ends, and a positioning groove (2312) distributed in a circular array is provided on one end surface of the cylinder (231), and the positioning groove (2312) cooperates with the positioning component (234); The adjusting component (232) includes a round rod (2321) that rotates on a cylinder (231), with one end of the round rod (2321) fixed to the surface of a knob (233). A threaded groove (2323) is provided on the surface of the round rod (2321). A movable block (2322) slides on the cylinder (231) and is slidably fitted onto the surface of the round rod (2321). A bead (2324) is embedded in the inner wall of the movable block (2322) and slides in the threaded groove (2323). Torsion springs (2325) are fitted on both ends of the round rod (2321) and both ends of the torsion springs (2325) are fixed to the surface of the round rod (2321) and the inner wall of the groove (2311) respectively.

7. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 6, characterized in that: The knob (233) has a groove (2331) inside. The positioning member (234) includes slots (2341) arranged in a circular array on the knob (233). A positioning plate (2342) slides in the slots (2341) and cooperates with the positioning groove (2312). The knob (233) has square slots (2343) arranged in a circular array and communicates with the slots (2341). A square plate (2344) slides in the square slots (2343) and the square plate (2344) slides in the square slots (2343). 4) A through positioning plate (2342) is provided with a guide hole (2345). A short column (2346) is fixed on the surface of the square plate (2344) and is symmetrically distributed. The short column (2346) slides in the guide hole (2345). A ball (2347) is embedded at one end of the square plate (2344) and cooperates with the unlocking ring (235). A spring (2348) is fixed between the end of the square plate (2344) away from the ball (2347) and the inner wall of the square groove (2343).

8. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 7, characterized in that: The surface of the unlocking ring (235) is provided with an unlocking surface one (2351) and an unlocking surface two (2352), and the unlocking surface one (2351) cooperates with the ball one (2347), the unlocking surface two (2352) cooperates with the driving component (237), and the unlocking ring (235) is provided with a limiting groove (2353) distributed in a circular array, and the limiting groove (2353) cooperates with the square plate one (2344).

9. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 8, characterized in that: The locking component (236) includes a pin (2361) inserted into the mounting groove (241) and the pin (2361) is fixed to one end of the cylinder (231). The pin (2361) has a slot (2362) and a block (2363) and a square block (2364) slide in the slot (2362). The block (2363) cooperates with the slot (242). The square block (2364) has a guide hole (2365) on its surface. The block (2363) has a short post (2366) fixed on its surface and slides in the guide hole (2365).

10. The high-stability anode layer ion source based on auxiliary electrode regulation as described in claim 9, characterized in that: The driving component (237) includes a cone (2371) that slides in the groove (2331). A connecting rod (2372) slides on the round rod (2321), the knob (233), the cylinder (231), and the insert (2361). One end of the connecting rod (2372) rotates on the cone (2371), and the other end rotates on the block (2364). A square plate (2373) arranged in a circular array slides on the knob (233). A ball bearing (2374) is embedded at one end of the square plate (2373). The ball bearing (2374) cooperates with the unlocking surface (2352).

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