Extreme ultraviolet time-delay compensated monochromator, processing method, electronic equipment

Abstract

This invention discloses an extreme ultraviolet (EUV) time-delay compensated monochromator, processing method, and electronic device, relating to the field of EUV light processing technology. The monochromator includes: a first optical structure comprising a first planar blazed grating and a first ring mirror, wherein the first planar blazed grating is used to split and diffract the incident light, and the first ring mirror is used to focus and reflect the beam; a second optical structure comprising a second planar blazed grating and a second ring mirror, wherein the second planar blazed grating is used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second ring mirror is used to focus and reflect the beam; and a slit plane, disposed between the first and second optical structures to ensure symmetry, for filtering the beam corresponding to the desired wavelength. This invention solves the technical problem in related technologies where monochromators cannot simultaneously achieve performance indicators such as energy transfer efficiency, spectral resolution, and pulse forward tilt compensation.

Description

Technical Field

[0001] This invention relates to the field of extreme ultraviolet light processing technology, and more specifically, to an extreme ultraviolet time-delay compensated monochromator, processing method, and electronic device. Background Technology

[0002] Extreme ultraviolet (EUV) light, characterized by its short wavelength (10–121 nm), high single-photon energy (12–124 eV), and strong matter-matter interaction capabilities, is primarily used in space astronomical observations and plasma physics research. With the development of various EUV generation technologies, such as synchrotron radiation, free-electron lasers, laser-generated plasma, and high-harmonic generation, EUV radiation is beginning to play a unique role in fields such as photolithography, ultrafast dynamics research, nanoscale imaging, materials science, and quantum technology. For example, EUV light generated by high-harmonic generation has a short wavelength and ultrashort time characteristics, which can be used for coherent diffraction imaging of micro- and nanostructures to detect defects in semiconductor devices. Furthermore, its extremely high temporal resolution, combined with angle-resolved photoemission spectroscopy (ARPES), can be used to observe the evolution of electrons over time, allowing for the study of electron dynamics and band structure in materials. However, since higher harmonics are generated by the interaction between the driving laser and the nonlinear medium, the propagation direction of all generated harmonics is the same as that of the driving laser. Harmonics of different orders are mixed together and propagate coaxially, so different monochromatic methods need to be selected according to experimental requirements.

[0003] Because various optical devices generally exhibit strong absorption characteristics for extreme ultraviolet (EUV) light, the method of using prisms for beam splitting and lenses for focusing is difficult to apply to the EUV and soft X-ray bands. Therefore, the current approach uses reflective gratings to separate the spectrum, then uses concave mirrors for focusing, and finally uses a slit to select the desired wavelength beam.

[0004] However, regardless of whether a classical diffraction geometry grating or a conical diffraction geometry grating is used, using only a single grating will increase the pulse duration. This is because a single grating introduces pulse forward tilt, meaning that beams of the same wavelength emitted from the aperture at different divergence angles will have different optical path lengths after diffraction through different grating lines. Therefore, to reduce or even completely compensate for the pulse forward tilt introduced by a single grating, monochromators based on limiting the beam aperture and reducing the grating line density are called time-preserving monochromators. Monochromators based on compensating for the pulse forward tilt caused by the first grating by introducing a second grating with identical parameters are called time-delay-compensated monochromators.

[0005] In related technologies, the following scheme is adopted to compensate for the pulse forward tilt introduced by grating diffraction (i.e., the time broadening of the beam at different spatial positions due to the optical path difference):

[0006] Figure 1 This is a schematic diagram of an optional time-keeping monochromator in related technologies, such as... Figure 1 As shown, two concave mirrors are used for beam collimation and focusing, a planar grating mounted in classical diffraction geometry is used for beam splitting, and finally, an adjustable slit is used for monochromaticization. This design is simple in structure and can achieve point focusing of the light source. The slit limits the beam aperture to reduce pulse forward tilt. However, because it only uses a single grating mounted in classical diffraction, the overall energy transfer efficiency is low, and the pulse forward tilt is still relatively large (energy transfer efficiency is approximately 10%-20%, and pulse forward tilt is on the order of 100 fs).

[0007] Figure 2 This is a schematic diagram of an optional time-delay compensated monochromator in related technologies, such as... Figure 2 As shown, a pair of concave variable-pitch gratings with identical parameters, mounted in classical diffraction geometry, are used for beam splitting and focusing. A slit is installed at the middle slit position to achieve single-order harmonic beam selection. This design uses the fewest components, has a simple structure, and can achieve point focusing of the light source. The pulse forward tilt introduced by the two gratings can achieve a certain degree of compensation. However, due to the use of classical diffraction geometry to mount the gratings, the overall energy transfer efficiency is extremely low, and the variable-pitch concave gratings are complex to manufacture and costly.

[0008] Figure 3 This is a schematic diagram of another alternative time-delay compensated monochromator in related technologies, such as... Figure 3 As shown, the system consists of two identical parts, each including two concave mirrors and a planar grating (mounted within a conical diffraction geometry). The concave mirrors are used for beam collimation and focusing, while the planar grating is used for beam dispersion and pulse-forward tilt compensation. Spectral monochromaticity is achieved by placing a slit in the central focusing plane. This design enables point focusing of the light source, and the use of conical diffraction geometry for grating mounting results in moderate overall system energy transfer efficiency and good pulse-forward tilt compensation. However, it uses the most components, has a complex structure, makes beam alignment difficult in experiments, and exhibits certain aberrations in the diffraction spectrum.

[0009] Therefore, current extreme ultraviolet and soft X-ray time-keeping and time-delay compensated monochromators cannot simultaneously achieve performance targets in terms of energy transmission efficiency, spectral resolution, pulse pre-tilt compensation, and device complexity.

[0010] There is currently no effective solution to the above problems. Summary of the Invention

[0011] This invention provides an extreme ultraviolet time-delay compensated monochromator, a processing method, and an electronic device to at least solve the technical problem in related technologies that monochromators cannot simultaneously achieve performance indicators such as energy transfer efficiency, spectral resolution, and pulse pre-tilt compensation.

[0012] According to one aspect of the present invention, an extreme ultraviolet time-delay compensated monochromator is provided, comprising: a first optical structure, the first optical structure including: a first planar blazed grating and a first ring mirror, the first planar blazed grating being used to split and diffract incident light, and the first ring mirror being used to focus and reflect the light beam; a second optical structure, the second optical structure including: a second planar blazed grating and a second ring mirror, the second planar blazed grating being used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second ring mirror being used to focus and reflect the light beam; and a slit plane disposed between the first optical structure and the second optical structure, making the first optical structure and the second optical structure symmetrical, the slit plane being used to filter the light beam corresponding to the desired wavelength.

[0013] Furthermore, the first and second planar blazed gratings are composed of equally spaced steps and are mounted with conical diffraction geometry.

[0014] Furthermore, the first and second circular mirrors are configured such that both the object distance and image distance are equal to twice the focal length, and the focal length is determined based on the radius of curvature of the sagittal plane of the circular mirror, the radius of curvature of the meridional plane, and the incident elevation angle of the incident light.

[0015] Furthermore, the first planar blazed grating is positioned one focal length in front of the first annular mirror, and the second planar blazed grating is positioned one focal length behind the second annular mirror. The distances between the first and second annular mirrors and the slit plane are both twice the focal length.

[0016] Furthermore, the first annular mirror is rotated clockwise by a preset angle, and the second annular mirror is rotated counterclockwise by a preset angle. The preset angle is determined based on the grating line spacing, diffraction order, incident elevation angle, and required wavelength.

[0017] Furthermore, by adjusting the mechanical position and opening / closing width of the slit in the slit plane, a beam of light corresponding to the desired wavelength can be transmitted.

[0018] According to another aspect of the present invention, a processing method for an extreme ultraviolet time-delay compensated monochromator is also provided, comprising: determining the incident elevation angle and the desired wavelength of extreme ultraviolet light; determining the azimuth angle of the diffracted light based on the incident elevation angle, the desired wavelength, and the grating line spacing, and determining the initial position of the slit in the slit plane based on the diffracted light azimuth angle and the propagation distance, wherein the propagation distance is determined by the distance between the first planar blazed grating and the first annular mirror; adjusting the initial position to determine the target position of the slit; incident extreme ultraviolet light onto the first planar blazed grating at the incident elevation angle, and filtering beams of different wavelengths diffracted by the first planar blazed grating through the slit located at the target position to obtain a beam of the desired wavelength; propagating the beam of the desired wavelength backward as a new light source, and focusing the beam of the desired wavelength onto the second planar blazed grating after reflection by the second annular mirror to compensate for pulse pre-tilt using the second planar blazed grating; and incident the beam of the desired wavelength, after pulse pre-tilt compensation, onto the focal plane.

[0019] Further, the steps of adjusting the initial position and determining the target position of the slit include: placing a movable mirror behind the slit; incident extreme ultraviolet light at an incident elevation angle into an extreme ultraviolet time-delay compensated monochromator, and moving the mirror to reflect the extreme ultraviolet light to the observation camera; acquiring the spectral distribution through the observation camera; and adjusting the initial position of the slit based on the spectral distribution to obtain the target position.

[0020] Furthermore, before incidenting the extreme ultraviolet light onto the first planar blazed grating at an incident elevation angle, the method further includes: adjusting the optical elements in the extreme ultraviolet time-delay compensated monochromator so that the zero-order beam propagates parallel to the ground between every two optical elements and is focused on the focal plane. The optical elements include: the first planar blazed grating, the first annular mirror, the second planar blazed grating, and the second annular mirror. The zero-order beam refers to the beam whose diffraction order is zero during the grating diffraction process.

[0021] According to another aspect of the present invention, a computer program product is also provided, including a non-volatile computer-readable storage medium storing a computer program, wherein the computer program, when executed by a processor, implements the processing method described above.

[0022] According to another aspect of the present invention, an electronic device is also provided, including one or more processors and a memory, the memory being used to store one or more programs, wherein when the one or more programs are executed by the one or more processors, the one or more processors cause the one or more processors to implement any of the above-described processing methods.

[0023] This invention proposes an extreme ultraviolet time-delay compensated monochromator, comprising: a first optical structure including a first planar blazed grating and a first ring mirror, wherein the first planar blazed grating is used to split and diffract the incident light, and the first ring mirror is used to focus and reflect the light beam; a second optical structure including a second planar blazed grating and a second ring mirror, wherein the second planar blazed grating is used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second ring mirror is used to focus and reflect the light beam; and a slit plane disposed between the first and second optical structures to make the first and second optical structures symmetrical, the slit plane being used to filter the light beam corresponding to the required wavelength, thereby solving the technical problem that monochromators in related technologies cannot simultaneously achieve performance indicators such as energy transmission efficiency, spectral resolution, and pulse forward tilt compensation.

[0024] In this invention, a symmetrical dual-grating-dual-ring mirror structure is adopted. By using a first-plane blazed grating and a second-plane blazed grating mounted under conical diffraction geometry to achieve spectral dispersion and pulse-forward tilt compensation respectively, spectral monochromaticization is achieved in the slit plane. The first and second ring mirrors are used to complete beam focusing and aberration control in a 2f-2f imaging configuration, achieving the goal of confocal convergence of the required wavelength beam in the focal plane. This achieves the technical effects of sub-femtosecond compensation for pulse-forward tilt, mutual cancellation of diffraction and reflection aberrations, and significant improvement in system energy transmission efficiency during extreme ultraviolet spectral monochromaticization. It also achieves synergistic optimization of high temporal resolution, high spectral resolution, and high light flux. Attached Figure Description

[0025] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this invention, illustrate exemplary embodiments of the invention and are used to explain the invention, but do not constitute an undue limitation of the invention. In the drawings:

[0026] Figure 1 This is a schematic diagram of an optional time-keeping monochromator in related technologies;

[0027] Figure 2 This is a schematic diagram of an optional time-delay-compensated monochromator in related technologies;

[0028] Figure 3 This is a schematic diagram of another alternative time-delay compensated monochromator in related technologies;

[0029] Figure 4 This is a schematic diagram of an optional extreme ultraviolet time-delay compensated monochromator according to an embodiment of the present invention;

[0030] Figure 5This is a schematic diagram of two optional diffraction geometries according to an embodiment of the present invention;

[0031] Figure 6 This is a schematic diagram of an optional extreme ultraviolet light introduced into the pulse pre-tilt via grating diffraction according to an embodiment of the present invention;

[0032] Figure 7 This is a schematic diagram of an optional planar blazed grating according to an embodiment of the present invention;

[0033] Figure 8 This is a schematic diagram of an optional ring mirror structure according to an embodiment of the present invention;

[0034] Figure 9 This is a schematic diagram of an optional time-delay-compensated extreme ultraviolet monochromator optical path structure according to an embodiment of the present invention;

[0035] Figure 10 This is a flowchart of an optional processing method according to an embodiment of the present invention;

[0036] Figure 11 This is a hardware structure block diagram of an electronic device (or mobile device) for a processing method according to an embodiment of the present invention. Detailed Implementation

[0037] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0038] It should be noted that the terms "first," "second," etc., used in this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0039] It should be noted that all related information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data used for analysis, stored data, and displayed data) collected and involved in this invention are information and data authorized by the user or fully authorized by all parties. Furthermore, the collection, storage, use, processing, transmission, provision, disclosure, and application of this data comply with the relevant laws, regulations, and standards of the relevant regions, and necessary measures have been taken to ensure compliance with public order and good morals. Corresponding operation entry points are provided for users to choose to authorize or refuse. For example, this system has an interface with relevant users or organizations. Before obtaining relevant information, a request to obtain the information needs to be sent to the aforementioned user or organization through the interface, and the relevant information is obtained only after receiving consent from the aforementioned user or organization.

[0040] This invention proposes a time-delay-compensated monochromator based on conical diffraction geometry for extreme ultraviolet and soft X-ray sources. The monochromator consists of two identical symmetrical parts, each including a concave mirror and a planar grating. The concave mirror focuses the beam, while the grating disperses the beam and compensates for pulse pre-tilt. A slit is placed at the central focal point to achieve spectral monochromaticity. This monochromator can achieve point focusing of the light source. Due to the use of conical diffraction geometry to mount the grating and simultaneously reducing the use of the concave mirror, the overall energy transfer efficiency is highest, and the pulse pre-tilt compensation effect is good. Furthermore, by rotating the ring mirror, the aberration of the beam at the focal point is optimized, improving spectral resolution. Finally, through a unique optical path structure, beams of different wavelengths can be focused at the same position.

[0041] The present invention will now be described in detail with reference to various embodiments.

[0042] Example 1

[0043] According to an embodiment of the present invention, an extreme ultraviolet time-delay compensated monochromator is provided.

[0044] Figure 4 This is a schematic diagram of an optional extreme ultraviolet time-delay compensated monochromator according to an embodiment of the present invention, as shown below. Figure 4 As shown, the monochromator is composed of two identical symmetrical parts. Each part includes a concave mirror and a planar grating. The concave mirror is used for focusing the beam, and the grating is installed with conical diffraction geometry for beam splitting and compensation for pulse pre-tilt. A slit is set at the central focal point to achieve spectral monochromaticity.

[0045] In this embodiment of the invention, different grating mounting methods correspond to two types of diffraction geometry: classical diffraction geometry and conical diffraction geometry.

[0046] Figure 5 This is a schematic diagram of two optional diffraction geometries according to an embodiment of the present invention, such as... Figure 5 As shown, Figure 5 (a) in the diagram represents classical diffraction geometry. In classical diffraction geometry, diffraction occurs in a two-dimensional plane (the two-dimensional plane formed by X and Y), meaning that both the incident beam and the diffracted beam are perpendicular to the grating lines. The corresponding diffraction equation is:

[0047] (1);

[0048] in, α Represents the azimuth angle of the incident light. β Represents the azimuth angle of the diffracted light. d λ represents the grating line spacing, m represents the diffraction order, and λ represents the incident beam wavelength.

[0049] Figure 5 (b) in the diagram represents conical diffraction geometry. In conical diffraction geometry, the diffraction process occurs in three-dimensional space (the three-dimensional space composed of X, Y, and Z). Decomposing the incident beam a yields a component a1 perpendicular to the grating lines and a component a2 parallel to the grating lines. The corresponding diffraction equation is:

[0050] (2);

[0051] in, γ This represents the angle of incidence.

[0052] Compared to classical diffraction, in conical diffraction geometry, the angle between the incident ray and the grating lines... γ The small angle of grazing incidence allows light to reach the shadowed areas that are blocked by the stepped structure under classical diffraction geometry, thereby improving diffraction efficiency. However, at the same time, the small angle of grazing incidence introduces large aberrations and reduces the resolution of the spectrometer.

[0053] Regardless of the method used to install the grating, using only a single grating will increase the pulse duration. This is because a single grating introduces pulse forward tilt, meaning that beams of the same wavelength emitted from the aperture at different divergence angles will have different optical paths after diffraction through different grating lines. Figure 6 This is a schematic diagram of an optional extreme ultraviolet light introduced into the pulse pre-tilt via grating diffraction according to an embodiment of the present invention, as shown below. Figure 6 As shown, Figure 6 (a) is a schematic diagram of the principle of introducing pulse forward tilt in a single grating under classical diffraction geometry. The magnitude of the pulse forward tilt is given by formula (3):

[0054] (3);

[0055] in, It corresponds to the wavelength. N It is the number of grating grooves illuminated by the beam of light. cIt's the speed of light. D It is the incident light aperture. γ It is the altitude angle of the incident ray. d It is the grating line spacing. α Represents the azimuth angle of the incident light. β This represents the azimuth angle of the diffracted light.

[0056] Figure 6 (b) is a schematic diagram of the principle of introducing pulse forward tilt under conical diffraction geometry with a single grating. The magnitude of the pulse forward tilt is given by formula (4):

[0057] (4);

[0058] in, It corresponds to the wavelength. N It is the number of grating grooves illuminated by the beam of light. c It's the speed of light. D It is the incident light aperture. d This refers to the spacing between the grating lines. 1 st The order represents the diffraction beam when the diffraction order is 1, 0 st The order represents the beam reflected when the diffraction order is 0.

[0059] Assuming conical diffraction geometry, when the diameter of the incident light illuminating the grating surface is 1.4 mm and the grating line density is 500 lines / mm, for a harmonic beam with a wavelength of 29.6 nm, the pulse forward tilt introduced by a single grating is 69.1 fs. For femtosecond pulses, this magnitude of pulse broadening would significantly reduce their temporal resolution and peak intensity, disrupting the temporal characteristics of ultrashort pulses.

[0060] In this embodiment of the invention, a time-delay-compensated monochromator technology based on conical diffraction geometry is proposed for extreme ultraviolet and soft X-ray sources. The grating installed with conical diffraction geometry is used to achieve spectral separation and reduce the use of concave mirrors, thereby improving the overall energy transmission efficiency. Furthermore, by having two gratings mutually compensate for the pulse-forward tilt, the reflection aberration of the concave mirror and the diffraction aberration of the grating can be mutually compensated, improving the spectral resolution. In addition, the unique optical path structure can ensure that light spots of different wavelengths can be focused at the same position, improving the convenience of experiments.

[0061] In one optional embodiment, the extreme ultraviolet time-delay compensated monochromator includes: a first optical structure comprising: a first planar blazed grating and a first annular mirror, wherein the first planar blazed grating is used to split and diffract the incident light, and the first annular mirror is used to focus and reflect the light beam; a second optical structure comprising: a second planar blazed grating and a second annular mirror, wherein the second planar blazed grating is used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second annular mirror is used to focus and reflect the light beam; and a slit plane disposed between the first and second optical structures to make the first and second optical structures symmetrical, wherein the slit plane is used to filter the light beam corresponding to the desired wavelength.

[0062] In this embodiment of the invention, the extreme ultraviolet time-delay compensated monochromator is composed of two identical symmetrical parts, namely the first optical structure and the second optical structure.

[0063] The first optical structure includes a first planar blazed grating and a first annular mirror. The first planar blazed grating is a conical diffracting device used to split and diffract incident light. The incident beam illuminates the surface of the first planar blazed grating at a grazing incidence angle γ. The grating has a line density between 50 lines / mm and 5000 lines / mm. Based on the geometry of conical diffraction, it separates incident light of different wavelengths in space at different diffraction angles. The first annular mirror is a focusing optical device used to focus and reflect the beam. The beam, after being diffracted by the first planar blazed grating, travels a distance f and then enters the first annular mirror. The annular mirror has different radii of curvature in the meridional and sagittal planes, and after reflection, it converges the diffracted beams of different wavelengths onto the slit plane.

[0064] The second optical structure includes a second planar blazed grating and a second annular mirror. The second planar blazed grating compensates for the pulse forward tilt introduced by the first planar blazed grating. The beam, after being filtered by the slit, propagates to the second planar blazed grating, which has the same parameters as the first planar blazed grating but is installed in the opposite direction. It receives the beam at the same grazing incidence angle γ to compensate for the pulse forward tilt introduced by the first grating. The second annular mirror focuses and reflects the beam. The beam, diffracted by the second planar blazed grating, propagates to the second annular mirror and is then focused onto the final focal plane after reflection.

[0065] Here, the incident beam has a spectrum in the extreme ultraviolet and soft X-ray bands, with the wavelength range of the incident beam being 0.1 nm to 200 nm. The spectrum of the incident beam is a narrow-band harmonic optical comb between 0.1 nm and 200 nm, a harmonic between 0.1 nm and 200 nm, and a broadband harmonic between 0.1 nm and 200 nm. The incident light is continuous light or pulsed laser, and the diameter of the narrow-spectrum focused beam after diffraction separation is between 1 and 10,000 micrometers.

[0066] The extreme ultraviolet time-delay compensated monochromator also includes a slit plane positioned between the first and second optical structures for symmetry. At the slit plane, the wavelength beam required for the experiment is selected by moving the slit and changing its width.

[0067] In this embodiment of the invention, the monochromator exhibits excellent performance in monochromating multi-wavelength beams, optimizing diffraction spectral aberrations, and compensating for pulse pre-tilt, thus meeting the requirements of high-resolution spectral detection and imaging applications. Furthermore, the resulting beam possesses high temporal and spatial coherence. The monochromator also demonstrates high overall energy transfer efficiency and low light flux loss.

[0068] In one alternative embodiment, the first planar blazed grating and the second planar blazed grating are composed of equally spaced steps and are mounted with conical diffraction geometry.

[0069] In this embodiment of the invention, both the first planar blazed grating and the second planar blazed grating are blazed gratings with equally spaced stepped structures processed on a planar substrate. Their scribe line density ranges from 50 lines / mm to 5000 lines / mm. The step height of each step is optimized to stagger the zero order of single-slot diffraction with the zero order of inter-slot interference, thereby concentrating the light energy to the required order.

[0070] Here, the equally spaced steps refer to the rectangular step structure periodically set along the grating surface along the etch line direction. The step height determines the blaze wavelength, ensuring high diffraction efficiency in the extreme ultraviolet band.

[0071] The grating is mounted using conical diffraction geometry, which reduces the shadowing effect on the beam and thus improves the overall diffraction efficiency. Specifically, the grating scribe lines are tilted at a small angle to the plane of the incident beam, ensuring that the component of the incident beam perpendicular to the scribe lines satisfies the diffraction conditions. Simultaneously, it avoids the grating's stepped structure from blocking the incident light, thereby increasing the effective diffraction area. This mounting method achieves high-efficiency spectral separation through three-dimensional diffraction, unlike the two-dimensional plane diffraction where the beam is perpendicular to the scribe lines in classical diffraction geometry.

[0072] Figure 7 This is a schematic diagram of an optional planar blazed grating according to an embodiment of the present invention, as shown below. Figure 7As shown, a planar blazed grating consists of steps distributed at equal intervals d on the grating surface (the step angle, i.e., the blaze angle, is...). It is composed of a grating surface normal L, a stepped surface normal I, and an incident light azimuth angle between the incident light ray M and the stepped surface normal I. α The azimuth angle of the diffracted ray N between the diffracted ray N and the normal I of the stepped surface is β The angle between the incident ray M and the normal L of the grating surface is i, and the angle between the diffracted ray N and the normal L of the grating surface is θ.

[0073] In this embodiment, the energy utilization rate of the target diffraction order is improved by employing a blazed grating structure, and the shadow loss during grazing incidence is reduced by combining conical diffraction geometry.

[0074] In one alternative embodiment, the first and second circular mirrors are configured such that both the object distance and image distance are equal to twice the focal length, the focal length being determined based on the radius of curvature of the sagittal plane of the circular mirror, the radius of curvature of the meridional plane, and the incident elevation angle of the incident light.

[0075] In this embodiment of the invention, a ring mirror (also called a tire mirror) is used for focusing and deflecting the light beam. The ring mirror adopts an aspherical reflecting mirror structure, and its surface has different radii of curvature R and r in the meridional plane (the plane containing the incident beam and the direction of the grating lines) and the sagittal plane (the plane perpendicular to the grating lines and containing the direction of beam propagation), respectively. Both are negative values ​​(concave mirror). Its parameters are reasonably designed according to the grazing incident angle and the overall beamline length required for the experiment.

[0076] The ring mirror operates at 2 f -2 f In the imaging configuration (i.e., object distance = image distance = twice the focal length f of the circular mirror), the focal length f is determined by the radii of curvature r and R of the circular mirror in the sagittal and meridional planes, and the incident height angle. γ Together, we determined that, after optimization, the imaging in both planes would satisfy the 2f imaging condition.

[0077] Figure 8 This is a schematic diagram of an optional ring mirror structure according to an embodiment of the present invention, such as... Figure 8 As shown, the ring mirror has two different radii of curvature in the sagittal plane and the meridional plane, respectively. r and R In three-dimensional space (a three-dimensional space consisting of X, Y, and Z axes, with o as the origin), the distance between the object point and the circular mirror is the object's conjugate distance S, and the distance between the image point and the circular mirror is... ,in, It is the distance between the image point and the meridian plane. It is the distance between the image point and the sagittal plane. α The azimuth angle of the incident light. γLet ω be the incident elevation angle, and ω be the rotation angle of the ring mirror.

[0078] In this embodiment, by placing both annular mirrors at 2 f -2 f The imaging configuration achieves strict symmetry in the object-image conjugate relationship, enabling the diffracted beam to form a clear and stable image in the slit plane. At the same time, it provides a geometric basis for subsequent optical path symmetry compensation, ensuring that the beam emitted from the slit can be accurately collimated and refocused after entering the second symmetry structure.

[0079] In one optional embodiment, a first planar blazed grating is disposed in front of the first annular mirror at a focal length, and a second planar blazed grating is disposed behind the second annular mirror at a focal length. The distance between the first and second annular mirrors and the slit plane is twice the focal length.

[0080] Typically, the distance between diffracted beams of different wavelengths emitted from the first planar blazed grating increases linearly with the beam propagation distance, which forces the size of the second annular mirror to increase significantly with the optical path length. To solve this problem, this embodiment mounts the first planar blazed grating in front of the first annular mirror. f At this point, based on the design principle of the ring mirror, it can be regarded as a collimator for diffracted beams of different wavelengths, with each wavelength diffracted beam exiting parallel to the others after reflection. This collimation process makes the size of the second ring mirror no longer limited by the propagation distance.

[0081] In this embodiment of the invention, a first planar blazed grating is mounted in front of a first annular mirror along the optical path, and the optical path distance between its surface and the vertex of the first annular mirror is precisely equal to the equivalent focal length f of the first annular mirror under the combined action of the sagittal and meridional planes. A second planar blazed grating is mounted behind a second annular mirror, and the optical path distance between its surface and the vertex of the second annular mirror is also equal to the focal length f of the annular mirror. The distances between the first annular mirror and the slit plane, and between the second annular mirror and the slit plane, are both set to 2f.

[0082] In this embodiment, by precisely controlling the relative positions of each optical element and the ring mirror, the first ring mirror achieves collimation of the diffracted beam, the second ring mirror achieves focusing of the monochromatic beam, and a completely symmetrical optical path structure is constructed.

[0083] In one optional embodiment, the first annular mirror is rotated clockwise by a preset angle, and the second annular mirror is rotated counterclockwise by a preset angle. The preset angle is determined based on the grating line spacing, diffraction order, incident elevation angle, and desired wavelength.

[0084] In this embodiment of the invention, to balance time delay compensation and high-resolution imaging, all diffracted beams of different wavelengths need to be focused at a single point, and aberration optimization methods must be effectively used to reduce the spot size. To meet this condition, the optical path structure before and after the slit plane is completely symmetrical about the slit plane in this embodiment, and the focal plane aberration is optimized by simultaneously rotating the orientation angles ω1 and ω2 of the two annular mirrors. The relationship between the aberration optimization center wavelength and the rotation angle is as follows:

[0085] (5);

[0086] (6);

[0087] Where d represents the grating line spacing, m represents the diffraction order, γ is the incident beam height angle, and λ represents the incident beam wavelength. Positive and negative values ​​only indicate different directions of rotation; negative values ​​represent clockwise rotation, and positive values ​​represent counter-clockwise rotation.

[0088] For example, a high-precision electrically controlled rotating platform is used to install the first and second ring mirrors respectively. Their rotation axes coincide with the normal of the mirror surface and are perpendicular to the beam propagation plane. The preset angle is calculated according to formulas (5) and (6). The calculation results are input to the rotation controller after system calibration, driving the first ring mirror to rotate clockwise by ω1 and the second ring mirror to rotate counterclockwise by ω2.

[0089] In this embodiment, by symmetrically rotating the first and second ring mirrors in opposite directions, reflection aberrations that are complementary to the grating diffraction aberrations are actively introduced to achieve system-level aberration compensation. This enables diffracted beams of different wavelengths to form near-diffraction-limited point spots in both the slit plane and the focal plane, thereby improving the spectral resolution and imaging quality of the monochromator.

[0090] In one alternative embodiment, a light beam corresponding to the desired wavelength is transmitted by adjusting the mechanical position and opening / closing width of the slit in the slit plane.

[0091] In this embodiment of the invention, the slit plane plays a crucial role in wavelength selection during the spectral selection process. By precisely adjusting the mechanical position (translation along the Y-axis) and opening / closing width of the slit, the diffracted beam corresponding to the target wavelength can be selectively transmitted. To achieve effective monochromaticity, the slit plane must meet the following conditions: firstly, the distance between the centers of adjacent wavelength diffracted spots must be sufficiently large; secondly, the size of a single spot must be sufficiently small. Since this embodiment employs a ring mirror-planar grating composite architecture, reflection aberration can be introduced by rotating the first ring mirror around its surface normal (corresponding to a rotation angle ω1). This aberration can compensate for the aberration introduced by the grating diffraction, ultimately improving the average spectral resolution of the diffracted spots at the slit plane and meeting the monochromaticity requirements.

[0092] For example, a precision linear displacement mechanism is used to drive the slit to translate along the Y-axis perpendicular to the beam propagation direction, with a resolution better than 1μm. This is combined with a high-precision opening and closing drive device to adjust the slit aperture width, with a width adjustment range of 10μm to 500μm.

[0093] Here, the slit plane refers to the imaging plane located between the first and second ring mirrors. It is the spatial dispersion plane of the diffraction spectrum, where beams of different wavelengths form spatially separated spots. The mechanical position refers to the lateral coordinates of the slit on this plane, and its adjustment is determined based on the spectral distribution or theoretical calculations. It is used to align the slit to the center of the diffraction spot of the target wavelength. The opening width refers to the lateral dimension of the slit. Its adjustment is used to balance luminous flux and spectral purity. The narrower the width, the stronger the ability to suppress stray light of adjacent wavelengths, but the luminous flux decreases.

[0094] In this embodiment, by mechanically adjusting the position and aperture of the slit on the dispersion plane, high-precision and tunable selection of the target wavelength in the extreme ultraviolet spectrum is achieved. Without changing the optical component parameters, dynamic monochromaticization of a wide-band light source is completed, improving the system's adaptability to different experimental wavelength requirements and the signal-to-noise ratio of the output spectrum.

[0095] Figure 9 This is a schematic diagram of an optional time-delay-compensated extreme ultraviolet monochromator optical path structure according to an embodiment of the present invention, as shown below. Figure 9 As shown, the distance between the extreme ultraviolet (EUV) source and grating 1 is f. The EUV source is incident on grating 1 at an angle γ. After propagating a distance f, the diffracted beam illuminates the ring mirror 1 (rotated by an angle ω1) at the same grazing incidence angle γ. A slit plane movable along the Y-axis is designed 2f behind the ring mirror 1 for spectral selection (selecting a single wavelength beam for monochromaticization). The monochromatic harmonic beam continues to propagate backward like a new point source. After propagating a distance 2f, the beam reaches the ring mirror 2 (rotated by an angle ω2), is reflected, and after propagating a distance f, is focused onto grating 2. Grating 2 compensates for the pulse forward tilt introduced by grating 1 (both the ring mirror 2 and grating 2 have grazing incidence angles of γ). Finally, the monochromatic beam, maintaining its ultra-short time characteristics, is incident on the EUV camera (focal plane).

[0096] In this embodiment of the invention, the transmission efficiency of the time-delay compensated extreme ultraviolet monochromator is improved by combining the diffraction efficiency of the conical mirror and the reflection efficiency of the concave mirror. Sub-femtosecond-level pulse forward tilt compensation is achieved through two planar gratings. Furthermore, by compensating for each other's diffraction aberrations and concave reflection aberrations, the beams ultimately converge into a point on the detector plane, improving spectral resolution. Simultaneously, by moving the slit position, the desired wavelength beam is selected, and different wavelength beams are all focused at the same position on the detector plane, achieving tunable monochromatic wavelengths and identical beam focusing positions.

[0097] The following is a detailed description with reference to another embodiment.

[0098] Example 2

[0099] According to an embodiment of the present invention, an embodiment of a processing method for an extreme ultraviolet time-delay compensated monochromator is provided. It should be noted that the steps shown in the flowchart in the accompanying drawings can be executed in a computer system such as a set of computer-executable instructions. Furthermore, although a logical order is shown in the flowchart, in some cases, the steps shown or described may be executed in a different order than that shown here.

[0100] Figure 10 This is a flowchart of an optional processing method according to an embodiment of the present invention, such as... Figure 10 As shown, the method includes the following steps:

[0101] Step S1001: Determine the incident elevation angle and required wavelength of the extreme ultraviolet light.

[0102] In this embodiment of the invention, the incident elevation angle refers to the angle γ between the incident beam and the normal to the grating plane in the direction perpendicular to the grating lines. Its value is determined by the grating mounting geometry, for example, a value of 1°–5°, to satisfy the conical diffraction condition. The required wavelength refers to the spectral composition of the experimental target, such as a higher harmonic at 29.6 nm.

[0103] This step provides a baseline input for subsequent optical path calculations by presetting experimental parameters, ensuring that the diffraction system is configured for a specific wavelength.

[0104] Step S1002: Based on the incident elevation angle, the required wavelength, and the grating line spacing, determine the diffracted light azimuth angle, and based on the diffracted light azimuth angle and the propagation distance, determine the initial position of the slit in the slit plane, wherein the propagation distance is determined by the distance between the first planar blazed grating and the first annular mirror.

[0105] In this embodiment of the invention, the azimuth angle β of the diffracted light is determined by the conical diffraction equation. The calculation shows that, γ Represents the angle of incidence. α Represents the azimuth angle of the incident light. β Represents the azimuth angle of the diffracted light. d represents the grating line spacing, and m represents the diffraction order.

[0106] The propagation distance refers to the straight-line optical path between the first planar blazed grating and the first annular mirror. The initial position of the slit in the slit plane is calculated using the diffracted light azimuth angle β and the propagation distance f, which is the theoretical focal point coordinate of the diffracted beam of the desired wavelength on the slit plane.

[0107] Step S1003: Adjust the initial position and determine the target position of the slit.

[0108] In this embodiment of the invention, the lateral position of the slit on the Y-axis is finely adjusted by a precision displacement mechanism (such as a piezoelectric ceramic translation stage) to precisely align the center of the target wavelength light spot with the center of the slit aperture. The target position is the optimal slit coordinate after calibration by actual light spot intensity distribution, in order to maximize light flux and suppress stray light of adjacent wavelengths.

[0109] In step S1004, extreme ultraviolet light is incident on a first planar blazed grating at an incident elevation angle. The beams of different wavelengths diffracted by the first planar blazed grating are filtered through a slit located at the target position to obtain the beam of the desired wavelength.

[0110] In this embodiment of the invention, an extreme ultraviolet light source is incident on the grating 1 at an incident height angle γ. After propagating a distance f, the diffracted beam illuminates the ring mirror 1 at the same grazing incident angle γ. A slit that can move along the Y-axis is designed 2f behind the ring mirror 1 to perform spectral selection (selecting a single wavelength beam to complete monochromaticization) to obtain a beam of the desired wavelength.

[0111] In step S1005, the beam of the desired wavelength is propagated backward as a new light source. After the beam of the desired wavelength reaches the second ring mirror, it is reflected by the second ring mirror and focused onto the second plane blazed grating to compensate for the pulse forward tilt through the second plane blazed grating.

[0112] In this embodiment of the invention, the monochromatic harmonic beam continues to propagate backward as a new point source. After propagating a distance of 2f, the beam reaches the annular mirror 2, is reflected, and propagates a distance of f before being focused onto the grating 2. The grating 2 can compensate for the pulse forward tilt introduced by the grating 1 (the grazing incidence height angle of both the annular mirror 2 and the grating 2 is γ).

[0113] Step S1006: The beam of the desired wavelength, after pulse pre-tilt compensation, is incident onto the focal plane.

[0114] In this embodiment of the invention, a monochromatic light beam maintaining ultra-short time characteristics is incident on the focal plane. Here, the focal plane is the final imaging plane of the system.

[0115] In summary, a dual-grating time delay compensation structure based on conical diffraction geometry is employed. The azimuth angle of the diffracted light is calculated based on the incident elevation angle, the required wavelength, and the grating line spacing. The initial slit position is determined by combining this with the propagation distance between the first planar blazed grating and the first annular mirror. This initial position is then calibrated and adjusted to the target position through actual measurement, achieving high-precision spatial selection of the target wavelength beam. The selected beam, after reflection by the second annular mirror, is collimated and incident on the second planar blazed grating. Utilizing its consistent parameters and symmetrical installation with the first grating, it compensates for the pulse forward tilt introduced by the first grating. This design ensures that beams of different wavelengths can ultimately be focused onto the same focal plane after slit selection, achieving confocal output with tunable wavelength. Thus, while maintaining high energy transmission efficiency (>30%), the system achieves sub-femtosecond pulse forward tilt compensation and high spectral resolution imaging, thereby solving the technical problem of traditional monochromators struggling to balance efficiency, time resolution, and multi-wavelength confocal performance.

[0116] To improve the accuracy of determining the target position of the slit, in the processing method provided in Embodiment 1 of this application, a movable reflector is placed behind the slit; extreme ultraviolet light is incident on an extreme ultraviolet time-delay compensated monochromator at an incident elevation angle, and the reflector is moved to reflect the extreme ultraviolet light to the observation camera; the spectral distribution is obtained through the observation camera; based on the spectral distribution, the initial position of the slit is adjusted to obtain the target position.

[0117] In this embodiment of the invention, the opening and closing width of the slit can be increased, and then a movable reflector can be placed at the rear position of the slit cavity.

[0118] When it is necessary to determine the specific location of the slit, extreme ultraviolet light can be incident on an extreme ultraviolet time-delay compensated monochromator at an incident elevation angle. Then, simply move the reflector to reflect the extreme ultraviolet light to the observation camera to observe the spectral distribution.

[0119] Here, the observation camera refers to an imaging device that can directly detect extreme ultraviolet light (wavelength range 0.1–200 nm) and output a two-dimensional light intensity image. Spectral distribution refers to the spatial distribution of discrete light spots formed by diffracted beams of different wavelengths on the slit plane, with the lateral position corresponding to the wavelength and the light spot intensity reflecting the flux at that wavelength.

[0120] Based on the offset between the center of the target wavelength spot and the center of the slit aperture in the spectral distribution image, the slit is laterally translated at the submicron level using a precision displacement platform until the center of the target spot coincides with the center of the slit, thus obtaining the target position.

[0121] In this embodiment, direct observation and calibration of the spectral distribution of the slit plane are realized, so that the determination of the slit target position is based on measured light intensity rather than theoretical calculation, thereby improving the wavelength selection accuracy and system debugging reliability.

[0122] In another alternative embodiment, the second optical structure of the extreme ultraviolet time-delay compensated monochromator is replaced with a camera; extreme ultraviolet light is incident on the extreme ultraviolet time-delay compensated monochromator at an incident elevation angle, and the spectral distribution is acquired by the camera.

[0123] This can be achieved by removing the second part of the optical structure (i.e., the second ring mirror and the second plane blazed grating) located behind the slit plane in the original system, and installing an imaging camera with extreme ultraviolet band response capability behind the slit plane and at the front of the original second ring mirror, so as to obtain the spectral distribution through the camera.

[0124] In the processing method provided in Embodiment 1 of this application, before the extreme ultraviolet light is incident on the first planar blazed grating at an incident elevation angle, under non-vacuum conditions, a driving laser is used to perform optical path calibration on the optical elements in the extreme ultraviolet time delay compensation monochromator so that the zero-order beam propagates parallel to the ground between every two optical elements and is focused on the focal plane. The optical elements include: a first planar blazed grating, a first annular mirror, a second planar blazed grating, and a second annular mirror. The zero-order beam refers to the beam whose diffraction order is zero during the diffraction process of the driving laser.

[0125] In this embodiment of the invention, under non-vacuum conditions, an infrared (1030nm) or green (515nm) driving laser is used as the calibration beam for optical path calibration. By adjusting the tilt angle and position of the first planar blazed grating, the first annular mirror, the second planar blazed grating, and the second annular mirror, the propagation path of the zero-order beam between two adjacent optical elements is made strictly parallel to the reference plane (i.e., the "ground") of the optical platform, and finally focused onto the focal plane designed by the system after reflection by the second annular mirror.

[0126] Here, the zeroth-order beam is a beam with a diffraction order of m=0. Its propagation direction is mirror-symmetrical to the incident light about the grating normal. It does not undergo wavelength dispersion, maintains the original wavelength and incident angle, and is only affected by mirror reflection or mirror deflection of the planar grating.

[0127] In this embodiment, by utilizing the characteristics of zero-order beams being dispersion-free and having predictable paths in the system, a unified optical path calibration benchmark is established to achieve precise coaxial alignment of the first and second optical structures, thereby improving system debugging efficiency and imaging consistency, and providing a stable geometric basis for subsequent high-precision monochromaticization and pulse pre-tilt compensation.

[0128] According to another aspect of the present invention, a computer program product is also provided, including a non-volatile computer-readable storage medium storing a computer program, wherein the computer program, when executed by a processor, implements the processing method described above.

[0129] According to another aspect of the present invention, an electronic device is also provided, including one or more processors and a memory, wherein the memory is used to store one or more programs, wherein when the one or more programs are executed by the one or more processors, the one or more processors cause the one or more processors to implement the processing method described above.

[0130] Figure 11 This is a hardware structure block diagram of an electronic device (or mobile device) for a processing method according to an embodiment of the present invention. Figure 11 As shown, an electronic device may include one or more processors (e.g., Figure 11 The processors 1102a, 1102b, ..., 1102n, etc., may include, but are not limited to, processing devices such as microprocessors (MCUs) or programmable logic devices (FPGAs), and a memory 1104 for storing data. In addition, it may include: a display, an input / output interface (I / O interface), a universal serial bus (USB) port (which may be included as one of the ports of the I / O interface), a network interface, a keyboard, a power supply, and / or a camera. Those skilled in the art will understand that... Figure 11 The structure shown is for illustrative purposes only and does not limit the structure of the electronic device described above. For example, the electronic device may also include components that are more... Figure 11 The more or fewer components shown, or having the same Figure 11 The different configurations shown.

[0131] The sequence numbers of the above embodiments of the present invention are for descriptive purposes only and do not represent the superiority or inferiority of the embodiments.

[0132] The embodiments or examples disclosed herein are not exhaustive, but merely illustrative of some embodiments or examples, and are not intended to limit the scope of protection of this disclosure. Unless otherwise specified, each step in a particular embodiment or example can be implemented as an independent embodiment, and the steps can be arbitrarily combined. For example, a solution after removing some steps in a particular embodiment or example can also be implemented as an independent embodiment, and the order of the steps in a particular embodiment or example can be arbitrarily interchanged. Furthermore, optional methods or examples in a particular embodiment or example can be arbitrarily combined; moreover, embodiments or examples can be arbitrarily combined. For example, some or all steps of different embodiments or examples can be arbitrarily combined, and a particular embodiment or example can be arbitrarily combined with optional methods or examples of other embodiments or examples.

[0133] In the above embodiments of the present invention, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions of other embodiments.

[0134] In the several embodiments provided by this invention, it should be understood that the disclosed technical content can be implemented in other ways. The device embodiments described above are merely illustrative; for example, the division of units can be a logical functional division, and in actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the displayed or discussed mutual coupling, direct coupling, or communication connection can be through some interfaces; the indirect coupling or communication connection of units or modules can be electrical or other forms.

[0135] The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0136] Furthermore, the functional units in the various embodiments of the present invention can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit.

[0137] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, read-only memory (ROM), random access memory (RAM), portable hard drives, magnetic disks, or optical disks.

[0138] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. An extreme ultraviolet time-delay compensated monochromator, characterized in that, include: The first part of the optical structure includes: a first planar blazed grating and a first ring mirror. The first planar blazed grating is used to split and diffract the incident light, and the first ring mirror is used to focus and reflect the light beam. The second optical structure includes: a second planar blazed grating and a second ring mirror. The second planar blazed grating is used to compensate for the pulse forward tilt introduced by the first planar blazed grating, and the second ring mirror is used to focus and reflect the light beam. A slit plane is positioned between the first optical structure and the second optical structure to make the first optical structure and the second optical structure symmetrical. The slit plane is used to filter the light beam corresponding to the desired wavelength.

2. The extreme ultraviolet time-delay compensated monochromator according to claim 1, characterized in that, The first planar blazed grating and the second planar blazed grating are composed of equally spaced steps and are mounted with conical diffraction geometry.

3. The extreme ultraviolet time-delay compensated monochromator according to claim 1, characterized in that, The first and second circular mirrors are configured such that both the object distance and the image distance are equal to twice the focal length. The focal length is determined based on the radius of curvature of the sagittal plane, the radius of curvature of the meridional plane, and the incident elevation angle of the incident light.

4. The extreme ultraviolet time-delay compensated monochromator according to claim 1, characterized in that, The first planar blazed grating is positioned one focal length in front of the first annular mirror, and the second planar blazed grating is positioned one focal length behind the second annular mirror. The distances between the first and second annular mirrors and the slit plane are both twice the focal length.

5. The extreme ultraviolet time-delay compensated monochromator according to claim 1, characterized in that, The first annular mirror is rotated clockwise by a preset angle, and the second annular mirror is rotated counterclockwise by the same preset angle. The preset angle is determined based on the grating line spacing, diffraction order, incident elevation angle, and required wavelength.

6. The extreme ultraviolet time-delay compensated monochromator according to claim 1, characterized in that, By adjusting the mechanical position and opening / closing width of the slit in the slit plane, a light beam corresponding to the desired wavelength is transmitted.

7. A processing method applied to the extreme ultraviolet time-delay compensated monochromator according to any one of claims 1 to 6, characterized in that, include: Determine the incident elevation angle and required wavelength of the extreme ultraviolet light; Based on the incident elevation angle, the required wavelength, and the grating line spacing, the diffracted light azimuth angle is determined, and based on the diffracted light azimuth angle and the propagation distance, the initial position of the slit in the slit plane is determined, wherein the propagation distance is determined by the distance between the first planar blazed grating and the first annular mirror. Adjust the initial position to determine the target position of the slit; The extreme ultraviolet light is incident on the first planar blazed grating at the incident height angle. The beams of different wavelengths diffracted by the first planar blazed grating are filtered through the slit located at the target position to obtain the beam of the desired wavelength. The beam of the desired wavelength is propagated backward as a new light source. After the beam of the desired wavelength reaches the second annular mirror, it is reflected by the second annular mirror and focused onto the second planar blazed grating to compensate for the pulse forward tilt through the second planar blazed grating. The desired wavelength of the beam, after pulse pre-tilt compensation, is incident onto the focal plane.

8. The processing method according to claim 7, characterized in that, The step of adjusting the initial position and determining the target position of the slit includes: A movable reflector is placed behind the slit; The extreme ultraviolet light is incident on the extreme ultraviolet time-delay compensated monochromator at the incident elevation angle, and the extreme ultraviolet light is reflected to the observation camera by moving the reflector. The spectral distribution is obtained through the observation camera; Based on the spectral distribution, the initial position of the slit is adjusted to obtain the target position.

9. The processing method according to claim 7, characterized in that, Before the extreme ultraviolet light is incident on the first planar blazed grating at the incident height angle, the method further includes: Under non-vacuum conditions, a driving laser is used to calibrate the optical path of the optical elements in the extreme ultraviolet time-delay compensated monochromator so that the zero-order beam propagates parallel to the ground between every two optical elements and is focused on the focal plane. The optical elements include: a first planar blazed grating, a first annular mirror, a second planar blazed grating, and a second annular mirror. The zero-order beam refers to the beam in which the driving laser has a diffraction order of zero during the grating diffraction process.

10. An electronic device, characterized in that, It includes one or more processors and a memory, the memory being used to store one or more programs, wherein when the one or more programs are executed by the one or more processors, the one or more processors cause the one or more processors to implement the processing method according to any one of claims 7 to 9.

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