Highly compatible long aging strong antioxidant semiconductor soldering flux

This semiconductor welding flux, formulated with a scientific ratio of imidazopyridine, modified rosin, and other ingredients, solves the problems of limited application, easy failure, and weak oxide removal ability of existing fluxes. It achieves a wide compatibility, long service life, and strong oxidation resistance, thereby improving welding quality and production efficiency.

CN122400903APending Publication Date: 2026-07-17JIAXING XINHAITONG NEW MATERIALS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JIAXING XINHAITONG NEW MATERIALS CO LTD
Filing Date
2026-06-11
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing fluxes have a narrow range of applications, making it difficult to adapt to diverse welding needs. They are prone to failure in harsh environments, have weak oxide removal capabilities, insufficient high-temperature resistance, and short shelf life, which affects welding quality and production efficiency.

Method used

A semiconductor welding flux with strong redox capabilities, good wettability, low void ratio, high surface insulation resistance and long shelf life is formed by using a scientific ratio of imidazopyridine, modified rosin, general solvent, activator, film-forming agent and thixotropic agent.

Benefits of technology

It achieves welding performance with wide compatibility, long service life, and strong oxidation resistance, improving welding quality and reliability, reducing production and storage costs, and adapting to harsh welding environments.

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Abstract

本申请公开了一种高兼容长时效强抗氧化半导体焊接助焊剂,属于半导体焊接材料技术领域。该助焊剂由咪唑并吡啶(CAS号:274‑76‑0)、改性松香(CAS号:65997‑05‑9)、一般溶剂、活化剂、成膜剂和触变剂按特定比例组成。本申请通过科学的成分选择与配比设计,使助焊剂具备强氧化还原能力,可高效持久清理焊接表面氧化物;良好润湿性降低焊接缺陷;成膜剂形成保护膜,实现低空洞率与高表面绝缘电阻;兼容多种焊料合金,拓宽应用范围;在零下温度可保存一年以上,延长时效。该助焊剂可适配苛刻焊接环境,提升半导体焊接质量与可靠性,解决现有助焊剂应用面窄、环境要求高、有效期短等问题,适用于各类半导体制造及电子焊接场景。
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