Centering and debugging tool and method for heating pedestal in PECVD equipment

Abstract

This application discloses a centering and debugging fixture and method for a heating base inside a PECVD equipment, belonging to the field of equipment maintenance and debugging technology. It includes: an upper clamping mechanism comprising an upper clamping mounting plate, two upper clamping cylinders, and an upper screw adjustment assembly for positioning the center of the reaction chamber; a lower clamping mechanism comprising a lower clamping mounting plate, two lower clamping cylinders, and a lower screw adjustment assembly for positioning the center of the heating base; a pin for inserting into and passing through the center holes of the two clamping mounting plates to align the centers of the reaction chamber and the heating base; and a guide flange assembly located at the center of the upper clamping mounting plate to provide insertion guidance for the pin. This application enables precise positioning of the heating base and the center of the reaction chamber, solving the problem of insufficient positioning accuracy in existing technologies. Furthermore, by employing a contact method combining line contact of the clamping cylinders with point contact of the screw adjustment assembly, damage to the heating base and the reaction chamber is avoided.

Description

Technical Field

[0001] This application relates to the field of equipment maintenance and debugging technology, and in particular to a centering and debugging tooling and method for the heating base inside a PECVD equipment. Background Technology

[0002] In the thin film deposition process of PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment, the concentricity of the heating base and the reaction chamber directly determines the process stability and product quality. Therefore, the alignment and debugging of the two is a key link in equipment installation, operation and maintenance and process optimization. Only by ensuring that the two are concentric can the concentricity of the heating base and the shower head be further guaranteed, thereby ensuring that the thin film deposition quality meets the stringent requirements of the high-end manufacturing field.

[0003] Currently, existing technical solutions for the alignment and commissioning of the heating base and reaction chamber in the industry are mainly divided into two categories: offline manual commissioning, which is the conventional commissioning method in the industry, and blind commissioning based on an automatic gap adjustment system (AGS, Auto Gapping System). Both of these existing technical solutions have significant drawbacks and cannot meet the precise control requirements for the concentricity of the heating base and reaction chamber in high-end manufacturing. Specific drawbacks are as follows: The offline manual commissioning solution and the auxiliary positioning methods in related patents are not only cumbersome and inefficient, but their accuracy is also highly dependent on the operator's experience level and easily affected by human observation errors and limitations in the precision of measuring tools, making it difficult to achieve micron-level precise alignment. The AGS blind commissioning solution and the borrowed automatic electrode rod adjustment patent technology lack direct position detection and precise positioning mechanisms, and can only indirectly judge concentricity deviation through film thickness data. The adjustment process has strong uncertainty, which can easily lead to excessive horizontal angle deviation of the heating base, resulting in abnormal force on the heating base support pin, increased lifting resistance, and long-term use can easily cause problems such as support pin breakage and product fragmentation.

[0004] Therefore, there is an urgent need for a simple, easy-to-operate, highly accurate, and low-cost alignment and debugging tool to address the aforementioned shortcomings of existing technologies. Summary of the Invention

[0005] To address the problems existing in the prior art, this application mainly provides a centering and debugging tooling and method for the heating base inside a PECVD equipment.

[0006] To achieve the above objectives, the first technical solution adopted in this application is: providing a centering and adjustment fixture for the heating base inside a PECVD equipment, comprising: an upper clamping mechanism, which includes an upper clamping mounting plate, and two upper clamping cylinders and an upper screw adjustment assembly uniformly installed circumferentially at the bottom edge of the upper clamping mounting plate, wherein, after the two upper clamping cylinders and the adjusted upper screw adjustment assembly are in contact with the inner cylindrical surface of the reaction chamber of the PECVD equipment, the center of the upper clamping mounting plate coincides with the center of the reaction chamber; a lower clamping mechanism, which includes a lower clamping mounting plate, and two upper clamping cylinders and an upper screw adjustment assembly uniformly installed circumferentially at the bottom edge of the upper clamping mounting plate. Two lower clamping cylinders and a lower screw adjustment assembly are evenly installed at the bottom edge of the lower clamping mounting plate. After the two lower clamping cylinders and the adjusted lower screw adjustment assembly are in contact with the outer surface of the cylinder of the heating base in the reaction chamber, the center of the lower clamping mounting plate coincides with the center of the heating base. A pin is inserted into and passes through the center holes opened at the center of the upper and lower clamping mounting plates to align the centers of the upper and lower clamping mounting plates. A guide flange assembly is located at the top center of the upper clamping mounting plate and provides insertion guidance for the pin.

[0007] The second technical solution adopted in this application is: to provide a method for centering and adjusting the heating base inside a PECVD equipment, which uses the centering and adjusting fixture for the heating base inside a PECVD equipment in the first technical solution to center and adjust the heating base.

[0008] The beneficial effects of the technical solution of this application are as follows: This application designs a centering and debugging fixture for the heating base inside a PECVD equipment. By innovatively setting clamping cylinders on the clamping mechanism, and adopting a line contact method between the clamping cylinders and the outer side of the heating base and the inner side of the reaction chamber, combined with an adjustable screw adjustment assembly forming a point contact method with the outer side of the heating base and the inner side of the reaction chamber, the clamping contact surface is reduced, thereby avoiding damage to the heating base and the reaction chamber. At the same time, the two clamping cylinders and the screw adjustment assembly, which are evenly distributed around the circumference, can accurately position the center of the heating base and the reaction chamber, solving the problem of insufficient positioning accuracy in the prior art. Through the coordinated cooperation of the upper and lower clamping mechanisms and the upper guide flange assembly, the center of the upper and lower clamping mechanisms is precisely connected by a pin, making the centering and debugging operation simple and ensuring the concentricity of the heating base and the reaction chamber, thereby ensuring that the thin film deposition quality meets the stringent requirements of the high-end manufacturing field. Attached Figure Description

[0009] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a schematic diagram of the overall structure of a specific embodiment of a centering and debugging fixture for a heating base inside a PECVD device according to this application; Figure 2 This is a front view structural diagram of a specific embodiment of this application; Figure 3 This is a schematic diagram of the cooperation structure between the guide flange and the upper clamping mounting plate according to a specific embodiment of this application.

[0011] Explanation of reference numerals in the attached figures: 1. Upper clamping mounting plate; 2. Upper clamping cylinder; 3. Upper screw adjustment bracket; 4. Upper adjusting screw; 5. Upper screw head buffer ball pad; 6. Lower clamping mounting plate; 7. Lower clamping cylinder; 8. Lower screw adjustment bracket; 9. Lower adjusting screw; 10. Lower screw head buffer ball pad; 11. Pin; 12. Guide flange; 13. O-ring seal; 14. Bottom anti-scratch pad; 15. Edge anti-scratch pad; 16. Pin nut head; 17. Pin clamping clamp; 18. Boss; 19. Recess. Detailed Implementation

[0012] The preferred embodiments of this application will now be described in detail with reference to the accompanying drawings, so that the advantages and features of this application can be more easily understood by those skilled in the art, thereby providing a clearer and more definite definition of the scope of protection of this application.

[0013] In the description of this application, it should be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0014] The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "multiple" means two or more.

[0015] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0016] Currently, the existing technical solutions closest to this invention for aligning and adjusting the heating base and reaction chamber in PECVD equipment are mainly divided into two categories, some of which have been disclosed in relevant patents.

[0017] One type is the offline manual debugging solution, which is a conventional debugging method in the industry and is also reflected in some published patents. For example, in the patent "Semiconductor heat treatment equipment and calibration method" with publication number CN121693038A, it is mentioned that the position of the base is adjusted with the aid of visual positioning. However, for the alignment of the heating base and the reaction chamber, an offline manual mode is adopted: the equipment is stopped and the cavity is in atmospheric condition. The operator uses conventional measuring tools such as rulers and dial indicators to visually observe and manually adjust the fixing bolts of the heating base to correct the relative position of the heating base and the reaction chamber. After the alignment debugging is completed, the cavity needs to be closed and a vacuum is drawn for process testing. If the film thickness uniformity does not meet the standard, the cycle of stopping, debugging and testing needs to be repeated until the requirements are met.

[0018] Another type is the blind adjustment scheme based on the Automatic Gap Adjustment System (AGS). The relevant technology can be found in the patent "An Automatic Adjustment Device for Electrode Rods of PECVD Process Main Stage" with authorization announcement number CN223522669U. This patent realizes automatic adjustment of the electrode rods through servo motor drive. Its core idea has been borrowed into the centering and debugging of the heating base to form the AGS blind adjustment scheme: by detecting the film thickness distribution data, the system automatically adjusts the position of the heating base to compensate for the concentricity deviation. There is no need for manual operation of measuring tools, which can reduce manual intervention. However, it does not optimize the design for the precise concentric positioning of the heating base and the reaction chamber.

[0019] The aforementioned existing technical solutions all have significant drawbacks and cannot meet the precise control requirements for the concentricity of the heating base and reaction chamber in high-end manufacturing. Specific drawbacks are as follows: Offline manual debugging solutions and the auxiliary positioning methods in related patents are not only cumbersome and inefficient, but their debugging accuracy is also highly dependent on the operator's experience, easily affected by human observation errors and limitations in the precision of measuring tools, making it difficult to achieve micron-level precise alignment. The AGS blind adjustment solution and the borrowed automatic electrode rod adjustment patent technology lack direct position detection and precise positioning mechanisms, relying solely on film thickness data to indirectly determine concentricity deviation. This adjustment process has significant uncertainties, easily leading to excessive horizontal angle deviation of the heating base, resulting in abnormal stress on the heating base support pins, increased lifting resistance, and long-term use can easily cause support pin breakage and product fragmentation. Furthermore, this solution cannot solve the alignment failure problem caused by dynamic offset of the heating base under high-temperature conditions, making it unsuitable for the stringent alignment requirements of high-end scenarios such as HJT photovoltaic cells and advanced packaging.

[0020] Conventional offline manual alignment and debugging lacks tooling and the alignment accuracy depends on the operator's experience. The AGS blind adjustment scheme lacks a direct positioning mechanism and the adjustment is uncertain. The core reason is the lack of positioning tooling that can accurately locate the center of the heating base and the reaction chamber and is easy to operate. This invention designs an upper and lower clamping mechanism that can accurately determine the center of the two and align them through a pin shaft, thus solving the above defects.

[0021] The technical solutions of this application and how they solve the aforementioned technical problems will be described in detail below with specific embodiments. The specific embodiments described below can be combined with each other to form new embodiments. The same or similar ideas or processes described in one embodiment may not be repeated in other embodiments. The embodiments of this application will now be described with reference to the accompanying drawings.

[0022] In one specific embodiment of this application, a centering and adjustment fixture for a heating base inside a PECVD device includes: an upper clamping mechanism, comprising an upper clamping mounting plate, and two upper clamping cylinders and an upper screw adjustment assembly uniformly installed circumferentially at the bottom edge of the upper clamping mounting plate, wherein, after the two upper clamping cylinders and the adjusted upper screw adjustment assembly are in contact with the inner cylindrical surface of the reaction chamber of the PECVD device, the center of the upper clamping mounting plate coincides with the center of the reaction chamber; and a lower clamping mechanism, comprising a lower clamping mounting plate, and two upper clamping cylinders and an upper screw adjustment assembly uniformly installed circumferentially at the bottom edge of the upper clamping mounting plate. The upper and lower clamping mounting plates have two lower clamping cylinders and a lower screw adjustment assembly at their bottom edges. After the two lower clamping cylinders and the adjusted lower screw adjustment assembly are in contact with the outer surface of the cylinder of the heating base inside the reaction chamber, the center of the lower clamping mounting plate coincides with the center of the heating base. A pin is inserted into and passes through the center holes opened at the center of the upper and lower clamping mounting plates to align the centers of the upper and lower clamping mounting plates. A guide flange assembly is located at the top center of the upper clamping mounting plate and provides insertion guidance for the pin.

[0023] In this specific embodiment, the centering and debugging fixture of this application innovatively sets clamping cylinders on the clamping mechanism. The clamping cylinders form line contact with the outer surface of the heating base and the inner surface of the reaction chamber, while the adjustable screw adjustment assembly forms point contact with these surfaces. This reduces the clamping contact area, thereby avoiding damage to the heating base and reaction chamber. Simultaneously, the two clamping cylinders and screw adjustment assembly, evenly distributed circumferentially, can accurately position the center of the heating base and the reaction chamber, solving the problem of insufficient positioning accuracy in existing technologies. Through the coordinated cooperation of the upper and lower clamping mechanisms and the upper guide flange assembly, the center of the upper and lower clamping mechanisms is precisely aligned using a pin. The centering and debugging operation is simple, and the concentricity of the heating base and the reaction chamber is ensured, thus guaranteeing that the thin film deposition quality meets the stringent requirements of high-end manufacturing.

[0024] In this specific embodiment, the upper clamping mechanism includes an upper clamping mounting plate, two upper clamping cylinders and an upper screw adjustment assembly uniformly mounted circumferentially at the bottom edge of the upper clamping mounting plate. After the two upper clamping cylinders and the adjusted upper screw adjustment assembly are in contact with the inner cylindrical surface of the reaction chamber of the PECVD equipment, the center of the upper clamping mounting plate coincides with the center of the reaction chamber. The upper clamping mechanism is used to center the inner cylindrical surface of the reaction chamber of the PECVD equipment, i.e., to locate its center. The two upper clamping cylinders and the upper screw adjustment assembly are uniformly mounted circumferentially at the bottom edge of the upper clamping mounting plate. Utilizing the principle of three-point circle determination, the center of the cylindrical reaction chamber can be better located. The upper screw adjustment assembly can be adjusted radially outward so that its end contacts the inner cylindrical surface of the reaction chamber. The two upper clamping cylinders form line contact with the inner cylindrical surface of the reaction chamber.

[0025] In one specific embodiment of this application, the upper screw adjustment assembly includes an upper screw adjustment bracket, an upper adjustment screw, and an upper screw head buffer ball pad. The upper screw adjustment bracket is fixedly installed at the bottom edge of the upper clamping mounting plate. The upper adjustment screw is mounted on the upper screw adjustment bracket, and the upper screw head buffer ball pad is installed at the end of the upper adjustment screw. The upper adjustment screw is adjusted so that the upper screw head buffer ball pad forms a point contact with the inner cylindrical surface of the reaction chamber. The upper adjustment screw can move radially outward to ensure that the upper screw head buffer ball pad forms a point contact with the inner cylindrical surface of the reaction chamber. This point contact assists in positioning, ensuring good line contact between the upper clamping cylinder and the inner cylindrical surface of the reaction chamber, thereby accurately determining the center of the reaction chamber.

[0026] In one specific embodiment of this application, the upper clamping mechanism further includes at least one edge anti-scratch pad disposed at the edge of the upper clamping mounting plate. The edge anti-scratch pad is used to prevent the upper clamping mechanism from scratching the cylindrical inner surface of the reaction chamber, which is beneficial to improving the safety and reliability of the centering and debugging tooling.

[0027] In this specific embodiment, the lower clamping mechanism includes a lower clamping mounting plate, two lower clamping cylinders and a lower screw adjustment assembly evenly mounted circumferentially at the bottom edge of the lower clamping mounting plate. After the two lower clamping cylinders and the adjusted lower screw adjustment assembly are in contact with the outer cylindrical surface of the heating base within the reaction chamber, the center of the lower clamping mounting plate coincides with the center of the heating base. The lower clamping mechanism is used to clamp and center the outer surface of the heating base within the reaction chamber, i.e., to locate its center. The two lower clamping cylinders and the lower screw adjustment assembly are evenly mounted circumferentially at the bottom edge of the lower clamping mounting plate. Utilizing the three-point circle-fixing principle, the center of the cylindrical heating base can be better located. The lower screw adjustment assembly can be adjusted radially inward along the heating base so that its end contacts the outer cylindrical surface of the heating base. The two lower clamping cylinders form line contact with the outer surface of the cylinder of the heating base, thereby reducing the clamping contact area of ​​the lower clamping mechanism and avoiding damage to the heating base.

[0028] In one specific embodiment of this application, the lower screw adjustment assembly includes a lower screw adjustment bracket, a lower adjustment screw, and a lower screw head buffer ball pad. The lower screw adjustment bracket is fixedly installed at the bottom edge of the lower clamping mounting plate. The lower adjustment screw is mounted on the lower screw adjustment bracket, and the lower screw head buffer ball pad is installed at the end of the lower adjustment screw. The lower adjustment screw is adjusted so that the lower screw head buffer ball pad forms a point contact with the outer cylindrical surface of the heating base. The lower adjustment screw can move radially inward to ensure that the lower screw head buffer ball pad forms a point contact with the outer cylindrical surface of the heating base. This point contact assists in positioning, ensuring good line contact between the lower clamping cylinder and the outer cylindrical surface of the heating base, thereby accurately determining the center of the heating base.

[0029] In one specific embodiment of this application, the lower clamping mechanism further includes at least one bottom anti-scratch pad disposed at the bottom of the lower clamping mounting plate, which effectively prevents the lower clamping mechanism from scratching the upper surface of the heating base.

[0030] In this specific embodiment, a pin is used to insert into and pass through a central hole opened at the center of the upper clamping mounting plate and the lower clamping mounting plate, so that the centers of the upper clamping mounting plate and the lower clamping mounting plate are aligned.

[0031] In one specific embodiment of this application, the centering and debugging fixture for the heating base inside the PECVD equipment of this application also includes a pin nut head, which is connected to the pin shaft by threads. The surface of the pin nut head is provided with vertical stripes, which can effectively increase the friction force when the operator grips it, making it easier for the operator to quickly grip and operate.

[0032] In one specific embodiment of this application, the alignment and debugging fixture for the heating base inside the PECVD equipment further includes at least one pin clamp, which is fixedly installed on the top of the upper clamping mounting plate for clamping and storing the pin, effectively preventing the pin from being lost.

[0033] In this specific embodiment, a guide flange assembly, located at the top center of the upper clamping mounting plate, provides insertion guidance for the pin. The guide flange assembly effectively ensures precise alignment of the pin with the centers of the lower and upper clamping mechanisms.

[0034] In one specific embodiment of this application, the guide flange assembly includes a guide flange and an O-ring. A pin hole is provided at the center of the guide flange, and the O-ring is positioned above the pin hole. The inner diameter of the O-ring is smaller than the inner diameter of the pin hole, ensuring that the pin can be freely positioned after passing through the O-ring and the mounting hole of the guide flange. The smaller inner diameter of the O-ring also restricts the movement of the inserted pin.

[0035] In one specific embodiment of this application, a guide flange is disposed at the top center of the upper clamping mounting plate. A boss is provided at the lower end of the guide flange, and a recess matching the shape of the boss is provided at the top center of the upper clamping mounting plate. The boss is fitted into the recess so that the center of the guide flange coincides with the center of the upper clamping mounting plate. The cooperation between the boss and the recess effectively ensures the concentricity of the upper and lower clamping mechanisms.

[0036] In one specific embodiment of this application, the upper clamping mounting plate, the lower clamping mounting plate, the upper screw adjustment bracket, and the lower screw adjustment bracket are made of 6061 aluminum alloy. This material has the advantages of low price, easy processing, and reliable mechanical properties, and can meet the strength requirements of tooling use, balancing economy and practicality.

[0037] In one specific embodiment of this application, the edge anti-scratch pad and the bottom anti-scratch pad are made of PEEK material. This material not only prevents scratches during use, but also produces minimal particle shedding, reducing contamination during the debugging process.

[0038] The following will be combined with the appendix Figure 1-3 This application describes a specific embodiment of a centering and debugging fixture for an internal heating base of a PECVD equipment.

[0039] Figure 1 The overall structure of the centering and debugging fixture for the heating base inside the PECVD equipment in this specific embodiment is shown.

[0040] Figure 2 The front view of the centering and debugging fixture of the heating base inside the PECVD equipment in this specific embodiment is shown.

[0041] Figure 3 The mating structure between the guide flange and the upper clamping mounting plate in this specific embodiment is shown.

[0042] like Figure 1-3 As shown in a specific embodiment of this application, the centering and debugging fixture for the heating base inside the PECVD equipment includes: an upper clamping mechanism, a lower clamping mechanism, a pin assembly, and a guide flange assembly.

[0043] In this specific embodiment, the upper clamping mechanism includes two upper clamping cylinders 2, an upper clamping mounting plate 1, an edge anti-scratch pad 15, a pin clamping clamp 17, and an upper screw adjustment assembly. The upper screw adjustment assembly includes an upper screw adjustment bracket 3, an upper adjusting screw 4, and an upper screw head buffer ball pad 5. The assembly method of each component is as follows: the upper clamping mounting plate 1 is Y-shaped; the two upper clamping cylinders 2 and the upper screw adjustment bracket 3 are evenly installed circumferentially at the bottom edge of the upper clamping mounting plate 1; the upper adjusting screw 4 is mounted on the upper screw adjustment bracket 3, and the upper screw head buffer ball pad 5 is installed at the end of the upper adjusting screw 4. The upper adjusting screw 4 can move radially outward so that the upper screw head buffer ball pad 5 forms point contact with the inner surface of the cylinder of the reaction chamber; the pin clamping clamp 17 is fixedly installed on the top of the upper clamping mounting plate 1 by screws; the edge anti-scratch pad 15 is disposed at the edge of the upper clamping mounting plate 1. After the inner surfaces of the two upper clamping cylinders 2 and the reaction chamber are in line contact, and the upper screw head buffer ball pad 5 and the inner surface of the reaction chamber are in point contact, the center of the upper clamping mounting plate 1 coincides with the center of the reaction chamber.

[0044] In this specific embodiment, the lower clamping mechanism includes two lower clamping cylinders 7, a lower clamping mounting plate 6, a bottom anti-scratch pad 14, and a lower screw adjustment assembly. The lower screw adjustment assembly includes a lower screw adjustment bracket 8, a lower adjusting screw 9, and a lower screw head buffer ball pad 10. The assembly method of each component is as follows: the lower clamping mounting plate 6 is Y-shaped; the two lower clamping cylinders 7 and the lower screw adjustment bracket 8 are evenly installed circumferentially at the bottom edge of the lower clamping mounting plate 6; the lower adjusting screw 9 is mounted on the lower screw adjustment bracket 8, and the lower screw head buffer ball pad 10 is installed at the end of the lower adjusting screw 9. The lower adjusting screw 9 can move radially inward so that the lower screw head buffer ball pad 10 forms point contact with the outer surface of the cylinder of the heating base; the bottom anti-scratch pad 14 is disposed at the bottom of the lower clamping mounting plate 6 to avoid scratching the upper surface of the heating base. After the two lower clamping cylinders 7 form line contact with the outer surface of the cylinder of the heating base, and the lower screw head buffer ball pad 10 forms point contact with the outer surface of the cylinder of the heating base, the center of the lower clamping mounting plate 6 coincides with the center of the heating base.

[0045] In this specific embodiment, the pin assembly includes a pin 11 and a pin nut head 16. The pin 11 is used to insert into and pass through the center hole opened at the center of the upper clamping mounting plate 1 and the lower clamping mounting plate 6. The pin nut head 16 is connected to the pin 11 by threads.

[0046] In this specific embodiment, the guide flange assembly includes a guide flange 12 and an O-ring 13. A pin hole is provided at the center of the guide flange 12 to provide insertion guidance for the pin 11; the O-ring 13 is disposed above the pin hole, and the inner diameter of the O-ring 13 is smaller than the inner diameter of the pin hole, ensuring that the pin 11 can be freely positioned after passing through the O-ring 13 and the mounting hole of the guide flange 12.

[0047] In this specific embodiment, the guide flange 12 is located at the top center of the upper clamping mounting plate 1. A boss 18 is provided at the lower end of the guide flange 12, and a recess 19 matching the shape of the boss 18 is provided at the top center of the upper clamping mounting plate 1. The cooperation between the boss 18 and the recess 19 effectively ensures the concentricity of the upper and lower clamping mechanisms. In this specific embodiment, the selected pin 11, pin nut head 16, O-ring seal 13, upper adjusting screw 4, lower adjusting screw 9, upper screw head buffer ball pad 5, and lower screw head buffer ball pad 10 are all standard parts, which can effectively reduce the manufacturing cost and subsequent maintenance cost of the tooling.

[0048] In this specific embodiment, the upper clamping mounting plate 1, the lower clamping mounting plate 6, the upper screw adjustment bracket 3, and the lower screw adjustment bracket 8 are all rounded, which can minimize the impact injury to the operator during operation and improve operational safety.

[0049] In this specific embodiment, the upper clamping mounting plate 1, the lower clamping mounting plate 6, the upper screw adjustment bracket 3, and the lower screw adjustment bracket 8 are made of 6061 aluminum alloy, which is inexpensive, easy to process, and has reliable mechanical properties. It can meet the strength requirements of tooling use, and takes into account both economy and practicality.

[0050] In this specific embodiment, the edge anti-scratch pad 15 and the bottom anti-scratch pad 14 are made of PEEK material to prevent scratches on the heating base and reaction chamber during use.

[0051] In this specific embodiment, the heating base is a cylinder, and the reaction chamber is a cylindrical cylinder. The heating base is placed inside the reaction chamber. During the alignment and adjustment of the heating base and the reaction chamber using the alignment and adjustment fixture of the heating base in the PECVD equipment of this application, the lower clamping mechanism is first placed on the surface of the heating base. At this time, the bottom anti-scratch pad 14 contacts the upper surface of the heating base. The lower adjusting screw 9 is adjusted. When the lower screw head buffer ball pad 10 at the front end of the lower screw adjusting bracket 8 contacts the side of the cylindrical heating base, the two lower clamping cylinders 7 will also make line contact with the side of the heating base. At this time, the center of the lower clamping mechanism is the center of the heating base. In addition, assemble the pin nut head 16 and the pin 11 together, and install the pin 11, O-ring seal 13 and guide flange 12 in sequence on the upper clamping mounting plate 1. At this time, place the upper clamping mechanism on the inner cylindrical surface of the reaction chamber. The edge anti-scratch pad 15 will contact the inner cylindrical surface of the reaction chamber. Rotate the upper adjusting screw 4. When the upper screw head buffer ball pad 5 at the front end of the upper screw adjusting bracket 3 contacts the inner cylindrical surface of the reaction chamber, the two upper clamping cylinders 2 will also make line contact with the inner cylindrical surface of the reaction chamber. At this time, the center of the upper clamping mechanism is the center of the reaction chamber, and the centering process is completed. Then, insert the pin 11 into the upper part of the lower clamping mechanism through the mounting hole of the guide flange 12. Slightly adjust the heating base. When the pin 11 can also pass through the center hole of the lower clamping mechanism, the centering is completed. Then, remove the centering clamping fixture according to the reverse operation procedure. The complete centering and debugging process is completed.

[0052] In this specific embodiment, the aligning and debugging fixture for the heating base inside the PECVD equipment of this application innovatively designs a clamping cylinder, adopting a contact method that combines line contact and point contact to reduce the clamping contact surface and avoid damage to the expensive heating base. At the same time, it can accurately determine the center of the heating base and the reaction chamber, solving the problem of insufficient positioning accuracy in the prior art. Through the coordinated cooperation of the upper and lower clamping mechanisms, the pin assembly and the guide flange assembly, as well as the cooperation of the boss and the concave, the concentricity of the upper and lower clamping mechanisms is accurately guaranteed. By selecting standard parts, 6061 material and rounded corner treatment, the operational safety and positioning accuracy are improved while reducing manufacturing and maintenance costs, solving the defects of cumbersome debugging and high cost in the prior art.

[0053] In one specific embodiment of this application, a method for centering and adjusting a heating base inside a PECVD equipment is provided. This method utilizes the centering and adjusting fixture for the heating base inside a PECVD equipment described in any of the above embodiments to center and adjust the heating base.

[0054] The above are merely embodiments of this application and do not limit the scope of this patent application. Any equivalent structural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the scope of patent protection of this application.

Claims

1. A centering and adjustment fixture for the heating base inside a PECVD device, characterized in that, include: The upper clamping mechanism includes an upper clamping mounting plate, two upper clamping cylinders and an upper screw adjustment assembly that are uniformly installed circumferentially at the bottom edge of the upper clamping mounting plate, wherein after the two upper clamping cylinders and the adjusted upper screw adjustment assembly are in contact with the inner cylindrical surface of the reaction chamber of the PECVD equipment, the center of the upper clamping mounting plate coincides with the center of the reaction chamber. The lower clamping mechanism includes a lower clamping mounting plate, two lower clamping cylinders and a lower screw adjustment assembly that are uniformly installed circumferentially at the bottom edge of the lower clamping mounting plate, wherein after the two lower clamping cylinders and the adjusted lower screw adjustment assembly are in contact with the outer surface of the cylinder of the heating base in the reaction chamber, the center of the lower clamping mounting plate coincides with the center of the heating base. A pin is used to insert into and pass through a central hole opened at the center of the upper clamping mounting plate and the lower clamping mounting plate, so as to align the centers of the upper clamping mounting plate and the lower clamping mounting plate. A guide flange assembly, disposed at the top center of the upper clamping mounting plate, is used to provide insertion guidance for the pin.

2. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 1, characterized in that, The upper screw adjustment assembly includes an upper screw adjustment bracket, an upper adjustment screw, and an upper screw head buffer ball pad. The upper screw adjustment bracket is installed at the bottom edge of the upper clamping mounting plate. The upper adjustment screw is assembled on the upper screw adjustment bracket. The upper screw head buffer ball pad is installed at the end of the upper adjustment screw. The upper adjustment screw is adjusted so that the upper screw head buffer ball pad makes point contact with the inner cylindrical surface of the reaction chamber. The lower screw adjustment assembly includes a lower screw adjustment bracket, a lower adjustment screw, and a lower screw head buffer ball pad. The lower screw adjustment bracket is installed at the bottom edge of the lower clamping mounting plate. The lower adjustment screw is assembled on the lower screw adjustment bracket. The lower screw head buffer ball pad is installed at the end of the lower adjustment screw. The lower adjustment screw is adjusted so that the lower screw head buffer ball pad makes point contact with the cylindrical outer surface of the heating base.

3. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 1, characterized in that, The upper clamping mechanism further includes at least one edge anti-scratch pad disposed at the edge of the upper clamping mounting plate, the at least one edge anti-scratch pad being used to prevent the upper clamping mechanism from scratching the cylindrical inner surface of the reaction chamber.

4. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 1, characterized in that, The guide flange assembly includes a guide flange and an O-ring. A pin hole is provided at the center of the guide flange, and the O-ring is disposed above the pin hole. The inner diameter of the O-ring is smaller than the inner diameter of the pin hole.

5. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 4, characterized in that, The guide flange is located at the top center of the upper clamping mounting plate. The lower end of the guide flange is provided with a boss, and the top center of the upper clamping mounting plate is provided with a recess that matches the shape of the boss. The boss is embedded in the recess so that the center of the guide flange coincides with the center of the upper clamping mounting plate.

6. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 1, characterized in that, The two upper clamping cylinders form line contact with the inner cylindrical surface of the reaction chamber, and the two lower clamping cylinders form line contact with the outer cylindrical surface of the heating base.

7. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 1, characterized in that, Also includes: At least one pin clamp is fixedly installed on the top of the upper clamping mounting plate for clamping and storing the pin.

8. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 2, characterized in that, The upper clamping mounting plate, the lower clamping mounting plate, the upper screw adjustment bracket, and the lower screw adjustment bracket are all made of 6061 aluminum alloy.

9. The alignment and adjustment fixture for the heating base inside the PECVD equipment according to claim 3, characterized in that, The edge scratch-resistant pad is made of PEEK material.

10. A method for aligning and adjusting a heating base inside a PECVD device, characterized in that, The heating base is aligned and adjusted using the alignment and adjustment fixture for the heating base inside the PECVD equipment as described in any one of claims 1-9.

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