Window apparatus, semiconductor apparatus, and semiconductor processing system

Abstract

The present disclosure provides a kind of window device, semiconductor equipment and semiconductor processing system, generally relates to the field of semiconductor manufacturing technology.The window device includes bearing matrix, filter component and shunt column group.The bearing matrix has light transmission channel;The bearing matrix is provided with first side wall and second side wall;The first side wall is provided with medium introduction port;The second side wall is provided with medium outlet port;Filter component is arranged in light transmission channel;Filter component has laminar flow channel inside;Shunt column group is arranged between the inlet side of laminar flow channel and medium introduction port.The present disclosure cooperates with laminar flow channel by configuring shunt column group, shunt column group pre-shunts and homogenizes filter medium at the inlet side of laminar flow channel, laminar flow channel provides smooth flow space for medium inside, and the stable laminar flow state of filter medium is kept in the whole flow channel range by the synergistic effect, and then the light beam is stably spectrally filtered.

Description

Technical Field

[0001] Exemplary embodiments of this disclosure generally relate to the field of semiconductor manufacturing technology, and more particularly to a window device, semiconductor equipment, and semiconductor processing system. Background Technology

[0002] In semiconductor manufacturing, a light beam needs to pass through a viewing window to perform the corresponding process. However, the viewing window in related technologies is a fixed light-transmitting structure, and the light beam passes directly through the window device, making it impossible to adjust the spectrum of the light beam. Summary of the Invention

[0003] This disclosure provides a window device, a semiconductor device, and a semiconductor processing system.

[0004] A first aspect of this disclosure provides a window device for a semiconductor device, including a carrier substrate, a filter assembly, and a shunt column assembly. A carrier substrate is used to be disposed on a semiconductor device; the carrier substrate has a light-transmitting channel that extends vertically; the vertical direction is the axial direction of the semiconductor device; the carrier substrate has a first sidewall and a second sidewall disposed opposite each other in a first direction perpendicular to the vertical direction; the first sidewall is provided with a dielectric inlet port; the second sidewall is provided with a dielectric outlet port; a filter assembly is disposed in the light-transmitting channel; the filter assembly has a laminar flow channel for the flow of filter medium; the laminar flow channel is connected to the dielectric inlet port and the dielectric outlet port respectively; a group of split columns is disposed between the inlet side of the laminar flow channel and the dielectric inlet port; the group of split columns includes multiple split columns arranged at intervals along a second direction, and a first gap is formed between any two adjacent split columns; the dielectric inlet port is connected to the laminar flow channel through multiple first gaps; the second direction, the first direction, and the vertical direction are mutually perpendicular; wherein, the filter medium flowing in from the dielectric inlet port is split by multiple split columns and then flows into the laminar flow channel through multiple first gaps to perform spectral filtering on the light beam passing through the filter assembly.

[0005] This disclosure utilizes a laminar flow channel configuration to ensure smooth flow of the filter medium within the channel, minimizing turbulence and providing a structural basis for maintaining a stable laminar flow state. The filter medium entering the window device is pre-diverted by a splitter column assembly, preventing the jet from directly entering the laminar flow channel and generating eddies, thus ensuring a uniform distribution of the filter medium in the second direction. The splitter column assembly and the laminar flow channel work together; the splitter column assembly pre-diverts and homogenizes the filter medium at the inlet side of the laminar flow channel, while the laminar flow channel provides a stable flow space for the medium internally. Their synergistic effect ensures that the filter medium maintains a stable laminar flow state throughout the entire channel range, thereby providing stable spectral filtering of the light beam.

[0006] A second aspect of this disclosure provides a semiconductor device, including a cavity, a light source, and a window device as described in any of the above embodiments. The cavity is used for implementing semiconductor processes; the light source is located vertically on the outer top and bottom sides of the cavity; the window device is vertically disposed on the top and bottom sides of the cavity; the window device is used to perform spectral filtering on the light beam emitted by the light source, so as to receive the filtered light beams as they enter the cavity through the window device.

[0007] A third aspect of this disclosure provides a semiconductor processing system, including the semiconductor device described in the above embodiments and a circulating liquid supply subsystem. The circulating liquid supply subsystem supplies filter media to a window device, and includes a storage tank, a circulating pump, a supply line, and a return line. The storage tank stores the filter media; the circulating pump is connected to the storage tank; the circulating pump applies pressure to the filter media; the supply line is connected between the outlet of the circulating pump and the media inlet port of the window device, for delivering the filter media to the window device; the return line is connected between the media outlet port of the window device and the storage tank, for returning the filter media that has flowed through the window device to the storage tank.

[0008] It should be understood that the description in the Summary of the Invention is not intended to limit the key or essential features of the embodiments of this disclosure, nor is it intended to restrict the scope of this disclosure. Other features of this disclosure will become readily apparent from the following description. Attached Figure Description

[0009] The above and other features, advantages, and aspects of the embodiments of this disclosure will become more apparent from the accompanying drawings and the following detailed description. In the drawings, the same or similar reference numerals denote the same or similar elements, wherein: Figure 1 This is a schematic diagram of the structure of the window device provided in the embodiments of this disclosure; Figure 2 This is a schematic diagram of the structure of the window device provided in the embodiments of this disclosure; Figure 3 This is an exploded view of the window device provided in the embodiments of this disclosure; Figure 4 This is a schematic diagram of the structure of the filter assembly provided in the embodiments of this disclosure; Figure 5 This is a schematic diagram of the structure of the inlet side of the laminar flow channel provided in an embodiment of this disclosure; Figure 6 This is a schematic diagram of the structure of the inlet side of the laminar flow channel provided in an embodiment of this disclosure; Figure 7 This is a schematic diagram of the structure of the first introduced sub-port provided in an embodiment of this disclosure; Figure 8 This is a schematic diagram of the structure of the second sub-port provided in an embodiment of this disclosure; Figure 9 This is a schematic diagram of the structure of a semiconductor device provided in an embodiment of this disclosure; Figure 10 This is a schematic diagram of the structure of the semiconductor processing system provided in the embodiments of this disclosure; Figure 11 This is a schematic diagram of the structure of the semiconductor processing system provided in the embodiments of this disclosure; Figure 12 This is a schematic flowchart of a semiconductor processing system provided in an embodiment of this disclosure.

[0010] Explanation of reference numerals in the attached figures: 1000: Window device; 1100: Supporting substrate; 1110: Light transmission channel; 1120: First sidewall; 1130: Second sidewall; 1140: Third sidewall; 1150: Fourth sidewall; 1160: Media inlet port; 1161: First introduced sub-port; 1162: Second introduced sub-port; 1163: Flow guide tube; 1164: Second voltage-stabilizing chamber; 1165: partition; 1166: First connecting hole; 1167: Second connecting hole; 1168: Third connecting hole; 1170: Medium output port; 1200: Filter assembly; 1210: Laminar flow channel; 1220: First filter element; 1230: Second filter element; 1300: Flow divider assembly; 1310: Flow divider column; 1400: Entrance side enclosure; 1410: First voltage-stabilizing chamber; 1500: Drainage column assembly; 1510: Drainage column; 1600: Temperature Measurement Unit; 2000: Semiconductor equipment; 2100: Cavity; 2200: Light source; 3000: Semiconductor processing system; 3100: Circulating liquid supply subsystem; 3110: Liquid storage tank; 3120: Circulating pump; 3130: Return line; A: Axial direction; B: First direction; C: Second direction. Detailed Implementation

[0011] The exemplary embodiments of this disclosure are described below with reference to the accompanying drawings, including various details of the embodiments to aid understanding, and should be considered merely exemplary. Therefore, those skilled in the art will recognize that various changes and modifications can be made to the embodiments described herein without departing from the scope and spirit of this disclosure. Similarly, for clarity and brevity, descriptions of well-known functions and structures are omitted in the following description.

[0012] like Figures 1 to 8 As shown, this embodiment provides a window device 1000 for a semiconductor device, including a carrier substrate 1100, a filter assembly 1200, and a shunt column assembly 1300. The carrier substrate 1100 is disposed on the semiconductor device; the carrier substrate 1100 has a light-transmitting channel 1110 extending along an axial direction A, where axial direction A is the axial direction of the semiconductor device; the carrier substrate 1100 has a first sidewall 1120 and a second sidewall 1130 disposed opposite each other along a first direction B perpendicular to axial direction A; the first sidewall 1120 has a medium inlet port 1160; the second sidewall 1130 has a medium outlet port 1170; the filter assembly 1200 is disposed in the light-transmitting channel 1110; the filter assembly 1200 has a laminar flow channel 1210 for the flow of the filter medium; the laminar flow channel 1210 is connected to the medium inlet port 1160 and the medium outlet port 1170. 170 are connected respectively; the diverter column group 1300 is disposed between the inlet side of the laminar flow channel 1210 and the medium inlet port 1160; the diverter column group 1300 includes a plurality of diverter columns 1310 arranged at intervals along the second direction C, and a first gap is formed between any two adjacent diverter columns 1310; the medium inlet port 1160 is connected to the laminar flow channel 1210 through the plurality of first gaps; the second direction C, the first direction B and the axial direction A are perpendicular to each other; wherein, the filter medium flowing in from the medium inlet port 1160 is diverted by the plurality of diverter columns 1310 and flows into the laminar flow channel 1210 through the plurality of first gaps to perform spectral filtering on the light beam passing through the filter light assembly 1200.

[0013] For ease of description, this embodiment defines the direction pointing downwards as axis A, which is the axial direction of the semiconductor device, such as... Figure 1 , Figure 2 The direction is vertically downwards. The first direction, B, is... Figure 1 , Figure 2 The direction from left to right in the middle. The second direction is... Figure 1 , Figure 2 The middle arrow C indicates the direction it points to.

[0014] The semiconductor device, as a whole, serves as the main execution body for semiconductor processes and may include structures such as a cavity 2100 and a light source 2200. The cavity 2100 is a sealed process space used for performing semiconductor processes (such as etching and deposition). The light source 2200 can be arranged along axis A on the top outer side of the cavity 2100, or on the bottom outer side of the cavity 2100, or on both the top and bottom outer sides of the cavity 2100, for emitting a light beam into the cavity 2100. The window device 1000 serves as a connecting structure for the optical path of the semiconductor device, used to achieve spectral filtering of the light beam during its passage through an internally flowing filter medium.

[0015] The support substrate 1100 is a supporting component for connecting the window device 1000 to the semiconductor device, and can generally be plate-shaped. The support substrate 1100 can be composed of a top wall, a bottom wall, and multiple side walls between the top and bottom walls; this disclosure illustrates four side walls, wherein a first side wall 1120 and a second side wall 1130 are arranged opposite each other along the first direction B; the other two are a third side wall 1140 and a fourth side wall 1150 arranged opposite each other along the second direction C. The first side wall 1120 is provided with a medium inlet port 1160, and the second side wall 1130 is provided with a medium outlet port 1170. The medium inlet port 1160 is used for the filter medium to flow into the window device 1000, and the medium outlet port 1170 is used for the filter medium to flow out after flowing through the window device 1000.

[0016] The light-transmitting channel 1110 is a pathway for a light beam to pass through the window device 1000, such as a through-hole extending along axis A through the top and bottom walls. The light-transmitting channel 1110 can be located relative to the central region of the supporting substrate 1100. The cross-sectional shape of the light-transmitting channel 1110 can be rectangular, circular, elliptical, or as shown in the figure. Figure 1-3 The irregular shape shown. The cross-sectional dimensions of the light-transmitting channel 1110 can be determined according to actual process requirements.

[0017] The media inlet port 1160 can be an opening structure disposed on the first sidewall 1120 for allowing the filter media to flow into the window device 1000. The media outlet port 1170 can be an opening structure disposed on the second sidewall 1130 for allowing the filter media to flow out of the window device 1000. In one example, the media inlet port 1160 extends from the outside of the first sidewall 1120 into the interior of the light-transmitting channel 1110; the media outlet port 1170 extends from the outside of the second sidewall 1130 into the interior of the light-transmitting channel 1110. The cross-sectional shape of the media inlet port 1160 and the media outlet port 1170 can be circular, rectangular, or other shapes. The aperture size of the media inlet port 1160 and the media outlet port 1170 can be determined according to the required flow rate and velocity; in one example, the media inlet port 1160 and the media outlet port 1170 can both be set as circular through holes to facilitate connection with external pipelines.

[0018] The outlet end of the media inlet port 1160 can be set toward the split column group 1300, so that the filter media discharged from the media inlet port 1160 can enter the area where the split column group 1300 is located; the inlet end of the media outlet port 1170 is set toward the outlet side of the laminar flow channel 1210 or other mechanism such as the diversion column group 1500, so that the filter media flowing through the laminar flow channel 1210 can be smoothly collected to the media outlet port 1170.

[0019] A filter assembly 1200 is disposed in the light transmission channel 1110 for the passage of a light beam; the filter assembly 1200 is generally plate-shaped. The filter assembly 1200 has a laminar flow channel 1210 for the flow of the filter medium. This laminar flow channel 1210 can be constructed as a thin-layered channel, meaning that the height dimension of the laminar flow channel 1210 in the axial direction A is much smaller than the length of the laminar flow channel 1210 in the first direction B and the width of the laminar flow channel 1210 in the second direction C. The inlet side of the laminar flow channel 1210 is connected to the medium inlet port 1160, and the outlet side of the laminar flow channel 1210 is connected to the medium outlet port 1170, allowing the filter medium to flow into the laminar flow channel 1210 from the medium inlet port 1160, flow through the entire laminar flow channel 1210, and then exit from the medium outlet port 1170.

[0020] The filter assembly 1200 can be a single integral structure, for example, including a first filter element 1220 and a second filter element 1230 spaced apart along the axial direction A. A fixing member is provided between the first filter element 1220 and the second filter element 1230, so that the opposing surfaces of the two filters and the fixing member together form a laminar flow channel 1210. Alternatively, the filter assembly 1200 can be a split structure, for example, including a first filter element 1220 and a second filter element 1230 spaced apart along the axial direction A. The first filter element 1220 and the second filter element 1230 are each independently fixed to the inner wall of the light transmission channel 1110, that is, the first filter element 1220, the second filter element 1230 and the inner wall of the light transmission channel 1110 together form a laminar flow channel 1210. In one example, a predetermined gap is maintained between the first filter element 1220 and the second filter element 1230 in the axial direction, the predetermined gap being the height of the laminar flow channel 1210 for the flow of the filter medium.

[0021] The diversion column group 1300 is disposed between the inlet side of the laminar flow channel 1210 and the medium inlet port 1160, and includes a plurality of diversion columns 1310 arranged at intervals along the second direction C, with a first gap formed between any two adjacent diversion columns 1310; the plurality of diversion columns 1310 are used to divert the filter medium flowing out from the medium inlet port 1160, dispersing the concentrated jet of filter medium into multiple uniform fine streams, and the multiple fine streams respectively flow into the laminar flow channel 1210 through the multiple first gaps.

[0022] The diversion column 1310 is generally columnar in shape, with an elliptical or streamlined cross-section to reduce flow resistance when the filter medium flows through. The height of the diversion column 1310 can be determined based on the axial height A of the laminar flow channel 1210. For example, the axial height A of the diversion column 1310 can be approximately the same as or slightly smaller than the axial height A of the laminar flow channel 1210 to ensure that the filter medium can smoothly pass through any of the first gaps into the laminar flow channel 1210. The number of diversion columns 1310 is determined based on the width of the laminar flow channel 1210 in the second direction C, for example, from 5 to 15. The diversion columns 1310 can be arranged at equal intervals along the second direction C, making the widths of the multiple first gaps equal, so that the flow rate of the medium exiting from each first gap is uniform, forming a uniform laminar flow state after entering the laminar flow channel 1210.

[0023] The filter medium flowing in through the medium inlet port 1160 first contacts the splitter column group 1300. Under the action of the splitter column group 1300, the concentrated jet entering from the medium inlet port 1160 is dispersed by multiple splitter columns 1310 and split into multiple uniform fine streams. These fine streams converge into the laminar flow channel 1210 through multiple first gaps. When the light beam passes through the window device 1000 along the axial direction A, it passes through the filter medium in the filter light assembly 1200 and the laminar flow channel 1210. The filter medium has an absorption effect on the light beam of a specific wavelength band, thereby achieving spectral filtering. The arrangement of the splitter column group 1300 ensures that the filter medium in the laminar flow channel 1210 can maintain a laminar flow state.

[0024] According to the window device 1000 of this disclosure, by configuring a laminar flow channel 1210, the filter medium flows smoothly within the channel, making it less prone to turbulence, thus providing a structural basis for maintaining a stable laminar flow state for the filter medium. By configuring a flow-splitting column assembly 1300, the filter medium entering the window device 1000 is pre-splitted, so that the concentrated jet entering from the filter medium inlet port 1160 is dispersed into multiple uniform fine streams, avoiding the jet directly entering the laminar flow channel 1210 and generating eddies. The flow-splitting column assembly 1300 and the laminar flow channel 1210 cooperate with each other. The flow-splitting column assembly 1300 pre-splits and homogenizes the filter medium at the inlet side of the laminar flow channel 1210, while the laminar flow channel 1210 provides a stable flow space for the medium inside. The synergistic effect of the two ensures that the medium maintains a stable laminar flow state throughout the entire channel range, thereby performing stable spectral filtering of the light beam.

[0025] In one example, distilled water can be used as the filter medium. Distilled water has specific light absorption characteristics in the 1450nm wavelength band, which can absorb the light radiation from the light source 2200 (such as an arc lamp) in the 1450nm wavelength band. Since the arc lamp has a strong light radiation intensity in the vicinity of 1450nm, and the heated wafer also has a certain radiation spectrum in this band, by using distilled water as the filter medium, the beam of light from the arc lamp in the 1450nm wavelength band can be filtered out when it flows through the window device 1000.

[0026] In one example, when the window device 1000 is mounted on top of the cavity 2100, multiple fixing pins can be configured on the outer side of the bottom wall of the supporting base 1100 (i.e., the side facing the interior of the cavity 2100). When the window device 1000 is mounted on the bottom of the cavity 2100, multiple fixing pins can be configured on the outer side of the top wall of the supporting base 1100 (i.e., the side facing the interior of the cavity 2100). The multiple fixing pins are spaced apart circumferentially along the light-transmitting channel 1110 to position the window device 1000 on the cavity 2100. The fixing pins can be columnar structures that engage with positioning holes provided on the top or bottom of the cavity 2100 to achieve precise positioning between the window device 1000 and the cavity 2100.

[0027] A sealing ring can be provided between the carrier substrate 1100 and the cavity 2100 to prevent gas leakage inside the cavity 2100 or external gas from entering the cavity 2100, thus ensuring the sealing of the cavity and ensuring the safe and reliable operation of the semiconductor process.

[0028] In one embodiment, such as Figure 1-8 As shown, the window device 1000 also includes an inlet side enclosure 1400, which is disposed between the diversion column group 1300 and the medium inlet port 1160; the inlet side enclosure 1400 extends along the second direction C and forms a first pressure stabilizing cavity 1410 with the first side wall 1120 located on one side inner wall of the light transmission channel 1110; the first pressure stabilizing cavity 1410 is connected to a plurality of first gaps; the filter medium flowing in from the medium inlet port 1160 is stabilized by the first pressure stabilizing cavity 1410 and then flows into the laminar flow channel 1210 through the plurality of first gaps.

[0029] The inlet-side enclosure 1400 is an enclosure structure located upstream of the diversion column group 1300, used to enclose a cavity space for stabilizing the pressure of the filter medium together with part of the inner wall of the supporting substrate 1100. The inlet-side enclosure 1400 is generally a strip-shaped plate structure extending along the second direction C. The two ends of the inlet-side enclosure 1400 are respectively connected to the two inner walls (i.e., the inner walls of the third side wall 1140 and the fourth side wall 1150) of the light transmission channel 1110 along the second direction C, so that the inlet-side enclosure 1400 spans the entire inlet-side area of ​​the laminar flow channel 1210. The height of the inlet side barrier 1400 in the axial direction A is higher than the lowest end of the inlet of the laminar flow channel 1210. That is, the top of the inlet side barrier 1400 extends upward to the height range above the lowest end of the inlet of the laminar flow channel 1210, which is equivalent to raising the height of the inlet area before the filter medium enters the laminar flow channel 1210, so as to avoid the filter medium being obstructed by the flow in the axial direction A before entering the diversion column group 1300.

[0030] The entrance side enclosure 1400 can be integrated with the diversion column assembly 1300, meaning the entrance side enclosure 1400 and each diversion column 1310 in the diversion column assembly 1300 are integrally formed into a single component to improve structural stability and ease of assembly. The entrance side enclosure 1400 can be integrally formed and fixedly connected to the supporting base 1100, or it can be fixed to the inner wall of the light-transmitting channel 1110 of the supporting base 1100 by welding, bonding, or threaded connection.

[0031] The inlet-side enclosure 1400 and the first sidewall 1120 are located on one side of the inner wall of the light-transmitting channel 1110, forming a first pressure-stabilizing cavity 1410. Specifically, the inlet-side enclosure 1400 is located upstream of the diversion column group 1300 (i.e., near the medium inlet port 1160) along the first direction B. The inlet-side enclosure 1400 and the inner wall of the first sidewall 1120 are spaced apart along the first direction B, and the space between them is the first pressure-stabilizing cavity 1410. The first pressure-stabilizing cavity 1410 is an elongated cavity space extending along the second direction C. The two ends of the first pressure-stabilizing cavity 1410 along the second direction C are respectively closed by the inner walls of the third sidewall 1140 and the fourth sidewall 1150 of the light-transmitting channel 1110. Since the height of the inlet side enclosure 1400 in the axial direction A is higher than the lowest end of the inlet of the laminar flow channel 1210, the first pressure stabilizing chamber 1410 has sufficient height space in the axial direction A, so that the filter medium can be fully diffused and stabilized after entering the first pressure stabilizing chamber 1410.

[0032] The first voltage-stabilizing chamber 1410 is connected to the laminar flow channel 1210 through multiple first gaps. Specifically, after the filter medium enters the first voltage-stabilizing chamber 1410 from the medium inlet port 1160, it needs to pass over the top of the inlet-side enclosure 1400, that is, over the upper edge of the inlet-side enclosure 1400 along the first direction B, and then flow into the laminar flow channel 1210 through multiple first gaps. The first voltage-stabilizing chamber 1410 is connected to multiple first gaps in that the downstream end of the first voltage-stabilizing chamber 1410 along the first direction B is directly connected to any one of the first gaps in space, so that the voltage-stabilized filter medium can flow directly from the first voltage-stabilizing chamber 1410 into the first gap.

[0033] After entering through the media inlet port 1160, the filter medium first enters the first pressure-stabilizing chamber 1410. Because the first pressure-stabilizing chamber 1410 has a large size in the second direction C, the incoming concentrated jet is buffered within it, the flow velocity decreases, and the pressure is redistributed and becomes more uniform along the second direction C. This allows the flow velocity and pressure of the filter medium to be initially homogenized and stabilized before entering the flow distribution column group 1300. After being stabilized by the first pressure-stabilizing chamber 1410, the filter medium passes over the top of the inlet-side barrier 1400 along the first direction B and enters the area where the flow distribution column group 1300 is located. Then, it enters the laminar flow channel 1210 through multiple first gaps.

[0034] According to the window device 1000 of the present disclosure, a first pressure stabilizing chamber 1410 is formed by configuring an inlet-side enclosure 1400, so that the filter medium undergoes pressure stabilization before entering the diversion column group 1300, eliminating pressure fluctuations caused by the external liquid supply pipeline, making the pressure distribution of the filter medium in the second direction C more uniform. The pressure-stabilized filter medium enters the laminar flow channel 1210 through multiple first gaps, which can form a more uniform laminar flow state.

[0035] In one embodiment, such as Figure 1-8 As shown, the medium inlet port 1160 includes at least one first inlet sub-port 1161 and two second inlet sub-ports 1162; the first inlet sub-port 1161 is located between the two second inlet sub-ports 1162, and the first inlet sub-port 1161 and the second inlet sub-port 1162 are arranged along the second direction C.

[0036] The medium inlet port 1160 is composed of a plurality of sub-ports arranged along the second direction C. Specifically, the medium inlet port 1160 includes at least one first inlet sub-port 1161 and two second inlet sub-ports 1162. The number of first inlet sub-ports 1161 can be one, two, three or more, and its specific number is determined according to the width of the laminar flow channel 1210 in the second direction C and the required flow rate. The two second inlet sub-ports 1162 are respectively located on both sides of the first inlet sub-ports 1161 arranged along the second direction C. That is, the first inlet sub-port 1161 is located between the two second inlet ports 1162. When there is one first inlet sub-port 1161, the sequence from left to right along the second direction C is: second inlet sub-port 1162, first inlet sub-port 1161, second inlet sub-port 1162; when there are two first inlet sub-ports 1161, the sequence from left to right along the second direction C is: second inlet sub-port 1162, first inlet sub-port 1161, first inlet sub-port 1161, second inlet sub-port 1162; and so on. Both the first inlet sub-port 1161 and the second inlet sub-port 1162 are through-hole structures formed on the first sidewall 1120, and their cross-sectional shape can be circular, rectangular, or other shapes. The sub-ports can be arranged at equal intervals along the second direction C, or adjusted according to actual flow distribution requirements.

[0037] The orifice sizes of the first inlet sub-port 1161 and the second inlet sub-port 1162 can be determined according to the required flow rate and velocity. In one example, the orifice size of the first inlet sub-port 1161 can be larger than that of the second inlet sub-port 1162, so that the medium supply in the middle region is greater than that in the edge region. In another example, the orifice sizes of the first inlet sub-port 1161 and the second inlet sub-port 1162 can be the same to simplify processing and assembly. Each sub-port is connected to an external liquid supply line, which can be multiple independent lines equal to the number of sub-ports, or a main line branched into multiple branches.

[0038] According to the window device 1000 of the present disclosure, by configuring at least one first inlet sub-port 1161 located in the middle region and two second inlet sub-ports 1162 located in the two side edge regions, the filter medium can enter the light transmission channel 1110 simultaneously from multiple positions along the second direction C, avoiding the problem of uneven distribution of the medium in the second direction C caused by a single port.

[0039] In one embodiment, such as Figure 1-8As shown, a guide pipe 1163 is provided at the outlet end of the first inlet sub-port 1161; wherein, along the first direction B, the guide pipe 1163 includes an inlet section and an outlet section arranged opposite to each other; the inlet section of the guide pipe 1163 is gradually narrowing along the first direction B; the outlet section of the guide pipe 1163 is gradually widening along the first direction B.

[0040] The guide tube 1163 is a tubular component located at the outlet end of the first inlet sub-port 1161, used to guide and rectify the filter medium flowing out of the first inlet sub-port 1161. The guide tube 1163 has a hollow tubular structure, and its internal channel is used for the filter medium to flow through. The guide tube 1163 extends along the first direction B, with its inlet section facing the medium inflow direction (i.e., towards the outside of the first sidewall 1120) and its outlet section facing the medium outflow direction (i.e., towards the inside of the light-transmitting channel 1110). The outer wall of the inlet section of the guide tube 1163 is connected to the inner wall of the first inlet sub-port 1161. The connection method can be welding, bonding, interference fit, or threaded connection, etc., so that the filter medium entering from the first inlet sub-port 1161 must pass through the internal channel of the guide tube 1163 before being discharged.

[0041] The inlet section of the guide tube 1163 is tapered along the first direction B, meaning the cross-sectional area of ​​the inlet section gradually decreases along the flow direction of the filter medium. Specifically, the inner diameter of the inlet section gradually decreases along the first direction B. The tapering angle of the inlet section can be determined according to the actual flow velocity and flow rate requirements; for example, the tapering angle can be from 5° to 30°. The tapering structure causes the flow velocity of the filter medium to gradually increase along the flow direction when it flows through the inlet section, which helps to eliminate turbulent components in the flow and makes the medium flow more orderly.

[0042] The outlet section of the guide tube 1163 gradually expands along the first direction B, meaning the cross-sectional area of ​​the outlet section gradually increases along the flow direction of the filter medium. The expansion angle of the outlet section can be determined according to the actual flow velocity and flow rate requirements; for example, the expansion angle can be from 5° to 30°. The expanding structure causes the flow velocity of the filter medium to gradually decrease along the flow direction when it flows through the outlet section, further stabilizing the flow field. The contracting structure of the inlet section, the expanding structure of the outlet section, and the transition region between them together form a continuous and smooth flow channel inside the guide tube 1163, allowing the filter medium to accelerate and decelerate smoothly when flowing through the guide tube 1163, avoiding flow separation or eddies in the filter medium.

[0043] In one example, a transition region exists between the inlet and outlet sections of the guide tube 1163. The filter medium first passes through the inlet section of the guide tube 1163. Under the action of the converging structure, the medium velocity gradually increases and the pressure gradually decreases, eliminating turbulent components in the flow. Subsequently, the medium passes through the transition region between the inlet and outlet sections, and finally through the outlet section. Under the action of the expanding structure, the medium velocity gradually decreases and the pressure gradually recovers, further stabilizing the flow field. The filter medium, rectified by the guide tube 1163, is discharged from the outlet section of the guide tube 1163 at a uniform velocity and pressure, enters the downstream region (such as the first pressure stabilizing chamber 1410), and then flows into the laminar flow channel 1210 via the split column assembly 1300.

[0044] According to the window device 1000 of the present disclosure, the gradual contraction and expansion combination structure of the guide tube 1163 achieves a smooth transition of the medium flow, avoids the flow separation and eddies of the filter medium, and ensures that the medium enters the subsequent flow path in a stable laminar flow state.

[0045] In one embodiment, such as Figure 1-8 As shown, the inner wall of the first inlet sub-port 1161 includes a first sub-wall and a second sub-wall along the first direction B; the inlet section of the guide tube 1163 is at least connected to the second sub-wall to form a second pressure stabilizing cavity 1164 between the first sub-wall and the inlet section of the guide tube 1163; the filter medium is discharged through the guide tube 1163 after being stabilized by the second pressure stabilizing cavity 1164.

[0046] The first inlet sub-port 1161 is a through-hole structure formed on the first sidewall 1120, and its inner wall is divided into a first sub-wall and a second sub-wall along the first direction B. The first sub-wall and the second sub-wall are two continuous sections of the inner wall of the first inlet sub-port 1161 along the medium flow direction. Along the medium flow direction (i.e., the direction from the outside of the first sidewall 1120 to the inside of the light-transmitting channel 1110 in the first direction B), the first sub-wall is located in the upstream section, that is, the section close to the outer surface of the first sidewall 1120; the second sub-wall is located in the downstream section, that is, the section close to the inside of the light-transmitting channel 1110.

[0047] The guide tube 1163 can be inserted into the first inlet sub-port 1161 from the inside of the first sidewall 1120 in the opposite direction to the first direction B, but the guide tube 1163 is only inserted to a certain depth into the first inlet sub-port 1161. The outer wall of the inlet section of the guide tube 1163 is in close contact with the second sub-wall. Since the outer diameter of the guide tube 1163 is smaller than the inner diameter of the first inlet sub-port 1161, the outer wall of the inlet section of the guide tube 1163 and the first sub-wall are radially spaced apart, and the spaced area is the second voltage stabilizing cavity 1164. That is to say, after the guide tube 1163 is inserted into the first inlet sub-port 1161, the radial space between its inlet section outer wall and the first sub-wall constitutes the second voltage stabilizing cavity 1164.

[0048] After entering through the inlet end of the first inlet port 1161 (i.e., the outside of the first sidewall 1120), the filter medium flows along the first direction B into the second pressure-stabilizing chamber 1164, where it accumulates to form a certain amount of medium. This allows the flow rate and pressure of the filter medium to be initially homogenized and stabilized before entering the guide tube 1163. After being stabilized by the second pressure-stabilizing chamber 1164, the filter medium enters the internal channel of the guide tube 1163 from the inlet section and is then discharged through the outlet section of the guide tube 1163.

[0049] According to the window device 1000 of the present disclosure, a second pressure stabilizing cavity 1164 is formed by the gap between the outer wall of the guide tube 1163 and the first sub-wall, so that the filter medium is pre-stabilized before entering the guide tube 1163, eliminating pressure fluctuations and allowing the filter medium to enter the guide tube 1163 with a stable pressure.

[0050] In one embodiment, such as Figure 1-8 As shown, a partition 1165 is provided at the outlet end of the second inlet sub-port 1162; the partition 1165 is provided with a first connecting hole 1166, a second connecting hole 1167 and a third connecting hole 1168; the filter medium in the second inlet sub-port 1162 is discharged through the first connecting hole 1166, the second connecting hole 1167 and the third connecting hole 1168; wherein, along the first direction B, the central axis of the first connecting hole 1166 and the central axis of the second connecting hole 1167 are inclined in a direction away from the central axis of the third connecting hole 1168.

[0051] The partition 1165 is a plate-shaped component disposed at the outlet end of the second inlet sub-port 1162. The overall outline of the partition 1165 matches the cross-sectional shape of the second inlet sub-port 1162. For example, when the second inlet sub-port 1162 is a circular through-hole, the partition 1165 is a circular plate-shaped structure; when the second inlet sub-port 1162 is a rectangular through-hole, the partition 1165 is a rectangular plate-shaped structure. The partition 1165 seals the outlet end of the second inlet sub-port 1162, that is, the partition 1165 is disposed at the end of the second inlet sub-port 1162 facing the interior of the light-transmitting channel 1110. The partition 1165 can be fixedly connected to the inner wall of the second inlet sub-port 1162 by means of welding, bonding, interference fit, or integral molding.

[0052] The partition 1165 has three connecting holes: a first connecting hole 1166, a second connecting hole 1167, and a third connecting hole 1168. These three connecting holes are used to guide and distribute the filter medium flowing out from the second inlet port 1162. The cross-sectional shape of the three connecting holes can be circular, elliptical, or other shapes. In this embodiment, the cross-sectional shape of all three connecting holes is circular to facilitate processing and ensure smooth medium flow. In one example, the first connecting hole 1166 and the second connecting hole 1167 can be located relative to each other in the upper region of the partition 1165 (i.e., a higher position along the axial direction A), and the third connecting hole 1168 is located in the lower region of the partition 1165 (i.e., a lower position along the axial direction A). The first connecting hole 1166 and the second connecting hole 1167 are spaced apart along the second direction C, and the third connecting hole 1168 is located approximately below the first connecting hole 1166 and the second connecting hole 1167. The arrangement of the three connecting holes forms an inverted triangle on the end face of the partition 1165, with the first connecting hole 1166 and the second connecting hole 1167 located at the top as the two vertices of the triangle, and the third connecting hole 1168 located at the bottom as one vertices of the triangle.

[0053] Along the first direction B, the central axis of the first connecting hole 1166 is inclined relative to the central axis of the third connecting hole 1168. Similarly, the central axis of the second connecting hole 1167 is inclined relative to the central axis of the third connecting hole 1168. Specifically, the central axes of the first connecting hole 1166 and the second connecting hole 1167 are inclined in directions away from the central axis of the third connecting hole 1168. In one example, the central axis of the first connecting hole 1166 is inclined to the left in space, and the central axis of the second connecting hole 1167 is inclined to the right in space, and the two diverge outward in a figure-eight shape. The central axis of the third connecting hole 1168 can extend straight along the first direction B without inclination, and the central axes of the first connecting hole 1166 and the second connecting hole 1167 both diverge outward with reference to the central axis of the third connecting hole 1168. The inclination angles of the first connecting hole 1166 and the second connecting hole 1167 can be determined according to the actual required medium diffusion range. For example, the angle between the central axis of the first connecting hole 1166 and the second connecting hole 1167 and the central axis of the third connecting hole 1168 can be 10° to 30°. The diameters of the three connecting holes can be the same or different. For example, the diameters of the first connecting hole 1166 and the second connecting hole 1167 can be the same and smaller than the diameter of the third connecting hole 1168 to adapt to the flow requirements of different areas.

[0054] The filter medium flowing in through the second inlet port 1162 enters from the inlet end of the second inlet port 1162 and exits through the first connecting hole 1166, the second connecting hole 1167, and the third connecting hole 1168, respectively. Since the central axes of the first connecting hole 1166 and the second connecting hole 1167 are inclined away from the central axis of the third connecting hole 1168, the filter medium exiting through the first connecting hole 1166 and the second connecting hole 1167 has a velocity component that diffuses to both sides, while the filter medium exiting through the third connecting hole 1168 flows out horizontally along the first direction B or in other directions. The filter medium exiting through the three connecting holes forms a dispersed flow field distribution on the outlet side of the partition 1165, making the filter medium more uniformly distributed in the second direction C when entering subsequent flow paths (such as the first voltage regulating chamber 1410).

[0055] According to the window device 1000 of the present disclosure, by setting the central axis of the two connecting holes to be inclined in a direction away from the central axis of the other connecting hole, the filter medium generates a diffusion effect when passing through the partition 1165, which helps the filter medium to be evenly distributed along the second direction C when entering the subsequent flow path, and avoids uneven flow caused by the filter medium being concentrated in a certain area.

[0056] In one embodiment, the inner wall of the second inlet sub-port 1162 includes a third sub-wall and a fourth sub-wall along the first direction B; the partition 1165 is at least connected to the fourth sub-wall to form a third voltage-stabilizing cavity between the third sub-wall and the partition 1165; after the filter medium is stabilized by the third voltage-stabilizing cavity, it is discharged through the first connecting hole 1166, the second connecting hole 1167 and the third connecting hole 1168.

[0057] The second inlet sub-port 1162 is a through-hole structure formed on the first sidewall 1120. Its inner wall is divided into a third sub-wall and a fourth sub-wall along the first direction B, which are two continuous sections of the inner wall of the second inlet sub-port 1162 along the medium flow direction. Along the medium flow direction (i.e., the direction from the outside of the first sidewall 1120 to the inside of the light-transmitting channel 1110 in the first direction B), the third sub-wall is located in the upstream section, that is, the section close to the outer surface of the first sidewall 1120; the fourth sub-wall is located in the downstream section, that is, the section close to the inside of the light-transmitting channel 1110.

[0058] The outer wall of the partition 1165 is fitted and connected to the fourth sub-wall. The connection method can be welding, bonding, interference fit, or integral molding, so that the partition 1165 is fixed within the second inlet sub-port 1162. The space enclosed by the partition 1165 and the third sub-wall is the third voltage stabilizing chamber. The third voltage stabilizing chamber is connected to the inlet section of the second inlet sub-port 1162 along the first direction B.

[0059] The filter medium enters through the inlet end of the second inlet sub-port 1162 (i.e., the outside of the first sidewall 1120) and flows along the first direction B. Since the partition 1165 is located within the second inlet sub-port 1162 and is only connected to the fourth sub-wall, the filter medium first enters the third pressure-stabilizing chamber between the partition 1165 and the third sub-wall. A certain amount of media accumulation occurs within the third pressure-stabilizing chamber, allowing the flow rate and pressure of the filter medium to be initially homogenized and stabilized before passing through the partition 1165. After being stabilized in the third pressure-stabilizing chamber, the filter medium is discharged through the first connecting hole 1166, the second connecting hole 1167, and the third connecting hole 1168 on the partition 1165, entering the subsequent flow path.

[0060] According to the window device 1000 of the present disclosure, the filter medium is pre-stabilized before passing through the partition 1165 by the third pressure stabilizing chamber, which eliminates pressure fluctuations and flow pulsations, so that the filter medium is discharged through the three connecting holes on the partition 1165 at a stable pressure, ensuring the uniformity of the flow of the medium flowing out of each connecting hole.

[0061] In one embodiment, such as Figure 1-8 As shown, the window device 1000 also includes a flow-guiding column group 1500, which is disposed between the outlet side of the laminar flow channel 1210 and the medium outlet port 1170; the flow-guiding column group 1500 includes a plurality of flow-guiding columns 1510 arranged at intervals along the second direction C, and a second gap is formed between any two adjacent flow-guiding columns 1510; the filter medium flowing out of the laminar flow channel 1210 is guided to the medium outlet port 1170 through the plurality of second gaps.

[0062] The flow-guiding column assembly 1500 is a component located on the outlet side of the laminar flow channel 1210. It collects and guides the filter media flowing out of the laminar flow channel 1210, directing it into the media outlet port 1170. The flow-guiding column assembly 1500 is positioned between the outlet side of the laminar flow channel 1210 and the media outlet port 1170. The flow-guiding column assembly 1500 consists of multiple flow-guiding columns 1510, which are arranged at intervals along a second direction C, with a second gap formed between any two adjacent flow-guiding columns 1510. The flow-guiding columns 1510 are generally columnar structures, and their cross-sectional shape can be circular, elliptical, or streamlined to reduce flow resistance when the filter media flows through them. The height of the drainage column 1510 is determined based on the axial height A of the laminar flow channel 1210. For example, the axial height A of the drainage column 1510 is approximately the same as or slightly smaller than the axial height A of the laminar flow channel 1210 to ensure that the filter medium can pass smoothly through the second gap. The number of drainage columns 1510 is determined based on the width of the laminar flow channel 1210 in the second direction C, and can be, for example, 5 to 15.

[0063] The filter medium within the laminar flow channel 1210 flows along the first direction B to the outlet side of the laminar flow channel 1210, and then first enters the area where the guide column group 1500 is located; it then converges towards the medium outlet port 1170 through multiple second gaps. In one example, the widths of the multiple second gaps are equal and they are uniformly distributed along the second direction C, and the flow rate of the medium flowing out of each second gap is uniform, so that the filter medium maintains a stable flow field during the convergence process, avoiding the generation of eddies or backflow.

[0064] According to the window device 1000 of the present disclosure, by configuring the flow-guiding column group 1500, the filter medium flowing out from the outlet side of the laminar flow channel 1210 is uniformly collected to the medium outlet port 1170, thereby avoiding backflow on the outlet side of the laminar flow channel 1210 and ensuring the smoothness of the entire flow path.

[0065] In one example, such as Figure 1-8 As shown, the diversion column group 1500 and the diversion column group 1300 are structurally corresponding to each other. They are respectively arranged on the inlet side and outlet side of the laminar flow channel 1210, forming a complete flow path for the filter medium to flow into, through, and out of the laminar flow channel 1210. The diversion column group 1500 and the diversion column group 1300 can have the same or similar configuration in structure. For example, the cross-sectional shape of the diversion column 1510 can be the same as the cross-sectional shape of the diversion column 1310. The number of diversion columns 1510 can also be the same as the number of diversion columns 1310. The arrangement of multiple diversion columns 1510 along the second direction C can also be the same as the arrangement of multiple diversion columns 1310. The height of the diversion column 1510 in the axial direction A can also be the same as the height of the diversion column 1310 in the axial direction A. In terms of position, the diversion column group 1500 and the diversion column group 1300 are respectively set on the outlet side and the inlet side of the laminar flow channel 1210. The two can be arranged opposite to each other along the first direction B. The position of each diversion column 1510 in the diversion column group 1500 in the second direction C corresponds one-to-one with the position of each diversion column 1310 in the diversion column group 1300 in the second direction C. That is, the diversion column 1510 and the diversion column 1310 are aligned in the second direction C.

[0066] In one embodiment, the window device 1000 further includes an outlet-side enclosure disposed between the drainage column group 1500 and the media outlet port 1170; the outlet-side enclosure extends along the second direction C and forms a drainage cavity with the second sidewall 1130 located on one side of the inner wall of the light-transmitting channel 1110; the drainage cavity communicates with a plurality of second gaps; the filter medium flowing out from the plurality of second gaps is guided to the media outlet port 1170 through the drainage cavity.

[0067] The outlet-side enclosure is a structure located downstream of the flow-guiding column assembly 1500, used to enclose a cavity space for the collection of the filter medium together with part of the inner wall of the supporting substrate 1100. The outlet-side enclosure is generally a strip-shaped plate structure extending along the second direction C. The two ends of the outlet-side enclosure are respectively connected to the two inner walls (i.e., the inner walls of the third side wall 1140 and the fourth side wall 1150) of the light-transmitting channel 1110 along the second direction C. The height of the outlet-side enclosure in the axial direction A is higher than the lowest point of the outlet of the laminar flow channel 1210, that is, the top of the outlet-side enclosure extends upward to above the height range of the lowest point of the outlet of the medium flow channel, which is equivalent to raising the height of the outlet area after the filter medium flows out of the medium flow channel, so that the filter medium completes laminar flow in the laminar flow channel 1210.

[0068] The outlet-side enclosure can be integrated with the diversion column assembly 1500, meaning the outlet-side enclosure and each diversion column 1510 in the diversion column assembly 1500 are integrally formed into a single component to improve structural stability and ease of assembly. The outlet-side enclosure can be integrally formed and fixedly connected to the supporting base 1100, or it can be fixed to the inner wall of the light-transmitting channel 1110 of the supporting base 1100 by welding, bonding, or threaded connection.

[0069] The outlet-side enclosure and the second sidewall 1130 are located on one side of the inner wall of the light-transmitting channel 1110, forming a drainage cavity. Specifically, the outlet-side enclosure is located downstream of the drainage column group 1500 (i.e., near the medium outlet port 1170) along the first direction B. The outlet-side enclosure and the inner wall of the second sidewall 1130 are spaced apart along the first direction B, and the space between them is the drainage cavity. The drainage cavity is an elongated cavity space extending along the second direction C, and its two ends along the second direction C are closed by the inner walls of the third sidewall 1140 and the fourth sidewall 1150 of the light-transmitting channel 1110, respectively. Since the height of the outlet-side enclosure in the axial direction A is higher than the lowest end of the outlet of the laminar flow channel 1210, the drainage cavity has sufficient height space in the axial direction A, so that the filter medium flowing out from the second gap can be fully collected and mixed within this height range.

[0070] The drainage cavity is connected to multiple second gaps. Specifically, after the filter medium flows out from the laminar flow channel 1210, it enters the drainage cavity through multiple second gaps, gathers in the drainage cavity, and is then discharged from the medium outlet port 1170.

[0071] According to the window device 1000 of the present disclosure, by configuring an outlet-side enclosure to form a drainage cavity, the filter medium flowing out from multiple second gaps is fully collected and homogenized in the drainage cavity, avoiding pressure fluctuations and backflow on the outlet side of the laminar flow channel 1210, and ensuring the smoothness of the entire flow path and the maintenance of the laminar flow state.

[0072] In one embodiment, along the first direction B, the medium outlet port 1170 includes an inlet section and an outlet section disposed opposite to each other; the inlet section of the medium outlet port 1170 is tapered along the first direction B.

[0073] The media outlet port 1170 is a through-hole structure located on the second sidewall 1130, with its internal channel extending along the first direction B. The inlet section faces the light-transmitting channel 1110 (i.e., the direction in which the filter medium flows in), and the outlet section faces the outside of the second sidewall 1130 (i.e., the direction in which the filter medium flows out). The inlet section of the media outlet port 1170 is tapered, meaning that the flow cross-sectional area of ​​the inlet section gradually decreases along the flow direction of the filter medium (from the inside of the light-transmitting channel 1110 to the outside of the second sidewall 1130). The tapering angle can be determined according to the actual flow rate and flow requirements; for example, the tapering angle can be from 5° to 30°. The tapering structure allows the flow rate of the filter medium to gradually increase along the flow direction when it flows through the inlet section, which helps the filter medium to be smoothly and rapidly discharged, avoiding pressure fluctuations and backflow caused by sudden changes in cross-sectional area, and ensuring smooth flow throughout the entire path.

[0074] In one example, the inlet section of the media outlet port 1170 can also be equipped with a guide tube. The specific structure of the guide tube can refer to the configuration of the guide tube 1163 at the first inlet sub-port 1161 mentioned above. A chamber space similar to the second pressure-stabilizing chamber 1164 can be formed between the inner wall of the outlet section of the media outlet port 1170 and the outer wall of the guide tube. After the filter medium is discharged from the guide tube, it first passes through this chamber space for pressure stabilization, eliminating pressure fluctuations and allowing the filter medium to be discharged stably through the media outlet port 1170. The specific structure of this chamber space can refer to the configuration of the second pressure-stabilizing chamber 1164 mentioned above.

[0075] In one example, the number and arrangement of the media outlet ports 1170 can be the same as those of the media inlet ports 1160. For example, when the media inlet port 1160 includes one first inlet sub-port 1161 and two second inlet sub-ports 1162, the media outlet ports 1170 include three outlet sub-ports. The three outlet sub-ports correspond one-to-one with the positions of the first inlet sub-port 1161 and the two second inlet ports 1162 in the second direction C; this ensures that the filter medium flowing into each inlet sub-port can flow out from the corresponding outlet sub-port after passing through the laminar flow channel 1210, guaranteeing the symmetry of the flow path and the matching of the flow rate.

[0076] According to the window device 1000 of the present disclosure, by configuring the inlet section of the medium outlet port 1170 to be tapered, the flow rate of the filter medium gradually increases when it is discharged, which helps to smoothly lead out the filter medium and avoid pressure fluctuations and backflow caused by sudden changes in cross-sectional area at the outlet, thus ensuring the smoothness of the entire flow path.

[0077] In one example, multiple outlet sub-ports are each connected to a return liquid branch, and the path lengths of these return liquid branches are equal. For instance, when the media outlet port 1170 includes four outlet sub-ports, the four return liquid branches have the same length from each outlet sub-port to the return liquid line 3130. The outlets of each outlet sub-port are flush, without any height misalignment, to prevent flow deviation caused by gravity or air bubbles. This equal-length design ensures that the filter media flowing out of each outlet sub-port experiences consistent resistance during the convergence process, avoiding uneven flow distribution due to differences in path length and guaranteeing the uniformity of return liquid flow in each branch.

[0078] In one example, multiple inlet sub-ports are connected to a liquid inlet branch, and each liquid inlet branch is equipped with a manual valve. When the filter medium flows in the laminar flow channel 1210, the operator can visually observe the fluid flow to determine the laminar flow state. When the fluid is observed to be constantly twisting, branching, and curling, forming a large number of tiny vortices with blurred boundaries and bubbles tumbling, colliding, and randomly rising with irregular trajectories, resulting in a large number of tiny cavitation vortices, the flow rate can be adjusted by adjusting the corresponding manual valve to ensure the laminar flow state of the corresponding channel.

[0079] In one embodiment, such as Figure 1-8 As shown, a plurality of temperature measuring parts 1600 are provided on the support substrate 1100; the plurality of temperature measuring parts 1600 are arranged at intervals along the circumference of the light transmission channel 1110.

[0080] The temperature measuring part 1600 is a structure for mounting a temperature sensor. In one example, the temperature measuring part 1600 can be a hole-like structure provided on the support base 1100 for mounting the temperature sensor or for the temperature sensor to pass through; the cross-sectional shape of the temperature measuring part 1600 can be circular, elliptical or other shapes, and the inner diameter of the hole-like structure matches the outer diameter of the temperature sensor to be mounted, so that the temperature sensor can be securely mounted in the temperature measuring part 1600.

[0081] Multiple temperature measuring units 1600 are arranged circumferentially around the light-transmitting channel 1110. Specifically, the multiple temperature measuring units 1600 can be evenly distributed around the periphery of the light-transmitting channel 1110, for example, arranged at equal angular intervals along the circumference of the light-transmitting channel 1110. The temperature measuring units 1600 are located on the periphery of the light-transmitting channel 1110 and maintain a certain distance from the edge of the light-transmitting channel 1110 to avoid affecting the structural strength of the light-transmitting channel 1110.

[0082] In one example, there may be four temperature measuring units 1600, respectively located in the four corner areas or the middle areas of the four sides of the supporting substrate 1100, and distributed approximately evenly along the circumference of the light transmission channel 1110. In another example, there may be six or eight temperature measuring units 1600 to provide a denser number of temperature detection points.

[0083] When the temperature measuring unit 1600 penetrates the support substrate 1100 along the axial direction A, its lower end opening faces the interior of the cavity 2100 of the semiconductor device, so that the temperature sensing end of the temperature sensor installed in the temperature measuring unit 1600 can directly face the interior of the cavity 2100 or the location of the wafer, thereby more accurately detecting the temperature of the wafer.

[0084] According to the window device 1000 of the present disclosure, by configuring a plurality of hole-shaped temperature measuring parts 1600 arranged circumferentially around the light-transmitting channel 1110, a temperature sensor can be installed and the temperature distribution of different areas of the wafer in the semiconductor device can be monitored in real time, providing accurate temperature feedback data for process control.

[0085] In one embodiment, such as Figure 1-8 As shown, the filter assembly 1200 includes a first filter element 1220 and a second filter element 1230 arranged at intervals along the axial direction A, so as to form a laminar flow channel 1210 between the lower surface of the first filter element 1220 and the upper surface of the second filter element 1230.

[0086] The first filter 1220 and the second filter 1230 are both plate-shaped structures made of light-transmitting material, used to allow light beams to pass through. The first filter 1220 can be located above, and the second filter 1230 can be located below. The first filter 1220 and the second filter 1230 are arranged at intervals along the axial direction A. The lower surface of the first filter 1220 and the upper surface of the second filter 1230 are opposite to each other and parallel to each other. The gap between them is the laminar flow channel 1210 described above.

[0087] The first filter element 1220 and the second filter element 1230 can be made of quartz. The thickness of the first filter element 1220 and the second filter element 1230 is determined according to actual process requirements. The planar dimensions of the first filter element 1220 and the second filter element 1230 match the cross-sectional dimensions of the light transmission channel 1110, so that the filter elements can be stably installed in the light transmission channel 1110.

[0088] The filter medium flowing in through the medium inlet port 1160 enters the laminar flow channel 1210 and flows along the first direction B within the laminar flow channel 1210. After flowing through the entire laminar flow channel 1210, it is discharged from the medium outlet port 1170. When the light beam passes through the window device 1000 along the axial direction A, it passes sequentially through the first filter element 1220, the filter medium in the laminar flow channel 1210, and the second filter element 1230.

[0089] According to the window device 1000 of the present disclosure, by configuring a laminar flow channel 1210 between two layers of filters, the light beam passes through the first filter 1220, the filter medium and the second filter 1230 in sequence when passing through along the axial direction A. The filter medium selectively absorbs the light beam in a specific wavelength band, thereby realizing spectral filtering.

[0090] In one embodiment, along axis A, the inner wall of the light-transmitting channel 1110 is provided with a first mating member and a second mating member at intervals; the first filter 1220 is connected to the first mating member; and the second filter 1230 is connected to the second mating member.

[0091] The first and second mating components are support and positioning structures disposed on the inner wall of the light-transmitting channel 1110, used for installing and fixing the first filter element 1220 and the second filter element 1230. The first mating component can be located above, and the second mating component can be located below, with the two arranged at intervals along the axial direction A. The first and second mating components can be annular bosses protruding inward from the inner wall of the light-transmitting channel 1110, or multiple spaced support blocks or other forms of support structures. When the first and second mating components are annular bosses, they extend continuously along the circumferential direction of the inner wall of the light-transmitting channel 1110, providing uniform support force for the filter element and helping to ensure the installation stability of the filter element. When the first and second mating components are multiple spaced support blocks, the multiple support blocks are arranged at intervals along the circumferential direction of the inner wall of the light-transmitting channel 1110, which simplifies the processing technology and reduces the amount of material used.

[0092] The first filter element 1220 can be placed on the upper surface of the first mating part and fixed by means of clamping blocks, fasteners, or adhesives, so that the first filter element 1220 is fixed relative to the supporting substrate 1100 in the axial direction A. The second filter element 1230 can be placed on the upper surface of the second mating part and fixed by means of clamping blocks, fasteners, or adhesives, so that the second filter element 1230 is fixed relative to the supporting substrate 1100 in the axial direction A. Sealing elements can also be provided between the first filter element 1220 and the first mating part, and between the second filter element 1230 and the second mating part, to achieve a sealed connection and prevent the filter medium from leaking from the edge of the filter element.

[0093] According to the window device 1000 of the present disclosure, by configuring the first mating member and the second mating member, accurate installation positioning and reliable support are provided for the first filter 1220 and the second filter 1230, ensuring that the gap between the first filter 1220 and the second filter 1230 is uniform and constant, which is beneficial to maintaining the laminar flow state.

[0094] like Figure 9As shown, this embodiment of the present disclosure provides a semiconductor device 2000, including a cavity 2100, a light source 2200, and a window device 1000 as described in any of the above embodiments. The cavity 2100 is used to implement semiconductor processes; the light source 2200 is located along axis A on the outer top and outer bottom of the cavity 2100; the window device 1000 is disposed along axis A on the top and bottom of the cavity 2100; the window device 1000 is used to perform spectral filtering on the light beam emitted by the light source 2200, so as to receive the filtered light beams through the window device 1000 and enter the cavity 2100.

[0095] The cavity 2100 is the reaction vessel of the semiconductor device 2000. The cavity 2100 is used to house the wafer and perform semiconductor processes, such as rapid thermal annealing or thermal oxidation. Openings are provided at the top and bottom of the cavity 2100 for mounting the window device 1000. A light source 2200 is located along axis A on the outer side of the top and bottom of the cavity 2100. The light source 2200 can be an arc lamp or other type of light source, used to emit a radiant beam to heat the wafer. The window device 1000 is disposed along axis A at the top and bottom of the cavity 2100. Specifically, the support base 1100 of the window device 1000 is fixedly mounted at the openings at the top and bottom of the cavity 2100, such that the filter assembly 1200 of the window device 1000 is located between the light source 2200 and the interior of the cavity 2100. The filter medium flowing through the window device 1000 is used to perform spectral filtering on the light beam emitted by the light source 2200. Specifically, the light beam emitted by the light source 2200 is incident on the window device 1000 along the axial direction A. The light beam passes through the first filter element 1220, the filter medium in the laminar flow channel 1210, and the second filter element 1230 in sequence through the filter assembly 1200. The filter medium selectively absorbs specific wavelengths in the light beam (such as interference wavelengths that cause temperature measurement deviations), so that the filtered light beam enters the cavity 2100 through the window device 1000 and irradiates the wafer surface to achieve uniform heating.

[0096] According to the semiconductor device 2000 of the present disclosure, the light beam emitted by the light source 2200 is spectrally filtered by the window device 1000 so that the light beam entering the cavity 2100 has the required spectral characteristics. At the same time, the filter medium inside the window device 1000 is kept in a laminar flow state to ensure the uniformity of the transmitted light spot, thereby improving the uniformity and process quality of the semiconductor process.

[0097] In one embodiment, the semiconductor device 2000 further includes a temperature sensor. The temperature sensor is disposed on the support substrate 1100 of the window device 1000 and is used to detect the temperature of the workpiece inside the semiconductor device 2000.

[0098] A temperature sensor can be installed in a temperature measuring part 1600 provided on a support base 1100 to detect the temperature of a workpiece inside a semiconductor device 2000.

[0099] The number of temperature sensors can be the same as the number of temperature measuring units 1600, for example, 4, 6 or 8. Multiple temperature sensors are arranged circumferentially around the light-transmitting channel 1110, so that each temperature sensor can simultaneously detect the temperature of different areas of the workpiece from different positions.

[0100] According to the embodiments of the present disclosure, the semiconductor device 2000, by configuring a temperature sensor connected to the support substrate 1100, can detect the temperature distribution of different areas of the workpiece within the semiconductor device 2000 in real time, providing accurate temperature feedback data for process control.

[0101] like Figure 10-12 As shown, this embodiment of the present disclosure provides a semiconductor processing system 3000, including the semiconductor device 2000 in the above embodiment and a circulating liquid supply subsystem 3100. The circulating liquid supply subsystem 3100 is used to supply filter media to the window device 1000, and includes a liquid storage tank 3110, a circulating pump 3120, a liquid supply pipeline, and a liquid return pipeline 3130. The storage tank 3110 is used to store the filter medium; the circulation pump 3120 is connected to the storage tank 3110; the circulation pump 3120 applies pressure to the filter medium; the supply line is connected between the outlet of the circulation pump 3120 and the medium inlet port 1160 of the window device 1000, and is used to transport the filter medium to the window device 1000; the return line 3130 is connected between the medium outlet port 1170 of the window device 1000 and the storage tank 3110, and is used to return the filter medium that has flowed through the window device 1000 to the storage tank 3110.

[0102] The circulating liquid supply subsystem 3100 is an auxiliary system in the semiconductor processing system 3000 used to supply filter media to the window device 1000. The filter media can be distilled water or other liquids with specific spectral absorption characteristics. The storage tank 3110 is a container for storing the filter media, and its volume is determined according to actual process requirements, for example, it can be 10 liters to 50 liters. The storage tank 3110 can be equipped with a level detector and a replenishment port. The level detector is used to monitor the level of the filter media in the storage tank 3110 in real time, and the replenishment port is used to replenish the filter media in the storage tank 3110 when the filter media is insufficient.

[0103] A circulation pump 3120 is connected to a storage tank 3110 and is used to apply pressure to the filter medium, driving the filter medium to circulate in the circulation supply subsystem 3100. The circulation pump 3120 can be a magnetic pump, a centrifugal pump, or other types of pump. The inlet end of the circulation pump 3120 is connected to the outlet end of the storage tank 3110, and the outlet end of the circulation pump 3120 is connected to the supply pipeline.

[0104] The liquid supply line connects the outlet of the circulating pump 3120 to the medium inlet port 1160 of the window device 1000, and is used to deliver the filter medium to the window device 1000. The inner diameter of the liquid supply line can be determined according to the required flow rate. Filters, pressure detectors, and flow regulating valves can be installed on the liquid supply line to achieve filtration, pressure, and flow control of the filter medium.

[0105] The return line 3130 connects the medium outlet port 1170 of the window device 1000 to the storage tank 3110, and is used to return the filter medium that has flowed through the window device 1000 to the storage tank 3110. The inner diameter of the return line 3130 can be determined according to the required flow rate. A temperature detector can be installed on the return line 3130 to detect the temperature of the filter medium flowing out of the window device 1000, so as to monitor the cooling or heating effect of the window device 1000.

[0106] When the circulating liquid supply subsystem 3100 is working, the circulating pump 3120 starts, driving the filter medium in the storage tank 3110 to be transported through the supply pipeline to the medium inlet port 1160 of the window device 1000. After entering the window device 1000, the filter medium flows through the laminar flow channel 1210 within the window device 1000, performing spectral filtering on the light beam passing through the filter optical assembly 1200. Then, it flows out from the medium outlet port 1170 and is returned to the storage tank 3110 through the return liquid pipeline 3130, completing one cycle. The filter medium maintains a laminar flow state while flowing within the window device 1000 to ensure that no refractive index fluctuation occurs when the light beam passes through the filter optical assembly 1200, thus ensuring the uniformity of the transmitted light spot.

[0107] According to an embodiment of the semiconductor processing system 3000 of this disclosure, a circulating liquid supply subsystem 3100 continuously supplies a filter medium to the window device 1000, achieving circulating flow of the filter medium within the window device 1000 and ensuring the continuity and stability of spectral filtering. The configuration of the liquid supply line and the liquid return line 3130 enables the filter medium to form a continuous laminar flow state within the window device 1000, further ensuring the uniformity of the transmitted light spot, thereby improving the uniformity and process quality of the semiconductor process.

[0108] In one embodiment, the liquid supply line includes an upper liquid supply branch and a lower liquid supply branch. One end of the upper liquid supply branch is connected to the circulation pump 3120 (or the outlet of the heat exchanger), and the other end is connected to the media inlet port 1160 of the window device 1000 located at the top of the semiconductor device 2000, for delivering the filter medium to the top window device 1000. One end of the lower liquid supply branch is connected to the circulation pump 3120 (or the outlet of the heat exchanger), and the other end is connected to the media inlet port 1160 of the window device 1000 located at the bottom of the semiconductor device 2000, for delivering the filter medium to the bottom window device 1000. The upper and lower liquid supply branches are controlled independently to achieve independent adjustment of the filter medium supply to the top and bottom window devices 1000, so that the flow rates of the two branches meet the flow requirements required to maintain the laminar flow state within their respective window devices 1000.

[0109] In one embodiment, the circulating liquid supply subsystem 3100 further includes a first throttle valve and a second throttle valve. The first throttle valve is disposed on the upper liquid supply branch and is used to regulate the flow rate of the filter medium distributed to the window device 1000 at the top of the semiconductor device 2000. The second throttle valve is disposed on the lower liquid supply branch and is used to regulate the flow rate of the filter medium distributed to the window device 1000 at the bottom of the semiconductor device 2000. The throttle valve can be a manual regulating valve or an automatic regulating valve. By adjusting the opening of the valve, the flow rate of the filter medium flowing through the corresponding branch is controlled, thereby precisely controlling the flow rate of the filter medium entering the top window device 1000 and the bottom window device 1000, so that the two flow rates meet the flow requirements required to maintain the laminar flow state within their respective window devices 1000.

[0110] In one embodiment, the circulating liquid supply subsystem 3100 further includes an upper liquid supply filter and a lower liquid supply filter. The upper liquid supply filter is disposed on the upper liquid supply branch and is used to filter the filter medium entering the window device 1000 at the top of the semiconductor device 2000, removing any particulate impurities that may be present in the filter medium and preventing impurities from entering the top window device 1000 and clogging the flow channels or scratching the surface of the filter element. The lower liquid supply filter is disposed on the lower liquid supply branch and is used to filter the filter medium entering the window device 1000 at the bottom of the semiconductor device 2000, preventing impurities from entering the bottom window device 1000 and clogging the flow channels or scratching the surface of the filter element.

[0111] In one embodiment, the circulating liquid supply subsystem 3100 further includes an upper liquid supply pressure detector and a lower liquid supply pressure detector. The upper liquid supply pressure detector is disposed on the upper liquid supply branch and is used to detect the pressure of the filter medium entering the window device 1000 at the top of the semiconductor device 2000, thereby monitoring whether the liquid supply pressure of the top window device 1000 is within a preset range. The lower liquid supply pressure detector is disposed on the lower liquid supply branch and is used to detect the pressure of the filter medium entering the window device 1000 at the bottom of the semiconductor device 2000, thereby monitoring whether the liquid supply pressure of the bottom window device 1000 is within a preset range.

[0112] In one embodiment, a return liquid temperature detector is installed on the return liquid line 3130 to detect the temperature of the filter medium flowing out of the window device 1000. The return liquid temperature detector can be a thermocouple or a thermistor, and it is installed on the return liquid line 3130 to detect the combined temperature of the filter medium flowing through the top and bottom window devices 1000 in real time. By monitoring the return liquid temperature, it can be determined whether the filter medium inside the window device 1000 has absorbed excessive heat, thereby assessing the cooling effect or heat load status of the window device 1000 and providing feedback for the temperature adjustment of the heat exchanger.

[0113] In one embodiment, a level detector is installed in the storage tank 3110 to detect the level of the filter medium within the tank. The level detector can be a float-type level gauge, an ultrasonic level gauge, or a capacitive level gauge, etc. The semiconductor processing system 3000 also includes a water replenishment branch connected to the storage tank 3110, and a water replenishment control valve is installed on the branch. The water replenishment control valve is signal-connected to the level detector and automatically replenishes the filter medium to the storage tank 3110 based on the detector's reading. When the level detector detects that the filter medium level in the storage tank 3110 is lower than a preset value, the water replenishment control valve automatically opens, replenishing the filter medium to the tank 3110 through the water replenishment branch; when the level detector detects that the level has reached the preset value, the water replenishment control valve automatically closes, stopping the replenishment. This achieves automatic maintenance of the filter medium level in the storage tank 3110, ensuring the continuity and stability of the system's circulation.

[0114] In one implementation, such as Figure 12 As shown, in the circulating liquid supply subsystem 3100 of the semiconductor processing system 3000, the circulation process of the filter medium is as follows: The filter medium is stored in the storage tank 3110. After the circulation pump 3120 starts, it extracts the filter medium from the storage tank 3110 and delivers it to the heat exchanger for temperature regulation, keeping the filter medium within a preset temperature range. The temperature-regulated filter medium enters the supply pipeline, and the flow rate to the window device 1000 at the top and bottom of the semiconductor processing equipment 2000 is regulated by the first and second throttle valves, respectively. The filter medium enters the window device 1000 at the top and bottom of the semiconductor processing equipment 2000 via the upper and lower supply branches, respectively. After flowing through the laminar flow channel 1210 inside the window device 1000, it flows out from the medium outlet port 1170 and is returned to the storage tank 3110 via the return pipeline 3130, completing one cycle.

[0115] The distilled water tank is used to supply distilled water to the storage tank 3110. The distilled water in the storage tank 3110 has specific light absorption characteristics in the 1450nm wavelength band, which can effectively absorb the light radiation of the light source 2100 (such as an arc lamp) in this wavelength band, thereby filtering out the interference of the arc lamp in the 1450nm wavelength band on the temperature measurement module. This allows the high-temperature thermometer to directly measure the emissivity of the wafer radiation in the 1450nm wavelength band, and then calculate the real-time temperature of the wafer using methods such as Planck's law.

[0116] During maintenance or drainage operations, both the liquid storage tank 3110 and the heat exchanger are equipped with drain valves, which, when opened, can drain any residual filter media in the system. A ball valve on the water supply branch is used to replenish the filter media in the liquid storage tank 3110. When the liquid level in the liquid storage tank 3110 is lower than a preset value, the ball valve automatically opens to replenish water, ensuring a stable total liquid volume in the system.

[0117] In the description of this specification, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0118] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this disclosure, "multiple" means two or more, unless otherwise explicitly specified.

[0119] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0120] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0121] The foregoing disclosure provides many different implementations or examples for carrying out different structures of this disclosure. To simplify the disclosure, specific examples of components and arrangements have been described above. Of course, these are merely examples and are not intended to limit the scope of this disclosure. Furthermore, reference numerals and / or letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various implementations and / or arrangements discussed.

[0122] The specific embodiments described above do not constitute a limitation on the scope of protection of this disclosure. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can be made according to design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure.

Claims

1. A window device for a semiconductor device, characterized in that, include: A carrier substrate for mounting on the semiconductor device; the carrier substrate has a light-transmitting channel extending vertically; The vertical direction is the axial direction of the semiconductor device; The supporting substrate is provided with a first sidewall and a second sidewall along a first direction perpendicular to the vertical direction; the first sidewall is provided with a medium inlet port; the second sidewall is provided with a medium outlet port. A filter assembly is disposed in the light-transmitting channel; the filter assembly has a laminar flow channel for the flow of the filter medium; the laminar flow channel is connected to the medium inlet port and the medium outlet port respectively; A diversion column group is disposed between the inlet side of the laminar flow channel and the medium inlet port; the diversion column group includes a plurality of diversion columns arranged at intervals along a second direction, and a first gap is formed between any two adjacent diversion columns; the medium inlet port is connected to the laminar flow channel through the plurality of first gaps; the second direction, the first direction and the vertical direction are mutually perpendicular; The filter medium flowing in through the medium inlet port is split by multiple split columns and then flows into the laminar flow channel through multiple first gaps to perform spectral filtering on the light beam passing through the filter assembly.

2. The window device according to claim 1, characterized in that, Also includes: An inlet-side enclosure is installed between the diversion column group and the medium inlet port; The entrance-side enclosure extends along the second direction and, together with the inner wall of the first sidewall located on one side of the light-transmitting channel, forms a first pressure-stabilizing cavity; the first pressure-stabilizing cavity communicates with a plurality of the first gaps; The filter medium flowing in through the medium inlet port is regulated by the first voltage stabilizing chamber and then flows into the laminar flow channel through multiple first gaps.

3. The window device according to claim 1, characterized in that, The media inlet port includes at least one first inlet sub-port and two second inlet sub-ports; The first inlet sub-port is located between the two second inlet sub-ports, and the first inlet sub-port and the second inlet sub-port are arranged along the second direction.

4. The window device according to claim 3, characterized in that, The outlet end of the first inlet sub-port is provided with a guide pipe; wherein, along the first direction, the guide pipe includes an inlet section and an outlet section disposed opposite to each other; The inlet section of the guide tube is tapered along the first direction; The outlet section of the guide tube gradually widens along the first direction.

5. The window device according to claim 4, characterized in that, The inner wall of the first inlet sub-port includes a first sub-wall and a second sub-wall along the first direction; The inlet section of the guide tube is at least connected to the second sub-wall to form a second pressure-stabilizing cavity between the first sub-wall and the inlet section of the guide tube; The filter medium is regulated by the second voltage stabilizing chamber and then discharged through the guide tube.

6. The window device according to claim 3, characterized in that, The outlet end of the second inlet sub-port is provided with a partition; the partition is configured with a first connecting hole, a second connecting hole and a third connecting hole; the filter medium in the second inlet sub-port is discharged through the first connecting hole, the second connecting hole and the third connecting hole; Wherein, along the first direction, the central axis of the first connecting hole and the central axis of the second connecting hole are inclined in a direction away from the central axis of the third connecting hole.

7. The window device according to claim 6, characterized in that, The inner wall of the second inlet sub-port includes a third sub-wall and a fourth sub-wall along the first direction; The partition is at least connected to the fourth sub-wall to form a third pressure-stabilizing cavity between the third sub-wall and the partition; The filter medium, after being regulated by the third voltage-stabilizing chamber, is discharged through the first connecting hole, the second connecting hole, and the third connecting hole.

8. The window device according to claim 1, characterized in that, Also includes: A flow-guiding column assembly is disposed between the outlet side of the laminar flow channel and the medium outlet port; the flow-guiding column assembly includes a plurality of flow-guiding columns arranged at intervals along a second direction, and a second gap is formed between any two adjacent flow-guiding columns; The filter medium flowing out from the laminar flow channel is guided to the medium outlet port through multiple second gaps.

9. The window device according to claim 8, characterized in that, Also includes: An outlet-side enclosure is disposed between the drainage column group and the medium outlet port; the outlet-side enclosure extends along the second direction and forms a drainage cavity with the inner wall of the second side wall located on one side of the light-transmitting channel; The drainage cavity is connected to multiple second gaps; The filter medium flowing out from the multiple second gaps is guided to the medium outlet port through the drainage cavity.

10. The window device according to claim 1, characterized in that, Along the first direction, the medium outlet port includes an inlet section and an outlet section disposed opposite to each other; The inlet section of the medium outlet port tapers along the first direction.

11. The window device according to claim 1, characterized in that, The supporting substrate is provided with multiple temperature measuring parts; the multiple temperature measuring parts are arranged at intervals along the circumference of the light-transmitting channel.

12. The window device according to any one of claims 1-11, characterized in that, The filtering assembly includes a first filter and a second filter arranged at a vertical interval to form the laminar flow channel between the lower surface of the first filter and the upper surface of the second filter.

13. The window device according to claim 12, characterized in that, Along the vertical direction, the inner wall of the light-transmitting channel is provided with a first mating member and a second mating member at intervals; the first filter element is connected to the first mating member; the second filter element is connected to the second mating member.

14. A semiconductor device, characterized in that, include: A cavity, the interior of which is used to carry out semiconductor processes; The light source is located vertically on the outer side of the top of the cavity and on the outer side of the bottom of the cavity; The window device according to any one of claims 1-13 is disposed vertically at the top and bottom of the cavity; the window device is used to perform spectral filtering on the light beam emitted by the light source so as to receive the filtered light beam through the window device and enter the cavity respectively.

15. A semiconductor processing system, characterized in that, include: The semiconductor device as described in claim 14; as well as A circulating liquid supply subsystem is used to supply filter media to the window device, the circulating liquid supply subsystem comprising: A storage tank is used to store the filter medium; A circulation pump is connected to the liquid storage tank; the circulation pump applies pressure to the filter medium; A liquid supply line is connected between the outlet of the circulating pump and the medium inlet port of the window device, for delivering the filter medium to the window device; A return line is connected between the medium outlet port of the window device and the liquid storage tank, and is used to return the filter medium that has flowed through the window device to the liquid storage tank.

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