Fluorine release film

Abstract

The utility model discloses a fluorine release film which comprises a base material layer, and a corona layer, a heavy fluorosiloxane release layer and an ultra-light fluorosiloxane release layer are sequentially arranged on the front surface of the base material layer from inside to outside. The release film is simple in structure, and the corona layer, the heavy fluorosiloxane release layer, the ultra-light fluorosiloxane release layer and the heavy release fluorine release layer are sequentially arranged on the surface of the base material layer from inside to outside, so that the interlayer adhesion is high, and the release agent cost is low; according to the ultra-light fluorine release layer, the coating thickness is reduced by about 60%, and the release force is still ultra-light; through the matching arrangement of the heavy fluorosiloxane release layer and the ultra-light fluorosiloxane release layer, while the cost is reduced by using the heavy fluorosiloxane release layer, the characteristics of light release force and high residual viscosity are realized by matching with the ultra-light fluorosiloxane release layer, the cost is low, and the release effect is good.

Description

Technical Field

[0001] The utility model relates to the technical field of release films, in particular to a fluorine release film. Background Art

[0002] Release film, also known as isolation film, peeling film, demoulding film, separation film, release film, adhesive barrier film, release film, silicone oil film, silicone oil paper, anti-adhesive film, slip film, thinner paper, release paper, etc., is a special film product made by coating a specific release agent on the surface of a substrate (PET / PE / BOPP / paper / other film materials), such as silicone release agent, fluorosilicone release agent, fluorocarbon release agent and non-silicone release agent, etc., and then processed through a specific process. After the release film comes into contact with specific materials (such as hot melt adhesive, acrylic adhesive and rubber-based pressure-sensitive adhesive), it exhibits a stable release effect under the action of certain external factors (such as long-term temperature, humidity, pressure and special external forces) to meet the application needs of specific industries.

[0003] With the increasing demand for electronic products, the application scope of silicone pressure-sensitive adhesives such as high-temperature tapes, gold fingers, and PI adhesives is constantly increasing. Silicone release films, non-silicone release films, and fluorocarbon release films are used to bond them. If they are left for a long time, they are prone to quality problems such as sticking or difficulty in peeling due to high release force. The release effect is poor, which seriously affects production efficiency. Therefore, ultra-light fluorine films with stable performance are needed.

[0004] In addition, the existing fluorine release film products have high release agent costs and corresponding fluorine release film costs, and product competition is limited. There is an urgent need to develop a low-cost, high-quality fluorine release film. Summary of the invention

[0005] In order to overcome the deficiencies of the prior art, the utility model provides a fluorine release film.

[0006] The technical solution adopted by the utility model to solve its technical problems is:

[0007] A fluorine release film comprises a substrate layer, on the surface of which a corona layer, a heavy fluorosilicone release layer and an ultra-light fluorosilicone release layer are sequentially arranged from the inside to the outside.

[0008] Preferably, the heavy fluorosilicone release layer is formed by coating a heavy release fluorosilicone release agent on the upper surface of the corona layer and then curing it.

[0009] Preferably, the coating amount of the heavy fluorosilicone release layer is 0.15-0.30 g / m 2 , the release force is 10-100g / in.

[0010] Preferably, the ultra-light fluorosilicone release layer is formed by coating an ultra-light fluorosilicone release agent on the upper surface of the heavy fluorosilicone release layer and then curing the resulting agent.

[0011] Preferably, the coating amount of the ultra-light fluorosilicone release layer is 0.08-0.12 g / m 2 , the release force is 1-5g / in.

[0012] Preferably, the substrate layer is made of PET.

[0013] Preferably, the substrate layer is made of PI material.

[0014] Preferably, the thickness h1 of the substrate layer is 25 to 188 μm.

[0015] Preferably, the corona layer is formed by performing corona treatment on the surface of the substrate layer, and the treatment power is 12 to 22 KW.

[0016] Preferably, the thickness h2 of the corona layer is 2-4 μm.

[0017] The beneficial effects of the utility model are as follows: the application has a simple structure, and a corona layer, a heavy fluorosilicone release layer and an ultra-light fluorosilicone release layer are sequentially arranged on the surface of the substrate layer from the inside to the outside. The heavy fluorosilicone release layer has strong interlayer adhesion and low release agent cost; the ultra-light fluorosilicone release layer has a coating thickness reduced by about 60%, and the release force is still ultra-light. The heavy fluorosilicone release layer and the ultra-light fluorosilicone release layer are arranged in combination, and while the heavy fluorosilicone release layer is used to reduce the cost, the ultra-light fluorosilicone release layer is used in combination to achieve the characteristics of light release force and high residual adhesion, low cost and good release effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0019] Figure 1 It is a structural schematic diagram of embodiment 1 of the utility model.

[0020] Figure 2 It is a structural schematic diagram of embodiment 2 of the present utility model. DETAILED DESCRIPTION

[0021] The technical solution of the utility model is described in detail below in conjunction with the accompanying drawings and embodiments.

[0022] See also Figure 1As shown, Example 1 of the present application provides a fluorine release film, including a substrate layer 1, on the surface of which a corona layer 2, a heavy fluorosilicone release layer 3 and an ultra-light fluorosilicone release layer 4 are sequentially arranged from the inside to the outside.

[0023] A corona layer 2, a heavy fluorosilicone release layer 3 and an ultra-light fluorosilicone release layer 4 are sequentially arranged on the surface of a substrate layer 1 from the inside to the outside, wherein the heavy release fluorosilicone release layer 3 has strong interlayer adhesion and low release agent cost; the ultra-light fluorosilicone release layer 4 has a coating thickness reduced by about 60%, and the release force is still ultra-light, together forming a fluorosilicone release film with the characteristics of low cost, light release force, high residual adhesion, and strong resistance to high temperature and high humidity.

[0024] Furthermore, the heavy fluorosilicone release layer 3 is formed by coating a heavy fluorosilicone release agent on the upper surface of the corona layer 2 and then curing the coating.

[0025] In this embodiment, the heavy-release fluorosilicone release agent contains more trifluoro / perfluoro-tert-butyl groups in its structure, and its cost is relatively lower than other fluorosilicone release agents.

[0026] Specifically, the coating amount of the heavy fluorosilicone release layer 3 is 0.15-0.30 g / m 2 , release force is 10-100g / in. Strong interlayer adhesion and low release agent cost.

[0027] Furthermore, the ultra-light fluorosilicone release layer 4 is formed by coating an ultra-light fluorosilicone release agent on the upper surface of the heavy fluorosilicone release layer 3 and then curing the coating.

[0028] In this embodiment, the ultra-light fluorosilicone release agent contains a large number of perfluoroether / polyfluoropolyether groups in its structure and has an excellent release effect.

[0029] Specifically, the coating amount of the ultra-light fluorosilicone release layer 4 is 0.08-0.12 g / m 2 , the release force is 1-5g / in. The coating thickness is reduced by about 60%, and the release force is still ultra-light.

[0030] By using heavy-release fluorosilicone release agents and ultra-light fluorosilicone release agents in combination, while using heavy-release fluorosilicone release agents to reduce costs, ultra-light fluorosilicone release agents are used in combination to achieve the characteristics of light release force and high residual adhesion, low cost and good release effect.

[0031] In this embodiment, the amount of silicon coating can be tested by an XRF instrument. The instrument is calibrated using a standard sample, a working curve is made, and then the test is performed. In actual production, three positions, namely the left, middle, and right positions of the head and tail, are generally taken for testing. Additional testing may also be performed based on actual requirements or special requirements.

[0032] The release force test method can adopt standardized testing, refer to GB / 25256-2010.

[0033] Furthermore, the substrate layer 1 is made of PET material, which is resistant to high temperatures and improves the applicability of the fluorine release film.

[0034] Specifically, the substrate layer 1 has a thickness h1 of 25 to 188 μm, a light transmittance of 92 to 95%, and a haze of 1.5 to 5%.

[0035] Furthermore, the corona layer 2 is formed by performing corona treatment on the surface of the substrate layer 1, and the treatment power is 12 to 22 KW.

[0036] Specifically, the thickness h2 of the corona layer 2 is 2-4 μm.

[0037] The fluorine release film of the present embodiment has a simple and reasonable structure. A corona layer 2 is formed on the surface of a high temperature resistant substrate layer 1, and then a heavy fluorosilicone release layer 3 and an ultra-light heavy fluorosilicone release layer 4 are coated in sequence. Finally, the residual adhesion of the release film can reach more than 90%, and the peeling strength after aging at 70 degrees for 7 days remains the same as before, the fluorine-silicon transfer is small, and the heavy release fluorine agent and the ultra-light fluorine agent are used in combination, which is low in cost and is beneficial to the processing and production of enterprises.

[0038] Furthermore, if Figure 2 As shown, the present application also provides Example 2. In Example 2, this embodiment is basically the same as Example 1. For the sake of simplicity, only the main structure difference from Example 1 is described. The parts not described in this embodiment are the same as those in Example 1, and the difference is that:

[0039] The substrate layer 1 is made of PI material, which is resistant to high temperatures and improves the applicability of the fluorine release film.

[0040] The fluorine release film of the present embodiment has a simple and reasonable structure. A corona layer 2 is formed on the surface of a high temperature resistant substrate layer 1, and then a heavy fluorosilicone release layer 3 and an ultra-light heavy fluorosilicone release layer 4 are coated in sequence. Finally, the residual adhesion of the release film can reach more than 90%, and the peeling strength after aging at 70 degrees for 7 days remains the same as before, the fluorine-silicon transfer is small, and the heavy release fluorine agent and the ultra-light fluorine agent are used in combination, which is low in cost and is beneficial to the processing and production of enterprises.

[0041] The above description is only an embodiment of the present invention, and does not limit the patent scope of the present invention. Any equivalent structure made using the contents of the specification and drawings of the present invention, or directly or indirectly used in other related technical fields, is also included in the patent protection scope of the present invention.

Claims

1. A fluorine release film, Features: The invention comprises a substrate layer (1), wherein a corona layer (2), a heavy fluorosilicone release layer (3) and an ultra-light fluorosilicone release layer (4) are sequentially arranged on the surface of the substrate layer (1) from the inside to the outside, and the thickness of the corona layer (2) is h 2 The thickness of the heavy fluorosilicone release layer (3) is 2-4 μm, and the coating amount of the heavy fluorosilicone release layer (3) is 0.15-0.30 g / m 2 The release force is 10-100 g / in, and the coating amount of the ultra-light fluorosilicone release layer (4) is 0.08-0.12 g / m 2 , the release force is 1-5g / in.

2. A fluorine release film according to claim 1, Features: The substrate layer (1) is made of PET.

3. A fluorine release film according to claim 1, Features: The substrate layer (1) is made of PI material.

4. A fluorine release film according to claim 2 or 3, Features: The thickness h of the substrate layer (1) is 1 25~188μm.

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