High-voltage generator adapting mechanism of ion implanter
By designing a high-voltage generator matching mechanism that supports assembly members, adapter members and locking positioning members in an ion implanter, the angle deviation problem caused by the inability to fine-tune the high-voltage generator in the prior art is solved, and the high-voltage generator is realized The stable installation and angle adjustment improves operating stability and ion implantation quality.
Patent Information
- Application Number
- CN202420153798.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-22
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2034-01-22
AI Technical Summary
The bracket structure of the existing ion implanter high-voltage generator cannot be fine-tuned, resulting in a skew of the high-voltage power supply angle, affecting the operating stability.
A high-voltage generator coupling mechanism including supporting assembly members, vertical adapter members, transverse overhang members, transverse support members and locking positioning members is designed, and a high-voltage generator is realized through a movable connection structure and locking positioning members. The stable installation and angle adjustment ensure the stable operation of the high-voltage generator in the ion implanter.
Through the design of supporting assembly and adapter members, the bending and torsional strength of the overall structure is improved. The combination of overhanging top beam and support frame provides good support capabilities, and the locking function of positioning slats ensures that The stability of the installation angle improves the operating stability and ion implantation quality of the high-voltage generator.
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Figure CN222209601U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to semiconductor ion implantation equipment, in particular to a high voltage generator matching mechanism of an ion implantation machine. Background Art
[0002] The high voltage generator in the ion implanter can provide energy for the ion acceleration process, and is generally installed in the ion implanter frame. Patent document CN213982786U discloses a high voltage generator insulating bracket, which can be used in the ion implanter, and includes a fixed base and a bracket body, the bracket body is on the fixed base, the bracket body includes a longitudinal fixing plate and a transverse fixing plate, the longitudinal fixing plate and the transverse fixing plate are in the same quadrant and the side is provided with a fixing groove, the longitudinal fixing plate and the transverse fixing plate are respectively provided with a longitudinal adjustment mechanism and a transverse adjustment mechanism, the longitudinal adjustment mechanism includes a longitudinal slide, a longitudinal adjustment screw rod, a longitudinal slider and a longitudinal baffle, the transverse adjustment mechanism includes a transverse slide, a transverse adjustment screw rod, a transverse slider and a transverse baffle, the longitudinal baffle and the transverse baffle are provided with an end clamping mechanism, the longitudinal fixing plate and the transverse fixing plate are located in the fixed groove and are provided with a side clamping mechanism, through the cooperation of the longitudinal adjustment mechanism and the transverse adjustment mechanism, it can be suitable for installing high voltage power supplies of different sizes, and can also adjust the installation angle of the high voltage generator, the operation is simple, and the practicality and flexibility of the bracket are improved. However, the horizontal fixing plate and the vertical fixing plate of this bracket adopt a fixed connection structure, which cannot be fine-tuned, and the front end of the horizontal fixing plate is subjected to a large pulling angle. When the horizontal fixing plate is deformed downward, it is difficult to adjust it, causing the high-voltage power supply angle to deviate, affecting the operating stability of the high-voltage generator. Therefore, it is necessary to optimize its structure to overcome the above defects. Utility Model Content
[0003] The utility model aims to provide a high voltage generator matching mechanism for an ion implanter to improve the operation stability of the equipment.
[0004] The technical solution adopted by the utility model to solve its technical problems is:
[0005] A high voltage generator matching mechanism for an ion implanter, comprising:
[0006] A support assembly component, which is installed in the ion implanter frame through a connector and has an assembly space inside;
[0007] A vertical transition member, which is installed in the supporting assembly member and has an assembly space inside;
[0008] A transverse overhanging member, which is installed in the vertical transition member and is installed in the ion implanter frame through a connecting piece, and has an assembly space inside;
[0009] A transverse supporting member, which is installed in the vertical transition member through a movable connection structure and corresponds to the position of the transverse overhanging member. The transverse supporting member can adjust the installation angle in the vertical transition member and form an accommodating space between the transverse overhanging member and the transverse supporting member;
[0010] A locking and positioning member is installed between the transverse overhanging member and the transverse supporting member, and the locking and positioning member locks the installation angle of the transverse supporting member. The transverse overhanging member provides a pulling force to the transverse supporting member through the locking and positioning member;
[0011] The shield accommodating component is installed in the transverse supporting component and supported by the transverse supporting component. The shield accommodating component has a high-voltage generator accommodating space inside, which can shield the high-voltage generator.
[0012] Specifically, the support assembly component includes:
[0013] A pair of supporting substrates are provided and are respectively installed in the ion implantation machine frame through connecting pieces;
[0014] A pair of mounting flanges are provided, each mounting flange is formed on the outer wall of the supporting base plate and protrudes outward from the supporting base plate, and the vertical transfer component can be installed on the mounting flange.
[0015] In one embodiment of the utility model, the support base plate is made of a flat metal plate, and the assembly flange is made of a U-shaped metal plate, the inner end of which is welded to the outer wall of the support base plate, and the outer end of which protrudes outward of the support base plate.
[0016] The vertical transfer components include:
[0017] A pair of transfer upright plates are provided, each transfer upright plate is arranged vertically, the bottom of each transfer upright plate is engaged with the assembly flange, and the top of each transfer upright plate extends above the transfer flange.
[0018] In one embodiment of the utility model, the transfer stand is made of an angled metal plate, one side of which is engaged with the transfer flange and the other side protrudes outward from the transfer flange.
[0019] The lateral overhanging members include:
[0020] A pair of cantilever top beams are provided, each cantilever top beam is arranged in the transverse direction, the middle part of each cantilever top beam is connected to the top of the transfer vertical plate, the inner end of each cantilever top beam extends to the inner side of the cantilever top beam, and the outer end of each cantilever top beam extends to the outer side of the transfer vertical plate;
[0021] A pair of transverse end plates are provided, each transverse end plate is respectively connected to the inner end of the cantilevered top beam and is connected to the ion implantation machine frame through a connecting piece.
[0022] In one embodiment of the utility model, the cantilever top beam is made of metal square tube, and the transverse end plate is made of flat metal plate, which is welded to the inner end of the cantilever top beam and connected to the ion implanter frame through connecting bolts.
[0023] The transverse support members include:
[0024] A support frame is arranged transversely and located below the cantilevered top beam, with its inner end located between the transfer uprights. Transfer through holes are respectively provided in the middle of the transfer uprights. The inner end of the support frame can be connected to the transfer uprights by matching transfer bolts, and the installation angle can be adjusted between the transfer uprights. The length of the cantilevered top beam is less than the length of the support frame.
[0025] In one embodiment of the utility model, the supporting frame is formed by enclosing and connecting a group of angle-shaped metal plates.
[0026] The locking and positioning component comprises:
[0027] A pair of positioning slats are provided, each of which is located between the cantilevered top beam and the support frame. The top end of the positioning slats is connected to the outer end of the cantilevered top beam by connecting bolts, and the installation angle can be adjusted on the cantilevered top beam. A long locking hole is provided at the bottom end, and the long locking hole extends along the length direction of the positioning slats. The positioning slats can be connected to the outer end of the support frame by a locking bolt that is compatible with it. The positioning slats provide tension to the support frame and lock the installation angle of the support frame.
[0028] In one embodiment of the present invention, the positioning strip is made of a long flat metal plate.
[0029] The mask receiving member comprises:
[0030] A shielding shell plate is provided, wherein a group of shielding shell plates are enclosed and connected to each other to form a receiving cavity inside thereof which is adapted to the shape of the high-voltage generator. The high-voltage generator can be plugged into the receiving cavity and shielded by the shielding shell plates.
[0031] In one embodiment of the utility model, the shield shell plate is made of a flat metal plate, and a reinforcing rib plate is connected to the joint portion of adjacent shield shell plates, and the reinforcing rib plate is made of an angle-joined metal plate.
[0032] The advantages of the utility model are:
[0033] The matching mechanism adopts a supporting base plate and an assembly flange to form a supporting assembly component, so that the matching mechanism can be firmly installed in the ion implanter frame. The supporting base plate provides good load-bearing capacity, and the assembly flange can enhance the connection strength and stability of the supporting base plate. The transfer vertical plate is made of an angle-combined metal plate, has high bending and torsional strength, can effectively transmit and disperse the load from the upper component, and ensure the vertical stability of the overall structure. The overhanging top beam is made of a metal square tube, has high bending stiffness and strength, and can effectively withstand lateral loads. The support frame is formed by a group of angle-combined metal plates enclosed and connected, has high integrity and stability, and can effectively support the upper shield accommodating component and the high-voltage generator. The positioning strip is made of a long flat metal plate, and the support frame is firmly connected to the overhanging top beam by connecting bolts, and the installation angle of the support frame is locked to ensure the lateral stability of the overall structure, so that the high-voltage generator can operate in a stable matching structure, avoid failures during the ion implantation process, and is conducive to improving the ion implantation quality and improving the performance of the integrated circuit finished product. BRIEF DESCRIPTION OF THE DRAWINGS
[0034] Figure 1 It is a structural schematic diagram of one embodiment of the high voltage generator matching mechanism of the ion implanter proposed by the utility model;
[0035] Figure 2 is a side structural schematic diagram of the matching mechanism;
[0036] Figure 3 It is a schematic diagram of the top surface structure of the matching mechanism. DETAILED DESCRIPTION
[0037] In order to make the purpose, technical scheme and advantages of the embodiment of the utility model clearer, the technical scheme in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. The components of the embodiment of the utility model generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiment of the utility model provided in the drawings is not intended to limit the scope of the utility model claimed for protection, but merely represents the selected embodiment of the utility model. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the utility model.
[0038] like Figure 1 to Figure 3As shown, the ion implantation machine high voltage generator matching mechanism proposed by the utility model includes a supporting assembly component, a vertical transfer component, a horizontal overhang component, a horizontal support component, a locking and positioning component and a shield accommodating component. The supporting assembly component is installed in the ion implantation machine frame through a connecting piece, and has an assembly space inside. The vertical transfer component is installed in the supporting assembly component, and has an assembly space inside. The horizontal overhang component is installed in the vertical transfer component and installed in the ion implantation machine frame through a connecting piece, and has an assembly space inside. The horizontal support component is installed in the vertical transfer component through a movable connection structure. The component is in the vertical transition component and corresponds to the position of the transverse overhanging component. It can adjust the installation angle in the vertical transition component and form an accommodation space between the transverse overhanging component and the transverse supporting component. The locking and positioning component is installed between the transverse overhanging component and the transverse supporting component. The installation angle of the transverse supporting component is locked by the locking and positioning component. The transverse overhanging component provides a pulling force to the transverse supporting component through the locking and positioning component. The shield accommodation component is installed in the transverse supporting component and is supported by the transverse supporting component. The shield accommodation component has a high-voltage generator accommodation space inside, which can shield the high-voltage generator.
[0039] In Example 1, the supporting assembly component includes a supporting substrate 110 and an assembly flange 120. A pair of supporting substrates are provided and are respectively installed in the ion implanter frame through connecting parts. A pair of assembly flanges are provided, each assembly flange is formed on the outer wall of the supporting substrate and protrudes to the outside of the supporting substrate. The vertical transfer component can be installed on the assembly flange.
[0040] The vertical transfer component includes a transfer plate 200, a pair of which are provided. Each transfer plate is arranged vertically, with its bottom engaged with the assembly flange and its top extending above the transfer flange.
[0041] The transverse cantilever component includes a cantilever top beam 310 and a transverse end plate 320. A pair of cantilever top beams are provided, and each cantilever top beam is arranged in the transverse direction. The middle part is connected to the top of the transfer vertical plate, the inner end thereof extends to the inner side of the cantilever top beam, and the outer end thereof extends to the outer side of the transfer vertical plate. A pair of transverse end plates are provided, and each transverse end plate is connected to the inner end of the cantilever top beam and connected to the ion implantation machine frame through a connecting piece.
[0042] The transverse supporting member includes a supporting frame 400, which is arranged transversely and located below the cantilevered top beam, with its inner end located between the transfer uprights. Transfer through holes are respectively provided in the middle of the transfer uprights, and the inner end of the supporting frame can be connected to the transfer uprights by matching transfer bolts, and the installation angle can be adjusted between the transfer uprights. The length of the cantilevered top beam is less than the length of the supporting frame.
[0043] The locking and positioning component includes a positioning slat 500, and a pair of positioning slats are provided. Each positioning slat is located between the cantilevered top beam and the support frame. The top end thereof is connected to the outer end of the cantilevered top beam by a connecting bolt, and the installation angle can be adjusted on the cantilevered top beam. The bottom end thereof is provided with a long locking hole, which extends along the length direction of the positioning slat and can be connected to the outer end of the support frame by a locking bolt adapted thereto. The positioning slat provides a pulling force to the support frame and locks the installation angle of the support frame.
[0044] The shielding containment component includes a shielding shell plate 600, which is provided in a group. The shielding shell plates are mutually enclosed and connected to form a containment cavity inside which is adapted to the shape of the high-voltage generator. The high-voltage generator can be plugged into the containment cavity and the high-voltage generator is shielded by the shielding shell plates.
[0045] In Example 2, the supporting assembly component includes a supporting substrate 110 and an assembly flange 120. A pair of supporting substrates are provided and are respectively installed in the ion implanter frame through connecting parts. A pair of assembly flanges are provided, each assembly flange is formed on the outer wall of the supporting substrate and protrudes to the outside of the supporting substrate. The vertical transfer component can be installed on the assembly flange.
[0046] In this embodiment, the support base plate is made of a flat metal plate, and the assembly flange is made of a U-shaped metal plate, the inner end of which is welded to the outer wall of the support base plate, and the outer end of which protrudes outward of the support base plate.
[0047] The vertical transfer component includes a transfer plate 200, a pair of which are provided. Each transfer plate is arranged vertically, with its bottom engaged with the assembly flange and its top extending above the transfer flange.
[0048] In this embodiment, the transfer plate is made of an angled metal plate, one side of which is engaged with the transfer flange and the other side protrudes outward from the transfer flange.
[0049] The transverse cantilever component includes a cantilever top beam 310 and a transverse end plate 320. A pair of cantilever top beams are provided, and each cantilever top beam is arranged in the transverse direction. The middle part is connected to the top of the transfer vertical plate, the inner end extends to the inner side of the cantilever top beam, and the outer end extends to the outer side of the transfer vertical plate. A pair of transverse end plates are provided, and each transverse end plate is connected to the inner end of the cantilever top beam and connected to the ion implantation machine frame through a connecting piece.
[0050] In this embodiment, the cantilever top beam is made of a metal square tube, and the transverse end plate is made of a flat metal plate, which is welded to the inner end of the cantilever top beam and connected to the ion implanter frame through connecting bolts.
[0051] The transverse supporting member includes a supporting frame 400, which is arranged transversely and located below the cantilevered top beam, with its inner end located between the transfer uprights. Transfer through holes are respectively provided in the middle of the transfer uprights, and the inner end of the supporting frame can be connected to the transfer uprights by matching transfer bolts, and the installation angle can be adjusted between the transfer uprights. The length of the cantilevered top beam is less than the length of the supporting frame.
[0052] In this embodiment, the support frame is formed by enclosing and connecting a group of angle-shaped metal plates.
[0053] The locking and positioning component includes a positioning slat 500, and a pair of positioning slats are provided. Each positioning slat is located between the cantilevered top beam and the support frame. The top end thereof is connected to the outer end of the cantilevered top beam by a connecting bolt, and the installation angle can be adjusted on the cantilevered top beam. The bottom end thereof is provided with a long locking hole, which extends along the length direction of the positioning slat and can be connected to the outer end of the support frame by a locking bolt adapted thereto. The positioning slat provides a pulling force to the support frame and locks the installation angle of the support frame.
[0054] In this embodiment, the positioning strips are made of long flat metal plates.
[0055] The shielding containment component includes a shielding shell plate 600, which is provided in a group. The shielding shell plates are mutually enclosed and connected to form a containment cavity inside which is adapted to the shape of the high-voltage generator. The high-voltage generator can be plugged into the containment cavity and the high-voltage generator is shielded by the shielding shell plates.
[0056] In this embodiment, the shield shell plate is made of a flat metal plate, and the joints of adjacent shield shell plates are connected with reinforcing rib plates, which are made of angle-bonded metal plates.
[0057] In the description of the present utility model, it should be noted that when terms such as "upper", "lower", "inner", "outer", "left", "right" and the like indicating orientation or positional relationship appear, it should be understood that the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the utility model product is usually placed when in use, or the orientation or positional relationship commonly understood by those skilled in the art, is only for the convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, when terms such as "first" and "second" appear, they are only used to distinguish the description, and cannot be understood as indicating or implying relative importance. In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and limited, terms such as "installation", "setting", and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements. For those skilled in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.
Claims
1. A high voltage generator matching mechanism for an ion implanter, It is characterized in that include: A support assembly component, which is installed in the ion implanter frame through a connector and has an assembly space inside; A vertical transition member, which is installed in the supporting assembly member and has an assembly space inside; A transverse overhanging member, which is installed in the vertical transition member and is installed in the ion implanter frame through a connecting piece, and has an assembly space inside; A transverse supporting member, which is installed in the vertical transition member through a movable connection structure and corresponds to the position of the transverse overhanging member. The transverse supporting member can adjust the installation angle in the vertical transition member and form an accommodating space between the transverse overhanging member and the transverse supporting member; A locking and positioning member, which is installed between the transverse overhanging member and the transverse supporting member, and the installation angle of the transverse supporting member is locked by the locking and positioning member, and the transverse overhanging member provides a pulling force to the transverse supporting member through the locking and positioning member; The shield accommodating component is installed in the transverse supporting component and supported by the transverse supporting component. The shield accommodating component has a high-voltage generator accommodating space inside and can shield the high-voltage generator.
2. The ion implanter high voltage generator matching mechanism according to claim 1, It is characterized in that The supporting assembly components include: A pair of supporting substrates are provided and are respectively installed in the ion implantation machine frame through connecting pieces; A pair of mounting flanges are provided, each mounting flange is formed on the outer wall of the supporting base plate and protrudes outward from the supporting base plate, and the vertical transfer component can be installed on the mounting flange.
3. The ion implanter high voltage generator matching mechanism according to claim 2, It is characterized in that The vertical transfer components include: A pair of transfer upright plates are provided, each transfer upright plate is arranged vertically, the bottom of each transfer upright plate is engaged with the assembly flange, and the top of each transfer upright plate extends above the transfer flange.
4. The ion implanter high voltage generator matching mechanism according to claim 3, It is characterized in that The lateral overhanging members include: A pair of cantilever top beams are provided, each cantilever top beam is arranged in the transverse direction, the middle part of each cantilever top beam is connected to the top of the transfer vertical plate, the inner end of each cantilever top beam extends to the inner side of the cantilever top beam, and the outer end of each cantilever top beam extends to the outer side of the transfer vertical plate; A pair of transverse end plates are provided, each transverse end plate is respectively connected to the inner end of the cantilevered top beam and is connected to the ion implantation machine frame through a connecting piece.
5. The high voltage generator matching mechanism of an ion implanter according to claim 4, It is characterized in that The transverse support members include: A support frame is arranged transversely and located below the cantilevered top beam, with its inner end located between the transfer uprights. Transfer through holes are respectively provided in the middle of the transfer uprights. The inner end of the support frame can be connected to the transfer uprights by matching transfer bolts, and the installation angle can be adjusted between the transfer uprights. The length of the cantilevered top beam is less than the length of the support frame.
6. The high voltage generator matching mechanism of an ion implanter according to claim 5, It is characterized in that The locking and positioning component comprises: A pair of positioning slats are provided, each of which is located between the cantilevered top beam and the support frame. The top end of the positioning slats is connected to the outer end of the cantilevered top beam by connecting bolts, and the installation angle can be adjusted on the cantilevered top beam. A long locking hole is provided at the bottom end, and the long locking hole extends along the length direction of the positioning slats. The positioning slats can be connected to the outer end of the support frame by a locking bolt that is compatible with it. The positioning slats provide tension to the support frame and lock the installation angle of the support frame.
7. The high voltage generator matching mechanism of an ion implanter according to claim 5, It is characterized in that The mask receiving member comprises: A shielding shell plate is provided, wherein a group of shielding shell plates are enclosed and connected to each other to form a receiving cavity inside thereof which is adapted to the shape of the high-voltage generator. The high-voltage generator can be plugged into the receiving cavity and shielded by the shielding shell plates.
