Preheating device and semiconductor process equipment

By designing a preheating device in a tank cleaning machine, the temperature and concentration of the process solution are monitored and controlled in real time, the problem of long preparation time for liquid dispensing and acid replacement in the prior art is solved, and the working efficiency and yield of the process tank is improved. .

CN222233579UActive Publication Date: 2024-12-24BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Application Number
CN202420077193.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-01-11
Publication Date
2024-12-24
Estimated Expiration
2034-01-11

AI Technical Summary

Technical Problem

During the liquid dispensing and acid replacement of the phosphoric acid solution, it is difficult for existing tank cleaning machines to accurately control the temperature and concentration, resulting in too long preparation time and reducing the yield.

Method used

A preheating device is designed, including a preheating tank, a detection component and a heating element. Through the detection component, the parameter information of the process solution is monitored in real time, and the adjustable flowmeter and heating element are controlled to achieve accurate control of the temperature and concentration of the process solution. , ensure that it is consistent with the parameters of the process tank.

Benefits of technology

Through the use of the preheating device, the preparation time of the process tank is significantly saved, the yield is improved, and the overbubble of wafers in the liquid tank is avoided.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a preheating device and semiconductor process equipment, relates to the technical field of semiconductor equipment, and is designed for solving the problem that the yield is reduced due to the fact that a lot of time is needed in the preparation process of liquid preparation and acid replacement of an existing process tank. The preheating device comprises a preheating tank, a detection assembly and a heating element, wherein the preheating tank is provided with an inner cavity for containing a process solution; the preheating tank is provided with a solution injection port and a solvent injection port; an adjustable flow meter is arranged at the front end of the solvent injection port and used for adjusting the flow of the solvent entering the inner cavity. The detection assembly is used for detecting parameter information of the process solution in the inner cavity so as to determine the concentration value of the process solution according to the parameter information and control the opening degree of the adjustable flow meter according to the concentration value of the process solution. The heating element is installed in the preheating groove and used for heating the process solution in the inner cavity. According to the utility model, the adjustment preparation time is saved, and the yield is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a preheating device and semiconductor process equipment. Background Art

[0002] Tank cleaning machines are a relatively common type of semiconductor process equipment. Currently, in the field of tank cleaning machines, phosphoric acid (HPO) solution is used for wet etching of silicon nitride / silicon oxide. The difficulty of this process is to accurately control the temperature and concentration of phosphoric acid. When preparing the solution or completely changing the acid, the phosphoric acid supplied from the factory to the process tank needs to undergo a heating and water replenishment process. The process can only be started after the temperature and concentration are within the control range; when partially changing the acid, the phosphoric acid in the process tank also needs to re-control the temperature and concentration. The above preparation process takes a lot of time, resulting in reduced yield. Utility Model Content

[0003] The first object of the utility model is to provide a preheating device to solve the technical problem that the preparation process of liquid preparation and acid replacement in the existing process tank requires a lot of time, resulting in reduced yield.

[0004] The preheating device provided by the utility model comprises: a preheating tank, a detection component and a heating element.

[0005] The preheating tank is provided with an inner cavity for containing a process solution; the preheating tank is provided with a solution injection port and a solvent injection port, the solution injection port is used to replenish the process solution into the inner cavity, and the solvent injection port is used to replenish the solvent into the inner cavity; an adjustable flow meter is provided at the front end of the solvent injection port, and the adjustable flow meter is used to adjust the flow rate of the solvent entering the inner cavity;

[0006] The detection component is used to detect parameter information of the process solution in the inner cavity, so as to determine the concentration value of the process solution according to the parameter information, so as to control the opening of the adjustable flow meter according to the concentration value of the process solution;

[0007] The heating element is installed in the preheating tank and is used to heat the process solution in the inner cavity.

[0008] Furthermore, the detection component includes a single-point liquid level gauge and a multi-point liquid level gauge both installed in the preheating tank, and the number of the single-point liquid level gauges is multiple, wherein the multiple single-point liquid level gauges are arranged at intervals along the height direction of the preheating tank, and are used to detect multiple heights of the process solution in the inner cavity; the multi-point liquid level gauge is used to detect the real-time pressure of the process solution in the inner cavity; the parameter information includes the multiple heights and the real-time pressure.

[0009] Furthermore, the preheating tank includes a tank body and a tank cover, the top of the tank body is provided with an opening, the tank cover is installed on the opening, and the contact portion between the tank cover and the tank body is sealed; the tank cover is provided with an exhaust port, and the exhaust port is connected to the negative pressure pipeline at the plant service end.

[0010] Furthermore, the preheating tank is a rectangular structure, and brackets are fixedly provided on the four sides of the preheating tank, and the brackets are used to be fixedly connected to the pipeline area support plate of the semiconductor process equipment; at least one of the brackets is provided with a mounting position, and the mounting position is used to fixedly install multiple single-point liquid level gauges.

[0011] Furthermore, the bracket includes a first fixing plate, a limiting plate and a second fixing plate connected in sequence in a "[" shape, wherein the first fixing plate is provided with a first hole, and the first hole is used for fixed connection with the trough body and the pipeline area support plate; the limiting plate is tightly fitted with the side of the trough body; the second fixing plate is provided with a second hole, and the second hole is used for fixed connection with the trough cover.

[0012] Furthermore, the bottom wall of the trough body partially extends outward around to form a first ear plate, and the first ear plate is provided with a through hole, and the through hole is opposite to and used in conjunction with the first hole for fixedly connecting the bracket, the trough body and the pipeline area support plate; the trough cover partially extends outward around to form a second ear plate, and the second ear plate is provided with a connecting hole, and the connecting hole is opposite to and used in conjunction with the second hole for fixedly connecting the trough cover and the bracket.

[0013] Furthermore, the preheating tank is provided with a first branch, a second branch and a third branch, wherein the first branch connects the inner cavity with the inner tank of the process tank, the second branch connects the inner cavity with the outer tank of the process tank, and the third branch connects the inner cavity with the cooling tank; a drain port is provided on the bottom wall of the tank body, and the first branch, the second branch and the third branch are connected to the drain port through a multi-way joint.

[0014] Furthermore, the preheating device also includes a first thermocouple, which is fixedly installed in the preheating tank and has a detection end extending into the process solution in the inner cavity. The first thermocouple is used to detect the temperature value of the process solution to control the heating element according to the temperature value of the process solution.

[0015] Furthermore, the preheating device also includes a second thermocouple, which is fixedly installed on the preheating tank and has a detection end extending into the process solution in the inner cavity. The second thermocouple is used to detect the temperature value of the process solution to issue an alarm when the temperature difference between the temperature value of the process solution detected by the first thermocouple and the temperature value of the process solution detected by the first thermocouple is greater than a set temperature range.

[0016] Furthermore, the heating element includes a plurality of electric heaters, the side wall of the preheating groove is partially recessed toward the inner cavity to form a plurality of installation cavities, and the plurality of electric heaters are respectively inserted into the plurality of installation cavities.

[0017] Furthermore, the preheating tank is also provided with an overflow port, and the lowest points of the solution injection port and the solvent injection port are both higher than the overflow port.

[0018] The beneficial effects brought by the preheating device of the utility model are:

[0019] During the use of the preheating device, the process solution is stored in the inner cavity of the preheating tank, and the heating element heats the process solution in the inner cavity and keeps it at the corresponding process temperature. When it is necessary to add liquid to the preheating tank, the process solution can be injected into the inner cavity using the solution injection port; the detection component detects the parameter information of the process solution in the inner cavity to determine the concentration value of the process solution according to the parameter information, and controls the opening of the adjustable flowmeter according to the concentration value of the process solution, so that the solvent is injected into the inner cavity from the solvent injection port at a corresponding rate, wherein during the liquid replenishment process, the adjustable flowmeter can be used to adjust the replenishment rate of the solvent so that the process solution in the inner cavity can reach the concentration required by the process tank.

[0020] This setting of the preheating device realizes the concentration control of the process solution of the preheating device, avoids the situation where the concentration of the process solution continues to increase due to solvent volatilization during the heating and insulation of the process solution, so that the process solution in the preheating tank can be consistent with the process solution in the process tank not only in temperature but also in concentration, thereby eliminating the concentration preparation stage of the process tank. When the process tank needs to prepare / change liquid, the process solution in the preheating tank can be quickly replenished to the process tank, and the process tank does not need the temperature and concentration adjustment process after preparing / changing liquid. On the one hand, it saves the adjustment preparation time, thereby increasing the working time of the process tank and improving the yield. On the other hand, it can also avoid over-bubbling of the wafer in the previous solution tank.

[0021] The second object of the utility model is to provide a semiconductor process equipment to solve the technical problem that the preparation process of liquid preparation and acid replacement in the existing process tank requires a lot of time, resulting in reduced yield.

[0022] The semiconductor process equipment provided by the utility model comprises a pipeline area support plate, a process tank, a cooling tank and the above-mentioned preheating device, wherein the preheating device is fixedly installed on the pipeline area support plate, and the inner tank of the process tank, the outer tank of the process tank and the cooling tank are all connected to the inner cavity of the preheating device.

[0023] The beneficial effects brought by the semiconductor process equipment of the utility model are:

[0024] By arranging the above-mentioned preheating device in the semiconductor process equipment, accordingly, the semiconductor process equipment has all the advantages of the above-mentioned preheating device, which will not be described one by one here.

[0025] In addition, by connecting the inner tank of the process tank, the outer tank of the process tank and the cooling tank to the inner cavity of the preheating device, the preheating device can not only add liquid to the inner tank of the process tank, but also replenish liquid to the outer tank of the process tank. It can also discharge the process solution in the inner cavity to the cooling tank during the machine debugging stage or when executing manual functions, thereby increasing the use conditions of the preheating device. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the utility model or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying creative work.

[0027] Figure 1 A schematic diagram of process tank solution replenishment provided for related technology;

[0028] Figure 2 The main structure of the preheating device provided in the embodiment of the utility model is schematically shown Figure 1 ;

[0029] Figure 3 The main structure of the preheating device provided in the embodiment of the utility model is schematically shown Figure 2 ;

[0030] Figure 4 A schematic diagram of the main structure of the preheating device provided in the embodiment of the utility model;

[0031] Figure 5 A schematic diagram of the temperature and concentration control principle of the preheating device provided in an embodiment of the utility model;

[0032] Figure 6 A bottom view of a preheating device provided in an embodiment of the utility model;

[0033] Figure 7 A schematic diagram of temperature and concentration control of a preheating device provided in an embodiment of the utility model.

[0034] Description of reference numerals:

[0035] 1'-preheating tank; 2'-inner tank; 3'-outer tank;

[0036] 010-control device; 020-thermostat;

[0037] 100-preheating tank; 110-tank body; 111-inner cavity; 112-solution injection port; 113-solvent injection port; 114-first ear plate; 1141-through hole; 115-drain port; 116-overflow port; 117-installation cavity; 120-tank cover; 121-exhaust port; 122-second ear plate; 1221-connection hole; 200-adjustable flow meter; 300-heating element; 310-electric heater; 400-multi-point liquid level gauge; 500-single-point liquid level gauge; 600-bracket; 610-first fixed plate; 611-first hole; 620-limiting plate; 630-second fixed plate; 631-second hole; 640-installation position; 710-first thermocouple; 720-second thermocouple; 800-fixed bracket; 810-installation hole. DETAILED DESCRIPTION

[0038] Figure 1 A schematic diagram of the process tank solution replenishment provided for the related technology. Figure 1 As shown, the process of replenishing the solution in the process tank provided by the related art is: using the preheating tank 1' to heat the phosphoric acid solution in advance, transporting the heated phosphoric acid solution to the outer tank 3' of the process tank, and then transporting it from the outer tank 3' to the inner tank 2' of the process tank to achieve the replenishment or acid replacement operation of the process tank. The above process reduces the temperature rise range of the process tank, can prevent the process tank from having a large temperature fluctuation, and thus saves the heating time required before the process.

[0039] However, in the above process, since the preheating tank 1' simply supplies the heated service phosphoric acid to the process tank, it does not have a concentration control function. In actual use, the water in the solution will volatilize in the heat preservation state after the phosphoric acid is heated, so that the phosphoric acid concentration increases, resulting in a higher concentration of phosphoric acid supplied to the process tank. Before the process, the phosphoric acid concentration in the process tank needs to be re-controlled, which prolongs the preparation time and reduces the yield.

[0040] In order to make the above-mentioned purposes, features and advantages of the utility model more obvious and easy to understand, the specific embodiments of the utility model are described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0041] Figure 2 The main structure of the preheating device provided in this embodiment is shown in FIG. Figure 1 , Figure 3 The main structure of the preheating device provided in this embodiment is shown in FIG. Figure 2 , Figure 4 This is a schematic diagram of the main structure of the preheating device provided in this embodiment. Figures 2 to 4As shown, this embodiment provides a preheating device, including a preheating tank 100, a detection component and a heating element 300. Specifically, the preheating tank 100 is provided with an inner cavity 111 for holding a process solution; the preheating tank 100 is provided with a solution injection port 112 and a solvent injection port 113, the solution injection port 112 is used to replenish the process solution to the inner cavity 111, and the solvent injection port 113 is used to replenish the solvent to the inner cavity 111; the front end of the solvent injection port 113 is provided with an adjustable flow meter 200 (not shown in the figure), the adjustable flow meter 200 is used to adjust the flow rate of the solvent entering the inner cavity 111; the adjustable flow meter 200 is electrically connected to the control device 010 of the semiconductor process equipment. The detection component is used to detect the parameter information of the process solution in the inner cavity 111; the detection component is electrically connected to the control device 010, and the control device 010 is used to determine the concentration value according to the parameter information to control the opening of the adjustable flow meter 200. The heating element 300 is installed in the preheating tank 100 to heat the process solution in the inner cavity 111 .

[0042] In this embodiment, the process solution is a phosphoric acid solution, and the solvent is pure water.

[0043] During the use of the preheating device, the phosphoric acid solution is stored in the inner cavity 111 of the preheating tank 100, and the heating element 300 heats the phosphoric acid solution in the inner cavity 111 and keeps it at the corresponding process temperature. When it is necessary to add liquid to the preheating tank 100, the phosphoric acid solution can be injected into the inner cavity 111 using the solution injection port 112; the detection component detects the parameter information of the process solution in the inner cavity 111, and outputs the detected parameter information to the control device 010 of the semiconductor process equipment, and the control device 010 determines the concentration value of the process solution in the inner cavity 111 according to the above parameter information. When the control device 010 determines that the concentration value of the process solution in the inner cavity 111 is high, at this time, it is necessary to replenish the preheating tank 100. The control device 010 will control the opening of the adjustable flowmeter 200 according to the concentration value, so that the solvent (pure water) is injected into the inner cavity 111 from the solvent injection port 113 at a corresponding rate. During the replenishment process, the adjustable flowmeter 200 can be used to adjust the pure water replenishment rate so that the phosphoric acid solution in the inner cavity 111 can reach the concentration required by the process tank.

[0044] This arrangement of the preheating device realizes the concentration control of the phosphoric acid solution in the preheating device, avoids the situation where the concentration of the phosphoric acid solution continues to increase due to the volatilization of water during the heating and insulation process of the phosphoric acid solution, so that the phosphoric acid solution in the preheating tank 100 can not only be consistent with the phosphoric acid solution in the process tank in temperature, but also can be unified with the phosphoric acid solution in the process tank in concentration, eliminating the concentration preparation stage of the process tank, so that when the process tank needs to prepare / change liquid, the phosphoric acid solution in the preheating tank 100 can be quickly added to the process tank, and the process tank does not need to adjust the temperature and concentration after preparing / changing liquid. On the one hand, it saves the adjustment preparation time, thereby increasing the working time of the process tank and improving the yield. On the other hand, it can also avoid the wafer from being over-bubbled in the previous liquid tank.

[0045] It should be noted that, in this embodiment, the control device 010 can be integrated into an industrial computer to achieve control over the opening of the adjustable flow meter 200 .

[0046] In addition, the setting of the solvent injection port 113 can also realize the cleaning of the inner cavity 111 of the preheating tank 100, that is, the setting of the solvent injection port 113 enables the preheating device to have a flushing function. Specifically, after the preheating tank 100 is emptied, pure water can be injected into the inner cavity 111 through the solvent injection port 113 to a certain height, and after a period of time, the inner cavity 111 is emptied, thereby realizing the cleaning of the inner cavity 111 of the preheating tank 100. Among them, the flushing frequency and the time of each flushing are open in the parameters of the industrial computer and can be set by the user.

[0047] It should be noted that, in this embodiment, only phosphoric acid solution is used as the process solution and pure water is used as the solvent to exemplify the preheating device. It can be understood that in other usage scenarios, the process solution and its corresponding solvent can be replaced by other methods.

[0048] Figure 5 This is a schematic diagram of the temperature and concentration control principle of the preheating device provided in this embodiment. Please continue to refer to Figures 2 to 4 , and combined with Figure 5 In this embodiment, the preheating device may further include a first thermocouple 710. Specifically, the first thermocouple 710 is fixedly mounted on the preheating tank 100, and its detection end extends into the phosphoric acid solution in the inner cavity 111. The first thermocouple 710 is connected to the control device 010 through the temperature controller 020, and the temperature controller 020 is electrically connected to the heating element 300. The first thermocouple 710 is used to detect the temperature value of the process solution to control the heating element 300 according to the temperature value of the process solution. Among them, the control of the heating element 300 may include controlling its startup and controlling the heating time of the heating element 300.

[0049] The first thermocouple 710 is provided to detect the temperature of the phosphoric acid solution in the preheating tank 100 in real time. When the temperature controller 020 obtains a signal that the phosphoric acid solution temperature is insufficient, the heating element 300 is controlled to operate, and the phosphoric acid solution in the preheating tank 100 is heated to a set temperature range, and then kept warm. The real-time temperature of the phosphoric acid solution is output by the temperature controller 020 to the control device 010. Figure 5 In the figure, ①②③ represent the temperature control process of the preheating device.

[0050] Figure 6 This is a bottom view of the preheating device provided in this embodiment. Please continue to refer to Figure 2 and Figure 5 , and combined with Figure 6 In this embodiment, the detection component may include a single-point liquid level gauge 500 and a multi-point liquid level gauge 400. Specifically, the single-point liquid level gauge 500 and the multi-point liquid level gauge 400 are both installed in the preheating tank. Multiple single-point liquid level gauges 500 are arranged at intervals along the height direction of the preheating tank 100 to detect multiple heights of the phosphoric acid solution in the inner cavity 111; the multi-point liquid level gauge 400 is used to detect the real-time pressure of the process solution in the inner cavity 111; the above-mentioned parameter information includes multiple heights detected by multiple single-point liquid level gauges 500 and real-time pressure detected by at least one multi-point liquid level gauge 400.

[0051] When the heating element 300 heats the phosphoric acid solution in the preheating tank 100 to the set temperature, the control device 010 starts to control the concentration of the phosphoric acid solution in the preheating tank 100. Specifically, multiple single-point level gauges 500 respectively control the phosphoric acid solution at different liquid level heights to detect multiple heights of the process solution in the inner cavity 111; the single-point level gauge 400 calculates the real-time pressure at the liquid surface position according to the nitrogen pressure at its nozzle, and outputs the data to the control device 010. Since P = ρgh, when the liquid level height of the preheating tank 100 is constant, the real-time pressure data output by the multi-point level gauge 400 is proportional to the density of the phosphoric acid solution, and the current concentration of the process solution can be converted according to the density. The control device 010 collects the pressure signal at a certain time interval, and calculates the water replenishment rate based on it, so as to adjust the opening of the adjustable flowmeter 200 to achieve the above-mentioned water replenishment rate. The adjustable flow meter 200 is used to replenish the preheating tank 100 with pure water at a required rate in real time until the output of the multi-point liquid level meter 400 maintains a steady state near a set value, thus completing the concentration control of the phosphoric acid solution. Figure 5 In the figure, ④⑤ represent the concentration control process of the preheating device.

[0052] This method utilizes multiple single-point liquid level gauges 500 to perform card control at multiple height positions of the inner cavity 111, and at least one multi-point liquid level gauge 400 to detect the pressure of the process solution in the inner cavity 111 in real time to obtain the concentration value of the process solution, so that the concentration control process of the process solution in the inner cavity 111 is a dynamic process and the concentration control is reliable.

[0053] Specifically in this embodiment, there are four single-point level gauges 500, which can control the phosphoric acid solution at four levels, and the four levels are: Empty, Low, Normal and Safety from bottom to top. Among them, the Empty level is used to feedback the emptying of the preheating tank 100; the Low level is used for low liquid level protection of the heating element 300 to prevent the phosphoric acid solution from burning empty due to the low level of the heating element 300 and causing safety hazards; the Normal level is the filling level of the preheating tank 100, which is used to control the volume of phosphoric acid solution injected into the preheating tank 100 by the factory phosphoric acid, and the level between the Low level and the Normal level is the available volume for the preheating tank 100 to dispense liquid to the process tank; the Safety level is the safety protection level to prevent the phosphoric acid solution from being too high.

[0054] When the single-point liquid level meter 500 detects that the phosphoric acid solution in the preheating tank 100 is less than the Normal liquid level, the factory service will inject the phosphoric acid solution into the preheating tank 100 through the solution injection port 112, and stop when the phosphoric acid solution reaches the Normal liquid level to complete the liquid preparation; when the control device 010 obtains the filling signal of the phosphoric acid solution in the preheating tank 100, it sends a control signal to the heating element 300 to make the heating element 300 work, heat the phosphoric acid solution in the preheating tank 100, and heat it to the set temperature range, and then start to keep warm to maintain the temperature of the phosphoric acid solution stable; after the temperature of the phosphoric acid solution reaches the above-mentioned set temperature range, the concentration control is turned on, and the factory service pure water is injected into the inner cavity 111 of the preheating tank 100 from the solvent injection port 113 after the flow rate is controlled by the adjustable flowmeter 200, so as to adjust the concentration of the phosphoric acid solution in the preheating tank 100 to the set range and maintain the concentration stable. When cleaning the preheating tank 100 , pure water may be injected to the Normal liquid level and then drained after a period of time to achieve cleaning of the inner cavity 111 of the preheating tank 100 .

[0055] It should be noted that in this embodiment, the liquid level of the phosphoric acid solution to be controlled can be calibrated and adjusted by the user. This embodiment only takes the number of single-point level gauges 500 as four, and takes the four liquid level heights of the phosphoric acid solution as an example for exemplary description. In this embodiment, the algorithm for controlling the concentration of the phosphoric acid solution of the preheating device is as follows. The pressure value P of the multi-point level gauge 400 is adjusted according to the N points P1, P2, P3...P N (where P1<P2<P3<…<P N) is divided into N+1 sections, and each section is set with a corresponding opening of the adjustable flow meter 200. For example, when 0≤P<P1, the control device 010 outputs a flow opening of v0 for the adjustable flow meter 200; when P1≤P<P2, the control device 010 outputs a flow opening of v1 for the adjustable flow meter 200; and so on. N ≤P, the control device 010 outputs v for the adjustable flow meter 200 N The flow opening of P1~P N , v0~v N All of them are open in the parameter setting interface of the machine user system, and users can set them according to their needs; if the segmentation set by the user does not meet P1<P2<P3<…<P N In the parameter setting interface of the concentration control algorithm, the user can also set the control cycle of the adjustable flow meter 200 for water replenishment, such as: the current flow rate is 50ml / min, which is changed to 51ml / min after 10s, and then changed again after 10s. In addition, it can also be set whether to turn on the concentration control function.

[0056] The basic principle of the above algorithm is the if piecewise function in C language, and the basic form of the function is: if(condition,result1,result2). Among them, condition is a logical expression (for example, the logical expression for judging 0≤P<P1 is 0<=P&&P<P1), and there are two possible results of the judgment: ① If its value is true, result1 is returned (the flow opening output to the adjustable flowmeter 200 is v1), ② If its value is false, the nested judgment P1≤P<P2 is started. Finally, the if piecewise function covers the size range of all possible pressure values ​​P of the multi-point liquid level meter 400, so as to realize the function of the algorithm to calculate the flow opening output of the adjustable flowmeter 200 according to the input P value.

[0057] Figure 7 The temperature and concentration control schematic diagram of the preheating device provided in this embodiment. Figure 7 As shown, in the preheating device, the adjustment process of the phosphoric acid solution concentration control is as follows. Assume that the target pressure value P of the phosphoric acid solution is within the range of P m ≤P<P m+1 First, at the calibrated working temperature, when the phosphoric acid solution is in this concentration range, the replenishment rate (i.e., the opening of the adjustable flow meter 200) can maintain a stable concentration. m Then the rehydration rates v1~v corresponding to the remaining concentration ranges are obtained. m-1 ,v m+1 ~v n There are two methods: 1. Calculation method; 2. Experimental calibration method.

[0058] Regarding 1. Calculation method, for any pressure value P (at P n ≤P<P n+1 interval, where n = 1, 2, ..., N), the corresponding fluid replenishment rate v n Can be set to v n =v m -k(P n -P m ), where v m is the stable liquid replenishment rate at the preheating tank 100°C holding temperature; k is the coefficient of concentration offset, which determines the intensity of concentration negative feedback control; P n is the current range of the pressure value, P m is the target range of pressure value. This calculation formula multiplies the offset between each concentration range and the target concentration range by a coefficient as the negative feedback of the fluid replenishment rate corresponding to the range, so that the pressure value P can approach P m .

[0059] Regarding 2. Experimental calibration method, that is, adjusting the concentration of phosphoric acid solution to various intervals, and experimentally obtaining a rehydration rate v that can negatively feedback the P value to a value closer to the target concentration. For example, first heat the phosphoric acid solution to 157.5°C, set a pure water rehydration rate (such as 50ml / min), and observe for a period of time to see if the concentration of the phosphoric acid solution changes, so that you can know whether the pure water rehydration rate is too high or too low. Through multiple experiments, you can get a rough rehydration rate.

[0060] It should be noted that, in other embodiments, a tube-type concentration meter may be used to detect the concentration of the process solution in the inner cavity 111. In this case, the parameter information of the process solution is its concentration.

[0061] Please continue to refer to Figures 2 to 4 In this embodiment, the preheating device may further include a second thermocouple 720. Specifically, the second thermocouple 720 is fixedly installed on the preheating tank 100, and its detection end extends into the process solution in the inner cavity 111. The second thermocouple 720 is electrically connected to the control device 010 through the temperature controller 020; wherein the control device 010 is provided with a temperature comparison module and an alarm module. The temperature comparison module is used to compare the temperature difference measured between the first thermocouple 710 and the second thermocouple 720, and the alarm module is used to issue an alarm when the above temperature difference is greater than the set temperature range.

[0062] In the preheating device, the first thermocouple 710 is used to provide the current temperature of the phosphoric acid solution to the temperature controller 020, and the second thermocouple 720 is used to provide the monitoring temperature. When the temperature data measured by the first thermocouple 710 is significantly different from the temperature data measured by the second thermocouple 720, the control device 010 will issue an alarm to prevent inaccurate measurement due to damage to the first thermocouple 710.

[0063] In this embodiment, the first thermocouple 710 and the second thermocouple 720 are arranged at close positions. Specifically, the first thermocouple 710 and the second thermocouple 720 are 3 to 5 cm apart.

[0064] Please continue to refer to Figures 2 to 4 In this embodiment, the preheating device may further include a fixing frame 800. Specifically, the fixing frame 800 is fixedly disposed in the inner cavity 111. The fixing frame 800 is provided with a plurality of mounting holes 810. The hole axes of the plurality of mounting holes 810 are parallel to the height direction of the preheating tank 100. The plurality of mounting holes 810 are used to install the multi-point liquid level meter 400, the first thermocouple 710 and the second thermocouple 720. The multi-point liquid level meter 400, the first thermocouple 710 and the second thermocouple 720 extend from the top wall of the preheating tank 100, specifically: extend from the tank cover 120 of the preheating tank 100.

[0065] The above arrangement not only enables the multi-point liquid level gauge 400, the first thermocouple 710 and the second thermocouple 720 to be stably installed in the preheating tank 100, thereby ensuring the reliability of the pressure and temperature detection of the phosphoric acid solution, but also makes the connection parts of the multi-point liquid level gauge 400, the first thermocouple 710 and the second thermocouple 720 and the control device 010 exposed, thereby preventing the connection parts from being damaged by corrosion.

[0066] Please continue to refer to Figures 2 to 4 In this embodiment, the preheating tank 100 may include a tank body 110 and a tank cover 120. Specifically, the top of the tank body 110 is provided with an opening, the tank cover 120 is installed at the opening, and the contact portion between the tank cover 120 and the tank body 110 is sealed. The tank cover 120 is provided with an exhaust port 121, and the exhaust port 121 is connected to the negative pressure pipeline at the plant service end.

[0067] By sealing the gap between the tank cover 120 and the tank body 110 and discharging the gas generated during the heating process through the exhaust port 121 provided in the tank cover 120, it is possible to prevent the water vapor or hot air generated during the heating of the phosphoric acid solution from overflowing from the gap between the tank cover 120 and the tank body 110 to the pipeline area and the electrical meter and wiring area above. On the one hand, it prevents the pipeline and supporting structure in the pipeline area from becoming soft and aging at high temperatures. On the other hand, it also prevents the risk of short circuit due to water vapor in the electrical area and damage caused by high temperature, thereby protecting the structures of the pipeline area and the electrical area.

[0068] In this embodiment, a boss is provided on one side of the slot cover 120 facing the slot body 110 . Specifically, the boss is embedded in the inner cavity 111 from the opening, and the outer periphery of the boss cooperates with the cavity wall of the inner cavity 111 to limit the freedom of movement of the slot cover 120 in the horizontal direction.

[0069] The above-mentioned matching structure of the slot cover 120 and the slot body 110, on the one hand, can play a role of pre-positioning during the assembly process of the slot cover 120 and the slot body 110, and on the other hand, can also play a role of limiting the slot cover 120 after the slot cover 120 and the slot body 110 are assembled, thereby preventing the slot cover 120 from moving in the horizontal direction relative to the slot body 110.

[0070] Please continue to refer to Figures 2 to 4 In this embodiment, the preheating tank 100 is a rectangular parallelepiped structure, wherein four sides of the preheating tank 100 are fixedly provided with brackets 600, and the brackets 600 are used to be fixedly connected to the pipeline area support plate of the semiconductor process equipment.

[0071] The rectangular preheating tank 100 is easy to manufacture. Moreover, by fixing the brackets 600 on the four sides of the preheating tank 100, the preheating tank 100 can be limited from four directions of the preheating tank 100, so that the installation stability of the preheating tank 100 is higher.

[0072] Please continue to refer to Figure 4 In this embodiment, the bracket 600 includes a first fixing plate 610, a limiting plate 620 and a second fixing plate 630 which are connected in sequence in a “[” shape, wherein the first fixing plate 610 is provided with a first hole 611, and the first hole 611 is used to be fixedly connected to the tank body 110 and the pipeline area support plate; the limiting plate 620 is tightly fitted with the side of the tank body 110; the second fixing plate 630 is provided with a second hole 631, and the second hole 631 is used to be fixedly connected to the tank cover 120.

[0073] This arrangement of the bracket 600 not only enables the two ends thereof to be connected to the pipeline area support plate and the tank cover 120 respectively to fix the tank body 110 on the pipeline area support plate, but also enables the limiting plate 620 located in the middle thereof to limit the tank body 110 to prevent the tank body 110 from moving in the horizontal direction. Moreover, the structure is simple and the cost is low.

[0074] Please continue to refer to Figure 4In this embodiment, the bottom wall of the trough body 110 partially extends outward around to form a first ear plate 114, and the first ear plate 114 is provided with a through hole 1141, and the through hole 1141 is opposite to and used in conjunction with the first hole 611, and is used to fix the connection bracket 600, the trough body 110 and the pipeline area support plate; the trough cover 120 partially extends outward around to form a second ear plate 122, and the second ear plate 122 is provided with a connecting hole 1221, and the connecting hole 1221 is opposite to and used in conjunction with the second hole 631, and is used to fix the connection between the trough cover 120 and the bracket 600.

[0075] When assembling the tank body 110 and the pipeline area support plate, the four brackets 600 can be placed on the four sides of the tank body 110 respectively, so that the first hole 611 opened in the first fixing plate 610 of the bracket 600 is opposite to the through hole 1141 of the first ear plate 114, and the connecting bolts are sequentially passed through the first hole 611 and the through hole 1141, and fixed to the pipeline area support plate, so as to realize the installation and fixation of the tank body 110 on the pipeline area support plate; at the same time, the tank cover 120 is covered at the opening of the tank body 110, and the connecting holes 1221 of the second ear plates 122 around the tank cover 120 are opposite to the second holes 631 opened in the second fixing plate 630 of the bracket 600, and the connecting bolts are sequentially passed through the connecting holes 1221 and the second holes 631, and the nuts are screwed to realize the fixed connection between the tank cover 120 and the tank body 110, so as to achieve the purpose of installing the preheating tank 100 on the pipeline area support plate.

[0076] The above-mentioned installation structure of the preheating tank 100 can not only realize the integrated fixation of the pipeline area support plate, the tank body 110 and the tank cover 120, and the installation stability is high, but also realize the detachable installation of the preheating tank 100 on the pipeline area support plate, thereby facilitating the disassembly and maintenance of the preheating tank 100.

[0077] Please continue to refer to Figure 4 In this embodiment, a bracket 600 is provided with a mounting position 640 , wherein the mounting position 640 is used to fix and install a plurality of single-point liquid level meters 500 .

[0078] This arrangement can realize the installation and fixation of the preheating tank 100 and the installation and fixation of multiple single-point liquid level meters 500 without adding additional components, thus saving assembly steps and reducing costs.

[0079] In this embodiment, the installation position 640 can be a strip groove, wherein the strip groove extends along the height direction of the preheating tank 100, and the single-point liquid level gauge 500 is fixedly installed in the strip groove by a nut. This setting can realize the detachable fixed installation of the single-point liquid level gauge 500 in the preheating tank 100, which is convenient for disassembly and maintenance of the single-point liquid level gauge 500, and the number of single-point liquid level gauges 500 can be increased according to actual needs, without redesigning the installation position 640 for the newly added single-point liquid level gauge 500, and the degree of commonality is high.

[0080] It should be noted that the single-point liquid level gauge 500 is generally cylindrical in structure, and an external thread is provided at the rear section thereof. The single-point liquid level gauge 500 can be clamped and fixed to the mounting position 640 of the bracket 600 by two nuts.

[0081] In other embodiments, installation positions 640 at different heights may also be provided on different brackets 600 to meet the installation requirements of multiple single-point liquid level meters 500 .

[0082] In this embodiment, the preheating tank 100 is provided with a first branch, a second branch and a third branch, wherein the first branch connects the inner cavity 111 with the inner tank of the process tank, the second branch connects the inner cavity 111 with the outer tank of the process tank, and the third branch connects the inner cavity 111 with the cooling tank.

[0083] The preheating device can not only add liquid to the inner tank of the process tank, but also replenish liquid to the outer tank of the process tank. It can also discharge the phosphoric acid solution in the inner cavity 111 to the cooling tank during the machine debugging stage or when executing manual functions, thereby increasing the use conditions of the preheating device.

[0084] In this embodiment, the bottom size of the preheating tank 100 is 400mm×400mm, and the height is 600mm. This size design makes the volume and usable volume of the preheating tank 100 larger than the total volume of the current process tank liquid (outer tank + inner tank + circulation pipeline), so that the preheating tank 100 can completely replace the acid for the process tank, or partially replace the acid in any proportion, effectively solving the problem of insufficient volume of the current preheating tank 100.

[0085] Please continue to refer to Figure 6 In this embodiment, a drain port 115 is provided on the bottom wall of the tank body 110, and the first branch, the second branch, and the third branch are connected to the drain port 115 through a multi-way connector. This arrangement can reduce the number of openings on the bottom wall of the tank body 110 and ensure the relative integrity of the preheating tank 100.

[0086] Please continue to refer to Figures 2 to 4 In this embodiment, the heating element 300 is installed in the lower half of the preheating tank 100.

[0087] By arranging the heating element 300 close to the lower part of the tank body 110, the heated phosphoric acid solution is facilitated to flow upward, so that the cold and hot convection inside the tank body 110 is strengthened to ensure the temperature uniformity of the heated phosphoric acid solution.

[0088] In this embodiment, the heating element 300 includes a plurality of electric heaters 310 , wherein the side wall of the groove body 110 is partially recessed toward the inner cavity 111 to form a plurality of installation cavities 117 , and the plurality of electric heaters 310 are respectively inserted into the plurality of installation cavities 117 .

[0089] This arrangement of the heating element 300, on the one hand, can heat the phosphoric acid solution at multiple points, shorten the heating time, and improve the heating efficiency. On the other hand, it can also realize embedded installation of the heating element 300, which not only saves the external space of the preheating tank 100, but also can increase the contact with the phosphoric acid solution, further shortening the heating time.

[0090] Please continue to refer to Figure 3 In this embodiment, the preheating tank 100 is further provided with an overflow port 116 , wherein the lowest points of the solution injection port 112 and the solvent injection port 113 are both higher than the overflow port 116 .

[0091] By providing the overflow port 116 in the preheating tank 100, it is possible to prevent the phosphoric acid solution from leaking out of the tank cover 120 due to excessive phosphoric acid solution in the preheating tank 100. In addition, by providing the overflow port 116 lower than the solution injection port 112 and the solvent injection port 113, it is also possible to prevent the phosphoric acid solution from flowing back and causing pollution and safety problems.

[0092] In this embodiment, the overflow port 116 is connected to the cooling tank, that is, the phosphoric acid solution overflowing from the overflow port 116 will flow into the cooling tank.

[0093] In addition, this embodiment also provides a semiconductor process equipment, including a pipeline area support plate, a process tank, a cooling tank and the above-mentioned preheating device, wherein the preheating device is fixedly installed on the pipeline area support plate, and the inner tank of the process tank, the outer tank of the process tank and the cooling tank are all connected to the inner cavity 111 of the preheating device.

[0094] By arranging the above-mentioned preheating device in the semiconductor process equipment, accordingly, the semiconductor process equipment has all the advantages of the above-mentioned preheating device, which will not be described one by one here.

[0095] Although the utility model is disclosed as above, the utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the utility model. Therefore, the protection scope of the utility model shall be subject to the scope defined by the claims.

[0096] Finally, it should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the term "comprises" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprises a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0097] In the above embodiments, the descriptions of directions such as “inside”, “outside”, and “side” are all based on the drawings.

[0098] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A preheating device, characterized in that: include: A preheating tank (100) is provided with an inner cavity (111) for containing a process solution; the preheating tank (100) is provided with a solution injection port (112) and a solvent injection port (113), the solution injection port (112) is used to replenish the process solution into the inner cavity (111), and the solvent injection port (113) is used to replenish the solvent into the inner cavity (111); an adjustable flow meter (200) is provided at the front end of the solvent injection port (113), and the adjustable flow meter (200) is used to adjust the flow rate of the solvent entering the inner cavity (111); A detection component, used for detecting parameter information of the process solution in the inner cavity (111), so as to determine a concentration value of the process solution according to the parameter information, so as to control the opening of the adjustable flow meter (200) according to the concentration value of the process solution; as well as A heating element (300) is installed in the preheating tank (100) and is used to heat the process solution in the inner cavity (111).

2. The preheating device according to claim 1, characterized in that: The detection component comprises a single-point liquid level gauge (500) and a multi-point liquid level gauge (400) both installed in the preheating tank (100); the number of the single-point liquid level gauges (500) is plural, wherein the multiple single-point liquid level gauges (500) are arranged at intervals along the height direction of the preheating tank (100) for detecting multiple heights of the process solution in the inner cavity (111); the multi-point liquid level gauge (400) is used to detect the real-time pressure of the process solution in the inner cavity (111); and the parameter information comprises the multiple heights and the real-time pressure.

3. The preheating device according to claim 2, characterized in that: The preheating tank (100) comprises a tank body (110) and a tank cover (120); the top of the tank body (110) is provided with an opening; the tank cover (120) is installed on the opening; and the contact portion between the tank cover (120) and the tank body (110) is sealed; the tank cover (120) is provided with an exhaust port (121), and the exhaust port (121) is connected to a negative pressure pipeline at a plant service end.

4. The preheating device according to claim 3, characterized in that: The preheating tank (100) is a rectangular parallelepiped structure, and brackets (600) are fixedly arranged on the four sides of the preheating tank (100), and the brackets (600) are used to be fixedly connected to a pipeline area support plate of a semiconductor process equipment; at least one of the brackets (600) is provided with a mounting position (640), and the mounting position (640) is used to fixedly install a plurality of the single-point liquid level meters (500).

5. The preheating device according to claim 4, characterized in that: The bracket (600) comprises a first fixing plate (610), a limiting plate (620) and a second fixing plate (630) which are connected in sequence in a "[" shape, wherein the first fixing plate (610) is provided with a first hole (611), and the first hole (611) is used for fixed connection with the tank body (110) and the pipeline area support plate; the limiting plate (620) is tightly fitted with the side of the tank body (110); the second fixing plate (630) is provided with a second hole (631), and the second hole (631) is used for fixed connection with the tank cover (120).

6. The preheating device according to claim 5, characterized in that: The bottom wall of the trough body (110) partially extends outward around to form a first ear plate (114), and the first ear plate (114) is provided with a through hole (1141), and the through hole (1141) is opposite to and used in conjunction with the first hole (611) for fixedly connecting the bracket (600), the trough body (110) and the pipeline area support plate; the trough cover (120) partially extends outward around to form a second ear plate (122), and the second ear plate (122) is provided with a connecting hole (1221), and the connecting hole (1221) is opposite to and used in conjunction with the second hole (631) for fixedly connecting the trough cover (120) and the bracket (600).

7. The preheating device according to claim 3, characterized in that: The preheating tank (100) is provided with a first branch, a second branch and a third branch, wherein the first branch connects the inner cavity (111) with the inner tank of the process tank, the second branch connects the inner cavity (111) with the outer tank of the process tank, and the third branch connects the inner cavity (111) with the cooling tank; a drain port (115) is provided on the bottom wall of the tank body (110), and the first branch, the second branch and the third branch are connected to the drain port (115) via a multi-way joint.

8. The preheating device according to claim 1, characterized in that: The preheating device further comprises a first thermocouple (710), which is fixedly mounted on the preheating tank (100) and has a detection end extending into the process solution in the inner cavity (111). The first thermocouple (710) is used to detect a temperature value of the process solution so as to control the heating element (300) according to the temperature value of the process solution.

9. The preheating device according to claim 8, characterized in that: The preheating device further comprises a second thermocouple (720), which is fixedly mounted on the preheating tank (100) and has a detection end extending into the process solution in the inner cavity (111). The second thermocouple (720) is used to detect the temperature value of the process solution, so as to issue an alarm when the temperature difference between the temperature value of the process solution detected by the first thermocouple (710) and the temperature value of the process solution detected by the first thermocouple (710) is greater than a set temperature range.

10. The preheating device according to claim 1, characterized in that: The heating element (300) comprises a plurality of electric heaters (310); a side wall of the preheating groove (100) is partially recessed in the direction of the inner cavity (111) to form a plurality of installation cavities (117); and the plurality of electric heaters (310) are respectively inserted into the plurality of installation cavities (117).

11. The preheating device according to claim 10, characterized in that: The preheating tank (100) is also provided with an overflow port (116), and the lowest points of both the solution injection port (112) and the solvent injection port (113) are higher than the overflow port (116).

12. A semiconductor process equipment, characterized in that: It comprises a pipeline area support plate, a process tank, a cooling tank and the preheating device according to any one of claims 1 to 11, wherein the preheating device is fixedly mounted on the pipeline area support plate, and the inner tank of the process tank, the outer tank of the process tank and the cooling tank are all connected to the inner cavity (111) of the preheating device.