Filtering equipment for recycling monocrystalline silicon polishing solution

Abstract

The filtering equipment comprises a tank body, a collecting hopper is fixed on the tank body, a transparent collecting cylinder is detachably mounted at the lower port of the collecting hopper, a cover cap is mounted at the upper port of the tank body, and a guide cylinder with a downward opening is fixed in the center of the lower surface of the cover cap. A lifting pipe capable of being adjusted in a lifting mode is vertically inserted into the center of the cover in a penetrating mode, a filter screen cylinder is fixed to the lower end of the lifting pipe, a liquid drainage hose is connected to the upper end of the lifting pipe, a rubber sealing cover is fixed to a lower port of the filter screen cylinder, and a liquid inlet pipe is fixed to the position, close to the left side, of the upper surface of the cover. Impurities precipitated in polishing liquid are collected through the collecting hopper and collected in the collecting barrel, and after the collecting barrel is full of the impurities, the filter screen barrel is driven by the lifting mechanism to enable the rubber sealing cover to plug the lower end opening of the collecting hopper, so that the impurity precipitates in the collecting barrel can be cleaned; and meanwhile, waste caused by flowing-out of the polishing solution is also avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing liquid filtering devices, in particular to filtering equipment for recovering single crystal silicon polishing liquid. Background Art

[0002] After being used for polishing, the single crystal silicon polishing liquid can be recycled by filtering out impurities in the polishing liquid, thereby realizing effective resource conservation. The filtration treatment of the polishing liquid requires the use of a filtration device.

[0003] The Chinese patent with the announcement number CN213885318U discloses a single crystal silicon wafer polishing liquid recovery and filtration device, which relates to the field related to single crystal silicon wafers, and is to solve the problem that when the polishing liquid is directly filtered through the filter screen, some large-size impurities will gradually block the filter holes of the filter screen, slow down the filtration speed, and gradually reduce the recovery and filtration efficiency. A polishing liquid static chamber is arranged inside the inner wall of the protective shell, and the polishing liquid static chamber is arranged in a U shape. A polishing liquid inlet pipe is installed at the upper end of one side of the protective shell, and one end of the polishing liquid inlet pipe extends to the inside of the polishing liquid static chamber. A clear liquid input pipe is installed at the upper end of the other side of the protective shell, and one end of the clear liquid input pipe extends to the inside of the polishing liquid static chamber. The installation height of the clear liquid input pipe is lower than the installation height of the polishing liquid inlet pipe. A first slag discharge pipe and a second slag discharge pipe are respectively installed on both sides of the lower end of the protective shell, and the first slag discharge pipe and the second slag discharge pipe are symmetrically arranged.

[0004] The above-mentioned single crystal silicon wafer polishing liquid recovery and filtering device discharges impurities settled at the bottom through the first slag discharge pipe and the second slag discharge pipe when the polishing liquid is subjected to impurity static precipitation treatment. However, this slag discharge method will also cause more polishing liquid to be discharged, thereby causing waste of polishing liquid. Utility Model Content

[0005] In order to solve the problem that when the above-mentioned single crystal silicon wafer polishing liquid recovery and filtering device discharges the precipitated impurities, a large amount of polishing liquid is discharged, thereby causing waste of polishing liquid, the present application provides a single crystal silicon polishing liquid recovery and filtering device, which adopts the following technical solution:

[0006] A filtering device for recovering monocrystalline silicon polishing liquid comprises a tank body, a collecting bucket is fixed to the tank body, and a transparent collecting cylinder is detachably mounted at the lower port of the collecting bucket, a cover is mounted at the upper port of the tank body, and a downwardly opening flow guide cylinder is fixed at the center of the lower surface of the cover, a lifting pipe which can be raised and lowered is vertically inserted through the center of the cover, and a filter screen cylinder is fixed to the lower end of the lifting pipe, a drainage hose is connected to the upper end of the lifting pipe, a rubber sealing cap is fixed to the lower port of the filter screen cylinder, a liquid inlet pipe is fixed to the upper surface of the cover near the left side, and a lifting mechanism for driving the lifting pipe to be raised and lowered is fixed to the upper surface of the cover.

[0007] Optionally, an annular connecting plate is fixed to the outer side of the tank body, and a connecting sleeve is fixed to the lower port of the tank body located at the collecting hopper.

[0008] Optionally, a liquid collecting pipe fixedly connected to the lifting pipe is fixed at the inner center of the filter screen cylinder, and a plurality of evenly arranged liquid inlet holes are opened on the outer surface of the liquid collecting pipe.

[0009] Optionally, an annular locking edge is fixed to the outer side of the cover near the lower end, and the locking edge is fixedly connected to the connecting plate by screws, and a sealing sleeve for movably sealing the lifting tube is fixed to the center of the cover.

[0010] Optionally, the lifting mechanism includes an electric telescopic rod, a lifting plate fixedly connected to the lifting tube is fixed at the lower end of the electric telescopic rod, and a top rod of the electric telescopic rod passes through the lifting plate and is fixed with a fixing plate, and the fixing plate is fixed to the cover by screws.

[0011] Optionally, an annular dispersion pipe is fixed on the inner side of the tank body near the upper end, and the dispersion pipe is connected to the liquid inlet pipe, and a plurality of evenly arranged liquid outlet holes are opened on the lower side of the dispersion pipe.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] In the utility model, impurities precipitated in the polishing liquid are collected by a collecting bucket and collected in a collecting cylinder. After the collecting cylinder is full, the filter screen cylinder is driven by a lifting mechanism so that the rubber cover seals the lower port of the collecting bucket, thereby cleaning and processing the impurities precipitated in the collecting cylinder, and also avoiding the waste caused by the outflow of polishing liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to more clearly illustrate the technical solution of the implementation mode of the utility model, the drawings required for use in the implementation mode will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.

[0015] Figure 1 This is a cross-sectional view of a filtering device for recovering single crystal silicon polishing liquid according to the utility model;

[0016] Figure 2 It is a tank schematic diagram of a filtering device for recovering single crystal silicon polishing liquid shown in the utility model;

[0017] Figure 3 It is a schematic diagram of a filter screen cylinder of a filter device for recovering single crystal silicon polishing liquid shown in the utility model;

[0018] Figure 4It is a schematic diagram of a cover of a filtering device for recovering single crystal silicon polishing liquid shown in the utility model;

[0019] Figure 5 The utility model is a schematic diagram of a lifting mechanism of a filtering device for recovering single crystal silicon polishing liquid.

[0020] In the figure: 1. tank body; 110. connecting plate; 120. collecting bucket; 130. connecting sleeve; 2. guide tube; 3. cover; 31. locking edge; 32. sealing sleeve; 4. liquid inlet pipe; 5. lifting mechanism; 51. electric telescopic rod; 52. fixing plate; 53. lifting plate; 6. drain hose; 7. lifting pipe; 8. filter screen cylinder; 81. rubber sealing cap; 82. liquid collecting pipe; 83. liquid inlet hole; 9. dispersion pipe; 10. collecting tube. DETAILED DESCRIPTION

[0021] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model. Therefore, the following detailed description of the embodiments of the utility model provided in the drawings is not intended to limit the scope of the utility model for which protection is claimed, but merely represents selected embodiments of the utility model.

[0022] Please refer to Figure 1 and Figure 2As shown, a filtering device for recovering single crystal silicon polishing liquid comprises a tank body 1, a collecting bucket 120 is fixed to the tank body 1, and a transparent collecting cylinder 10 is detachably installed at the lower end of the collecting bucket 120 for convenient observation of impurity collection, a cover 3 is installed at the upper end of the tank body 1, and a downwardly opening guide cylinder 2 is fixed at the center of the lower surface of the cover 3, a lifting pipe 7 which can be adjusted for lifting is vertically inserted through the center of the cover 3, and a filter screen cylinder 8 is fixed at the lower end of the lifting pipe 7, a liquid discharge hose 6 is connected to the upper end of the lifting pipe 7, a rubber sealing cap 81 is fixed at the lower end of the filter screen cylinder 8, a liquid inlet pipe 4 is fixed near the left side of the upper surface of the cover 3, and an annular dispersion pipe 9 is fixed near the upper end of the inner side of the tank body 1, and the distribution pipe 9 is The dispersion pipe 9 is connected to the liquid inlet pipe 4. A plurality of evenly arranged liquid outlet holes are provided on the lower side of the dispersion pipe 9. The annular dispersion pipe 9 evenly transports liquid into the tank body 1 through the plurality of liquid outlet holes, which is beneficial to the precipitation of impurities in the polishing liquid and the uniform filtration of the filter screen cylinder 8. A lifting mechanism 5 is fixed on the upper surface of the cover 3 for driving the lifting pipe 7 to rise and fall. The impurities precipitated in the polishing liquid are collected by the collecting bucket 120 and collected in the collecting barrel 10. After the collecting barrel 10 is full, the filter screen cylinder 8 is driven by the lifting mechanism 5 so that the rubber cover 81 blocks the lower port of the collecting bucket 120. The impurity precipitation in the collecting barrel 10 can be cleaned and processed, and the waste caused by the outflow of polishing liquid can be avoided.

[0023] Please refer to Figure 2 As shown, an annular connecting plate 110 is fixed to the outer side of the tank body 1 for fixed cooperation with the locking edge 31 , and a connecting sleeve 130 is fixed to the lower end of the collecting bucket 120 of the tank body 1 for installing the collecting cylinder 10 .

[0024] Please refer to Figure 3 As shown, a liquid collecting pipe 82 fixedly connected to the lifting pipe 7 is fixed at the inner center of the filter screen cylinder 8 for collecting the polishing liquid filtered by the filter screen cylinder 8, and a plurality of evenly arranged liquid inlet holes 83 are opened on the outer surface of the liquid collecting pipe 82 to collect the polishing liquid.

[0025] Please refer to Figure 4 As shown, an annular locking edge 31 is fixed to the outer side of the cover 3 near the lower end, and the locking edge 31 is fixedly connected to the connecting plate 110 by screws. A sealing sleeve 32 for active sealing of the lifting tube 7 is fixed at the center of the cover 3 for sealing cooperation when the lifting tube 7 is raised or lowered.

[0026] Please refer to Figure 5As shown, the lifting mechanism 5 includes an electric telescopic rod 51, the lower end of which is fixed with a lifting plate 53 fixedly connected to the lifting tube 7, and the top rod of the electric telescopic rod 51 passes through the lifting plate 53 and is fixed with a fixing plate 52, which is fixed to the cover 3 by screws. The electric telescopic rod 51 retracts the top rod to drive the lifting plate 53 to descend and then drive the lifting tube 7 to descend.

[0027] Working principle: the polishing liquid is sent into the dispersion pipe 9 through the liquid inlet pipe 4 and transported downward evenly. The larger impurities in the polishing liquid flowing downward are precipitated downward and collected in the collecting cylinder 10 through the collecting bucket 120. The polishing liquid after precipitation enters the guide cylinder 2 from bottom to top and is filtered through the filter screen cylinder 8. The filtered polishing liquid enters the collecting pipe 82 through the liquid inlet hole 83 and is discharged through the lifting pipe 7 and the drain hose 6. When the collecting cylinder 10 is full, the electric telescopic rod 51 retracts the top rod to drive the lifting plate 53 to descend, and then drives the lifting pipe 7 to descend and drives the filter screen cylinder 8 to descend, so that the rubber cover 81 blocks the lower port of the collecting bucket 120, and the impurity precipitation in the collecting cylinder 10 can be cleaned and processed.

[0028] The above description is only the preferred implementation of the utility model, and is not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. A filtering device for recovering a single crystal silicon polishing liquid, comprising a tank body (1), characterized in that: The tank body (1) is fixed with a collecting bucket (120), and a transparent collecting cylinder (10) is detachably mounted at the lower end of the collecting bucket (120); a cover (3) is mounted at the upper end of the tank body (1), and a downwardly opening flow guide cylinder (2) is fixed at the center of the lower surface of the cover (3); a lifting tube (7) that can be adjusted in lifting and lowering is vertically inserted through the center of the cover (3), and a filter screen cylinder (8) is fixed at the lower end of the lifting tube (7); a liquid discharge hose (6) is connected to the upper end of the lifting tube (7), and a rubber sealing cover (81) is fixed at the lower end of the filter screen cylinder (8); a liquid inlet pipe (4) is fixed near the left side of the upper surface of the cover (3), and a lifting mechanism (5) that drives the lifting tube (7) to be adjusted in lifting and lowering is fixed on the upper surface of the cover (3).

2. A filtering device for recovering single crystal silicon polishing liquid according to claim 1, characterized in that: An annular connecting plate (110) is fixed to the outside of the tank body (1), and a connecting sleeve (130) is fixed to the lower end of the tank body (1) located in the collecting hopper (120).

3. The filtering device for recovering single crystal silicon polishing liquid according to claim 1, characterized in that: A liquid collecting pipe (82) fixedly connected to the lifting pipe (7) is fixed at the inner center of the filter screen cylinder (8), and a plurality of evenly arranged liquid inlet holes (83) are provided on the outer surface of the liquid collecting pipe (82).

4. The filtering device for recovering single crystal silicon polishing liquid according to claim 2, characterized in that: An annular locking edge (31) is fixed to the outer side of the cover (3) near the lower end, and the locking edge (31) is fixedly connected to the connecting plate (110) by means of screws. A sealing sleeve (32) for movably sealing the lifting tube (7) is fixed to the center of the cover (3).

5. The filtering device for recovering single crystal silicon polishing liquid according to claim 1, characterized in that: The lifting mechanism (5) comprises an electric telescopic rod (51), a lifting plate (53) fixedly connected to the lifting tube (7) being fixed at the lower end of the electric telescopic rod (51), and a top rod of the electric telescopic rod (51) passing through the lifting plate (53) and fixed with a fixing plate (52), wherein the fixing plate (52) is fixed to the cover (3) by means of screws.

6. The filtering device for recovering single crystal silicon polishing liquid according to claim 1, characterized in that: An annular dispersion pipe (9) is fixed on the inner side of the tank body (1) near the upper end, and the dispersion pipe (9) is connected to the liquid inlet pipe (4). The lower side of the dispersion pipe (9) is provided with a plurality of evenly arranged liquid outlet holes.

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