Device for positioning defect position of photomask
By setting up positioning parts composed of markers and branches on the photomask, the problem of difficult removal of foreign matter defects that are strongly attached to the photomask and difficult to locate defects is solved, and the rapid and accurate positioning and analysis of photomask defects is achieved, improving the improvement of the improvement of the photomask defects. Defect recognition and analysis accuracy are achieved.
Patent Information
- Application Number
- CN202420975457.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-07
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-05-07
AI Technical Summary
The strongly attached foreign matter defects that may occur during the production and use of the photomask are difficult to remove through cleaning and repair, resulting in the scrapping of the photomask, and the existing analytical equipment cannot accurately locate and distinguish nano-level defects, resulting in difficulty in judging the source of the defect.
A device including a test photomask and a positioner is designed, the positioner consists of a marker and a branch, which is arranged around the target defect, and the branch is connected to the marker to form a shape and size from small to large, thereby Position defect locations within the range visible to the naked eye to avoid interference and improve recognition.
Through this device, the analysis equipment can quickly and accurately locate and identify target defects of the photomask, improve defect recognition and analysis accuracy, and is suitable for difficult-to-locate photomask defect analysis process, reducing artificial errors and difficulty in lobe processing .
Smart Images
Figure CN222259835U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of photomask defect positioning, and in particular to a device for positioning a photomask defect position. Background Art
[0002] Photomasks may have various defects during production, use and storage. Photomasks are inspected for defects before they leave the factory and before they are used. Common defects are usually eliminated by repair and cleaning. However, some foreign defects have strong adhesion and cannot be removed by cleaning. The success rate and efficiency of repair are very low, which may cause the photomask to be scrapped. Therefore, it is necessary to find the cause and solve the problem from the source. Since photomasks have many manufacturing processes, it is difficult to determine the source of defects only by the optical images obtained by defect detection. Physical and chemical analysis of defects is helpful to determine the source of defects.
[0003] Before conducting physical and chemical analysis on defects in a photomask, one of the operational difficulties is often how the analysis and testing equipment can accurately locate the target defect position.
[0004] Based on this, a new technical solution is needed. Utility Model Content
[0005] In view of this, an embodiment of the present disclosure provides a device for locating photomask defects.
[0006] The embodiments of this specification provide the following technical solutions:
[0007] The embodiment of the present specification provides a device for locating a defect position of a photomask, including a test photomask and a positioning member;
[0008] The test photomask has a target defect, and the positioning member is disposed at the target defect position of the test photomask, and is configured so that the positioning member positions the target defect position;
[0009] The positioning member includes a marking member and a plurality of branch members;
[0010] The marking element is arranged around the target defect and is configured to locate and display the target defect;
[0011] A plurality of branch members are arranged around the marking member, and the branch members are all connected to the marking member.
[0012] Preferably, the inner end of the branch piece is connected to the marking piece, and the inner end of the branch piece to the outer end of the branch piece are arranged in a shape from small to large, and the positioning piece is configured to be invisible to the naked eye and visible to the naked eye.
[0013] Preferably, the marking member is a marking frame, which is configured so that the target defect is located in the marking frame.
[0014] Preferably, the marking frame is in a square shape.
[0015] Preferably, the marking frame is circular in shape.
[0016] Preferably, the marking frame is located at the center of the positioning member.
[0017] Preferably, adjacent branch members are spaced apart at a preset angle.
[0018] Preferably, the preset angle between adjacent branch members is 90 degrees.
[0019] Preferably, the branch member comprises a plurality of branch blocks, and the plurality of branch blocks are stacked;
[0020] The dimensions of the plurality of branch blocks perpendicular to the stacking direction are arranged from small to large from the inner end of the branch piece to the outer end of the branch piece.
[0021] Preferably, the positioning member is configured as an exposure member.
[0022] Compared with the prior art, the at least one technical solution adopted in the embodiments of this specification can achieve the following beneficial effects:
[0023] The present application sets a positioning piece on the test photomask, and the analysis and testing equipment can accurately find and locate the target defect position of the test photomask through the positioning piece. The positioning piece can quickly and effectively locate the target defect position when performing split processing and physical and chemical analysis, improve the recognition of the target defect, and facilitate finding and distinguishing the target defect. It is suitable for situations where it is difficult to locate during the photomask defect analysis process. In addition, by setting the marking piece around the target defect, the marking piece does not interfere with the target defect, which facilitates the display of the target defect; multiple branch pieces are set around the marking piece, which can improve the recognition of the positioning piece. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0025] Figure 1 It is a schematic diagram of the structure in this application;
[0026] Figure 2 yes Figure 1 A magnified schematic diagram of part A;
[0027] Figure 3 yes Figure 2 Schematic diagram of the enlarged portion B.
[0028] Figure numerals: 1. test photomask; 2. positioning piece; 21. marking piece; 22. branch piece; 221. branch block. DETAILED DESCRIPTION
[0029] The embodiments of the present application are described in detail below with reference to the accompanying drawings.
[0030] The following describes the implementation methods of the present application through specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The present application can also be implemented or applied through other different specific implementation methods, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that, in the absence of conflict, the following embodiments and the features in the embodiments can be combined with each other. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work belong to the scope of protection of the present application.
[0031] It should be noted that various aspects of the embodiments within the scope of the appended claims are described below. It should be apparent that the aspects described herein can be embodied in a wide variety of forms, and any specific structure and / or function described herein is merely illustrative. Based on the present application, it should be understood by those skilled in the art that an aspect described herein can be implemented independently of any other aspect, and two or more of these aspects can be combined in various ways. For example, any number and aspect described herein can be used to implement the device and / or practice the method. In addition, other structures and / or functionalities other than one or more of the aspects described herein can be used to implement this device and / or practice this method.
[0032] It should also be noted that the illustrations provided in the following embodiments are only schematic illustrations of the basic concept of the present application. The drawings only show components related to the present application rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.
[0033] Additionally, in the following description, specific details are provided to facilitate a thorough understanding of the examples. However, it will be understood by those skilled in the art that the examples can be practiced without these specific details.
[0034] In view of this, the applicant has conducted in-depth research and improved exploration on the photomask defect processing and the location of the photomask defect, and found that physical and chemical analysis of defects is helpful to determine the source of defects. The current analysis equipment cannot achieve full-plate machine testing, and needs to be processed by splitting. The common method is manual slicing. The defect size is generally at the nanometer level. When slicing, the defect is located according to the inspection coordinates. This method is prone to errors, and it is not easy to distinguish the target defects after the analysis equipment is installed.
[0035] Common defects will be judged based on experience, and component analysis can improve the accuracy of judging the source of defects. Analyzing the source of photomask defects is an effective way to fundamentally solve the generation of defects. Component analysis of defects can improve the accuracy of judging the source of defects. Component analysis requires accurate positioning of defects to ensure that the target defects are analyzed. Electron beams can be used to perform processing at the defect location that is easy to identify defects. Most equipment does not have the function of accurate positioning of electron beams, that is, most equipment does not have the function of accurate positioning of electron beams on the entire plate. Split processing locates defects according to the inspection coordinates, and there will be position errors for nano-level defects. Therefore, although physical and chemical analysis of photomask defects is conducive to judging the source of defects, the analysis equipment cannot achieve full-plate test analysis, and split processing is required. Split processing locates defects according to the inspection coordinates, and there will be position errors for nano-level defects. It is not easy to locate and distinguish target defects after the photomask splinter sample is analyzed by the equipment.
[0036] Based on this, the technical solutions provided by the embodiments of the present application are described below in conjunction with the accompanying drawings.
[0037] The embodiments of this specification provide a device for locating the position of a defect in a photomask, such as Figure 1 and Figure 2 As shown, it includes a test photomask 1 and a positioning member 2; the test photomask 1 carries a target defect, and the positioning member 2 is arranged at the target defect position of the test photomask 1, and is configured so that the positioning member 2 locates the target defect position. The positioning member 2 can be a positioning groove, which is opened on the test photomask 1; the positioning member 2 can be a marking pattern for positioning, which is arranged on the test photomask 1 by means of secondary exposure or the like; and the primary exposure is used on the test photomask 1. The positioning member 2 can also be a positioning entity, which is arranged on the test photomask 1 by means of pasting or the like. The positioning member 2 is a pattern arranged from small to large from the inside to the outside, so that the positioning member 2 can be visible to the naked eye. The positioning member 2 is helpful to determine the target defect position. The positioning member 2 only needs to increase from the inside to the outside to be recognizable to the naked eye, and the positioning member 2 can be radial, circular, or an extended square frame, etc. The size of the entire positioning member 2 is more than 1 mm, which can be within the visible range of the naked eye. The center of the positioning member 2 is left empty so as not to cover the defect. Figure 1 The middle one is a 6*6 inch test photomask 1.
[0038] like Figure 2 and Figure 3 As shown, the positioning member 2 includes a marking member 21 and a plurality of branch members 22; the marking member 21 is arranged around the target defect and is configured to locate and display the target defect; the plurality of branch members 22 are arranged around the marking member 21, and the branch members 22 are all connected to the marking member 21. The branch member 22 can be a branch groove in the positioning groove, a branch pattern in the marking pattern, or a branch entity member in the positioning entity member.
[0039] In one embodiment, the inner end of the branch member 22 is connected to the marking member 21, and the inner end of the branch member 22 to the outer end of the branch member 22 are arranged in a shape from small to large, and the positioning member 2 is configured to be invisible to the naked eye or visible to the naked eye.
[0040] In one embodiment, the marking member 21 is a marking frame, which is configured so that the target defect is located in the marking frame. The marking frame is in the shape of a closed loop, and the marking frame can be a marking entity in the positioning entity, a marking groove in the positioning groove, and a marking frame graphic in the marking graphic. The marking frame is used to frame the target defect, and the marking frame is separated from the target defect, and the marking frame and the target defect do not interfere with each other. The size of the marking frame can be applied to or accommodate the target defect size at the nanometer level.
[0041] In one embodiment, the marking frame is in a square shape.
[0042] In one embodiment, the marking frame is circular in shape.
[0043] In one embodiment, the marking frame is located at the center of the positioning member 2. The center formed by the plurality of branch members 22 is consistent with the center of the marking frame. The plurality of branches are based on the marking frame and are arranged from small to large from inside to outside.
[0044] In one embodiment, adjacent branch members 22 are spaced apart by a preset angle.
[0045] In one embodiment, the preset angle between adjacent branch members 22 is 90 degrees. The branches are symmetrically and evenly arranged, and the branches are arranged at preset angles at intervals, for example, adjacent branches are arranged at 90 degrees, and four branches are arranged, for example, in a cross-shaped arrangement. The marking frame is located at the center of the cross.
[0046] In one embodiment, if Figure 2 and Figure 3As shown, the branch member 22 includes a plurality of branch blocks 221, and the plurality of branch blocks 221 are stacked; the dimensions of the plurality of branch blocks 221 perpendicular to the stacking direction are arranged from small to large from the inner end of the branch member 22 to the outer end of the branch member 22. The branch member 22 is formed by dividing a plurality of branch blocks 221 into stacks, and the dimensions of the plurality of branch blocks 221 perpendicular to the stacking direction are arranged from small to large from the inside to the outside. The stacked branch blocks 221 are symmetrically arranged along the central axis of the stacking direction, and the symmetrical two sides are arranged in a stepped shape. The two sides of the branch member 22 can also be directly arranged in an oblique line shape.
[0047] In one embodiment, the positioning member 2 is configured as an exposure member. A secondary exposure process is added to the test photomask 1. For example, a round of secondary exposure process is added to the existing test photomask 1, and the positioning member 2 for locating defects is formed on the test photomask 1. The defect position is accurately located on the crack processing and analysis equipment through the positioning member 2. Because the previous mask used for defect analysis has been scrapped, the positioning member 2 is secondary produced on a large area of the subsequent mask through secondary exposure or other processes. The secondary exposure is to re-apply photoresist, perform photolithography, development and etching to produce the positioning member 2. Because the positioning member 2 has obvious features, it will cover the original mask so that it can be identified. The secondary exposure process is a normal technical process, which will have positioning and alignment functions and will not interfere with the defect position. The first exposure is for mask production, and the secondary exposure performed on the completed mask forms the positioning member 2.
[0048] By using the positioning piece 2 on the test photomask 1, the test photomask 1 can be split to obtain a sample of the test photomask 1 with the positioning piece 2. The target defect on the sample can be located by the positioning piece 2, and the target defect can be physically and chemically analyzed to determine the source of the photomask defect. The defect size is generally at the nanometer level and is invisible to the naked eye. General analysis equipment cannot achieve on-machine testing of the entire photomask, and needs to be split in advance. The common method is to identify and locate it by human eyes. During the test stage, the slices will be visualized in advance, but the graphics around the actual defects are invisible, and it is very difficult to locate them only by coordinates. Moreover, even if splitting is not required, many analysis equipment cannot locate and find the target defects without the magnification observation function of the electron beam microscope. Therefore, a positioning piece 2 that gradually increases from the inside to the outside is made and designed on the test photomask 1: the inside is the same order of magnitude as the defect, and the outside extends to the size visible to the naked eye. The defect position can be quickly and accurately determined during the splitting process. The positioning piece 2 can also be easily found by on-machine observation of the analysis and detection equipment, which is conducive to locating and distinguishing the target defects.
[0049] In this specification, the same or similar parts between the various embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the embodiments described later, the description is relatively simple, and the relevant parts can be referred to the partial description of the previous embodiments.
[0050] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.
Claims
1. A device for locating a defect position of a photomask, characterized in that: It comprises a test photomask (1) and a positioning member (2); The test photomask (1) has a target defect, and the positioning member (2) is arranged at the target defect position of the test photomask (1), and is configured so that the positioning member (2) locates the target defect position; The positioning member (2) comprises a marking member (21) and a plurality of branch members (22); The marking element (21) is arranged around the target defect and is configured to locate and display the target defect; The plurality of branch pieces (22) are arranged around the outside of the marking piece (21), and the branch pieces (22) are all connected to the marking piece (21).
2. The device for locating a defect position of a photomask according to claim 1, characterized in that: The inner end of the branch piece (22) is connected to the marking piece (21), and the inner end of the branch piece (22) to the outer end of the branch piece (22) are arranged in a shape from small to large, and the positioning piece (2) is configured to be invisible to the naked eye but visible to the naked eye.
3. The device for locating a defect position of a photomask according to claim 1, characterized in that: The marking element (21) is a marking frame, which is configured so that the target defect is located in the marking frame.
4. The device for locating a defect position of a photomask according to claim 3, characterized in that: The shape of the marking frame is square.
5. The device for locating a defect position of a photomask according to claim 3, characterized in that: The shape of the marking frame is circular.
6. The device for locating a defect position of a photomask according to claim 3, characterized in that: The marking frame is located at the center of the positioning member (2).
7. The device for locating a defect position of a photomask according to claim 1, characterized in that: Adjacent branch members (22) are arranged at a preset angle.
8. The device for locating a defect position of a photomask according to claim 7, characterized in that: The preset angle between adjacent branch members (22) is 90 degrees.
9. The device for locating a defect position of a photomask according to claim 2, characterized in that: The branch member (22) comprises a plurality of branch blocks (221), and the plurality of branch blocks (221) are stacked. The dimensions of the plurality of branch blocks (221) perpendicular to the stacking direction are arranged from small to large from the inner end of the branch piece (22) to the outer end of the branch piece (22).
10. The device for locating a defect position of a photomask according to claim 1, characterized in that: The positioning member (2) is configured as an exposure member.