Solar cell silicon wafer vacuum drying equipment

Abstract

The utility model discloses solar cell silicon wafer vacuum drying equipment, which belongs to the technical field of solar cell drying, and is characterized in that a plurality of heating cavities which are connected in series, namely a front preheating cavity, a constant-temperature low-pressure vacuum furnace and a rear cooling treatment cavity, are arranged, and sample cells are placed on an automatic conveying line through other automatic accessories; and the sample batteries are sequentially conveyed into the box bodies through the feeding and discharging mechanism, so that the sample batteries are sequentially subjected to all stages in the baking process in the box bodies. The cavities are heated line by line in the vertical direction through multi-line parallel arrangement, it is guaranteed that the temperature difference in the vertical direction is greatly reduced through up-down circulation of cold and hot air, the temperature difference of sample batteries in the constant-temperature low-pressure vacuum furnace in the vertical direction is reduced as much as possible, and the yield of large-batch solar battery production is increased; and the difference of samples in the same batch caused by non-uniform temperature distribution of the sample batteries is avoided.

Description

Technical Field

[0001] The utility model belongs to the technical field of solar cell drying, and in particular relates to a solar cell silicon wafer vacuum drying device. Background Art

[0002] Traditional fossil energy reserves are decreasing, and the harm to the environment is becoming increasingly prominent. Photovoltaic power generation has become a technology that can replace fossil energy. At present, the first generation of solar cells includes single crystal, polycrystalline and amorphous silicon solar cells; this type of battery is relatively mature and has been widely used in commercial and civilian fields. The second generation of solar cells is mainly compound semiconductor solar cells; this type of battery has a high theoretical conversion efficiency, but the production cost is high and it is difficult to be civilianized. It is usually only used in aerospace, military and other fields. The third generation of solar cells is also called a new type of solar cell, which mainly includes inorganic and organic thin film solar cells, dye-sensitized, quantum dot-sensitized solar cells and perovskite solar cells.

[0003] In the research and practice of the prior art, the inventors found that for the curing and drying of the metallized part in the production process of solar cells, the drying temperature is too high to affect the cell performance, and the temperature is too low to completely treat the organic solvent in the grid line. The uneven heat transfer during drying will also lead to uneven drying of the cell, resulting in defects in the device structure, affecting the performance and stability of the device. Therefore, it is particularly important to improve the drying efficiency while reducing the impact of the drying process on the cell performance. Utility Model Content

[0004] In order to solve the above problems, the purpose of the utility model is to provide a solar cell silicon wafer vacuum drying equipment, which optimizes the production and manufacturing process and greatly reduces the cost and energy consumption while obtaining high-performance solar cells.

[0005] The utility model is realized by the following technical solutions:

[0006] The utility model proposes a solar cell silicon wafer vacuum drying device, comprising a plurality of heating cavities, an air supply mechanism, an automation mechanism, and an exhaust mechanism. Each of the plurality of heating cavities includes a heating mechanism inside, the air supply mechanism and the exhaust mechanism are respectively fixedly connected to the two ends of the plurality of heating cavities, the automation mechanism runs through the plurality of heating cavities and is located below each of the heating mechanisms, and each of the heating cavities is connected by a sealing mechanism.

[0007] In one embodiment, the multiple heating chambers include a front preheating chamber, a constant temperature low pressure vacuum furnace, and a post cooling treatment chamber which are connected in sequence. Heating mechanisms are arranged inside the heating chambers of the front preheating chamber, the constant temperature low pressure vacuum furnace, and the post cooling treatment chamber. The automation mechanism passes through the front preheating chamber, the constant temperature low pressure vacuum furnace, and the post cooling treatment chamber in sequence, and is located below each of the heating mechanisms. An airtight valve is also arranged at the connection between the front preheating chamber, the constant temperature low pressure vacuum furnace, and the post cooling treatment chamber, which is used for sealing and isolating the heating chambers to ensure that each heating chamber can maintain its own temperature and pressure conditions.

[0008] In one embodiment, two adjacent cavities of the plurality of heating cavities are connected by a sealing mechanism, and the sealing mechanism can control the connection or isolation between two adjacent cavities of the plurality of heating cavities by opening and closing. The sealing mechanism is composed of the feed sealing gate valve 1, the discharge sealing gate valve 1, the feed sealing gate valve 2, the discharge sealing gate valve 2, the feed sealing gate valve 3, and the discharge sealing gate valve 3. The feed sealing gate valve 1 is arranged at the feed end of the front preheating chamber, and the discharge sealing gate valve 3 is arranged at the discharge end of the rear cooling treatment chamber; the discharge sealing gate valve 1 is connected to the feed sealing gate valve 2 between the front preheating chamber and the constant temperature low pressure vacuum furnace, and the discharge sealing gate valve 2 is connected to the feed sealing gate valve 3 between the constant temperature low pressure vacuum furnace and the rear cooling treatment chamber. Specifically, the sealing gate valves that cooperate with each other can be better sealed by installing a vacuum pressure gauge. The feed sealing valve 1, the discharge sealing valve 1, the feed sealing valve 2, the discharge sealing valve 2, the feed sealing valve 3 and the discharge sealing valve 3 can be automatic plug-in type valves or upper and lower plug-in type valves, and need to have corresponding sealing silicone and sealing layers to facilitate switching. When the valves are closed, the front preheating chamber, the constant temperature low-pressure vacuum furnace and the rear cooling treatment chamber are all independently sealed.

[0009] In one embodiment, the gas supply mechanism includes the gas supply main tank, a gas storage box, an air intake transition box, a gas control electromagnetic device, a gas supply PLC master controller, a non-constant pressure airflow controller, a constant pressure airflow controller, a non-constant pressure airflow solenoid valve, and a constant pressure airflow solenoid valve.

[0010] In one embodiment, a gas storage box, an air intake transition box, and a gas control electromagnetic device are provided inside the gas supply main tank. Specifically, the gas storage box is connected to a plurality of gas control electromagnetic devices respectively through a plurality of gas pipelines, and finally connected to a plurality of heating chambers. Specifically, the gas storage box is connected to the air intake transition box, and the air intake transition box is connected to the outside of the equipment, so that gas can be absorbed from the outside, and then distributed to each gas control electromagnetic device in turn after entering the gas storage box. Specifically, the air intake transition box can be equipped with an external gas pump, a compressed air pump, an inert gas tank, an industrial gas production system, etc. The specific external device is not restricted here, and gas is supplied to the air intake transition box so as to ensure a stable supply of gas inside the equipment.

[0011] In one embodiment, the gas supply mechanism also includes the gas supply PLC master controller, the non-constant pressure airflow controller, the constant pressure airflow controller, the non-constant pressure airflow solenoid valve, and the constant pressure airflow solenoid valve. Specifically, the gas supply PLC master controller is electrically connected to the non-constant pressure airflow controller, the constant pressure airflow controller, the non-constant pressure airflow solenoid valve, and the constant pressure airflow solenoid valve, and the gas supply PLC master controller is coordinated with the external industrial control host for unified operation, and at the same time, the air pressure control, airflow constraint and other mechanism cooperation of the gas supply mechanism can be effectively and uniformly managed. Specifically, the gas supply main tank is connected to the non-constant pressure airflow controller and the constant pressure airflow controller through the gas pipeline, and the non-constant pressure airflow controller is provided with multiple controls for the front preheating chamber and the rear cooling treatment chamber, respectively. The constant pressure airflow controller is connected to the constant temperature low pressure vacuum furnace through the gas pipeline.

[0012] In one embodiment, the multiple heating chambers are connected through the automation mechanism, and the automation mechanism includes a loading transport line extension line, a loading transport line, a high-temperature transport line, a unloading transport line, and a unloading transport extension line connected in sequence; the loading transport line extension line is located outside the feeding end of the front preheating chamber, the loading transport line is located inside the front preheating chamber, the high-temperature transport line is located inside the constant temperature low-pressure vacuum furnace, the unloading transport line is located inside the rear cooling treatment chamber, and the unloading transport extension line is located outside the discharge end of the rear cooling treatment chamber.

[0013] In one embodiment, the exhaust mechanism includes the preheating chamber ventilation pipe, the high-temperature airflow control valve, the cooling chamber ventilation pipe, the constant temperature furnace ventilation pipe, the constant pressure exhaust processing chamber, the exhaust PLC master controller, the cooling chamber airtight valve, the constant pressure low pressure airtight valve, the exhaust insulation layer, the heating chamber airtight valve, the cooling chamber airflow detection controller, the constant pressure low pressure airflow detection controller, the heating chamber airflow detection controller, the preheating exhaust processing chamber, and the cooling exhaust processing chamber.

[0014] In one embodiment, the preheating chamber ventilation duct, the cooling chamber ventilation duct, and the constant temperature furnace ventilation duct are all provided with high-temperature airflow control valves that can be uniformly controlled or separately controlled. Specifically, the preheating chamber ventilation duct is connected to the preheating exhaust treatment chamber, the cooling chamber ventilation duct is connected to the cooling exhaust treatment chamber, and the constant temperature furnace ventilation duct is provided with one or more connections to the constant pressure exhaust treatment chamber. Specifically, the preheating chamber ventilation duct, the cooling chamber ventilation duct, and the constant temperature furnace ventilation duct are respectively connected to the outside air, so that the gas inside the equipment can be discharged through these three ventilation ducts. Specifically, the exhaust insulation layer is provided with the constant pressure treatment chamber, the preheating exhaust treatment chamber, and the cooling exhaust treatment chamber, and each treatment chamber is independent of each other in position, structure, temperature, and air pressure protection.

[0015] In one embodiment, the exhaust PLC master controller is electrically connected to the high-temperature airflow control valve, the cooling chamber airtight valve, the constant-pressure low-pressure airtight valve, the heating chamber airtight valve, the cooling chamber airflow detection controller, the constant-pressure low-pressure airflow detection controller, and the heating chamber airflow detection controller, and the exhaust PLC master controller cooperates with the external industrial control host for unified operation, and at the same time, the air pressure control, airflow constraint and other mechanism cooperation of the exhaust mechanism can be effectively and uniformly managed. Specifically, the preheating exhaust treatment chamber is connected to the front preheating chamber through the gas pipeline, the heating chamber airflow detection controller and the heating chamber airtight valve, so that the front preheating chamber can communicate with the outside world; the constant-pressure exhaust treatment chamber is connected to the constant-temperature low-pressure vacuum furnace through the gas pipeline, the constant-pressure low-pressure airflow detection controller and the constant-pressure low-pressure airtight valve, so that the constant-temperature low-pressure vacuum furnace can communicate with the outside world; the cooling exhaust treatment chamber is connected to the rear cooling treatment chamber through the gas pipeline, the cooling chamber airflow detection controller and the cooling chamber airtight valve, so that the cooling exhaust treatment chamber can communicate with the outside world.

[0016] In one embodiment, the heating mechanism includes the constant temperature and constant pressure heating source, the heating source for increasing temperature, the cooling source for decreasing temperature, and the transmission component. Specifically, the heating source for increasing temperature is vertically distributed along both sides of the front preheating chamber, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the loading and transporting line; the constant temperature and constant pressure heating source is vertically distributed along both sides of the constant temperature and low pressure vacuum furnace, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the high temperature transporting line; the cooling source for decreasing temperature is vertically distributed along both sides of the rear cooling treatment chamber, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the unloading and transporting line. Specifically, the constant temperature and constant pressure heating source, the heating source for increasing temperature, and the cooling source for decreasing temperature each have a transmission component for signal transmission, mechanical structure connection, and electrical connection.

[0017] Compared with the prior art, the utility model has the following beneficial technical effects:

[0018] The utility model discloses a solar cell silicon wafer vacuum drying equipment, which is arranged in series with multiple heating chambers, which are respectively a front preheating chamber, a constant temperature low pressure vacuum furnace, and a rear cooling treatment chamber. The sample battery is placed in the automated transportation line through other automated accessories, and is sequentially sent to each box through the loading and unloading mechanism, so that the sample battery can complete each stage of the baking process in each box in sequence. A solar cell silicon wafer vacuum drying equipment of the above embodiment of the utility model can realize the continuous and simultaneous processing of multiple sample batteries, thereby significantly improving the processing efficiency. In addition, each box maintains a fixed baking condition according to the function of the corresponding stage, and can cooperate with the temperature rise and fall, the pressure rise and fall operation, and perform multi-sample battery drying treatment, which can significantly improve the baking efficiency and equipment safety and stability. Through the parallel arrangement of multiple rows, the chambers are heated row by row in the vertical direction, and the temperature difference in the vertical direction is greatly reduced by the up and down circulation of hot and cold air, and the temperature difference in the vertical direction of the sample battery in the constant temperature low pressure vacuum furnace is reduced as much as possible, the yield rate of large-scale solar cell production is improved, and it is ensured that the sample battery will not be differentiated from the same batch of samples due to uneven temperature distribution. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0020] Figure 1 The utility model is a schematic cross-sectional analysis diagram of a solar cell silicon wafer vacuum drying device provided in an embodiment of the utility model.

[0021] Figure 2 It is a structural relationship diagram of a solar cell silicon wafer vacuum drying device provided by an embodiment of the utility model.

[0022] 100, heating chamber; 101, front preheating chamber; 102, constant temperature low pressure vacuum furnace; 103, rear cooling treatment chamber;

[0023] 200, gas supply mechanism; 201, gas supply main tank; 202, gas storage box; 203, air intake transition box; 204, gas control electromagnetic device; 205, gas supply PLC master controller; 206, non-constant pressure air flow controller; 207, constant pressure air flow controller; 208, non-constant pressure air flow electromagnetic valve; 209, constant pressure air flow electromagnetic valve;

[0024] 300, automation mechanism; 3011, loading and transport line extension line; 301, loading and transport line; 302, high temperature transport line; 303, unloading and transport line; 3031, unloading and transport extension line;

[0025] 400, exhaust mechanism; 401, preheating chamber ventilation pipe; 402, high-temperature airflow control valve; 403, cooling chamber ventilation pipe; 404, constant temperature furnace ventilation pipe; 405, constant pressure exhaust treatment chamber; 406, exhaust PLC master controller; 407, cooling chamber airtight valve; 408, constant pressure low pressure airtight valve 409, exhaust insulation layer; 410, heating chamber airtight valve; 411, cooling chamber airflow detection controller; 412, constant pressure low pressure airflow detection controller; 413, heating chamber airflow detection controller; 414, preheating exhaust treatment chamber; 415, cooling exhaust treatment chamber;

[0026] 500, sealing mechanism; 501, feed sealing valve 1; 502, discharge sealing valve 1; 503, feed sealing valve 2; 504, discharge sealing valve 2; 505, feed sealing valve 3; 506, discharge sealing valve 3;

[0027] 600, heating mechanism; 601, constant temperature and constant pressure heating source; 602, heating source for heating; 603, cooling source for cooling; 604, transmission component; DETAILED DESCRIPTION

[0028] The present invention is further described below in conjunction with the embodiments and drawings, but this is not intended to limit the scope of protection of the claims of this application. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0029] In the description of the present invention, unless otherwise specified, "multiple" means two or more; the terms "center", "longitudinal", "lateral", "up", "down", "left", "right", "inside", "outside", "front end", "rear end", "head", "tail", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0030] According to one aspect of the present invention, see Figures 1-2The utility model proposes a solar cell silicon wafer vacuum drying device, comprising a plurality of heating cavities 100, an air supply mechanism 200, an automation mechanism 300, and an exhaust mechanism 400. Each heating cavity of the plurality of heating cavities 100 includes a heating mechanism 600. The air supply mechanism 200 and the exhaust mechanism 400 are respectively fixedly connected to the two ends of the plurality of heating cavities 100. The automation mechanism 300 runs through the plurality of heating cavities 100 and is located below each of the heating mechanisms 600. Each cavity of the heating cavity 100 is connected by a sealing mechanism 500.

[0031] Specifically, the multiple heating chambers 100 include a front preheating chamber 101, a constant temperature low pressure vacuum furnace 102, and a post cooling treatment chamber 103 which are connected in sequence. A heating mechanism 600 is arranged inside the heating chambers of the front preheating chamber 101, the constant temperature low pressure vacuum furnace 102, and the post cooling treatment chamber 103. The automation mechanism 300 sequentially penetrates the front preheating chamber 101, the constant temperature low pressure vacuum furnace 102, and the post cooling treatment chamber 103, and is located below each of the heating mechanisms 600. An airtight valve is also arranged at the connection between the front preheating chamber 101, the constant temperature low pressure vacuum furnace 102, and the post cooling treatment chamber 103, which is used for sealing and isolating the heating chambers to ensure that each heating chamber can maintain its own temperature and pressure conditions.

[0032] According to the specific embodiment of the present experimental novelty, firstly, the preheating chamber 101 is used to preheat and vacuum transition the sample battery, the constant temperature low pressure vacuum furnace 102 is used to maintain a constant low pressure and high temperature heating state for a long time for the sample battery, and the post-cooling treatment chamber 103 cools down and increases the pressure of the sample battery that has been heated in the constant temperature low pressure vacuum furnace 102, and completes the post-processing of the sample battery.

[0033] According to a specific embodiment of the present invention, two adjacent cavities of the plurality of heating cavities 100 are connected by a sealing mechanism 500, and the sealing mechanism 500 can control the connection or isolation between two adjacent cavities of the plurality of heating cavities 100 by opening and closing. Figure 1As shown, the sealing mechanism 500 is composed of the feed sealing gate valve 1 501, the discharge sealing gate valve 1 502, the feed sealing gate valve 2 503, the discharge sealing gate valve 2 504, the feed sealing gate valve 3 505, and the discharge sealing gate valve 3 506. The feed sealing gate valve 1 501 is arranged at the feed end of the front preheating chamber 101, and the discharge sealing gate valve 3 506 is arranged at the discharge end of the rear cooling treatment chamber 103; the discharge sealing gate valve 1 502 and the feed sealing gate valve 2 503 are connected between the front preheating chamber 101 and the constant temperature low pressure vacuum furnace 102, and the discharge sealing gate valve 2 504 and the feed sealing gate valve 3 505 are connected between the constant temperature low pressure vacuum furnace 102 and the rear cooling treatment chamber 103. Specifically, the sealing gate valves that cooperate with each other can be better sealed by installing a vacuum pressure gauge. The feed sealing valve 1 501, the discharge sealing valve 1 502, the feed sealing valve 2 503, the discharge sealing valve 2 504, the feed sealing valve 3 505 and the discharge sealing valve 3 506 can be automatic plug-in valves or upper and lower plug-in valves, and need to have corresponding sealing silicone and sealing layers to facilitate opening and closing. When the valves are closed, the front preheating chamber 101, the constant temperature low-pressure vacuum furnace 102 and the rear cooling treatment chamber 103 are all independently sealed.

[0034] According to the specific embodiment of the present experimental novelty, the feed sealing gate valve 2 503 and the discharge sealing gate valve 2 504 on both sides of the constant temperature low pressure vacuum furnace 102 are high vacuum sealing gate valves with higher air tightness. Since the high vacuum sealing gate valves have higher air tightness, they can more effectively help maintain the low pressure vacuum environment of the constant temperature low pressure vacuum furnace 102 for a long time.

[0035] The gas supply mechanism 200 includes the gas supply main tank 201, a gas storage box 202, an air intake transition box 203, a gas control electromagnetic device 204, a gas supply PLC master controller 205, a non-constant pressure airflow controller 206, a constant pressure airflow controller 207, a non-constant pressure airflow electromagnetic valve 208, and a constant pressure airflow electromagnetic valve 209;

[0036] According to a specific embodiment of the present experimental novel type, a gas storage box 202, an air intake transition box 203, and a gas control electromagnetic device 204 are arranged inside the gas supply main tank 201. Specifically, the gas storage box 202 is respectively connected to multiple gas control electromagnetic devices 204 through multiple gas pipelines, and is finally connected to multiple heating chambers 100. Specifically, the gas storage box 202 is connected to the air intake transition box 203, and the air intake transition box 203 is connected to the outside of the equipment, so that gas can be absorbed from the outside, enter the gas storage box 202, and then distributed to each gas control electromagnetic device 204 in turn. Specifically, the air intake transition box 203 can be equipped with an external gas pump, a compressed air pump, an inert gas tank, an industrial gas production system, etc. The specific external device is not restricted here, and gas is supplied to the air intake transition box 203 so as to ensure a stable supply of gas inside the equipment. Specifically, the above examples are only single examples. The gas supply main tank 201, gas storage box 202, air intake transition box 203, and gas control electromagnetic device 204 have different calibers, materials, and connection structure standards due to the differences in gas temperature, composition, moisture, cleanliness, and processing methods when processing different samples. They are flexibly arranged according to actual needs, and the specific content is not limited here.

[0037] According to the specific embodiment of the new experimental model, the gas supply mechanism 200 also includes the gas supply PLC master controller 205, the non-constant pressure airflow controller 206, the constant pressure airflow controller 207, the non-constant pressure airflow solenoid valve 208, and the constant pressure airflow solenoid valve 209. Specifically, the gas supply PLC master controller 205 is electrically connected with the non-constant pressure airflow controller 206, the constant pressure airflow controller 207, the non-constant pressure airflow solenoid valve 208, and the constant pressure airflow solenoid valve 209. The gas supply PLC master controller 205 cooperates with the external industrial control host to perform unified operations, and at the same time, the air pressure control, airflow constraint and other mechanism cooperation of the gas supply mechanism 200 can be effectively and uniformly managed. Specifically, the gas supply main tank 201 is connected to the non-constant pressure airflow controller 206 and the constant pressure airflow controller 207 through the gas pipeline, and the non-constant pressure airflow controller 206 is provided with multiple controls for the front preheating chamber 101 and the rear cooling treatment chamber 103, respectively. The constant pressure airflow controller 207 is connected to the constant temperature low pressure vacuum furnace 102 through the gas pipeline.

[0038] According to a specific embodiment of the present experimental novelty, the multiple heating chambers 100 are connected through the automation mechanism 300, and the automation mechanism 300 includes a loading transport line extension line 3011, a loading transport line 301, a high-temperature transport line 302, a unloading transport line 303, and a unloading transport extension line 3031 which are connected in sequence; the loading transport line extension line 3011 is located outside the feeding end of the front preheating chamber 101, the loading transport line 301 is located inside the front preheating chamber 101, the high-temperature transport line 302 is located inside the constant temperature low-pressure vacuum furnace 102, the unloading transport line 303 is located inside the rear cooling treatment chamber 103, and the unloading transport extension line 3031 is located outside the discharge end of the rear cooling treatment chamber 103.

[0039] Specifically, the vacuum drying equipment can also be equipped with a variety of external sample transporters, such as high-temperature flower baskets, high-temperature transport plates, single-piece transport baskets, etc., which are not limited here. The sample transporter can be mechanically coordinated with the extension line 3011 of the loading transport line to achieve the purpose of loading, and the sample transporter can also be mechanically coordinated with the extension line 3031 of the unloading transport line to achieve the purpose of unloading. Specifically, after the extension line 3011 of the loading transport line receives the sample transporter, its conveyor belt will have an additional positioning mechanism to adjust the position offset, and the air supply PLC controller 205 can be controlled by an external industrial control host, and cooperate to determine whether the sample transporter can enter the front preheating chamber 101. At the same time, a manual operation button is set, and the sample transporter can also be manually placed on the extension line 3011 of the loading transport line. After confirming that it is placed, press the button, and the industrial control host controls and cooperates with the judgment; unloading is also the same, and the mechanical structure can be coordinated through the automatic judgment of the industrial control host, or the sample transporter can be manually operated to confirm that the extension line 3031 of the unloading transport line cooperates with unloading.

[0040] The exhaust mechanism 400 includes the preheating chamber ventilation pipe 401, the high-temperature airflow control valve 402, the cooling chamber ventilation pipe 403, the constant temperature furnace ventilation pipe 404, the constant pressure exhaust processing chamber 405, the exhaust PLC master controller 406, the cooling chamber airtight valve 407, the constant pressure low pressure airtight valve 408, the exhaust heat insulation layer 409, the heating chamber airtight valve 410, the cooling chamber airflow detection controller 411, the constant pressure low pressure airflow detection controller 412, the heating chamber airflow detection controller 413, the preheating exhaust processing chamber 414, and the cooling exhaust processing chamber 415;

[0041] Specifically, the preheating chamber ventilation pipe 401, the cooling chamber ventilation pipe 403, and the constant temperature furnace ventilation pipe 404 are all provided with a high-temperature airflow control valve 402 that can be uniformly controlled or separately controlled. Specifically, the preheating chamber ventilation pipe 401 is connected to the preheating exhaust treatment chamber 414, the cooling chamber ventilation pipe 403 is connected to the cooling exhaust treatment chamber 415, and the constant temperature furnace ventilation pipe 404 is provided with one or more connections to the constant pressure exhaust treatment chamber 405. Specifically, the preheating chamber ventilation pipe 401, the cooling chamber ventilation pipe 403, and the constant temperature furnace ventilation pipe 404 are respectively connected to the outside air, so that the gas inside the equipment can be discharged through these three ventilation pipes. Specifically, the exhaust insulation layer 409 is provided with the constant pressure treatment chamber 405, the preheating exhaust treatment chamber 414, and the cooling exhaust treatment chamber 415, and each treatment chamber is independent of each other in position, structure, temperature and air pressure protection. Specifically, the above examples are only single examples. The preheating chamber ventilation duct 401, the cooling chamber ventilation duct 403, and the constant temperature furnace ventilation duct 404 have different calibers, materials, and connection structure standards due to the different temperatures, components, moisture, cleanliness, and treatment methods of the gases in the treatment of different samples. They are flexibly arranged according to actual needs, and the specific content is not limited here.

[0042] According to the specific embodiment of the present experimental novel type, the exhaust PLC master controller 406 is electrically connected to the high-temperature airflow control valve 402, the cooling chamber airtight valve 407, the constant-pressure low-pressure airtight valve 408, the heating chamber airtight valve 410, the cooling chamber airflow detection controller 411, the constant-pressure low-pressure airflow detection controller 412, and the heating chamber airflow detection controller 413. The exhaust PLC master controller 406 is coordinated with the external industrial control host to perform unified operations, and at the same time, the air pressure control, airflow constraint and other mechanism cooperation of the exhaust mechanism 400 can be effectively and uniformly managed. Specifically, the preheating exhaust treatment chamber 414 is connected to the front preheating chamber 101 through the gas pipeline, the heating chamber airflow detection controller 413 and the heating chamber airtight valve 410, so that the front preheating chamber 101 can communicate with the outside world; the constant pressure exhaust treatment chamber 405 is connected to the constant temperature and low pressure vacuum furnace 102 through the gas pipeline, the constant pressure and low pressure airflow detection controller 412 and the constant pressure and low pressure airtight valve 408, so that the constant temperature and low pressure vacuum furnace 102 can communicate with the outside world; the cooling exhaust treatment chamber 415 is connected to the rear cooling treatment chamber 103 through the gas pipeline, the cooling chamber airflow detection controller 411 and the cooling chamber airtight valve 407, so that the cooling exhaust treatment chamber 415 can communicate with the outside world.

[0043] According to the specific embodiment of the present experimental novel, the heating mechanism includes the constant temperature and constant pressure heating source 601, the heating source 602, the cooling source 603, and the transmission component 604. Specifically, the heating source 602 is vertically distributed along both sides of the front preheating chamber 101, and is composed of multiple heating source units superimposed along the vertical direction above the loading transportation line 301; the constant temperature and constant pressure heating source 601 is vertically distributed along both sides of the constant temperature low pressure vacuum furnace 102, and is composed of multiple heating source units superimposed along the vertical direction above the high temperature transportation line 302; the cooling source 603 is vertically distributed along both sides of the rear cooling treatment chamber 103, and is composed of multiple heating source units superimposed along the vertical direction above the unloading transportation line 303. Specifically, the constant temperature and constant pressure heating source 601, the heating source 602, and the cooling source 603 each have a transmission component 604 for signal transmission, mechanical structure connection, and electrical connection. Specifically, the three combined heating mechanisms of the constant temperature and constant pressure heating source 601, the heating source 602, the cooling source 603, and the transmission component 604 can be operated in a unified manner by coordinating with the external industrial control host through signal transmission. Specifically, the constant temperature and low pressure vacuum furnace 102 is maintained at a high temperature and constant temperature by the constant temperature and constant pressure heating source 601 and its independent transmission component 604. Since a small amount of gas exchange will occur when maintaining normal air pressure, the high and low temperature difference in the furnace will be different. The upper and lower multi-layer heating sources are independently adjusted in temperature by the external industrial control host, which can ensure that the original temperature will not be overheated, and ensure that the constant temperature and low pressure vacuum furnace maintains the temperature in the furnace under the condition of a small temperature difference. Specifically, the front preheating chamber 101 is rapidly heated by the heating source 602 and its independent transmission component 604. Due to the airflow exchange with the outside world, the temperature in the furnace will drop significantly. The upper and lower multi-layer heating sources are independently adjusted by the external industrial control host. At the same time, the transitional heating can be performed in the longitudinal direction of the furnace door so that the space close to the outside world is heated faster and the space close to the constant temperature and constant pressure vacuum furnace is heated more slowly. The front preheating chamber ensures rapid preheating under the condition of a small temperature difference. Specifically, the rear cooling treatment chamber 103 is rapidly cooled by the cooling cooling source 603 and its independent transmission component 604. Due to the airflow exchange with the outside world, the temperature in the furnace will drop significantly. The upper and lower multi-layer heating sources are independently adjusted by the external industrial control host. At the same time, the transitional heating can be performed in the longitudinal direction of the furnace door so that the space close to the outside world is cooled faster and the space close to the constant temperature and constant pressure vacuum furnace is cooled more slowly. The rear cooling treatment chamber 103 ensures rapid cooling under the condition of a small temperature difference.

[0044] The solar cell silicon wafer vacuum drying equipment provided by the utility model embodiment is provided with a plurality of heating chambers connected in series, which are a front preheating chamber, a constant temperature low-pressure vacuum furnace, and a rear cooling treatment chamber in sequence. The sample battery is transmitted in the plurality of heating chambers by an automated mechanism, and is sequentially sent to each chamber by a loading and unloading mechanism, so that the sample battery can sequentially complete each stage of the baking process in each chamber. The solar cell silicon wafer vacuum drying equipment provided by the utility model can realize the continuous and simultaneous processing of a plurality of sample batteries, thereby significantly improving the processing efficiency. In addition, each cavity maintains fixed baking conditions according to the function of the corresponding stage, and can cooperate in temperature and pressure increase and decrease operations, and perform multi-sample battery drying treatment, which can significantly improve baking efficiency and equipment safety and stability. The heating module and the transmission module are arranged in parallel in multiple rows along the parallel direction of the box. The multiple rows are arranged in parallel to heat the cavity row by row in the vertical direction. The temperature difference in the vertical direction is greatly reduced by the up and down circulation of hot and cold air, and the temperature difference of the sample battery in the constant temperature and low-pressure vacuum furnace is reduced as much as possible in the vertical direction, thereby improving the yield rate of large-scale solar cell production and ensuring that the sample batteries will not be differentiated from the same batch of samples due to uneven temperature distribution.

Claims

1. A solar cell silicon wafer vacuum drying equipment, characterized in that: It includes multiple heating chambers, an air supply mechanism, an automation mechanism, and an exhaust mechanism. Each heating chamber of the multiple heating chambers includes a heating mechanism. The air supply mechanism and the exhaust mechanism are respectively fixedly connected to the two ends of the multiple heating chambers. The automation mechanism runs through the multiple heating chambers and is located under each of the heating mechanisms. Each chamber of the heating chamber is connected by a sealing mechanism.

2. The solar cell silicon wafer vacuum drying equipment according to claim 1, characterized in that: The multiple heating chambers include a front preheating chamber, a constant temperature low pressure vacuum furnace, and a rear cooling treatment chamber which are connected in sequence, and heating mechanisms are arranged inside the heating chambers of the front preheating chamber, the constant temperature low pressure vacuum furnace, and the rear cooling treatment chamber; the automation mechanism passes through the front preheating chamber, the constant temperature low pressure vacuum furnace, and the rear cooling treatment chamber in sequence, and is located below each of the heating mechanisms.

3. The solar cell silicon wafer vacuum drying equipment according to claim 2, characterized in that: Two adjacent cavities of the plurality of heating cavities are connected via a sealing mechanism, and the sealing mechanism controls the connection or isolation between two adjacent cavities of the plurality of heating cavities by opening and closing.

4. The solar cell silicon wafer vacuum drying equipment according to claim 3, characterized in that: The sealing mechanism consists of a feed sealing valve 1, a discharge sealing valve 1, a feed sealing valve 2, a discharge sealing valve 2, a feed sealing valve 3 and a discharge sealing valve 3; the feed sealing valve 1 is arranged at the feed end of the front preheating chamber, and the discharge sealing valve 3 is arranged at the discharge end of the rear cooling treatment chamber; the discharge sealing valve 1 is connected to the feed sealing valve 2 between the front preheating chamber and the constant temperature low pressure vacuum furnace, and the discharge sealing valve 2 is connected to the feed sealing valve 3 between the constant temperature low pressure vacuum furnace and the rear cooling treatment chamber.

5. The solar cell silicon wafer vacuum drying equipment according to claim 2, characterized in that: The gas supply mechanism includes a gas supply main tank, a gas storage box, an air intake transition box, a gas control electromagnetic device, a gas supply PLC master controller, a non-constant pressure airflow controller, a constant pressure airflow controller, a non-constant pressure airflow electromagnetic valve, and a constant pressure airflow electromagnetic valve.

6. The solar cell silicon wafer vacuum drying equipment according to claim 5, characterized in that: The gas storage box, the air intake transition box, and the gas control electromagnetic device are arranged inside the gas supply main tank; the gas storage box is respectively connected to multiple gas control electromagnetic devices through multiple gas pipelines, and is finally connected to multiple heating cavities.

7. The solar cell silicon wafer vacuum drying equipment according to claim 6, characterized in that: The air supply PLC master controller is electrically connected to the non-constant pressure airflow controller, the constant pressure airflow controller, the non-constant pressure airflow solenoid valve, and the constant pressure airflow solenoid valve; the air supply main tank is connected to the non-constant pressure airflow controller and the constant pressure airflow controller through gas pipelines, respectively. The non-constant pressure airflow controller is provided with multiple controls for the front preheating chamber and the rear cooling treatment chamber, respectively. The constant pressure airflow controller is connected to the constant temperature low-pressure vacuum furnace through a gas pipeline.

8. The solar cell silicon wafer vacuum drying equipment according to claim 2, characterized in that: The automated mechanism includes a loading transport line extension line, a loading transport line, a high-temperature transport line, a unloading transport line, and a unloading transport extension line connected in sequence; the loading transport line extension line is located outside the feeding end of the front preheating chamber, the loading transport line is located inside the front preheating chamber, the high-temperature transport line is located inside the constant temperature low-pressure vacuum furnace, the unloading transport line is located inside the rear cooling treatment chamber, and the unloading transport extension line is located outside the discharging end of the rear cooling treatment chamber.

9. The solar cell silicon wafer vacuum drying equipment according to claim 2, characterized in that: The exhaust mechanism includes a preheating chamber ventilation pipe, a high-temperature airflow control valve, a cooling chamber ventilation pipe, a constant temperature furnace ventilation pipe, a constant pressure exhaust processing chamber, an exhaust PLC master controller, a cooling chamber airtight valve, a constant pressure low-pressure airtight valve, an exhaust insulation layer, a heating chamber airtight valve, a cooling chamber airflow detection controller, a constant pressure low-pressure airflow detection controller, a heating chamber airflow detection controller, a preheating exhaust processing chamber, and a cooling exhaust processing chamber.

10. The solar cell silicon wafer vacuum drying equipment according to claim 9, characterized in that: The preheating chamber ventilation pipe is connected to the preheating exhaust treatment chamber, the cooling chamber ventilation pipe is connected to the cooling exhaust treatment chamber, and one or more constant temperature furnace ventilation pipes are connected to the constant pressure exhaust treatment chamber; the exhaust PLC master controller is electrically connected to the high temperature airflow control valve, the cooling chamber airtight valve, the constant pressure low pressure airtight valve, the heating chamber airtight valve, the cooling chamber airflow detection controller, the constant pressure low pressure airflow detection controller, and the heating chamber airflow detection controller, and unified operation is performed through the exhaust PLC master controller in coordination with the external industrial control host; the preheating exhaust treatment chamber is connected to the front preheating chamber through the gas pipeline, the heating chamber airflow detection controller and the heating chamber airtight valve, the constant pressure exhaust treatment chamber is connected to the constant temperature low pressure vacuum furnace through the gas pipeline, the constant pressure low pressure airflow detection controller and the constant pressure low pressure airtight valve, and the cooling exhaust treatment chamber is connected to the rear cooling treatment chamber through the gas pipeline, the cooling chamber airflow detection controller and the cooling chamber airtight valve.

11. The solar cell silicon wafer vacuum drying equipment according to claim 2, characterized in that: The heating mechanism includes the constant temperature and constant pressure heating source, the heating source for heating up, the cooling source for cooling down, and the transmission component; the heating source for heating up is vertically distributed along both sides of the front preheating chamber, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the loading and transporting line; the constant temperature and constant pressure heating source is vertically distributed along both sides of the constant temperature and low pressure vacuum furnace, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the high temperature transporting line; the cooling source for cooling down is vertically distributed along both sides of the rear cooling treatment chamber, and is composed of a plurality of heating source units superimposed in a direction vertical to the top of the unloading and transporting line.

12. The solar cell silicon wafer vacuum drying equipment according to claim 11, characterized in that: The constant temperature and constant pressure heating source, the temperature increasing heating source, and the temperature decreasing cooling source each have a transmission component for signal transmission, mechanical structure connection, and electrical connection.

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