Semiconductor cleaning tank

Abstract

The semiconductor cleaning tank comprises a tank body and a motor, the motor is fixedly installed on the upper surface of the tank body, a positioning frame is fixedly connected to the inner wall of the upper end of the tank body, a transmission rod is fixedly connected to the lower end of an output shaft of the motor, and a driving rod is movably connected to the inner wall of the side of the positioning frame. A disc is fixedly arranged at the lower end of the driving rod, a driving wheel is installed at the edge of the lower surface of the disc, a grid groove is movably connected to the inner wall of the grid frame, rolling wheels are installed at the four corners of the lower surface of the grid frame correspondingly, and a supporting plate is fixedly connected to the inner wall of a groove body on the sides of the rolling wheels; a positioning arm is fixedly arranged on the inner wall of the bottom of the tank body, a stirring rod is movably connected to the inner wall of the positioning arm, and an auxiliary bevel gear is fixedly installed at the end of the stirring rod. According to the semiconductor cleaning tank, the cleaning capacity is enhanced, so that impurities are prevented from remaining on the surface of a semiconductor to affect subsequent processing.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor cleaning, in particular to a semiconductor cleaning tank. Background Art

[0002] Semiconductor is one of the indispensable materials in the modern electronics industry. Because of its special conductive properties, semiconductor materials are mainly used to make integrated circuits, semiconductor devices and other components. With the continuous development of science and technology, the importance of semiconductors is still increasing. The semiconductor cleaning tank refers to the equipment for cleaning semiconductors. Its function is to clean the surface of the semiconductor, so as to facilitate the subsequent processing of the semiconductor.

[0003] However, the existing semiconductor cleaning tank has the following problems when used:

[0004] Since the semiconductor is placed in a water flow and the impurities on the surface of the semiconductor are removed by the water flow for cleaning, it is easy for the impurities on the surface of the semiconductor to be insufficiently cleaned. Therefore, in order to improve the cleaning effect, it is necessary to strengthen the cleaning capacity of the device. However, the cleaning capacity of the existing semiconductor cleaning tank is insufficient, which can easily cause impurities to remain on the surface of the semiconductor and affect its subsequent processing.

[0005] In view of the above problems, it is urgent to carry out innovative design based on the original semiconductor cleaning tank. Utility Model Content

[0006] The utility model aims to provide a semiconductor cleaning tank to solve the problem that the cleaning capacity of the existing semiconductor cleaning tank is insufficient, which easily leads to impurities remaining on the surface of the semiconductor and affects its subsequent processing.

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a semiconductor cleaning tank, comprising a tank body and a motor, the upper surface of the tank body is fixedly installed with a motor, and the upper inner wall of the tank body is fixedly connected with a positioning frame, and the lower end of the motor output shaft is fixedly connected with a transmission rod, and the outer wall in the middle of the transmission rod is fixedly installed with a main gear, and the lower end of the transmission rod is fixedly provided with a main bevel gear, the inner wall on the side of the positioning frame is movably connected with a driving rod, and a disc is fixedly provided at the lower end of the driving rod, and a driving wheel is installed at the edge of the lower surface of the disc, and a driving mechanism is provided on the outer wall of the driving wheel, and a grid frame is installed at the end of the driving mechanism, the inner wall of the grid frame is movably connected with a grid groove, and rollers are respectively installed at the four corners of the lower surface of the grid frame, and a support plate is fixedly connected to the inner wall of the tank body on the side of the roller, a positioning arm is fixedly provided on the bottom inner wall of the tank body, and a stirring rod is movably connected to the inner wall of the positioning arm, and a secondary bevel gear is fixedly installed at the end of the stirring rod.

[0008] Preferably, the transmission rod and the driving rod are both rotationally connected to the positioning frame, and the driving rod and the slot body are rotationally arranged, the outer wall of the driving rod on the side of the main gear is fixedly connected with a toothed disc, and the toothed disc and the main gear are meshed, and the diameter of the toothed disc is larger than the diameter of the main gear.

[0009] Preferably, the driving mechanism comprises a driving frame and a driving plate, and the driving frame is movably mounted on the outer wall of the driving wheel, and the side outer wall of the driving frame is fixedly connected with the driving plate.

[0010] Preferably, the driving frame and the driving wheel are fitted together, the driving plate and the grid frame are fixedly connected, the grid frame and the grid groove form a sliding structure, and the driving plate and the positioning arm are slidably arranged.

[0011] Preferably, the roller and the support plate are closely connected, and the support plate is symmetrically distributed about the longitudinal center axis of the trough body.

[0012] Preferably, the stirring rod is rotatably connected to the trough body and the positioning arm respectively, and the main bevel gear and the auxiliary bevel gear are meshed.

[0013] Compared with the prior art, the beneficial effects of the utility model are: the semiconductor cleaning tank enhances the cleaning ability, thereby preventing impurities from remaining on the surface of the semiconductor and affecting its subsequent processing;

[0014] The transmission rod is driven by the motor, so that the main gear drives the toothed disc, and then the toothed disc drives the driving rod, so that the disc drives the driving mechanism, so that the grid slot drives the semiconductor placed therein to move back and forth. At the same time, as the transmission rod rotates, the main bevel gear drives the secondary bevel gear to rotate the stirring rod, so that the stirring rod drives the cleaning liquid inside the slot to flow fully, and then the semiconductor moves back and forth in the fully flowing cleaning liquid, which makes it easier for the cleaning liquid to fully flush the surface of the semiconductor. Therefore, the device enhances the cleaning ability and prevents impurities from remaining on the surface of the semiconductor and affecting its subsequent processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic diagram of the front section structure of the utility model;

[0016] Figure 2 This is a schematic diagram of the side section structure of the support plate of the utility model;

[0017] Figure 3 This is a schematic diagram of the partial structure of the disk of the utility model when viewed from above;

[0018] Figure 4 It is a side view structural diagram of the positioning arm of the utility model.

[0019] In the figure: 1, tank body; 2, motor; 3, positioning frame; 4, transmission rod; 5, main gear; 6, main bevel gear; 7, driving rod; 8, toothed disc; 9, disc; 10, driving wheel; 11, driving mechanism; 1101, driving frame; 1102, driving plate; 12, grid frame; 13, grid slot; 14, roller; 15, support plate; 16, positioning arm; 17, stirring rod; 18, auxiliary bevel gear. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0021] See also Figure 1-4 The utility model provides a technical solution: a semiconductor cleaning tank, including a tank body 1, a motor 2, a positioning frame 3, a transmission rod 4, a main gear 5, a main bevel gear 6, a driving rod 7, a toothed disc 8, a disc 9, a driving wheel 10, a driving mechanism 11, a driving frame 1101, a driving plate 1102, a grid frame 12, a grid slot 13, a roller 14, a support plate 15, a positioning arm 16, a stirring rod 17 and a secondary bevel gear 18, the upper surface of the tank body 1 is fixedly installed with the motor 2, and the positioning frame 3 is fixedly connected to the inner wall of the upper end of the tank body 1, and the lower end of the output shaft of the motor 2 is fixedly connected with the transmission rod 4, and the main gear 5 is fixedly installed on the outer wall of the middle of the transmission rod 4, and the lower end of the transmission rod 4 is fixedly provided with There is a main bevel gear 6, a driving rod 7 is movably connected to the inner wall of the side of the positioning frame 3, and a disc 9 is fixedly provided at the lower end of the driving rod 7, and a driving wheel 10 is installed at the edge of the lower surface of the disc 9, and a driving mechanism 11 is provided on the outer wall of the driving wheel 10, and a grid frame 12 is installed at the end of the driving mechanism 11, and a grid groove 13 is movably connected to the inner wall of the grid frame 12, and rollers 14 are respectively installed at the four corners of the lower surface of the grid frame 12, and a support plate 15 is fixedly connected to the inner wall of the groove body 1 on the side of the roller 14, a positioning arm 16 is fixedly provided on the inner wall of the bottom of the groove body 1, and a stirring rod 17 is movably connected to the inner wall of the positioning arm 16, and a secondary bevel gear 18 is fixedly installed at the end of the stirring rod 17.

[0022] The transmission rod 4 and the driving rod 7 are both rotationally connected to the positioning frame 3, and the driving rod 7 and the slot body 1 are rotatably arranged. The outer wall of the driving rod 7 on the side of the main gear 5 is fixedly connected with a toothed disc 8, and the toothed disc 8 and the main gear 5 are meshed, and the diameter of the toothed disc 8 is larger than the diameter of the main gear 5, so that the motor 2 drives the transmission rod 4 to rotate, and the main gear 5 drives the toothed disc 8, so that the transmission rod 4 and the driving rod 7 rotate at the same time, and because the diameter of the toothed disc 8 is larger than the diameter of the main gear 5, the rotation speed of the transmission rod 4 is greater than the rotation speed of the driving rod 7, thereby preventing the grid slot 13 from moving back and forth too fast.

[0023] The driving mechanism 11 includes a driving frame 1101 and a driving plate 1102, and the driving frame 1101 is movably mounted on the outer wall of the driving wheel 10, and the side outer wall of the driving frame 1101 is fixedly connected with the driving plate 1102, so that when the driving rod 7 rotates, the disc 9 drives the driving mechanism 11 to make the grid slot 13 move back and forth.

[0024] The driving frame 1101 and the driving wheel 10 are fitted together, the driving plate 1102 and the grid frame 12 are fixedly connected, and the grid frame 12 and the grid groove 13 form a sliding structure, and the driving plate 1102 and the positioning arm 16 are slidingly arranged, so that when the disc 9 drives the driving wheel 10 to rotate around the longitudinal center line of the disc 9, the driving wheel 10 drives the driving frame 1101 to move back and forth, so that the driving frame 1101 drives the driving plate 1102 to move relative to the positioning arm 16, and as the driving plate 1102 moves, the driving plate 1102 drives the grid groove 13 to move back and forth, and facilitates the sliding of the grid groove 13 relative to the grid frame 12 for disassembly and assembly.

[0025] The roller 14 and the support plate 15 are closely connected, and the support plate 15 is symmetrically distributed about the longitudinal center axis of the slot body 1, so that when the grid slot 13 moves back and forth, the grid slot 13 drives the roller 14 to roll relative to the support plate 15, thereby making the grid slot 13 move back and forth stably.

[0026] The stirring rod 17 is rotatably connected to the trough body 1 and the positioning arm 16 respectively, and the main bevel gear 6 and the secondary bevel gear 18 are meshed so that when the transmission rod 4 rotates, the transmission rod 4 drives the main bevel gear 6, so that the main bevel gear 6 drives the secondary bevel gear 18, and the secondary bevel gear 18 drives the stirring rod 17 to rotate, so that the stirring rod 17 stirs the cleaning liquid in the trough body 1, so that the cleaning liquid in the trough body 1 can flow fully.

[0027] Working principle: When using the semiconductor cleaning tank, first Figure 1-4As shown, the user pours the cleaning liquid into the tank body 1, and then the user puts the grid tank 13 containing the semiconductor into the grid frame 12, and then the user starts the motor 2, and then the motor 2 drives the transmission rod 4 to rotate, and then the transmission rod 4 drives the main gear 5 and the main bevel gear 6 to rotate at the same time, and then the main gear 5 drives the toothed disc 8 to rotate, at this time the transmission rod 4 and the driving rod 7 rotate relative to the positioning frame 3 at the same time, and then the toothed disc 8 drives the disc 9 to rotate, and then the disc 9 drives the driving wheel 10 to rotate around the longitudinal center line of the disc 9, and then the driving wheel 10 drives the driving frame 1101 to move back and forth, and then the driving frame 1101 drives the driving plate 1102 to move back and forth relative to the positioning arm 16, and then the driving plate 1102 drives the grid frame 12 to move back and forth, and as the grid frame 12 moves, the grid frame 12 drives the roller 14 to roll against the support plate 15, and then as Figure 1-2 and Figure 4 As shown, as the main bevel gear 6 rotates, the main bevel gear 6 drives the secondary bevel gear 18, and then the secondary bevel gear 18 drives the stirring rod 17 to rotate. At this time, the stirring rod 17 stirs the cleaning liquid to make the cleaning liquid flow fully, so that the grid groove 13 drives the semiconductor to move back and forth with the relatively fully flowing cleaning liquid, which makes it easier for the cleaning liquid to fully flush the impurities on the surface of the semiconductor. Therefore, the device enhances the cleaning ability and prevents impurities from remaining on the surface of the semiconductor and affecting its subsequent processing.

[0028] Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art may still modify the technical solutions described in the aforementioned embodiments, or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention.

Claims

1. A semiconductor cleaning tank, comprising a tank body (1) and a motor (2), characterized in that: The upper surface of the tank body (1) is fixedly mounted with a motor (2), and the inner wall of the upper end of the tank body (1) is fixedly connected with a positioning frame (3), and the lower end of the output shaft of the motor (2) is fixedly connected with a transmission rod (4), and the outer wall of the middle of the transmission rod (4) is fixedly mounted with a main gear (5), and the lower end of the transmission rod (4) is fixedly provided with a main bevel gear (6), and the inner wall of the side of the positioning frame (3) is movably connected with a driving rod (7), and the lower end of the driving rod (7) is fixedly provided with a disk (9), and a driving wheel (10) is installed at the edge of the lower surface of the disk (9), and the driving wheel The outer wall of the driving mechanism (10) is provided with a driving mechanism (11), and a grid frame (12) is installed at the end of the driving mechanism (11); the inner wall of the grid frame (12) is movably connected with a grid groove (13), and rollers (14) are respectively installed at the four corners of the lower surface of the grid frame (12), and the inner wall of the groove body (1) on the side of the roller (14) is fixedly connected with a support plate (15), the bottom inner wall of the groove body (1) is fixedly provided with a positioning arm (16), and the inner wall of the positioning arm (16) is movably connected with a stirring rod (17), and a secondary bevel gear (18) is fixedly installed at the end of the stirring rod (17).

2. A semiconductor cleaning tank according to claim 1, characterized in that: The transmission rod (4) and the driving rod (7) are both rotatably connected to the positioning frame (3), and the driving rod (7) and the slot body (1) are rotatably arranged. A toothed disc (8) is fixedly connected to the outer wall of the driving rod (7) on the side of the main gear (5), and the toothed disc (8) and the main gear (5) are meshed, and the diameter of the toothed disc (8) is greater than the diameter of the main gear (5).

3. A semiconductor cleaning tank according to claim 1, characterized in that: The driving mechanism (11) comprises a driving frame (1101) and a driving plate (1102), wherein the driving frame (1101) is movably mounted on the outer wall of the driving wheel (10), and the driving plate (1102) is fixedly connected to the side outer wall of the driving frame (1101).

4. A semiconductor cleaning tank according to claim 3, characterized in that: The driving frame (1101) and the driving wheel (10) are fitted together, the driving plate (1102) and the grid frame (12) are fixedly connected, the grid frame (12) and the grid groove (13) form a sliding structure, and the driving plate (1102) and the positioning arm (16) are slidably arranged.

5. A semiconductor cleaning tank according to claim 1, characterized in that: The roller (14) and the support plate (15) are fitted and connected, and the support plate (15) is symmetrically distributed about the longitudinal center axis of the trough body (1).

6. A semiconductor cleaning tank according to claim 1, characterized in that: The stirring rod (17) is rotatably connected to the tank body (1) and the positioning arm (16) respectively, and the main bevel gear (6) and the auxiliary bevel gear (18) are meshed.

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