Photosensitive material plate washing tank liquid recovery system

By designing the lighting material plate washing slot recovery system, the resin adsorption device and the acid solution regeneration technology are used to solve the problem of washing and waste in the existing system, and the recycling and cost savings of the washing slot solution.

CN222402592UActive Publication Date: 2025-01-28CHANGGE HUIDA PHOTOSENSITIVE MATERIAL
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Patent Information

Application Number
CN202421358685.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-14
Publication Date
2025-01-28
Estimated Expiration
2034-06-14

AI Technical Summary

Technical Problem

The existing photosensitive material board washing tank liquid renewal system has waste problems, and the washing tank liquid cannot be effectively recycled and reused, resulting in waste of resources and increased costs.

Method used

Design a kind of sensitive plate washing groove solution recovery system, including resin adsorption device, acid groove and aluminum plate oxidation groove, adsorb an aluminum ions through resin adsorption columns, use acid regeneration resin, and use regenerative washing through pipes to return to the flow pipes to be washed after the flow pipe. The groove is returned to the washing slot.

Benefits of technology

The recycling and utilization of the washing slot is realized, the waste of resources is reduced, the cost is reduced, and the washing effect is improved.

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Abstract

The utility model relates to the technical field of photosensitive material plate washing tank liquid recovery, in particular to a photosensitive material plate washing tank liquid recovery system, which comprises a photosensitive material plate washing tank and a resin adsorption device, the resin adsorption device is provided with an inlet and an outlet, the inlet and the outlet are respectively a second inlet and a second outlet, and the second inlet and the second outlet are communicated with the photosensitive material plate washing tank. A resin adsorption column with aluminum ions is arranged in the resin adsorption device, the photosensitive material plate washing tank is communicated with the second inlet through a drain pipe, and the second outlet is communicated with the photosensitive material plate washing tank through a return pipe. The photosensitive material plate washing tank liquid recovery system has the advantages that the washing tank liquid can be recycled, and the cost is saved.
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Description

Technical Field

[0001] The utility model relates to the technical field of photosensitive material plate washing tank liquid recovery, in particular to a photosensitive material plate washing tank liquid recovery system. Background Art

[0002] The washing tank for photosensitive material plates contains washing tank liquid. After long-term use, there are still a lot of aluminum ions in the washing tank liquid. The presence of aluminum ions will affect the washing effect of the photosensitive material plates. In the prior art, the washing tank for photosensitive material plates does not have a system for updating the washing tank liquid. The technical solution adopted is to replace the washing tank liquid in the washing tank for photosensitive material plates after a period of time. Since the washing tank liquid contains a lot of solutes of the washing liquid, direct updating will cause great waste, which is not conducive to cost saving. Summary of the invention

[0003] The purpose of the utility model is to provide a photosensitive material plate washing tank liquid recovery system which can recycle the washing tank liquid and save costs in view of the above shortcomings.

[0004] The technical solution adopted by the utility model is: a photosensitive material plate washing tank liquid recovery system, including a photosensitive material plate washing tank, which is characterized in that: it also includes a resin adsorption device, the resin adsorption device has an inlet and an outlet, the inlet and the outlet are respectively a second inlet and a second outlet, a resin adsorption column for aluminum ions is provided in the resin adsorption device, the photosensitive material plate washing tank is connected to the second inlet by a drainage pipe, and the second outlet is connected to the photosensitive material plate washing tank by a reflux pipe.

[0005] Furthermore, it also includes an acid tank and an oxidation tank for the aluminum plate, the acid tank is connected to the second inlet or the second outlet by an acid delivery pipe, and a regeneration liquid output pipe is connected to the second outlet or the second inlet to the oxidation tank; a valve is installed in the middle of the drain pipe, and this valve is the first valve; a valve is installed in the middle of the reflux pipe, and this valve is the second valve; a valve is installed in the middle of the regeneration liquid output pipe, and this valve is the third valve.

[0006] Furthermore, there is a heating component around the resin adsorption device, and this heating component is the first heating component.

[0007] Furthermore, there is a heating component around the acid tank, and this heating component is the second heating component.

[0008] Furthermore, there is a heating component around the oxidation tank, and this heating component is the third heating component.

[0009] The beneficial effect of the utility model is that such a photosensitive material plate washing tank liquid recovery system has the advantages of being able to recycle the washing tank liquid and save costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 It is a structural schematic diagram of the utility model.

[0011] Wherein: 1, photosensitive material plate washing tank 2, resin adsorption device 21, second inlet 22, second outlet 23, resin adsorption column 3, drain pipe 4, reflux pipe 5, acid liquid tank 51, acid liquid delivery pipe 6, oxidation tank 71, first valve 72, second valve 73, third valve 81, first heating device 82, second heating device 83, third heating device. DETAILED DESCRIPTION

[0012] The utility model will be further described below in conjunction with the accompanying drawings.

[0013] like Figure 1 As shown, the photosensitive material plate washing tank liquid recovery system includes a photosensitive material plate washing tank 1, which is characterized in that: it also includes a resin adsorption device 2, the resin adsorption device has an inlet and an outlet, the inlet and the outlet are respectively a second inlet 21 and a second outlet 22, and there is a resin adsorption column 23 of aluminum ions in the resin adsorption device, the photosensitive material plate washing tank is connected to the second inlet by a drain pipe 3, and the second outlet is connected to the photosensitive material plate washing tank by a reflux pipe 4.

[0014] The above configuration of the utility model can realize the regeneration of the washing tank liquid of the photosensitive material plate. When in use, the resin adsorption column contains the resin adsorbing aluminum ions, such as the aluminum ion adsorbing resin T-62.

[0015] Or it is T-62MP Tulsimer aluminum-removing resin. After a period of time, the resin adsorption column is taken out for replacement or regeneration. The photosensitive material plate washing tank liquid after adsorbing aluminum ions flows back to the photosensitive material plate washing tank through the reflux pipe and is reused, which can achieve the purpose of the utility model.

[0016] Furthermore, it also includes an acid liquid tank 5 and an oxidation tank 6 for the aluminum plate, the acid liquid tank is connected to the second inlet or the second outlet by an acid liquid delivery pipe 51, and there is also a regeneration liquid output pipe 25 connecting the second outlet or the second inlet to the oxidation tank; a valve is installed in the middle of the drain pipe, and this valve is the first valve 71; a valve is installed in the middle of the reflux pipe, and this valve is the second valve 72; a valve is installed in the middle of the regeneration liquid output pipe, and this valve is the third valve 73.

[0017] According to the above arrangement of the utility model, after a period of time, the first valve and the second valve can be closed, and the third valve can be opened to regenerate the resin using the acid in the acid tank. The regenerated acid flows to the oxidation tank. On the one hand, the oxidation tank uses these acid solutions, and on the other hand, the aluminum ions in the acid solutions do not affect the normal use of the acid solutions for oxidation.

[0018] Furthermore, there is a heating component around the resin adsorption device, and this heating component is the first heating component 81.

[0019] The utility model is arranged in this way, and can provide a suitable temperature for the resin adsorption device. For example, the first heating component can make the temperature inside the resin adsorption device reach 35-37°C, which can achieve a better effect of removing aluminum ions.

[0020] Furthermore, there is a heating component around the acid tank, and this heating component is the second heating component 82.

[0021] The utility model is arranged in this way, and can provide a suitable temperature for the inside of the acid tank. For example, the second heating component can make the temperature inside the acid tank reach 30-32° C., and can achieve a better effect of resin regeneration.

[0022] Furthermore, there is a heating component around the oxidation tank, and this heating component is the third heating component 83.

[0023] The utility model is arranged in this way, and can provide a suitable temperature for the oxidation tank. For example, the third heating component can make the temperature in the oxidation tank reach 40-42°C, which can achieve a better oxidation effect of the aluminum plate of the photosensitive material plate.

[0024] The above description is only a specific embodiment of the present invention, but the structural features of the protection scope of the present invention are not limited thereto. Any changes or modifications made by any technician in the field of the present invention are included in the patent scope of the present invention.

Claims

1. A photosensitive material plate washing tank liquid recovery system, comprising a photosensitive material plate washing tank, characterized in that: It also includes a resin adsorption device, which has an inlet and an outlet, which are respectively the second inlet and the second outlet. There is a resin adsorption column for aluminum ions in the resin adsorption device. The photosensitive material plate washing tank is connected to the second inlet by a drain pipe, and the second outlet is connected to the photosensitive material plate washing tank by a reflux pipe.

2. The photosensitive material plate washing tank liquid recovery system according to claim 1, characterized in that: It also includes an acid tank and an oxidation tank for aluminum plates. The acid tank is connected to the second inlet or the second outlet by an acid delivery pipe, and a regeneration liquid output pipe is connected to the second outlet or the second inlet to the oxidation tank. A valve is installed in the middle of the drain pipe, and this valve is the first valve; a valve is installed in the middle of the reflux pipe, and this valve is the second valve; a valve is installed in the middle of the regeneration liquid output pipe, and this valve is the third valve.

3. The photosensitive material plate washing tank liquid recovery system according to claim 1 or 2, characterized in that: There is a heating component around the resin adsorption device, and this heating component is the first heating component.

4. The photosensitive material plate washing tank liquid recovery system according to claim 2, characterized in that: There is also a heating component around the acid tank, and this heating component is the second heating component.

5. The photosensitive material plate washing tank liquid recovery system according to claim 2, characterized in that: There is also a heating component around the oxidation tank, and this heating component is the third heating component.