Calibration device

Abstract

The utility model provides a calibration device, and the device mainly comprises a tilt angle sensor which is disposed at the edge of a motion platform, and is used for obtaining the tilt angle of the motion platform; the plurality of adjusters are arranged at the edge of the motion platform and are used for adjusting the levelness of the motion platform; and the controller is electrically connected with the tilt angle sensor and the plurality of regulators respectively, and the controller controls the plurality of regulators to regulate the levelness of the motion platform according to the tilt angle. Thus, no matter whether the laser annealing equipment is executing the laser annealing process or not, the motion platform can be monitored in real time through the tilt angle sensor, the levelness of the motion platform is adjusted in real time through the adjuster, the adjustment time of the levelness of the motion platform can be shortened, and the adjustment efficiency can be improved.

Description

Technical Field

[0001] The present application relates to the field of automatic control technology, and in particular to a calibration device. Background Art

[0002] In the process of integrated circuit manufacturing, the laser annealing process can be used to process the surface of the wafer. A high-energy laser beam is used to quickly irradiate the wafer. The wafer absorbs the laser energy and converts it into heat energy, causing the wafer to quickly heat up to a high temperature locally. At high temperature, the impurity atoms diffuse in the lattice and occupy replacement positions. Under rapid cooling, the atoms in the lattice are rearranged, thereby controlling the diffusion of carriers on the wafer surface, stress release, or metal silicide formation. Since the local temperature of the wafer surface exceeds 1400°C during the laser annealing process, the silicon wafer is extremely sensitive to temperature. Uneven heating will break the surface stress balance and cause fragments.

[0003] When performing the laser annealing process, the laser optical path position remains unchanged, and the motion platform carries the wafer to move horizontally to change the position of the wafer irradiated by the laser beam. During the horizontal movement of the motion platform, if the motion platform is not level enough, the distance from the laser to the wafer surface will change, thereby affecting the laser focus and causing the laser spot size to change. Therefore, how to quickly adjust the levelness of the motion platform and timely monitor the levelness changes of the motion platform during the process or between process slices is the key to improving annealing uniformity and reducing the fragmentation rate of the laser annealing process.

[0004] In related technologies, such as Figure 1 As shown, the annealing laser 15 irradiates the annealing laser onto the wafer carried by the wafer carrier 12 through the reflection prism 16, so as to perform the laser annealing process on the wafer. The wafer carrier 12 is set on the motion platform 11, and the laser rangefinder 13 is set directly above the wafer carrier. During the movement of the motion platform 11, the laser rangefinder 13 measures the distance between the laser rangefinder 13 and multiple height adjustment points on the motion platform 11, and draws a distance distribution diagram. The operator manually adjusts the three height adjustment screws 14 according to the distance distribution diagram, drives the adjustment of the horizontality of the motion platform 11, so as to ensure that the distance between the motion platform 11 and the annealing laser 15 remains unchanged. However, in the process of manually adjusting the height adjustment screw 14, it is impossible to measure and monitor the change of the horizontality of the motion platform in real time, and repeated distance measurement and manual adjustment are required, which wastes manpower and time. Utility Model Content

[0005] The technical problem to be solved by the present application is that the prior art cannot monitor the horizontal changes of the motion platform in real time, resulting in repeated distance measurements and manual adjustments, wasting manpower and time.

[0006] To solve the above technical problems, the present application provides a calibration device for calibrating a motion platform of a laser annealing device, comprising: an inclination sensor, which is arranged at the edge of the motion platform and is used to obtain the inclination angle of the motion platform; a plurality of regulators, which are arranged at the edge of the motion platform and are used to adjust the horizontality of the motion platform; and a controller, which is electrically connected to the inclination sensor and the plurality of regulators, respectively, and controls the plurality of regulators to adjust the horizontality of the motion platform according to the inclination angle.

[0007] In some embodiments of the present application, the regulator includes a transmission mechanism and a servo motor; one end of the transmission mechanism is arranged at the edge of the motion platform through a connection point; the other end of the transmission mechanism is connected to the output shaft of the servo motor; the control end of the servo motor is electrically connected to the controller, and the servo motor adjusts the horizontality of the motion platform under the control of the controller.

[0008] In some embodiments of the present application, the first surface of the motion platform is used to set the transmission mechanism and the servo motor, and the second surface of the motion platform is used to set the wafer carrier.

[0009] In some embodiments of the present application, the multiple connection points corresponding to the multiple regulators include a first connection point and at least two second connection points, the at least two second connection points are located on the same straight line, and the first connection point is located on a perpendicular line to the straight line.

[0010] In some embodiments of the present application, the controller is an industrial computer or a programmable logic controller PLC.

[0011] In some embodiments of the present application, the tilt sensor includes at least one of a gyroscope and an accelerometer.

[0012] In some embodiments of the present application, the calibration device also includes: a laser rangefinder, which is electrically connected to the controller and is used to generate a distance distribution map; the controller controls the multiple regulators to adjust the horizontality of the motion platform based on the distance distribution map.

[0013] In some embodiments of the present application, the distance distribution diagram includes multiple vertical distances, and the vertical distance is a straight-line distance between the laser rangefinder and the motion platform in a direction perpendicular to a standard horizontal plane.

[0014] In some embodiments of the present application, the calibration device further includes: a data receiving device;

[0015] The data receiving device is used to receive the inclination correction value input by the user; the controller is electrically connected to the data receiving device, and the controller is also used to control the multiple regulators to adjust the horizontality of the motion platform according to the inclination correction value and the tilt angle.

[0016] In some embodiments of the present application, the data receiving device is any one of the following: a touch screen display, a data entry device, and a signal receiving device.

[0017] The embodiment of the present application provides a calibration device, which controls a plurality of regulators to adjust the horizontality of the motion platform according to the tilt angle obtained from the tilt sensor through a controller. In this way, whether the laser annealing equipment is performing the laser annealing process or not, the motion platform can be monitored in real time through the tilt sensor, and the horizontality of the motion platform can be adjusted in real time through the regulator, which can reduce the adjustment time of the horizontality of the motion platform and improve the adjustment efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The following figures describe in detail the exemplary embodiments disclosed in this application. The same reference numerals represent similar structures in several views of the drawings. Those skilled in the art will understand that these embodiments are non-limiting, exemplary embodiments, and the drawings are only for the purpose of illustration and description, and are not intended to limit the scope of this application. Other embodiments may also accomplish the inventive intent in this application. It should be understood that the drawings are not drawn to scale.

[0019] Figure 1 It is a schematic diagram of the structure of an existing calibration device and a part of a laser annealing device according to some embodiments of the present application;

[0020] Figure 2 is a schematic structural diagram of a calibration device according to some embodiments of the present application;

[0021] Figure 3 is a schematic structural diagram of another calibration device according to some embodiments of the present application;

[0022] Figure 4 is a schematic diagram of a hardware control logic according to some embodiments of the present application;

[0023] Figure 5 is a schematic diagram of height adjustment logic according to some embodiments of the present application;

[0024] Figure 6 is a schematic diagram of another hardware control logic according to some embodiments of the present application;

[0025] Description of the drawings: 11-motion platform, 12-wafer carrier, 13-laser rangefinder, 14-height adjustment screw, 15-annealing laser, 16-reflecting prism, 21-tilt sensor, 22-controller, 23-regulator, 231-connection point, 232-servo motor, 61-data receiving device. DETAILED DESCRIPTION

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. Unless it is obvious from the language environment or otherwise explained, the same reference numerals in the figures represent the same structure or operation. It should be clearly understood that the drawings are only for the purpose of illustration and description and are not intended to limit the scope of disclosure of this specification.

[0027] It should be understood that the "module" and "circuit" used herein are a method for distinguishing different components, elements, parts, portions or assemblies at different levels. However, if other words can achieve the same purpose, the words can be replaced by other expressions.

[0028] The terms used in this application are only for the purpose of describing specific example embodiments and are not restrictive. When used in this specification, the terms "include", "comprises" and / or "contains" mean the presence of associated integers, steps, operations, elements and / or components, but do not exclude the presence of one or more other features, integers, steps, operations, elements, components and / or groups or the addition of other features, integers, steps, operations, elements, components and / or groups in the calibration device. When describing the association of different components in this specification, it can be a direct relationship or an indirect relationship. For example, "A and B are connected" can mean that A and B are directly connected, or A and B are indirectly connected through other components.

[0029] For the motion platform used to perform the laser annealing process, the motion platform may not be level enough during the initial assembly or replacement of parts, that is, the motion platform is not on the standard horizontal plane. During the laser annealing process, the accumulated errors caused by material deformation or motion wear may also cause the motion platform to be not level enough. Therefore, in order to improve the annealing uniformity and reduce the fragmentation rate of the laser annealing process, it is necessary to monitor the level changes of the motion platform in time during the process or between process slices and adjust the level of the motion platform.

[0030] Based on the above analysis, if Figure 2 As shown, a calibration device provided in an embodiment of the present application may include:

[0031] A tilt sensor 21, which is disposed at an edge of the motion platform 11 and is used to obtain a tilt angle of the motion platform 11;

[0032] A plurality of adjusters 23, wherein the plurality of adjusters 23 are disposed at the edge of the motion platform 11 and are used to adjust the levelness of the motion platform 11; and

[0033] The controller 22 is electrically connected to the inclination sensor 21 and the plurality of regulators 23 respectively, and the controller 22 controls the plurality of regulators 23 to adjust the horizontality of the motion platform 11 according to the inclination angle.

[0034] In the embodiment of the present application, the inclination sensor 21 includes at least one of a gyroscope and an accelerometer. The inclination angle of the motion platform 11 obtained by the inclination sensor 21 can have an inclination accuracy of more than 0.01°.

[0035] In this way, the tilt angle of the motion platform 11 obtained by the tilt sensor 21 has a higher accuracy, thereby improving the accuracy of the horizontality of the motion platform 11 adjusted by the controller 22 and the plurality of regulators 23 .

[0036] In the embodiment of the present application, the inclination sensor 21 and the multiple regulators 23 are all arranged on the edge of the motion platform 11 outside the wafer carrier 12. In this way, during the laser annealing process, the laser beam cannot irradiate the inclination sensor 21 and the multiple regulators 23, which can extend the service life of the inclination sensor 21 and the multiple regulators 23.

[0037] It is understandable that there is a certain gap between the inclination sensor 21 and the regulator 23, and between the regulator 23 and the regulator 23. The size of the gap can meet the space required for installation deviation, looseness in use, and rotation of the regulator (for adjusting the horizontality of the motion platform).

[0038] In the embodiment of the present application, the tilt sensor 21 is disposed on the motion platform 11, and the specific arrangement mode may be fixed connection, adhesive connection, or detachable connection through a fixing member. Exemplarily, the fixing member may be a buckle or a bolt.

[0039] In the embodiment of the present application, the controller 22 is electrically connected to the inclination sensor 21 and the plurality of regulators 23, respectively, so that the inclination sensor 21 can transmit the obtained inclination angle to the controller 22, the controller 22 can generate a control signal according to the inclination angle, and the controller 22 can transmit the control signal to the plurality of regulators 23. The control signal is used to control the plurality of regulators 23 to adjust the platform height and levelness of the motion platform 11.

[0040] It should be noted that the electrical connection mode can be a wired connection or a wireless connection, which is not limited in the embodiments of the present application. The control signal can be a single signal or a group of signals, and the number of signals in the control signal is not limited in the embodiments of the present application.

[0041] In some embodiments of the present application, Figure 2 As shown, the regulator 23 includes a transmission mechanism and a servo motor 232;

[0042] One end of the transmission mechanism is disposed at the edge of the motion platform 11 through a connection point 231;

[0043] The other end of the transmission mechanism is connected to the output shaft of the servo motor 232;

[0044] The control end of the servo motor 232 is electrically connected to the controller 22 , and the servo motor 232 adjusts the horizontality of the motion platform 11 under the control of the controller 22 .

[0045] In the embodiment of the present application, the servo motor 232 receives a control instruction sent by the controller 22 , and the servo motor 232 rotates according to the control instruction, and then drives the motion platform 11 to adjust the horizontality through a transmission mechanism.

[0046] In some embodiments of the present application, the first surface of the motion platform 11 is used to set the transmission structure and the servo motor 232 , and the second surface of the motion platform 11 is used to set the wafer carrier 12 .

[0047] In the embodiment of the present application, the transmission mechanism may include components such as a screw, a movable rod, a gear and a steering shaft. The specific structure and size of the transmission structure vary with the positional relationship between the motion platform 11 and the servo motor 232. Figure 2 The transmission structure is included in the transmission mechanism. For example, the screw rod can penetrate the threaded hole (connection point) of the motion platform 11, one end of the screw rod is connected to the nut, and one end of the screw rod is connected to the servo motor 232 through other components of the transmission mechanism. The outer thread of the screw rod is adapted to the inner thread of the threaded hole.

[0048] In the embodiment of the present application, the servo motor 232 rotates according to the control instruction, which can drive the screw in the transmission mechanism to rotate, and then drive the motion platform 11 to rise or fall.

[0049] In some embodiments of the present application, the nut can also be rotated during manual adjustment by an operator to raise or lower the motion platform 11 .

[0050] In this way, during the laser annealing process, the laser beam cannot irradiate the servo motor 232 , thereby extending the service life of the servo motor 232 .

[0051] In some embodiments of the present application, the multiple connection points corresponding to the multiple regulators 23 include a first connection point and at least two connection points, the at least two second connection points are located on the same straight line, and the first connection point is located on a perpendicular line to the straight line.

[0052] It is understandable that, since three scattered points can determine a plane, the levelness of the motion platform 11 can be adjusted by three regulators 23. If the number of the multiple regulators 23 is greater than 3, three of the regulators 23 are used to adjust the levelness of the motion platform 11, and the other regulators 23 are used to lock the motion platform 11.

[0053] In the embodiment of the present application, the same straight line on which the at least two second connection points are located can be determined as the X-axis, and the perpendicular line of the straight line on which the first connection point is located can be determined as the Y-axis. By adjusting the height of the nut connected to the connection point and adjusting the inclination of the X-axis or the Y-axis, the horizontality of the motion platform 11 can be adjusted.

[0054] In this way, the process of obtaining the control signal is simplified, the efficiency of generating the control signal is improved, and the adjustment time of the motion platform 11 is reduced.

[0055] In some embodiments of the present application, the controller 22 is an industrial computer or a programmable logic controller PLC.

[0056] In some embodiments of the present application, Figure 3 As shown, the calibration device further includes: a laser rangefinder, the laser rangefinder 13 is electrically connected to the controller 22, and is used to generate a distance distribution map;

[0057] The controller 22 controls the plurality of regulators 23 to adjust the horizontality of the motion platform 11 based on the distance distribution graph.

[0058] In some embodiments of the present application, the distance distribution diagram includes multiple vertical distances, and the vertical distance is a straight-line distance between the laser rangefinder and the motion platform in a direction perpendicular to a standard horizontal plane.

[0059] It can be understood that the vertical distance is the straight-line distance between the laser rangefinder and the height measurement point on the motion platform in a direction perpendicular to the standard horizontal plane. Multiple vertical distances correspond to multiple height measurement points, and the multiple height measurement points can be distributed on a circle with the center of the motion platform 11 as the center point. The number of height measurement points can be 8, 10 or 12. The operating platform 11 is required to measure the vertical distance by moving horizontally and / or vertically.

[0060] In the embodiments of the present application, Figure 4 As shown, the inclination sensor 21 obtains the inclination angle of the motion platform 11, and then the controller 22 receives the inclination angle and controls the servo motors 232 in the multiple regulators 23 to adjust the horizontality of the motion platform 11 according to the inclination angle. In this way, the control process of the motion platform 11 is a closed-loop control process, and the motion platform 11 can be finally adjusted to a standard horizontal plane.

[0061] It can be understood that a slight angle difference between the motion platform 11 and the standard horizontal plane is allowed.

[0062] In the embodiment of the present application, since the adjusted vertical distance (Z-axis distance) may also have deviations, the controller 22 controls the servo motors 232 in the plurality of regulators 23 to adjust the height of the motion platform 11 according to the vertical distance.

[0063] For example, it is assumed that the connection points corresponding to servo motor 1 and servo motor 2 belong to the X-axis, and the connection point corresponding to servo motor 3 belongs to the Y-axis. Figure 5As shown, first, when the height difference of the X-axis is not 0, the controller generates a first group of signals according to the tilt angle, so that the servo motor 1 and / or the servo motor 2 adjust the height difference of the X-axis of the motion platform 11 according to the first group of signals. Then, when the height difference of the X-axis is 0 and the height difference of the Y-axis is not 0, the controller generates a second group of signals according to the tilt angle, so that the servo motor 2 and / or the servo motor 3 adjust the height difference of the Y-axis of the motion platform 11 according to the first group of signals. Finally, when the height difference of the X-axis is 0, the height difference of the Y-axis is 0, and the height difference of the Z-axis is not 0, the controller generates a third group of signals according to the tilt angle, so that the servo motor 1 and / or the servo motor 2 and / or the servo motor 3 adjust the height difference of the Y-axis of the motion platform 11 according to the third group of signals. After the servo motor 1 and / or the servo motor 2 and / or the servo motor 3 adjust the motion platform 11, it is re-determined whether the height difference of the X-axis is 0, that is, the horizontality of the motion platform is re-adjusted.

[0064] In some embodiments of the present application, Figure 6 As shown, the calibration device further includes: a data receiving device 61;

[0065] The data receiving device 61 is used to receive the tilt correction value input by the user;

[0066] The controller 22 is electrically connected to the data receiving device 61 , and the controller 22 is further used to control the plurality of regulators 23 to adjust the horizontality of the motion platform 11 according to the inclination correction value and the inclination angle.

[0067] In some embodiments of the present application, the data receiving device 61 is any one of the following: a touch screen display, a data entry device, and a signal receiving device.

[0068] Exemplarily, the data entry device may be a keyboard or a mouse, and the signal receiving device may be a wireless receiving module or a wired receiving module.

[0069] In the embodiment of the present application, due to the inherent deviation of the motion platform 11, or in order to adapt to the special requirements of the laser annealing process for the deviation of the horizontality, the calibration result of the calibration device can be corrected by the inclination correction value.

[0070] Illustratively, the correction value may be smaller than a preset ratio of a preset vertical distance, such as 2 microns, 0.06 millimeters, and 1 millimeter.

[0071] The embodiment of the present application provides a calibration device, which controls a plurality of regulators to adjust the horizontality of the motion platform according to the tilt angle obtained from the tilt sensor through a controller. In this way, whether the laser annealing equipment is performing the laser annealing process or not, the motion platform can be monitored in real time through the tilt sensor, and the horizontality of the motion platform can be adjusted in real time through the regulator, which can reduce the adjustment time of the horizontality of the motion platform and improve the adjustment efficiency.

[0072] It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects that may be produced may be any one or a combination of the above, or any other beneficial effects that may be obtained.

[0073] In summary, after reading the contents of this application, those skilled in the art will appreciate that the aforementioned application contents may be presented only in an exemplary manner and may not be restrictive. Although not explicitly stated herein, those skilled in the art will appreciate that this application is intended to encompass various reasonable changes, improvements and modifications to the embodiments. These changes, improvements and modifications are within the spirit and scope of the exemplary embodiments of this application.

[0074] It should also be understood that although the terms first, second, third, etc. can be used to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. Therefore, without departing from the teachings of the present application, the first element in some embodiments can be referred to as the second element in other embodiments. The same reference numerals or the same reference signs represent the same elements throughout the specification.

Claims

1. A calibration device for calibrating a motion platform of a laser annealing device, characterized in that: include: An inclination sensor is disposed at an edge of the motion platform and is used to obtain an inclination angle of the motion platform; A plurality of regulators, wherein the plurality of regulators are arranged at the edge of the motion platform and are used to adjust the levelness of the motion platform; as well as A controller is electrically connected to the inclination sensor and the plurality of regulators respectively, and the controller controls the plurality of regulators to adjust the horizontality of the motion platform according to the inclination angle.

2. The calibration device according to claim 1, characterized in that The regulator includes a transmission mechanism and a servo motor; One end of the transmission mechanism is arranged at the edge of the motion platform through a connection point; The other end of the transmission mechanism is connected to the output shaft of the servo motor; The control end of the servo motor is electrically connected to the controller, and the servo motor adjusts the horizontality of the motion platform under the control of the controller.

3. The calibration device according to claim 2, characterized in that The first surface of the motion platform is used to set the transmission mechanism and the servo motor, and the second surface of the motion platform is used to set the wafer carrying plate.

4. The calibration device according to claim 2, characterized in that The multiple connection points corresponding to the multiple regulators include a first connection point and at least two second connection points, the at least two second connection points are located on the same straight line, and the first connection point is located on a perpendicular line to the straight line.

5. The calibration device according to claim 1, characterized in that: The controller is an industrial computer or a programmable logic controller (PLC).

6. The calibration device according to claim 1, characterized in that: The tilt sensor includes at least one of a gyroscope and an accelerometer.

7. The calibration device according to claim 1, characterized in that: It also includes: a laser rangefinder, the laser rangefinder is electrically connected to the controller and is used to generate a distance distribution map; The controller controls the plurality of regulators to adjust the horizontality of the motion platform based on the distance distribution map.

8. The calibration device according to claim 7, characterized in that The distance distribution diagram includes a plurality of vertical distances, where the vertical distance is a straight-line distance between the laser rangefinder and the motion platform in a direction perpendicular to a horizontal plane.

9. The calibration device according to claim 8, characterized in that Also includes: Data receiving equipment; The data receiving device is used to receive the tilt correction value input by the user; The controller is electrically connected to the data receiving device, and is also used to control the plurality of regulators to adjust the horizontality of the motion platform according to the inclination correction value and the inclination angle.

10. The calibration device according to claim 9, characterized in that The data receiving device is any one of the following: a touch screen display, a data entry device and a signal receiving device.

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