Autorotation polishing device for nanometer polishing

Abstract

The utility model relates to the technical field of nano polishing, in particular to an autorotation polishing device for nano polishing. The utility model provides a self-rotating polishing device for nano polishing, which is characterized by comprising a body, a first driving part, a first transmission part and a clamping part, the body is of a hollow structure, and the first driving part, the first transmission part and the clamping part are arranged in the body; one end of the first transmission part is arranged on the first driving part, and the other end of the first transmission part is connected with the clamping part; the clamping part is used for clamping and fixing a workpiece to be polished; and the first driving part can transmit driving force to the clamping part through the first transmission part, so that the clamping part and a workpiece to be polished move.

Description

Technical Field

[0001] The present application relates to the technical field of nano-polishing, and in particular to a self-rotating polishing device for nano-polishing. Background Art

[0002] PLNP nano-polishing is a green and efficient surface processing technology. It uses a low-concentration neutral salt solution as a polishing medium. It can solve the problems of efficient polishing, deburring, rust removal, and oil removal on the inner and outer surfaces of complex metal workpieces, and can effectively reduce the adverse effects on the environment and human health. PLNP technology is based on the principle of gas-liquid plasma generation. The polishing liquid forms a gas layer that completely wraps the workpiece on the surface of the workpiece and excites it to a plasma state, so that the surface roughness value of the polished workpiece can reach or approach the nanometer level.

[0003] The polishing device based on PLNP nano-polishing technology allows the workpiece surface to be evenly exposed to the plasma polishing liquid by immersion, thereby achieving efficient and uniform surface polishing.

[0004] At present, when PLNP nano-polishing is performed on a workpiece, the workpiece is moved up and down by controlling the lead screw, so that the workpiece enters the polishing liquid. When the workpiece is completely immersed in the polishing liquid, the workpiece stops moving. When the workpiece is large, the upper and lower ends of the workpiece are immersed in the polishing liquid at different depths. When polishing is completed, the workpiece positions at different water depths will have different polishing effects, resulting in uneven polishing effects. Therefore, the upper and lower ends of the workpiece need to be turned upside down and reprocessed to ensure the consistency of the workpiece polishing effect. Utility Model Content

[0005] The purpose of the present application is to provide a self-rotating polishing device for nano-polishing to solve at least one technical problem existing in the prior art.

[0006] In order to solve the above technical problems, the present application provides a self-rotating polishing device for nano-polishing, comprising a body, a first driving part, a first transmission part and a clamping part;

[0007] The main body is a hollow structure in which the first driving part, the first transmission part and the clamping part are arranged;

[0008] One end of the first transmission part is arranged on the first driving part, and the other end is connected to the clamping part;

[0009] The clamping part is used to clamp and fix the workpiece to be polished;

[0010] The first driving part can transmit the driving force to the clamping part through the first transmission part, so that the clamping part and the workpiece to be polished move.

[0011] Preferably, the first driving part is a servo motor.

[0012] Preferably, the first transmission part is a rotating shaft.

[0013] Furthermore, it also includes a limiting portion;

[0014] The limiting portion is arranged on the inner wall of the body;

[0015] The limiting portion is rotatably connected to the first transmission portion and is used to limit the position of the first transmission portion.

[0016] Furthermore, a coupling is also provided on the first transmission part;

[0017] The coupling is arranged on a side biased toward the first driving part to play a role of overload protection.

[0018] Further, the first transmission part is a conductor, on which a conductive part is electrically arranged;

[0019] The conductive part is electrically connected to an external power supply wire.

[0020] Further, the conductive part is sleeved on the first transmission part and includes a conductive ring;

[0021] A brush is provided at the end of the power supply wire;

[0022] The brush is connected to the conductive ring.

[0023] Furthermore, a plurality of brushes are arranged in parallel to increase the contact area with the conductive ring and improve the stability of current conduction.

[0024] Furthermore, the conductive part also includes a limiting separation ring;

[0025] The limiting and separating ring is arranged on the conducting ring, and is used for limiting and separating a plurality of parallel-connected brushes, so as to avoid mutual contact and entanglement between them and improve the stability of equipment operation.

[0026] Furthermore, it also includes a second driving part and a second transmission part;

[0027] The body is movably connected to the processing groove through a second driving part and a second transmission part.

[0028] Preferably, the second driving part is a cylinder, and the second transmission part is a slider.

[0029] Furthermore, a guide and limit device is also provided on the processing groove, which is used to guide and limit the second transmission part.

[0030] Preferably, the guide and limiting device is a guide rail.

[0031] By adopting the above technical solution, the present application has the following beneficial effects:

[0032] The device can drive the workpiece to rotate during polishing through a servo motor, and adjust the depth of different positions of the workpiece immersed in the polishing liquid, so that each position on the workpiece can reach the water depth position with the best polishing effect, so that all positions of the workpiece can achieve the best polishing effect, and ensure the consistency of the workpiece polishing effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the specific implementation methods of the present application or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0034] Figure 1 It is a schematic diagram of the planar structure of a self-rotating polishing device for nano-polishing;

[0035] Figure 2 It is a schematic diagram of the planar structure of the conductive part of a self-rotating polishing device for nano-polishing;

[0036] Figure 3 It is a schematic diagram of the planar structure of a limiting part of a self-rotating polishing device used for nano-polishing.

[0037] Reference numerals:

[0038] 1-main body; 2-first driving part; 3-first transmission part; 4-clamping part; 5-limiting part; 6-coupling; 7-conductive part; 8-power supply wire; 9-conduction ring; 10-brush; 11-limiting and separating ring; 12-second driving part; 13-second transmission part; 14-guide and limiting device; 15-processing groove; 16-bearing. DETAILED DESCRIPTION

[0039] The technical solution of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.

[0040] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0041] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0042] The present application is further explained below in conjunction with specific implementation methods.

[0043] like Figure 1-3 As shown, the present embodiment provides a self-rotating polishing device for nano-polishing, comprising a body 1, a first driving part 2, a first transmission part 3 and a clamping part 4;

[0044] The main body 1 is a hollow structure in which the first driving part 2, the first transmission part 3 and the clamping part 4 are arranged;

[0045] One end of the first transmission part 3 is arranged on the first driving part 2, and the other end is connected to the clamping part 4;

[0046] The clamping portion 4 is used to clamp and fix the workpiece to be polished;

[0047] The first driving part 2 can transmit the driving force to the clamping part 4 through the first transmission part 3, so that the clamping part 4 and the workpiece to be polished move.

[0048] As a preferred embodiment of the present application, the first driving unit 2 is a servo motor.

[0049] As a preferred embodiment of the present application, the first transmission part 3 is a rotating shaft.

[0050] As a preferred embodiment of the present application, the main body 1 is a supporting structure, preferably a supporting plate or a supporting cylinder.

[0051] As a further embodiment of the present application, it further comprises a processing tank 15 for carrying the polishing liquid, and the body 1 is fixedly connected or detachably connected to the processing tank 15 .

[0052] When the self-rotating polishing device for nano-polishing of the present application is working, the clamping part 4 clamps and fixes the workpiece to be polished. After the workpiece to be polished is immersed in the polishing liquid, the first driving part 2 is started. Under the drive of the first driving part 2, the first transmission part 3 transmits the driving force to the clamping part 4 and rotates the workpiece to be polished in the polishing liquid, which can not only achieve the technical effect of full polishing, but also stir the polishing liquid to avoid the polishing hidden danger caused by uneven concentration of the polishing liquid.

[0053] As a further embodiment of the present application, it further includes a limiting portion 5;

[0054] The limiting portion 5 is arranged on the inner wall of the body 1;

[0055] The limiting portion 5 is rotatably connected to the first transmission portion 3 and is used to limit the position of the first transmission portion 3 .

[0056] As a further implementation scheme of the present application, a bearing 16 is provided between the limiting portion 5 and the first transmission portion 3 to reduce friction resistance.

[0057] When the self-rotating polishing device for nano-polishing of the present application is working, the first driving part 2 may encounter greater resistance in the process of driving the workpiece to rotate and polish in the polishing liquid, so that the rotation of the first transmission part 3 may cause strong vibration or deformation and other working hazards. By setting the limiting part 5, the relevant hidden dangers can be avoided and the stability of the equipment operation can be improved.

[0058] As a further implementation scheme of the present application, a coupling 6 is further provided between the first transmission part 3 and the first driving part 2 to play a role of overload protection.

[0059] When the self-rotating polishing device for nano-polishing of the present application is working, the coupling 6 can connect two coaxial lines in different mechanisms, combine the active part of the power machine with the working machine, and convert the deceleration motion of the actuator into a rotational motion to drive the motor or other mechanical equipment, thereby realizing the displacement transfer between the two mechanisms. The relative displacement of the two axes is compensated by elastic elements, including axial offset, radial offset, angular offset or combined offset. In addition, the coupling 6 has the functions of buffering and vibration absorption, and can realize the vibration isolation between the engine and the reducer, power unit or power absorption device. The coupling 6 is also used as a safety device to prevent the connected parts from bearing excessive loads, and plays a role in overload protection. In addition, the coupling 6 also plays a control or adjustment role such as steering and positioning, and can also mark the positions of the parts that cooperate with each other before the coupling 6 is disassembled.

[0060] As a further embodiment of the present application, the first transmission part 3 is a conductor, and a conductive part 7 is electrically disposed thereon;

[0061] The conductive part 7 is electrically connected to an external power supply wire 8 .

[0062] When the self-rotating polishing device for nano-polishing of the present application is working, the conductive part 7 is connected to the positive electrode of the power supply to form a processing anode; the container of the polishing liquid (i.e., the processing tank 15) is connected to the negative electrode of the power supply to form a processing cathode, and the polishing salt molecules in the polishing liquid perform nano-polishing on the workpiece under the action of the electric potential.

[0063] As a further implementation scheme of the present application, an insulating connection block (not shown in the figure) is provided in the coupling 6, which is used to perform insulation between the first transmission part 3 and the first driving part 2 to avoid electrical damage to the first driving part 2.

[0064] As a further embodiment of the present application, the conductive part 7 is sleeved on the first transmission part 3 and includes a conductive ring 9;

[0065] A brush 10 is provided at the end of the power supply wire 8;

[0066] The brush 10 is connected to the conducting ring 9 .

[0067] When the self-rotating polishing device for nano-polishing of the present application is working, a stable electrical connection can be achieved through the cooperation between the brush 10 and the conductive ring 9, and problems such as entanglement caused by direct connection between the power supply wire 8 and the conductive part 7 can be avoided.

[0068] As a further implementation scheme of the present application, a plurality of brushes 10 are arranged in parallel to increase the contact area with the conductive ring 9 and improve the stability of current conduction.

[0069] When a self-rotating polishing device for nano-polishing of the present application is working, due to the limited current transmission capacity of a single brush 10, a single brush 10 is difficult to meet the current demand for processing large workpieces. Therefore, multiple brushes 10 are provided to increase the upper limit of the processing current.

[0070] As a further embodiment of the present application, the conductive part 7 further includes a limiting separation ring 11;

[0071] The limiting and separating ring 11 is arranged on the conducting ring 9, and is used to limit and separate a plurality of parallel-connected brushes 10, so as to avoid mutual contact and entanglement between them, and improve the stability of equipment operation.

[0072] In order to ensure that multiple parallel brushes 10 do not affect each other when the self-rotating polishing device for nano-polishing of the present application is working, a limiting separation ring 11 is used to be set between every two brushes 10 to achieve the function of limiting and separating.

[0073] As a further embodiment of the present application, it further includes a second driving part 12 and a second transmission part 13;

[0074] The body 1 is movably connected to the processing tank 15 via a second driving part 12 and a second transmission part 13 .

[0075] As a preferred embodiment of the present application, the second driving part 12 is a cylinder, and the second transmission part 13 is a slider.

[0076] As a preferred embodiment of the present application, the conductive part 7 is a conductive slip ring.

[0077] When the self-rotating polishing device for nano-polishing of the present application is in operation, the second driving part 12 and the second transmission part 13 arranged on the processing groove 15 can make the main body 1 and the processing groove 15 move relative to each other, and control the main body 1 to approach or move away from the processing groove 15, thereby controlling the movement of the workpiece to be polished entering and leaving the polishing liquid and its depth in the polishing liquid.

[0078] As a further implementation scheme of the present application, a guide and limit device 14 is further provided on the processing groove 15 for guiding and limiting the second transmission part 13 .

[0079] As a preferred embodiment of the present application, the guide and limit device 14 is a guide rail.

[0080] When the self-rotating polishing device for nano-polishing of the present application is working, the clamping part 4 clamps and fixes the workpiece to be polished. The second driving part 12 and the second transmission part 13 arranged on the processing groove 15 can make the body 1 and the processing groove 15 move relative to each other, and control the body 1 to approach or move away from the processing groove 15, so as to control the movement of the workpiece to be polished entering and leaving the polishing liquid and its depth in the polishing liquid. After the workpiece to be polished is immersed in the polishing liquid, the first driving part 2 is started. Under the drive of the first driving part 2, the first transmission part 3 transmits the driving force to the clamping part 4, and rotates the workpiece to be polished in the polishing liquid, which can achieve the technical effect of full polishing and can also stir the polishing liquid to avoid the hidden danger of polishing caused by uneven concentration of the polishing liquid. At the same time, the conductive part 7 is connected to the positive pole of the power supply to form a processing anode; the processing groove 15 is connected to the negative pole of the power supply to form a processing cathode, and the polishing salt molecules in the polishing liquid perform nano-polishing on the workpiece under the action of the electric potential. The conductive part 7 and the power supply wire 8 can achieve stable electrical connection through the cooperation of the brush 10 and the conductive ring 9, and can avoid the entanglement and other problems caused by the direct connection between the power supply wire 8 and the conductive part 7. In order to ensure that multiple parallel brushes 10 do not affect each other, a limiting separation ring 11 is used to be set between every two brushes 10 to achieve the function of limiting and separation.

[0081] By adopting the above technical solution, the present application has the following beneficial effects:

[0082] The device can drive the workpiece to rotate during polishing through a servo motor, and adjust the depth of different positions of the workpiece immersed in the polishing liquid, so that each position on the workpiece can reach the water depth position with the best polishing effect, so that all positions of the workpiece can achieve the best polishing effect, and ensure the consistency of the workpiece polishing effect.

[0083] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A self-rotating polishing device for nano-polishing, characterized in that: It includes a body, a first driving part, a first transmission part and a clamping part; The main body is a hollow structure in which the first driving part, the first transmission part and the clamping part are arranged; One end of the first transmission part is arranged on the first driving part, and the other end is connected to the clamping part; The clamping part is used to clamp and fix the workpiece to be polished; The first driving part can transmit the driving force to the clamping part through the first transmission part, so that the clamping part and the workpiece to be polished move; The first transmission part is a conductor, and a conductive part is electrically arranged on the conductor; The conductive part is electrically connected to an external power supply wire; The conductive part is sleeved on the first transmission part and includes a conductive ring; A brush is provided at the end of the power supply wire; The brush is connected to the conductive ring.

2. The self-rotating polishing device for nano-polishing according to claim 1, characterized in that: Also includes a limiting portion; The limiting portion is arranged on the inner wall of the body; The limiting portion is rotatably connected to the first transmission portion and is used to limit the position of the first transmission portion.

3. The self-rotating polishing device for nano-polishing according to claim 2, characterized in that: The first transmission part is also provided with a coupling; The coupling is arranged on a side biased toward the first driving part to play a role of overload protection.

4. The self-rotating polishing device for nano-polishing according to claim 1, characterized in that: A plurality of brushes are arranged in parallel to increase the contact area with the conductive ring and improve the stability of current conduction.

5. The self-rotating polishing device for nano-polishing according to claim 4, characterized in that: The conductive part also includes a limiting separation ring; The limiting and separating ring is arranged on the conducting ring, and is used for limiting and separating a plurality of parallel-connected brushes, so as to avoid mutual contact and entanglement between them and improve the stability of equipment operation.

6. The self-rotating polishing device for nano-polishing according to claim 5, characterized in that: It also includes a second driving part and a second transmission part; The body is movably connected to the processing groove through a second driving part and a second transmission part.

7. The self-rotating polishing device for nano-polishing according to claim 6, characterized in that: The processing groove is also provided with a guide and limit device for guiding and limiting the second transmission part.

8. The self-rotating polishing device for nano-polishing according to claim 7, characterized in that: The first driving part is a servo motor; The first transmission part is a rotating shaft; The second driving part is a cylinder; The second transmission part is a slider; The guide and limiting device is a guide rail.

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