Process device for concentrating and absorbing silicon tetrafluoride gas

Abstract

The utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas. The process device comprises an absorption box, the absorption cavity is formed in the absorption box, an air inlet pipe is fixedly mounted in the absorption box, a communicating hole is formed in the middle of the top of the air inlet pipe, and an external pipe is arranged at the top of the outer surface of the air inlet pipe; the cleaning device is fixedly mounted in the external pipe and comprises a mounting plate, a servo motor, a rotating soft rod and a spring, and the mounting plate is fixedly mounted in the external pipe. According to the process device for concentrating and absorbing the silicon tetrafluoride gas, the output shaft of the servo motor is controlled by an external power supply to rotate to drive the rotating soft rod and the spring to rotate, and the rotating soft rod drives the spring to stir silica gel in the communicating hole and push the silica gel out of the communicating hole, so that the silica gel is prevented from blocking the communicating hole; and the conversion efficiency of the device is maintained.

Description

Technical Field

[0001] The utility model relates to the field of gas absorption, in particular to a process device for concentrating and absorbing silicon tetrafluoride gas. Background Art

[0002] During the wet process of producing phosphoric acid or phosphate fertilizer, part of the fluorine in the phosphate rock is replaced by silicon tetrafluoride gas. The fluorine overflow can reach 30% to 40%, which is a very high content. Directly discharging these gases will pollute the air and cause great waste. In order to make full use of silicon tetrafluoride gas, silicon tetrafluoride needs to be absorbed with water as an unabsorbent first.

[0003] For example, a process device for concentrating and absorbing silicon tetrafluoride gas is disclosed with the publication number CN213375860U. Silicon tetrafluoride is discharged into an absorption box through an air inlet pipe and then discharged from an exhaust pipe. The exhaust pipe is bent and wrapped around a support plate. Silicon tetrafluoride is discharged from an exhaust port on the exhaust pipe, thereby increasing the contact area between silicon tetrafluoride and water and increasing the absorption efficiency. A portion of the unabsorbed silicon tetrafluoride reaches above the liquid surface, and a water pump drives the water to circulate. The water is sprayed out from the spray pipe at the upper end to absorb the unabsorbed silicon tetrafluoride in the air and increase the absorption rate. At the same time, a plurality of spray heads are provided to increase the absorption efficiency. However, the exhaust pipe is in contact with water, and silicon fluoride will also produce silica gel inside the exhaust pipe, causing blockage inside the exhaust pipe and affecting the circulation of silicon tetrafluoride.

[0004] Therefore, it is necessary to provide a process device for concentrating and absorbing silicon tetrafluoride gas to solve the above technical problems. Utility Model Content

[0005] The utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas, which solves the problem that when an exhaust pipe contacts water, silicon fluoride will also produce silica gel inside the exhaust pipe, causing blockage inside the exhaust pipe and affecting the circulation of silicon tetrafluoride.

[0006] In order to solve the above technical problems, the utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas, comprising: an absorption box;

[0007] An absorption chamber, wherein the absorption chamber is opened inside the absorption box, an air intake pipe is fixedly installed inside the absorption box, a connecting hole is opened in the middle of the top of the air intake pipe, and an external pipe is arranged on the top of the outer surface of the air intake pipe;

[0008] A cleaning device, the cleaning device is fixedly installed inside the external tube, the cleaning device includes a mounting plate, a servo motor, a rotating soft rod and a spring, the mounting plate is fixedly installed inside the external tube, the servo motor is fixedly installed in the middle of the surface of the mounting plate, the rotating soft rod is fixedly connected to the output shaft of the servo motor, and the spring is arranged on the outer surface of the rotating soft rod.

[0009] Preferably, elastic devices are provided at the bottom of both sides of the absorption chamber, and filter plates are provided at the top of the elastic devices.

[0010] Preferably, a vibration device is provided at the bottom of the other side of the inner wall of the absorption chamber.

[0011] Preferably, an infusion tube is fixedly mounted on one side of the outer surface of the absorption box, a pump body is provided on the surface of the infusion tube, and a spray head is provided on the top of one side of the infusion tube.

[0012] Preferably, a discharge pipe is provided on the other side of the outer surface of the absorption box, and a liquid discharge pipe is provided at the bottom of the other side of the outer surface of the absorption box.

[0013] Preferably, threaded holes are provided on both sides of the outer surface of the external tube, the internal threads of the threaded holes are engaged with a limiting device, and one side of the threaded holes is connected to a receiving groove.

[0014] Preferably, the limiting device comprises a threaded rod, a limiting protrusion and a rotating block, the threaded rod is threadedly engaged with the inside of the threaded hole, the limiting protrusion is fixedly connected to one end of the threaded rod, and the rotating block is fixedly connected to the other end of the threaded rod.

[0015] Compared with the related art, the process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model has the following beneficial effects:

[0016] The utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas. The output shaft of a servo motor is controlled by an external power supply to rotate, thereby driving a rotating soft rod and a spring to rotate. The rotating soft rod drives the spring to stir silica gel inside a connecting hole, and the silica gel is pushed out of the connecting hole to avoid the silica gel from clogging the connecting hole, thereby maintaining the conversion efficiency of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A schematic structural diagram of a first embodiment of a process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model;

[0018] Figure 2 for Figure 1 An enlarged schematic diagram of point A is shown;

[0019] Figure 3 A schematic structural diagram of a second embodiment of a process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model;

[0020] Figure 4 for Figure 3 The enlarged schematic diagram of point B is shown;

[0021] Figure 5 for Figure 4 The schematic diagram of the limit device structure is shown.

[0022] Numbers in the figure: 1. absorption box, 2. absorption chamber, 3. air inlet pipe, 4. external pipe, 5. connecting hole, 6. cleaning device, 61. mounting plate, 62. servo motor, 63. rotating soft rod, 64. spring, 7. elastic device, 8. filter plate, 9. discharge pipe, 10. discharge pipe, 11. vibration device, 12. infusion pipe, 13. pump body, 14. sprinkler head, 15. limiting groove, 16. threaded hole, 17. storage groove, 18. limiting device, 181. threaded rod, 182. limiting protrusion, 183. rotating block. DETAILED DESCRIPTION

[0023] The utility model is further described below in conjunction with the accompanying drawings and implementation modes.

[0024] First embodiment

[0025] Please refer to Figure 1 and Figure 2 ,in, Figure 1 A schematic structural diagram of a first embodiment of a process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model; Figure 2 for Figure 1 The enlarged schematic diagram of point A is shown. A process device for concentrating and absorbing silicon tetrafluoride gas comprises: an absorption box 1;

[0026] An absorption chamber 2, the absorption chamber 2 is opened inside the absorption box 1, an air intake pipe 3 is fixedly installed inside the absorption box 1, a connecting hole 5 is opened in the middle of the top of the air intake pipe 3, and an external pipe 4 is arranged on the top of the outer surface of the air intake pipe 3;

[0027] The cleaning device 6 is fixedly installed inside the external tube 4. The cleaning device 6 includes a mounting plate 61, a servo motor 62, a rotating soft rod 63 and a spring 64. The mounting plate 61 is fixedly installed inside the external tube 4. The servo motor 62 is fixedly installed in the middle of the surface of the mounting plate 61. The rotating soft rod 63 is fixedly connected to the output shaft of the servo motor 62. The spring 64 is arranged on the outer surface of the rotating soft rod 63.

[0028] Elastic devices 7 are arranged at the bottom of both sides of the absorption chamber 2 , and filter plates 8 are arranged at the top of the elastic devices 7 .

[0029] A vibration device 11 is provided at the bottom of the other side of the inner wall of the absorption chamber 2 .

[0030] A liquid infusion tube 12 is fixedly mounted on one side of the outer surface of the absorption box 1 , a pump body 13 is arranged on the surface of the liquid infusion tube 12 , and a spray head 14 is arranged on the top of one side of the liquid infusion tube 12 .

[0031] A discharge pipe 9 is provided on the other side of the outer surface of the absorption box 1 , and a liquid discharge pipe 10 is provided on the bottom of the other side of the outer surface of the absorption box 1 .

[0032] The rotating soft rod 63 is a soft and tough metal rod, and the spring 64 is wound around the outer surface of the rotating soft rod 63 to form a auger shape.

[0033] The pump body 13 enables the liquid delivery tube 12 to draw the water at the bottom of the absorption chamber 2 upward and spray it out from the spray head 14 .

[0034] The working principle of the process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model is as follows:

[0035] During operation, first, the output shaft of the servo motor 62 is controlled by an external power supply to rotate, driving the rotating soft rod 63 and the spring 64 to rotate. The rotating soft rod 63 drives the spring 64 to stir the silica gel inside the connecting hole 5 and push the silica gel out of the connecting hole 5.

[0036] Compared with the related art, the process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model has the following beneficial effects:

[0037] The utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas. The output shaft of a servo motor 62 is controlled by an external power supply to rotate, thereby driving a rotating soft rod 63 and a spring 64 to rotate. The rotating soft rod 63 drives the spring 64 to stir silica gel inside a connecting hole 5, and pushes the silica gel out of the connecting hole 5, thereby preventing the silica gel from clogging the connecting hole 5 and maintaining the conversion efficiency of the device.

[0038] Second embodiment

[0039] Please refer to Figure 3 , Figure 4 and Figure 5 Based on the process device for concentrating and absorbing silicon tetrafluoride gas provided in the first embodiment of the present application, the second embodiment of the present application proposes another process device for concentrating and absorbing silicon tetrafluoride gas. The second embodiment is only a preferred embodiment of the first embodiment, and the implementation of the second embodiment will not affect the independent implementation of the first embodiment.

[0040] Specifically, the difference of the process device for concentrating and absorbing silicon tetrafluoride gas provided in the second embodiment of the present application is that, in a process device for concentrating and absorbing silicon tetrafluoride gas, threaded holes 16 are provided on both sides of the outer surface of the external pipe 4, the internal threads of the threaded holes 16 are engaged with a limiting device 18, and one side of the threaded hole 16 is connected to a receiving groove 17.

[0041] The limiting device 18 includes a threaded rod 181, a limiting protrusion 182 and a rotating block 183. The threaded rod 181 is threadedly engaged with the inside of the threaded hole 16, the limiting protrusion 182 is fixedly connected to one end of the threaded rod 181, and the rotating block 183 is fixedly connected to the other end of the threaded rod 181.

[0042] The working principle of the process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model is as follows:

[0043] During operation, the external tube 4 is first sleeved on the top of the outer surface of the intake pipe 3, the receiving groove 17 is connected to the limiting groove 15, the rotating block 183 is rotated to drive the threaded rod 181 to rotate, and the threaded rod 181 rotates to engage the threaded hole 16 and move toward the receiving groove 17, driving the limiting protrusion 182 to move and embed into the inside of the limiting groove 15, thereby limiting the external tube 4 to the outer surface of the intake pipe 3.

[0044] Compared with the related art, the process device for concentrating and absorbing silicon tetrafluoride gas provided by the utility model has the following beneficial effects:

[0045] The utility model provides a process device for concentrating and absorbing silicon tetrafluoride gas, wherein a threaded rod 181 is driven to rotate by rotating a rotating block 183, the threaded rod 181 rotates to engage with a threaded hole 16 to move, the threaded rod 181 is embedded in a limiting groove 15, and an external tube 4 is installed on the outer surface of an intake pipe 3. The device has a simple structure and strong practicality, and is convenient for disassembling and assembling the external tube 4 from the surface of the intake pipe, and is convenient for disassembling and repairing a cleaning device 6, and the disassembly and assembly method is convenient and simple.

[0046] The above description is only an embodiment of the present invention, and does not limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made by using the contents of the specification and drawings of the present invention, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A process device for concentrating and absorbing silicon tetrafluoride gas, characterized in that: include: Absorption box; An absorption chamber, wherein the absorption chamber is opened inside the absorption box, an air intake pipe is fixedly installed inside the absorption box, a connecting hole is opened in the middle of the top of the air intake pipe, and an external pipe is arranged on the top of the outer surface of the air intake pipe; A cleaning device, the cleaning device is fixedly installed inside the external tube, the cleaning device includes a mounting plate, a servo motor, a rotating soft rod and a spring, the mounting plate is fixedly installed inside the external tube, the servo motor is fixedly installed in the middle of the surface of the mounting plate, the rotating soft rod is fixedly connected to the output shaft of the servo motor, and the spring is arranged on the outer surface of the rotating soft rod.

2. A process device for concentration and absorption of silicon tetrafluoride gas according to claim 1, characterized in that: Elastic devices are arranged at the bottoms of both sides of the absorption chamber, and filter plates are arranged at the tops of the elastic devices.

3. A process device for concentrating and absorbing silicon tetrafluoride gas according to claim 1, characterized in that: A vibration device is arranged at the bottom of the other side of the inner wall of the absorption cavity.

4. A process device for concentration and absorption of silicon tetrafluoride gas according to claim 1, characterized in that: A liquid infusion tube is fixedly installed on one side of the outer surface of the absorption box, a pump body is arranged on the surface of the liquid infusion tube, and a spray head is arranged on the top of one side of the liquid infusion tube.

5. A process device for concentrating and absorbing silicon tetrafluoride gas according to claim 4, characterized in that: A discharge pipe is arranged at the other side of the outer surface of the absorption box, and a liquid discharge pipe is arranged at the bottom of the other side of the outer surface of the absorption box.

6. A process device for concentrating and absorbing silicon tetrafluoride gas according to claim 1, characterized in that: Threaded holes are provided on both sides of the outer surface of the external tube, the internal threads of the threaded holes are engaged with a limiting device, and one side of the threaded holes is connected to a receiving groove.

7. A process device for concentrating and absorbing silicon tetrafluoride gas according to claim 6, characterized in that: The limiting device comprises a threaded rod, a limiting protrusion and a rotating block, the threaded rod is threadedly engaged with the inside of the threaded hole, the limiting protrusion is fixedly connected to one end of the threaded rod, and the rotating block is fixedly connected to the other end of the threaded rod.

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