Thermal field component cleaning device and crystal bar drawing device

Abstract

The embodiment of the utility model provides a cleaning device of a thermal field component and a crystal bar drawing device. The cleaning device comprises a moving mechanism; the lifting mechanism is connected to the moving mechanism; the supporting plate is arranged on the lifting mechanism; the rotating support is rotationally connected to the supporting plate, and the rotating support is used for lifting a thermal field component; and the protective claws are connected to the supporting plate, the protective claws are arranged in the circumferential direction of the rotating support at intervals, a gap is formed between the protective claws and the rotating support, and the protective claws are used for preventing the thermal field component on the rotating support from toppling over. According to the cleaning device, disassembly and assembly of the thermal field component can be rapidly completed, the cleaning efficiency of the thermal field component is improved, and the universality is good.

Description

Technical Field

[0001] The present application belongs to the field of photovoltaic processing technology, and specifically relates to a cleaning device for thermal field components and a crystal rod pulling device. Background Art

[0002] RCZ (repeated crystal pulling) is a major method for preparing silicon rods at present, with high efficiency of pulling crystal rods. In the process of pulling crystal rods, thermal field components such as heat shields can be used to provide a thermal field environment, and their cleanliness affects the quality of the crystal rods. Therefore, after the single crystal furnace is shut down, the thermal field components usually need to be removed to clean the surface volatiles to facilitate reuse in the next furnace.

[0003] In the existing technology, a heat screen mobile vehicle is usually used to disassemble and transport heat screens and other thermal field components, and then the thermal field components are cleaned manually, which has a low efficiency in disassembly and cleaning of the thermal field components. Moreover, usually one heat screen mobile vehicle can only be used for disassembly and assembly of one thermal field component, and has poor versatility. Utility Model Content

[0004] The present application aims to provide a cleaning device for a thermal field component and a crystal rod pulling device, so as to solve the problems of low disassembly and cleaning efficiency and poor versatility of the existing thermal screen mobile vehicle.

[0005] In order to solve the above technical problems, this application is implemented as follows:

[0006] In a first aspect, the present application discloses a cleaning device for a thermal field component, the cleaning device comprising:

[0007] Mobile mechanism;

[0008] A lifting mechanism connected to the moving mechanism;

[0009] A support plate, wherein the support plate is arranged on the lifting mechanism;

[0010] A rotating support, the rotating support is rotatably connected to the support plate, and the rotating support is used to lift the thermal field component;

[0011] and a plurality of protective claws connected to the support plate, the plurality of protective claws being arranged at intervals along the circumference of the rotating support and having a spacing between the protective claws and the rotating support, the protective claws being used to prevent the thermal field component on the rotating support from tipping over.

[0012] Optionally, the cleaning device further comprises a slewing bearing, wherein the slewing bearing is connected between the rotating support and the support plate, and the rotating support is rotatably connected to the support plate via the slewing bearing.

[0013] Optionally, the slewing bearing comprises an outer ring and an inner ring which are arranged at intervals, and a rolling portion arranged between the outer ring and the inner ring, and the outer ring and the inner ring can rotate relative to each other through the rolling portion; wherein,

[0014] The rotating support is connected to one of the outer ring and the inner ring, and the other of the outer ring and the inner ring is connected to the support plate.

[0015] Optionally, the protective claw includes a mounting plate, an inclined plate and a straight plate; wherein,

[0016] The mounting plate is connected to the support plate and has a distance between it and the rotating support;

[0017] One end of the inclined plate is connected to one end of the mounting plate away from the rotating support, and the other end of the inclined plate extends upwardly and obliquely toward a side away from the rotating support;

[0018] One end of the straight plate is connected to the other end of the inclined plate, and the other end of the straight plate extends in a vertically upward direction.

[0019] Optionally,

[0020] The cleaning device also includes a cleaning piece, which is slidably connected to the support plate and is used to clean the thermal field component on the rotating support.

[0021] Optionally, the cleaning device further comprises a cleaning mechanism, the cleaning mechanism comprises a cleaning piece, and the cleaning piece is slidably connected to the support plate via the cleaning mechanism.

[0022] Optionally, the cleaning mechanism includes a bracket, a slide rail, a first locking member, a support frame and a cleaning member; wherein,

[0023] The slide rail is connected to the support plate and extends in the radial direction of the rotating support, the support frame is slidably connected to the slide rail, the first locking member is respectively connected to the support frame and the slide rail, and when the support frame slides to the first target position, the first locking member is used to lock the support frame at the first target position;

[0024] The support frame is connected to the bracket, and the cleaning piece is detachably connected to the support frame.

[0025] Optionally, the cleaning device further comprises a cleaning mechanism, and the cleaning mechanism comprises a bracket, a support frame and a cleaning member; wherein,

[0026] The bracket is fixedly or slidably connected to the support plate, and the support frame is slidably connected to the bracket.

[0027] Optionally, the support frame includes a second slider, a connecting rod, a second locking member and a fixing plate; wherein,

[0028] The bracket is provided with a slide bar;

[0029] The second slider is slidably connected to the slider, the connecting rod is connected between the second slider and the fixing plate, and the cleaning member is detachably connected to the fixing plate;

[0030] The second locking member is connected to the second slider and the slide bar respectively, and when the second slider moves to the second target position, the second locking member is used to lock the second slider at the second target position.

[0031] Optionally, the cleaning mechanism further includes: an elastic member, which is connected to the connecting rod and abuts against the bracket and the fixing plate respectively.

[0032] Optionally, the cleaning piece is a flexible cleaning piece, and the flexible cleaning piece is attached to the fixing plate;

[0033] The shape of the fixing plate is adapted to the shape of the thermal field component.

[0034] Optionally, the cleaning device further comprises a rotating handle, the rotating handle being connected to the rotating support, and the rotating handle being used to drive the rotating support to rotate. The number of the rotating handles is one or more, and when multiple rotating handles are provided, the multiple rotating handles are spaced apart along the circumference of the rotating support.

[0035] Optionally, the cleaning device further comprises: an oil cylinder assembly, the oil cylinder assembly comprising an oil cylinder body, an oil pump and a pressure relief valve, the oil pump and the pressure relief valve are both connected to the oil cylinder body through pipelines, and the oil cylinder body is connected to the lifting mechanism;

[0036] And / or, the moving mechanism includes a base and casters connected to the bottom of the base.

[0037] In a second aspect, the present application further discloses a crystal rod pulling device, the crystal rod pulling device comprising: a single crystal furnace and any one of the cleaning devices described above; wherein,

[0038] A thermal field component is arranged in the single crystal furnace, and the cleaning device can move relative to the single crystal furnace, and the cleaning device is used to clean the thermal field component.

[0039] In the embodiment of the present application, the lifting mechanism can be used to drive the rotary support on the support plate to lift and lower, so that the rotary support can lift the thermal field component. Since the rotary support is rotatably connected to the support plate, the thermal field component is driven to rotate by the rotary support, and the disassembly and assembly of the thermal field component can be completed quickly, thereby improving the cleaning efficiency of the thermal field component. Moreover, since the protective claw is connected to the support plate and has a spacing with the rotary support, it is convenient for the rotary support to lift the thermal field components of different sizes. Correspondingly, the protective claw can be used to prevent the dumping of the thermal field components of different sizes, so that the thermal field components of different sizes can share one cleaning device, thereby improving the versatility of the cleaning device. In addition, after the thermal field component is removed, the cleaning mechanism can be used to clean the outside of the thermal field component to avoid the operation of manually cleaning the thermal field component, realize automatic cleaning, and improve the cleaning efficiency of the thermal field component.

[0040] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0042] Figure 1 It is a structural schematic diagram of a cleaning device described in an embodiment of the present application;

[0043] Figure 2 yes Figure 1 A schematic structural diagram of the cleaning device from another angle shown;

[0044] Figure 3 yes Figure 1 The cleaning device shown is a schematic structural diagram from another angle;

[0045] Figure 4 yes Figure 1 The cleaning device shown is a schematic diagram of the structure of the thermal field component;

[0046] Figure 5 yes Figure 4 A schematic diagram of the structure from another angle of the structure shown;

[0047] Figure 6 This is a schematic diagram of the connection between a thermal field component and a heat exchanger in an embodiment of the present application;

[0048] Figure 7 is a cross-sectional view of a connection between a rotating support and a slewing bearing according to an embodiment of the present application;

[0049] Figure 8 is a schematic structural diagram of another cleaning device described in an embodiment of the present application;

[0050] Fig. 9 yes Figure 8 A schematic structural diagram of the cleaning device from another angle shown;

[0051] Fig.10 yes Figure 8 The cleaning device shown is a schematic structural diagram from another angle;

[0052] Fig.11 yes Figure 8 The cleaning device shown is a schematic diagram of the structure of the thermal field component;

[0053] Fig.12 yes Fig.11 A schematic diagram of the structure from another angle of the structure shown;

[0054] Fig.13 It is a structural schematic diagram of a cleaning mechanism described in an embodiment of the present application;

[0055] Fig.14 yes Fig.13 A schematic structural diagram of the cleaning mechanism from another angle is shown.

[0056] Figure numerals: 1-base, 2-universal brake wheel, 3-directional wheel, 4-lifting mechanism, 5-support plate, 6-rotating support, 7-protective claw, 71-mounting plate, 72-inclined plate, 73-straight plate, 80-cylinder body, 8-oil pump, 9-pressure relief valve, 10-second slider, 101-connecting rod, 102-fixed plate, 11-cleaning mechanism, 12-elastic member, 110-bracket, 111-sliding rod, 13-cleaning member, 14-second locking member, 15-thermal field component, 16-lifting ear, 17-slewing bearing, 18-hanging ear, 19-heat exchanger, 20-first slider, 21-slide rail, 22-first locking member, 23-rotating handle. DETAILED DESCRIPTION

[0057] The embodiments of the utility model will be described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the utility model, and cannot be understood as limiting the utility model. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0058] The term "first" or "second" in the specification and claims of this application may include one or more of the features explicitly or implicitly. In the description of this utility model, unless otherwise specified, "multiple" means two or more. In addition, "and / or" in the specification and claims means at least one of the connected objects, and the character " / " generally means that the objects connected before and after are in an "or" relationship.

[0059] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0060] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0061] The embodiment of the present application provides a cleaning device for a thermal field component, which can be used to remove the thermal field component from a single crystal furnace to clean the thermal field component, and install the cleaned thermal field component on the single crystal furnace. In the embodiment of the present application, the thermal field component may include but is not limited to any one of a heat shield and a guide tube, and the embodiment of the present application may not limit the specific content of the thermal field component.

[0062] Reference Figure 1 , showing a schematic diagram of the structure of a cleaning device according to an embodiment of the present application, referring to Figure 2 , showing Figure 1 The schematic diagram of the structure of the cleaning device from another angle is shown in FIG. Figure 3 , showing Figure 1 The cleaning device shown in FIG. Figure 4 , showing Figure 1 The cleaning device shown in the figure holds up the heat field component. Figure 5 , showing Figure 4 The structure diagram of another angle of the structure shown. Figures 1 to 5 As shown, the cleaning device may specifically include: a moving mechanism; a lifting mechanism 4, which is connected to the moving mechanism; a support plate 5, which is arranged on the lifting mechanism 4; a rotating support 6, which is rotatably connected to the support plate 5, and the rotating support 6 can be used to lift the thermal field component 15; and a plurality of protective claws 7, which are connected to the support plate 5, and the plurality of protective claws 7 are arranged at intervals along the circumference of the rotating support 6 and have a distance between them and the rotating support 6, and the protective claws 7 can be used to prevent the thermal field component 15 on the rotating support 6 from tipping over.

[0063] In the embodiment of the present application, the lifting mechanism 4 can be used to drive the rotating support 6 on the support plate 5 to lift and lower, so that the rotating support 6 can lift the thermal field component 15. Since the rotating support 6 is rotatably connected to the support plate 5, the thermal field component 15 is driven to rotate by the rotating support 6, and the disassembly and assembly of the thermal field component 15 can be completed quickly, thereby improving the cleaning efficiency of the thermal field component 15. Moreover, since the protective claw 7 is connected to the support plate 5 and there is a gap between it and the rotating support 6, it is convenient for the rotating support 6 to lift thermal field components 15 of different sizes. Accordingly, the protective claw 7 can be used to prevent the dumping of thermal field components 15 of different sizes, so that thermal field components 15 of different sizes can share one cleaning device, thereby improving the versatility of the cleaning device.

[0064] In a specific application, when it is necessary to remove the thermal field component 15 from the single crystal furnace for cleaning, the cleaning device can be pushed to the bottom of the thermal field component 15 so that the center of the thermal field component 15 is aligned with the center of the rotating support 6 on the cleaning device. Then, the support plate 5 and the rotating support 6 are driven to rise by the lifting mechanism 4 to lift the thermal field component 15. Then, the rotating support 6 is rotated to separate the thermal field component 15 from the single crystal furnace. Finally, the support plate 5 and the rotating support 6 are driven to descend by the lifting mechanism 4 to reduce the height of the thermal field component 15, so as to facilitate the transfer of the thermal field component 15 to the cleaning station for cleaning.

[0065] Reference Figure 6 , shows a schematic diagram of the connection between a thermal field component and a heat exchanger in an embodiment of the present application. Figure 6As shown, a heat exchanger 19 may be provided in the single crystal furnace, and a lug 18 with an opening is provided on the heat exchanger 19. A lifting lug 16 is provided on the thermal field component 15, and the lifting lug 16 can be connected to the lifting lug 18 from the opening, so as to connect the thermal field component 15 to the heat exchanger 19. Similarly, the lifting lug 16 can also be detached from the lifting lug 18 from the opening to achieve separation of the thermal field component 15 from the heat exchanger 19. Specifically in the embodiment of the present application, after the rotating support 6 lifts up the thermal field component 15, the lifting lug 16 can be detached from the lifting lug 18 from the opening by rotating the rotating support 6, so as to achieve separation of the thermal field component 15 from the heat exchanger 19, and remove the thermal field component 15 from the single crystal furnace.

[0066] Specific to Figure 6 After the rotating support 6 lifts up the thermal field component 15, the rotating support 6 rotates clockwise to separate the thermal field component 15 from the heat exchanger 19, so that the thermal field component 15 can be removed from the single crystal furnace for cleaning. Similarly, after the thermal field component 15 is cleaned, the rotating support 6 can be aligned with the center of the thermal field component 15 and the thermal field component 15 can be lifted up by the rotating support 6, and then the rotating support 6 can be rotated counterclockwise to connect the ear 16 of the thermal field component 15 to the ear 18 of the heat exchanger 19, so that the thermal field component 15 can be installed on the single crystal furnace, and the disassembly and assembly efficiency of the thermal field component 15 is extremely high.

[0067] like Figure 2 As shown, the mobile mechanism may include a base 1 and casters arranged at the bottom of the base 1, and the casters may include at least one of a universal brake wheel 2 and a fixed wheel 3. The casters can be used to assist the movement of the cleaning device to improve the convenience of the cleaning device in transporting the thermal field component 15.

[0068] In some optional embodiments of the present application, the cleaning device may further include a slewing bearing 17, the slewing bearing 17 is connected between the rotating support 6 and the support plate 5, and the rotating support 6 is rotatably connected to the support plate 5 through the slewing bearing 17. Since the slewing bearing 17 has the advantages of large load-bearing capacity, stable transportation and small rotation resistance, when the rotating support 6 is rotatably connected to the support plate 5 through the slewing bearing 17, it can have the advantages of stable transportation and small rotation resistance. In this way, the operator only needs to gently push the rotating support 6 to achieve the stable rotation of the rotating support 6 and the thermal field component 15, and to a certain extent avoid the risk of the thermal field component 15 tilting.

[0069] Reference Figure 7 , shows a cross-sectional view of the connection between a rotating support and a slewing bearing according to an embodiment of the present application. Figure 7As shown, the slewing bearing 17 may include an outer ring, an inner ring and a rolling portion arranged between the outer ring and the inner ring, and the outer ring and the inner ring can rotate relative to each other through the rolling portion; wherein the rotating support 6 is connected to one of the outer ring and the inner ring, and the other of the outer ring and the inner ring is connected to the support plate 5. In this way, the rotating support 6 can be smoothly rotated relative to the support plate 5 by the relative rotation between the outer ring and the inner ring.

[0070] Specifically, the rotating support 6 can be made of carbon-carbon composite material to be consistent with the material of the thermal field component 15. In this way, when the rotating support 6 is in direct contact with the thermal field component 15, damage to the thermal field component 15 can be avoided. The size of the rotating support 6 can be adapted to the bottom size of the thermal field component 15. In order to enable the rotating support 6 to fully support a variety of thermal field components 15 of different sizes, the specific size of the rotating support 6 can be adapted to the bottom size of the common largest thermal field component 15. For example, the common thermal field component 15 size is less than 37 inches, and the rotating support 6 can be adapted to the bottom size of the 37-inch thermal field component 15, so that the rotating support 6 can fully support the common thermal field components 15 less than 37 inches such as 28 inches, 30 inches, 32 inches, etc., to improve the versatility of the rotating support 6.

[0071] It should be noted that the embodiment of the present application only shows the case where the rotating support 6 is connected to the inner ring and the outer ring is connected to the support plate 5. In practical applications, the rotating support 6 can also be connected to the outer ring and the inner ring is connected to the support plate 5. Moreover, Figure 6 Only the situation that the rotating support 6 is connected to the inner ring by fasteners such as bolts and screws is shown. In actual application, the rotating support 6 can also be connected to the inner ring by bonding, clamping, etc. The embodiment of the present application does not specifically limit the connection method between the rotating support 6 and the slewing bearing 17.

[0072] like Figure 3 , Figure 7 As shown, the cleaning device may further include a rotating handle 23, which is connected to the rotating support 6, and the rotating handle 23 may be used to drive the rotating support 6 to rotate. In a specific operation, the operator may hold the rotating handle 23 and push the rotating handle 23 to rotate, so that the rotating support 6 and the thermal field component 15 on the rotating support 6 are driven to rotate together by the rotation of the rotating handle 23, so as to improve the convenience of the operator in rotating the rotating support 6.

[0073] like Figure 3As shown, the number of the rotating handles 23 is one or more. When multiple rotating handles are provided, the multiple rotating handles 23 are distributed at intervals along the circumference of the rotating support 6, so that the operator can hold any one of the multiple rotating handles 23 from multiple directions, so as to further improve the convenience of the operator in rotating the rotating support 6.

[0074] It should be noted that, in the drawings of the embodiment of the present application, only the number of rotating handles 23 is shown to be 6, and these 6 rotating handles 23 are evenly spaced along the circumference of the rotating support 6. In actual applications, the number of rotating handles 23 can also be 1, 2, 4 or 8, etc., and the rotating handles 23 can be evenly or unevenly distributed. The embodiment of the present application does not specifically limit the number and position of the rotating handles 23.

[0075] For example, the rotating handle 23 can be made of metal pipes such as stainless steel pipes and aluminum alloy pipes, and the metal pipes can be coated with heat-insulating or anti-skid and wear-resistant materials to facilitate the operator to hold. In addition, the rotating handle 23 can be placed horizontally and extend radially outward along the rotating support 6, so that it is convenient for the operator to hold the rotating handle 23, and it can also keep a certain distance between the operator's hand and the thermal field component 15 on the rotating support 6, thereby improving the operator's operating safety.

[0076] like Figure 1 As shown, the protective claw 7 may include a mounting plate 71, an inclined plate 72 and a straight plate 73; wherein the mounting plate 71 is connected to the support plate 5 and has the said spacing with the rotating support 6; one end of the inclined plate 72 is connected to one end of the mounting plate 71 away from the rotating support 6, and the other end of the inclined plate 72 extends upwardly at an angle toward a side away from the rotating support 6; one end of the straight plate 73 is connected to the other end of the inclined plate 72, and the other end of the straight plate 73 extends in a vertically upward direction.

[0077] In practical applications, the mounting plate 71 can be connected to the support plate 5 by fasteners such as bolts and screws to achieve reliable connection between the protective claw 7 and the support plate 5. By connecting the inclined plate 72 between the mounting plate 71 and the straight plate 73, not only can the radial space of the protective claw 7 along the rotating support 6 be increased, so that the space enclosed by the rotating support 6 can accommodate thermal field components 15 of different sizes. Moreover, the shape of the inclined plate 72 can also be adapted to the tapered portion at the bottom of the thermal field component 15, reducing the distance between the inclined plate 72 and the tapered portion of the thermal field component 15, so as to improve the reliability of the protective claw 7 in preventing the thermal field component 15 from tipping over.

[0078] For example, the mounting plate 71 , the inclined plate 72 and the straight plate 73 on the protective claw 7 can be made of stainless steel or a carbon-carbon composite material, etc. The embodiment of the present application does not specifically limit the material of the protective claw 7 .

[0079] Optionally, the cleaning device may further include: a cylinder assembly, which may be used to drive the lifting mechanism 4 to move up and down. In the embodiment of the present application, the cylinder assembly may be a split structure. Figure 1 As shown, the oil cylinder assembly specifically includes an oil cylinder body 80 , an oil pump 8 and a pressure relief valve 9 . The oil pump 8 and the pressure relief valve 9 are both connected to the oil cylinder body 80 through pipelines, and the oil cylinder body 80 is connected to the lifting mechanism 4 .

[0080] In a specific application, when the lifting mechanism 4 needs to be raised, the operator can trigger the oil pump 8 to drive the oil cylinder body 80 to extend through the oil pump 8, so that the lifting mechanism 4 is raised by the extension of the oil cylinder body 80. When the lifting mechanism 4 needs to be lowered, the operator can trigger the pressure relief valve 9 to control the shortening of the oil cylinder body 80 through the pressure relief valve 9, so that the lifting mechanism 4 is driven to descend by the shortening of the oil cylinder body 80, with high control accuracy and large lifting and lowering formation, so as to further improve the accuracy and efficiency of the cleaning device in disassembling and assembling the thermal field component 15.

[0081] It should be noted that since the cylinder assembly is a split structure, the oil pump 8, the pressure relief valve 9 and the cylinder body 80 are connected by pipes. The positions of the oil pump 8 and the pressure relief valve 9 can be flexibly set according to the operator's habits to improve the operator's operating experience of the cleaning device.

[0082] like Figure 1 As shown, the lifting mechanism 4 described in the embodiment of the present application can adopt a double-layer scissors-type structure to increase the lifting height of the lifting mechanism 4, thereby solving the problem that the furnace cover of the single crystal furnace is swung open too high due to the thermal field upgrade on site to lower the furnace cover for disassembly and assembly of the thermal field component 15, improving the disassembly and assembly efficiency of the thermal field component 15, and avoiding the risk of the furnace cover falling off due to the inability to use the furnace cover support frame due to lowering the furnace cover.

[0083] Reference Figure 8 , showing a schematic diagram of the structure of another cleaning device described in an embodiment of the present application, referring to Fig. 9 , showing Figure 8 The schematic diagram of the structure of the cleaning device from another angle is shown in FIG. Fig.10 , showing Figure 8 The cleaning device shown in FIG. Fig.11 , showing Figure 8 The cleaning device shown in the figure holds up the heat field component. Fig.12 , showing Fig.11 The structure diagram of another angle of the structure shown. Figures 8 to 12As shown, the cleaning device may further include a cleaning mechanism 11, which may be fixedly or slidably connected to the support plate 5, and the cleaning mechanism 11 may be used to clean the thermal field component 15 on the rotating support 6. That is, after the thermal field component 15 is removed, the cleaning mechanism 11 may be used to clean the outside of the thermal field component 15, so as to avoid the operation of manually cleaning the thermal field component 15, realize automatic cleaning, and improve the cleaning efficiency of the thermal field component 15.

[0084] Optionally, the cleaning mechanism 11 is slidably connected to the support plate 5 along the radial direction of the rotating support 6, so as to be suitable for cleaning thermal field components 15 of different sizes, thereby further improving the versatility of the cleaning device.

[0085] In practical applications, when the size of the thermal field component 15 on the rotating support 6 is small, the cleaning mechanism 11 can slide close to the rotating support 6 along the radial direction of the rotating support 6, so that the cleaning mechanism 11 contacts the thermal field component 15 to clean the thermal field component 15. Similarly, when the size of the thermal field component 15 on the rotating support 6 is large, the cleaning mechanism 11 can slide away from the rotating support 6 along the radial direction of the rotating support 6, so that the cleaning mechanism 11 contacts the thermal field component 15 to clean the thermal field component 15.

[0086] Reference Fig.13 , showing a schematic diagram of the structure of a cleaning mechanism according to an embodiment of the present application, referring to Fig.14 , showing Fig.13 The structural diagram of the cleaning mechanism from another angle is shown in FIG. Fig.13 , Fig.14 As shown, the cleaning device further includes a cleaning member 13, which is slidably connected to the support plate 5. Specifically, in one embodiment, there are three ways to achieve the sliding connection between the cleaning member and the support plate 5: (1) through the sliding connection between the bracket 110 and the support plate 5; (2) through the sliding connection between the support frame and the bracket 110; (3) through the sliding connection between the bracket 110 and the support plate 5, and between the support frame and the bracket 110. The implementation of the specific scheme will be described in detail below.

[0087] In some other optional embodiments of the present application, the cleaning mechanism 11 may specifically include a bracket 110, a slide rail 21, a first locking piece 22, a support frame and a cleaning piece 13; wherein the slide rail 21 is connected to the support plate 5 and extends radially along the rotating support 6, the bracket 110 is slidably connected to the slide rail 21, and the first locking piece 22 is respectively connected to the bracket 110 and the slide rail 21. When the bracket 110 slides to the first target position, the first locking piece 22 can be used to lock the bracket 110 at the first target position; the support frame is connected to the bracket 110, the cleaning piece 13 is connected to the support frame, and the cleaning piece 13 can be used to clean the thermal field component 15.

[0088] like Fig.13 As shown, the bottom of the bracket 110 may be provided with a first slider 20, and the first slider 20 may be slidably connected to the slide rail 21. The first locking member 22 may be a screw, a bolt, etc., and the first locking member 22 may be threadedly connected to the first slider 20 and the slide rail 21. In the case where the position of the cleaning mechanism 11 needs to be adjusted, the first locking member 22 may be rotated counterclockwise so that the first slider 20 may slide relative to the slide rail 21, so as to adjust the bracket 110 to the required first target position. Then, the first locking member 22 is rotated clockwise again until the first locking member 22 locks the first slider 20 to the slide rail 21, so that the bracket 110 remains in the first target position.

[0089] In a specific application, the cleaning member 13 can be a flexible cleaning member such as a rag or a scouring pad that can be used to clean the thermal field component 15, and the support frame can be used to support the cleaning member 13. When the support frame 110 is adjusted to the required first target position, the cleaning member 13 on the support frame can contact the thermal field component 15. In this way, by rotating the support frame 110 to drive the thermal field component 15 to rotate, the external cleaning of the thermal field component 15 can be achieved.

[0090] In some other optional embodiments of the present application, the cleaning mechanism 11 may include a bracket 110, a support frame and a cleaning piece 13; wherein the bracket 110 may be fixedly or slidably connected to the support plate 5, and the support frame is slidably connected to the bracket 110, and the position of the cleaning piece 13 may be adjusted by sliding the support frame relative to the bracket 110.

[0091] In a specific application, when the bracket 110 is slidably connected to the support plate 5, and the support frame is slidably connected to the bracket 110, the position of the cleaning member 13 can be adjusted by sliding the bracket 110 relative to the support plate 5 and the support frame relative to the bracket 110. When the bracket 110 is fixedly connected to the support plate 5 and the support frame is slidably connected to the bracket 110, the position of the cleaning member 13 can be adjusted by sliding the support frame relative to the bracket 110.

[0092] Specifically, when there is no need to clean the thermal field component 15, the support frame can slide toward the bracket 110 to avoid interference between the cleaning piece 13 on the support frame and the thermal field component 15, so that the rotating support 6 can lift the thermal field component 15. When it is necessary to clean the thermal field component 15, the support frame can slide toward the rotating support 6 so that the cleaning piece 13 on the support frame can abut against the thermal field component 15.

[0093] like Fig.13 As shown, the support frame may include a second slider 10, a connecting rod 101, a second locking member 14 and a fixed plate 102; the second slider 10 may be arranged in a bracket 110, one end of the connecting rod 101 may extend into the bracket 110 and be connected to the second slider 10, and the other end of the connecting rod 101 may be exposed from the bracket 110 and be connected to the fixed plate 102. Among them, a sliding rod 111 is arranged in the bracket 110; the second slider 10 is slidably connected to the sliding rod 111, the connecting rod 101 is connected between the second slider 10 and the fixed plate 102, and the cleaning member 13 is detachably connected to the fixed plate 102; the second locking member 14 is respectively connected to the second slider 10 and the sliding rod 111, and when the second slider 10 moves to the second target position, the second locking member 14 may be used to lock the second slider 10 at the second target position.

[0094] In a specific application, the second locking member 14 can be threadedly connected with the second slider 10 and the slide bar 111. When the position of the cleaning mechanism 11 needs to be adjusted, the second locking member 14 can be rotated counterclockwise so that the second slider 10 can slide relative to the slide bar 111, so as to adjust the second slider 10 to the desired second target position. Then, the second locking member 14 is rotated clockwise until the second locking member 14 locks the second slider 10 to the slide bar 111, so that the second slider 10 remains at the second target position, and the position adjustment is achieved.

[0095] In practical applications, the cleaning piece 13 can be detachably connected to the fixed plate 102 by means of snap connection, bonding, or the like. The embodiment of the present application does not specifically limit the connection method of the cleaning piece 13 on the fixed plate 102.

[0096] Optionally, the cleaning piece 13 can be a flexible cleaning piece such as a scouring pad, and the flexible cleaning piece is attached to the fixed plate 102; the shape of the fixed plate 102 is adapted to the shape of the thermal field component 15, so that the cleaning piece 13 can fully fit to the thermal field component 15, thereby improving the cleaning effect of the cleaning piece 13 on the thermal field component 15.

[0097] For example, in the thermal field component 15 such as Figure 5In the case shown in which the conical portion and the columnar portion at the bottom are included, the fixing plate 102 may include an inclined section and a vertical section located above the inclined section to adapt to the shape of the thermal field component 15 so that the cleaning piece 13 can be fully fitted with the thermal field component 15.

[0098] like Fig.13 As shown, the cleaning mechanism 11 may further include an elastic member 12, which is connected to the connecting rod 101 and respectively abuts against the bracket 110 and the fixing plate 102. The elastic member 12 may provide a certain elastic force to the fixing plate 102, so that the cleaning member 13 on the fixing plate 102 may fit closely with the thermal field component 15, thereby improving the cleaning effect of the cleaning member 13 on the thermal field component 15.

[0099] For example, the elastic member 12 may be a spring sleeved on the connecting rod 101 , or the elastic member 12 may be a spring sheet fixed on the connecting rod 101 . The embodiment of the present application does not specifically limit the specific arrangement of the elastic member 12 .

[0100] In practical applications, after the thermal field component 15 is transported to the cleaning station, the cleaning mechanism 11 can be used to clean the outer surface of the thermal field component 15. When the bracket 110 is slidably connected to the support plate 5, the first locking member 22 can be rotated so that the first slider 20 can slide relative to the slide rail 21, so that the bracket 110 moves close to the thermal field component 15. When the bracket 110 is adjusted to the required first target position, the first locking member 22 can be rotated again until the first locking member 22 locks the first slider 20 to the slide rail 21, so that the bracket 110 remains in the first target position. When the bracket 110 is fixedly connected to the support plate 5, this step can be ignored.

[0101] Next, the second locking member 14 can be rotated so that the second slider 10 can slide relative to the slide bar 111, so as to adjust the second slider 10 to the desired second target position, at which time the cleaning member 13 on the fixed plate 102 can fully abut against the thermal field component 15. Then, the second locking member 14 is rotated again until the second locking member 14 locks the second slider 10 to the slide bar 111, so that the second slider 10 is maintained at the second target position, so as to achieve reliable abutment between the cleaning member 13 and the thermal field component 15.

[0102] Finally, the operator can hold the rotating handle 23 and push the rotating handle 23 to rotate, so that the rotating support 6 and the thermal field component 15 on the rotating support 6 can be driven to rotate together through the rotation of the rotating handle 23, so as to complete the cleaning of the outer surface of the thermal field component 15 through the rotation of the thermal field component 15 relative to the cleaning piece 13.

[0103] In summary, the cleaning device described in the embodiment of the present application can at least include the following advantages:

[0104] In the embodiment of the present application, the lifting mechanism can be used to drive the rotary support on the support plate to lift and lower, so that the rotary support can lift the thermal field component. Since the rotary support is rotatably connected to the support plate, the thermal field component is driven to rotate by the rotary support, and the disassembly and assembly of the thermal field component can be completed quickly, thereby improving the cleaning efficiency of the thermal field component. Moreover, since the protective claw is connected to the support plate and has a spacing with the rotary support, it is convenient for the rotary support to lift the thermal field components of different sizes. Correspondingly, the protective claw can be used to prevent the dumping of the thermal field components of different sizes, so that the thermal field components of different sizes can share one cleaning device, thereby improving the versatility of the cleaning device. In addition, after the thermal field component is removed, the cleaning mechanism can be used to clean the outside of the thermal field component to avoid the operation of manually cleaning the thermal field component, realize automatic cleaning, and improve the cleaning efficiency of the thermal field component.

[0105] An embodiment of the present application also provides a crystal rod pulling device, which may specifically include a single crystal furnace and any one of the cleaning devices described above; wherein a thermal field component is provided in the single crystal furnace, the cleaning device can be moved relative to the single crystal furnace, and the cleaning device is used to clean the thermal field component.

[0106] It should be noted that in the embodiment of the present application, the specific structure of the cleaning device is the same as the structure of the cleaning device described in any of the above embodiments, and its beneficial effects are also similar, which will not be repeated here.

[0107] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0108] Although the embodiments of the present invention have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A cleaning device for thermal field components, characterized in that: The cleaning device comprises: Mobile mechanism; A lifting mechanism (4), the lifting mechanism (4) being connected to the moving mechanism; A support plate (5), wherein the support plate (5) is arranged on the lifting mechanism (4); A rotating support (6), the rotating support (6) being rotatably connected to the support plate (5), and the rotating support (6) being used to lift the thermal field component (15); and a plurality of protective claws (7), wherein the protective claws (7) are connected to the support plate (5), the plurality of protective claws (7) are arranged at intervals along the circumference of the rotating support (6) and have a spacing with the rotating support (6), and the protective claws (7) are used to prevent the thermal field component (15) on the rotating support (6) from tipping over.

2. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises a slewing bearing (17), wherein the slewing bearing (17) is connected between the rotating support (6) and the support plate (5), and the rotating support (6) is rotatably connected to the support plate (5) via the slewing bearing (17).

3. The cleaning device according to claim 2, characterized in that: The slewing bearing (17) comprises an outer ring and an inner ring arranged at intervals, and a rolling portion arranged between the outer ring and the inner ring, and the outer ring and the inner ring can rotate relative to each other through the rolling portion; wherein, The rotating support (6) is connected to one of the outer ring and the inner ring, and the other of the outer ring and the inner ring is connected to the supporting plate (5).

4. The cleaning device according to claim 1, characterized in that: The protective claw (7) comprises a mounting plate (71), an inclined plate (72) and a straight plate (73); wherein: The mounting plate (71) is connected to the support plate (5) and has a distance between it and the rotating support (6); One end of the inclined plate (72) is connected to one end of the mounting plate (71) away from the rotating support (6), and the other end of the inclined plate (72) extends upwardly and obliquely toward a side away from the rotating support (6); One end of the straight plate (73) is connected to the other end of the inclined plate (72), and the other end of the straight plate (73) extends in a vertically upward direction.

5. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises a cleaning piece (13), wherein the cleaning piece (13) is slidably connected to the support plate (5), and the cleaning piece (13) is used to clean the thermal field component (15) on the rotating support (6).

6. The cleaning device according to claim 5, characterized in that: The cleaning device further comprises a cleaning mechanism (11), the cleaning mechanism (11) comprises a cleaning piece (13), and the cleaning piece (13) is slidably connected to the support plate (5) through the cleaning mechanism (11).

7. The cleaning device according to claim 6, characterized in that: The cleaning mechanism (11) comprises a bracket (110), a slide rail (21), a first locking member (22), a support frame and a cleaning member (13); wherein: The slide rail (21) is connected to the support plate (5) and extends in the radial direction of the rotating support (6); the bracket (110) is slidably connected to the slide rail (21); the first locking member (22) is respectively connected to the bracket (110) and the slide rail (21); when the bracket (110) slides to a first target position, the first locking member (22) is used to lock the bracket (110) at the first target position; The support frame is connected to the bracket (110), and the cleaning piece (13) is detachably connected to the support frame.

8. The cleaning device according to any one of claims 5 to 7, characterized in that: The cleaning device further comprises a cleaning mechanism (11), the cleaning mechanism (11) comprising a bracket (110), a support frame and a cleaning member (13); wherein the bracket (110) is connected to the support plate, the support frame is slidably connected to the bracket (110), the support frame comprises a second sliding block (10), a connecting rod (101), a second locking member (14) and a fixing plate (102); wherein, The bracket (110) is provided with a sliding rod (111); The second sliding block (10) is slidably connected to the sliding rod (111), the connecting rod (101) is connected between the second sliding block (10) and the fixing plate (102), and the cleaning member (13) is detachably connected to the fixing plate (102); The second locking member (14) is respectively connected to the second slider (10) and the slide bar (111); when the second slider (10) moves to a second target position, the second locking member (14) is used to lock the second slider (10) at the second target position.

9. The cleaning device according to claim 8, characterized in that: The cleaning mechanism (11) further comprises an elastic member (12), wherein the elastic member (12) is connected to the connecting rod (101) and abuts against the bracket (110) and the fixing plate (102) respectively.

10. The cleaning device according to claim 9, characterized in that: The cleaning piece (13) is a flexible cleaning piece, and the flexible cleaning piece is attached to the fixing plate (102); The shape of the fixing plate (102) is adapted to the shape of the thermal field component (15).

11. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises one or more rotating handles (23), wherein the rotating handles (23) are connected to the rotating support (6). When a plurality of rotating handles (23) are provided, the plurality of rotating handles (23) are spaced apart along the circumference of the rotating support (6) and are used to drive the rotating support (6) to rotate.

12. The cleaning device according to claim 1, characterized in that: The cleaning device further comprises: an oil cylinder assembly, the oil cylinder assembly comprising an oil cylinder body (80), an oil pump (8) and a pressure relief valve (9), the oil pump (8) and the pressure relief valve (9) are both connected to the oil cylinder body (80) through pipelines, and the oil cylinder body (80) is connected to the lifting mechanism (4); And / or, the moving mechanism includes a base and casters connected to the bottom of the base.

13. A crystal rod pulling device, characterized in that: The crystal rod pulling device comprises: a single crystal furnace and a cleaning device according to any one of claims 1 to 12; wherein, A thermal field component is arranged in the single crystal furnace, and the cleaning device can move relative to the single crystal furnace, and the cleaning device is used to clean the thermal field component.

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