Metal grid structure capable of preventing electrostatic injury

Abstract

The utility model discloses a metal grid structure capable of preventing static damage. The metal grid structure comprises a substrate, the plurality of Metal Mesh in-plane areas are arranged on the substrate; a Metal Mesh routing area is distributed on the periphery of the metal Mesh in-plane area; a metal Mesh wiring area is distributed on the periphery of the metal Mesh in-plane area; lines extend out of the plurality of Metal Mesh in-plane areas through the corresponding binding areas and the electrical logging lead areas; one end of the anti-static area is connected with the Mesh line in the electrical logging lead area, and the other end of the anti-static area is connected with the chromium plate area in the photomask; the anti-static area is composed of a plurality of anti-static array units, each anti-static array unit comprises a plurality of anti-static Mesh lines which are arranged in parallel, and the line width of the anti-static Mesh lines is smaller than the Mesh line width of the Metal Mesh in-plane area and the Mesh line width of the Metal Mesh wiring area; according to the utility model, static electricity generated in the manufacturing process is led to the anti-static area, the damage caused by the static electricity of the Mesh line is avoided, the yield of the manufacturing process is high, the static electricity in the anti-static area is led to the ground through the chromium plate area, and the line breakage of the photomask is avoided.

Description

Technical Field

[0001] The utility model relates to a metal grid structure, in particular to a metal grid structure capable of preventing electrostatic damage. Background Art

[0002] The preparation process of Metal Mesh flexible touch sensor requires processes such as photoresist coating, baking, exposure, development, etching, degumming, and blackening. The metal mesh structure is an important component of Metal Mesh flexible touch sensor. Static electricity will be generated during the preparation process of Metal Mesh flexible touch sensor. When the static electricity accumulates to a certain level, the smaller mesh wires in the metal mesh structure will be damaged by static electricity, causing the mesh wires to break and cause functional failure. Static electricity is more likely to form when the humidity in the production workshop is low, or when there is friction between Metal Mesh sensors, between Metal Mesh sensors and equipment, or when the protective film on the surface of the Metal Mesh sensor is torn off.

[0003] In addition, when the Metal Mesh sensor absorbs vacuum and breaks vacuum during the exposure process, there is friction between the Metal Mesh plate and the mask. This friction will generate a certain amount of static electricity. When the static electricity accumulates to a certain level in the metal mesh structure, it will break through the circuit on the mask and cause the circuit in the exposure area of ​​the mask to break. When the Metal Mesh sensor is exposed under the broken mask, the broken Metal Mesh will be automatically exposed, causing the Metal Mesh to malfunction. Utility Model Content

[0004] The utility model aims to overcome the shortcomings of the prior art and provide a metal mesh structure that is anti-statically-damaged. In the manufacturing process of a Metal Mesh sensor, the Mesh wires in the metal mesh structure will not be damaged by static electricity, and the anti-static ability is strong, thereby ensuring that the Metal Mesh sensor has complete functions.

[0005] In order to achieve the above-mentioned purpose, the technical solution adopted by the utility model is: a metal grid structure for preventing electrostatic damage, comprising:

[0006] substrate;

[0007] Metal Mesh in-plane regions, a plurality of the Metal Mesh in-plane regions being arranged on the substrate;

[0008] The Metal Mesh routing area is distributed around the area within the Metal Mesh surface;

[0009] An electrical test lead area, wherein a plurality of lines within the metal mesh surface area extend outward from the electrical test lead area through corresponding binding areas;

[0010] An anti-static area, one end of which is connected to the Mesh line in the electrical test lead area, wherein the anti-static area is composed of a plurality of parallel anti-static array units, each of which includes a plurality of parallel anti-static Mesh lines, and the line width of the anti-static Mesh line is smaller than the Mesh line width of the Metal Mesh in-plane area and the Metal Mesh routing area;

[0011] The photomask is distributed along the four sides of the substrate, and the other end of the antistatic area is connected to the chrome plate area in the photomask. The four corners of the chrome plate area of ​​the photomask are provided with conductive parts.

[0012] Furthermore, the two Metal Mesh in-plane regions are arranged opposite to each other on the substrate.

[0013] Furthermore, the test lead area is connected to the pins on the external electrical test fixture by overlapping; the electrical test fixture, the electrical test lead area, and the binding area form an electrical test loop.

[0014] Furthermore, the anti-static Mesh line width in the anti-static area is at least 0.5 um smaller than the Mesh line width in the Metal Mesh in-plane area.

[0015] Furthermore, the anti-static area can be cut and connected to the Mesh line in the electrical test lead area.

[0016] Furthermore, the conductive component is conductive foam.

[0017] Due to the application of the above technical solution, the utility model has the following advantages compared with the prior art:

[0018] The anti-static metal mesh structure of the utility model has an anti-static area connected to the end of the electrical measurement lead area, and the line width of the anti-static Mesh line in the anti-static area is shorter than the line width of the Mesh line in the Metal Mesh surface area and the Metal Mesh routing area, thereby directing the static electricity generated in the process to the anti-static area, avoiding the accumulation of static electricity in the Metal Mesh surface area and the Metal Mesh routing area, enhancing the anti-static ability of the metal mesh structure, preventing the Mesh line from being damaged by static electricity, ensuring the complete function of the Metal Mesh sensor, and improving the process yield.

[0019] At the same time, conductive components are attached to the four corners of the chrome plate area of ​​the mask. The static electricity generated during the exposure process is concentrated on the anti-static Mesh line in the anti-static area. The concentrated static electricity will be introduced into the chrome plate area of ​​the mask, and the conductive components will introduce the static electricity into the ground. In this way, the static electricity generated during the exposure process can be effectively dissipated, avoiding the breakage of the mask. The service life of the mask can be extended by more than 50 times. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The technical solution of the utility model is further described below in conjunction with the accompanying drawings:

[0021] Figure 1 This is a schematic diagram of the structure of an embodiment of the utility model;

[0022] Figure 2 for Figure 1 A magnified view of part A in FIG.

[0023] Figure 3 It is a partial schematic diagram of the connection between the anti-static unit and the electrical test lead area in one embodiment of the utility model;

[0024] Among them: substrate 1, Metal Mesh in-plane area 2, Metal Mesh routing area 3, electrical measurement lead area 4, binding area 5, anti-static area 6, mask 7, conductive component 8, Mesh line 20, electrical measurement Mesh line 40, anti-static Mesh line 60, chrome plate area 71. DETAILED DESCRIPTION

[0025] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present application.

[0026] The utility model provides a metal mesh structure that is anti-static, so as to solve the problem in the prior art that static electricity is generated in the production process of the MetalMesh sensor. When the static electricity accumulates to a certain level, the metal mesh with a smaller line width will be electrostatically damaged, resulting in the disconnection of the Mesh line and the failure of the function.

[0027] For ease of understanding, the specific process in the embodiments of the present application is described below. Figures 1 to 3A metal mesh structure for preventing electrostatic damage in an embodiment of the present application includes a substrate 1, a Metal Mesh in-surface area 2, a Metal Mesh wiring area 3, an electrical test lead area 4, a binding area 5, an anti-static area 6 and a mask 7. The utility model prevents the Metal Mesh in-surface area 2 and the Metal Mesh wiring area 3 from being damaged by electrostatic discharge by setting an anti-static area 6, effectively protecting the Mesh wires in the Metal Mesh in-surface area 2 and the Metal Mesh wiring area 3 from being broken, and the metal mesh structure has a high yield rate, ensuring the complete functions of subsequent products.

[0028] Specifically, the two Metal Mesh in-plane areas 2 are relatively arranged on the substrate 1, and the Metal Mesh in-plane area 2 is composed of countless diamond grids, and its Mesh line 20 is relatively small, about 2 to 5um; the Metal Mesh routing area 3 is distributed along the four sides of the Metal Mesh in-plane area 2, and the line width and line spacing of the Mesh line 20 in the Metal Mesh routing area 3 are between 10um / 10um and 30um / 30um.

[0029] The two electrical test lead areas 4 respectively extend the lines in the two Metal Mesh surface areas 2 outward through the corresponding binding areas 5. The electrical test lead area 4 is mainly used for electrical function testing of the metal mesh structure. During the test, the electrical test lead area 4 will be overlapped with the pin feet on the external electrical test fixture, so that the electrical test fixture, the electrical test lead area 4, and the binding area 5 form an electrical test loop to determine whether there is a short circuit or an open circuit in the metal mesh structure.

[0030] One end of the antistatic area 6 is connected to the electrical measurement Mesh line 40 in the electrical measurement lead area 4. In this embodiment, the antistatic area 6 is composed of a plurality of parallel antistatic array units, each of which includes a plurality of parallel antistatic Mesh lines 60, and the antistatic Mesh line 60 is connected to the electrical measurement Mesh line 40. Among them, the antistatic Mesh lines 60 can be 3 or 5, and the number of antistatic Mesh lines 60 is defined according to the product structure and size. The line width of the antistatic Mesh line 60 is smaller than the Mesh line width 20 of the Metal Mesh routing area 3 and the Metal Mesh in-plane area 2; specifically, the line width of the antistatic Mesh line 60 is at least 0.5um smaller than the Mesh line width 20 of the Metal Mesh in-plane area 2. For example, when the Mesh line width of the Metal Mesh in-plane area 2 is 3.5um, the line width of the antistatic Mesh line 60 can be designed to be less than or equal to 3um.

[0031] During operation, when static electricity exists in the Metal Mesh sensor during the manufacturing process, since the line width of the anti-static Mesh line 60 is smaller than the width of the Mesh line 20 in area 2 within the Metal Mesh surface, the static electricity will gradually gather on the anti-static Mesh line 60 and will not gather on the Mesh line 20 in area 2 within the Metal Mesh surface. In this way, the risk of static electricity damage to the Mesh line in area 2 within the Metal Mesh surface can be reduced, preventing the Metal Mesh sensor from malfunctioning.

[0032] Compared with the line width of the Mesh in area 2 within the Metal Mesh surface, the line width of the Mesh in area 3 of the Metal Mesh routing is larger, and static electricity is not easily accumulated here. Therefore, the risk of static electricity injury in the Metal Mesh routing area is relatively small. Therefore, the static electricity accumulated on the Mesh lines in area 2 within the Metal Mesh surface and in area 3 of the Metal Mesh routing is transferred to the anti-static Mesh line 60 through the anti-static Mesh line 60, thereby improving the yield rate of the metal mesh structure after the process.

[0033] In addition, the anti-static area 6 will not always stay in the metal mesh structure. After the large plate of the metal mesh structure is punched into small pieces of the metal mesh structure, the anti-static area 6 will also be punched out at the same time. Therefore, the anti-static area only plays a protective role in the preparation process of the MetalMesh sensor and will not affect the product after production.

[0034] Secondly, in the process of printing insulation, laminating PET, laminating OCA, tearing protective film, punching small pieces, etc. of the large plate of the metal mesh structure, a certain amount of static electricity will be generated, and the accumulated static electricity will gather on the anti-static Mesh wire in the anti-static area 6. When a certain anti-static Mesh wire in the anti-static area 6 is broken due to excessive static electricity accumulation, since the anti-static array unit is composed of multiple anti-static Mesh wires 60, one of the anti-static Mesh wires is broken, and the remaining anti-static Mesh wires 60 are still connected to the Mesh wires in the electrical test lead area 4, the static electricity generated in the process can also be introduced into the ground through other anti-static Mesh wires 60, so that the electrical test of the product will not be affected by the accumulation of static electricity, which improves the safety during the test.

[0035] The photomask 7 is distributed along the four sides of the substrate 1, and the other end of the antistatic area 6 is connected to the chrome plate area 71 in the photomask 7, and the four corners of the photomask 7 are attached with conductive components 8. During the process, the static electricity generated during the exposure process can be concentrated on the antistatic Mesh line of the antistatic area 6, and the concentrated static electricity will be introduced into the photomask 7 area, and the conductive component 8 will introduce the static electricity of the photomask 7 into the ground. In this way, the antistatic Mesh line 60 in the antistatic area 6, the chrome plate area of ​​the photomask, and the four conductive components 8 can form an integrated static electricity dissipation system, so that the static electricity generated during the exposure process can be effectively dissipated, avoiding the photomask 7 from breaking, and the service life of the photomask can be extended by more than 50 times.

[0036] Furthermore, the conductive component 8 in the present embodiment is conductive foam, but it may be made of other materials as long as it can meet the use requirements.

[0037] To sum up, the anti-static metal mesh structure of the utility model can concentrate the static electricity generated on the anti-static Mesh wire in the anti-static area during the relevant process of the metal mesh structure, and finally conduct the static electricity to the ground through the conductive components during exposure; secondly, even if the static electricity breaks through a certain anti-static Mesh wire in the anti-static area 6, it will not affect the electrical testing of the product. At the same time, the anti-static area will be cut off when it is made into small pieces, which will not affect the production of the product.

[0038] As described above, the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A metal grid structure for preventing electrostatic damage, characterized in that: include: substrate; MetalMesh in-plane regions, a plurality of the MetalMesh in-plane regions being arranged on the substrate; The MetalMesh routing area is distributed around the area within the MetalMesh surface; An electrical test lead area, wherein a plurality of lines within the Metal Mesh surface area extend outward from the electrical test lead area through corresponding binding areas; An anti-static area, one end of which is connected to the Mesh line in the electrical test lead area, wherein the anti-static area is composed of a plurality of parallel anti-static array units, each of which includes a plurality of parallel anti-static Mesh lines, and the line width of the anti-static Mesh line is smaller than the Mesh line width of the MetalMesh in-plane area and the MetalMesh routing area; The photomask is distributed along the four sides of the substrate, and the other end of the antistatic area is connected to the chrome plate area in the photomask. The four corners of the chrome plate area of ​​the photomask are provided with conductive parts.

2. The metal grid structure for preventing electrostatic damage according to claim 1, characterized in that: The two MetalMesh in-plane regions are arranged opposite to each other on the substrate.

3. The metal grid structure for preventing electrostatic damage according to claim 1, characterized in that: The test lead area is connected to the pins on the external electric test fixture by lap connection; the electric test fixture, the electric test lead area, and the binding area form an electric test loop.

4. The metal grid structure for preventing electrostatic damage according to claim 1, characterized in that: The anti-static Mesh line width of the anti-static area is at least 0.5 um smaller than the Mesh line width of the Metal Mesh in-plane area.

5. The metal grid structure for preventing electrostatic damage according to claim 1, characterized in that: The anti-static area can be cut and connected to the Mesh line in the electrical test lead area.

6. The metal grid structure for preventing electrostatic damage according to claim 1, characterized in that: The conductive component is conductive foam.

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