Photolithography mask storage box with high applicability
By designing an automated lithography plate storage box, and automatically opening and closing using structures such as slide covers and magnets, the problem of easy damage during storage and transportation of traditional lithography plates is solved, and the protection and use environment of lithography plates are improved.
Patent Information
- Application Number
- CN202420157218.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-23
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2034-01-23
AI Technical Summary
During the storage and transportation of traditional lithography plates, particles are easily introduced into particles and dust and contamination, resulting in damage to the lithography plates and requires frequent manual transfer, which increases operational risks.
A lithography storage box with high applicability is designed, using the sliding cover opening method of the upper slide cover and the front flip cover. The box body is equipped with slide rails, push rods, spring posts and magnets to realize automatic push-opening and closing, reducing manual operation, and the internal support blocks and stops stabilize the lithography position, and the pressing blocks and springs provide buffer protection.
It realizes the automatic transportation and preservation of lithography versions, reduces manual operation, avoids the risks of dust and contamination, and improves the protection and use environment of lithography versions.
Smart Images
Figure CN222592245U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photolithography plate storage boxes, in particular to a photolithography plate storage box with high applicability. Background Art
[0002] The circuit element patterns on semiconductor silicon wafers all come from the layout, so the quality of the photomask plays a very important role in the photolithography process. The photomask is the benchmark and blueprint for photolithography replication patterns. Any defects on the photomask will have a serious impact on the final graphic accuracy, so the photomask must remain "perfect" during use and storage. A mask box is required during the use and turnover of the photomask, so the structural requirements for the mask box are particularly high. In the semiconductor industry, in wafer manufacturing and wafer-level packaging processes of advanced packaging, the photolithography process is still the core process, and the photomask is a very important fixture, so it needs to be protected and stored during the production process.
[0003] The traditional way is that after the photoresist is produced, the manufacturer will make a preliminary storage box. After it is sent to the fab workshop, before each loading on the photolithography machine, it needs to be manually taken out of the storage box and transferred to the photoresist loading box dedicated to the photolithography machine. This manual intervention and multiple taking and placing will greatly introduce particles of dust and even contaminate and damage the photoresist. Utility Model Content
[0004] The utility model aims to solve the shortcomings in the prior art and provides a photolithography plate storage box with high applicability.
[0005] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a photolithography plate storage box with high applicability, comprising an upper sliding cover, a box body, a front flip cover, and a photolithography plate, wherein a slide rail 1 is provided in the box body, a push rod is slidably connected to the slide rail 1, a tension spring column is provided on the slide rail 1, a tension spring is fixedly connected to the tension spring column, one end of the tension spring is fixedly connected to one end of the push rod, one end of the push rod is hinged to a long connecting rod, one end of the long connecting rod is hinged to a rotating rod, the rotating rod is rotatably connected to the box body through a rotating shaft, one end of the rotating rod is hinged to a short connecting rod, one end of the short connecting rod is hinged to a slider, one side of the slider is fixedly connected to a magnet 1, and a limit column is provided in the box body.
[0006] As a further description of the above technical solution:
[0007] The upper sliding cover is slidably connected to the box body, one side of the upper sliding cover is rotatably connected to the front flip cover, and two sides of the box body are fixedly connected to loading support edges.
[0008] As a further description of the above technical solution:
[0009] The lower surface of the upper slide cover is fixedly connected with a magnet seat, one side of the magnet seat is fixedly connected with a second magnet, the lower surface of the upper slide cover is fixedly connected with a bump, the bump is provided with two groups, and the two groups of bumps are symmetrically distributed on both sides of the upper slide cover.
[0010] As a further description of the above technical solution:
[0011] A spring seat is fixedly connected in the box body, and two groups of spring seats are provided. The two groups of spring seats are symmetrically distributed in the box body. A spring is fixedly connected in the spring seat, and a pressure block is fixedly connected above the spring. The pressure block fits the photolithography plate.
[0012] As a further description of the above technical solution:
[0013] A support block is fixedly connected in the box body, and the support block is provided with four groups. The four groups of support blocks are evenly distributed in the box body. A stop block is fixedly connected in the box body, and the photolithography plate is placed between the support block and the stop block.
[0014] As a further description of the above technical solution:
[0015] The limiting column limits the rotating rod.
[0016] As a further description of the above technical solution:
[0017] The first magnet is magnetically connected to the second magnet.
[0018] The utility model has the following beneficial effects:
[0019] 1. In the utility model, the drawer-type photolithography plate transport box can not only achieve the purpose of transportation and storage, but also has loading support edges on both sides of the box body and can be directly used to load it into the photolithography machine for use. The low cost and light structure realize dual uses of one box, avoid frequent manual transfer operations, and improve the use environment of the photolithography plate.
[0020] 2. In the utility model, a sliding cover is adopted to open the cover, and the front cover is automatically pushed open, which is more convenient and faster than manual opening and closing of the cover. There are loading support edges on both sides of the box body, and the photolithography plate can be directly used on the photolithography machine after sliding open. The internal support block and the stop block stabilize the position of the photolithography plate. There is a spring under the pressure plate. After the cover is slid on, the pressure block presses the photolithography plate, and the spring is used for buffering, which further improves the protection of the photolithography plate and increases the stability of transportation. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] Figure 1 This is a structural schematic diagram of a highly applicable photolithography plate storage box proposed by the utility model;
[0022] Figure 2This is a schematic diagram of the internal structure of a highly applicable photolithography plate storage box proposed by the utility model;
[0023] Figure 3 for Figure 2 A enlarged view in;
[0024] Figure 4 The utility model discloses a cross-sectional view of a photolithography plate storage box with high applicability for pressing a photolithography plate.
[0025] Legend:
[0026] 1. Upper slide cover; 2. Box body; 3. Loading support edge; 4. Front flip cover; 5. Push rod; 6. Long connecting rod; 7. Rotating rod; 8. Short connecting rod; 9. Slider; 10. Magnet 1; 11. Tension spring; 12. Tension spring stop; 13. Slide rail 1; 14. Rotating shaft; 15. Limiting column; 16. Slide rail 2; 17. Magnet 2; 18. Magnet seat; 19. Press block; 20. Spring; 21. Spring seat; 22. Bump; 23. Stop block; 24. Support block; 25. Photolithography plate. DETAILED DESCRIPTION
[0027] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0028] Reference Figure 1-Figure 4 The utility model provides an embodiment: a highly applicable photolithography storage box, comprising an upper slide cover 1, a box body 2, a front flip cover 4, and a photolithography plate 25. A slide rail 13 is provided in the box body 2, a push rod 5 is slidably connected to the slide rail 13, a tension spring column 12 is provided on the slide rail 13, a tension spring 11 is fixedly connected to the tension spring column 12, one end of the tension spring 11 is fixedly connected to one end of the push rod 5, one end of the push rod 5 is hinged with a long connecting rod 6, one end of the long connecting rod 6 is hinged with a rotating rod 7, the rotating rod 7 is rotatably connected to the box body 2 through a rotating shaft 14, and one end of the rotating rod 7 is hinged with A short connecting rod 8 is hinged at one end of the short connecting rod 8 with a slider 9, and a magnet 10 is fixedly connected to one side of the slider 9. A limiting column 15 is arranged in the box body 2, and a sliding cover is adopted. The automatic opening of the front flap is more convenient and faster than the manual opening and closing of the flap. There are loading support edges on both sides of the box body. The photolithography plate can be directly used on the lithography machine after sliding open. The internal support block and the stop block stabilize the position of the photolithography plate. There is a spring under the pressure plate. After sliding on the cover, the pressure block presses the photolithography plate and is buffered by the spring, which further improves the protection of the photolithography plate and increases the stability of transportation.
[0029] Among them, the upper sliding cover 1 is slidably connected to the box body 2, one side of the upper sliding cover 1 is rotatably connected to the front flip cover 4, the two sides of the box body 2 are fixedly connected to the loading support edges 3, the lower surface of the upper sliding cover 1 is fixedly connected to the magnet seat 18, one side of the magnet seat 18 is fixedly connected to the magnet 2 17, the lower surface of the upper sliding cover 1 is fixedly connected to the protrusion 22, the protrusion 22 is provided with two groups, and the two groups of protrusions 22 are symmetrically distributed on both sides of the upper sliding cover 1, the box body 2 is fixedly connected to the spring seat 21, the spring seat 21 is provided with two groups, and the two groups of spring seats 21 are symmetrically distributed in the box body 2, the spring seat 21 is fixedly connected to the spring 20, and the pressure block 1 is fixedly connected above the spring 20 9, the pressing block 19 fits the photolithography plate 25, and the box body 2 is fixedly connected with a supporting block 24, and the supporting block 24 is provided with four groups, and the four groups of supporting blocks 24 are evenly distributed in the box body 2, and the box body 2 is fixedly connected with a stopper 23, and the photolithography plate 25 is placed between the supporting block 24 and the stopper 23, and the limiting column 15 limits the rotating rod 7, and the magnet 10 is magnetically connected with the magnet 2 17. The drawer-type photolithography plate transport box can not only complete the purpose of transportation and storage, but also can be directly used for loading onto the photolithography machine for use, and the low cost and light structure realize dual-purpose of one box, avoid frequent manual transfer operations, and improve the use environment of the photolithography plate.
[0030] Working principle: This is a photolithography plate storage box that can be transported and opened and directly used in the photolithography machine plate library, realizing a dual-purpose function of one box. To achieve the effect of pushing the upper sliding cover 1 to drive the front flip cover 4 to automatically open and leak out the photolithography plate 25, the upper sliding cover 1 and the side of the box body 2 adopt a slide groove structure. When the upper sliding cover 1 is pushed, the magnet 2 17 on the magnet seat 18 attracts the magnet 10, driving the slider 9 to move backward along the slide rail 2 16, the slider 9 pulls the short connecting rod 8, the short connecting rod 8 pulls the rotating rod 7, the rotating rod 7 cooperates with the rotating shaft 14 to rotate, one end of the rotating rod 7 pushes the long connecting rod 6 forward by rotation, and one end of the long connecting rod 6 pushes the push rod 5 forward, and the push rod 5 pushes the front flip cover 4 forward along the slide rail 13, and the upper sliding cover 1 and the front flip cover 4 move backward at the same time, the tension spring column 12 fixes one end of the tension spring 11, and the spring 11 is tightened and stressed during the push rod 5 to push forward. 7 side contacts the limit column 15, under the action of the limit, the push rod 5 and the slider 9 stop moving, at this time the front flip cover 4 is opened above the box body 2, the magnetic force of the magnet 10 and the magnet 2 17 is greater than the pulling force of the tension spring 11, at this time the convex block 22 of the upper slide cover 1 moves away from the top of the pressure block 19, the top of the pressure block 19 is not under pressure, the spring 20 bounces the pressure block 19 upward, the photolithography plate 25 is not subject to the pressing force of the pressure block 19, the upper slide cover 1 continues to push the magnet 10 and the magnet 2 17 backward to separate, the tension spring 11 pulls the push block 5 back, the push block 5 drives the long connecting rod 12 to rotate the rotating rod 14 in the opposite direction, the rotating rod 14 drives the short connecting rod 8 and the slider 9 to retract, and the photolithography plate 25 leaks out. The device can not only achieve the purpose of transportation and storage, but also has loading support edges on both sides of the box body and can be directly used for loading into the photolithography machine for use, with low cost and light structure to achieve dual uses of one box, avoiding frequent manual transfer operations.
[0031] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. A highly applicable photolithography plate storage box, comprising an upper sliding cover (1), a box body (2), a front flip cover (4), and a photolithography plate (25), characterized in that: A slide rail (13) is provided in the box body (2), a push rod (5) is slidably connected to the slide rail (13), a tension spring column (12) is provided on the slide rail (13), a tension spring (11) is fixedly connected to the tension spring column (12), one end of the tension spring (11) is fixedly connected to one end of the push rod (5), one end of the push rod (5) is hinged to a long connecting rod (6), one end of the long connecting rod (6) is hinged to a rotating rod (7), the rotating rod (7) is rotatably connected to the box body (2) through a rotating shaft (14), one end of the rotating rod (7) is hinged to a short connecting rod (8), one end of the short connecting rod (8) is hinged to a slider (9), one side of the slider (9) is fixedly connected to a magnet (10), and a limit column (15) is provided in the box body (2).
2. A highly applicable photolithography plate storage box according to claim 1, characterized in that: The upper sliding cover (1) is slidably connected to the box body (2); one side of the upper sliding cover (1) is rotatably connected to the front flip cover (4); and both sides of the box body (2) are fixedly connected to loading support edges (3).
3. A highly applicable photolithography plate storage box according to claim 2, characterized in that: The lower surface of the upper sliding cover (1) is fixedly connected to a magnet seat (18), one side of the magnet seat (18) is fixedly connected to a second magnet (17), and the lower surface of the upper sliding cover (1) is fixedly connected to a protrusion (22), and the protrusion (22) is provided with two groups, and the two groups of protrusions (22) are symmetrically distributed on both sides of the upper sliding cover (1).
4. A highly applicable photolithography plate storage box according to claim 3, characterized in that: A spring seat (21) is fixedly connected inside the box body (2), and two groups of spring seats (21) are provided. The two groups of spring seats (21) are symmetrically distributed inside the box body (2). A spring (20) is fixedly connected inside the spring seat (21), and a pressure block (19) is fixedly connected above the spring (20), and the pressure block (19) is attached to the photolithography plate (25).
5. A highly applicable photolithography plate storage box according to claim 4, characterized in that: A support block (24) is fixedly connected inside the box body (2), and the support block (24) is provided with four groups. The four groups of support blocks (24) are evenly distributed inside the box body (2). A stop block (23) is fixedly connected inside the box body (2), and the photolithography plate (25) is placed between the support block (24) and the stop block (23).
6. A highly applicable photolithography plate storage box according to claim 5, characterized in that: The limiting column (15) limits the rotation rod (7).
7. A highly applicable photolithography plate storage box according to claim 6, characterized in that: The magnet one (10) is magnetically connected to the magnet two (17).