Flat sample table of X-ray diffractometer

Abstract

The utility model provides a flat sample table of an X-ray diffractometer, relates to the technical field of sample bearing devices, and solves the technical problem that the existing X-ray diffractometer is easy to cause background interference on small samples. The sample table comprises a first sample table for placing a sample, the first sample table is provided with a telescopic plate which can be stored in an overlapped manner, and the telescopic plate is provided with a silicon wafer sample table which can be lifted to adjust the height and reduce the interference of a test background. According to the utility model, small samples are prevented through the silicon wafer sample platform, so that background interference of the sample platform on the small samples can be reduced; the purpose of accommodating the silicon wafer sample table can be achieved through the sliding fit of the telescopic plate and the lifting of the silicon wafer sample table, and the test of a normal sample on the first sample table is not influenced.

Description

Technical Field

[0001] The utility model relates to the technical field of sample carrying devices, in particular to a flat sample stage of an X-ray diffractometer. Background Art

[0002] X-ray diffraction imaging is an important technical means for fine structure imaging. When a substance is subjected to diffraction analysis, the substance is irradiated with X-rays to produce different degrees of diffraction. The composition of the substance, the bonding mode within the molecule, the configuration of the molecule, etc. determine the unique diffraction pattern produced by the substance. The X-ray diffraction method has the advantages of not damaging the sample, no pollution, fast, high measurement accuracy, and the ability to obtain a large amount of information about the integrity of the crystal.

[0003] When using an X-ray diffractometer, a sample slot is usually used to obtain a horizontal test surface for the sample, and then the sample slot and the test surface are clamped on a sample stage for testing. However, it is not convenient to clamp small block samples on the sample platform, and it is not convenient to adjust the height of the sample stage test surface according to the shape and size of the sample.

[0004] Therefore, as proposed in the patent with publication number CN105572156A, a two-axis precision motion platform for X-ray diffractometer adopts a precision piezoelectric linear motor as a driving component, with a large motion range, rapid response, and high positioning accuracy. A Hall sensor is used to provide limit signals and initial position signals to prevent the moving parts from exceeding the motion range, and the sample stage can be adjusted more accurately.

[0005] There is also an X-ray diffraction profilometer and its sample stage device proposed in the patent with publication number CN219957413U. A second sample stage is arranged on the first sample stage and is lifted and lowered. By lifting the second sample stage, samples of different thicknesses are lifted and lowered to the specified position. There is no need to adjust the position of the X-ray emitter. The X-ray diffractometer can test samples of different thicknesses. The operation is simple, the work efficiency is improved, and the accuracy of the test results is also ensured. Compared with the previous application, this application can use a smaller second sample stage for special and precise operations on small samples, which is more convenient and practical. However, for testing small samples with the second sample stage, there is still the problem that the test results are easily interfered by the background. Utility Model Content

[0006] The utility model aims to provide a flat sample stage for an X-ray diffractometer to solve the technical problem that the existing X-ray diffractometer easily causes background interference to small samples.

[0007] The embodiments of the present invention are implemented by the following technical solutions:

[0008] A flat sample stage for an X-ray diffractometer comprises a first sample stage for placing samples, wherein the first sample stage is provided with a telescopic plate capable of overlapping and storing, and the telescopic plate is provided with a silicon wafer sample stage capable of lifting and lowering to adjust the height and reduce the interference of the test background.

[0009] Preferably, the telescopic plate includes a plurality of groups of telescopic rods for connecting the silicon wafer sample stage and control rods for controlling the lifting and lowering of the telescopic rods; and also includes a vertical plate for connecting the telescopic plate and the first sample stage.

[0010] Preferably, the telescopic rod is provided with a worm, and the control rod shaft is connected to a plurality of worm wheels meshingly connected to the worm; one end of the control rod is rotatably connected to the vertical plate, and the other end is provided with a handle for rotating the control rod.

[0011] Preferably, a slide groove is provided below the first sample platform, and the vertical plate is provided with a sliding block for slidably connecting the slide groove.

[0012] Preferably, the silicon wafer sample stage is provided with a background-free silicon wafer for placing samples and a connecting sleeve for connecting the telescopic plate, and the connecting sleeve is rotatably connected to the telescopic rod.

[0013] Preferably, the silicon wafer sample stage is further provided with a fixing member for fixing the background-free silicon wafer.

[0014] Preferably, the telescopic rod passes through the telescopic plate and is provided with a limiting piece for preventing the telescopic rod from falling off.

[0015] By adopting the technical scheme, the silicon wafer sample stage is used to prevent small samples, and the background interference of the sample platform on the small samples can be reduced. The sliding of the telescopic plate and the lifting of the silicon wafer sample stage can achieve the purpose of storing the silicon wafer sample stage, and will not affect the test of normal samples on the first sample platform. When testing small samples, the telescopic plate is slid out, and then the small sample is placed on the silicon wafer sample stage by lifting the silicon wafer sample stage. By turning the handle, the handle drives the control lever to rotate, and the worm gear drives the worm to rotate and lift to adjust the height of the silicon wafer sample stage, which is convenient for testing. The silicon wafer sample platform adopts silicon wafers to place samples, which can effectively reduce the background interference of the test. While improving the test accuracy, it is convenient to store, take out and use the silicon wafer sample stage.

[0016] The technical solution of the embodiment of the utility model has at least the following advantages and beneficial effects:

[0017] 1. The utility model prevents small samples by using the silicon wafer sample stage, which can reduce the background interference of the sample platform on small samples;

[0018] 2. The utility model can achieve the purpose of storing the silicon wafer sample stage by sliding the telescopic plate to cooperate with the lifting of the silicon wafer sample stage, without affecting the test of normal samples on the first sample platform. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.

[0020] Figure 1 A schematic diagram of the structure of an X-ray diffractometer flat sample stage provided in Example 1 of the utility model;

[0021] Figure 2 A schematic diagram of the structure of the flat sample stage of the X-ray diffractometer provided in Example 1 of the utility model;

[0022] Figure 3 A schematic diagram of the side structure of a flat sample stage of an X-ray diffractometer provided in Example 2 of the utility model;

[0023] Figure 4 A partially enlarged structural schematic diagram of a flat sample stage of an X-ray diffractometer provided in Example 2 of the utility model;

[0024] Figure 5 A schematic structural diagram of a silicon wafer sample stage for an X-ray diffractometer flat sample stage provided in Example 2 of the utility model;

[0025] Icons: 1. First sample stage; 11. Slide slot; 2. Vertical plate; 21. Control lever; 22. Slider; 23. Handle; 3. Telescopic plate; 31. Telescopic rod; 32. Limiting piece; 34. Worm; 35. Worm gear; 4. Background-free silicon wafer; 41. Connecting sleeve; 5. Silicon wafer sample stage; 51. Fixing piece. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Generally, the components of the embodiments of the utility model described and shown in the drawings here can be arranged and designed in various different configurations.

[0027] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the present invention to be protected, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0028] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0029] In the description of the present invention, it should be noted that if the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc. appear, the orientation or position relationship indicated is based on the orientation or position relationship shown in the accompanying drawings, or is the orientation or position relationship in which the product of the application is usually placed when used. It is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0030] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0031] Example 1

[0032] A flat sample stage for an X-ray diffractometer comprises a first sample stage 1 for placing samples, wherein the first sample stage 1 is provided with a telescopic plate 3 which can be overlapped and stored, and the telescopic plate 3 is provided with a silicon wafer sample stage 5 which can be raised and lowered to adjust the height and reduce the test background interference.

[0033] In this embodiment, the telescopic plate 3 includes a plurality of telescopic rods 31 for connecting the silicon wafer sample stage 5 and a control rod 21 for controlling the lifting and lowering of the telescopic rods 31 ; and also includes a vertical plate 2 for connecting the telescopic plate 3 and the first sample stage 1 .

[0034] In this embodiment, a slide groove 11 is provided below the first sample platform 1 , and a sliding block 22 is provided on the vertical plate 2 for slidably connecting the slide groove 11 .

[0035] In this embodiment, the silicon wafer sample stage 5 is provided with a background-free silicon wafer 4 for placing samples and a connecting sleeve 41 for connecting the telescopic plate 3 , and the connecting sleeve 41 is rotatably connected to the telescopic rod 31 .

[0036] In this embodiment, the telescopic rod 31 passes through the telescopic plate 3 and is provided with a stopper 32 for preventing the telescopic rod 31 from falling off.

[0037] In this embodiment, the slide grooves 11 are provided in two groups, the control rods 21 are provided in two groups, and each group of the control rods 21 is connected to two groups of telescopic rods.

[0038] Working principle and usage:

[0039] During operation, the silicon wafer sample stage 5 can prevent small samples from being placed, and the background interference of the sample platform on small samples can be reduced. The sliding of the telescopic plate 3 and the lifting of the silicon wafer sample stage 5 can achieve the purpose of storing the silicon wafer sample stage 5 without affecting the test of normal samples on the first sample platform. When testing small samples, the telescopic plate 3 is slid out, and then the small sample is placed on the silicon wafer sample stage 5 by lifting it. By turning the handle 23, the handle 23 drives the control rod 21 to rotate, and the worm gear 35 drives the worm 34 to rotate and lift to adjust the height of the silicon wafer sample stage 5, which is convenient for testing. The silicon wafer sample platform adopts silicon wafers to place samples, which can effectively reduce the background interference of the test. While improving the test accuracy, it is convenient for the storage, removal and use of the silicon wafer sample stage 5.

[0040] Example 2

[0041] The only difference between this embodiment and embodiment 1 is that, in this embodiment, the telescopic rod 31 is provided with a worm 34, and the control rod 21 axis is connected to a plurality of groups of worm wheels 35 meshingly connected with the worm 34; one end of the control rod 21 is rotatably connected to the vertical plate 2, and the other end is provided with a handle 23 for rotating the control rod 21.

[0042] In this embodiment, the silicon wafer sample stage 5 is further provided with a fixing member 51 for fixing the background-free silicon wafer 4 .

[0043] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may be subject to various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A flat sample stage for an X-ray diffractometer, comprising a first sample stage (1) for placing a sample, characterized in that: The first sample stage (1) is provided with a telescopic plate (3) that can be overlapped and stored, and the telescopic plate (3) is provided with a silicon wafer sample stage (5) that can be raised and lowered to adjust the height and reduce the background interference of the test.

2. The X-ray diffractometer flat sample stage according to claim 1, characterized in that: The telescopic plate (3) comprises a plurality of groups of telescopic rods (31) for connecting the silicon wafer sample stage (5) and control rods (21) for controlling the lifting and lowering of the telescopic rods (31); and also comprises a vertical plate (2) for connecting the telescopic plate (3) and the first sample stage (1).

3. The X-ray diffractometer flat sample stage according to claim 2, characterized in that: The telescopic rod (31) is provided with a worm (34), and the control rod (21) is axially connected to a plurality of worm wheels (35) meshingly connected with the worm (34); one end of the control rod (21) is rotatably connected to the vertical plate (2), and the other end is provided with a handle (23) for rotating the control rod (21).

4. The X-ray diffractometer flat sample stage according to claim 2 or 3, characterized in that: A slide groove (11) is provided below the first sample platform (1), and a sliding block (22) is provided on the vertical plate (2) for slidingly connecting the slide groove (11).

5. The X-ray diffractometer flat sample stage according to claim 4, characterized in that: The silicon wafer sample stage (5) is provided with a background-free silicon wafer (4) for placing samples and a connecting sleeve (41) for connecting the telescopic plate (3), and the connecting sleeve (41) is rotatably connected to the telescopic rod (31).

6. The X-ray diffractometer flat sample stage according to claim 5, characterized in that: The silicon wafer sample stage (5) is also provided with a fixing member (51) for fixing the background-free silicon wafer (4).

7. An X-ray diffractometer flat sample stage according to any one of claims 2, 3, 5 and 6, characterized in that: The telescopic rod (31) passes through the telescopic plate (3) and is provided with a limiting piece (32) for preventing the telescopic rod (31) from falling off.

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