Detection device for gallium nitride epitaxial wafer processing

Abstract

The utility model relates to the technical field of gallium nitride epitaxial wafers, and discloses a detection device for gallium nitride epitaxial wafer processing, which comprises a fixed plate, supporting legs fixedly arranged at the bottom of the fixed plate, a vertical plate fixedly arranged at the top of the fixed plate, and a processing assembly arranged at the side position of the fixed plate, the machining assembly comprises a clamping mechanism installed at the top of the fixing plate, a turnover mechanism is installed at the bottom of the fixing plate and connected with the clamping mechanism, the clamping mechanism comprises a long rod, and one end of the long rod is rotationally installed on the inner wall of the vertical plate through a bearing. According to the utility model, the existing device drives the position of the rotating block to rotate through the detection clamp so as to realize the overturning of a detected object, but the side wall position of the rotating block is not provided with a limiting mechanism, so that when the detection clamp works, the detected object may shake and deviate.

Description

Technical Field

[0001] The utility model relates to the technical field of gallium nitride epitaxial wafers, in particular to a detection device for processing gallium nitride epitaxial wafers. Background Art

[0002] Gallium nitride epitaxial wafers are typical representatives of the third-generation wide bandgap semiconductor epitaxial materials, with excellent properties such as large bandgap width, high breakdown field strength, high thermal conductivity, high electron saturation drift velocity, strong radiation resistance and high chemical stability. They are widely used in new energy vehicles, microwave communications, rail transportation, aerospace, optoelectronics and other fields. Therefore, appearance inspection is required during the production and processing of gallium nitride epitaxial wafers, so a detection device for gallium nitride epitaxial wafer processing is needed;

[0003] For example, Chinese patent CN220231517U discloses a detection device for processing gallium nitride epitaxial wafers. The device is provided with a fixed block, a rotating block, a detection clamp and a rubber pad. After the detection clamp is clamped and fixed to the gallium nitride epitaxial wafer, the detection clamp is rotated 360° through the rotating block and the adjusting rod, which makes it easier for workers to use during appearance inspection, avoids the need for disassembly and assembly back and forth, and improves the efficiency of appearance inspection.

[0004] However, there are certain defects in this patent. The device rotates the rotating block by the detection clamp to achieve the flipping of the detection object, but there is no limiting mechanism on the side wall of the rotating block. When the detection clamp is working, it may cause the detection object to shake and deviate. Utility Model Content

[0005] The purpose of the utility model is to provide a detection device for gallium nitride epitaxial wafer processing, so as to achieve the purpose of solving the problems raised in the above-mentioned background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solution: a detection device for processing gallium nitride epitaxial wafers, comprising a fixing plate,

[0007] A support leg fixedly mounted on the bottom of the fixing plate;

[0008] A vertical plate fixedly mounted on the top of the fixed plate;

[0009] and a processing assembly disposed at a side position of the fixing plate;

[0010] The processing assembly includes a clamping mechanism mounted at a top position of the fixed plate;

[0011] A turning mechanism is installed at the bottom of the fixing plate, and the turning mechanism is connected to the clamping mechanism.

[0012] Preferably, there are four supporting legs, the four supporting legs are equal in shape and size, and the four supporting legs are respectively fixedly installed at the four corners of the bottom of the fixing plate, so that the position of the entire device can be supported by the supporting legs.

[0013] Preferably, a column is fixedly mounted on the top of the fixed plate, an adjustment bracket is slidably mounted on the inner wall of the column, and a detection light is fixedly mounted on the top side wall of the adjustment bracket.

[0014] Preferably, the clamping mechanism includes a long rod, one end of which is rotatably mounted on the inner wall of the vertical plate through a bearing, a turntable is fixedly mounted on one end of the long rod, a sleeve is fixedly mounted on the side wall of the turntable, a base plate is fixedly mounted on the bottom of the turntable, an electric telescopic rod is fixedly mounted on the top of the base plate, a connecting rod is hingedly mounted on the top of the electric telescopic rod, a moving block is hingedly mounted on the other end of the connecting rod, a clamping plate is fixedly mounted on the side wall of the moving block, and a rubber pad is fixedly mounted on the other side of the clamping plate.

[0015] Preferably, the diameter of the side wall of the moving block is the same as the diameter of the inner wall of the sleeve, the side wall of the moving block is slidably connected to the inner wall of the sleeve, and the moving block can slide on the inner wall of the sleeve.

[0016] Preferably, the flipping mechanism includes a socket block, which is fixedly installed on the bottom of the fixed plate, and a dual-output motor is fixedly installed on the inner wall of the socket block, and the output end of the dual-output motor is driven by a rotating shaft, and a transmission wheel 1 is fixedly installed on the other end of the rotating shaft, and a belt is driven on the side wall of the transmission wheel 1, and a transmission wheel 2 is driven on the other end of the belt, and the inner wall of the transmission wheel 2 is fixedly connected to the side wall of the long rod.

[0017] Preferably, there are two belts, the two belts are equal in shape and size, and the two belts are symmetrically arranged relative to the middle surface of the fixed plate in the left and right directions.

[0018] The utility model provides a detection device for gallium nitride epitaxial wafer processing. It has the following beneficial effects:

[0019] (1) The utility model allows an operator to move the GaN epitaxial wafer to the side wall of the rubber pad. At this time, the electric telescopic rod can be directly opened, and the electric telescopic rod will squeeze one end of the connecting rod. The connecting rod drives the moving block to slide on the inner wall of the sleeve. At this time, the moving block will move the position of the clamping plate and the rubber pad. By bringing the two rubber pads close to each other, the position of the GaN epitaxial wafer is stabilized, the stability of the GaN epitaxial wafer is improved, and the problem of the existing device driving the rotating block to rotate by the detection clamp to achieve the flipping of the detection object is solved. However, the side wall position of the rotating block is not provided with a limiting mechanism. When the detection clamp is working, it may cause the detection object to shake and deviate.

[0020] (2) When the operator needs to flip the GaN epitaxial wafer for detection, the utility model can directly turn on the dual-output motor, which can drive the position of the rotating shaft to rotate, and the rotating shaft drives the position of the transmission wheel 1 to rotate. The transmission wheel 1 drives the position of the transmission wheel 2 through the belt, and the transmission wheel 2 further drives the position of the long rod and the turntable to flip, thereby further realizing the rotation of the position of the GaN epitaxial wafer, which is convenient for the operator to better use the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a schematic diagram of the appearance structure of the utility model;

[0022] Figure 2 This is a schematic diagram of the utility model's upward structure;

[0023] Figure 3 It is a partial structural schematic diagram of the clamping mechanism of the utility model;

[0024] Figure 4 It is a schematic diagram of the connection between the column and the detection lighting lamp of the utility model.

[0025] In the figure: 1. fixed plate; 2. supporting leg; 3. vertical plate; 4. processing assembly; 41. clamping mechanism; 411. rubber pad; 412. clamping plate; 413. sleeve; 414. moving block; 415. connecting rod; 416. electric telescopic rod; 417. bottom plate; 418. turntable; 419. long rod; 42. turning mechanism; 421. socket block; 422. dual output end motor; 423. belt; 424. transmission wheel 1; 425. transmission wheel 2; 426. rotating shaft; 5. column; 6. adjustment bracket; 7. detection light. DETAILED DESCRIPTION

[0026] In order to have a clearer understanding of the technical features, purposes and effects of the utility model, the specific implementation methods of the utility model are now described with reference to the accompanying drawings.

[0027] Example 1

[0028] A preferred embodiment of the detection device for gallium nitride epitaxial wafer processing provided by the utility model is as follows: Figures 1 to 4 As shown: a detection device for processing gallium nitride epitaxial wafers, comprising a fixed plate 1, a column 5 is fixedly installed on the top of the fixed plate 1, an adjustment bracket 6 is slidably installed on the inner wall of the column 5, and a detection light 7 is fixedly installed on the top side wall of the adjustment bracket 6 (the adjustment bracket 6 and the detection light 7 are existing public technologies in the comparative documents, so their internal structures are fully described).

[0029] The support legs 2 are fixedly mounted on the bottom of the fixed plate 1. There are four support legs 2. The four support legs 2 are of equal shape and size. The four support legs 2 are respectively fixedly mounted at the four corners of the bottom of the fixed plate 1. The support legs 2 can support the position of the entire device.

[0030] A vertical plate 3 fixedly mounted on the top of the fixed plate 1;

[0031] and a processing assembly 4 disposed at a side position of the fixed plate 1;

[0032] The processing assembly 4 includes a clamping mechanism 41 mounted at a top position of the fixed plate 1;

[0033] A turning mechanism 42 is installed at the bottom of the fixing plate 1 , and the turning mechanism 42 is connected to the clamping mechanism 41 .

[0034] The clamping mechanism 41 includes a long rod 419, one end of which is rotatably mounted on the inner wall of the vertical plate 3 through a bearing, a turntable 418 is fixedly mounted on one end of the long rod 419, a sleeve 413 is fixedly mounted on the side wall of the turntable 418, a bottom plate 417 is fixedly mounted on the bottom of the turntable 418, an electric telescopic rod 416 is fixedly mounted on the top of the bottom plate 417, a connecting rod 415 is hingedly mounted on the top of the electric telescopic rod 416, a moving block 414 is hingedly mounted on the other end of the connecting rod 415, a clamping plate 412 is fixedly mounted on the side wall of the moving block 414, and a rubber pad 411 is fixedly mounted on the other side of the clamping plate 412.

[0035] In this embodiment, the diameter of the side wall of the moving block 414 is the same as the diameter of the inner wall of the sleeve 413 , the side wall of the moving block 414 is slidably connected to the inner wall of the sleeve 413 , and the moving block 414 can slide on the inner wall of the sleeve 413 .

[0036] During the specific implementation process, when the operator uses the device, he first supports the position of the device through the support legs 2 at the bottom of the device, and then the gallium nitride epitaxial wafer can be directly moved to the side wall position of the rubber pad 411. At this time, the electric telescopic rod 416 can be directly opened, and the electric telescopic rod 416 will squeeze one end of the connecting rod 415. The connecting rod 415 drives the moving block 414 to slide on the inner wall of the sleeve 413. At this time, the moving block 414 will move the position of the clamping plate 412 and the rubber pad 411. By bringing the two rubber pads 411 close to each other, the position of the gallium nitride epitaxial wafer can be stabilized, thereby improving the stability of the gallium nitride epitaxial wafer.

[0037] Example 2

[0038] On the basis of Example 1, a preferred embodiment of a detection device for processing gallium nitride epitaxial wafers provided by the utility model is as follows: Figures 1 to 4 As shown: the flip mechanism 42 includes a socket block 421, which is fixedly installed on the bottom of the fixed plate 1, and a dual-output end motor 422 is fixedly installed on the inner wall of the socket block 421, and the output end of the dual-output end motor 422 is driven by a rotating shaft 426, and the other end of the rotating shaft 426 is fixedly installed with a transmission wheel 1 424, and the side wall of the transmission wheel 1 424 is driven by a belt 423, and the other end of the belt 423 is driven by a transmission wheel 2 425, and the inner wall of the transmission wheel 2 425 is fixedly connected to the side wall of the long rod 419.

[0039] In this embodiment, there are two belts 423 . The two belts 423 are equal in shape and size, and are symmetrically arranged with respect to the middle surface of the fixing plate 1 in the left-right direction.

[0040] During the specific implementation process, when the operator needs to flip the gallium nitride epitaxial wafer for detection, the dual-output motor 422 can be directly turned on. The dual-output motor 422 can drive the position of the rotating shaft 426 to rotate, and the rotating shaft 426 drives the position of the transmission wheel 1 424 to rotate. The transmission wheel 1 424 drives the position of the transmission wheel 2 425 to rotate through the belt 423, and the transmission wheel 2 425 further drives the position of the long rod 419 and the turntable 418 to flip, thereby further realizing the rotation of the position of the gallium nitride epitaxial wafer.

[0041] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A detection device for processing gallium nitride epitaxial wafers, comprising a fixing plate (1), A supporting leg (2) fixedly mounted on the bottom of the fixing plate (1); A vertical plate (3) fixedly mounted on the top of the fixed plate (1); and a processing assembly (4) arranged at the side of the fixing plate (1); characterized in that: The processing assembly (4) comprises a clamping mechanism (41) installed at the top of the fixed plate (1); A turning mechanism (42) is installed at the bottom of the fixed plate (1), and the turning mechanism (42) is connected to the clamping mechanism (41).

2. The detection device for gallium nitride epitaxial wafer processing according to claim 1, characterized in that: There are four supporting legs (2), the four supporting legs (2) are of equal shape and size, and the four supporting legs (2) are respectively fixedly mounted at the four corners of the bottom of the fixing plate (1).

3. The detection device for gallium nitride epitaxial wafer processing according to claim 1, characterized in that: A column (5) is fixedly mounted on the top of the fixed plate (1), an adjustment bracket (6) is slidably mounted on the inner wall of the column (5), and a detection light (7) is fixedly mounted on the top side wall of the adjustment bracket (6).

4. The detection device for gallium nitride epitaxial wafer processing according to claim 1, characterized in that: The clamping mechanism (41) comprises a long rod (419), one end of which is rotatably mounted on the inner wall of the vertical plate (3) via a bearing, a turntable (418) is fixedly mounted on one end of the long rod (419), a sleeve (413) is fixedly mounted on the side wall of the turntable (418), a bottom plate (417) is fixedly mounted on the bottom of the turntable (418), an electric telescopic rod (416) is fixedly mounted on the top of the bottom plate (417), a connecting rod (415) is hingedly mounted on the top of the electric telescopic rod (416), a moving block (414) is hingedly mounted on the other end of the connecting rod (415), a clamping plate (412) is fixedly mounted on the side wall of the moving block (414), and a rubber pad (411) is fixedly mounted on the other side of the clamping plate (412).

5. The detection device for gallium nitride epitaxial wafer processing according to claim 4, characterized in that: The diameter of the side wall of the moving block (414) is the same as the diameter of the inner wall of the sleeve (413), and the side wall of the moving block (414) is slidably connected to the inner wall of the sleeve (413).

6. The detection device for gallium nitride epitaxial wafer processing according to claim 1, characterized in that: The turning mechanism (42) comprises a sleeve block (421), wherein the sleeve block (421) is fixedly mounted on the bottom of the fixed plate (1), a dual-output motor (422) is fixedly mounted on the inner wall of the sleeve block (421), an output end of the dual-output motor (422) is transmission-mounted with a rotating shaft (426), a transmission wheel 1 (424) is fixedly mounted on the other end of the rotating shaft (426), a belt (423) is transmission-mounted on the side wall of the transmission wheel 1 (424), a transmission wheel 2 (425) is transmission-mounted on the other end of the belt (423), and an inner wall of the transmission wheel 2 (425) is fixedly connected to the side wall of the long rod (419).

7. The detection device for gallium nitride epitaxial wafer processing according to claim 6, characterized in that: There are two belts (423), the two belts (423) are equal in shape and size, and the two belts (423) are symmetrically arranged relative to the middle surface of the fixing plate (1) in the left-right direction.

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