Mask frame support element, edge exclusion mask, mask frame element, substrate support, substrate processing apparatus

Abstract

A mask frame support element, an edge exclusion mask, a mask frame element, a substrate support, and a substrate processing apparatus are described. A mask frame support element for a mask frame support includes, in a first direction configured to extend along a side edge of a substrate: a protruding section configured to provide contact with the substrate; and a recessed section configured to couple a portion of a mask frame to the mask frame support. The mask frame element includes a body having a mask edge extending in a first direction configured to extend along a side edge of a substrate. The main body is provided with a protruding part, and the protruding part extends downwards and provides the mask edge. The projection includes a first section having a first width, the first width extending away from the mask edge from the mask edge, and a second section having a second width extending away from the mask edge. And a second section having a second width greater than the first width, the second width extending from the mask edge away from the mask edge.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to an edge exclusion mask, in particular a mask frame support element or an edge support frame (ESF) and a mask frame element or a mask frame. The edge exclusion mask can be provided for a support table of a deposition apparatus. Embodiments of the present disclosure also relate to a mask frame support element, an edge exclusion mask configured to shield an edge of a substrate supported on a table, a mask frame element, a substrate support, a substrate processing apparatus, and a method for manufacturing one or more devices on a large area substrate. Background Art

[0002] Several methods are known for depositing materials on substrates. For example, the substrate may be coated using an evaporation process, a physical vapor deposition (PVD) process (such as a sputtering process, a spraying process, etc.), or a chemical vapor deposition (CVD) process. The substrate (on which the material is to be deposited) (i.e., the substrate to be coated) is introduced into a vacuum chamber of a vacuum processing system and positioned relative to a processing area of ​​the vacuum chamber of the vacuum processing system. For example, the coating process may occur in a vacuum chamber.

[0003] Coating processes, i.e. material deposition processes, can be considered for large-area substrates, for example in display manufacturing technology. The coated substrates can further be applied in several technical fields, for example in microelectronics, in the production of semiconductor devices, for substrates with thin-film transistors, also for insulating panels, etc. The trend towards larger substrates (for example in the production of larger displays) results in larger vacuum processing systems.

[0004] During the coating process, the substrate may be held on a substrate support. The substrate is fixed by a mask frame support and the edges of the substrate are masked by the mask frame. The mask frame defines the area of ​​the substrate to be processed. In addition, shadowing effects of the mask frame may occur close to the mask edge.

[0005] In view of the above, it would be beneficial to provide improved masking, and in particular to increase processing efficiency of substrates. Summary of the invention

[0006] According to an embodiment, a mask frame support element for a mask frame support is provided, wherein the mask frame support element includes, along a first direction configured to extend along a side edge of a substrate: a protruding section configured to provide contact with the substrate; and a recessed section configured to couple a portion of a mask frame to the mask frame support.

[0007] In some embodiments, the difference in width between the protruding section and the recessed section is 1 mm or greater.

[0008] In some embodiments, the recessed section slopes downwardly and away from the protruding section.

[0009] In some embodiments, the protruding section protrudes in a second direction, wherein the recessed section is recessed in the second direction, and wherein the recessed section slopes downwardly toward a substrate plane of the substrate and away from the substrate in the second direction.

[0010] In some embodiments, the recessed section is configured to receive an undercut portion of a mask frame element to attach the mask frame element to the mask frame support element.

[0011] In some embodiments, the recessed section is shaped to form a dovetail joint.

[0012] In some embodiments, the protruding section protrudes in the second direction.

[0013] In some embodiments, the recessed section is recessed in the second direction.

[0014] In some embodiments, a width difference between the protruding section and the recessed section in the second direction is 1 mm or more.

[0015] In some embodiments, the mask frame support element is configured to be coupled together with one or more additional mask frame support elements to form the mask frame support.

[0016] In some embodiments, a terminal end is formed in an upper portion of the mask frame support element at a location of the recessed section.

[0017] In some embodiments, an undercut is formed in a lower portion of the mask frame supporting element at a certain position of the recessed section.

[0018] In some embodiments, the mask frame support element comprises: PEEK, polyimide, polybenzimidazole, or a combination thereof.

[0019] In some embodiments, the protruding section protrudes in a second direction, wherein the recessed section is recessed in the second direction, and wherein a width difference between the protruding section and the recessed section in the second direction is 1 mm or more.

[0020] In some embodiments, the mask frame support element includes more than one protruding section and more than one recessed section, wherein the mask frame support element includes the more than one protruding section and the more than one recessed section alternately along the first direction.

[0021] In some embodiments, the more than one protruding segments include at least a first protruding segment and a second protruding segment; the more than one recessed segments include at least a first recessed segment and a second recessed segment; wherein the first protruding segment is adjacent to the first recessed segment, the second recessed segment is adjacent to the first protruding segment, and the second protruding segment is adjacent to the second recessed segment.

[0022] In some embodiments, the mask frame support element includes a zigzag design to provide a zigzag contact with the substrate.

[0023] According to an embodiment, an edge exclusion mask configured to mask a substrate edge of a substrate supported on a stage is provided. The edge exclusion mask includes: a mask frame configured to provide a mask edge; and a mask frame support having a plurality of mask frame support elements configured to provide contact with the substrate. One or more of the plurality of mask frame support elements is a mask frame support element according to any one of the embodiments of the present disclosure.

[0024] In some embodiments, the mask frame includes a plurality of mask frame elements, wherein each of the plurality of mask frame elements includes: a body having a mask edge, the mask edge extending along a first direction, the first direction being configured to extend along a side edge of a substrate, the body having a protrusion extending downward and providing the mask edge. The protrusion includes: a first section having a first width extending from the mask edge away from the mask edge; and a second section having a second width greater than the first width, the second width extending from the mask edge away from the mask edge.

[0025] In some embodiments, the second section has an undercut to at least one of: engage with or attach to a mask frame support element.

[0026] In some embodiments, the second section is shaped to form a dovetail joint.

[0027] In some embodiments, the mask edge is a straight mask edge.

[0028] In some embodiments, the protrusion extends downwardly from an upper portion of the mask frame element.

[0029] In some embodiments, the protrusion extends downwardly toward a substrate plane of the substrate.

[0030] In some embodiments, a difference in width between the first width and the second width of the protrusion of the mask frame element is 1 mm or more.

[0031] In some embodiments, the mask frame element includes aluminum, titanium, or a combination thereof.

[0032] In some embodiments, the mask frame element has a structured surface.

[0033] In some embodiments, the mask frame element is configured to be coupled together with one or more additional mask frame elements of the plurality of mask frame elements to form the mask frame.

[0034] In some embodiments, the plurality of mask frame elements include at least one of mask frame side elements or mask frame corner elements.

[0035] In some embodiments, the mask frame provides a rectangular hole to mask the substrate edge of the substrate.

[0036] In some embodiments, a connection between a mask frame support element of the plurality of mask frame support elements and a mask frame element of the plurality of mask frame elements is provided by a protrusion engaging with a cavity.

[0037] In some embodiments, the connection between a mask frame support element of the plurality of mask frame support elements and a mask frame element of the plurality of mask frame elements is provided by a dovetail connection.

[0038] In some embodiments, the recessed section of the mask frame support element of the plurality of mask frame support elements and the second section of the mask frame element of the plurality of mask frame elements provide a positive locking connection.

[0039] In some embodiments, the first section of the mask frame elements of the plurality of mask frame elements corresponds to the protruding section of the mask frame support elements of the plurality of mask frame support elements.

[0040] In some embodiments, the second section of the mask frame elements of the plurality of mask frame elements corresponds to the recessed section of the mask frame support elements of the plurality of mask frame support elements.

[0041] In some embodiments, a difference in the first width relative to the second width of the mask frame element corresponds to a width difference between the protruding section and the recessed section of the mask frame support element.

[0042] In some embodiments, a mask frame element of the plurality of mask frame elements is attached to or engaged with a mask frame support element of the plurality of mask frame support elements to prevent the mask frame element and the mask frame support elements from moving relative to each other in a direction away from or toward the substrate.

[0043] In some embodiments, the recessed section of the mask frame support element of the plurality of mask frame support elements is configured to receive a cavity of a mask frame element of the plurality of mask frame elements to attach the mask frame element to the mask frame support element.

[0044] In some embodiments, the substrate to be masked by the edge exclusion mask has a thickness of at least 0.5 m 2 size.

[0045] In some embodiments, the substrate to be masked by the edge exclusion mask has a thickness of 1 m 2 or larger surfaces.

[0046] According to an embodiment, a mask frame element is provided. The mask frame element includes a body having a mask edge extending along a first direction configured to extend along a side edge of a substrate. The body has a protrusion extending downward and providing the mask edge. The protrusion includes: a first section having a first width extending from the mask edge away from the mask edge; and a second section having a second width greater than the first width extending from the mask edge away from the mask edge.

[0047] In some embodiments, the second section has an undercut to at least one of: engage with or attach to a mask frame support element.

[0048] In some embodiments, the second section is shaped to form a dovetail joint.

[0049] In some embodiments, the mask edge is a straight mask edge.

[0050] In some embodiments, the protrusion extends downwardly from an upper portion of the mask frame element.

[0051] In some embodiments, the protrusion extends downwardly toward a substrate plane of the substrate.

[0052] In some embodiments, a difference in width between the first width and the second width of the protrusion of the mask frame element is 1 mm or more.

[0053] In some embodiments, the mask frame element includes aluminum, titanium, or a combination thereof.

[0054] In some embodiments, the mask frame element has a structured surface.

[0055] In some embodiments, the mask frame element is configured to be coupled together with one or more additional mask frame elements to form a mask frame.

[0056] According to an embodiment, a substrate support is provided, including: a stage main body; a stage frame coupled to the stage main body; and an edge exclusion mask according to any one of the embodiments of the present disclosure and at least partially provided at the stage frame.

[0057] According to an embodiment, a substrate processing apparatus is provided. The substrate processing apparatus includes: a vacuum chamber, and a substrate support according to any one of the embodiments described herein and provided in the vacuum chamber.

[0058] The present disclosure further describes a method of manufacturing one or more devices on a substrate. The method includes: loading a substrate on a stage body of a substrate support stage to be supported by the stage body, contacting the substrate with one or more mask frame support elements through the protruding sections while not contacting the substrate with recessed sections of the one or more mask frame support elements; and processing the substrate while the substrate is contacted. The method may include masking an edge of the substrate with a mask frame supported by the one or more mask frame support elements. The mask frame may be a straight mask edge along one or more of the protruding sections and one or more of the recessed sections. BRIEF DESCRIPTION OF THE DRAWINGS

[0059] In order that the above-recited features of the present disclosure may be understood in detail, a more particular description of the disclosure briefly summarized above may be had by reference to the embodiments. The accompanying drawings relate to embodiments of the present disclosure and are described below.

[0060] Figure 1 A schematic top view showing an edge exclusion mask according to an embodiment of the present disclosure;

[0061] FIG2 shows a schematic cross-sectional view of an edge exclusion mask as previously known;

[0062] Figure 3A and Figure 3B A schematic cross-sectional view showing an edge exclusion mask according to an embodiment of the present disclosure;

[0063] Figure 4 A schematic diagram showing a mask frame support element according to an embodiment of the present disclosure;

[0064] Figure 5 A schematic diagram showing a mask frame element according to an embodiment of the present disclosure;

[0065] Fig. 6A and Figure 6B A schematic cross-sectional view showing an edge exclusion mask according to an embodiment of the present disclosure;

[0066] Figure 7 Schematic cross-sectional views showing a mask frame support element and a mask frame element according to an embodiment of the present disclosure;

[0067] Figure 8 A schematic diagram showing a mask frame element according to an embodiment of the present disclosure;

[0068] Fig. 9 A schematic diagram showing a substrate support according to an embodiment of the present disclosure;

[0069] Fig. 10A A schematic diagram showing a substrate processing apparatus according to an embodiment of the present disclosure;

[0070] Fig. 10B A schematic diagram showing a substrate processing apparatus according to an embodiment of the present disclosure; and

[0071] Fig.11 Shown is a flow chart illustrating one or more methods of fabricating one or more devices on a large area substrate according to embodiments of the present disclosure. DETAILED DESCRIPTION

[0072] Reference will now be made in detail to various embodiments, with one or more examples of the embodiments illustrated in each figure. Each example is provided in an illustrative manner and is not intended to be limiting. For example, the features illustrated or described as part of one embodiment may be used on any other embodiment or in combination with any other embodiment to produce yet another embodiment. It is contemplated that the present disclosure includes such modifications and variations. In the following description of the drawings, the same reference numerals refer to the same or similar parts. Generally speaking, only the differences relative to individual embodiments are described. Unless otherwise indicated, the description of a part or aspect in one embodiment may also be applied to the corresponding part or aspect in another embodiment.

[0073] The deposition system may include a substrate support, which typically includes a substrate support table, which has, for example, a table body and a table frame, which is coupled to the table body. The table frame can be reversibly coupled to an edge support frame (ESF). The ESF can support a mask, such as a mask for edge exclusion. The substrate can be positioned between the table body and the edge support frame or mask.

[0074] For processing, the substrate is typically arranged between the stage frame and the ESF. The ESF or edge exclusion mask is coupled to the stage frame for processing the substrate. Coupling the ESF or edge exclusion mask to the stage frame holds the mask and substrate in position for processing. The edge exclusion mask masks edge portions of the substrate, such as a couple of millimeters or a few millimeters at the edge of the substrate. Considering large area substrates for display manufacturing, substrates with a surface area of ​​1 m are excluded from processing (such as deposition) by the edge exclusion mask. 2 or larger (such as 4m 2 or larger) at a few millimeters around the rectangular periphery of the substrate.

[0075] The process may involve tilting the substrate support for coating. After the process, the ESF is separated from the stage frame and the coated substrate is replaced. During the process, the substrate temperature and the temperature of the edge exclusion mask may be increased, for example, by heating or by energy provided by the substrate process. For example, the temperature may be 100° C. or higher, such as 150° C. or higher.

[0076] Figure 1 An edge exclusion mask 100 is shown. The edge exclusion mask includes a mask frame and a mask frame support. The mask frame includes a mask frame element that is disposed between the mask frame and the mask frame support. Figure 1 The mask frame support includes a mask frame support element. Figure 1 As shown in , the mask frame elements include mask frame side elements 102 and mask frame corner elements 103 .

[0077] Figure 1 The mask frame shown in FIG. 1 provides a rectangular hole and masks the substrate 50 (ie, Figure 1 As will be appreciated by those skilled in the art, other shapes of substrates and corresponding shapes of mask frames or edge exclusion masks may be provided, respectively. For example, the substrate and the aperture may be circular, elliptical, other polygonal shapes, or the like. The directions as mentioned herein may also be considered as directions of a polar coordinate system or a cylindrical coordinate system, respectively, for non-polygonal substrate shapes.

[0078] The substrate 50 (e.g., a rectangular substrate) includes a first side edge 54a, a second side edge 54b, a third side edge 54c, and a fourth side edge 54d. The first side edge and the third side edge are opposite to each other and / or parallel to each other. The second side edge and the fourth side edge are opposite to each other and / or parallel to each other. Figure 1 , the first side edge and the third side edge extend along the Y direction, and the second side edge and the fourth side edge extend along the X direction. Accordingly, for the embodiments described herein, for each figure, the direction extending along the side edge of the substrate or configured to extend along the side edge of the substrate is considered to be the Y direction of the first side edge and the third side edge of the substrate and the X direction of the second side edge and the fourth side edge of the substrate. Figure 8 , the edge exclusion mask, the mask frame support element and / or the mask frame element corresponding to Figure 1 As described above, those skilled in the art will appreciate that when referring to the second side edge or the fourth side edge instead of the third side edge, the X direction and the Y direction may need to be swapped. Figure 8 , generally speaking, side edges or mask edges are mentioned, ie, no third side edges or the like are mentioned.

[0079] like Figure 1 As shown in , the edge exclusion mask or the mask frame respectively has a mask edge corresponding to the side edge of the substrate. Figure 1 A first mask edge 104a, a second mask edge 104b, a third mask edge 104c, and a fourth mask edge 104d are shown. For other substrate shapes, one or more mask edges corresponding to substrate edges (i.e., side edges of the substrate) may be provided. According to some embodiments, which may be combined with other embodiments described herein, the shape of the mask edge or aperture provided by the mask frame is geometrically similar to the shape of the substrate.

[0080] FIG2 shows a schematic cross-sectional view of an edge exclusion mask 10 that has been used previously. FIG2 shows a portion of a mask frame support, i.e., a portion of an edge support frame ESF or a mask frame support element 22. The mask frame element 24 is coupled and / or attached to the mask frame support element. The mask edge 14 and the side edge of the substrate 50 extend in the Y direction. The edge region 21 is masked by the edge exclusion mask. The mask frame support element is configured to provide contact with the substrate. The substrate is held and fixed by the contact of the mask frame support element.

[0081] like Figure 1, the substrate may show size and shape tolerances. In addition, thermal expansion may occur differently for edge exclusion masks and shapes, causing further deviations in the side edge position of the substrate and the corresponding mask edge position. Considering the tolerance of about 2mm to 8mm on each side of the substrate, the edge area 21 typically has a minimum size of several millimeters to ensure that the ESF contacts the substrate during processing, thereby avoiding failure of the substrate support, which may cause glass cracking or the like. The tolerance of 2mm to 8mm will help mask the substrate. Because of the masking, the processing material will not be coated on other materials (such as the edge on stage (EOT), i.e., the edge exclusion mask or the base plate, i.e., the substrate support stage).

[0082] Embodiments of the present disclosure allow for reduced size edge regions that are excluded from processing (e.g., material deposition). Overlap of edge exclusion masks with substrates can be reduced. Substrate loss can be reduced, and substrate usage can be increased. For example, the area available for deposition (such as sputtering deposition) can be increased.

[0083] According to an embodiment, a mask frame support element is provided. The mask frame support element comprises, along a first direction configured to extend along a side edge of a substrate (particularly alternately), a protruding section configured to provide contact with the substrate, and a recessed section configured to couple a portion of the mask frame to the mask frame support. For example, with respect to FIG. 3A to FIG. 8 , the first direction is the Y direction. The protruding section and the recessed section protrude or recess respectively in the X direction. In the Y direction, the first protruding section is adjacent to the first recessed section, the second recessed section is adjacent to the first protruding section, the second protruding section is adjacent to the second recessed section, and so on.

[0084] A zigzag glass protection strip or a zigzag mask frame support element (i.e., having protruding sections and recessed sections) may be provided for an edge exclusion mask, for example, for holding a substrate on a substrate support table. The edge exclusion mask may also be referred to as an "edge on table" (EOT). Due to the zigzag design, the edge exclusion mask may also be strengthened. According to some embodiments, a zigzag contact of the mask frame support with the substrate is provided compared to the straight-line contact of a conventional mask frame shown in FIG. 2 . Due to the zigzag design, the mask edge may be shorter and / or the edge region 21 (the edge region 21 having the overlap of the edge exclusion mask with the substrate) may be smaller.

[0085] According to some embodiments, which can be combined with other embodiments described herein, the connection between the mask frame support element and the mask frame element can be provided by a protrusion engaging with the cavity. Figures 3A to 5Additionally or alternatively, the connection may be provided by a dovetail connection. FIG. 6A to FIG. 8 The diagram is shown as an example in FIG.

[0086] Figure 3A and Figure 3B A schematic cross-sectional view of an edge exclusion mask 100 according to an embodiment of the present disclosure is shown. The same view is shown for parts of the edge exclusion mask and / or the mask frame support element and the mask frame element, respectively. Figure 3A A cross-sectional view at a first position along the Y direction (eg, along a first direction configured to extend along a side edge of the substrate) is shown. Figure 3B A cross-sectional view at a second position along the Y direction (eg, along the first direction configured to extend along the side edge of the substrate) is shown. Figure 3A In FIG. 3 , the mask frame support element 302 has a protruding section 312. Figure 3B , the mask frame support element 302 has a recessed section. The protruding section 312 is configured to contact the substrate 50. The recessed section is configured to couple the mask frame element 304 to the mask frame support element 302.

[0087] The mask frame element 304 includes a body having a mask edge 104. The mask edge is oriented along a first direction (ie, along Figure 3A and Figure 3B The first direction extends along the side edge of the substrate 50 and / or parallel to the side edge 54 of the substrate 50. The mask edge (eg, a straight mask edge) is provided at Figure 3A The first section shown in Figure 3B The mask edge is provided by a downwardly extending protrusion. A first width 322 is provided in the first section. The first width extends from the mask edge and away from the mask edge. A second width 324 is provided in the second section. The second width is greater than the first width. The second width extends from the mask edge and away from the mask edge. The first width and the second width may be the width of a protrusion extending downwardly from the main body of the mask frame element or the upper portion of the mask frame element, respectively.

[0088] The first section of the mask frame element 304 corresponds to the protruding section of the mask frame support element 302. The second section of the mask frame element 304 corresponds to the recessed section of the mask frame support element 302. The difference of the first width 322 relative to the second width 324 corresponds to the width difference between the protruding section and the recessed section. According to some embodiments that can be combined with other embodiments described herein, the width difference between the protruding section of the mask frame support element and the recessed section of the mask frame support element can be 1 mm or more. Correspondingly, the width difference between the first width and the second width of the protrusion of the mask frame element can be 1 mm or more.

[0089] like Figure 3B As shown by the dashed line 315 in FIG. 3 , the recessed section of the mask frame support element 302 is inclined downward and away from the protruding section. A tip is formed in the upper portion of the mask frame support element 302 at a certain position of the recessed section. An undercut is formed in the lower portion of the mask frame support element 302 at a certain position of the recessed section.

[0090] like Figure 3B , the second section of the mask frame element forms a cavity 334. An end is formed in a lower portion of the mask frame element 304 at a location in the second section. An undercut or cavity is formed in an upper portion of the mask frame element 304 at a location in the second section. The cavity or undercut is configured to engage the mask frame element with the mask frame support element and / or to attach the mask frame element to the mask frame support element. The end of the mask frame support element and the cavity of the mask frame support element correspond to each other to provide coupling between the mask frame element and the mask frame support element. According to some embodiments that can be combined with other embodiments described herein, the mask frame element is attached to the mask frame support element or engaged with the mask frame support element to minimize or avoid vertical movement of the mask frame element and the mask frame support element relative to each other, i.e., movement away from or toward the substrate. According to some embodiments that can be combined with other embodiments described herein, the recessed section of the mask frame support element is configured to receive the cavity of the mask frame element to attach the mask frame element to the mask frame support element. According to some embodiments that can be combined with other embodiments described herein, the recessed section of the mask frame support element and the second section of the mask frame element provide a positive locking connection.

[0091] Figure 431 and 32 are schematic diagrams of portions of a mask frame support element or ESF, respectively. The protruding sections 312 and recessed sections 314 of the mask frame support element 302 form a zigzag structure along the Y direction. The recessed sections 314 are inclined downward and away from the mask edge, as indicated by dashed lines 315, to allow connection between mask frame elements in the mask frame support element.

[0092] The zigzag structure allows the edge exclusion mask to have sufficient contact with the substrate, particularly in the protruding sections, to provide reliable contact with the substrate, even in the presence of substrate shape and / or substrate size tolerances and even in the presence of thermal expansion. The zigzag structure further allows the mask frame element to be securely coupled to the mask frame support element, particularly in the recessed sections. The second width 324 is large enough to allow the mask frame element to be coupled in the mask frame support element. The mask typically allows for thermal expansion while shielding the edges of the substrate from coating, as it is beneficial for some applications not to coat material on all glass.

[0093] Figure 5 A schematic diagram of a mask frame element 304 is shown. The mask frame element 304 has a mask edge, in particular a straight mask edge, to provide an edge exclusion mask for a substrate. A cavity 334 is formed in the second section of the mask frame element. The cavity or undercut allows the mask frame element 304 to be attached to a mask frame support element.

[0094] As described above, the recessed section of the mask frame support element and the second section of the mask frame element may provide a positive locking connection. Fig. 6A , Figure 6B , Figure 7 and Figure 8 Further examples are shown, in which the connection between the mask frame element and the mask frame support element is provided by a dovetail joint.

[0095] Fig. 6A and Figure 6B A schematic cross-sectional view of an edge exclusion mask 100 according to an embodiment of the present disclosure is shown. The same view is shown for parts of the edge exclusion mask and / or the mask frame support element and the mask frame element, respectively. Fig. 6A A cross-sectional view at a first position along the Y direction (eg, along a first direction configured to extend along a side edge of the substrate) is shown. Figure 6B A cross-sectional view at a second position along the Y direction (eg, along the first direction configured to extend along the side edge of the substrate) is shown. Fig. 6A In FIG. 3 , the mask frame support element 302 has a protruding section 312. Figure 6B, the mask frame support element 302 has a recessed section 314. The protruding section 312 is configured to contact the substrate 50. The recessed section is configured to couple the mask frame element 304 to the mask frame support element 302 with a dovetail connection.

[0096] The mask frame element 304 includes a body having a mask edge 104. The mask edge is oriented along a first direction (ie, along Fig. 6A and Figure 6B The first direction extends along the side edge of the substrate 50 and / or parallel to the side edge 54 of the substrate 50. The mask edge (eg, a straight mask edge) is provided at Fig. 6A The first section shown in Figure 6B . The mask edge is provided by a downwardly extending protrusion. A first width 322 is provided in the first section. The first width extends from the mask edge and away from the mask edge. A second width 324 is provided in the second section. The second width is greater than the first width. The second width extends from the mask edge and away from the mask edge. The first width and the second width may be the width of a protrusion extending downwardly from the main body of the mask frame element or the upper portion of the mask frame element, respectively.

[0097] The first section of the mask frame element 304 corresponds to the protruding section of the mask frame support element 302. The second section of the mask frame element 304 corresponds to the recessed section of the mask frame support element 302. The difference in the first width 322 relative to the second width 324 corresponds to the width difference between the protruding section and the recessed section. The width difference may be similar to Figure 3A and Figure 3B The described embodiments are provided.

[0098] According to some embodiments that can be combined with other embodiments described herein, the mask frame element is attached to or engaged with the mask frame support element to minimize or avoid vertical movement of the mask frame element and the mask frame support element relative to each other, i.e., movement away from or towards the substrate. According to some embodiments that can be combined with other embodiments described herein, the recessed section of the mask frame support element and the second section of the mask frame element provide a positive locking connection via a dovetail joint. According to some embodiments that can be combined with other embodiments described herein, the positive locking mechanism with the dovetail joint can be combined with other locking mechanisms described herein, for example, in different areas of the ESF or the mask frame.

[0099] Figure 7Schematic diagrams of a portion of a mask frame support element or ESF and a mask frame element or mask frame, respectively. The views are cross-sectional views parallel to the substrate edge or mask edge (in the Y direction) to further illustrate the dovetail connection. The protruding sections and recessed sections 314 of the mask frame support element 302 form a zigzag structure along the Y direction.

[0100] The zigzag structure allows sufficient contact of the edge exclusion mask with the substrate, particularly in the protruding sections, to provide reliable contact with the substrate, even in the presence of substrate shape and / or substrate size tolerances and even in the presence of thermal expansion. The zigzag structure further allows a secure coupling of the mask frame element to the mask frame support element, particularly in the recessed sections. The second width 324 is large enough to allow the mask frame element to be coupled in the mask frame support element.

[0101] Figure 8 A schematic diagram of a mask frame element 304 is shown. The mask frame element 304 has a mask edge, in particular a straight mask edge, to provide an edge exclusion mask for a substrate. A dovetail connector 834 is formed in a second section of the mask frame element, in particular for attaching the mask frame element 304 to a mask frame support element.

[0102] According to some embodiments, which can be combined with other embodiments described herein, the mask frame support element may include PEEK, polyimide (e.g., Vespel), polybenzimidazole (e.g., Celazole), or a combination thereof. According to some embodiments, which can be combined with other embodiments described herein, the mask frame element may include aluminum, titanium, or a combination thereof. Additionally or alternatively, the mask frame element may have a structured surface, in particular to reduce flaking of deposited material adhered to the mask frame element.

[0103] Embodiments of the present disclosure provide a zigzag substrate protection strip with a corresponding mask frame. The overlap of the edge exclusion mask and the substrate can be reduced by 1 mm or more, for example, by about 2 mm. The overlap can be defined as the distance between the substrate edge and the mask edge projected into the substrate plane. Considering the size of, for example, an 8th generation substrate, the substrate area to be processed (e.g., by sputtering deposition) can be increased by about 185 cm 2 For example, the efficiency of a sputtering deposition source can be improved. The area of ​​uniform material deposition can be increased by moving the mask edge closer to the substrate edge. In addition, the zigzag structure of the mask support element can enhance the structural design.

[0104] Some embodiments, features, and details are described herein with respect to mask frame elements or mask frame support elements. The mask frame elements can be coupled together to form a mask frame. The mask frame elements can also be referred to as mask frame portions, wherein straight elements (such as mask frame side elements 102) and corner elements (such as mask frame corner elements 103) (see Figure 1 ) are elements of a mask frame that can be connected together. The same applies to the mask frame support element. The mask frame and optionally the mask frame support (i.e., the edge support frame (ESF)) provide an edge exclusion mask. The embodiments, features and details described with respect to the mask frame element and the mask frame support element similarly apply to the edge exclusion mask.

[0105] According to one embodiment, an edge exclusion mask configured for masking a substrate edge of a substrate is provided. The substrate may be supported on a stage. The edge exclusion mask comprises: a mask frame configured to provide a mask edge; and a mask frame support having a plurality of mask frame support elements. The mask frame and / or the mask frame support element are configured to provide contact with the substrate. One or more of the plurality of mask frame support elements are provided according to the embodiments described herein. In particular, a zigzag design may be provided. One or more of the plurality of mask frame support elements comprises a protruding section and a recessed section as described herein.

[0106] refer to Fig. 9 , schematically illustrates a substrate support 900 according to some embodiments of the present disclosure. The substrate support 900 includes a stage body and a stage frame 940. The stage body may be configured to support a substrate (not shown). According to another embodiment that may be combined with other embodiments described herein, a fixture may be provided to fix the ESF of the edge exclusion mask 100 to the stage frame 940 and / or the stage (i.e., substrate support stage).

[0107] like Fig. 9 As shown in FIG. 1 , according to an embodiment, the substrate support includes an ESF or edge exclusion mask 100. Fig. 9 In FIG. 1 , the edge exclusion mask is shown with solid lines as being in a coupled configuration, ie, in a configuration in which the substrate is supported on a substrate supporting table and secured with the edge exclusion mask.

[0108] According to embodiments that can be combined with other embodiments described herein, the substrate support 900 may have a substrate (not shown) disposed between the stage frame 940 and the edge exclusion mask 100 or the ESF of the edge exclusion mask. The substrate may be fixed between the stage frame 940 and the ESF. The substrate may be fixed (e.g., clamped) between the stage frame and the ESF by contact of the mask frame support or the mask frame support element, respectively, with the substrate (particularly in the protruding section of the mask frame support element).

[0109] like Fig. 9 As shown in , according to an embodiment, the substrate support 900 may include a tilt drive 920 for tilting a portion of the substrate support 900 (particularly a portion including a substrate, for example, a stage body having a stage frame 940 and an edge exclusion mask in a coupled configuration). Tilt the portion of the substrate support may involve a tilting motion 924. The tilting motion may involve rotating the portion of the substrate support about a common axis along a defined angular range. The tilting of the substrate support may move the portion of the substrate support from a substantially horizontal position into a substantially vertical position, such as Fig. 9 926. The vertical position 926 can be advantageously used in certain stages of substrate processing operations, such as material deposition operations. The horizontal position can be advantageously used in other certain stages of substrate processing operations, such as loading and / or unloading of substrates. According to some embodiments, which can be combined with other embodiments described herein, the substantially vertical or substantially horizontal orientation can deviate from the vertical orientation or the horizontal orientation, respectively, by ±15°.

[0110] like Fig. 9 As shown in , according to an embodiment, the substrate support 900 may include a lift pin assembly including substrate support pins 910 or lift pins and a lift pin driver or actuator 912. The lift pin assembly may be configured to specifically lift and lower portions of the substrate support 900, and in particular to lift and lower an edge exclusion mask in the direction of ESF motion 914. The direction of ESF motion 914 or edge exclusion mask motion may be perpendicular to the substrate surface.

[0111] like Fig. 9 As shown in , according to an embodiment, the action of the lift pin assembly can move the substrate support 900 from a coupled state to an uncoupled state 916 by lifting the edge exclusion mask relative to the stage frame 940. According to embodiments that can be combined with other embodiments described herein, the uncoupled state 916 can be used for specific stages of a substrate processing method, such as loading and / or unloading of a substrate.

[0112] According to embodiments that can be combined with the embodiments described herein, the substrate support as described herein, in particular the substrate support 900, can be configured to operate inside a vacuum chamber, in particular a vacuum chamber of a deposition apparatus. The vacuum can be a constant vacuum, or the vacuum can be cycled, i.e., changed between a vacuum state and a pressurized state.

[0113] According to an embodiment, a substrate support is provided. The substrate support includes a stage body and a stage frame coupled to the stage body. An edge exclusion mask according to any embodiment of the present disclosure is at least partially provided at or above the stage frame. The edge exclusion mask can be moved relative to the stage frame, in particular for loading and / or unloading a substrate.

[0114] Fig. 10A A schematic diagram of a substrate processing apparatus 1000 for depositing a material on a substrate 50 is shown. The substrate moves relative to a processing region 1310 inside a vacuum chamber 1100. Fig. 10A A material deposition source 1200 is shown. In particular, the material deposition source 1200 may be a sputtering cathode of a cathode array, such as a rotatable sputtering cathode. A processing region 1310 is provided in a region in front of the material deposition source 1200 .

[0115] The source can provide the ejected material, such as Fig. 10A The substrate processing apparatus 1000 for depositing a material on a substrate 50 includes a vacuum chamber 1100. The substrate 50 may be supported by a substrate support member 900, such as Fig. 9 , and corresponding embodiments may be included in the substrate processing apparatus 1000. In some embodiments, the support body may include a support surface 1440. The support body is located inside the vacuum chamber 1100. According to an embodiment of the present disclosure, the apparatus includes a tilt driver 920 coupled to the support surface 1440.

[0116] Fig. 10A The substrate 50 is shown supported on a support surface 1440 of a support body. According to embodiments described herein, the substrate 50 is partially covered by an edge exclusion mask.

[0117] Embodiments described herein relate particularly to material deposition, such as for display fabrication on large area substrates. According to some embodiments, a large area substrate or a carrier supporting one or more substrates may have a thickness of at least 0.5 m 2 For example, the deposition system can be adapted to process large area substrates, such as the 5th generation (corresponding to about 1.4 m 2 Substrate (1.1m×1.3m)), 6th generation (corresponding to about 2.7m 2 (1.5m×about 1.8m)), 7.5th generation (corresponding to about 4.29m 2Substrate (1.95m×2.2m)), 8.5th generation (corresponding to about 5.7m 2 substrate (2.2m×2.5m)) or even the 10th generation (corresponding to about 8.7m 2 Substrates (2.85 m×3.05 m)). Even higher generations (such as 11th and 12th generations) and corresponding substrate areas can be implemented similarly. According to further embodiments, half the size of the above-mentioned substrate generations can be processed. Alternatively or additionally, semiconductor wafers can be processed and coated in a deposition system according to the present disclosure.

[0118] The apparatus and systems described herein are configured to mask a substrate, which may particularly have a 1 m 2 or larger surface. The term "substrate" may particularly encompass substrates such as glass substrates used in display manufacturing, and may also encompass substrates such as wafers, slices of transparent crystals (such as sapphire) or the like. However, the term "substrate" may encompass other substrates that may be non-flexible or flexible, such as, for example, foils or webs. The substrate may be formed of any material suitable for material deposition.

[0119] Embodiments described herein may relate to components of a deposition system, wherein a substrate (which may be a substrate as described above) is loaded and unloaded in a horizontal configuration, and wherein the substrate is processed, e.g. coated, in a vertical configuration. Deposition systems according to embodiments described herein are suitable for use in deposition apparatuses that support substrates in different configurations, in particular deposition apparatuses that include a tilt drive for moving the substrate between a horizontal configuration and a vertical configuration.

[0120] As in Fig. 10A In and also in Fig. 10B The vacuum processing apparatus or vacuum deposition apparatus described in may be provided in a cluster system, wherein one or more vacuum processing apparatuses are coupled to a central transfer chamber, in particular a central vacuum transfer chamber.

[0121] Fig. 10B 1 shows a vacuum processing device or substrate processing device 1000, for example, a vacuum deposition device. The deposition device includes a vacuum chamber. Fig. 10B The vacuum chamber 1100 exemplarily shown in FIG. 1 includes segments, such as source frame segments. The source frame segments are configured to support source components and / or source support components, respectively. Fig. 10B As shown in , a plurality of sputtering cathodes (ie, material deposition sources 1200) and a plurality of anodes 1202 are provided in a source frame segment. Alternatively, one or more other sources may be provided and / or supported by a source support assembly.

[0122] A substrate handling section is provided below the source frame section. The substrate handling section includes or houses components for substrate handling, substrate alignment, substrate masking, substrate support, or the like. The substrate handling section may have an upper portion and a lower portion, wherein the lower portion may include a bottom cover assembly. Fig. 10B A substrate support table and an actuator 912 coupled to the substrate support body are shown. The actuator may be a linear actuator or drive configured to vertically move the substrate support body. For example, Fig. 10B The substrate support body is shown in a first position below the upper ends of the substrate support rods 910. The actuator may move the support body to a second position, i.e., an upper position, in which the substrate support body is positioned above the upper ends of the substrate support rods 910. In the second position, the substrate may be masked by the edge exclusion mask 100. The edge exclusion mask may be provided according to any of the embodiments described herein.

[0123] When the substrate support body moves from the first position to the second position, the substrate 50 disposed on the substrate support rods 910 will be contacted by the substrate support body. Accordingly, by lifting the substrate support body from the first position to the second position, the substrate can be disposed on the substrate support body for material deposition.

[0124] According to some embodiments of the present disclosure, which may be combined with other embodiments described herein, the substrate support may be a support table (e.g., a substrate support table) or a pedestal (e.g., a substrate support pedestal provided in a processing chamber of a vacuum processing system). The support table may be particularly configured for horizontal substrate processing or substantially horizontal substrate processing. For example, a processing chamber including a substrate support may be provided in a cluster system. When a substrate is loaded onto the substrate support, the substrate may be provided onto an electrostatic chuck until an electrostatic force is established. Some embodiments of the present disclosure provide a substrate support having an electrostatic chuck.

[0125] According to an embodiment, a substrate processing apparatus is provided. The substrate processing apparatus comprises a vacuum chamber and a substrate support according to any of the embodiments described herein, the substrate support being provided within the vacuum chamber. In particular, an edge exclusion mask according to an embodiment of the present disclosure is provided, the edge exclusion mask having one or more mask frame support elements as described herein and / or one or more mask frame elements as described herein. The vacuum chamber may comprise a port 1110 for connecting a vacuum pump to the vacuum chamber.

[0126] refer to Fig.11, a flow chart is shown, which illustrates a method 11 of manufacturing one or more devices on a substrate. The substrate may be, in particular, a large area substrate as described herein and / or a substrate for display manufacturing. The method includes loading the substrate on a stage body of a substrate support stage in frame 13 to be supported by the stage body. The substrate may be as described with respect to Fig. 10A and Fig. 10B as described herein and / or may be loaded into a substrate processing apparatus ... Fig. 9 The method further includes in frame 15 bringing the substrate into contact with one or more mask frame support elements through the protruding sections while not bringing the substrate into contact with the recessed sections of the one or more mask frame support elements. This corresponds to Figure 3A and Figure 3B as well as Fig. 6A and Figure 6B . The details of the mask frame support element described herein can be implemented with respect to the method described. The method also includes processing the substrate while contacting (see box 17). Processing the substrate particularly includes depositing material on the substrate, and more particularly, depositing the material by sputtering (e.g., using a rotatable sputtering cathode). The rotatable sputtering cathode can have a cylindrical target. For example, an array of sputtering cathodes can be used for substrate processing.

[0127] A method may further include masking an edge of a substrate with a mask frame supported by one or more mask frame support elements. For example, the mask frame may provide a straight mask edge along one or more of the protruding segments and one or more of the recessed segments. According to some embodiments that may be combined with other embodiments described herein, the nominal width of the mask area (i.e., the width excluding glass size or glass shape tolerances and excluding thermal expansion) may be 2.7 mm or less, in particular 2 mm or less or even 1.5 mm or less. According to some embodiments that may be combined with other embodiments described herein, a clamping area of ​​1.5 mm or less (e.g., about 1 mm) is provided.

[0128] While the foregoing is directed to particular implementations of the present disclosure, other and further implementations of the disclosure may be devised without departing from the basic scope of the disclosure, the scope of which is determined by the appended claims.

Claims

1. A mask frame support element for a mask frame support, characterized in that Along a first direction configured to extend along a side edge of the substrate includes: a protruding section configured to provide contact with the substrate; and A recessed section is configured to couple a portion of a mask frame to the mask frame support. 2 . The mask frame supporting element according to claim 1 , wherein a width difference between the protruding section and the recessed section is 1 mm or more. 3 . The mask frame support element of claim 1 , wherein the recessed section is inclined downward and away from the protruding section.

4. The mask frame support element of claim 3, wherein the protruding section protrudes in a second direction, wherein the recessed section is recessed in the second direction, and wherein the recessed section is inclined downwardly toward a substrate plane of the substrate and away from the substrate in the second direction. 5 . The mask frame support element of claim 1 , wherein the recessed section is configured to receive an undercut portion of a mask frame element to attach the mask frame element to the mask frame support element. The mask frame support element of claim 1 , wherein the recessed section is shaped to form a dovetail joint. The mask frame supporting element of claim 1 , wherein the protruding section protrudes in a second direction. 8 . The mask frame supporting element according to claim 7 , wherein the recessed section is recessed in the second direction. 9 . The mask frame support element of claim 8 , wherein a width difference between the protruding section and the recessed section in the second direction is 1 mm or more.

10. The mask frame support element of claim 1, wherein the mask frame support element is configured to be coupled together with one or more additional mask frame support elements to form the mask frame support. 11 . The mask frame supporting element according to claim 1 , wherein a terminal end is formed in an upper portion of the mask frame supporting element at a certain position of the recessed section. 12 . The mask frame supporting element according to claim 11 , wherein an undercut portion is formed in a lower portion of the mask frame supporting element at a certain position of the recessed section.

13. The mask frame support element according to any one of claims 1 to 3, 5, 6 or 10 to 12, wherein the protruding section protrudes in the second direction. 14 . The mask frame supporting element of claim 13 , wherein the recessed section is recessed in the second direction.

15. The mask frame support element according to any one of claims 1, 3, 5, 6 or 10 to 12, wherein the protruding section protrudes in a second direction, wherein the recessed section is recessed in the second direction, and wherein a width difference between the protruding section and the recessed section in the second direction is 1 mm or greater.

16. The mask frame support element according to any one of claims 1 to 12, wherein the mask frame support element comprises more than one protruding section and more than one recessed section, wherein the mask frame support element comprises the more than one protruding section and the more than one recessed section alternately along the first direction.

17. According to the mask frame support element of claim 16, the more than one protruding sections include at least a first protruding section and a second protruding section; the more than one recessed sections include at least a first recessed section and a second recessed section; wherein the first protruding section is adjacent to the first recessed section, the second recessed section is adjacent to the first protruding section, and the second protruding section is adjacent to the second recessed section.

18. The mask frame support element of claim 16, wherein the mask frame support element comprises a zigzag design to provide a zigzag contact with the substrate.

19. An edge exclusion mask configured to mask a substrate edge of a substrate, the substrate being supported on a stage, the edge exclusion mask being characterized by comprising: a mask frame configured to provide a mask edge; and A mask frame support having a plurality of mask frame support elements configured to provide contact with the substrate, one or more of the plurality of mask frame support elements being a mask frame support element according to any one of claims 1 to 12.

20. The edge exclusion mask of claim 19, wherein the mask frame comprises a plurality of mask frame elements, wherein each mask frame element of the plurality of mask frame elements comprises: A main body having a mask edge extending in a first direction, the first direction being configured to extend along a side edge of a substrate, the main body having a protrusion extending downward and providing the mask edge, the protrusion comprising: a first segment having a first width extending from the mask edge away from the mask edge; and A second segment has a second width greater than the first width, the second width extending from the mask edge away from the mask edge.

21. The edge exclusion mask of claim 20, wherein the second section has an undercut to at least one of: engage with or attach to a mask frame support element.

22. The edge exclusion mask of claim 20, wherein the second segment is shaped to form a dovetail joint.

23. The edge exclusion mask of claim 20, wherein the mask edge is a straight mask edge.

24. The edge exclusion mask of claim 20, wherein the protrusion extends downwardly from an upper portion of the mask frame member.

25. The edge exclusion mask of claim 24, wherein the protrusion extends downwardly toward a substrate plane of the substrate.

26. The edge exclusion mask of claim 20, wherein a difference in width between the first width and the second width of the protrusion of the mask frame member is 1 mm or more.

27. The edge exclusion mask of claim 20, wherein the mask frame element comprises aluminum, titanium, or a combination thereof.

28. The edge exclusion mask of claim 20, wherein the mask frame element has a structured surface.

29. The edge exclusion mask of claim 20, wherein the mask frame element is configured to be coupled together with one or more additional mask frame elements of the plurality of mask frame elements to form the mask frame.

30. The edge exclusion mask of claim 20, wherein the plurality of mask frame elements include at least one of mask frame side elements or mask frame corner elements.

31. The edge exclusion mask of claim 19, wherein the mask frame provides a rectangular hole to mask the substrate edge of the substrate.

32. The edge exclusion mask of claim 20, wherein connections between mask frame support elements of the plurality of mask frame support elements and mask frame elements of the plurality of mask frame elements are provided by protrusions engaging cavities.

33. The edge exclusion mask of claim 20, wherein connections between mask frame support elements of the plurality of mask frame support elements and mask frame elements of the plurality of mask frame elements are provided by dovetail connections.

34. The edge exclusion mask of claim 20, wherein the recessed section of the mask frame support element of the plurality of mask frame support elements and the second section of the mask frame element of the plurality of mask frame elements provide a positive locking connection.

35. The edge exclusion mask of claim 20, wherein the first section of a mask frame element of the plurality of mask frame elements corresponds to the protruding section of a mask frame support element of the plurality of mask frame support elements.

36. The edge exclusion mask of claim 35, wherein the second section of the mask frame elements of the plurality of mask frame elements corresponds to the recessed section of the mask frame support elements of the plurality of mask frame support elements.

37. The edge exclusion mask of claim 36, wherein a difference in the first width relative to the second width of the mask frame element corresponds to a difference in width between the protruding section and the recessed section of the mask frame support element.

38. An edge exclusion mask according to claim 20, wherein mask frame elements of the plurality of mask frame elements are attached to or engaged with mask frame support elements of the plurality of mask frame support elements to prevent the mask frame elements and the mask frame support elements from moving relative to each other in a direction away from or toward the substrate.

39. The edge exclusion mask of claim 20, wherein the recessed section of the mask frame support element of the plurality of mask frame support elements is configured to receive the cavity of the mask frame element of the plurality of mask frame elements to attach the mask frame element to the mask frame support element.

40. The edge exclusion mask of claim 19, wherein the substrate to be masked by the edge exclusion mask has a thickness of at least 0.5 μm. 2 size.

41. The edge exclusion mask of claim 19, wherein the substrate to be masked by the edge exclusion mask has a thickness of 1 m 2 or larger surfaces.

42. A mask frame element, characterized in that include: A main body having a mask edge extending in a first direction, the first direction being configured to extend along a side edge of a substrate, the main body having a protrusion extending downward and providing the mask edge, the protrusion comprising: a first segment having a first width extending from the mask edge away from the mask edge; and A second segment has a second width greater than the first width, the second width extending from the mask edge away from the mask edge.

43. The mask frame element of claim 42, wherein the second section has an undercut to at least one of: engage with or attach to a mask frame support element.

44. The mask frame element of claim 42, wherein the second section is shaped to form a dovetail joint.

45. The mask frame element of claim 42, wherein the mask edge is a straight mask edge.

46. ​​The mask frame element of claim 42, wherein the protrusion extends downwardly from an upper portion of the mask frame element.

47. The mask frame element of claim 46, wherein the protrusion extends downwardly toward a substrate plane of the substrate.

48. The mask frame element according to any one of claims 42 to 47, wherein a difference in width between the first width and the second width of the protrusion of the mask frame element is 1 mm or more.

49. The mask frame element of any one of claims 42-47, wherein the mask frame element comprises aluminum, titanium, or a combination thereof.

50. The mask frame element according to any one of claims 42-47, wherein the mask frame element has a structured surface.

51. The mask frame element according to any one of claims 42-47, wherein the mask frame element is configured to be joined together with one or more further mask frame elements to form a mask frame.

52. A substrate support, characterized in that include: Main body of the platform; a stage frame coupled to the stage body; and According to the edge exclusion mask of claim 19, the edge exclusion mask is at least partially provided at the stage frame.

53. A substrate processing device, characterized in that include: vacuum chamber, and The substrate support of claim 52, provided within the vacuum chamber.

Images