Movable semiconductor ultrapure water preparation device

Abstract

The utility model belongs to the technical field of water treatment, and particularly discloses a movable semiconductor ultrapure water preparation device which comprises a water tank part, a pretreatment part, a primary treatment part, a secondary treatment part, a functional treatment part, a terminal treatment part and a dosing part. All the parts are integrated, convenient to disassemble and assemble and compact in structure. The ultrapure water preparation device capable of integrating various cleaning and purifying functions comprises all process equipment for controlling the water quality index of the ultrapure water, strictly ensures that the water quality of produced water reaches the standard, and is designed with online detection equipment, so that the water quality of the ultrapure water is fully ensured. The whole device is convenient to move, and can be quickly conveyed to a factory for preparing ultrapure water for water preparation, so that the construction cost and the operation and maintenance cost are reduced while the requirements of the production process and the water quality are met. All functional parts in the device are recombined, disassembled and assembled, the market change requirements are met, the equipment cost is reduced by adopting the reasonable and integrated device, and the quality and efficiency of preparing ultrapure water are improved.

Description

Technical Field

[0001] The present disclosure relates to the technical field of water treatment, and in particular to a movable semiconductor ultrapure water preparation device. Background Art

[0002] Ultrapure water is water that contains almost no impurities. Ions, DO (dissolved oxygen), TOC (total organic carbon) and other impurities are removed as much as possible. It is used in places where water quality is extremely high. For example, in the production process of semiconductor products, ultrapure water is needed to clean various products in semiconductor manufacturing. Because water quality has a significant impact on the quality and performance of the products, stable ultrapure water is an indispensable part of the semiconductor production line. In the preparation process of ultrapure water, it is required to remove ions, dissolved oxygen, total organic carbon and other impurities in the water as much as possible, so that its composition is infinitely close to 100% water molecules, and the resistivity can reach more than 18.2MΩcm at 25°C to meet the demand.

[0003] However, with the continuous adjustment of the market demand for ultrapure water consumption and water quality, primary environmental problems and the relative shortage of water resources, the technology and requirements for ultrapure water treatment are also constantly adjusted. The existing ultrapure water treatment equipment cannot adapt well to the changes in demand, the equipment structure is fixed, and the treatment effect is also single, which cannot better meet the market demand. Summary of the invention

[0004] To this end, the present disclosure proposes a movable semiconductor ultrapure water preparation device to solve the above-mentioned problems.

[0005] The present disclosure provides a movable semiconductor ultrapure water preparation device, comprising: a water tank part, a pretreatment part, a primary treatment part, a secondary treatment part, a functional treatment part, a terminal treatment part and a dosing part;

[0006] The water tank part includes a raw water tank, a filtered water tank, a reverse osmosis water tank, a pure water tank and an ultrapure water tank. The raw water tank is arranged at the uppermost part of the device, the ultrapure water tank is arranged at the lowermost part of the device, and the filtered water tank, the reverse osmosis water tank and the pure water tank are arranged in the device corresponding to other functions.

[0007] The pre-treatment unit and the terminal treatment unit are both connected to the reverse osmosis water tank; the primary treatment unit and some equipment in the secondary treatment unit are connected to the reverse osmosis water tank;

[0008] The functional processing part is connected to the reverse osmosis water tank and the pure water tank respectively;

[0009] The dosing part is respectively connected to the raw water tank, the pretreatment part, the primary treatment part and the secondary treatment part;

[0010] The terminal processing unit is connected to the ultrapure water tank;

[0011] The water tank part, the pretreatment part, the primary treatment part, the secondary treatment part, the functional treatment part, the reverse osmosis water tank, the pure water tank, the terminal treatment part, and the ultrapure water tank are connected in sequence, and the dosing part, the primary treatment part, the secondary treatment part, and the functional treatment part are interspersed in the device.

[0012] Preferably, the water tank part, the pretreatment part, the primary treatment part, the secondary treatment part, the functional treatment part and the terminal treatment part are respectively provided with power pumps, namely: raw water supply pump, pretreatment ultrafiltration backwash pump, reverse osmosis water supply pump, primary reverse osmosis high-pressure water pump, secondary reverse osmosis high-pressure water pump, EDI water supply pump, terminal water supply pump.

[0013] Preferably, a pre-treatment heat exchanger and a terminal heat exchanger are also provided. The pre-treatment heat exchanger is provided in the pre-treatment section, and the terminal heat exchanger is provided in the terminal treatment section.

[0014] Preferably, the raw water tank is further provided with a raw water supply pump, and the raw water supply pump is connected to the pre-treatment part;

[0015] The pretreatment unit comprises: a pretreatment filter, a pretreatment ultrafiltration membrane, a pretreatment ultrafiltration backwash water pump and a reverse osmosis security filter, wherein the pretreatment filter, the pretreatment ultrafiltration membrane, the pretreatment ultrafiltration backwash water pump and the reverse osmosis security filter are connected in sequence; the pretreatment filter is also connected to the raw water supply pump, the pretreatment ultrafiltration membrane and the pretreatment ultrafiltration backwash water pump are also connected to a filter water tank, and the pretreatment ultrafiltration backwash water pump and the reverse osmosis security filter are also connected to the pretreatment heat exchanger;

[0016] The terminal processing section includes: a terminal water supply pump, a terminal heat exchanger, a terminal filter and a terminal ultrafiltration membrane, and the terminal water supply pump, the terminal heat exchanger, the terminal filter and the terminal ultrafiltration membrane are connected in sequence; the terminal water supply pump and the terminal heat exchanger are connected and are jointly arranged between the primary processing section and the secondary processing section; the terminal filter and the terminal ultrafiltration membrane are connected in sequence to the ultrapure water tank.

[0017] Preferably, the functional processing section comprises: a polishing mixed bed and a total EDI device, wherein the polishing mixed bed is connected to the secondary processing section, and the total EDI device is arranged upstream of the primary processing section;

[0018] The total EDI equipment includes an EDI water supply pump and an EDI security filter, the EDI water supply pump is connected to the EDI security filter, and the EDI water supply pump and the EDI security filter are arranged between the primary processing part and the secondary processing part;

[0019] The polishing mixed bed is arranged in the secondary treatment section.

[0020] Preferably, the equipment in the primary treatment section is consistent with that in the secondary treatment section, including: a reverse osmosis high-pressure water pump, a reverse osmosis structure, an ultraviolet TOC removal device, an EDI device and a degassing membrane, and the reverse osmosis high-pressure water pump, the reverse osmosis structure, the ultraviolet TOC removal device, the EDI device and the degassing membrane are connected in sequence;

[0021] They are first-stage reverse osmosis structure, first-stage reverse osmosis high-pressure water pump, first-stage ultraviolet TOC removal device, first-stage EDI equipment and first-stage degassing membrane; second-stage reverse osmosis structure, second-stage reverse osmosis high-pressure water pump, second-stage ultraviolet TOC removal device, second-stage EDI equipment and second-stage degassing membrane;

[0022] The first-level reverse osmosis high-pressure water pump is connected to the first-level reverse osmosis structure, and the first-level reverse osmosis high-pressure water pump is also connected to the reverse osmosis security filter. The first-level reverse osmosis structure is connected downstream to the second-level reverse osmosis high-pressure water pump and the second-level reverse osmosis structure, and the second-level reverse osmosis structure is connected to the reverse osmosis water tank. After the reverse osmosis water tank is connected to the total EDI equipment, the first-level ultraviolet TOC removal device is connected and a second-level EDI device is arranged between the first-level EDI equipment and the first-level degassing membrane. The first-level degassing membrane is connected to the pure water tank, and the pure water tank is connected to the terminal water supply pump and the terminal heat exchanger. The terminal heat exchanger is connected to the second-level ultraviolet TOC removal device, and the second-level ultraviolet TOC removal device is connected to the second-level degassing membrane through the polishing mixed bed, and the second-level degassing membrane is connected to the terminal filter.

[0023] Preferably, a detection equipment group is also provided, which includes: a DO meter, a silicon meter, a boron meter, a particle meter and a first-level conductivity resistivity meter. The DO meter, the silicon meter, the boron meter, the particle meter and the first-level conductivity resistivity meter are all online detection devices.

[0024] Preferably, an air compressor is also provided, and the air compressor is connected to the terminal ultrafiltration membrane.

[0025] Compared with the prior art, the movable semiconductor ultrapure water preparation device provided by the present disclosure has the following beneficial effects: it provides an ultrapure water preparation device that can integrate multiple cleaning and purification functions, includes all process equipment for controlling ultrapure water quality indicators, strictly ensures that the water quality of the produced water meets the standards, and designs online detection equipment to fully guarantee the water quality of ultrapure water. The entire device is easy to move and can be quickly transported to a factory that prepares ultrapure water for water production. While meeting the production process and water quality requirements, it also reduces the cost of construction and operation and maintenance. The various functional parts in the device are reorganized and disassembled to adapt to the changing needs of the market, and a rationalized and integrated device is used to reduce equipment costs and improve the quality and efficiency of preparing ultrapure water. The entire system can be transported to an ultrapure water plant to quickly produce ultrapure water, while ensuring the water quality of the produced water and environmental protection requirements, while reducing the overall system construction and operation and maintenance costs.

[0026] It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.

[0027] Further features and aspects of the present disclosure will become apparent from the following detailed description of exemplary embodiments with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The drawings herein are incorporated into the specification and constitute a part of the specification. These drawings illustrate embodiments consistent with the present disclosure and are used to illustrate the technical solutions of the present disclosure together with the specification.

[0029] Figure 1 A schematic diagram showing the structure of a movable semiconductor ultrapure water preparation device;

[0030] Figure 2 A partial structural schematic diagram of a movable semiconductor ultrapure water preparation device is shown;

[0031] Figure 3 Another partial structural schematic diagram of the movable semiconductor ultrapure water preparation device is shown;

[0032] Figure 4 A partial structural layout diagram of a movable semiconductor ultrapure water preparation device is shown;

[0033] Figure 5 Another partial structural layout diagram of the movable semiconductor ultrapure water preparation device is shown.

[0034] Figure numerals: 1-water tank; 11-raw water tank; 12-filtered water tank; 13-reverse osmosis water tank; 14-pure water tank; 15-ultrapure water tank; 2-pretreatment section; 21-pretreatment filter; 22-pretreatment ultrafiltration membrane; 23-reverse osmosis security filter; 3-primary treatment section; 31-primary reverse osmosis structure; 32-primary ultraviolet TOC removal device; 33-primary EDI equipment; 34-primary degassing membrane; 4-secondary treatment section; 41-secondary reverse osmosis structure; 42-secondary ultraviolet TOC removal device; 43-secondary EDI equipment; 44-secondary degassing Air film; 5-functional treatment unit; 51-polishing mixed bed; 52-total EDI equipment; 522-EDI security filter; 6-terminal treatment unit; 61-terminal filter; 62-terminal ultrafiltration membrane; 7-dosing unit; 81-raw water supply pump; 82-pretreatment ultrafiltration backwash pump; 83-reverse osmosis water supply pump; 84-first-stage reverse osmosis high-pressure water pump; 85-second-stage reverse osmosis high-pressure water pump; 86-EDI water supply pump; 87-terminal water supply pump; 91-pretreatment heat exchanger; 92-terminal heat exchanger; 100-detection equipment group; 101-air compressor. DETAILED DESCRIPTION

[0035] Various exemplary embodiments, features and aspects of the present disclosure will be described in detail below with reference to the accompanying drawings. The same reference numerals in the accompanying drawings represent elements with the same or similar functions. Although various aspects of the embodiments are shown in the accompanying drawings, the drawings are not necessarily drawn to scale unless otherwise specified.

[0036] The word “exemplary” is used exclusively herein to mean “serving as an example, example, or illustration.” Any embodiment described herein as “exemplary” is not necessarily to be construed as preferred or advantageous over other embodiments.

[0037] The term "and / or" herein is only a description of the association relationship of the associated objects, indicating that there may be three relationships. For example, A and / or B can represent: A exists alone, A and B exist at the same time, and B exists alone. In addition, the term "at least one" herein represents any combination of at least two of any one or more of a plurality of. For example, including at least one of A, B, and C can represent including any one or more elements selected from the set consisting of A, B, and C.

[0038] In addition, in order to better illustrate the present disclosure, numerous specific details are given in the following specific embodiments. It should be understood by those skilled in the art that the present disclosure can also be implemented without certain specific details. In some examples, methods, means, components and circuits well known to those skilled in the art are not described in detail in order to highlight the subject matter of the present disclosure.

[0039] It can be understood that the above-mentioned various method embodiments mentioned in the present disclosure can be combined with each other to form a combined embodiment without violating the principle logic. Due to space limitations, the present disclosure will not go into details.

[0040] Today's semiconductor industry has huge investment, and its production capacity increase shows a step-by-step increase, while market demand usually shows a gradual increase. Domestic semiconductor manufacturers need to accelerate the construction of factories in the next five to ten years. Under such circumstances, the construction period of chip factories is required to be shorter and shorter, and the construction period of ultrapure water systems is also shortened accordingly. On the other hand, the production development of semiconductor technology has led to the continuous improvement and perfection of production processes and production equipment, and the demand for ultrapure water consumption and water quality is also constantly adjusting. At the same time, environmental concerns and the relative shortage of water resources have brought higher technical and process requirements to the design of water systems. In order to ensure that the ultrapure water system meets the water quality requirements of the production process within a relatively short construction period, and at the same time can reduce the cost of construction and operation and maintenance, this disclosure will modularly define the standards of each subsystem of ultrapure water according to flux and equipment specifications, combine design and experimental data, and form a standardized resource library and database to eventually build a set of overall standardized devices.

[0041] In order to ensure that the ultrapure water system meets the water quality requirements of the production process within a short construction period and reduce the cost of construction and operation and maintenance, this embodiment is based on various standards for ultrapure water preparation, combined with design and experimental data, and finally builds a set of overall standardized devices by forming a standardized resource library and database. Specifically, Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, this embodiment discloses a movable semiconductor ultrapure water preparation device, Figure 1The final output port connected to NO.2 means that the final output port is connected to the input port of the second part. Similarly, the output port of the second part of Han Yiwei of NO.1 is connected to the output port of the first part. Specifically including: water tank part 1, pretreatment part 2, primary treatment part 3, secondary treatment part 4, functional treatment part 5, terminal treatment part 6 and dosing part 7. Among them, the water tank part 1 is arranged in each corresponding part of the device, which is used to collect the liquid after treatment of the corresponding part, and the liquid is arranged to be ultrafiltered in the pretreatment part in this device, and then the primary treatment part 3 and the secondary treatment part 4 are subjected to reverse osmosis treatment, the functional treatment part 5 is subjected to electric desalination treatment and two-stage polishing mixed bed treatment, and the terminal treatment part 6 is subjected to terminal ultrafiltration treatment. Among them, the dosing part 7 is connected to the primary treatment part 3, the secondary treatment part 4 and the functional treatment part 5, so as to facilitate a more sufficient and rapid reaction of the liquid. Specifically, the water tank section 1 includes a raw water tank 11, a filtered water tank 12, a reverse osmosis water tank 13, a pure water tank 14 and an ultrapure water tank 15. The raw water tank 11 is set at the uppermost stream of the device, and the ultrapure water tank 15 is set at the lowermost stream of the device. The filtered water tank 12, the reverse osmosis water tank 13 and the pure water tank 14 are set in the device corresponding to other functions. Since the water quality in each water tank is different. Therefore, the dosing section is set corresponding to the different liquids in each water tank of the water tank section 1, and the reagents put in each part are different. Specifically: compared with the raw water, the filtered water tank 12 removes more than 99% of suspended matter, particles, bacteria, viruses and colloids, and the turbidity is less than or equal to 0.1NTU, while the reverse osmosis water tank 13 removes most of the microorganisms, ions, organic matter and particles compared with the filtered water tank 12, and the conductivity can be reduced by more than 90%. As shown in the following table:

[0042] Turbidity (NTU) Conductivity (μs / cm) Raw water 8 233 Filtered tank water ＜0.1 225 Reverse osmosis tank water ＜0.1 20

[0043] The output ends of the pre-treatment unit 2, the primary treatment unit 3, the secondary treatment unit 4 and the terminal treatment unit 6 are all connected to the reverse osmosis water tank 13; the functional treatment unit 5 is respectively connected to the reverse osmosis water tank 13 and the pure water tank 14. The water quality of each water tank can be detected by an online detection device, wherein the online detection device is the detection device group 100, and the liquid is then diverted according to the detection results.

[0044] The dosing part 7 is connected to the water tank part 1, the pretreatment part 2, the primary treatment part 3 and the secondary treatment part 4 respectively, and the terminal treatment part 6 is connected to the ultrapure water tank 15 to promote the reaction of the liquid in each part of the device. The dosing part 7 adds different reagents at different positions, such as: sodium hypochlorite is added to the raw water and added during the backwashing of the ultrafiltration membrane; the reducing agent and the antiscalant are added to the water inlet position of the reverse osmosis security filter; sodium hydroxide is added to the secondary reverse osmosis water inlet position, which can be used to adjust the pH, clean the RO membrane and prevent scaling, etc. The details are as follows:

[0045] Add concentration recommendation Sodium hypochlorite-raw water ≥3ppm Sodium hypochlorite-Ultrafiltration membrane backwash ≥750ppm reducing agent ≥3ppm Antiscalant ≥3ppm Sodium hydroxide ≥5ppm

[0046] That is, in this embodiment, the reagent used in the dosing unit 7 is sodium hypochlorite added to the raw water and the pretreatment unit 2, a reducing agent and a scale inhibitor are added to the influent water of the primary treatment unit 3, and sodium hydroxide is added to the influent water of the secondary treatment unit 4.

[0047] The water tank part 1, the pretreatment part 2, the primary treatment part 3, the secondary treatment part 4, and the functional treatment part 5 are connected in sequence, and the dosing part 7, the primary treatment part 3, the secondary treatment part 4, and the functional treatment part 5 are interspersed in the device to form a complete ultrapure water treatment device, and the functional treatment part 5, the primary treatment part 3, the secondary treatment part 4, etc. can be dismantled and reorganized, and the device has a high degree of integration and is easy to move, which can improve the treatment efficiency of ultrapure water and enhance the diverse and flexible wastewater treatment methods. The primary treatment part 3 and the secondary treatment part 4 are set up mainly because there is a difference in the quality of the produced water, but the equipment used is not different. It is also set that the water quality of the water produced by the secondary treatment part 4 is better than that of the water produced by the primary treatment part 3, in the actual application process. The conductivity of the water produced by the primary treatment part 3 is generally about 30-40, and the conductivity of the water produced by the secondary treatment part 4 is generally about 15-20. If the water quality is not required to reach a higher standard, only the primary treatment part 3 can be designed, and no specific limitation is made here.

[0048] In a specific embodiment, Figure 2 , Figure 4 and Figure 5 As shown, the water outlet of the primary EDI device 33 arranged in the first container is connected to the secondary EDI device 43, the water outlet of the secondary EDI device 43 is connected to the primary degassing membrane 34, the primary degassing membrane 34 is connected to the pure water tank 14, the pure water tank 14 is connected to the terminal water supply pump 87 to pass water into the terminal heat exchanger 92, the water outlet of the terminal heat exchanger 92 is connected to the secondary ultraviolet TOC removal device 42, the secondary ultraviolet TOC removal device 42 is connected to the polishing mixed bed 51, the polishing mixed bed 51 is connected to the secondary degassing membrane 44, the secondary degassing membrane 44 is connected to the terminal filter 61, the terminal filter 61 is connected to the terminal ultrafiltration membrane 62, the water outlet of the terminal ultrafiltration membrane 62 is connected to the ultrapure water tank 15, and the concentrated water outlet of the terminal ultrafiltration membrane 62 is connected to the reverse osmosis water tank 14 in the first container. In this embodiment, in order to facilitate disassembly and reassembly, separate racks are welded to each part in the first container, and each part can be disassembled as a whole at any time. Continue to refer to Figure 4 , where A refers to the location where the sodium hypochlorite metering box and metering pump, reducing agent metering box and metering pump, antiscalant metering box and metering pump, sodium hydroxide metering box and metering equipment are added. B refers to the PLC electric control cabinet of the first container set up here. Continue to refer to Figure 5 , C refers to the location of the PLC control cabinet of the second container.

[0049] In the embodiments of the present disclosure, Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, in order to provide power for the operation and treatment of the liquid in the device, a water tank part 1, a pretreatment part 2, a primary treatment part 3, a secondary treatment part 4, a functional treatment part 5 and a terminal treatment part 6 are provided with power pumps, which are respectively: a raw water supply pump 81, a pretreatment ultrafiltration backwash pump 82, a reverse osmosis water supply pump 83, a primary reverse osmosis high-pressure water pump 84, a secondary reverse osmosis high-pressure water pump 85, an EDI water supply pump 86, and a terminal water supply pump 87. These power pumps can provide power for the operation of the liquid in the device, and can also provide power for the liquid to pass through the filtering device, that is, for the liquid to pass through the filter membrane and other parts. In order to further promote the liquid reaction and meet different water temperature conditions to achieve the best reaction effect, a pretreatment heat exchanger 91 and a terminal heat exchanger 92 are also provided. The pretreatment heat exchanger 91 is provided in the pretreatment part 2, and the terminal heat exchanger 92 is provided in the terminal treatment part 6. Specifically, the pre-treatment heat exchanger 91 and the terminal heat exchanger 92 are both detachably connected to the above-mentioned device that needs to be heated, so that under the influence of external factors, whether the device needs to be heated will not be affected. In actual application, if the water temperature of the incoming water is too low or too high, the pre-treatment heat exchanger 91 is selected to adjust the water temperature to 25±1°C. The terminal pure water temperature is controlled at 23±1°C in the terminal heat exchanger 92, so that the output pure water is convenient for subsequent application. Among them, in order to meet the needs of actual use, the water tank part in this device is connected to the liquid returned from each part. These liquids are purified according to the actual purification needs, which are not specifically limited here.

[0050] In a specific embodiment of the present disclosure, Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5As shown, raw water is passed into the raw water tank 11, the raw water tank 11 is connected to the raw water supply pump 81, the outlet of the raw water supply pump 81 is connected to the pretreatment filter 21, the water outlet of the pretreatment filter 21 is connected to the pretreatment ultrafiltration membrane 22, the water outlet of the pretreatment ultrafiltration membrane 22 is connected to the filter water tank 12, and the filter water tank 12 is connected to the reverse osmosis water supply pump 83 to pass the water into the pretreatment heat exchanger 91 to increase the water temperature of the liquid after the first filtration treatment. The outlet of the pre-treatment heat exchanger 91 is connected to the reverse osmosis security filter 23, the outlet of the reverse osmosis security filter 23 is connected to the first-level reverse osmosis high-pressure pump 84 to pass water into the first-level reverse osmosis structure 31, the outlet of the first-level reverse osmosis structure 31 is connected to the second-level reverse osmosis high-pressure pump 85 to pass water into the second-level reverse osmosis structure 41, the outlet of the second-level reverse osmosis structure 41 is connected to the reverse osmosis water tank 13, the concentrated water outlet of the second-level reverse osmosis structure 41 is connected to the filtered water tank 12, the reverse osmosis water tank 13 is connected to the EDI water supply pump 86, the outlet of the EDI water supply pump 86 is connected to the EDI security filter 522, the outlet of the EDI security filter 522 is connected to the first-level ultraviolet TOC removal device 32, the first-level ultraviolet TOC removal device 32 is connected to the first-level EDI equipment 33, the outlet of the first-level EDI equipment 33 is connected to the first-level EDI equipment 33. Figure 3 and Figure 5 The second container is connected to the secondary EDI device 43, and the concentrate outlet of the primary EDI device 33 is connected to the reverse osmosis water tank 13. In this embodiment, the various parts of the two-stage treatment unit are respectively arranged in the whole device, and various parts can be removed or added according to actual needs, or all the parts of the primary treatment unit 3 or the secondary treatment unit 4 can be directly removed, and then assembled and installed according to actual needs to complete the water treatment operation.

[0051] Continue to refer Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 In order to facilitate the rapid assembly, disassembly or integration of each part in the device, a primary treatment part 3, a secondary treatment part 4, etc. are provided, and each part in the primary treatment part 3 and the secondary treatment part 4 is a separate integrated part. This allows a separate part to perform ultrapure water purification operations, and each part integrated as a whole can also perform ultrapure water processing operations. For example: the secondary treatment part 4 includes a secondary EDI device 43, a primary degassing membrane 34, a pure water tank 14, a terminal water supply pump 87, a terminal heat exchanger 92, a secondary ultraviolet TOC removal device 42, a polishing mixed bed 51, a secondary degassing membrane 44, a terminal filter 61, and a terminal ultrafiltration membrane 62. In this embodiment, a cation exchange resin in the polishing mixed bed 51 is provided to react with salt in the water to remove salt, and CO is generated in this process. 2 It is also necessary to set up a degassing membrane to generate CO 2 Remove to avoid CO2 Gas affects the subsequent treatment effect and the water quality of the produced water, making the produced water quality worse. An air compressor 101 is provided to perform air washing operation on the ultrafiltration membrane to prevent the generated gas from affecting the filtering treatment effect. It can be seen that the secondary treatment unit 4 in this embodiment performs deep water purification treatment on the basis of the primary treatment unit 3, and in actual application, it can be considered whether to dismantle part of the equipment to reduce investment and operating costs according to the specific raw water and water quality, and the secondary treatment unit 4 can be used alone.

[0052] Specifically, you can also set Figure 2 and Figure 4 The water outlet of the primary EDI device 33 in the first container is connected to the secondary EDI device 43, the water outlet of the secondary EDI device 43 is connected to the primary degassing membrane 34, the primary degassing membrane 34 is connected to the pure water tank 14, the pure water tank 14 is connected to the terminal water supply pump 87 to pass water into the terminal heat exchanger 92, the water outlet of the terminal heat exchanger 92 is connected to the secondary ultraviolet TOC removal device 42, the secondary ultraviolet TOC removal device 42 is connected to the polishing mixed bed 51, the polishing mixed bed 51 is connected to the secondary degassing membrane 44, the secondary degassing membrane 44 is connected to the terminal filter 61, the terminal filter 61 is connected to the terminal ultrafiltration membrane 62, the water outlet of the terminal ultrafiltration membrane 62 is connected to the ultrapure water tank 15, and the concentrated water outlet of the terminal ultrafiltration membrane 62 is connected as shown in the figure. Figure 2 and Figure 4 The reverse osmosis water tank 13 is shown in the first container.

[0053] In the embodiment of the present disclosure, an online detection equipment group 100 is also provided, including a DO meter, a silicon meter, a boron meter, a particle meter and a conductivity resistivity meter, which is used to detect the water quality of the produced water in real time at the water use point of the device terminal and to detect the water quality of the water tanks in each part of the water tank part 1.

[0054] The embodiments of the present disclosure have been described above, and the above description is exemplary, not exhaustive, and is not limited to the disclosed embodiments. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The selection of terms used herein is intended to best explain the principles of the embodiments, practical applications, or technical improvements to the technology in the market, or to enable other persons of ordinary skill in the art to understand the embodiments disclosed herein.

Claims

1. A mobile semiconductor ultrapure water preparation device, characterized in that: include: A water tank section (1), a pretreatment section (2), a primary treatment section (3), a secondary treatment section (4), a functional treatment section (5), a terminal treatment section (6) and a dosing section (7); The water tank part (1) comprises a raw water tank (11), a filtered water tank (12), a reverse osmosis water tank (13), a pure water tank (14) and an ultrapure water tank (15); the raw water tank (11) is arranged at the uppermost part of the device, the ultrapure water tank (15) is arranged at the lowermost part of the device, and the filtered water tank (12), the reverse osmosis water tank (13) and the pure water tank (14) are arranged in the device accordingly; The pre-treatment section (2) and the terminal treatment section (6) are both connected to the reverse osmosis water tank (13); some equipment in the primary treatment section (3) and the secondary treatment section (4) are connected to the reverse osmosis water tank (13); The functional processing unit (5) is connected to the reverse osmosis water tank (13) and the pure water tank (14) respectively; The dosing section (7) is respectively connected to the raw water tank (11), the pretreatment section (2), the primary treatment section (3) and the secondary treatment section (4); The terminal processing unit (6) is connected to the ultrapure water tank (15); The water tank part (1), the pretreatment part (2), the primary treatment part (3), the secondary treatment part (4), the functional treatment part (5) and the terminal treatment part (6) are connected in sequence, and the dosing part (7), the primary treatment part (3), the secondary treatment part (4) and the functional treatment part (5) are interspersed in the device; The primary processing part (3), the secondary processing part (4) and the functional processing part (5) are all detachably connected.

2. The portable semiconductor ultrapure water preparation device according to claim 1, characterized in that: The water tank section (1), the pretreatment section (2), the primary treatment section (3), the secondary treatment section (4), the functional treatment section (5) and the terminal treatment section (6) are each provided with a power pump, which are: a raw water supply pump (81), a pretreatment ultrafiltration backwash pump (82), a reverse osmosis water supply pump (83), a primary reverse osmosis high-pressure water pump (84), a secondary reverse osmosis high-pressure water pump (85), an EDI water supply pump (86) and a terminal water supply pump (87).

3. The portable semiconductor ultrapure water preparation device according to claim 2, characterized in that: A pre-treatment heat exchanger (91) and a terminal heat exchanger (92) are also provided. The pre-treatment heat exchanger (91) is provided in the pre-treatment section (2), and the terminal heat exchanger (92) is provided in the terminal treatment section (6).

4. The portable semiconductor ultrapure water preparation device according to claim 3, characterized in that: The raw water tank (11) is connected to a raw water supply pump (81), and the raw water supply pump (81) is connected to the pretreatment unit (2); The pretreatment section (2) comprises: a pretreatment filter (21), a pretreatment ultrafiltration membrane (22), a pretreatment ultrafiltration backwash water pump (82) and a reverse osmosis security filter (23); the pretreatment filter (21), the pretreatment ultrafiltration membrane (22), the pretreatment ultrafiltration backwash water pump (82) and the reverse osmosis security filter (23) are connected in sequence; the pretreatment filter (21) is also connected to the raw water supply pump (81); the pretreatment ultrafiltration membrane (22) and the pretreatment ultrafiltration backwash water pump (82) are also connected to a filter water tank (12); the pretreatment ultrafiltration backwash water pump (82) and the reverse osmosis security filter (23) are also connected to the pretreatment heat exchanger (91); The terminal processing section (6) comprises: a terminal water supply pump (87), a terminal heat exchanger (92), a terminal filter (61) and a terminal ultrafiltration membrane (62); the terminal water supply pump (87), the terminal heat exchanger (92), the terminal filter (61) and the terminal ultrafiltration membrane (62) are connected in sequence; the terminal water supply pump (87) and the terminal heat exchanger (92) are connected and are jointly arranged between the primary processing section (3) and the secondary processing section (4); the terminal filter (61) and the terminal ultrafiltration membrane (62) are connected in sequence to the ultrapure water tank (15).

5. The portable semiconductor ultrapure water preparation device according to claim 4, characterized in that: The functional processing section (5) comprises: a polishing mixed bed (51) and a total EDI device (52), wherein the polishing mixed bed (51) is connected to the secondary processing section (4), and the total EDI device (52) is arranged upstream of the primary processing section (3); The total EDI equipment (52) includes the EDI water supply pump (86) and the EDI security filter (522), the EDI water supply pump (86) is connected to the EDI security filter (522), and the EDI water supply pump (86) and the EDI security filter (522) are arranged between the primary processing part (3) and the secondary processing part (4); The polishing mixed bed (51) is arranged in the secondary treatment section (4).

6. The portable semiconductor ultrapure water preparation device according to claim 5, characterized in that: The equipment in the primary treatment section (3) is consistent with that in the secondary treatment section (4), including: a reverse osmosis high-pressure water pump, a reverse osmosis structure, an ultraviolet TOC removal device, an EDI device and a degassing membrane, wherein the reverse osmosis high-pressure water pump, the reverse osmosis structure, the ultraviolet TOC removal device, the EDI device and the degassing membrane are connected in sequence; They are respectively a primary reverse osmosis structure (31), a primary reverse osmosis high-pressure water pump (84), a primary ultraviolet TOC removal device (32), a primary EDI device (33) and a primary degassing membrane (34); a secondary reverse osmosis structure (41), a secondary reverse osmosis high-pressure water pump (85), a secondary ultraviolet TOC removal device (42), a secondary EDI device (43) and a secondary degassing membrane (44); The primary reverse osmosis high-pressure water pump (84) is connected to the primary reverse osmosis structure (31), and the primary reverse osmosis high-pressure water pump (84) is also connected to the reverse osmosis security filter (23). The primary reverse osmosis structure (31) is connected downstream to a secondary reverse osmosis high-pressure water pump (85) and the secondary reverse osmosis structure (41). The secondary reverse osmosis structure (41) is connected to the reverse osmosis water tank (13). After the reverse osmosis water tank (13) is connected to the total EDI device (52), it is connected to the primary ultraviolet TOC removal device (32) and the primary EDI device (3 3) A secondary EDI device (43) is arranged between the primary degassing membrane (34), the primary degassing membrane (34) is connected to the pure water tank (14), the pure water tank (14) is connected to the terminal water supply pump (87) and the terminal heat exchanger (92), the terminal heat exchanger (92) is connected to the secondary ultraviolet TOC removal device (42), the secondary ultraviolet TOC removal device (42) is connected to the secondary degassing membrane (44) through the polishing mixed bed (51), and the secondary degassing membrane (44) is connected to the terminal filter (61).

7. The portable semiconductor ultrapure water preparation device according to claim 5, characterized in that: A detection equipment group is also provided, the detection equipment group (100) comprising: a DO meter, a silicon meter, a boron meter, a particle meter and a first-level conductivity resistivity meter, the DO meter, the silicon meter, the boron meter, the particle meter and the first-level conductivity resistivity meter are all online detection devices.

8. The portable semiconductor ultrapure water preparation device according to claim 7, characterized in that: An air compressor (101) is also provided, and the air compressor (101) is connected to the terminal ultrafiltration membrane (62).

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