Vacuum valves and chemical vapor deposition systems

By designing a vacuum valve including the main valve body, piston assembly and flow regulation assembly, the simplification and optimization of the exhaust system of the chemical vapor deposition system is achieved, and the problems of complex structure, expensive and large space occupancy of the exhaust system are solved, and the compactness of the equipment and convenient maintenance are improved.

CN222717451UActive Publication Date: 2025-04-04SHANGHAI WEIFU SEMICON EQUIP CO LTD
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Patent Information

Application Number
CN202421374041.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-17
Publication Date
2025-04-04
Estimated Expiration
2034-06-17

AI Technical Summary

Technical Problem

The exhaust system of the existing chemical vapor deposition system is complex, expensive and occupies a large space for equipment, making it difficult to meet the compact needs of semiconductor equipment.

Method used

A vacuum valve is designed, including the main valve body, piston assembly and flow regulation assembly. Through the cooperation of the piston assembly and flow regulation assembly, the gas flow rate of the outlet is adjusted to meet the pumping needs under different conditions. A variety of pumping operations are achieved by only one pumping pipe.

Benefits of technology

The structure of the exhaust system is simplified, the cost is reduced, the space is occupied, the equipment is compact and the maintenance convenience is improved, and the problems of complex, high cost and large space occupancy in the prior art are solved.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present application discloses a vacuum valve and a chemical vapor deposition system, wherein the vacuum valve comprises: a main valve body, having a hollow cavity, an air outlet connected to the hollow cavity, and an air inlet connected to the hollow cavity; a piston assembly, comprising a piston member arranged in the hollow cavity and a valve member connected to the piston member, wherein the piston member can move along the hollow cavity under the action of an external force to drive the valve member to move, so that a first flow channel between the air outlet and the hollow cavity is opened or closed; and a flow regulating assembly, used for regulating the gas flow between the air outlet and the hollow cavity.
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Description

Technical Field

[0001] The present application relates to the technical field of valves and semiconductor processing equipment, and in particular to a vacuum valve and a chemical vapor deposition system. Background Art

[0002] In a chemical vapor deposition device (e.g., a tubular low-pressure chemical vapor deposition device), a vacuum valve is connected to a vacuum pump through an exhaust pipe. The vacuum pump has different requirements for the exhaust capacity of the vacuum valve under different conditions. Specifically, there are the following requirements:

[0003] Condition 1: Slow pumping. When the equipment is turned on, in order to protect the vacuum pump from excessive gas impact and reduce internal dust, a small bypass pipeline should be made in the exhaust pipeline to pump air.

[0004] Condition 2: Fast pumping. To improve equipment operating efficiency and reduce startup time, when slow pumping satisfies the process chamber to reach a certain pressure, a large-diameter exhaust pipeline should be used instead.

[0005] Condition 3: The process pressure adjustable range can be set. When the equipment process is running, the vacuum pump runs stably. The pressure control range of the process chamber is restricted by the vacuum pump's exhaust capacity. Adding an adjustable valve on the pipeline changes the exhaust capacity of the exhaust pipeline to the process chamber. The pressure control mechanism can control the correct pressure range of the process within its own capacity range.

[0006] Condition 4: Small back pressure extraction. When the process chamber is back-pressurized, in order to reduce dust, the design requirement of air intake and exhaust at the same time is adopted. The exhaust pipe used for exhaust of the process chamber requires a smaller exhaust pipe bypass.

[0007] In the current use of semiconductor industry equipment, the above four conditions need to be achieved through different pipeline structures, so four independent exhaust pipeline branches need to be set up. As a result, the exhaust system has a complex structure, large space, and high cost. As a result, the design, installation, commissioning and maintenance of semiconductor equipment, where every inch of land is valuable, are increasingly problematic.

[0008] With respect to the technical problems existing in the prior art mentioned above that the exhaust system for the chemical vapor deposition system is complex in structure, expensive in cost and occupies a large space of the equipment, no effective solution has been proposed so far. Utility Model Content

[0009] The utility model provides a vacuum valve and a chemical vapor deposition system, so as to at least solve the technical problems existing in the prior art that the gas extraction system for the chemical vapor deposition system is complex in structure, expensive in cost and occupies a large space of the equipment.

[0010] According to one aspect of an embodiment of the utility model, a vacuum valve is provided, comprising: a main valve body, having a hollow cavity, an air outlet connected to the hollow cavity, and an air inlet connected to the hollow cavity; a piston assembly, comprising a piston member arranged in the hollow cavity and a valve member connected to the piston member, the piston member can move along the hollow cavity under the action of an external force to drive the valve member to move, so that a first flow channel between the air outlet and the hollow cavity is opened or closed; and a flow regulating assembly, used to regulate the gas flow between the air outlet and the hollow cavity.

[0011] Optionally, the piston member includes a first piston having a first moving stroke, and a second piston having a second moving stroke and capable of abutting against the first piston, wherein the valve member is connected to the second piston. The flow regulating assembly includes a stopper for adjusting the first moving stroke, so that the gas flow of the first flow channel can be adjusted by adjusting the first moving stroke.

[0012] Optionally, the first piston has a protrusion, which extends in a direction away from the valve member and protrudes out of the main valve body, and the hollow cavity is provided with a stepped groove corresponding to the valve member and communicating with the first flow channel. And wherein the limiter is movably provided on the protrusion, so that the first movement stroke can be adjusted based on the position of the limiter on the protrusion, thereby adjusting the position of the valve member relative to the stepped groove under the first movement stroke.

[0013] Optionally, the main valve body has a second flow channel connecting the air outlet and the hollow cavity, wherein the diameter of the second flow channel is smaller than the diameter of the first flow channel, and the flow regulating assembly includes a first auxiliary valve assembly for opening or closing the second flow channel when the valve member closes the first flow channel.

[0014] Optionally, the main valve body has a first sliding groove connected to the second flow channel, the first auxiliary valve assembly includes a first valve body connected to the main valve body, a first auxiliary plug extending from the first valve body and located in the first sliding groove, and the first auxiliary plug moves along the first sliding groove under the action of an external force to open or close the second flow channel. And wherein, the second flow channel includes a fourth flow channel connecting the air outlet and the first sliding groove, and a fifth flow channel connecting the hollow cavity and the first sliding groove; the first auxiliary plug is arranged opposite to the fourth flow channel to open or close the fourth flow channel.

[0015] Optionally, the first auxiliary plug body has a first contact surface in contact with the fifth flow channel, and the first contact surface is a plane. When the first auxiliary plug body closes the fifth flow channel, the first contact surface fits or tends to fit with the fifth flow channel.

[0016] Optionally, the main valve body has a third flow channel connected to the gas outlet and the hollow cavity, wherein the caliber of the third flow channel is smaller than the caliber of the second flow channel, and the flow regulating assembly includes a second auxiliary valve assembly, which is used to adjust the gas flow of the third flow channel when the valve member closes the first flow channel. And wherein, the main valve body has a second sliding groove connected to the third flow channel, and the second auxiliary valve assembly includes a second valve body connected to the main valve body, and a second auxiliary plug body extending from the second valve body to be located in the second sliding groove, and the second auxiliary plug body moves along the second sliding groove under the action of an external force to open or close the third flow channel.

[0017] Optionally, the third flow channel includes a sixth flow channel connecting the air outlet and the second sliding groove, and a seventh flow channel connecting the hollow cavity and the second sliding groove, wherein the caliber of the sixth flow channel is smaller than the caliber of the fourth flow channel.

[0018] Optionally, the second auxiliary plug body is arranged opposite to the sixth flow channel and the seventh flow channel, wherein the second auxiliary plug body has a deformation surface, and the deformation surface deforms under the action of an external force to adjust the gas flow of the third flow channel.

[0019] According to another aspect of the embodiment of the utility model, a chemical vapor deposition system is provided, comprising: a chemical vapor deposition device; a vacuum valve according to any one of the above; and a vacuum pump. The air outlet of the vacuum valve is connected to the vacuum pump; and the air inlet of the vacuum valve is connected to the exhaust port of the chemical vapor deposition device.

[0020] Therefore, according to this embodiment, when the vacuum valve is connected to the chemical vapor deposition equipment for exhaust, only one exhaust pipe is needed to be connected to the vacuum valve, and the gas flow rate of the vacuum valve outlet can be adjusted according to different conditions by using the flow regulating component, so as to perform exhaust operation under different conditions. This solves the technical problems of the prior art that the exhaust system is complex in structure, expensive in cost, and occupies a large space in the equipment.

[0021] Based on the detailed description of the specific embodiments of the present application in combination with the accompanying drawings below, those skilled in the art will become more aware of the above and other purposes, advantages and features of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Hereinafter, some specific embodiments of the present application will be described in detail in an exemplary and non-limiting manner with reference to the accompanying drawings. The same reference numerals in the accompanying drawings indicate the same or similar components or parts. It should be understood by those skilled in the art that these drawings are not necessarily drawn to scale. In the accompanying drawings:

[0023] Figure 1 is a schematic diagram of the structure of a vacuum valve according to the present application;

[0024] Figure 2 yes Figure 1A cross-sectional schematic diagram of the vacuum valve shown;

[0025] Figure 3 yes Figure 1 A cross-sectional schematic diagram of a first auxiliary valve assembly;

[0026] Figure 4 yes Figure 3 Schematic diagram of some structures;

[0027] Figure 5 yes Figure 1 A cross-sectional schematic diagram of a second auxiliary valve assembly;

[0028] Figure 6 yes Figure 5 Schematic diagram of part of the structure. DETAILED DESCRIPTION

[0029] It should be noted that, in the absence of conflict, the embodiments and features of the embodiments of the present invention can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0030] In order to enable those skilled in the art to better understand the solution of the utility model, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is only a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiment of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the utility model.

[0031] It should be noted that the terms "first", "second", etc. in the specification and claims of the utility model and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the terms used in this way can be interchanged where appropriate, so as to describe the embodiments of the utility model described here. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0032] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0033] Figure 1 is a schematic structural diagram of a vacuum valve 100 according to an embodiment of the present application. Figure 2 yes Figure 1 Specifically, the vacuum valve 100 comprises a main valve body 1 and a piston assembly 2, wherein the main valve body 1 has a hollow cavity 13, an air outlet 11 and an air inlet 12 connected to the hollow cavity 13, and the piston assembly 2 is disposed in the hollow cavity 13 and can move relative to the hollow cavity 13.

[0034] The air outlet 11 and the air inlet 12 are both circular in shape. In other embodiments, the air outlet 11 and the air inlet 12 may also be square, rectangular, polygonal, etc., which are not specifically limited here and are determined according to actual conditions.

[0035] In this embodiment, the center line of the air outlet 11 and the center line of the air inlet 12 are arranged vertically. That is, the air outlet 11 is arranged on the bottom wall of the main valve body 1, and the air inlet 12 is arranged on the side wall of the main valve body 1. In other embodiments, the center line of the air outlet 11 and the center line of the air inlet 12 can also be arranged in parallel, that is, the air outlet 11 and the air inlet 12 are both arranged on the side wall of the main valve body 1, etc., which is not specifically limited here and is determined according to actual conditions.

[0036] Figure 2 yes Figure 1 The cross-sectional schematic diagram of the vacuum valve shown in the figure, wherein the piston assembly 2 includes a piston member disposed in the hollow cavity 13 and a valve member 23 connected to the piston member, and the piston member can move along the hollow cavity 13 under the action of an external force to drive the valve member 23 to move, so that the first flow channel 15 between the gas outlet 11 and the hollow cavity 13 is opened or closed. The valve member 23 is disposed toward the gas outlet 11, so that the valve member 23 can move with the piston member to close or open the first flow channel 15.

[0037] Specifically, a stepped groove 14 is provided in the main valve body 1, and the valve member 23 abuts against the stepped groove 14 under the drive of the piston member to close the first flow channel 15, and the valve member 23 opens the first flow channel 15 when it is separated from the stepped groove 14. The valve member 23 includes a valve body and a first sealing member provided on the valve body, and the first sealing member is installed at the portion where the valve body abuts against the stepped groove 14 to ensure the sealing between the valve body and the stepped groove 14 when the two abut.

[0038] In this embodiment, the first sealing member is a sealing ring. In other embodiments, the first sealing member may also be rubber or silicone connected to the valve body, etc., which is not specifically limited here and is determined according to actual conditions.

[0039] In addition, the vacuum valve further includes a flow regulating component, and in this embodiment, the flow regulating component may be a first auxiliary valve component 3, a second auxiliary valve component 4, and a stopper 5 disposed on the protrusion 6 of the first piston 21. Thus, the flow of gas discharged from the hollow cavity 13 through the gas outlet 11 may be regulated by the first auxiliary valve component 3, the second auxiliary valve component 4, and the stopper 5 disposed on the protrusion 6 of the first piston 21.

[0040] As described in the background technology, in chemical vapor deposition equipment (for example, tubular low-pressure chemical vapor deposition equipment), the vacuum valve is connected to the vacuum pump through an exhaust pipe, and the vacuum pump has different requirements for the exhaust capacity of the vacuum valve under different conditions (for example, the four different conditions described in the background technology). In the current use of semiconductor industry equipment, the four conditions need to be implemented in different structures, so four independent exhaust pipe branches need to be set up. As a result, the structure of the exhaust system is complex, the space is huge, and the cost is high. As a result, the disadvantages of design, installation, commissioning and maintenance are increasingly reflected in semiconductor equipment where every inch of land is valuable.

[0041] In view of this, the present embodiment provides a vacuum valve. When the vacuum valve is connected to the chemical vapor deposition equipment for exhaust, only one exhaust pipe is needed to be connected to the vacuum valve. The flow rate regulating component can be used to adjust the gas flow rate of the air outlet of the vacuum valve according to different conditions, so as to perform exhaust operation under different conditions. This solves the technical problems of the exhaust system in the prior art, such as complex structure, high cost, and large space occupied by the equipment. The flow regulating component will be described in detail below.

[0042] Optionally, the piston member includes a first piston 21 having a first movement stroke and a second piston 22 having a second movement stroke and capable of abutting against the first piston 21, wherein the valve member 23 is connected to the second piston 22. That is, the first piston 21 is disposed close to the top wall of the main valve body 1.

[0043] As can be seen from the foregoing, the piston member moves along the hollow cavity 13 under the action of an external force. In this embodiment, the external force is the pressure exerted on the first piston 21 and the second piston 22 by the gas entering the hollow cavity 13. The main valve body 1 is also provided with a first gas port A and a second gas port B connected to a gas generator, and the gas generator is an air pump or a compressor. Correspondingly, the hollow cavity 13 includes a first cavity 131 for accommodating the first piston 21, a second cavity 132 for accommodating the second piston 22, and a third cavity 133 connected to the gas outlet 11 and the gas inlet 12, the first gas port A is connected to the first cavity 131, and the second gas port B is connected to the second cavity 132.

[0044] Since the first piston 21 can abut against the second piston 22, the first piston 21 partially extends into the second cavity 132, so that the second piston 22 abuts against the first piston 21. The second piston 22 partially extends into the third cavity 133 and is connected to the valve member 23 in the third cavity 133, thereby driving the valve member 23 to close or open the first flow channel 15. In addition, referring to Figure 2 As shown, the flow regulating assembly includes a limiter 5 for adjusting the first moving stroke, so that the gas flow of the first flow channel 15 can be adjusted by adjusting the first moving stroke of the first piston 21 .

[0045] Thus, when the vacuum valve 100 is connected to the vapor deposition equipment for pumping, the gas can be input through the second gas port B to push the second piston 22 to drive the valve member 23, or the gas can be input through the first gas port A to push the first piston 21 to drive the second piston 22 and then drive the valve member 23. Thus, the pumping operation under condition 2 (i.e., fast pumping) and condition 3 (i.e., the process pressure adjustable range can be set) can be achieved through these two different driving modes.

[0046] Specifically, when the first piston 21 and the second piston 22 are not driven (i.e., when gas is not input to the first gas port A and the second gas port B), the valve member 23 does not block the first flow channel 15, and the first flow channel 15 is fully opened, so that the vapor deposition device can be quickly pumped under condition 2. When only the second piston 22 is driven (i.e., when gas is only input through the second gas port B), the valve member 23 can be driven to completely close the first flow channel 15, thereby stopping the rapid pumping of the vapor deposition device under condition 2.

[0047] In addition, when only the first piston 21 is driven (i.e., gas is input only through the first gas port A), since the first moving stroke of the first piston 21 can be adjusted by the limit member 5, the degree of blockage of the first flow channel 15 by the valve member 23 can be adjusted when the valve member 23 is driven, so that the vapor deposition equipment can be evacuated in a manner such that the process pressure adjustable range can be set (i.e., condition three).

[0048] The first piston 21 includes a first rod body, a first plug body connected to the end of the first rod body, and a first elastic member connecting the first plug body and the main valve body 1. The edge of the first plug body contacts the inner wall of the main valve body 1 to move in the hollow cavity 13, and the first rod body extends into the second cavity 132. The first plug body can be returned to the top wall by the restoring force of the first elastic member when the first gas port A stops inputting gas, and there is a first gap between the first plug body and the top wall, and the first gas port A is connected to the first gap. Since the first rod body extends into the second cavity 132, there is a second gap between the second piston 22 and the top of the second cavity 132, and the second gas port B is connected to the second gap.

[0049] The second piston 22 includes a second rod, a second plug and a second elastic member. The second plug can abut against the first rod, and the valve member 23 is connected to the second rod. The second plug can be retracted to abut against the first rod by the restoring force of the second elastic member when the second gas port B stops inputting gas.

[0050] In this embodiment, the first elastic member and the second elastic member are springs, which are not specifically limited here and are determined according to actual conditions.

[0051] Optionally, refer to Figure 2 As shown, the first piston 21 has a protrusion 6, which protrudes out of the main valve body 21 in a direction away from the valve member 23. The hollow cavity 13 is provided with a stepped groove 14 corresponding to the valve member 23 and communicating with the first flow channel 15. And wherein, the limiter 5 is movably provided on the protrusion 6, so that the first moving stroke can be adjusted based on the position of the limiter 5 on the protrusion 6, and then the position of the valve member 23 relative to the stepped groove 14 under the first moving stroke can be adjusted.

[0052] Specifically, the protrusion 6 is slidably connected to the main valve body 1. When gas is input into the first gas port A, the first piston 21 is driven to move toward the gas outlet 11 until the stopper 5 provided on the protrusion 6 abuts against the main valve body 1. Thus, by adjusting the position of the stopper 5 on the protrusion 6, the first movement stroke of the first piston 21 can be determined. Specifically, the stopper 5 can be, for example, a nut, and is threadedly connected to the protrusion 6. And the position of the stopper 5 on the protrusion 6 can be adjusted by rotating the stopper 5.

[0053] For example, refer to Figure 2As shown, when the limit member 5 is located at position a, the corresponding first moving stroke is longer than the first moving stroke when the limit member 5 is located at position b. Therefore, when the limit member 5 is located at position a, the first piston 21 can push the second piston 22 so that the valve member 23 can enter the stepped groove 14 more deeply, so that the vapor deposition equipment can only be evacuated with a smaller pressure. When the limit member 5 is located at position b, the first piston 21 can only push the second piston 22 so that the valve member 23 reaches a relatively shallower position in the stepped groove 14, so that the vapor deposition equipment can be evacuated with a greater pressure. Therefore, by adjusting the position of the limit member 5 on the protrusion 6, it is possible to achieve evacuation of the vapor deposition equipment under condition three (the adjustable range of the process pressure can be set).

[0054] Optionally, refer to Figure 1 to Figure 3 As shown, the main valve body 1 has a second flow channel 7 connecting the air outlet 11 and the hollow cavity, and the flow regulating assembly includes a first auxiliary valve assembly 3 for opening or closing the second flow channel 7 when the valve member 23 closes the first flow channel 15.

[0055] Thus, when gas is input only through the second gas port B so that the second piston 22 drives the valve member 23 to close the first flow channel 15, the second flow channel 7 can be opened or closed by the first auxiliary valve assembly 3. Preferably, in this embodiment, the caliber of the second flow channel 7 is smaller than the caliber of the first flow channel 15, so that the gas flow rate of the second flow channel 7 is smaller than the gas flow rate of the first flow channel 15. In this case, by closing the first flow channel 15 with the valve member 23 and opening the second flow channel 7 with the first auxiliary valve assembly 3, slow pumping of the vapor deposition equipment under conditions can be achieved.

[0056] Figure 3 yes Figure 1 The cross-sectional schematic diagram with the first auxiliary valve assembly, the first auxiliary valve assembly 3 is connected to the outside and the hollow cavity 13 through the second flow channel 7, and the first auxiliary valve assembly 3 operates to open or close the second flow channel 7 and the hollow cavity 13. Since the caliber of the second flow channel 7 is smaller than that of the first flow channel 15, the gas flow rate that can pass through the second flow channel 7 is smaller than that of the first flow channel 15. In this embodiment, the first auxiliary valve assembly 3 is arranged near the gas outlet 11 and is located below the stepped groove 14.

[0057] Figure 4 yes Figure 3 Partial structural diagram, see Figure 4 As shown, the main valve body 1 has a first sliding groove connected to the second flow channel 7, and the first auxiliary valve assembly 3 includes a first valve body connected to the main valve body 1 and a first auxiliary plug extending from the first valve body to be located in the first sliding groove. The first auxiliary plug moves along the first sliding groove under the action of external force to open or close the second flow channel 7.

[0058] The second flow channel 7 includes a fourth flow channel 71 connecting the air outlet 11 and the first sliding groove, and a fifth flow channel 72 connecting the hollow cavity 13 and the first sliding groove; the first auxiliary plug body is arranged opposite to the fourth flow channel 71 to open or close the fourth flow channel 71. In this embodiment, the extension direction of the fourth flow channel 71 is parallel or tends to be parallel to the extension direction of the air inlet 12, and the extension direction of the fifth flow channel 72 is parallel or tends to be parallel to the extension direction of the air outlet 11.

[0059] The first auxiliary plug body has a first contact surface 31 in contact with the inlet of the fourth flow channel 71, and the first contact surface 31 is a plane; wherein, when the first auxiliary plug body closes the fourth flow channel 71, the first contact surface 31 fits or tends to fit with the outlet of the fourth flow channel 71, thereby controlling the flow rate of the gas.

[0060] Figure 5 yes Figure 1 The cross-sectional schematic diagram with the second auxiliary valve assembly shown, refer to Figure 5 As shown, the main valve body 1 has a third flow channel 8 connecting the gas outlet 1 and the hollow cavity 13, and the flow regulating assembly includes a second auxiliary valve assembly 4, which is used to adjust the gas flow of the third flow channel 8 when the valve member 23 closes the first flow channel 15. The caliber of the third flow channel 8 is smaller than the caliber of the second flow channel 7, so that the gas flow of the third flow channel 8 is smaller than the gas flow of the second flow channel 7.

[0061] Thus, when gas is input only through the second gas port B so that the second piston 22 drives the valve member 23 to close the first flow channel 15, the third flow channel 8 can be opened or closed by the second auxiliary valve assembly 4. The back pressure small pumping of the vapor deposition equipment can be achieved under condition 4.

[0062] In this embodiment, the second auxiliary valve assembly 4 is disposed close to the gas outlet 11 and below the stepped groove 14 .

[0063] Figure 6 yes Figure 5 Partial structural diagram, see Figure 6 As shown, the main valve body 1 has a second sliding groove connected to the third flow channel 8, and the second auxiliary valve assembly 4 includes a second valve body connected to the main valve body 1 and a second auxiliary plug extending from the second valve body to be located in the second sliding groove. The second auxiliary plug moves along the second sliding groove under the action of external force to open or close the third flow channel 8.

[0064] The third flow channel 8 includes a sixth flow channel 81 connecting the air outlet 11 and the second sliding groove, and a seventh flow channel 82 connecting the hollow cavity 13 and the second sliding groove; wherein the caliber of the sixth flow channel 81 is smaller than that of the fourth flow channel 71 .

[0065] The second auxiliary plug body is arranged opposite to the sixth flow channel 81 and the seventh flow channel 82; wherein the second auxiliary plug body has a deformation surface 41, which deforms under the action of external force to adjust the gas flow of the third flow channel 8. In this embodiment, the second auxiliary valve assembly 4 is a regulating pneumatic diaphragm valve structure.

[0066] The first auxiliary valve assembly 3 and the second auxiliary valve assembly 4 are both connected to an external gas generator to drive the gas. At this time, the first auxiliary valve assembly 3 also has a third gas port C, and the second auxiliary valve assembly 4 also has a fourth gas port D. Alternatively, the first auxiliary valve assembly 3 and the second auxiliary valve assembly 4 can also be electrically controlled.

[0067] The first auxiliary valve assembly 3 and the second auxiliary valve assembly 4 may be normally open, normally closed, double-acting valves, etc., which are not specifically limited here and are determined according to actual conditions.

[0068] When quick pumping is required, no gas is introduced into the first gas port A and the second gas port B, and the first piston 21 and the second piston 22 are located at the initial position, at which time the gas flow rate is the maximum. Thus, quick pumping can be performed under condition 2.

[0069] When slow pumping is required, gas is introduced into the second gas port B, and the second piston 22 drives the valve member 23 to move toward the gas outlet 11 until the first flow channel 15 is closed; at this time, the first auxiliary valve assembly 3 opens, and the gas flows out from the hollow cavity 13 through the second flow channel 7 from the gas outlet 11.

[0070] When it is necessary to realize the exhaust with adjustable process pressure range, the position of the stopper 5 on the protrusion 6 is adjusted. Then the gas is introduced into the first gas port A, so that the valve member 23 moves toward the gas outlet 11 until the stopper 5 abuts against the main valve body 1, thereby exhausting the gas deposition device through the first flow channel 15 according to the pressure corresponding to the stopper 5.

[0071] When it is necessary to realize a small back pressure pumping, gas is introduced into the second gas port B, and the second piston 22 drives the valve member 23 to move toward the gas outlet 11 until the first flow channel 15 is closed; at this time, the second auxiliary valve assembly 4 is opened, and the gas flows out of the gas outlet 11 from the hollow cavity 13 through the third flow channel 8, thereby realizing a small back pressure pumping.

[0072] In addition, although not shown in the figure, according to another aspect of the present embodiment, a chemical vapor deposition system is provided. The chemical vapor deposition system comprises: a chemical vapor deposition device; a vacuum valve according to any one of the above; and a vacuum pump. The gas outlet of the vacuum valve is connected to the vacuum pump; and the gas inlet of the vacuum valve is connected to the exhaust port of the chemical vapor deposition device.

[0073] Therefore, the vacuum pump can be used to evacuate the chemical vapor deposition equipment via the vacuum valve, and the chemical vapor deposition equipment can be evacuated under different conditions through the flow regulating component of the vacuum valve.

[0074] Therefore, according to this embodiment, when the vacuum valve is connected to the chemical vapor deposition equipment for exhaust, only one exhaust pipe is needed to be connected to the vacuum valve, and the gas flow rate of the vacuum valve outlet can be adjusted according to different conditions by using the flow regulating component, so as to perform exhaust operation under different conditions. This solves the technical problems existing in the prior art that the exhaust system for the chemical vapor deposition system is complex in structure, expensive in cost, and occupies a large space in the equipment.

[0075] Unless otherwise specifically stated, the relative arrangement, numerical expressions and numerical values ​​of the parts and steps described in these embodiments do not limit the scope of the utility model. At the same time, it should be understood that, for ease of description, the sizes of the various parts shown in the accompanying drawings are not drawn according to the actual proportional relationship. The technology, methods and equipment known to ordinary technicians in the relevant field may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be regarded as a part of the authorization specification. In all examples shown and discussed here, any specific value should be interpreted as merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once a certain item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0076] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used here to describe the spatial positional relationship between a device or feature and other devices or features as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figure. For example, if the device in the accompanying drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below other devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.

[0077] In the description of the present utility model, it needs to be understood that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the drawings, and are only for the convenience of describing the present utility model and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the device or element referred to must have a specific direction or be constructed and operated in a specific direction, and therefore cannot be understood as limiting the scope of protection of the present utility model; the directional words "inside and outside" refer to the inside and outside relative to the contours of each component itself.

[0078] The above is only a preferred specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A vacuum valve, characterized in that: include: A main valve body, comprising a hollow cavity, an air outlet communicated with the hollow cavity, and an air inlet communicated with the hollow cavity; A piston assembly, comprising a piston member disposed in the hollow cavity and a valve member connected to the piston member, wherein the piston member can move along the hollow cavity under the action of an external force to drive the valve member to move, so that the first flow channel between the gas outlet and the hollow cavity is opened or closed; as well as A flow regulating assembly for regulating the gas flow between the gas outlet and the hollow cavity, wherein the piston member comprises a first piston having a first moving stroke and a second piston having a second moving stroke and capable of abutting against the first piston, wherein the valve member is connected to the second piston, and wherein, The flow regulating assembly includes a limiter for adjusting the first moving stroke, so that the gas flow of the first flow channel can be adjusted by adjusting the first moving stroke, and wherein The main valve body has a second flow channel connecting the air outlet and the hollow cavity, wherein the diameter of the second flow channel is smaller than the diameter of the first flow channel, and the flow regulating assembly includes a first auxiliary valve assembly for opening or closing the second flow channel when the valve member closes the first flow channel.

2. The vacuum valve according to claim 1, characterized in that: The first piston has a protrusion, which extends in a direction away from the valve member and protrudes out of the main valve body, and the hollow cavity is provided with a stepped groove corresponding to the valve member and communicating with the first flow channel, and wherein, The limiting member is movably disposed on the protruding portion, so that the first moving stroke can be adjusted based on the position of the limiting member on the protruding portion, thereby adjusting the position of the valve member relative to the stepped groove under the first moving stroke.

3. The vacuum valve according to claim 1, characterized in that: The main valve body has a first sliding groove communicating with the second flow channel, the first auxiliary valve assembly includes a first valve body connected to the main valve body and a first auxiliary plug extending from the first valve body and located in the first sliding groove, the first auxiliary plug moves along the first sliding groove under the action of an external force to open or close the second flow channel, and wherein, The second flow channel includes a fourth flow channel connecting the air outlet and the first sliding groove and a fifth flow channel connecting the hollow cavity and the first sliding groove, wherein the first auxiliary plug body is arranged opposite to the fourth flow channel to open or close the fourth flow channel.

4. The vacuum valve according to claim 3, characterized in that: The first auxiliary plug body has a first contact surface in contact with the fifth flow channel, wherein the first contact surface is a plane. When the first auxiliary plug closes the fifth flow channel, the first contact surface fits or tends to fit with the fifth flow channel.

5. The vacuum valve according to claim 3, characterized in that: The main valve body has a third flow channel connecting the gas outlet and the hollow cavity, wherein the diameter of the third flow channel is smaller than the diameter of the second flow channel, and the flow regulating assembly includes a second auxiliary valve assembly, which is used to regulate the gas flow of the third flow channel when the valve member closes the first flow channel, and wherein The main valve body has a second sliding groove connected to the third flow channel. The second auxiliary valve assembly includes a second valve body connected to the main valve body and a second auxiliary plug extending out of the second valve body and located in the second sliding groove. The second auxiliary plug moves along the second sliding groove under the action of external force to open or close the third flow channel.

6. The vacuum valve according to claim 5, characterized in that: The third flow channel includes a sixth flow channel connecting the air outlet and the second sliding groove and a seventh flow channel connecting the hollow cavity and the second sliding groove, wherein the caliber of the sixth flow channel is smaller than the caliber of the fourth flow channel.

7. The vacuum valve according to claim 6, characterized in that The second auxiliary plug body is arranged opposite to the sixth flow channel and the seventh flow channel, wherein the second auxiliary plug body has a deformation surface, and the deformation surface is deformed under the action of external force to adjust the gas flow of the third flow channel.

8. A chemical vapor deposition system, characterized in that: include: Chemical vapor deposition equipment; The vacuum valve according to any one of claims 1 to 7; and a vacuum pump, wherein The air outlet of the vacuum valve is connected to the vacuum pump; and The air inlet of the vacuum valve is connected to the exhaust port of the chemical vapor deposition equipment.