Monocrystalline silicon wafer grinding slurry circulating device
By designing a single crystal silicon wafer abrasive slurry recycling device with a multi-layer filter structure, the problems of waste of abrasive slurry and poor filtration effects in the prior art are solved, and efficient recycling of abrasive slurry and high-quality grinding of single crystal silicon wafers are achieved.
Patent Information
- Application Number
- CN202420613314.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-28
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2034-03-28
AI Technical Summary
During the recycling of existing single crystal silicon wafer abrasive slurry, there are problems such as a lot of waste of abrasive slurry, poor filtration effect, and reduced grinding quality.
A single crystal silicon wafer abrasive slurry circulation device including a processing box, a filter structure, a rotating shaft and a driving structure is designed. The device realizes multiple filtration and recycling of abrasive slurry through a multi-layer filter structure such as a primary filter box, a primary filter cartridge, a filter layer and a fine filter cartridge.
It effectively reduces the waste of abrasive slurry, improves the filtration effect of abrasive slurry, and ensures high-quality grinding of single crystal silicon wafers.
Smart Images
Figure CN222768102U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of single crystal silicon slice grinding, in particular to a single crystal silicon slice grinding slurry circulation device. Background Art
[0002] At present, in the process of grinding single crystal silicon wafers, in order to improve the grinding efficiency and enhance the grinding quality of single crystal silicon wafers, a large amount of grinding slurry is sprayed on the surface of the single crystal silicon wafer. The grinding slurry carries the debris generated in the process of grinding the single crystal silicon wafer and flows out, resulting in a large amount of waste grinding slurry. If the grinding liquid is directly discarded, it will not only cause waste of resources, but also increase the grinding cost of single crystal silicon wafers. The existing methods are mostly to process the grinding slurry and then recycle it. However, in the existing recycling process of grinding slurry, there are problems such as high waste of grinding slurry, poor grinding slurry filtration effect, and reduced grinding quality of single crystal silicon wafers. Utility Model Content
[0003] The purpose of the utility model is to provide a single crystal silicon wafer grinding slurry circulation device with reasonable structural design, less grinding slurry waste, multiple filtering treatments to enhance the grinding slurry filtering effect, and good single crystal silicon wafer grinding quality in order to address the problems of large amount of grinding slurry waste, poor grinding slurry filtering effect, and reduced single crystal silicon wafer grinding quality in existing single crystal silicon wafer recycling devices.
[0004] The technical solution adopted by the utility model to solve the technical problem is:
[0005] A single crystal silicon wafer grinding slurry circulation device comprises a processing box and a cover plate. A filtering structure is arranged in the processing box, and the cover plate is movably connected to the processing box. A liquid inlet pipe, a rotating shaft, a liquid discharge pipe and a driving structure are arranged on the cover plate. The rotating shaft is movably connected to the filtering structure, and the rotating shaft is movably connected to the driving structure.
[0006] Preferably, a primary filter box is provided on the liquid inlet pipe, and the two opposite sides of the primary filter box are connected to the liquid inlet pipe. The bottom of the primary filter box is set to an inclined structure, and a baffle is set between the inner wall of the higher side of the bottom of the treatment box and the top of the primary filter box. The used grinding slurry flows into the treatment box through the liquid inlet pipe, and the grinding slurry first flows into the primary filter box before flowing into the treatment box. The bottom of the primary filter box is set to an inclined structure, so that impurities falling to the bottom of the primary filter box slide along the inclined bottom of the primary filter box to prevent impurities from continuing to flow forward with the grinding slurry. The baffle in the primary filter box can block large particles of impurities, thereby achieving the effect of preliminary filtration of the grinding slurry, which is convenient for the recycling of the grinding slurry.
[0007] Preferably, a primary filter cartridge is threadedly provided at the bottom of the cover plate, one end of the liquid inlet pipe is inserted into the primary filter cartridge, liquid outlet holes are provided on the side wall and the bottom of the primary filter cartridge, and the primary filter cartridge is provided with a replaceable structure on the cover plate, and the grinding slurry after preliminary filtration in the primary filter box flows into the primary filter cartridge, so that the primary filter cartridge filters the grinding slurry again.
[0008] Preferably, a bearing is provided on the cover plate, the rotating shaft passes vertically through the bearing, and the bottom end of the rotating shaft is extended into the processing box, a filter layer with a horizontal structure is provided in the processing box, and a sealing ring is provided between the filter layer and the rotating shaft, the grinding slurry after filtering by the primary filter cartridge flows into the processing box, the filtering structure in the processing box filters the grinding slurry, and the grinding slurry after filtering is filtered again through the filter layer, which can improve the purity of the grinding slurry, and the recycled grinding slurry can ensure the grinding quality of single crystal silicon wafers.
[0009] Preferably, the driving structure includes a motor, which is arranged on the cover plate, and a transmission shaft is arranged on the motor, and a driving wheel is arranged on the transmission shaft, and a driven wheel is arranged on the rotating shaft, and the driven wheel is connected to the driving wheel through a belt. The motor drives the rotating shaft to rotate, and the rotating shaft drives the filtering structure to rotate, so that the filtering structure receives the grinding slurry discharged from the primary filter cylinder, and the grinding slurry is dispersed and falls to different positions of the filtering structure, avoiding the grinding slurry from being too concentrated on the filtering structure, thereby improving the filtering efficiency and filtering effect of the grinding slurry.
[0010] Preferably, the filtering structure includes a filter plate and a fine filter cartridge. The filter plate is provided with a mounting ring, and the mounting ring is mounted on a rotating shaft above the filter layer. The fine filter cartridge is provided with a connecting ring, and the connecting ring is movably connected to the bottom end of the rotating shaft. The grinding slurry discharged from the primary filter cartridge falls onto the filter plate for filtration. The grinding slurry filtered by the filter plate is filtered through the filter layer. The grinding slurry filtered by the filter layer is finely filtered by the fine filter cartridge and then discharged from a drain pipe. The grinding slurry discharged from the drain pipe is discharged into a single crystal silicon wafer grinding device to grind the single crystal silicon wafer. The used grinding slurry flows into the liquid inlet pipe, and then flows into the processing box through the liquid inlet pipe for filtration, thereby realizing the recycling of the single crystal silicon wafer and reducing the waste of grinding slurry.
[0011] Preferably, the filter plate is arranged to have 2-5 layers from top to bottom, filter holes are arranged on the surface of the filter plate, the mesh number of the filter holes on the filter plate is increased successively from top to bottom, the filter plate is arranged to have a conical structure, the filter plate is arranged to have a replaceable structure on a rotating shaft through a mounting ring, and a baffle is arranged on the bottom edge of the filter plate, the filter plate is arranged to have a multi-layer structure, the grinding slurry can be filtered multiple times, and the filtering effect of the grinding slurry is improved, the filter plate is arranged to have a conical structure, the grinding slurry is convenient to flow along the surface of the filter plate, so that the grinding slurry can be fully filtered, the rotating shaft drives the filter plate to rotate, so that impurities are quickly separated from the grinding slurry under the action of centrifugal force, the impurities flow downward along the surface of the filter plate, the baffle can prevent impurities from falling from the filter plate, so that the impurities are fully separated from the grinding slurry, thereby improving the filtering effect of the grinding slurry.
[0012] Preferably, the fine filter cartridge is configured as an inner and outer two-layer structure, with liquid inlet holes being provided on the inner wall and the outer wall of the fine filter cartridge, and an adsorption layer being filled between the inner layer and the outer layer of the fine filter cartridge, and the grinding slurry filtered by the filter layer flows into the fine filter cartridge through the liquid inlet hole, and the adsorption layer can adsorb the grinding slurry to further improve the purity of the grinding slurry.
[0013] Preferably, the rotating shaft is configured as a hollow structure, the drain pipe is vertically inserted into the rotating shaft, and the bottom end of the drain pipe is extended into the fine filter cylinder, the drain pipe is connected to an external infusion pump, and the negative pressure is used to extract the grinding slurry after filtering in the fine filter cylinder and transport it to the single crystal silicon wafer grinding equipment. The grinding slurry filtered in the processing box is adsorbed by the adsorption layer and then flows into the fine filter cylinder, thereby realizing the recycling of the grinding slurry.
[0014] Beneficial effects:
[0015] 1. The motor drives the rotating shaft to rotate, and the rotating shaft drives the filter structure to rotate, so that the filter structure receives the grinding slurry discharged from the primary filter cartridge, and the grinding slurry is dispersed and falls to different positions of the filter structure to avoid excessive concentration of the grinding slurry on the filter structure, thereby improving the filtering efficiency and filtering effect of the grinding slurry;
[0016] 2. The rotating shaft is set as a hollow structure, the drain pipe is vertically inserted into the rotating shaft, and the bottom end of the drain pipe is extended into the fine filter cartridge. The drain pipe is connected to an external infusion pump. The grinding slurry after filtering in the fine filter cartridge is extracted by negative pressure and transported to the single crystal silicon wafer grinding equipment. The grinding slurry after filtering in the processing box is adsorbed by the adsorption layer and then flows into the fine filter cartridge, realizing the recycling of the grinding slurry;
[0017] 3. The filter plate is set as a multi-layer structure, which can filter the grinding slurry multiple times and improve the filtering effect of the grinding slurry. The filter plate is set as a conical structure to facilitate the flow of the grinding slurry along the surface of the filter plate, so that the grinding slurry can be fully filtered. The rotating shaft drives the filter plate to rotate, so that the impurities are quickly separated from the grinding slurry under the action of centrifugal force, and the impurities flow downward along the surface of the filter plate. The baffle can prevent the impurities from falling from the filter plate, so that the impurities are fully separated from the grinding slurry, thereby improving the filtering effect of the grinding slurry. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a structural schematic diagram of the utility model.
[0019] Figure 2 It is a partial structural schematic diagram of the utility model, illustrating the connection structure between the liquid inlet pipe and the primary filter box.
[0020] Figure 3 It is a partial structural diagram of the utility model, illustrating the connection structure between the treatment box and the primary filter cartridge.
[0021] Figure 4 It is a partial structural schematic diagram of the utility model, illustrating the connection structure between the filter plate and the mounting ring.
[0022] Figure 5 It is a partial structural schematic diagram of the utility model, illustrating the connection structure between the fine filter cartridge and the adsorption layer.
[0023] Figure 6 This is a partial structural diagram of the utility model, showing the connection structure between the rotating shaft and the fine filter cartridge
[0024] Figure 7 This is another schematic diagram of the structure of the present invention.
[0025] In the figure: 1. treatment box, 2. cover plate, 3. filter layer, 4. liquid inlet pipe, 5. bearing, 6. primary filter cartridge, 7. liquid outlet, 8. motor, 9. transmission shaft, 10. primary filter box, 11. baffle, 12. rotating shaft, 13. drain pipe, 14. driven wheel, 15. sealing ring, 16. driving wheel, 17. belt, 18. filter plate, 19. fine filter cartridge, 20. mounting ring, 21. filter hole, 22. baffle, 23. connecting ring, 24. liquid inlet, 25. adsorption layer, 26. brush rod. DETAILED DESCRIPTION
[0026] The present invention will be described in more detail below with reference to the accompanying drawings.
[0027] Embodiment 1:
[0028] As attached Figure 1-6As shown: A single crystal silicon wafer grinding slurry circulation device includes a processing box 1 and a cover plate 2. A filtering structure is arranged in the processing box 1. The cover plate 2 is movably connected to the processing box 1. A liquid inlet pipe 4, a rotating shaft 12, a liquid discharge pipe 13, and a driving structure are arranged on the cover plate 2. The rotating shaft 12 is movably connected to the filtering structure, and the rotating shaft 12 is movably connected to the driving structure.
[0029] Among them, a preliminary filter box 10 is arranged on the liquid inlet pipe 4, and the two opposite sides of the preliminary filter box 10 are connected to the liquid inlet pipe 4. The bottom of the preliminary filter box 10 is set to an inclined structure, and a baffle 11 is arranged between the inner wall of the higher side of the bottom of the processing box 1 and the top of the preliminary filter box 10. A preliminary filter cartridge 6 is arranged at the bottom of the cover plate 2 through a thread, and one end of the liquid inlet pipe 4 is extended into the preliminary filter cartridge 6. Liquid outlet holes 7 are arranged on the side wall and the bottom of the preliminary filter cartridge 6, and the preliminary filter cartridge 6 is arranged to be replaceable on the cover plate 2. The grinding slurry after preliminary filtration by the preliminary filter box 10 flows into the preliminary filter cartridge 6, so that the preliminary filter cartridge 6 filters the grinding slurry again.
[0030] Among them, a bearing 5 is arranged on the cover plate 2, and the rotating shaft 12 passes through the bearing 5 vertically, and the bottom end of the rotating shaft 12 extends into the processing box 1. A filter layer 3 with a horizontal structure is arranged in the processing box 1, and a sealing ring 15 is arranged between the filter layer 3 and the rotating shaft 12.
[0031] The driving structure includes a motor 8, which is arranged on the cover plate 2, a transmission shaft 9 is arranged on the motor 8, a driving wheel 16 is arranged on the transmission shaft 9, a driven wheel 14 is arranged on the rotating shaft 12, and the driven wheel 14 is connected to the driving wheel 16 through a belt 17.
[0032] The filtering structure includes a filter plate 18 and a fine filter cartridge 19. A mounting ring 20 is provided on the filter plate 18, and the mounting ring 20 is installed on the rotating shaft 12 above the filter layer 3. A connecting ring 23 is provided on the fine filter cartridge 19, and the connecting ring 23 is movably connected to the bottom end of the rotating shaft 12. The filter plate 18 is set as a three-layer structure from top to bottom. Filter holes 21 are set on the surface of the filter plate 18. The mesh number of the filter holes 21 on the filter plate 18 is increased from top to bottom, and the filter plate 18 is set as a conical structure. The filter plate 18 is arranged as a structure that can be replaced on the rotating shaft 12 through the mounting ring 20, and a baffle 22 is arranged at the bottom edge of the filter plate 18, the fine filter cartridge 19 is arranged as an inner and outer two-layer structure, liquid inlet holes 24 are arranged on the inner wall and the outer wall of the fine filter cartridge 19, and an adsorption layer 25 is filled between the inner layer of the fine filter cartridge 19 and the outer layer of the fine filter cartridge 19, the rotating shaft 12 is arranged as a hollow structure, the drain pipe 13 is vertically inserted into the rotating shaft 12, and the bottom end of the drain pipe 13 is extended into the fine filter cartridge 19.
[0033] Embodiment 2:
[0034] This embodiment is further described on the basis of the first embodiment. Figure 7 As shown: a brush rod 26 is arranged on the rotating shaft 12 above the filter layer 3. The rotating shaft 12 rotates under the action of the motor 8, driving the brush rod 26 to rotate, so that the brush rod 26 cleans the filter layer 3 to avoid excessive concentration of impurities on the filter layer 3, so that the grinding slurry can be quickly filtered and processed, thereby improving the filtering efficiency and filtering effect of the grinding slurry.
[0035] Working principle: connect the liquid inlet pipe 4 to the single crystal silicon wafer grinding equipment, and the used grinding slurry flows into the liquid inlet pipe 4, and the discharge pipe 13 is connected to the external infusion pump. The negative pressure draws out the grinding slurry after filtering in the fine filter cartridge 19 and transports it to the single crystal silicon wafer grinding equipment. The grinding slurry flows into the primary filter box 10 before flowing into the processing box 1. The bottom of the primary filter box 10 is set to an inclined structure, so that the impurities falling to the bottom of the primary filter box 10 slide along the inclined bottom of the primary filter box 10 to prevent the impurities from continuing to flow forward with the grinding slurry. The grinding slurry after preliminary filtration in the primary filter box 10 flows into the primary filter cartridge 6, so that the primary filter cartridge 6 filters the grinding slurry again, and the motor 8 drives the rotating shaft 12 to rotate, and the rotating shaft 12 drives the filtering structure to rotate, so that the filtering structure receives the grinding slurry discharged from the primary filter cartridge 6, and the grinding slurry is dispersed and falls to the The filter structure is arranged at different positions to avoid excessive concentration of the grinding slurry on the filter structure. The filter plate 18 is set to a multi-layer structure, which can filter the grinding slurry multiple times and improve the filtering effect of the grinding slurry. The filter plate 18 is set to a conical structure to facilitate the flow of the grinding slurry along the surface of the filter plate 18, so that the grinding slurry can be fully filtered. The rotating shaft 12 drives the filter plate 18 to rotate, so that the impurities are quickly separated from the grinding slurry under the action of centrifugal force, and the impurities flow downward along the surface of the filter plate 18. The baffle 22 can prevent the impurities from falling from the filter plate 18, so that the impurities are fully separated from the grinding slurry. The grinding slurry filtered by the filter layer 3 flows into the fine filter cylinder 19 through the liquid inlet hole 24. The adsorption layer 25 can adsorb the grinding slurry. The grinding slurry after adsorption is extracted from the drain pipe 13, thereby realizing the recycling of the grinding slurry.
[0036] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
[0037] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.
[0038] The parts not involved in the present invention are the same as the prior art or can be implemented by using the prior art.
Claims
1. A single crystal silicon wafer polishing slurry circulation device, comprising a processing box and a cover plate, characterized in that: A filtering structure is arranged in the processing box, and the cover plate is movably connected to the processing box. A liquid inlet pipe, a rotating shaft, a liquid discharge pipe, and a driving structure are arranged on the cover plate. The rotating shaft is movably connected to the filtering structure, and the rotating shaft is movably connected to the driving structure.
2. The single crystal silicon wafer polishing slurry circulation device according to claim 1, characterized in that: A primary filter box is arranged on the liquid inlet pipe, and the two opposite sides of the primary filter box are connected to the liquid inlet pipe. The bottom of the primary filter box is arranged as an inclined structure, and a retaining net is arranged between the inner side wall of the higher side of the bottom of the treatment box and the top of the primary filter box.
3. The single crystal silicon wafer polishing slurry circulation device according to claim 1, characterized in that: The bottom of the cover plate is provided with a primary filter cartridge through a thread, one end of the liquid inlet pipe is inserted into the primary filter cartridge, liquid outlet holes are provided on the side wall and the bottom of the primary filter cartridge, and the primary filter cartridge is provided with a replaceable structure on the cover plate.
4. The single crystal silicon wafer polishing slurry circulation device according to claim 1, characterized in that: The cover plate is provided with a bearing, the rotating shaft passes through the bearing vertically, and the bottom end of the rotating shaft extends into the processing box, a filter layer with a horizontal structure is provided in the processing box, and a sealing ring is provided between the filter layer and the rotating shaft.
5. The single crystal silicon wafer polishing slurry circulation device according to claim 1, characterized in that: The driving structure comprises a motor, the motor is arranged on the cover plate, a transmission shaft is arranged on the motor, a driving wheel is arranged on the transmission shaft, a driven wheel is arranged on the rotating shaft, and the driven wheel is connected to the driving wheel through a belt.
6. The single crystal silicon wafer polishing slurry circulation device according to claim 1, characterized in that: The filtering structure comprises a filter plate and a fine filter cartridge. The filter plate is provided with a mounting ring which is mounted on a rotating shaft above the filter layer. The fine filter cartridge is provided with a connecting ring which is movably connected to the bottom end of the rotating shaft.
7. The single crystal silicon wafer polishing slurry circulation device according to claim 6, characterized in that: The filter plate is arranged as a 2-5 layer structure from top to bottom, filter holes are arranged on the surface of the filter plate, the mesh number of the filter holes on the filter plate is increased from top to bottom, the filter plate is arranged as a conical structure, the filter plate is arranged as a structure that can be replaced on a rotating shaft through a mounting ring, and a baffle is arranged at the bottom edge of the filter plate.
8. The single crystal silicon wafer polishing slurry circulation device according to claim 6, characterized in that: The fine filter cartridge is configured as an inner and outer two-layer structure, liquid inlet holes are arranged on the inner wall and the outer wall of the fine filter cartridge, and an adsorption layer is filled between the inner layer of the fine filter cartridge and the outer layer of the fine filter cartridge.
9. The single crystal silicon wafer polishing slurry circulation device according to claim 6, characterized in that: The rotating shaft is arranged as a hollow structure, the drain pipe is vertically inserted into the rotating shaft, and the bottom end of the drain pipe is extended into the fine filter cylinder.