Exposure clamp

By designing an exposure fixture including a clamping plate and an elastic fixing mechanism, the problem of small substrate size and inability to be fully placed on the lithography machine platform is solved, and efficient treatment without cutting and edge grinding is achieved, and contamination and damage of the substrate is avoided.

CN222774732UActive Publication Date: 2025-04-18SHENZHEN QINGYI MICROELECTRONICS CO LTD
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Patent Information

Application Number
CN202421492998.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-26
Publication Date
2025-04-18
Estimated Expiration
2034-06-26

AI Technical Summary

Technical Problem

In the prior art, the substrate is small in size and cannot be completely placed on three support points of the IC mask lithography machine platform, resulting in the need to use a large-size substrate for exposure treatment and then cut, which adds processes and may contaminate the product, resulting in the substrate requiring repeated cleaning and easy scratches and scrapping.

Method used

An exposure fixture is designed, including a clamping plate and an elastic fixing mechanism. The clamping plate is provided with a clamping groove and a fixing groove. The elastic fixing mechanism can clamp and fix the substrate through the elastic member and the clamping head, so that its size is larger than the substrate and can completely cover the three supporting points of the lithography machine platform.

Benefits of technology

By using an exposure fixture, the problem of small substrate size and unavailability of complete placement is solved. There is no need to use a large substrate to expose it, which reduces cutting, edge grinding and other processes, improves processing efficiency, and avoids the problem of repeated cleaning of substrates and scratches and scrapping.

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Abstract

The utility model discloses an exposure fixture, relates to the technical field of fixtures, and aims to solve the problems that a required small-size substrate cannot be completely placed on three supporting points of an IC (Integrated Circuit) mask plate photoetching machine platform for exposure treatment, and a large-size substrate is usually cut and edged to form a small-size substrate after exposure treatment in the prior art, so that the working procedures are increased, the production efficiency is high, and the like. And the substrate needs to be repeatedly cleaned and is easily scratched. Comprising a clamping plate, the upper surface of the clamping plate is provided with a clamping groove, and the clamping groove is used for clamping a substrate; and the elastic fixing mechanism is arranged on the clamping plate and located at one end of the clamping groove, and the elastic fixing mechanism is used for clamping and fixing the base plate in the clamping groove.
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Description

Technical Field

[0001] The present application relates to the technical field of clamps, and in particular to an exposure clamp. Background Art

[0002] In the factory, the substrate usually needs to be placed on the IC mask lithography machine platform for exposure processing. Since the IC mask lithography machine platform usually has three support points to support the substrate, when the required substrate size is small and cannot be completely placed on the three support points, it is often necessary to first use a larger substrate (which can be completely placed on the three support points) to place it on the IC mask lithography machine platform. After processing, the larger substrate is cut into the required size. This not only requires additional cutting, edging and other processes, but also the cutting and edging processes are likely to contaminate the product, resulting in the substrate requiring repeated cleaning and being easily scratched and scrapped.

[0003] Therefore, the prior art still needs to be improved. Utility Model Content

[0004] The purpose of the present application is to provide an exposure fixture to solve the problem that the required small-sized substrate cannot be completely placed on the three supporting points of the IC mask lithography machine platform for exposure processing. The existing large-sized substrates are often used for exposure processing and then cut and edge-grinded into small-sized substrates, which increases the number of steps, requires repeated cleaning of the substrate, and easily scratches the substrate.

[0005] To achieve the above-mentioned purpose, the embodiment of the present application provides an exposure fixture, comprising:

[0006] A clamping plate, the upper surface of which is provided with a clamping groove, the clamping groove being used for clamping the substrate;

[0007] An elastic fixing mechanism is arranged on the clamping plate and located at one end of the clamping groove. The elastic fixing mechanism is used for clamping and fixing the substrate in the clamping groove.

[0008] According to the exposure fixture described above, the clamping plate is provided with a fixing groove at one end of the clamping groove, the fixing groove is connected to the clamping groove, and the elastic fixing mechanism includes:

[0009] An elastic member, which is disposed in the fixing groove, and one end of the elastic member is connected to the clamping plate;

[0010] A clamping head, which is arranged on one end of the fixing groove close to the clamping groove and connected to the other end of the elastic member;

[0011] The elastic force of the elastic member is used to force one end of the clamping head to pass through the fixing groove and press against the base plate in the clamping groove.

[0012] According to the exposure fixture described above, the clamping plate is provided with at least two fixing grooves at one end of the clamping groove, the two fixing grooves are arranged in parallel and are both connected to the clamping groove, and the elastic fixing mechanism includes:

[0013] At least two elastic members, which are respectively disposed in the corresponding fixing grooves, and one end of the two elastic members is connected to the clamping plate;

[0014] At least two clamping heads, which are respectively arranged on one end of the corresponding fixing groove close to the clamping groove and connected to the other end of the corresponding elastic member;

[0015] The elastic force of the elastic member is used to force one end of the corresponding clamping head to pass through the corresponding fixing groove and press against the base plate in the clamping groove.

[0016] According to the exposure clamp described above, a protective layer is provided at one end of the clamping head away from the elastic member, and the protective layer is used to prevent the substrate from being worn.

[0017] According to the exposure fixture described above, a plurality of supporting blocks are arranged on the clamping groove, and the supporting blocks are used to support the substrate.

[0018] According to the exposure fixture described above, the clamping plate is provided with access grooves on both sides of the clamping groove, the access grooves are connected to the clamping groove, and the bottom surfaces of the access grooves are lower than the bottom surface of the clamping groove.

[0019] According to the exposure fixture described above, the two taking slots are symmetrically arranged.

[0020] According to the exposure fixture described above, the clamping plate is provided with access openings on both sides of the clamping groove, and the two access openings are both connected to the clamping groove.

[0021] According to the exposure fixture described above, the two access ports are symmetrically arranged.

[0022] According to the exposure fixture described above, the clamping plate is configured as a quartz plate, and the corners of the clamping plate are configured as rounded corners.

[0023] The beneficial effects of an exposure fixture provided by the present application are at least:

[0024] The present application sets up the exposure fixture. Since the size of the exposure fixture is larger than the size of the substrate and the size of the exposure fixture can completely cover the three supporting points of the IC mask lithography machine platform, the problem that the required substrate size is small and cannot be completely placed on the three supporting points of the IC mask lithography machine platform can be solved by placing the exposure fixture that clamps and fixes the substrate on the three supporting points of the IC mask lithography machine platform. There is no need to use a large substrate for exposure, which reduces the processes of substrate cutting and edging, improves processing efficiency, and does not require repeated cleaning of the substrate, which can avoid the problem of scratches and scrapping of the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0026] Figure 1 A structural schematic diagram of an exposure fixture is provided for an embodiment of the present application.

[0027] Figure 2 for Figure 1 Enlarged view of point A.

[0028] Figure 3 for Figure 1 A cross-sectional view of the BB.

[0029] Among them, the reference numerals in the figure are:

[0030] 1. Clamping plate; 11. Clamping groove; 12. Fixing groove; 13. Access groove; 2. Elastic fixing mechanism; 21. Elastic member; 22. Clamping head; 3. Support block; 4. Protective layer; 5. Connecting block. DETAILED DESCRIPTION

[0031] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0032] It should be noted that when a component is referred to as being "fixed on" or "disposed on" another component, it may be directly or indirectly located on the other component. When a component is referred to as being "connected to" another component, it may be directly or indirectly connected to the other component. The directions or positions indicated by the terms "upper", "lower", "left", "right", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. are based on the directions or positions shown in the accompanying drawings and are only for the convenience of description and cannot be understood as limitations on the present technical solution. The terms "first" and "second" are only used for the convenience of description and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features. "Multiple" means two or more, unless otherwise clearly and specifically defined.

[0033] In the factory, the substrate usually needs to be placed on the IC mask lithography machine platform for exposure processing. Since the IC mask lithography machine platform usually has three support points to support the substrate, when the required substrate size is too small to be completely placed on the three support points, it is often necessary to first use a larger substrate (that can be completely placed on the three support points) to place it on the IC mask lithography machine platform. After processing, the larger substrate is cut into the required size. This not only requires additional cutting, edging and other processes, but also the cutting and edging processes are likely to contaminate the product, resulting in the substrate requiring repeated cleaning and being easily scratched and scrapped.

[0034] For this purpose, see Figure 1 , Figure 2 and Figure 3 The present embodiment provides an exposure fixture, comprising a clamping plate 1 and an elastic fixing mechanism 2, wherein a clamping groove 11 is provided on the upper surface of the clamping plate 1, wherein the clamping groove 11 is used to clamp a substrate, and the elastic fixing mechanism 2 is arranged on the clamping plate 1 and located at one end of the clamping groove 11, wherein the elastic fixing mechanism 2 is used to clamp and fix the substrate in the clamping groove 11. The present embodiment sets the exposure fixture, and since the size of the exposure fixture is larger than the size of the substrate, and the size of the exposure fixture can completely cover the three supporting points of the IC mask lithography machine platform, the exposure fixture clamping and fixing the substrate is placed on the three supporting points of the IC mask lithography machine platform, thereby solving the problem that the required substrate size is small and cannot be completely placed on the three supporting points of the IC mask lithography machine platform, and there is no need to use a large substrate for exposure, thereby reducing the processes of substrate cutting, edging, etc., and improving the processing efficiency, and there is no need to repeatedly clean the substrate, thereby avoiding the problem of the substrate being scratched and scrapped.

[0035] Optional, see Figure 1In this embodiment, a plurality of support blocks 3 are provided on the clamping groove 11, and the support blocks 3 are used to support the substrate. It can be foreseen that, compared with placing the substrate in the entire clamping groove 11, the present embodiment can reduce the contact area of ​​the back side of the substrate by providing a plurality of support blocks 3 on the clamping groove 11 and placing the substrate on the support blocks 3, thereby reducing the risk of damage to the back side of the substrate. Moreover, if the substrate is directly placed in the clamping groove 11, the contact area between the two will be very large, that is, the back side area of ​​the entire substrate, and the flatness requirement of the clamping groove 11 is very high. In this embodiment, the substrate is avoided from directly contacting the clamping groove 11, and the substrate is supported by the support blocks 3, and the contact area is small, thereby reducing the processing difficulty.

[0036] For further information, see Figure 1 In this embodiment, the clamping groove 11 can be a rectangular groove, and several of the support blocks 3 are correspondingly arranged on the corners of the clamping groove 11. Since the substrate is also a rectangular plate, it can be foreseen that several support blocks 3 are also correspondingly arranged on the corners of the substrate. Through the above arrangement, this embodiment can improve the stability of the substrate set on the support block 3.

[0037] Optionally, in one embodiment, a fixing groove 12 is provided at one end of the clamping plate 1 located at the clamping groove 11, and the fixing groove 12 can be arranged in the middle of the clamping groove 11, and the fixing groove 12 is communicated with the clamping groove 11, and the elastic fixing mechanism 2 includes an elastic member 21 and a clamping head 22, wherein the elastic member 21 can be a spring, and the elastic member 21 is arranged in the fixing groove 12, one end of the elastic member 21 is connected to the clamping plate 1, and the clamping head 22 is arranged on one end of the fixing groove 12 close to the clamping groove 11 and connected to the other end of the elastic member 21, and the elastic force of the elastic member 21 is used to prompt one end of the clamping head 22 to pass through the fixing groove 12 and press against the substrate in the clamping groove 11.

[0038] Of course, it is also possible to set a bolt on the fixing groove 12 and rotate the bolt to make it press against the substrate in the clamping groove 11, but it is easy to damage the substrate. Therefore, this embodiment sets an elastic member 21 at one end of the clamping head 22 to better control the force of the clamping head 22 pressing against the substrate and reduce the damage to the substrate.

[0039] Optional, see Figure 1 and Figure 3In another embodiment, the clamping plate 1 is provided with at least two fixing grooves 12 at one end of the clamping groove 11, and the two fixing grooves 12 are arranged in parallel and are both connected to the clamping groove 11. The elastic fixing mechanism 2 includes at least two elastic members 21 and two clamping heads 22. At least two of the elastic members 21 are respectively arranged in the corresponding fixing grooves 12, one end of the two elastic members 21 is connected to the clamping plate 1, and at least two of the clamping heads 22 are respectively arranged on one end of the corresponding fixing groove 12 close to the clamping groove 11, and are connected to the other end of the corresponding elastic member 21. The elastic force of the elastic member 21 is used to prompt one end of the corresponding clamping head 22 to pass through the corresponding fixing groove 12 and press against the substrate in the clamping groove 11. It can be foreseen that, compared with fixing one point, this embodiment can more stably fix the substrate on the exposure fixture by setting two clamping heads 22 to fix two places of the substrate in the clamping groove 11.

[0040] Optional, see Figure 2 In one embodiment, a connecting block 5 is provided on the inner wall of the fixing groove 12, and the end of the elastic member 21 facing away from the clamping head 22 is connected to the connecting block 5, that is to say.

[0041] For further information, see Figure 2 In this embodiment, a protective layer 4 can be provided on the outer side of the clamping head 22. Of course, a protective layer 4 can also be provided on the end of the clamping head 22 away from the elastic member 21. In order to save material costs, in this embodiment, a protective layer 4 is preferably provided on the end of the clamping head 22 away from the elastic member 21. By providing the protective layer 4, the wear of the substrate can be prevented. The protective layer 4 can be a rubber layer or a Teflon layer, etc.

[0042] Optional, see Figure 1 In one embodiment, the clamping plate 1 is provided with access grooves 13 on both sides of the clamping groove 11, and the access grooves 13 are connected to the clamping groove 11, and the bottom surface of the access groove 13 is lower than the bottom surface of the clamping groove 11. It can be foreseen that when the substrate in the clamping groove 11 needs to be taken out, the operator can place his hand in the access groove 13, and can easily contact the lower end of the substrate to easily take out the substrate in the clamping groove 11, so as to facilitate the access to the substrate in the clamping groove 11. In addition, when the substrate needs to be placed in the clamping groove 11, the present embodiment first presses one end of the substrate (the end close to the elastic fixing mechanism 2) against the clamping head 22, and pushes the clamping head 22 to move toward the clamping groove 11 in the direction close to the fixing groove 12, until the clamping head 22 is hidden in the fixing groove 12, and then the other end of the substrate is inserted into the clamping groove 11 to complete the placement of the substrate in the clamping groove 11.

[0043] Optional, see Figure 1 In this embodiment, the access groove 13 can be a semicircular groove, and the two access grooves 13 are symmetrically arranged.

[0044] Optionally, in another embodiment, the clamping plate 1 is provided with access openings (not shown in the figure) on both sides of the clamping groove 11, and the access openings are connected to the clamping groove 11. The use principle of the access openings is consistent with that of the above-mentioned access groove 13, wherein the two access openings are symmetrically arranged.

[0045] Optionally, in this embodiment, the clamping plate 1 is configured as a quartz plate. Through the above configuration, the clamping plate 1 has high hardness and is not easily deformed.

[0046] Optional, see Figure 1 In this embodiment, the corners of the clamping plate 1 are set to be rounded. Through the above setting, this embodiment can prevent the corners of the clamping plate 1 from injuring the operator.

[0047] In summary, the present application provides an exposure fixture, comprising a clamping plate 1 and an elastic fixing mechanism 2, the upper surface of the clamping plate 1 is provided with a clamping groove 11, the clamping groove 11 is used to clamp a substrate, the elastic fixing mechanism 2 is arranged on the clamping plate 1 and is located at one end of the clamping groove 11, the elastic fixing mechanism 2 is used to clamp and fix the substrate in the clamping groove 11, the present application sets the exposure fixture, since the size of the exposure fixture is larger than the size of the substrate, and the size of the exposure fixture can completely cover the three supporting points of the IC mask lithography machine platform, therefore, by placing the exposure fixture clamping and fixing the substrate on the three supporting points of the IC mask lithography machine platform, the problem that the required substrate size is small and cannot be completely placed on the three supporting points of the IC mask lithography machine platform can be solved, there is no need to use a large substrate for exposure, the substrate cutting, edge grinding and other processes are reduced, the processing efficiency is improved, and there is no need to repeatedly clean the substrate, which can avoid the problem of scratches and scrapping of the substrate.

[0048] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. An exposure fixture, characterized in that: include: A clamping plate, the upper surface of which is provided with a clamping groove, the clamping groove being used for clamping the substrate; An elastic fixing mechanism is arranged on the clamping plate and located at one end of the clamping groove. The elastic fixing mechanism is used for clamping and fixing the substrate in the clamping groove.

2. The exposure jig according to claim 1, characterized in that: The clamping plate is provided with a fixing groove at one end of the clamping groove, the fixing groove is communicated with the clamping groove, and the elastic fixing mechanism comprises: An elastic member, which is disposed in the fixing groove, and one end of the elastic member is connected to the clamping plate; A clamping head, which is arranged on one end of the fixing groove close to the clamping groove and connected to the other end of the elastic member; The elastic force of the elastic member is used to force one end of the clamping head to pass through the fixing groove and press against the base plate in the clamping groove.

3. The exposure jig according to claim 1, characterized in that: The clamping plate is provided with at least two fixing grooves at one end of the clamping groove, the two fixing grooves are arranged in parallel and are both connected to the clamping groove, and the elastic fixing mechanism includes: At least two elastic members, which are respectively disposed in the corresponding fixing grooves, and one end of the two elastic members is connected to the clamping plate; At least two clamping heads, which are respectively arranged on one end of the corresponding fixing groove close to the clamping groove and connected to the other end of the corresponding elastic member; The elastic force of the elastic member is used to force one end of the corresponding clamping head to pass through the corresponding fixing groove and press against the base plate in the clamping groove.

4. The exposure jig according to claim 2 or 3, characterized in that: A protective layer is provided at one end of the clamping head away from the elastic member, and the protective layer is used to prevent the substrate from being worn.

5. The exposure jig according to claim 1, characterized in that: A plurality of support blocks are arranged on the clamping groove, and the support blocks are used to support the substrate.

6. The exposure jig according to claim 1, characterized in that: The clamping plate is provided with access grooves on both sides of the clamping groove, the access grooves are communicated with the clamping groove, and the bottom surfaces of the access grooves are lower than the bottom surface of the clamping groove.

7. The exposure jig according to claim 6, characterized in that: The two taking slots are symmetrically arranged.

8. The exposure jig according to claim 1, characterized in that: The clamping plate is provided with access openings on both sides of the clamping groove, and the two access openings are communicated with the clamping groove.

9. The exposure jig according to claim 8, characterized in that: The two access openings are symmetrically arranged.

10. The exposure jig according to claim 1, characterized in that: The clamping plate is configured as a quartz plate, and the corners of the clamping plate are configured as rounded corners.