Plasma generating device and plasma processing equipment

Abstract

The utility model discloses a plasma generating device and plasma processing equipment, and relates to the technical field of plasma processing, the plasma generating device comprises a plasma generating main body, an ionization assembly and a diffusion assembly, the plasma generating main body is provided with a through airflow channel, the gas flow channel is provided with a gas inlet and a gas outlet which are respectively used for introducing and discharging process gas, the diffusion assembly and the ionization assembly are arranged in the gas flow channel at an interval, the ionization assembly is used for ionizing the process gas to generate plasma, and the diffusion assembly is used for diffusing the process gas; and the plasma generation main body is also provided with a connecting part which is used for being detachably connected with an external plasma processing device, and the connecting part realizes convenient disassembly and assembly between the plasma generation device and the plasma processing device, so that maintenance and replacement of the two modules are facilitated, and the applicability of the plasma generation device is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of plasma processing, in particular to a plasma generating device and plasma processing equipment. Background Art

[0002] Plasma processing equipment generally includes a plasma generating device and a plasma treating device. The plasma treating device has a reaction chamber for placing circuit boards or wafers. The process gas is transported to the plasma generating device for ionization to generate plasma, and the plasma is allowed to enter the reaction chamber of the plasma treating device to etch / clean / deposit the circuit boards or wafers to form the desired components.

[0003] Since the plasma generating device needs to be provided with an air flow channel for ionizing the process gas, electrodes, and a power module for powering the electrodes, and the air flow channel and the reaction chamber need to be sealed and connected, the plasma generating device has many parts and a complex structure, resulting in cumbersome assembly of the plasma generating device and the plasma processing device, high difficulty in installation and disassembly, and affecting production efficiency. Utility Model Content

[0004] The main purpose of the utility model is to provide a plasma generating device and a plasma processing device, aiming to improve the problem that the plasma generating device and the plasma processing device are difficult to disassemble and assemble.

[0005] To achieve the above-mentioned purpose, the plasma generating device proposed by the utility model comprises:

[0006] A plasma generating body, the plasma generating body comprising an air flow channel, a diffusion component and an ionization component, the diffusion component and the ionization component are arranged in the air flow channel, and the air flow channel has an air inlet and an air outlet;

[0007] The ionization component is used to ionize the process gas flowing through to generate plasma;

[0008] The diffusion component is used to diffuse the process gas before and / or after ionization;

[0009] The plasma generating body has a connecting portion, which is located outside the airflow channel and is used for detachable connection with an external plasma processing device. The gas outlet of the airflow channel is connected to the reaction chamber of the external plasma processing device to supply plasma to the reaction chamber.

[0010] In one embodiment, the connecting portion includes a through hole passing through the plasma generating body, and the through hole is arranged at an interval from the air flow channel; the through hole is used for a connecting member to pass through, so that the plasma generating body and the plasma processing device can be detachably connected through the connecting member; or, the connecting portion also includes a connecting member, and the connecting member is passed through the through hole for detachably connecting the plasma generating body and the plasma processing device.

[0011] In one embodiment, the plasma generating body includes a first shell and a second shell, the first shell forms a first channel, the second shell forms a second channel, the first channel and the second channel are connected to form the airflow channel, and the through hole is set through the first shell and / or the second shell.

[0012] In one embodiment, the width of the first shell along the first direction is smaller than the width of the second shell along the first direction, an escape space is formed between the first shell and the second shell, the through hole passes through the second shell, and the escape space is used to escape the connecting member passing through the through hole.

[0013] In one embodiment, the through holes are disposed on two opposite sides of the second shell along the first direction.

[0014] In one embodiment, there are a plurality of through holes, and the plurality of through holes are sequentially spaced apart along the second direction on the second shell.

[0015] In one embodiment, the diffusion component and the ionization component are arranged in sequence along the airflow direction in the airflow channel; and / or the diffusion component includes a first diffusion plate and a second diffusion plate, and the first diffusion plate and the second diffusion plate are arranged in sequence along the airflow direction in the first channel.

[0016] In one embodiment, the plasma generating body also includes a sealing member, the plasma generating body having an abutting surface abutting against the plasma processing device, the abutting surface being provided with a limiting groove annularly arranged along the circumference of the airflow channel, the sealing member being arranged in the limiting groove for abutting and sealing against the plasma processing device.

[0017] In one embodiment, the ionization component includes a first electrode and a second electrode, and the plasma generating device also includes a power module, which is installed on the plasma generating body and is electrically connected to the first electrode and the second electrode respectively, and the power module is used to periodically change the polarity of the power output to the first electrode and the second electrode.

[0018] The utility model also proposes a plasma processing device, comprising a plasma processing device and a plasma generating device in any of the aforementioned embodiments, wherein the plasma processing device comprises a reaction chamber, and the gas outlet of the gas flow channel is connected to the reaction chamber.

[0019] The technical solution of the utility model realizes convenient assembly and disassembly by integrating various components on a plasma generating body, and arranging a connecting portion on the plasma generating body for connecting a plasma processing device. Specifically, the plasma generating device comprises a plasma generating body, an ionization component and a diffusion component. The plasma generating body has an air flow channel arranged through it, and the air flow channel has an air inlet and an air outlet, which are respectively used to connect and discharge process gas. The diffusion component and the ionization component are arranged in the air flow channel at intervals and arranged along the gas flow direction. The ionization component contacts the process gas in the air flow channel and ionizes the process gas to generate plasma. The diffusion component can be arranged between the air inlet and the ionization component to diffuse the process gas entering the air flow channel so that the process gas is fully in contact with the ionization component. The diffusion component can also be arranged between the air outlet and the ionization component so that the generated plasma enters the reaction chamber of the plasma processing device from the air outlet through the diffusion component, so that the plasma is more evenly distributed in the reaction chamber, thereby improving the etching / cleaning / deposition effect.

[0020] Furthermore, a connecting portion is provided on the plasma generating body, and the connecting portion is arranged outside the air flow channel, and the two are arranged at a distance to prevent leakage of process gas. The connecting portion is used to be detachably connected to the plasma processing device, so that the gas outlet of the air flow channel is connected to the reaction chamber of the plasma processing device, so that plasma enters the reaction chamber from the air flow channel. It can be understood that the plasma generating body integrates an ionization component and a diffusion component to form a complete independent module, and then is detachably connected to the plasma processing device through the connecting portion on the plasma generating body, thereby realizing convenient disassembly and assembly between the plasma generating device and the plasma processing device, which is beneficial to the maintenance and replacement of the two modules and improves the applicability of the plasma generating device. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0022] Figure 1 A schematic structural diagram of an embodiment of a plasma generating device provided by the utility model;

[0023] Figure 2 for Figure 1 An exploded view of the plasma generating device;

[0024] Figure 3 A schematic diagram of the structure of the first shell and the second shell in an embodiment of the plasma generating device provided by the utility model;

[0025] Figure 4 A schematic structural diagram of a diffusion component in an embodiment of a plasma generating device provided by the utility model;

[0026] Figure 5 for Figure 1 Sectional view in the AA direction;

[0027] Figure 6 for Figure 1 Axial section view along the BB direction.

[0028] Description of Figure Numbers:

[0029] 100, plasma generating device; 110, plasma generating body; 111, first shell; 112, second shell; 112a, abutting surface; 112b, limiting groove; 113, air flow channel; 113a, air inlet; 113b, air outlet; 113c, first channel; 113d, second channel; 114, diffusion component; 114a, first diffusion plate; 114b, second diffusion plate; 115, ionization component; 115a, first electrode; 115b, second electrode; 116, connecting part; 116a, through hole; 117, sealing member; 118, side cover component; 120, power module; 130, air inlet pipe.

[0030] The realization of the purpose, functional features and advantages of the utility model will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0031] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0032] It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back...), the directional indications are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0033] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the utility model, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features limited to "first" and "second" may explicitly or implicitly include at least one of the features. In addition, if "and / or" or "and / or" appears in the full text, its meaning includes three parallel solutions. Taking "A and / or B" as an example, it includes solution A, solution B, or solutions that satisfy both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the utility model.

[0034] The utility model provides a plasma generating device 100 .

[0035] See also Figures 1 to 6 In one embodiment of the utility model, the plasma generating device 100 includes a plasma generating body 110, an ionization component 115 and a diffusion component 114. The plasma generating body 110 has a gas flow channel 113 arranged through it. The gas flow channel 113 has an air inlet 113a and a gas outlet 113b, which are respectively used to connect and discharge process gas. The diffusion component 114 and the ionization component 115 are arranged in the gas flow channel 113 at intervals and arranged along the gas flow direction. The ionization component 115 contacts the process gas in the gas flow channel 113 and discharges the process gas. Ionization generates plasma. The diffusion component 114 can be arranged between the air inlet 113a and the ionization component 115 to diffuse the process gas entering the air flow channel 113 so that the process gas is in full contact with the ionization component 115. The diffusion component 114 can also be arranged between the air outlet 113b and the ionization component 115 so that the generated plasma passes through the diffusion component 114 and enters the reaction chamber of the plasma processing device (not shown) from the air outlet 113b, so that the plasma is more evenly distributed in the reaction chamber, thereby improving the etching / cleaning / deposition effect.

[0036] Furthermore, a connecting portion 116 is provided on the plasma generating body 110, and the connecting portion 116 is arranged outside the air flow channel 113, and the two are arranged at a distance to prevent leakage of process gas. The connecting portion 116 is used to be detachably connected to the plasma processing device, so that the gas outlet 113b of the air flow channel 113 is connected to the reaction chamber of the plasma processing device, so that plasma enters the reaction chamber from the air flow channel 113. It can be understood that the ionization component 115 and the diffusion component 114 are integrated in the plasma generating body 110 to form a complete independent module, and then the plasma generating body 110 is detachably connected to the plasma processing device through the connecting portion 116 on the plasma generating body 110, thereby realizing convenient disassembly and assembly between the plasma generating device 100 and the plasma processing device, facilitating the maintenance and replacement of the two modules, and improving the applicability of the plasma generating device 100.

[0037] In one embodiment, the connecting portion 116 includes a through hole 116a that passes through the plasma generating body 110, and the through hole 116a is spaced apart from the air flow channel 113; the through hole 116a is used for a connecting member to pass through, so that the plasma generating body 110 and the plasma processing device can be detachably connected through the connecting member; or, the connecting portion 116 also includes a connecting member, and the connecting member is passed through the through hole 116a, so as to detachably connect the plasma generating body 110 and the plasma processing device.

[0038] like Figure 1 , Figure 3 and Figure 5 As shown, in one embodiment of the utility model, the connecting portion 116 is a through hole 116a formed along the third direction (i.e., the height direction of the plasma generating body 110) through the plasma generating body 110, and the through hole 116a is used for a connecting member (not shown) to pass through, and the connecting member is connected to the plasma processing device through the through hole 116a. In this embodiment, the connecting member is a bolt. In some other embodiments of the utility model, the connecting member can also be a pin or other component, so as to be able to fix the plasma generating device 100 on the plasma processing device, and no specific limitation is made here.

[0039] It should be noted that, in another embodiment of the present invention, the connecting portion 116 also includes a connecting piece in addition to the through hole 116a, that is, the connecting piece is movably arranged in the through hole 116a as a part of the plasma generating body 110. Since the connecting piece can be disassembled, the equipment can decide whether the plasma generating body 110 includes the connecting piece according to demand, and no specific limitation is made here.

[0040] In one embodiment, the plasma generating body 110 includes a first shell 111 and a second shell 112, the first shell 111 forms a first channel 113c, the second shell 112 forms a second channel 113d, the first channel 113c and the second channel 113d are connected to form an airflow channel 113, and a through hole 116a is set through the first shell 111 and / or the second shell 112.

[0041] like Figure 2 , Figure 3 and Figure 5 As shown, in one embodiment of the utility model, the plasma generating body 110 includes a first shell 111 and a second shell 112, the first shell 111 is penetrated by a first channel 113c, the second shell 112 is penetrated by a second channel 113d, the first shell 111 and the second shell 112 are connected so that the first channel 113c is connected to the second channel 113d to form an air flow channel 113, the air inlet 113a is provided on the first shell 111 away from the second shell 112 on a side, for connecting the air inlet pipe 130, the air inlet pipe 130 can be connected to the gas source module (not shown) providing the process gas, the air outlet 113b Located on the side of the second shell 112 away from the first shell 111, the diffusion component 114 is arranged in the first channel 113c, and the ionization component 115 is arranged in the second channel 113d, so that the first shell 111 and the second shell 112 can form a modular assembly, which is beneficial to the maintenance and replacement of components. Since the air inlet 113a and the air outlet 113b are arranged in the third direction, the plasma processing device can be connected through the first shell 111 or the second shell 112, and the through hole 116a can be opened on the first shell 111 or the second shell 112, so that the connecting piece can be passed through and connected to the equipment body, and no specific limitation is made here.

[0042] In one embodiment, the width of the first shell 111 along the first direction is smaller than the width of the second shell 112 along the first direction, and an escape space is formed between the first shell 111 and the second shell 112. The through hole 116a passes through the second shell 112, and the escape space is used to avoid the connecting part passing through the through hole 116a.

[0043] like Figure 1 and Figure 5As shown, in one embodiment of the utility model, the second shell 112 is used to connect with the plasma processing device, the air inlet 113a is provided on the first shell 111, and the air outlet 113b is provided on the second shell 112. The width of the first shell 111 in the first direction (i.e., the width direction of the plasma generating body 110) is smaller than the width of the second shell 112 in the first direction, so that when the first shell 111 is covered on the second shell 112, the two sides of the first shell 111 in the first direction form a stepped avoidance space with the second shell 112, and the through hole 116a is provided on the second shell 112 and penetrates along the third direction. The connector can pass through the avoidance space and penetrate into the through hole 116a to realize a detachable connection. The avoidance space is provided to facilitate the disassembly and assembly of the plasma generating device 100, and can improve the space utilization rate of the plasma generating body 110 and reduce the overall volume of the plasma generating device 100.

[0044] In one embodiment, two opposite sides of the second housing 112 along the first direction are provided with through holes 116 a .

[0045] like Figure 3 and Figure 5 As shown, in one embodiment of the utility model, through holes 116a are provided on both sides of the second shell 112 relative to each other along the first direction. It can be understood that in order to ensure firm installation, through holes 116a are provided on both sides of the second shell 112 and connecting parts are passed through, which can improve the connection tightness between the second shell 112 and the equipment body of the plasma processing device, avoid unilateral fixation causing gaps on one side and thus leading to leakage of process gas, and can improve the stability and safety of the entire device.

[0046] In one embodiment, there are multiple through holes 116 a , and the multiple through holes 116 a are sequentially arranged along the second direction on the second housing 112 at intervals.

[0047] like Figure 2 , Figure 3 and Figure 5 As shown, in one embodiment of the utility model, a plurality of through holes 116a are provided and are disposed on both sides of the second shell 112 in the first direction. The plurality of through holes 116a are evenly spaced apart on both sides of the second shell 112 along the second direction (i.e., the length direction of the plasma generating body 110). It can be understood that the provision of a plurality of through holes 116a and connectors can increase the connection stress points, improve the structural strength, and help to enhance the sealing effect between the plasma generating device 100 and the plasma processing device. The sealing structure will be specifically described below.

[0048] In one embodiment, the diffusion component 114 and the ionization component 115 are arranged in sequence along the airflow direction in the airflow channel 113; and / or, the diffusion component 114 includes a first diffusion plate 114a and a second diffusion plate 114b, and the first diffusion plate 114a and the second diffusion plate 114b are arranged in sequence along the airflow direction in the first channel 113c.

[0049] like Figure 4 and Figure 5 As shown, in one embodiment of the utility model, the diffusion component 114 and the ionization component 115 are arranged at intervals in the air flow channel 113, so that the process gas can be diffused first and then ionized, or ionized first and then diffused, or diffused before and after ionization; in this embodiment, the ionization component 115 is arranged in the second channel 113d, and the diffusion component 114 includes a first diffusion plate 114a and a second diffusion plate 114b, and the two diffusion plates are both arranged in the first channel 113c to diffuse the process gas entering the second channel 113d. The diffused process gas enters the second channel 113d and is ionized by the ionization component 115. The first diffusion plate 114a and the second diffusion plate 114b are both provided with a plurality of air inlet holes, and the number of air inlet holes on the first diffusion plate 114a is less than that on the second diffusion plate 114b, so that the process gas diffuses more evenly and fills the second channel 113d as much as possible, and is fully in contact with the ionization component 115, thereby improving the ionization effect.

[0050] In one embodiment, the plasma generating body 110 further includes a sealing member 117. The plasma generating body 110 has an abutting surface 112a abutting against a plasma processing device. The abutting surface 112a is provided with a limiting groove 112b arranged in a circumferential ring along the air flow channel 113. The sealing member 117 is arranged in the limiting groove 112b for abutting and sealing against the plasma processing device.

[0051] like Figure 2 and Figure 5 As shown, in one embodiment of the utility model, in order to achieve a sealed connection between the plasma generating device 100 and the plasma processing device, the plasma generating body 110 further includes a sealing member 117, which is an annular rubber ring. The second shell 112 has an abutting surface 112a on the side facing the plasma processing device. The abutting surface 112a is provided with a limiting groove 112b circumferentially arranged around the air flow channel 113. The sealing member 117 is embedded in the limiting groove 112b. When the plasma generating device 100 and the plasma processing device are connected, the gas outlet 113b is docked with the reaction chamber, and the abutting surface 112a abuts on the plasma processing device and presses the sealing member 117 to achieve sealing, thereby preventing the process gas from leaking from between the plasma generating body 110 and the plasma processing device.

[0052] In one embodiment, the ionization assembly 115 includes a first electrode 115a and a second electrode 115b, and the plasma generating device 100 further includes a power module 120, which is mounted on the plasma generating body 110 and electrically connected to the first electrode 115a and the second electrode 115b, respectively, and the power module 120 is used to periodically change the polarity of the power output to the first electrode 115a and the second electrode 115b.

[0053] like Figure 1 , Figure 5 as well as Figure 6 As shown, in one embodiment of the utility model, the ionization component 115 includes a first electrode 115a and a second electrode 115b, and the two electrodes are extended along the second direction and spaced apart in the second channel 113d, which can improve the ionization efficiency and the uniformity of the plasma. The two ends of the first electrode 115a and the second electrode 115b are installed through the side cover component 118. The plasma generating device 100 also includes a power module 120, which is connected to the plasma generating body 110 and is electrically connected to the first electrode 115a and the second electrode 115b. The power module 120 is used to periodically change the polarity of the power output to the first electrode 115a and the second electrode 115b, so that the positive and negative polarities of the first electrode 115a and the second electrode 115b are changed, which can avoid the problem of uneven etching / cleaning / deposition of a single positive and negative electrode, and further improve the uniformity of etching / cleaning / deposition.

[0054] The utility model also proposes a plasma processing device, which includes a plasma processing device and a plasma generating device 100. The specific structure of the plasma generating device 100 refers to the above embodiment. Since the plasma processing device adopts all the technical solutions of all the above embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, which will not be repeated here. Among them, the plasma processing device has a reaction chamber, and the gas outlet 113b of the gas flow channel 113 of the plasma generating device 100 is connected to the reaction chamber, so that plasma can enter the reaction chamber through the gas outlet 113b.

[0055] The above description is only an exemplary embodiment of the present invention, and does not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the technical concept of the present invention, or directly / indirectly applied in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A plasma generating device, characterized in that: include: A plasma generating body, the plasma generating body comprising an air flow channel, a diffusion component and an ionization component, the diffusion component and the ionization component are arranged in the air flow channel, and the air flow channel has an air inlet and an air outlet; The ionization component is used to ionize the process gas flowing through to generate plasma; The diffusion component is used to diffuse the process gas before and / or after ionization; The plasma generating body has a connecting portion, which is located outside the airflow channel and is used for detachable connection with an external plasma processing device. The gas outlet of the airflow channel is connected to the reaction chamber of the external plasma processing device to supply plasma to the reaction chamber.

2. The plasma generating device according to claim 1, wherein: The connecting portion includes a through hole that passes through the plasma generating body, and the through hole is arranged at a distance from the air flow channel; the through hole is used for a connecting piece to pass through, so that the plasma generating body and the plasma processing device can be detachably connected through the connecting piece; or, the connecting portion also includes a connecting piece, and the connecting piece is passed through the through hole, so as to be used for detachably connecting the plasma generating body and the plasma processing device.

3. The plasma generating device according to claim 2, characterized in that: The plasma generating body comprises a first shell and a second shell, the first shell forms a first channel, the second shell forms a second channel, the first channel and the second channel are connected to form the airflow channel, and the through hole is set through the first shell and / or the second shell.

4. The plasma generating device according to claim 3, characterized in that: The width of the first shell along the first direction is smaller than the width of the second shell along the first direction, an escape space is formed between the first shell and the second shell, the through hole passes through the second shell, and the escape space is used to escape the connecting member passing through the through hole.

5. The plasma generating device according to claim 4, characterized in that: The through holes are disposed on opposite sides of the second shell along the first direction.

6. The plasma generating device according to claim 5, characterized in that: There are multiple through holes, and the multiple through holes are arranged in sequence along the second direction on the second shell.

7. The plasma generating device according to claim 3, characterized in that: The diffusion component and the ionization component are arranged in sequence in the airflow direction in the airflow channel; and / or the diffusion component includes a first diffusion plate and a second diffusion plate, and the first diffusion plate and the second diffusion plate are arranged in sequence in the first channel along the airflow direction.

8. The plasma generating device according to any one of claims 1 to 7, characterized in that: The plasma generating body also includes a sealing member, the plasma generating body having an abutting surface abutting against the plasma processing device, the abutting surface being provided with a limiting groove annularly arranged along the circumference of the gas flow channel, the sealing member being arranged in the limiting groove for abutting and sealing against the plasma processing device.

9. The plasma generating device according to any one of claims 1 to 7, characterized in that: The ionization assembly includes a first electrode and a second electrode, and the plasma generating device also includes a power module, which is installed on the plasma generating body and electrically connected to the first electrode and the second electrode respectively, and is used to periodically change the polarity of the power output to the first electrode and the second electrode.

10. A plasma processing device, characterized in that: It comprises a plasma processing device and a plasma generating device as claimed in any one of claims 1 to 9, wherein the plasma processing device has a reaction chamber, and the gas outlet of the gas flow channel is connected to the reaction chamber.

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