Long-service-life device for improving uniformity of thin film

Abstract

The utility model relates to a long-life device for improving film uniformity, which belongs to the technical field of semiconductor processing equipment and comprises processing equipment, an adjusting component is mounted on the lower side wall of the processing equipment and comprises a motor fixedly connected to the lower side of the processing equipment, and a toothed bar is rotatably connected to the inner wall of the lower side of the processing equipment. The output end of the motor is fixedly connected with the toothed bar, the upper end of the toothed bar is rotationally connected with a supporting plate, a fixing cylinder is fixedly connected between the supporting plate and the lower side wall of the machining equipment, the fixing cylinder is slidably connected with a plurality of toothed plates, and the toothed plates are meshed with the toothed bar. The circle center of the ceramic wafer automatically corresponds to the circle center of the placed silicon wafer, so that the deposition uniformity of the periphery of the thin film is improved, meanwhile, the problems that the ceramic wafer is fragile due to electric shock and short in service life are solved through changes, and the problem that the efficiency discreteness is large due to the fact that the film thickness is not uniform is also solved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing equipment, in particular to a device with a long service life for improving film uniformity. Background Art

[0002] With the consumption of non-renewable resources and the pollution of the environment, green and sustainable development is the new purpose of survival; solar power generation as an unlimited renewable energy source is the necessary path for the world's energy transformation. Solar cells, as an important application tool for solar power generation, have been widely used all over the world. Solar cells are energy-saving devices that use solar radiation to directly convert into electrical energy. They have the advantages of high energy utilization efficiency, low maintenance cost, and high power stability. They have good market development prospects. The working principle of PECVD is to ionize the gas containing the atoms of the film components in a closed space (cavity) under a vacuum environment with the help of microwaves or radio frequencies to form plasma locally. The plasma has strong chemical activity and is easy to react, and the desired film is deposited on the substrate. In order to enable the chemical reaction to proceed at a lower temperature and form a film layer with better quality properties, the activity of plasma is used to promote the reaction.

[0003] Publication (Announcement) No.: CN219286369U; discloses a cavity ceramic ring and a processing device for a semiconductor device, and provides a cavity ceramic ring and a processing device for a semiconductor device. The above-mentioned cavity ceramic ring includes a ceramic ring body, which is used to cooperate with a spray plate and a wafer tray to form a reaction chamber for processing wafers; and a position adjustment mechanism, which is connected to the ceramic ring body and is used to drive the ceramic ring body to perform lateral and / or longitudinal displacement. By configuring the position adjustment mechanism, the cavity ceramic ring can have left-right and up-down adjustment functions, so that the heating plate and the ceramic ring are concentric, thereby controlling the uniformity of the periphery of the film.

[0004] The ceramic sheet device plays a vital role in the cavity. The ceramic sheet must ensure that the cathode heating plate on the cavity is insulated from the silicon wafer carrier and that the ions generated by the reaction in the cavity can be evenly sputtered on the surface of the silicon wafer. At the same time, when the centers of the silicon wafer and the ceramic sheet do not correspond, the periphery of the thin film deposited on the silicon wafer will also be uneven. In the above patent, the concentricity adjustment of the ceramic ring still needs to be manually adjusted, which is very inconvenient. In view of this, it is necessary to provide a new type of ceramic sheet device that is resistant to high temperature, resistant to electric shock, not easy to break and has excellent gas uniformity effect to solve the above technical problems. Utility Model Content

[0005] The utility model aims to provide a device for improving film uniformity with a long service life, so as to solve the problem of improving the non-uniformity of thin film deposited on silicon wafers proposed in the above background technology.

[0006] The technical solution of the utility model is:

[0007] It includes processing equipment, and an adjustment component is installed on the lower side wall of the processing equipment. The adjustment component includes a motor fixedly connected to the lower side of the processing equipment, a gear rod is rotatably connected to the lower inner wall of the processing equipment, and the output end of the motor is fixedly connected to the gear rod, a support plate is rotatably connected to the upper end of the gear rod, a fixed cylinder is fixedly connected between the support plate and the lower side wall of the processing equipment, a plurality of gear plates are slidably connected to the fixed cylinder, and the plurality of gear plates are all meshed with the gear rod, and a top rod is fixedly connected to the plurality of gear plates, and a moving component is installed on the upper inner wall of the processing equipment.

[0008] Furthermore, the moving component includes a fixed rail fixedly connected to the inner walls of the front and rear sides of the processing equipment, a sliding rod is slidably connected between the two fixed rails, a moving block is arranged on the lower side of the sliding rod, a sliding sleeve is fixedly connected to the upper side wall of the moving block, and the sliding sleeve is slidably connected to the sliding rod, a supporting component is installed on the lower side wall of the moving block, the supporting component includes a ceramic drag ring located on the lower side of the moving block, and two connecting rods are fixedly connected between the ceramic drag ring and the moving block.

[0009] By setting up a moving assembly and a supporting assembly, the gear rod can drive multiple tooth plates to move synchronously, and the push rod can be used to push the moving block to move, so that the center of the moving block can be controlled at the axis center of the gear rod.

[0010] Furthermore, a silicon wafer is placed on the side wall of the support plate, a ceramic wafer is placed on the ceramic drag ring, the specifications and morphology of the ceramic wafer are made into a double-layer staggered type, and the ventilation holes of the ceramic wafer are processed in quantity and region.

[0011] By changing the ceramic sheet, the gas can be converged in the middle position and diffused from the middle position to both sides, reducing the gas flow at the edge to achieve the purpose of improving uniformity. At the same time, it also improves the compactness of the upper cathode ceramic arrangement, improves the resistance to electric shock, and reduces the risk of ceramic sheet breakage.

[0012] The utility model provides a device for improving the uniformity of thin films with a long service life through improvement. Compared with the prior art, the utility model has the following improvements and advantages:

[0013] First, the utility model can automatically drive the ceramic sheet to move, so that the center of the ceramic sheet automatically corresponds to the center of the placed silicon sheet, thereby improving the deposition uniformity of the periphery of the thin film.

[0014] Second, the utility model avoids the problem of ceramic pieces being easily broken by electric shock and having a short service life, and also avoids the problem of large efficiency dispersion due to uneven film thickness. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The utility model is further explained below in conjunction with the accompanying drawings and embodiments:

[0016] Figure 1It is a three-dimensional stereogram of the utility model;

[0017] Figure 2 It is a schematic diagram of the structure inside the processing equipment of the utility model;

[0018] Figure 3 It is a structural schematic diagram of the adjustment component and the moving component part of the utility model;

[0019] Figure 4 It is a structural schematic diagram of the support assembly of the utility model;

[0020] Figure 5 It is a schematic diagram of the structure of a conventional device;

[0021] Figure 6 It is a structural schematic diagram of the ceramic piece of the utility model.

[0022] Description of reference numerals:

[0023] 1. Processing equipment;

[0024] 2. Adjustment assembly; 201. Motor; 202. Gear rod; 203. Support plate; 204. Fixed cylinder; 205. Gear plate; 206. Ejector rod;

[0025] 3. Moving assembly; 301. Fixed rail; 302. Sliding rod; 303. Moving block; 304. Sliding sleeve;

[0026] 4. Support assembly; 401. Ceramic drag ring; 402. Connecting rod;

[0027] 5. Silicon wafer;

[0028] 6. Ceramic pieces. DETAILED DESCRIPTION

[0029] The following will be combined with the attached Figures 1 to 5 The utility model is described in detail, and the technical solutions in the embodiments of the utility model are clearly and completely described. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of them. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0030] The utility model provides a device for improving the uniformity of thin films with a long service life by improvement. Figure 1 - Figure 4As shown, it includes a processing device 1, and an adjustment component 2 is installed on the lower side wall of the processing device 1. The adjustment component 2 includes a motor 201 fixedly connected to the lower side of the processing device 1. The structure and principle of the motor 201 are both existing technologies and are not repeated here. A gear rod 202 is rotatably connected to the inner wall of the lower side of the processing device 1, and the output end of the motor 201 is fixedly connected to the gear rod 202. A support plate 203 is rotatably connected to the upper end of the gear rod 202. The center of the support plate 203 and the axis of the gear rod 202 are in the same vertical plane. A fixed cylinder 204 is fixedly connected between the support plate 203 and the lower side wall of the processing device 1, and a plurality of tooth plates 205 are slidably connected to the fixed cylinder 204, and the plurality of tooth plates 205 are all meshed with the gear rod 202. A push rod 206 is fixedly connected to the plurality of tooth plates 205. A moving component 3 is installed on the inner wall of the upper side of the processing device 1.

[0031] In this embodiment: by starting the motor 201, the motor 201 drives the gear rod 202 to rotate, and the gear rod 202 drives the multiple tooth plates 205 to shrink at the same time, so that the multiple tooth plates 205 can push the moving block 303 through the push rod 206. When the three push rods 206 push the moving block 303 synchronously at the same time, the moving block 303 will be pushed to the same position as the axis of the gear rod 202, so that the center of the moving block 303 and the support plate 203 are on the same vertical plane, thereby improving the deposition uniformity of the periphery of the thin film.

[0032] In the above embodiment, the moving block 303 can automatically adjust and move inside the processing equipment 1, which can be implemented in the following manner:

[0033] In a preferred embodiment, the moving component 3 includes a fixed rail 301 fixedly connected to the inner walls of the front and rear sides of the processing equipment 1, a sliding rod 302 is slidably connected between the two fixed rails 301, a moving block 303 is arranged on the lower side of the sliding rod 302, a sliding sleeve 304 is fixedly connected to the upper side wall of the moving block 303, and the sliding sleeve 304 is slidably connected to the sliding rod 302, and a supporting component 4 is installed on the lower side wall of the moving block 303, the supporting component 4 includes a ceramic drag ring 401 located on the lower side of the moving block 303, the center of the ceramic drag ring 401 corresponds to the center of the moving block 303, and the upper side wall of the ceramic drag ring 401 is opened with a placement groove matching the ceramic sheet 6, so that after the ceramic sheet 6 is placed on the ceramic drag ring 401, the center of the ceramic sheet 6 can correspond to the ceramic drag ring 401, and two connecting rods 402 are fixedly connected between the ceramic drag ring 401 and the moving block 303.

[0034] In this embodiment: the forward and backward movement of the movable block 303 is achieved through the sliding connection between the slide rod 302 and the fixed rail 301, and the left and right movement of the movable block 303 is achieved through the sliding connection between the sleeve 304 and the slide rod 302. By drilling a placement groove on the ceramic drag ring 401, the center of the ceramic piece 6 can be in the same vertical plane as the center of the movable block 303. At this time, it is only necessary to adjust the center of the movable block 303 and the gear rod 202 to the same vertical plane.

[0035] Also, see Figure 5 This figure shows the specifications and morphology of the conventional ceramic sheet 6 at the upper cathode position and the arrangement of the vent positions. Because the exhaust position is on both sides of the chamber, the edge gas flow will increase, the edge film thickness will become thicker, and the uniformity will deteriorate; and the specifications and morphology of the ceramic sheet 6 will seriously affect the service life.

[0036] See also Figure 6 The figure shows the ceramic sheet 6 of the present device, which regionalizes the number of vent holes of the ceramic sheet 6, tries to make the gas converge in the middle position, diffuse from the middle position to both sides, reduce the gas flow at the edge, and thus achieve the purpose of improving uniformity; simultaneously, the specifications and morphology of the ceramic sheet 6 are made into a double-layer staggered type, which improves the compactness of the upper cathode ceramic arrangement, improves the electric shock resistance, and reduces the risk of ceramic sheet 6 breakage. The verification conclusion analysis shows that the service life of the ceramic sheet 6 in the present invention is increased by >80%, and the film uniformity is increased by >45%.

[0037] The utility model makes the low-temperature effect more obvious through the PECVD new ceramic piece 6, effectively reduces the frequency of sparking and broken ceramics in the production process, greatly improves the life of the ceramic piece 6 and the uniformity of the crystalline silicon film layer, thereby reducing costs, reducing the impact on production capacity, and improving the overall efficiency of solar cells.

[0038] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A device for improving thin film uniformity with a long service life, comprising a processing device (1), characterized in that: An adjustment assembly (2) is installed on the lower side wall of the processing equipment (1), and the adjustment assembly (2) comprises a motor (201) fixedly connected to the lower side of the processing equipment (1); a gear rod (202) is rotatably connected to the inner wall of the lower side of the processing equipment (1), and the output end of the motor (201) is fixedly connected to the gear rod (202); a support plate (203) is rotatably connected to the upper end of the gear rod (202); a fixed cylinder (204) is fixedly connected between the support plate (203) and the lower side wall of the processing equipment (1); a plurality of tooth plates (205) are slidably connected to the fixed cylinder (204), and the plurality of tooth plates (205) are all meshed with the gear rod (202); a plurality of tooth plates (205) are fixedly connected to a push rod (206); and a moving assembly (3) is installed on the inner wall of the upper side of the processing equipment (1).

2. The device for improving thin film uniformity with a long service life according to claim 1, characterized in that: The moving assembly (3) comprises a fixed rail (301) fixedly connected to the inner walls of the front and rear sides of the processing equipment (1), a sliding rod (302) is slidably connected between the two fixed rails (301), and a moving block (303) is arranged on the lower side of the sliding rod (302).

3. The device for improving thin film uniformity with a long service life according to claim 2, characterized in that: The upper side wall of the moving block (303) is fixedly connected with a sliding sleeve (304), and the sliding sleeve (304) is slidably connected with the sliding rod (302), and the lower side wall of the moving block (303) is installed with a supporting assembly (4).

4. The device for improving thin film uniformity with a long service life according to claim 3, characterized in that: The support assembly (4) comprises a ceramic drag ring (401) located at the lower side of the moving block (303), and two connecting rods (402) are fixedly connected between the ceramic drag ring (401) and the moving block (303).

5. The device for improving thin film uniformity with a long service life according to claim 4, characterized in that: A silicon wafer (5) is placed on the upper side wall of the support plate (203), and a ceramic wafer (6) is placed on the ceramic drag ring (401).

6. The device for improving thin film uniformity with a long service life according to claim 5, characterized in that: The ceramic sheet (6) is designed in a double-layer staggered shape.

7. The device for improving thin film uniformity with a long service life according to claim 5, characterized in that: The ventilation holes of the ceramic sheet (6) are processed in a quantitatively zoned manner.

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