Semiconductor process waste gas treatment system
By designing a cone structure with a small upper and a large lower lower at the input end of the semiconductor process exhaust gas treatment system, the problem of impurities accumulation in the waste gas is solved, the air flow smoothness and purification effect are improved, and the maintenance frequency is reduced.
Patent Information
- Application Number
- CN202421785588.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-26
- Publication Date
- 2025-04-25
- Estimated Expiration
- 2034-07-26
AI Technical Summary
In the existing semiconductor process exhaust gas treatment system, the upper width and narrow structure of the gas reactor causes impurities in the exhaust gas to easily accumulate at the output end, resulting in poor flow, dust wall hanging, blockage, and equipment corrosion and leakage, which require frequent shutdown and cleaning and maintenance.
A semiconductor process exhaust gas treatment system is designed. The gas reactor input end adopts a conical cylinder structure with a small upper and a large lower lower, and a uniform gas filtration module is installed inside, including a detachable material basket and filler. Through the combination of the conical cylinder structure and a uniform gas filtration module, the air flow smoothness and impurity capture effect are improved.
The cone structure improves air flow smoothness, reduces impurity accumulation, improves equipment operation stability and purification effect, and reduces maintenance frequency. The uniform air filtration module can effectively capture impurities, making it convenient for regular cleaning and maintenance.
Smart Images
Figure CN222788927U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of waste gas treatment equipment, in particular to a semiconductor process waste gas treatment system. Background Art
[0002] In the production process of the semiconductor industry, a large amount of chemicals and special gases are used, and a large amount of toxic and harmful process waste gas is continuously generated in the production process.
[0003] In semiconductor processes, harsh processes refer to complex, harsh, dusty, and highly corrosive processes, such as the borophosphosilicate glass (BPSG) process in the chemical vapor deposition (CVD) process, the high aspect ratio (HARP) process, the silicon nitride (SiN) process, the metal etching (Metal ETCH) process in the etching (ETCH) process, the atomic layer deposition (ALD) process in the diffusion (Diffusion) process, the time-sensitive networking (TSN) process, etc.
[0004] In the Harsh process, a large amount of SiO2 dust and highly corrosive harmful substances need to be handled. In order to facilitate the discharge operation during maintenance and cleaning, the gas reactor used in some existing semiconductor waste gas treatment systems will be designed with a constricted structure at the bottom output end of the gas reactor, that is, a tank structure that is wide at the top and narrow at the bottom. This structure easily increases the resistance of the internal gas at the bottom and causes poor flow. When the flow rate decreases, it is easy to cause dust to accumulate on the wall, even blockage, and further cause equipment corrosion and leakage, resulting in the need for frequent shutdown of the equipment for cleaning and maintenance during use. Utility Model Content
[0005] The utility model provides a semiconductor process waste gas treatment system, which is beneficial to solving the problem that impurities contained in the waste gas are easily accumulated at the output end of the gas reactor due to the structure of some existing gas reactors that are wide at the top and narrow at the bottom.
[0006] The utility model is achieved in this way:
[0007] A semiconductor process waste gas treatment system comprises a cabinet, a cavity is provided inside the cabinet, a water tank is provided at the bottom of the cavity, a gas reactor and a washing tower are provided on the water tank, the top of the washing tower is an exhaust end, the bottom of the washing tower is connected with the top of the water tank, and a water channel connected with the water tank is provided inside the washing tower, the top of the gas reactor is an input end, a first disassembly body is provided at the bottom, one side of the first disassembly body forms a connecting structure with the bottom side wall of the washing tower through a connecting pipe, a conical cylinder structure with a small top and a large bottom is provided at the top of the gas reactor, a uniform gas filtering module is provided inside the conical cylinder structure, and the uniform gas filtering module comprises a material basket, the material basket is detachably connected to the inner wall of the gas reactor, and filler is provided inside the material basket.
[0008] Based on the above technical solution, the gas reactor includes a variable diameter section and a vertical section distributed up and down, the variable diameter section constitutes the conical cylinder structure, a fixed frame is provided inside the variable diameter section, the fixed frame has a longitudinal hollow structure, and the uniform gas filtration module is connected below the fixed frame.
[0009] On the basis of the above technical solution, the fixing frame includes an outer ring and an inner ring arranged concentrically, which are connected into an integrated structure by a plurality of ribs. A central hole is provided at the center of the inner ring, and the central hole penetrates the inner ring longitudinally.
[0010] Based on the above technical solution, a vertical mounting rod is provided at the center of the basket. The mounting rod has an external thread structure. The mounting rod passes through the middle hole from bottom to top and is fixed by a nut. After installation, the outer periphery of the basket abuts against the inner wall of the variable diameter section of the gas reactor.
[0011] Based on the above technical solution, the filler comprises polyhedral hollow spheres.
[0012] On the basis of the above technical solution, a second disassembly body is provided at the bottom of the washing tower, and the connection position between the connecting pipe and the washing tower is located on the side wall of the second disassembly body.
[0013] On the basis of the above technical solution, a holding piece is sleeved on the mounting rod, the holding piece is located on the top of the filling material in the material basket, and the holding piece has a plurality of longitudinal hollow structures.
[0014] On the basis of the above technical solution, an elastic member is provided on the mounting rod between the holding member and the top of the material frame, and the elastic expansion and contraction direction of the elastic member is parallel to the vertical direction.
[0015] Based on the above technical solution, the elastic member is a tension spring.
[0016] On the basis of the above technical solution, a plurality of height-adjustable feet are provided at the bottom of the cabinet.
[0017] Compared with the prior art, the utility model has at least the following advantages:
[0018] The utility model arranges the input end of the gas reactor into a conical cylinder structure with a smaller inner diameter near the input end. This allows the pressure of the semiconductor process waste gas to gradually decrease towards the output end after entering the gas reactor. This is conducive to smooth airflow and does not easily result in a stagnation area due to the large pressure resistance in the input end area. Therefore, the smoothness of the airflow is improved to reduce the accumulation of impurities. In addition, by providing a detachable gas-leveling filter module, most impurities can be captured and collected, which is convenient for regular cleaning and maintenance. The gas-leveling filter module can also fully mix the gas to improve the reaction efficiency and purification effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] In order to more clearly illustrate the technical solution of the implementation mode of the utility model, the drawings required for use in the implementation mode will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.
[0020] Figure 1 is a schematic structural diagram of a semiconductor process waste gas treatment system in one embodiment;
[0021] Figure 2 for Figure 1 Schematic diagram of the internal structure of the gas reactor;
[0022] Figure 3 for Figure 2 A schematic diagram of the structure of the middle fixing frame;
[0023] Figure 4 FIG. 4 is a schematic diagram of the structure of a pressing member in another embodiment.
[0024] Labels in the figure: 1. cabinet; 11. cavity; 2. gas reactor; 21. first disassembled body; 22. fixing frame; 221. outer ring; 222. inner ring; 223. ribs; 224. middle hole; 23. material basket; 24. mounting rod; 25. holding piece; 27. elastic piece; 2a. reducing section; 2b. vertical section; 3. water tank; 4. washing tower; 41. second disassembled body; 5. connecting pipe; 6. filling material. DETAILED DESCRIPTION
[0025] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model. Therefore, the following detailed description of the embodiments of the utility model provided in the drawings is not intended to limit the scope of the utility model for which protection is claimed, but merely represents selected embodiments of the utility model.
[0026] In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.
[0027] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to an element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation method.
[0028] The utility model is further described in detail below with reference to the accompanying drawings and specific embodiments.
[0029] Example 1: Combination Figure 1-3 This embodiment discloses a semiconductor process waste gas treatment system, including a cabinet 1, a gas reactor 2, a water tank 3, a washing tower 4, a connecting pipe 5 and a filler 6.
[0030] Specifically, the cabinet 1 is a rectangular box structure, a door structure is provided on the front side thereof, and a cavity 11 is provided inside thereof, and the cavity 11 provides an assembly space for various components.
[0031] The water tank 3 is assembled at the bottom of the cavity 11. The water tank 3 is used to store water required for the exhaust gas treatment process. In this embodiment, the interior of the water tank 3 is a single-compartment structure, and water circulation is achieved with the help of a filter. In other embodiments, it can also be set to a multi-compartment structure for separating clean water and sewage.
[0032] like Figure 1 As shown, a gas reactor 2 and a washing tower 4 are provided on the water tank 3. The top of the washing tower 4 is an exhaust end. The bottom of the washing tower 4 is connected to the top of the water tank 3. A water channel connected to the water tank 3 is provided inside the washing tower 4. The water channel further purifies the gas with the help of a spray system and finally discharges it.
[0033] The top of the gas reactor 2 is the input end, and the input end is provided with a plurality of air inlet pipes, which are respectively used to input the exhaust gas to be purified and the functional gas such as nitrogen that reacts with the exhaust gas to achieve the purification effect. It is a prior art, and its specific structure and working principle are not described here in detail. Those skilled in the art can select and implement it from the prior art according to the actual operation situation. A first disassembly body 21 is provided at the bottom of the gas reactor 2, and one side of the first disassembly body 21 forms a connecting structure with the bottom side wall of the washing tower 4 through a connecting pipe 5. During actual operation, the gas enters from the top of the gas reactor 2, and enters the bottom of the washing tower 4 along the connecting pipe 5 after descending, and is discharged after ascending.
[0034] It should be noted that the first disassembly body 21 is connected and assembled by means of a flange, a sealing ring and bolts, and its function is to facilitate the bottom disassembly of the gas reactor 2 during maintenance and to facilitate the cleaning and maintenance of the interior.
[0035] Furthermore, a conical cylinder structure with a small top and a large bottom is provided on the top of the gas reactor 2, and a uniform gas filtering module is provided inside the conical cylinder structure. The uniform gas filtering module includes a material basket 23, which is detachably connected to the inner wall of the gas reactor 2, and a filler 6 is provided inside the material basket 23.
[0036] Among them, combined Figure 2 The gas reactor 2 includes a variable diameter section 2a and a vertical section 2b distributed up and down. The variable diameter section 2a constitutes the conical cylinder structure. A fixed frame 22 is provided inside the variable diameter section 2a. The fixed frame 22 has a longitudinal hollow structure. The uniform gas filtering module is connected to the bottom of the fixed frame 22. When working, the gas can pass through the fixed frame 22 and the uniform gas filtering module. In the process of passing through the uniform gas filtering module, the gas will be evenly dispersed, so that the gas in each area can be fully mixed, which is conducive to improving the contact effect between the gases, thereby improving the reaction effect.
[0037] Further, such as Figure 3 As shown, the fixing frame 22 includes an outer ring 221 and an inner ring 222 which are arranged concentrically, and the two are connected into an integrated structure via a plurality of ribs 223 . A central hole 224 is provided at the center of the inner ring 222 , and the central hole 224 passes through the inner ring 222 longitudinally.
[0038] like Figure 2 As shown, the longitudinal section profile of the material basket 23 is a frustum shell structure, with a vertical mounting rod 24 provided at the center thereof. The mounting rod 24 has an external thread structure, and the mounting rod 24 passes through the middle hole 224 from bottom to top and is fixed by a nut. After installation, the outer periphery of the material basket 23 abuts against the inner wall of the reducing section 2a of the gas reactor 2 to form a clamping limit structure, which functions to cover the internal airflow path of the gas reactor 2, to break up the gas passing through, and to filter and capture impurities contained in the gas.
[0039] In this embodiment, the fillers 6 are all multi-faceted hollow balls, which are prior art. The specific structure and working principle thereof are not described in detail here. Those skilled in the art can select and implement from the prior art according to the actual operation conditions. In other embodiments, a mixed filling method of multiple fillers 6 can also be adopted.
[0040] Furthermore, a second disassembly body 41 is provided at the bottom of the washing tower 4, and the connection position between the connecting pipe 5 and the washing tower 4 is located on the side wall of the second disassembly body 41. The structure and function of the second disassembly body 41 are similar to those of the first disassembly body 21.
[0041] Example 2: Based on Example 1, Figure 4 In this embodiment, a holding piece 25 is sleeved on the mounting rod 24, and the holding piece 25 is located at the top of the filling material 6 in the material basket 23, and the holding piece 25 has a plurality of longitudinal hollow structures. Specifically, in this embodiment, the holding piece 25 adopts a filter structure, and its function is to hold the filling material 6 from top to bottom, so that the filling material 6 is closely attached to each other and will not easily run around due to the impact of airflow, resulting in excessive local gaps and uneven resistance due to excessive local gaps.
[0042] Furthermore, the mounting rod 24 is provided with an elastic member 27 between the holding member 25 and the top of the material frame. The elastic member 27 is a tension spring. The elastic expansion direction of the elastic member 27 is parallel to the vertical direction. The function of the elastic member 27 is to provide a longitudinal elastic force for the holding member 25, so that it has a certain longitudinal elastic activity ability. Its structure can be adaptively adjusted according to the actual air intake volume during the specific implementation process. If the air volume is too large and the wind speed is too fast, the holding member 25 will be forced to move downward, further tightly squeeze the filler 6 below, so that the structure of the filler 6 is more stable, which can play the role of stabilizing and homogenizing the gas and can also slow down the flow and speed, ensuring that the gas reaction has enough time and space. If the air volume is small and the wind speed is slow, the elastic member 27 will drive the holding member 25 to move upward appropriately, so that the filler 6 is relatively loose and the gap becomes larger, which will reduce the wind resistance and make the air flow relatively smooth without causing blockage and retention.
[0043] In other embodiments, a plurality of height-adjustable feet are provided at the bottom of the cabinet 1 to facilitate horizontal correction or slight adjustment of the installation height when assembling the equipment.
[0044] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims
1. A semiconductor process waste gas treatment system, characterized in that: The invention comprises a cabinet (1), wherein a cavity (11) is provided inside the cabinet (1), a water tank (3) is provided at the bottom of the cavity (11), a gas reactor (2) and a washing tower (4) are provided on the water tank (3), the top of the washing tower (4) is an exhaust end, the bottom of the washing tower (4) is connected to the top of the water tank (3), and a water channel connected to the water tank (3) is provided inside the washing tower (4), the top of the gas reactor (2) is an input end, and a first detachable body (21) is provided at the bottom, and one side of the first detachable body (21) forms a connecting structure with the bottom side wall of the washing tower (4) through a connecting pipe (5), the top of the gas reactor (2) is provided with a cone structure with a small top and a large bottom, and a uniform gas filtering module is provided inside the cone structure, and the uniform gas filtering module comprises a material basket (23), the material basket (23) is detachably connected to the inner side wall of the gas reactor (2), and a filling material (6) is provided inside the material basket (23).
2. A semiconductor process waste gas treatment system according to claim 1, characterized in that: The gas reactor (2) comprises a variable diameter section (2a) and a vertical section (2b) distributed up and down, the variable diameter section (2a) constituting the conical cylinder structure, a fixing frame (22) being arranged inside the variable diameter section (2a), the fixing frame (22) having a longitudinal hollow structure, and the uniform gas filtering module being connected below the fixing frame (22).
3. A semiconductor process waste gas treatment system according to claim 2, characterized in that: The fixing frame (22) comprises an outer ring (221) and an inner ring (222) which are arranged concentrically, and the two are connected to form an integrated structure via a plurality of ribs (223). A central hole (224) is provided at the center of the inner ring (222), and the central hole (224) penetrates the inner ring (222) longitudinally.
4. A semiconductor process waste gas treatment system according to claim 3, characterized in that: A vertical mounting rod (24) is provided at the center of the material basket (23). The mounting rod (24) has an external thread structure. The mounting rod (24) passes through the middle hole (224) from bottom to top and is connected and fixed by a nut. After installation, the outer periphery of the material basket (23) abuts against the inner side wall of the variable diameter section (2a) of the gas reactor (2).
5. The semiconductor process waste gas treatment system according to claim 1, characterized in that: The filler (6) comprises polyhedral hollow spheres.
6. A semiconductor process waste gas treatment system according to claim 1, characterized in that: A second disassembly body (41) is provided at the bottom of the washing tower (4), and the connection position between the connecting pipe (5) and the washing tower (4) is located on the side wall of the second disassembly body (41).
7. A semiconductor process waste gas treatment system according to claim 4, characterized in that: A holding piece (25) is sleeved on the mounting rod (24), the holding piece (25) is located on the top of the filling material (6) in the material basket (23), and the holding piece (25) has a plurality of longitudinal hollow structures.
8. A semiconductor process waste gas treatment system according to claim 7, characterized in that: The mounting rod (24) is provided with an elastic member (27) between the pressing member (25) and the top of the material frame, and the elastic expansion and contraction direction of the elastic member (27) is parallel to the vertical direction.
9. A semiconductor process waste gas treatment system according to claim 8, characterized in that: The elastic member (27) is a tension spring.
10. The semiconductor process waste gas treatment system according to claim 1, characterized in that: The bottom of the cabinet (1) is provided with a plurality of height-adjustable supporting feet.