Polishing rotary table and chemical mechanical polishing equipment

Abstract

The utility model discloses a polishing rotary table and chemical mechanical polishing equipment, and the polishing rotary table comprises a polishing disc, a first rotating shaft and a second rotating shaft, the polishing disc is provided with a cooling channel, and a cooling medium flows through the cooling channel so that the cooling medium can cool the polishing disc; the rotating assembly is rotatably arranged, the polishing disc is arranged on the rotating assembly, an inflow conveying channel and an outflow conveying channel which are communicated with the cooling channel are arranged in the rotating assembly, the inflow conveying channel is used for inputting the cooling medium into the cooling channel, and the outflow conveying channel is used for outputting the cooling medium into the rotating assembly. The outflow transmission channel is used for outputting the cooling medium after the polishing disc is cooled outwards; the inflow transmission channel and the outflow transmission channel are straight channels. The processing difficulty and leakage risk of the transmission channel can be reduced.

Description

Technical Field

[0001] The present application relates to the technical field of chemical mechanical polishing equipment, and in particular to a polishing turntable and chemical mechanical polishing equipment. Background Art

[0002] Chemical Mechanical Polishing (CMP) is an important part of the wafer manufacturing process. In the related art, chemical mechanical polishing equipment usually includes a polishing turntable and a polishing head, wherein the polishing turntable usually includes a rotatable rotating component, a polishing disk arranged on the rotating component, and a polishing pad is arranged on the polishing disk. During polishing, the polishing head presses the wafer against the polishing pad, and the relative movement between the wafer and the polishing pad in the polishing liquid, that is, under the joint action of chemistry and mechanics, can achieve global flattening of the wafer.

[0003] During the polishing process, the polishing disc generates heat, and since this heat will affect the chemical reaction of the polishing liquid to a certain extent, this heat will affect the polishing quality. In the related art, in order to cool the polishing disc, a cooling channel is usually provided in the polishing disc, and a transmission channel connected to the cooling channel is usually provided in the rotating assembly, so as to provide cooling liquid to the cooling channel in the polishing disc to cool the polishing disc.

[0004] In the related art, since the transmission channel in the rotating component usually includes several 90° changes in direction, in order to facilitate the processing of the transmission channel, a side opening is also opened on the rotating component, and the side opening is blocked after the processing is completed.

[0005] However, there are problems. On the one hand, several 90° changes in direction will make the transmission channel inconvenient to process, which will make the processing of the transmission channel more difficult; on the other hand, there is a risk of leakage in the blocked side openings, which will lead to a greater risk of leakage in the transmission channel. Utility Model Content

[0006] In view of the above-mentioned deficiencies in the related art, the present application provides a polishing turntable and a chemical mechanical polishing device to solve the problems of difficulty in processing the transmission channel and high risk of leakage in the related art.

[0007] In order to solve the above technical problems, in a first aspect, the present application provides a polishing turntable, which comprises:

[0008] A polishing disc, wherein a cooling channel is provided on the polishing disc, and a cooling medium flows through the cooling channel so that the cooling medium cools the polishing disc;

[0009] A rotating assembly, wherein the rotating assembly is rotatably arranged, the polishing disc is arranged on the rotating assembly, and an inflow transmission channel and an outflow transmission channel connected with the cooling channel are arranged in the rotating assembly, the inflow transmission channel is used to input the cooling medium into the cooling channel, and the outflow transmission channel is used to output the cooling medium after cooling the polishing disc to the outside;

[0010] The inflow transmission channel and the outflow transmission channel are both straight channels.

[0011] In a possible implementation of the first aspect, the rotating assembly includes a core shaft, the core shaft is connected to the polishing disk, the inflow transmission channel includes a core shaft inflow channel section disposed in the core shaft, and the outflow transmission channel includes a core shaft outflow channel section disposed in the core shaft.

[0012] In a possible implementation of the first aspect, a first end seal is provided between the core shaft and the polishing disk for sealingly connecting the two, and a first connecting structure is provided on the first end seal, and the first connecting structure is used to connect the cooling channel with the core shaft inflow channel section and the core shaft outflow channel section.

[0013] In a possible implementation of the first aspect, the polishing turntable further includes a turntable seat, and the rotating assembly further includes a support member connected to the core shaft and the polishing disk, and the support member is rotatably disposed on the turntable seat.

[0014] In a possible implementation of the first aspect, the support member includes a support ring, a fixed disk and a connecting structure, the polishing disk, the support ring, the fixed disk and the core shaft are coaxially arranged, the polishing disk is arranged on one side of the support ring, the fixed disk is spaced apart in the axial direction of the core shaft on the side of the support ring away from the polishing disk, the connecting structure is connected between the circumference of the support ring and the fixed disk, and the core shaft is connected to the fixed disk.

[0015] In a possible implementation of the first aspect, the mandrel includes a first shaft segment and a second shaft segment disposed on both sides of the fixed disk in its axial direction, two axial ends of the first shaft segment are respectively connected to the fixed disk and the polishing disk, and one axial end of the second shaft segment is connected to the fixed disk;

[0016] The mandrel inflow channel section includes a first inflow channel section disposed in the first shaft section, a second inflow channel section disposed in the second shaft section, and the mandrel outflow channel section includes a first outflow channel section disposed in the first shaft section, a second outflow channel section disposed in the second shaft section; the inflow transmission channel also includes a third inflow channel section disposed in the fixed disk, and the outflow transmission channel also includes a third outflow channel section disposed in the fixed disk;

[0017] The second inflow channel section, the third inflow channel section, the first inflow channel section and the cooling channel are connected in sequence to allow the cooling medium to flow into the polishing disk; the cooling channel, the first outflow channel section, the third outflow channel section and the second outflow channel section are connected in sequence to allow the cooling medium to flow out after cooling the polishing disk.

[0018] In a possible implementation of the first aspect,

[0019] A first middle seal is provided between the first shaft section and the fixed disk for sealingly connecting the two, and a second communication structure is provided on the first middle seal, and the second communication structure is used to connect the first inflow channel section with the third inflow channel section, and to connect the first outflow channel section with the third outflow channel section;

[0020] and / or,

[0021] A second middle seal is arranged between the second shaft section and the fixed disk for sealingly connecting the two. A third connecting structure is arranged on the second middle seal. The third connecting structure is used to connect the second inflow channel section with the third inflow channel section and connect the second outflow channel section with the third outflow channel section.

[0022] In a possible implementation of the first aspect,

[0023] The polishing turntable further comprises a rotary joint connected to the other axial end of the second shaft segment, wherein a fourth inflow channel segment and a fourth outflow channel segment are arranged in the rotary joint, wherein the fourth inflow channel segment is communicated with the second inflow channel segment, and the fourth outflow channel segment is communicated with the second outflow channel segment;

[0024] The rotary joint is also provided with a first inlet connected to the fourth inlet channel section and a first outlet connected to the fourth outlet channel section. The first inlet is for the cooling medium to flow into the fourth inlet channel section and the inlet transmission channel, and the first outlet is for the cooling medium after cooling the polishing disk to flow out of the outflow transmission channel and the fourth outflow channel section.

[0025] In a possible implementation of the first aspect, a second end seal is provided between the rotary joint and the second shaft segment for sealingly connecting the two, and a fourth connecting structure is provided on the second end seal. The fourth connecting structure is used to connect the fourth inflow channel segment with the second inflow channel segment and to connect the fourth outflow channel segment with the second outflow channel segment.

[0026] In a second aspect, the present application further provides a chemical mechanical polishing device, the chemical mechanical polishing device comprising:

[0027] The polishing turntable described in any one of the first aspects.

[0028] Compared with the related art, this application has at least the following beneficial effects:

[0029] In the present application, since a cooling channel is provided on the polishing disc, and since an inflow transmission channel and an outflow transmission channel connected to the cooling channel are provided in the rotating assembly, on the one hand, a cooling medium can be input into the cooling channel through the inflow transmission channel, and then the polishing disc can be cooled by the cooling medium, which is beneficial to avoid the heat generated by the polishing disc affecting the polishing quality; on the other hand, the cooling medium in the cooling channel after cooling the polishing disc can be discharged through the outflow transmission channel, so that the inflow transmission channel can continue to input cooling medium into the cooling channel, which is beneficial to ensure the cooling effect of the polishing disc.

[0030] Furthermore, since both the inflow transmission channel and the outflow transmission channel are straight channels, compared with the related art, the present application, on the one hand, can simplify the structure of the transmission channel in the rotating assembly, which is conducive to facilitating the processing of the transmission channel in the rotating assembly, thereby helping to reduce the processing difficulty of the transmission channel in the rotating assembly; on the other hand, since both the inflow transmission channel and the outflow transmission channel do not have several 90° changes in direction, there is no need to make side openings on the rotating assembly, and there is no risk of leakage from the blocked side openings, which is conducive to reducing the risk of leakage in the transmission channel in the rotating assembly. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0032] Figure 1 A cross-sectional view of a polishing turntable provided in an embodiment of the present application;

[0033] Figure 2 A cross-sectional view of a partial structure of a polishing turntable provided in an embodiment of the present application;

[0034] Figure 3 for Figure 1 The enlarged view of point A in the middle;

[0035] Figure 4 A schematic diagram of a chemical mechanical polishing device provided in an embodiment of the present application.

[0036] Description of reference numerals:

[0037] 1-Turntable seat;

[0038] 2- Polishing disc;

[0039] 3-driving member; 31-stator; 32-rotor;

[0040] 4-rotating assembly; 41-inflow transmission channel; 411-mandrel inflow channel section; 4111-first inflow channel section; 4112-second inflow channel section; 412-third inflow channel section; 42-outflow transmission channel; 421-mandrel outflow channel section; 4211-first outflow channel section; 4212-second outflow channel section; 422-third outflow channel section; 43-support member; 431-support ring; 432-fixed disk; 433-connecting structure; 44-mandrel; 441-first shaft section; 442-second shaft section;

[0041] 5-first end seal; 6-first middle seal; 7-second middle seal; 8-second end seal;

[0042] 9-rotating joint; 91-fourth inflow channel section; 92-fourth outflow channel section; 93-first inlet; 94-first outlet;

[0043] 100-Polishing turntable. DETAILED DESCRIPTION

[0044] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0045] In the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0046] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0047] In addition, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0048] In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0049] As described in the background technology of this application, in the related art, chemical mechanical polishing (CMP) is an important part of the wafer manufacturing process. In the related art, the chemical mechanical polishing equipment usually includes a polishing turntable and a polishing head, wherein the polishing turntable usually includes a rotatable rotating component, a polishing disk arranged on the rotating component, and a polishing pad is arranged on the polishing disk. During polishing, the polishing head presses the wafer against the polishing pad, and the relative movement between the wafer and the polishing pad in the polishing liquid, that is, under the joint action of chemistry and mechanics, can achieve global flattening of the wafer.

[0050] During the polishing process, the polishing disc generates heat, and since this heat will affect the chemical reaction of the polishing liquid to a certain extent, this heat will affect the polishing quality. In the related art, in order to cool the polishing disc, a cooling channel is usually provided in the polishing disc, and a transmission channel connected to the cooling channel is usually provided in the rotating assembly, so as to provide cooling liquid to the cooling channel in the polishing disc to cool the polishing disc.

[0051] In the related art, since the transmission channel in the rotating component usually includes several 90° changes in direction, in order to facilitate the processing of the transmission channel, a side opening is also opened on the rotating component, and the side opening is blocked after the processing is completed.

[0052] However, there are problems. On the one hand, several 90° changes in direction will make the transmission channel inconvenient to process, which will make the processing of the transmission channel more difficult; on the other hand, there is a risk of leakage in the blocked side openings, which will lead to a greater risk of leakage in the transmission channel.

[0053] Embodiment 1

[0054] In view of the above-mentioned problems, the present application provides a polishing turntable to solve the problems of difficulty in processing the transmission channel and high risk of leakage in the related art.

[0055] The technical solution of the present application will be further described below in conjunction with specific embodiments and drawings:

[0056] like Figure 1 As shown, the polishing turntable 100 includes a polishing disc 2 and a rotating assembly 4. The polishing disc 2 is provided with a cooling channel, through which a cooling medium flows, so that the cooling medium cools the polishing disc 2. The rotating assembly 4 is rotatably provided, the polishing disc 2 is provided on the rotating assembly 4, and an inflow transmission channel 41 and an outflow transmission channel 42 connected to the cooling channel are provided in the rotating assembly 4. The inflow transmission channel 41 is used to input the cooling medium into the cooling channel, and the outflow transmission channel 42 is used to output the cooling medium after cooling the polishing disc 2, and both the inflow transmission channel 41 and the outflow transmission channel 42 are straight channels.

[0057] In the present application, since a cooling channel is provided on the polishing disk 2, and since an inflow transmission channel 41 and an outflow transmission channel 42 connected to the cooling channel are provided in the rotating component 4, on the one hand, a cooling medium can be input into the cooling channel through the inflow transmission channel 41, and then the polishing disk 2 can be cooled by the cooling medium, which is beneficial to avoid the heat generated by the polishing disk 2 affecting the polishing quality; on the other hand, the cooling medium after cooling the polishing disk 2 in the cooling channel can be discharged through the outflow transmission channel 42, so that the inflow transmission channel 41 can continue to input cooling medium into the cooling channel, which is beneficial to ensure the cooling effect on the polishing disk 2.

[0058] Furthermore, since both the inflow transmission channel 41 and the outflow transmission channel 42 are straight channels, compared with the related art, the present application, on the one hand, can simplify the structure of the transmission channel in the rotating component 4, which is conducive to facilitating the processing of the transmission channel in the rotating component 4, thereby helping to reduce the processing difficulty of the transmission channel in the rotating component 4; on the other hand, since both the inflow transmission channel 41 and the outflow transmission channel 42 do not have several 90° changes in direction, there is no need to make side openings on the rotating component 4, and there is no risk of leakage from the blocked side openings, which is conducive to reducing the risk of leakage of the transmission channel in the rotating component 4.

[0059] Regarding the setting of the cooling channel on the polishing disk 2, in the embodiment of the present application, the cooling channel can be arranged inside the polishing disk 2, and can also be composed of a cooling pipeline arranged outside the polishing disk 2. The setting method of the cooling channel on the polishing disk 2 is relatively flexible, and the embodiment of the present application does not make specific limitations on this.

[0060] Regarding the cooling medium, in the embodiments of the present application, the cooling medium may be a cooling liquid or a cooling gas. The type of cooling medium is relatively flexible and is not specifically limited in the embodiments of the present application.

[0061] For the rotating assembly 4, further, as Figure 1 As shown, the rotating assembly 4 includes a spindle 44, and the spindle 44 is connected to the polishing disc 2, as shown in FIG. Figure 2 As shown, the inflow transmission channel 41 includes a core shaft inflow channel section 411 disposed inside the core shaft 44 , and the outflow transmission channel 42 includes a core shaft outflow channel section 421 disposed inside the core shaft 44 .

[0062] Arranging a core shaft inflow channel section 411 and a core shaft outflow channel section 421 in the core shaft 44 is beneficial to the integrated setting of the inflow transmission channel 41 and the outflow transmission channel 42, which is beneficial to reducing the additional complex channel setting, making the structure of the inflow transmission channel 41 and the outflow transmission channel 42 more simple and compact, and thus helping to save space.

[0063] Furthermore, if Figure 1 As shown, a first end seal 5 is provided between the core shaft 44 and the polishing disk 2 for sealingly connecting the two, and a first connecting structure is provided on the first end seal 5, and the first connecting structure is used to connect the cooling channel with the core shaft inflow channel section 411 and the core shaft outflow channel section 421.

[0064] Such arrangement can not only prevent the cooling medium from leaking from the connection position between the core shaft 44 and the polishing disk 2 through the first end seal 5, but also ensure the connection between the cooling channel and the core shaft inlet channel section 411 and the core shaft outlet channel section 421 through the first connecting structure on the first end seal 5.

[0065] like Figure 1 As shown, the polishing turntable 100 further includes a turntable seat 1 , and the rotating assembly 4 further includes a supporting member 43 connected to the core shaft 44 and the polishing disc 2 , and the supporting member 43 is rotatably disposed on the turntable seat 1 .

[0066] Such arrangement facilitates the rotatable arrangement of the polishing disc 2 through the support member 43 , and at the same time, through the cooperation between the support member 43 and the turntable seat 1 , the polishing disc 2 can be rotated more stably, thereby facilitating the quality of the polishing process.

[0067] like Figure 1As shown, the polishing turntable 100 further includes a driving member 3, which includes a stator 31 and a rotor 32, wherein the stator 31 is disposed on the turntable seat 1, and the rotor 32 is disposed on the support member 43, so that the driving member 3 can drive the spindle 44 and the polishing disc 2 to rotate by driving the support member 43 to rotate, that is, the rotating assembly 4 can be driven to rotate by the driving member 3. Such a configuration not only enables the driving member 3 to have a relatively simple structure, but also enables the driving member 3 to be stable and reliable, and also facilitates the rotation of the rotating assembly 4.

[0068] For the support member 43, further, as Figure 1 As shown, the support member 43 includes a support ring 431, a fixed disk 432 and a connecting structure 433. The polishing disk 2, the support ring 431, the fixed disk 432 and the core shaft 44 are coaxially arranged. The polishing disk 2 is arranged on one side of the support ring 431. The fixed disk 432 is spaced apart in the axial direction of the core shaft 44 on the side of the support ring 431 away from the polishing disk 2. The connecting structure 433 is connected between the support ring 431 and the fixed disk 432 in the circumferential direction. The core shaft 44 is connected to the fixed disk 432.

[0069] Such arrangement, on the one hand, is conducive to reducing the weight of the support member 43 to a certain extent, is conducive to realizing the lightweight design of the support member 43, and is conducive to realizing the lightweight design of the rotating assembly 4; on the other hand, while realizing the lightweight of the support member 43, the support ring 431, the connecting structure 433 and the fixing plate 432 are sequentially arranged and connected along the axial direction of the core shaft 44, which is also conducive to ensuring the overall strength of the support member 43, and is conducive to ensuring the stability of the rotation of the support member 43. In addition, one end of the core shaft 44 is conveniently connected to the polishing plate 2 by passing through the inner ring of the support ring 431.

[0070] Regarding the connection structure 433, in the embodiment of the present application, the connection structure 433 can be a plurality of connection ribs arranged at intervals along the circumference of the support ring 431 and the fixed disk 432, or it can be a connection plate connected between the circumference of the support ring 431 and the fixed disk 432. The type of the connection structure 433 is relatively flexible, and the embodiment of the present application does not make specific limitations on this.

[0071] In other embodiments, the support member 43 only includes a support ring 431, and the core shaft 44 is fixed to the inner ring of the support ring 431. Such a configuration can not only realize a lightweight design of the support member 43, but also simplify the structure of the support member 43, which is conducive to facilitating the processing of the support member 43.

[0072] Furthermore, if Figure 1As shown, the core shaft 44 includes a first shaft segment 441 and a second shaft segment 442 which are arranged on both sides of the fixed disk 432 in its axial direction. The axial ends of the first shaft segment 441 are respectively connected to the fixed disk 432 and the polishing disk 2, and one axial end of the second shaft segment 442 is connected to the fixed disk 432.

[0073] like Figure 2 As shown, the mandrel inflow channel section 411 includes a first inflow channel section 4111 disposed in the first shaft section 441, and a second inflow channel section 4112 disposed in the second shaft section 442, and the mandrel outflow channel section 421 includes a first outflow channel section 4211 disposed in the first shaft section 441, and a second outflow channel section 4212 disposed in the second shaft section 442. The inflow transmission channel 41 also includes a third inflow channel section 412 disposed in the fixed disk 432, and the outflow transmission channel 42 also includes a third outflow channel section 422 disposed in the fixed disk 432.

[0074] The second inflow channel section 4112, the third inflow channel section 412, the first inflow channel section 4111 and the cooling channel are sequentially connected to allow the cooling medium to flow into the polishing plate 2. The cooling channel, the first outflow channel section 4211, the third outflow channel section 422 and the second outflow channel section 4212 are sequentially connected to allow the cooling medium to flow out after cooling the polishing plate 2.

[0075] With such arrangement, on the one hand, there is no need to provide a hole on the fixed disk 432 for the core shaft 44 to pass through, which is conducive to simplifying the structure of the fixed disk 432 and facilitating the processing of the fixed disk 432; on the other hand, through the contact between the axial end faces of the first shaft segment 441 and the second shaft segment 442 and the fixed disk 432, the connection contact area between the first shaft segment 441 and the second shaft segment 442 and the fixed disk 432 can be increased, which is conducive to enhancing the reliability of the connection between the first shaft segment 441 and the second shaft segment 442 and the fixed disk 432.

[0076] In addition, by arranging the third inflow channel section 412 and the third outflow channel section 422 on the fixed disk 432, it is convenient for the second inflow channel section 4112 and the first inflow channel section 4111 to be connected through the third inflow channel section 412, and it is also convenient for the first outflow channel section 4211 and the second outflow channel section 4212 to be connected through the third outflow channel section 422.

[0077] Furthermore, if Figure 3 As shown, a first middle seal 6 is provided between the first shaft section 441 and the fixed disk 432 for sealingly connecting the two, and a second communication structure is provided on the first middle seal 6, and the second communication structure is used to connect the first inflow channel section 4111 with the third inflow channel section 412, and to connect the first outflow channel section 4211 with the third outflow channel section 422. And / or, as Figure 3 As shown, a second middle seal 7 is provided between the second shaft section 442 and the fixed disk 432 for sealingly connecting the two, and a third connecting structure is provided on the second middle seal 7, and the third connecting structure is used to connect the second inflow channel section 4112 and the third inflow channel section 412, and to connect the second outflow channel section 4212 and the third outflow channel section 422.

[0078] In this configuration, not only can the first middle seal 6 be used to prevent the cooling medium from leaking from the connection position between the first shaft segment 441 and the fixed disk 432, but also the second communication structure on the first middle seal 6 can ensure the communication between the first inflow channel segment 4111 and the third inflow channel segment 412, and the communication between the first outflow channel segment 4211 and the third outflow channel segment 422. And / or, not only can the second middle seal 7 be used to prevent the cooling medium from leaking from the connection position between the second shaft segment 442 and the fixed disk 432, but also the third communication structure on the second middle seal 7 can ensure the communication between the second inflow channel segment 4112 and the third inflow channel segment 412, and the communication between the second outflow channel segment 4212 and the third outflow channel segment 422.

[0079] like Figure 1 and Figure 2 As shown, the polishing turntable 100 also includes a rotary joint 9 connected to the other axial end of the second shaft segment 442, and a fourth inlet channel segment 91 and a fourth outflow channel segment 92 are provided in the rotary joint 9, wherein the fourth inlet channel segment 91 is connected to the second inlet channel segment 4112, and the fourth outflow channel segment 92 is connected to the second outflow channel segment 4212.

[0080] like Figure 1 and Figure 2 As shown, the rotary joint 9 is also provided with a first inlet 93 connected to the fourth inlet channel section 91 and a first outlet 94 connected to the fourth outflow channel section 92. The first inlet 93 is for the cooling medium to flow into the fourth inflow channel section 91 and into the transmission channel 41, and the first outlet 94 is for the cooling medium after cooling the polishing disk 2 to flow out of the outflow transmission channel 42 and the fourth outflow channel section 92.

[0081] In this arrangement, since the first inlet 93 and the first outlet 94 can be used to connect to an external pipeline, the provision of the rotary joint 9 and the first inlet 93 and the first outlet 94 facilitates the connection of the fourth inlet channel segment 91 and the inlet transmission channel 41 with the external pipeline, and the connection of the outflow transmission channel 42 and the fourth outflow channel segment 92 with the external pipeline.

[0082] As for the rotary joint 9, the rotary joint 9 includes a rotating part and a fixed part (not shown in the figure), wherein the rotating part is connected to the other axial end of the second shaft segment 442, and is used to rotate with the second shaft segment 442, the fixed part is fixedly arranged, the first inlet 93 and the first outlet 94 are both arranged in the fixed part, and a part of the fourth inflow channel segment 91 and the fourth outflow channel segment 92 are both arranged in the fixed part, and the other part is arranged in the rotating part. Since the rotary joint 9 is a prior art, the detailed structure of the rotary joint 9 is not elaborated in detail in the embodiment of the present application.

[0083] Furthermore, if Figure 3 As shown, a second end seal 8 is arranged between the rotary joint 9 and the second shaft section 442 for sealingly connecting the two, and a fourth connecting structure is arranged on the second end seal 8, and the fourth connecting structure is used to connect the fourth inflow channel section 91 with the second inflow channel section 4112, and to connect the fourth outflow channel section 92 with the second outflow channel section 4212.

[0084] Such arrangement can not only prevent the cooling medium from leaking from the connection position between the rotary joint 9 and the second shaft segment 442 through the second end seal 8, but also ensure the connection between the fourth inflow channel segment 91 and the second inflow channel segment 4112, and the connection between the fourth outflow channel segment 92 and the second outflow channel segment 4212 through the fourth connecting structure on the second end seal 8.

[0085] In the embodiment of the present application, the first end seal 5, the first middle seal 6, the second middle seal 7 and the second end seal 8 can all be any one of a rubber seal, a polyurethane seal and a polytetrafluoroethylene seal, and the embodiment of the present application does not make any specific limitation on this.

[0086] In the embodiment of the present application, the first connecting structure, the second connecting structure, the third connecting structure and the fourth connecting structure can all be avoidance holes or mesh structures, and the embodiment of the present application does not make specific limitations on this.

[0087] Embodiment 2

[0088] The present application also provides a chemical mechanical polishing device, such as Figure 4 As shown, the chemical mechanical polishing equipment includes a polishing turntable 100, which has the same structure as any of the polishing turntables 100 in the above embodiments and can bring the same or similar beneficial effects. For details, please refer to the description in the above embodiments, and this embodiment will not be repeated here.

[0089] In the present application, since both the inflow transmission channel 41 and the outflow transmission channel 42 are straight channels, compared with the related art, on the one hand, such a setting can simplify the structure of the transmission channel in the rotating component 4, which is conducive to facilitating the processing of the transmission channel in the rotating component 4, and thus helps to reduce the processing difficulty of the transmission channel in the rotating component 4; on the other hand, such a setting, since both the inflow transmission channel 41 and the outflow transmission channel 42 do not have several 90° changes in direction, there is no need to make side openings on the rotating component 4, and there is no risk of leakage from the blocked side openings, which helps to reduce the risk of leakage of the transmission channel in the rotating component 4.

[0090] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A polishing turntable, characterized in that: include: A polishing disc, wherein a cooling channel is provided on the polishing disc, and a cooling medium flows through the cooling channel so that the cooling medium cools the polishing disc; A rotating assembly, wherein the rotating assembly is rotatably arranged, the polishing disc is arranged on the rotating assembly, and an inflow transmission channel and an outflow transmission channel connected with the cooling channel are arranged in the rotating assembly, the inflow transmission channel is used to input the cooling medium into the cooling channel, and the outflow transmission channel is used to output the cooling medium after cooling the polishing disc to the outside; The inflow transmission channel and the outflow transmission channel are both straight channels.

2. The polishing turntable according to claim 1, characterized in that: The rotating assembly includes a core shaft, the core shaft is connected to the polishing disk, the inflow transmission channel includes a core shaft inflow channel section disposed in the core shaft, and the outflow transmission channel includes a core shaft outflow channel section disposed in the core shaft.

3. The polishing turntable according to claim 2, characterized in that: A first end seal is provided between the core shaft and the polishing disk for sealingly connecting the two. A first connecting structure is provided on the first end seal for connecting the cooling channel with the core shaft inflow channel section and the core shaft outflow channel section.

4. The polishing turntable according to claim 2 or 3, characterized in that: The polishing turntable further includes a turntable seat, and the rotating assembly further includes a supporting member connected to the core shaft and the polishing disc, and the supporting member is rotatably disposed on the turntable seat.

5. The polishing turntable according to claim 4, characterized in that: The support member includes a support ring, a fixed disk and a connecting structure. The polishing disk, the support ring, the fixed disk and the core shaft are coaxially arranged. The polishing disk is arranged on one side of the support ring. The fixed disk is arranged at an interval on the side of the support ring away from the polishing disk in the axial direction of the core shaft. The connecting structure is connected between the support ring and the fixed disk in the circumferential direction. The core shaft is connected to the fixed disk.

6. The polishing turntable according to claim 5, characterized in that: The mandrel comprises a first shaft section and a second shaft section which are arranged on both sides of the fixed disk in the axial direction of the mandrel, the axial ends of the first shaft section are respectively connected to the fixed disk and the polishing disk, and one axial end of the second shaft section is connected to the fixed disk; The mandrel inflow channel section includes a first inflow channel section disposed in the first shaft section, a second inflow channel section disposed in the second shaft section, and the mandrel outflow channel section includes a first outflow channel section disposed in the first shaft section, a second outflow channel section disposed in the second shaft section; the inflow transmission channel also includes a third inflow channel section disposed in the fixed disk, and the outflow transmission channel also includes a third outflow channel section disposed in the fixed disk; The second inflow channel section, the third inflow channel section, the first inflow channel section and the cooling channel are connected in sequence to allow the cooling medium to flow into the polishing disk; the cooling channel, the first outflow channel section, the third outflow channel section and the second outflow channel section are connected in sequence to allow the cooling medium to flow out after cooling the polishing disk.

7. The polishing turntable according to claim 6, characterized in that: A first middle seal is provided between the first shaft section and the fixed disk for sealingly connecting the two, and a second communication structure is provided on the first middle seal, and the second communication structure is used to connect the first inflow channel section with the third inflow channel section, and to connect the first outflow channel section with the third outflow channel section; and / or, A second middle seal is arranged between the second shaft section and the fixed disk for sealingly connecting the two. A third connecting structure is arranged on the second middle seal. The third connecting structure is used to connect the second inflow channel section with the third inflow channel section and connect the second outflow channel section with the third outflow channel section.

8. The polishing turntable according to claim 6, characterized in that: The polishing turntable further comprises a rotary joint connected to the other axial end of the second shaft segment, wherein a fourth inflow channel segment and a fourth outflow channel segment are arranged in the rotary joint, wherein the fourth inflow channel segment is communicated with the second inflow channel segment, and the fourth outflow channel segment is communicated with the second outflow channel segment; The rotary joint is also provided with a first inlet connected to the fourth inlet channel section and a first outlet connected to the fourth outlet channel section. The first inlet is for the cooling medium to flow into the fourth inlet channel section and the inlet transmission channel, and the first outlet is for the cooling medium after cooling the polishing disk to flow out of the outflow transmission channel and the fourth outflow channel section.

9. The polishing turntable according to claim 8, characterized in that: A second end seal is provided between the rotary joint and the second shaft segment for sealingly connecting the two, and a fourth connecting structure is provided on the second end seal. The fourth connecting structure is used to connect the fourth inflow channel segment with the second inflow channel segment and to connect the fourth outflow channel segment with the second outflow channel segment.

10. A chemical mechanical polishing device, characterized in that: include: The polishing turntable according to any one of claims 1 to 9.

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