Vacuum coating machine

Abstract

The utility model discloses a vacuum coating machine. The vacuum coating machine comprises a coating chamber, a plasma generating assembly, at least two groups of light detection probes, a spectrograph and a controller, the coating chamber is provided with a to-be-coated position and a coating conveying line in the first direction, and the coating conveying line passes through the to-be-coated position so as to convey a substrate to pass through the to-be-coated position and coat the surface of the substrate; the plasma generation assembly communicates with the coating chamber and is provided with a plasma flow channel facing the position to be coated in the second direction, and the plasma flow channel forms a coating area in the third direction at the position to be coated; the at least two groups of light detection probes are distributed at intervals along a third direction and are used for detecting mixed glow emitted by the plasma in the plasma flow channel; the spectrograph is optically connected to the optical detection probe and is used for obtaining spectral data according to the mixed glow; and the controller is electrically connected to the spectrograph and is used for receiving and processing the spectral data and obtaining the plasma composition proportion.

Description

Technical Field

[0001] The utility model relates to the technical field of plasma coating, in particular to a vacuum coating machine. Background Art

[0002] The principle of RPD vacuum coating equipment (reactive plasma coating equipment) is to use magnetron technology to converge the plasma beam on the surface of the solid target ingot in the center of the furnace. The sublimated target particles will be highly dissociated in the plasma area, and then combined with most of the plasma to form a thin film on the substrate surface. Currently, most of the films coated are transparent conductive materials (TCO). The requirements for the deposited films are high penetration, low square resistance and high carrier mobility. The goal is to maintain the uniformity of various film indicators when coating a large area.

[0003] RPD vacuum coating equipment has a long target-substrate distance, and the reaction gas is spread from the gas distribution pipe to the entire coating chamber for reaction. Since the ionized gas is affected by the magnetic field, the various reaction plasma gases will have different concentration distributions when projected onto the substrate, resulting in differences in the surface resistance, transmittance and mobility of the deposited film. The uniformity of the coating width is difficult to compensate in time through process or hardware adjustments. Utility Model Content

[0004] The utility model aims to solve the problems existing in the above-mentioned prior art and proposes a vacuum coating machine to realize real-time detection of plasma distribution on the coating surface and improve regulation efficiency.

[0005] According to a first embodiment of the present invention, a vacuum coating machine is provided, comprising:

[0006] The coating chamber is provided with a coating position and a coating conveying line along a first direction, wherein the coating conveying line passes through the coating position to convey the substrate through the coating position and coats the surface of the substrate;

[0007] A plasma generating assembly is connected to the coating chamber and is provided with a plasma flow channel along a second direction toward the position to be coated, wherein the plasma flow channel forms a coating area along a third direction at the position to be coated, and the first direction, the second direction and the third direction intersect with each other;

[0008] At least two groups of light detection probes are spaced apart along the third direction, and different light detection probes are oriented to different positions of the plasma flow channel along the third direction, and the light detection probes are used to detect mixed glow emitted by the plasma in the plasma flow channel;

[0009] a spectrometer, optically connected to the light detection probe, for obtaining spectral data according to the mixed glow;

[0010] The controller is electrically connected to the spectrometer and is used for receiving and processing the spectrum data sent by the spectrometer to obtain the plasma composition ratios at different positions of the plasma flow channel along the third direction.

[0011] The vacuum coating machine proposed in the above-mentioned embodiment of the utility model has at least the following beneficial effects: the light detection probe is arranged toward the plasma flow channel, and the glow emitted by the plasma in the plasma flow channel is directly detected, and the glow is transmitted to the spectrometer, the spectrometer analyzes and obtains the spectral data of different plasmas, and then processes the spectral data of different plasmas through the controller to obtain the plasma composition ratios of different plasmas, two or more groups of light detection probes detect different positions of the plasma flow channel along the third direction, and obtain the plasma composition ratios at different positions of the plasma flow channel along the third direction, as well as the plasma distribution at different positions of the coating area along the third direction, so as to realize real-time monitoring of the plasma distribution. When debugging the vacuum coating machine, the parameters can be adjusted according to the plasma distribution to make the plasma distribution more uniform, and after adjusting the parameters, the adjusted plasma distribution can be directly understood. When the plasma distribution does not meet the preset requirements, the adjustment can be continued directly until the plasma distribution is uniform, thereby improving the adjustment efficiency and adjustment accuracy.

[0012] According to some embodiments of the present invention, the plasma generating assembly includes a generating chamber connected to the coating chamber, part of the plasma flow channel is located in the generating chamber, and the light detection probe is arranged in the generating chamber; or the light detection probe is arranged in the coating chamber and is located between the position to be coated and the side of the coating chamber connected to the plasma generating assembly.

[0013] According to some embodiments of the present invention, the plasma flow channel includes a sublimation zone and a deposition zone along the second direction, and the light detection probe is arranged toward the deposition zone.

[0014] According to some embodiments of the present invention, the plasma flow channel includes a sublimation zone, a dissociation zone and a deposition zone along the second direction, and the light detection probe is arranged toward the dissociation zone and / or the deposition zone.

[0015] According to some embodiments of the present invention, at least two groups of light detection probes are further included, and the light detection probes are spaced apart and distributed along the second direction.

[0016] According to some embodiments of the present invention, the first direction, the second direction and the third direction are perpendicular to each other.

[0017] According to some embodiments of the present invention, the light detection probe is perpendicular to the plasma flow channel.

[0018] According to some embodiments of the utility model, the optical detection probe includes an incident probe and a receiving probe relative to the incident probe, the plasma flow channel is between the incident probe and the receiving probe, and the receiving probe is optically connected to the spectrometer.

[0019] According to some embodiments of the present invention, the light detection probe includes a reflection probe for receiving reflected light.

[0020] According to some embodiments of the present invention, the light detection probe further includes a light absorber relative to the reflection probe or a reflector relative to the reflection probe.

[0021] According to some embodiments of the present invention, the controller is further configured to: when the detected plasma composition ratio is outside a preset range, control the plasma generating component so that the plasma composition ratio in the plasma flow channel is within a preset range.

[0022] According to some embodiments of the present utility model, the plasma generating assembly includes a main power supply, a plasma generating source, a beam guide, a thickness compensation plate, a gas source and a generating chamber;

[0023] The controller controls the plasma generating assembly so that the plasma composition ratio in the plasma flow channel is within a preset range, including controlling at least one of the following parameters:

[0024] The current of the main power supply;

[0025] The current of the beam expansion electromagnet coil of the plasma generating source;

[0026] The current of the deflection electromagnet coil of the plasma generating source;

[0027] Argon gas flux of plasma source;

[0028] The location of the beam guide;

[0029] The amount of current in the electromagnet coil of the beam guide;

[0030] The location of the thickness compensation plate;

[0031] The ventilation composition ratio of the gas source;

[0032] Total ventilation pressure of the gas source;

[0033] Ventilation location of the gas source;

[0034] The wall temperature of the generating chamber.

[0035] According to a second embodiment of the present invention, a vacuum coating machine is provided, comprising:

[0036] The coating chamber is provided with a coating position for coating a stationary substrate or a rotating substrate;

[0037] A plasma generating assembly is connected to the coating chamber and is provided with a plasma flow channel along a second direction toward the location to be coated;

[0038] At least two groups of light detection probes are spaced apart along a fourth direction, and different light detection probes are oriented toward different positions of the plasma flow channel along the fourth direction, and the light detection probes are used to detect mixed glow emitted by the plasma in the plasma flow channel;

[0039] A spectrometer, optically connected to the light detection probe, to decompose the mixed glow and convert it into spectral data;

[0040] The controller is electrically connected to the spectrometer and is used for receiving and processing the spectrum data sent by the spectrometer to obtain the plasma composition ratios at different positions of the plasma flow channel along the fourth direction.

[0041] The vacuum coating machine proposed in the second embodiment of the utility model has at least the following beneficial effects: the light detection probe is arranged toward the plasma flow channel, and the glow emitted by the plasma in the plasma flow channel is directly detected, and the glow is transmitted to the spectrometer, the spectrometer analyzes and obtains the spectral data of different plasmas, and then the plasma composition ratios of the different plasmas are obtained through processing by the controller, two or more groups of light detection probes detect different positions of the plasma flow channel along the fourth direction, and obtain the plasma composition ratios at different positions of the plasma flow channel along the fourth direction, as well as the plasma distribution at different positions of the coating area along the fourth direction, so as to realize real-time monitoring of the plasma distribution. When debugging the vacuum coating machine, the parameters can be adjusted according to the plasma distribution to make the plasma distribution more uniform, and after adjusting the parameters, the adjusted plasma distribution can be directly understood. When the plasma distribution does not meet the preset requirements, the adjustment can be continued directly until the plasma distribution is uniform, thereby improving the adjustment efficiency and adjustment accuracy.

[0042] The debugging method of the vacuum coating machine described in the first embodiment of the utility model includes the following specific steps:

[0043] S1: starting the vacuum coating machine described in the first embodiment;

[0044] S2: different light detection probes detect the glow at different positions in the plasma flow channel along the third direction, and the spectrometer receives the mixed glow detected by the light detection probes to detect the plasma composition ratio at different positions of the plasma flow channel;

[0045] S3: If the plasma composition ratios at different positions are different, the equipment parameters of the vacuum coating machine are adjusted, and S2 is repeated until the measured plasma composition ratio difference is less than or equal to the preset concentration difference.

[0046] The debugging method of the vacuum coating machine described in the second embodiment of the utility model includes the following specific steps:

[0047] S1: starting the vacuum coating machine described in the second embodiment;

[0048] S2: different light detection probes detect the glow at different positions in the plasma flow channel along the fourth direction, and the spectrometer receives the mixed glow detected by the light detection probes to detect the plasma composition ratio at different positions in the plasma flow channel;

[0049] S3: If the plasma composition ratios at different positions are different, the equipment parameters of the vacuum coating machine are adjusted, and S2 is repeated until the measured plasma composition ratio difference is less than or equal to the preset concentration difference.

[0050] By debugging the light detection probe, spectrometer and controller, the plasma distribution of the plasma flow channel along the third direction or the fourth direction can be directly known. According to the plasma distribution, the vacuum coating machine can be directly adjusted, and the adjusted plasma distribution can be fed back in real time. According to the adjusted plasma distribution, it can be adjusted again to improve the adjustment efficiency and accuracy.

[0051] According to some embodiments of the present invention, in S3, the equipment debugging parameters of the vacuum coating machine include at least one of the following parameters:

[0052] The conveying speed of the coating conveying line;

[0053] The potential of the carrier board carrying the substrate on the coating conveyor line;

[0054] The current of the main power supply;

[0055] The current of the beam expansion electromagnet coil of the plasma generating source;

[0056] The amount of current flowing through the deflection electromagnet coil of the plasma generating source;

[0057] The argon gas flux of the plasma generating source;

[0058] The location of the beam guide;

[0059] The amount of current in the electromagnet coil of the beam guide;

[0060] The location of the thickness compensation plate;

[0061] The shape of the thickness compensation plate;

[0062] The ventilation composition ratio of the gas source;

[0063] The total ventilation pressure of the gas source;

[0064] The ventilation position of the gas source;

[0065] The wall temperature of the generating chamber.

[0066] The vacuum coating machine according to the first embodiment or the second embodiment of the utility model can be used for RPD vacuum coating equipment, and the regulation efficiency and regulation accuracy of the RPD vacuum coating equipment are higher.

[0067] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0068] The present invention is further described below with reference to the accompanying drawings and embodiments, wherein:

[0069] Figure 1 This is a schematic diagram of the structure of a vacuum coating machine in an RPD device according to an embodiment of the utility model;

[0070] Figure 2 This is a schematic structural diagram of a vacuum coating machine in a magnetron sputtering coating device according to an embodiment of the utility model;

[0071] Figure 3 This is a schematic structural diagram of a vacuum coating machine in an evaporation coating device according to an embodiment of the utility model;

[0072] Figure 4 A schematic diagram of the three-dimensional structure of a vacuum coating machine in an RPD device according to an embodiment of the utility model;

[0073] Figure 5 This is a schematic diagram of the specific structure of a vacuum coating machine in an RPD device according to an embodiment of the utility model.

[0074] Figure Number:

[0075] Coating chamber 100; position to be coated 110; substrate 120; plasma generating assembly 200; plasma flow channel 210; sublimation zone 211; deposition zone 212; dissociation zone 213; generating chamber 220; thickness compensation plate 221; optical detection probe 300; spectrometer 400; target material 500; beam guide 510; plasma generating source 600; beam expansion electromagnet coil 610; deflection electromagnet coil 620. DETAILED DESCRIPTION

[0076] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0077] In the description of the present invention, it should be understood that the descriptions involving orientation, such as the orientation or positional relationship indicated as up, down, etc., are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0078] In the description of the present utility model, "several" refers to one or more, and "multiple" refers to two or more. If there is a description of "first" or "second", it is only for the purpose of distinguishing technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0079] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0080] In the multi-chamber RPD equipment, because there are multiple plasma channels 210 in the same plasma generating assembly 200, there is a certain interference between two adjacent plasma channels 210. Even if the film thickness of the substrate 120 after coating is consistent, there is still a problem of excessively high square resistance non-uniformity along the coating width direction. The non-uniformity of square resistance is caused by the uneven distribution of different plasmas, so it is necessary to detect the plasma distribution uniformity of the film layer. In the related art, the plasma uniformity detection method of the film layer is generally: first make a sample, then detect the square resistance of the sample, and then change the equipment parameters of the vacuum coating machine according to the test results to adjust the thickness and uniformity of the film layer on the sample. This detection method must be tested on the finished product after the finished product is produced, and then adjust the equipment according to the test results, and then re-make the finished product and test it to determine the debugging effect. This method of detection is costly and inefficient.

[0081] Reference Figures 1 to 5As shown, the first embodiment of the utility model proposes a vacuum coating machine, including: a coating chamber 100, a plasma generating assembly 200, at least two groups of light detection probes 300, a spectrometer 400 and a controller, the coating chamber 100 is provided with a position to be coated 110 and a coating conveying line along a first direction, the coating conveying line passes through the position to be coated 110 to convey a substrate 120 through the position to be coated 110, and coats the surface of the substrate 120; the plasma generating assembly 200 is connected to the coating chamber 100, and is provided with a plasma flow channel 210 along a second direction toward the position to be coated 110, and the plasma flow channel 210 forms a plasma flow channel along a third direction at the position to be coated 110. The coating area is formed in the first direction, the second direction and the third direction intersect with each other; at least two groups of light detection probes 300 are spaced apart along the third direction, different light detection probes 300 are oriented to different positions of the plasma channel 210 along the third direction, and the light detection probes 300 are used to detect the mixed glow emitted by the plasma in the plasma channel 210; the spectrometer 400 is optically connected to the light detection probes 300 to decompose the mixed glow and convert it into spectral data; the controller is electrically connected to the spectrometer 400, and is used to receive and process the spectral data emitted by the spectrometer 400 to obtain the plasma composition ratio at different positions of the plasma channel 210 along the third direction.

[0082] In this embodiment, the coating chamber 100 is generally arranged above the plasma generating assembly 200. Both the coating chamber 100 and the plasma generating assembly 200 are vacuumed. The coating chamber 100 conveys the substrate 120 through the coating conveying line. In a vacuum environment, the plasma generating assembly 200 generates coating plasma and constrains the coating plasma to form a plasma flow channel 210. The plasma flow channel 210 moves upward along the second direction to coat the bottom surface of the substrate 120.

[0083] The vacuum coating machine also includes a target material 500, through which plasma is generated for coating the surface of the substrate 120. The target material 500 can form a plasma flow channel 210 through heating and magnetic field control, or can form a plasma flow channel 210 through the impact of a plasma flow emitted by a plasma generating source 600. For ease of understanding, an example of a vacuum coating machine having a plasma source 600 and a target material 500 is given as follows: the plasma source 600 is disposed outside the plasma generating assembly 200 and is connected to the plasma generating assembly 200; the target material 500 is disposed in the plasma generating assembly 200; the target material 500 in the plasma generating assembly 200 is opposite to and spaced from the position to be coated 110 of the coating chamber 100; the target material 500 is located below the position to be coated 110; the plasma source 600 is disposed between the target material 500 and the position to be coated 110, and is disposed toward a plasma flow channel 210 between the target material 500 and the position to be coated 110; the electron beam emitted by the plasma source 600 hits the top surface of the target material 500 in a parabolic manner, and hits the surface of the target material 500; the target material particles on the surface of the target material 500 escape along a second direction to form a plasma flow channel 210 toward the position to be coated 110. The plasma source 600 can control the parabolic shape of the electron beam through a magnetic field, so that the electron beam can vertically hit the surface of the target 500. The plasma flow channel 210 formed after the target 500 is hit can also be controlled by a magnetic field, so that the plasma flow channel 210 spirals up along a second direction, and the second direction refers to the axial direction of the spiral rising direction of the plasma flow channel 210.

[0084] The top of the plasma flow channel 210 along the second direction is formed into an arc surface, and the arc surface is tangent to the bottom surface of the substrate 120 to form a strip-shaped coating area. During the movement of the substrate 120 along the first direction, the coating area passes through all surfaces of the substrate 120 to form a film layer, completing the coating of the substrate 120. For ease of understanding, the coating area can be understood as a line. During the movement of the substrate 120, the linear coating area passes through the bottom surface of the substrate 120 along the first direction and forms a film layer on the bottom surface of the substrate 120. In an ideal situation, the coating area seen on the bottom surface of the substrate 120 is strip-shaped. The third direction is the length direction of the coating area, and because the length of the coating area forms a plane along the first direction, the third direction is also called the coating width direction.

[0085] At least two groups of optical detection probes 300 are arranged in sequence along the third direction. The optical detection probes 300 face different positions of the plasma flow channel 210 along the third direction, that is, the optical detection probes 300 detect different positions of the coating area along the third direction. The optical detection probes 300 detect mixed glows emitted by different plasmas. The mixed glow includes: emission glows of argon, oxygen, hydrogen, indium or tin. The spectrometer 400 receives the mixed glow detected by the optical detection probes 300 and decomposes the mixed glow into separate glows, and then obtains spectral data according to the wavelengths of different glows. The controller processes the spectral data and displays it in a graphical form, so that the user can intuitively understand the content of various plasmas detected by the optical detection probes 300, and multiple different optical detection probes 300 will be able to know the distribution of various plasmas in the plasma flow channel 210 along the third direction, and then know the composition distribution of various plasmas when they reach the surface of the substrate 120, which is convenient for analyzing the uniformity of the film layer on the coating area.

[0086] After knowing the uniformity of the coating area, the user can know the values ​​of various plasma contents in the detection area by analyzing the data. When the content of a certain plasma is low, the equipment parameters of the vacuum coating machine are adjusted to make the plasma content at different positions meet the preset requirements. It should be noted that the distribution of plasma in the vacuum coating machine is affected by many factors, such as the amount of gas introduced, the amount of plasma generated by the plasma source 600, the angle at which the electron beam of the plasma source 600 hits the target 500, the magnetic field distribution of the plasma source 600, the magnetic field distribution of the target 500, the temperature of the target 500, the temperature in the plasma generating assembly 200, etc. When one or more of the parameters change, the distribution of various plasmas in the plasma flow channel 210 formed by the target 500 will change, and there is a correlation between different parameters. When a certain parameter changes, other parameters also need to be adjusted in a correlated manner. Therefore, the debugging of the vacuum coating machine is more suitable for the exhaustive method to obtain the best parameter range. The optimal adjustment parameter ranges of two vacuum coating machines of the same model are not necessarily the same, and each vacuum coating machine needs to be debugged according to the actual usage. Therefore, the utility model detects the various plasma distribution conditions in the plasma flow channel 210 in real time, and after the parameters of the vacuum coating machine are adjusted, the influence of the adjusted parameters on the various plasma distributions is known in real time, which is convenient for subsequent adjustment, thereby improving the parameter adjustment efficiency and adjustment accuracy of the vacuum coating machine, and being able to produce a more uniform film layer on the surface of the substrate 120.

[0087] In general, the utility model sets the light detection probe 300 toward the plasma flow channel 210, and directly detects the glow emitted by the plasma in the plasma flow channel 210, and transmits the glow to the spectrometer 400. The spectrometer 400 analyzes and obtains the spectral data of different plasmas, and then processes the spectral lines of different plasmas through the controller. According to the intensity comparison of the spectral lines, the plasma composition ratios of various plasmas are analyzed. Two or more groups of light detection probes 300 detect different positions of the plasma flow channel 210 along the third direction to obtain various plasma composition ratios at different positions of the plasma flow channel 210 along the third direction, and various plasma distribution conditions at different positions of the coating area along the third direction, so as to realize real-time monitoring of various plasma distribution conditions. When debugging the vacuum coating machine, parameters can be adjusted according to various plasma distribution conditions, so that the uniformity of various plasma distributions is higher, and after adjusting the parameters, the various plasma distribution conditions after adjustment can be directly understood. When the various plasma distributions do not meet the preset requirements, they can be directly adjusted until the various plasma distributions are uniform, thereby improving the adjustment efficiency and adjustment accuracy.

[0088] Reference Figure 1 and Figure 4 As shown, in some specific embodiments of the present invention, the plasma generating assembly 200 includes a generating chamber 220 connected to the coating chamber 100 , the plasma flow channel 210 is located in the generating chamber 220 , and the light detection probe 300 is disposed in the plasma generating assembly 200 .

[0089] It is worth understanding that the plasma generating assembly 200 is used to form a plasma flow channel 210, and the optical detection probe 300 is arranged in the generating chamber. In the process of the plasma generating assembly 200 forming the plasma flow channel 210 in the generating chamber 220, the optical detection probe 300 directly detects various plasma distributions at different positions of the plasma flow channel 210 along the third direction, and the optical detection probe 300 has a larger installation space in the generating chamber, and is more convenient to modify.

[0090] In some other specific embodiments of the present invention, the optical detection probe 300 is disposed in the coating chamber 100 and is located between the to-be-coated position 110 and a side of the coating chamber 100 connected to the plasma generating assembly 200 .

[0091] It is worth understanding that the substrate 120 is coated in the coating chamber 100, and the plasma distribution in the space close to the lower surface of the substrate 120 is highly consistent with the plasma distribution of the film layer of the substrate 120. The optical detection probe 300 can directly detect the distribution of various plasmas within this spatial range, thereby improving the accuracy of the various plasma distributions detected by the optical detection probe 300.

[0092] In this embodiment, the light detection probe 300 is disposed between the lower surface of the substrate 120 and the connection position between the coating chamber 100 and the generating chamber to prevent the substrate 120 from moving along the third direction to block the light detection probe 300, thereby improving the accuracy of detection. Of course, without considering the blocking of the substrate 120, the light detection probe 300 can be disposed at any position of the coating chamber 100, as long as the light detection probe 300 is disposed toward the part of the plasma flow channel 210 in the coating chamber 100.

[0093] Reference Figure 1 , Figure 2 and Figure 3 As shown, in some specific embodiments of the present invention, the plasma flow channel 210 includes a sublimation area 211 and a deposition area 212 along the second direction, and the light detection probe 300 is disposed toward the deposition area 212 .

[0094] It should be noted that, for evaporation coating or magnetron sputtering coating, the plasma flow channel 210 only has a sublimation zone 211 and a deposition zone 212, and for reactive plasma coating (RPD), the plasma flow channel 210 also includes a dissociation zone 213. The sublimation zone 211 refers to: a high-heat area formed near the surface of the target material 500, in which there are broadened high-brightness spectrum lines and more peaks of the spectrum lines; the deposition zone 212 refers to: an area near the surface of the substrate 120 where the plasma flow channel 210 is close to the plasma 120, in which most of the plasma is used for coating; the dissociation zone 213 refers to: a region formed by the electron beam emitted by the plasma generation source 600 between the sublimation zone 211 and the deposition zone 212, in which various particles collide and dissociate into positive and negative ions.

[0095] Generally speaking, when the optical detection probe 300 is disposed toward the deposition area 212, the distribution of various plasmas in the plasma flow channel 210 detected by the optical detection probe 300 is very close to the distribution of various plasmas in the film layer of the substrate 120, making the detection result more accurate.

[0096] In reactive plasma deposition (RPD), the light detection probe 300 may also be disposed toward the dissociation zone 213 , and the light detection probe 300 may also detect various plasma distributions in the plasma flow channel 210 .

[0097] In some other specific embodiments of the present invention, at least two groups of light detection probes 300 are spaced apart and distributed along the second direction.

[0098] Specifically, by directing part of the light detection probe 300 toward the sublimation area 211 and the other part of the light detection probe 300 toward the deposition area 212 , the change process of the plasma flow channel 210 along the second direction can be detected, and various plasma distribution changes in the plasma flow channel 210 can be understood in more detail.

[0099] In reactive plasma deposition (RPD), all the light detection probes 300 can be divided into two parts, facing two of the sublimation zone 211, the dissociation zone 213 and the deposition zone 212, or all the light detection probes 300 can be divided into three parts, facing the sublimation zone 211, the dissociation zone 213 and the deposition zone 212. In this embodiment, at least two groups of light detection probes 300 are disposed toward the dissociation zone 213, and at least two groups of light detection probes 300 are disposed toward the deposition zone 212.

[0100] Of course, multiple groups of light detection probes 300 may be distributed in the deposition area 212 at intervals along the second direction to obtain the change process of the deposition area 212 of the plasma flow channel 210 along the second direction, so as to understand the plasma distribution changes in the deposition area 212 in more detail.

[0101] Reference Figure 1 and Figure 4 As shown, in some specific embodiments of the present invention, the first direction, the second direction and the third direction are perpendicular to each other.

[0102] It is worth understanding that the first direction is perpendicular to the second direction, so that the plasma flow channel 210 can vertically impact the surface of the substrate 120 for coating. The first direction is perpendicular to the third direction, and the strip-shaped coating area can form a rectangular coating plane, which is more convenient to use. The second direction is perpendicular to the third direction, so that the distance from any position in the coating area to the target material 500 is basically the same, and the uniformity of the coating film thickness is better.

[0103] Reference Figure 1 As shown, in some specific embodiments of the present invention, the orientation direction of the light detection probe 300 is perpendicular to the second direction.

[0104] In this embodiment, the optical detection probe 300 faces the plasma channel 210 along a first direction to detect various plasma distributions at the same height of the plasma channel 210 to improve detection accuracy. As another embodiment, the optical detection probe 300 can also face the plasma channel 210 at an angle.

[0105] Specifically, the optical detection probe 300 includes an incident probe and a receiving probe relative to the incident probe, a plasma flow channel 210 is between the incident probe and the receiving probe, and the receiving probe is optically connected to the spectrometer 400. The incident probe and the receiving probe are both collimating lenses, and the receiving probe is optically connected to an optical fiber, through which the mixed glow is transmitted to the spectrometer 400.

[0106] Reference Figure 1 As shown, in some specific embodiments of the present invention, the light detection probe 300 includes a reflection probe for receiving reflected light.

[0107] It is worth understanding that the reflection probe receives the glow emitted by the ions themselves, and there is no interference from light sources in other directions. The spectrometer 400 directly forms spectral data of the glow emitted by the ions, which can effectively reduce the interference of stray light and improve the accuracy of detection.

[0108] Furthermore, the optical detection probe 300 also includes a light absorber relative to the reflection probe. The light absorber absorbs the light relative to the wall of the reflector, reduces the refraction of stray light into the reflection probe, and can effectively reduce the interference of stray light, thereby improving the accuracy of detection. In this embodiment, the light absorber is a pyramid. Alternatively, the optical detection probe 300 also includes a reflector relative to the reflection probe, and the light intensity entering the reflection probe is increased by the reflector to improve the accuracy of detection.

[0109] In some specific embodiments of the present invention, the controller is further configured to: when the detected various plasma composition ratios are outside the preset range, control the plasma generating assembly 200 to make the various plasma composition ratios in the plasma flow channel 210 within the preset range.

[0110] It is worth understanding that the debugging efficiency of the vacuum coating machine is improved by performing automated control and adjustment through the controller.

[0111] Specifically, refer to Figure 5As shown, the plasma generating assembly 200 includes a main power supply, a plasma generating source 600 , a beam guide 510 , a thickness compensation plate 221 , a gas source and a generating chamber 220 . The main power supply is used to control the current of the plasma generating assembly 200 as a whole; the plasma generating source 600 is provided with a beam expansion electromagnet coil 610 and a deflection electromagnet coil 620, through which the beam expansion electromagnet coil 610 and the deflection electromagnet coil 620 control the opening angle and distribution area of ​​the electron beam emitted by the plasma generating source; the beam guide 510 is provided with an electromagnet coil, through which the electron beam is converged to the surface of the target ingot; the thickness compensation plate 221 is installed on the top of the generating chamber 220 along the third direction, and is located on one side or both sides of the strip coating area along the third direction, shortening the faster deposition path directly above the target material, and the shape of the coating area can be maintained as a strip, rather than an ellipse, so that the width of the strip coating area along the first direction is consistent, and the thickness accumulation of the film layer on the substrate 120 along the third direction is the same; the gas source is used to introduce reaction gases, including but not limited to argon, oxygen and hydrogen, and the distribution of oxygen ions and hydrogen ions will also affect the uniformity of the film layer distribution.

[0112] The controller controls the plasma generating assembly 200 so that the plasma composition ratio in the plasma flow channel 210 is within a preset range, including performing at least one of the following controls:

[0113] 1. Control the current of the main power supply. By increasing or decreasing the current of the main power supply, the amount of gas ions changes;

[0114] 2. Control the current of the beam expansion electromagnet coil 610 of the plasma source 600 so that the distribution area of ​​the electron beam emitted by the plasma source 600 changes;

[0115] 3. Control the current of the deflection electromagnet coil 620 of the plasma source 600 so that the trajectory of the electron beam emitted by the plasma source 600 changes;

[0116] 4. Controlling the argon gas flux of the plasma generating source 600 so that the amount of the electron beam emitted by the plasma generating source 600 changes;

[0117] 5. Control the position of the beam guide 510 so that the relative position between the electron beam and the target 500 changes;

[0118] 6. Control the current of the electromagnet coil of the beam guide 510 so that the contact surface between the electron beam and the target 500 changes;

[0119] 7. Control the position of the thickness compensation plate 221 so that the shape of the coating area changes;

[0120] 8. Control the ventilation composition ratio of the gas source to change the amount of gas ions;

[0121] 9. Control the total ventilation pressure of the gas source to change the amount of gas ions;

[0122] 10. Control the ventilation position of the gas source to change the gas ion distribution;

[0123] 11. Control the wall temperature of the generating chamber 220 to change the amount of gas ions.

[0124] The second embodiment of the utility model provides a vacuum coating machine, comprising: a coating chamber 100, a plasma generating assembly 200, at least two groups of light detection probes 300, a spectrometer 400 and a controller. The coating chamber 100 is provided with a coating position 110 for coating a stationary substrate 120 or a rotating substrate 120; the plasma generating assembly 200 is connected to the coating chamber 100, and is provided with a plasma flow channel 210 along a second direction toward the coating position 110; at least two groups of light detection probes 300 are spaced apart along a fourth direction, and different light detection probes are arranged at different positions. The detection probe 300 is oriented toward different positions of the plasma flow channel 210 along the fourth direction. The optical detection probe 300 is used to detect the mixed glow emitted by the plasma in the plasma flow channel 210. The fourth direction intersects with the second direction. The spectrometer 400 is optically connected to the optical detection probe 300 to decompose the mixed glow and convert it into spectral data. The controller is electrically connected to the spectrometer 400 to receive and process the spectral data emitted by the spectrometer 400 to obtain various plasma composition ratios at different positions of the plasma flow channel 210 along the fourth direction.

[0125] In this embodiment, the coating position 110 has a stationary substrate 120 or a rotating substrate 120, and the plasma flow channel 210 rises in a straight line and directly injects into the surface of the substrate 120. Ideally, the plasma flow channel 210 directly forms a concentric film layer on the surface of the substrate 120. Among them, the coating chamber 100 can also have a coating conveyor line along the first direction. After the coating conveyor line conveys the substrate 120 to the coating position 110, the coating conveyor line stops, so that the substrate 120 at the coating position 110 is coated in a stationary state. The vacuum coating machine also includes a target material 500. By directly heating the target material 500, the particles on the surface of the target material 500 are vaporized, and the gaseous particles move along the plasma flow channel 210 and are transported to the surface of the substrate 120 to be deposited into a film. Among them, the rotating substrate 120 can make the film layer thickness distribution more uniform.

[0126] The plasma flow channel 210 directly forms a planar film layer on the substrate 120, and the coating area can be understood as a planar film, so the fourth direction can be the same direction as the first direction or the third direction, and both can detect various plasma distributions in the plasma flow channel 210. In this embodiment, some of the light detection probes 300 are spaced apart along the first direction, and another part of the light detection probes 300 are spaced apart along the third direction.

[0127] It is worth understanding that the light detection probe 300 is set toward the plasma flow channel 210, and directly detects the glow emitted by the plasma in the plasma flow channel 210, and transmits the glow to the spectrometer 400. The spectrometer 400 analyzes and obtains the spectral data of various plasmas, and then processes the plasma composition ratios of various plasmas through the controller. Two or more groups of light detection probes 300 detect different positions of the plasma flow channel 210 along the fourth direction, and obtain various plasma composition ratios at different positions of the plasma flow channel 210 along the fourth direction, as well as various plasma distribution conditions at different positions of the coating area along the fourth direction, thereby realizing real-time monitoring of various plasma distribution conditions. When debugging the vacuum coating machine, parameters can be adjusted according to various plasma distribution conditions to make the uniformity of various plasma distributions higher. After adjusting the parameters, the various plasma distribution conditions after adjustment can be directly understood. When the various plasma distributions do not meet the preset requirements, they can be directly adjusted until the various plasma distributions are uniform, thereby improving the adjustment efficiency and adjustment accuracy.

[0128] The vacuum coating machine provided in the first embodiment of the present invention can be debugged by the following method, and the specific steps include:

[0129] S1: Start the vacuum coating machine according to the first aspect;

[0130] S2: different light detection probes 300 detect the glow at different positions in the plasma flow channel 210 along the third direction, and the spectrometer 400 receives the mixed glow detected by the light detection probes 300 to detect the plasma composition ratio at different positions in the plasma flow channel 210;

[0131] S3: If the plasma composition ratio at different positions is outside the preset range, the equipment parameters of the vacuum coating machine are adjusted, and S2 is repeated until the measured plasma composition ratio is within the preset range.

[0132] The vacuum coating machine of the second embodiment of the utility model can be debugged by the following method, and the specific steps include:

[0133] S1: Start the vacuum coating machine according to the second embodiment;

[0134] S2: different light detection probes 300 detect the glow at different positions in the plasma flow channel 210 along the fourth direction, and the spectrometer 400 receives the mixed glow detected by the light detection probes 300 to detect the plasma composition ratio at different positions in the plasma flow channel 210;

[0135] S3: If the plasma composition ratio at different positions is outside the preset range, the equipment parameters of the vacuum coating machine are adjusted, and S2 is repeated until the measured plasma composition ratio is within the preset range.

[0136] Specifically, the light detection probe 300, the spectrometer 400 and the controller can directly know the plasma distribution of the plasma flow channel 210 along the third direction or the fourth direction. According to the plasma distribution, the vacuum coating machine can be directly adjusted, and the adjusted plasma distribution can be fed back in real time. According to the adjusted plasma distribution, adjustments can be made again to improve the adjustment efficiency and accuracy.

[0137] It is worth understanding that after detecting the distribution of the plasma, the equipment parameters of the vacuum coating machine are adjusted so that the composition ratio of various plasmas in the plasma channel 210 when reaching the surface of the substrate 120 is within a preset range, thereby improving the uniformity of the distribution of various plasmas in the film layer on the substrate 120, reducing the square resistance of the substrate 120, and improving the coating performance of the substrate 120.

[0138] Reference Figure 5 As shown, in some specific embodiments of the present invention, in S3, the equipment debugging parameters of the vacuum coating machine include at least one of the following parameters: the conveying speed of the coating conveyor line; the potential of the carrier board carrying the substrate 120 on the coating conveyor line; the current of the main power supply; the current of the beam expansion electromagnet coil 610 of the plasma generating source 600; the current of the deflection electromagnet coil 620 of the plasma generating source 600; the argon gas flux of the plasma generating source 600; the position of the beam guide 510; the current of the electromagnet coil of the beam guide 510; the position of the thickness compensation plate 221; the shape of the thickness compensation plate 221; the total ventilation pressure of the gas source; the ventilation position of the gas source; the cavity wall temperature of the generating chamber 220. Among them, the shape of the thickness compensation plate 221 can also change the shape of the coating area. The conveying speed of the coating conveyor line and the potential of the carrier board both affect the adhesion uniformity of the plasma in the coating area. Other parameters will not be repeated here.

[0139] Reference Figure 1 and Figure 4As shown, the RPD vacuum coating device proposed by the present invention includes the vacuum coating machine in the first embodiment or the second embodiment. Experiments have shown that the RPD vacuum coating device formed by using the vacuum coating machine in the first embodiment or the second embodiment has higher regulation efficiency and regulation accuracy.

[0140] In an embodiment where the RPD vacuum coating equipment adopts a multi-furnace equipment, that is, there are multiple plasma channels 210 in the same plasma generating assembly 200, the substrate 120 is coated through the multiple plasma channels 210, thereby improving production efficiency.

[0141] In addition, the vacuum coating machine of the first embodiment or the second embodiment can also be applied to evaporation coating equipment or magnetron sputtering coating equipment.

[0142] The embodiments of the present invention are described in detail above in conjunction with the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge scope of ordinary technicians in the relevant technical field without departing from the purpose of the present invention.

Claims

1. A vacuum coating machine, characterized in that: include: The coating chamber is provided with a coating position and a coating conveying line along a first direction, wherein the coating conveying line passes through the coating position to convey the substrate through the coating position and coats the surface of the substrate; A plasma generating assembly is connected to the coating chamber and is provided with a plasma flow channel along a second direction toward the position to be coated, wherein the plasma flow channel forms a coating area along a third direction at the position to be coated, and the first direction, the second direction and the third direction intersect with each other; At least two groups of light detection probes are spaced apart along the third direction, and different light detection probes are oriented to different positions of the plasma flow channel along the third direction, and the light detection probes are used to detect mixed glow emitted by the plasma in the plasma flow channel; a spectrometer, optically connected to the light detection probe, for obtaining spectral data according to the mixed glow; The controller is electrically connected to the spectrometer and is used for receiving and processing the spectrum data sent by the spectrometer to obtain the plasma composition ratios at different positions of the plasma flow channel along the third direction.

2. The vacuum coating machine according to claim 1, characterized in that: The plasma generating assembly comprises a generating chamber connected to the coating chamber, the plasma flow channel is located in the generating chamber, and the light detecting probe is arranged in the generating chamber; or the light detecting probe is arranged in the coating chamber and is located between the position to be coated and the side of the coating chamber connected to the plasma generating assembly.

3. The vacuum coating machine according to claim 1, characterized in that: The plasma flow channel includes a sublimation area and a deposition area along the second direction, and the light detection probe is arranged toward the deposition area.

4. The vacuum coating machine according to claim 1, characterized in that: The plasma flow channel includes a sublimation zone, a dissociation zone and a deposition zone along the second direction, and the light detection probe is arranged toward the dissociation zone and / or the deposition zone.

5. The vacuum coating machine according to claim 4, characterized in that: It also includes at least two groups of light detection probes spaced apart along the second direction, and the light detection probes are arranged toward the sublimation area and the deposition area.

6. The vacuum coating machine according to claim 4, characterized in that: It also includes at least two groups of light detection probes spaced apart along the second direction, and the light detection probes are arranged toward the dissociation area and the deposition area.

7. The vacuum coating machine according to claim 1, characterized in that: The controller is further configured to: when the detected plasma composition ratio is outside a preset range, control the plasma generating assembly to make the plasma composition ratio in the plasma flow channel within a preset range.

8. The vacuum coating machine according to claim 5, characterized in that: The first direction, the second direction and the third direction are perpendicular to each other.

9. The vacuum coating machine according to claim 1, characterized in that: Each group of optical detection probes includes an incident probe and a receiving probe opposite to the incident probe, a plasma flow channel is between the incident probe and the receiving probe, and the receiving probe is optically connected to the spectrometer.

10. A vacuum coating machine, characterized in that: include: The coating chamber is provided with a coating position for coating a stationary substrate or a rotating substrate; A plasma generating assembly is connected to the coating chamber and is provided with a plasma flow channel along a second direction toward the location to be coated; At least two groups of light detection probes are spaced apart along a fourth direction, different light detection probes are oriented to different positions of the plasma flow channel along the fourth direction, and the light detection probes are used to detect mixed glow emitted by the plasma in the plasma flow channel, and the fourth direction intersects with the second direction; A spectrometer, optically connected to the light detection probe, to decompose the mixed glow and convert it into spectral data; The controller is electrically connected to the spectrometer and is used for receiving and processing the spectrum data sent by the spectrometer to obtain the plasma composition ratios at different positions of the plasma flow channel along the fourth direction.

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