Correction equipment for wafer loading device

Abstract

The utility model provides correction equipment for a wafer loading device, and the equipment comprises a cover plate which is used for covering the top of a loading cavity; the lifting mechanism is arranged on the cover plate; the correction assembly is movably arranged on the cover plate, and the correction assembly is connected with the power end of the lifting mechanism; in the correction working state, the lifting mechanism drives the correction assembly to descend to the moving area, and when a manipulator carries a control wafer to be placed on the supporting convex part through the moving area and the control wafer makes contact with the bottom of the correction assembly in the moving process, the correction assembly is moved to the moving area. And the distance between the correcting assembly and the supporting convex part is set to be the maximum distance that the mechanical arm can move in the height direction. The correction equipment provided by the utility model is used for correcting the moving track of the manipulator in the wafer loading device, so that the condition that the manipulator interferes with the interior of the wafer loading device when grabbing the wafer is avoided, the wafer transfer reliability is improved, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor process equipment, and in particular to a correction device for a wafer loading device. Background Art

[0002] Semiconductor process equipment usually includes an atmospheric transmission device, a wafer loading device, a vacuum transmission device, and a wafer processing chamber, etc. Among them, a wafer box is arranged in the wafer loading device, and support protrusions are arranged at intervals in the wafer box. The support protrusions are used to store wafers or wafer trays, and a robot can enter the wafer loading device to transfer the wafers.

[0003] In the prior art, the robot's running trajectory cannot be accurately calibrated when transferring wafers in a wafer loading device, which may cause the wafer to interfere with the top of the wafer loading device during the actual transfer process, thereby damaging the wafer and generating contaminated particles. Summary of the invention

[0004] The object of the present invention is to provide a correction device for a wafer loading device, which is used to correct the running trajectory of a robot in the wafer loading device to avoid interference between the robot and the inside of the wafer loading device when grabbing the wafer, thereby improving the reliability of wafer transfer and thus improving production efficiency.

[0005] To achieve the above-mentioned object, in a first aspect, the present invention provides a calibration device for a wafer loading device, the wafer loading device comprising a loading chamber and a top cover, the top cover being detachably arranged on the top of the loading chamber, a supporting protrusion being arranged in the loading chamber, the supporting protrusion being used to support the wafer, and a movable area being formed between the supporting protrusion and the bottom of the top cover, the calibration device comprising:

[0006] A cover plate, used for covering the top of the loading cavity;

[0007] A lifting mechanism provided on the cover plate;

[0008] A correction component movably arranged on the cover plate, wherein the correction component is connected to a power end of the lifting mechanism;

[0009] In the correction working state, the lifting mechanism drives the correction component to descend to the active area. When the manipulator carries the control piece through the active area and places it on the supporting protrusion, and the control piece contacts the bottom of the correction component during the movement, the distance between the correction component and the supporting protrusion is set as the maximum distance that the manipulator can move in height.

[0010] The beneficial effect of the correction device for the wafer loading device provided by the present invention is that by adopting the correction device to correct the running trajectory of the robot, the interference between the robot and the inside of the wafer loading device when grabbing the wafer is avoided, the reliability of wafer transfer is improved, and thus the production efficiency is improved.

[0011] In some embodiments, the calibration assembly includes a controller, a calibration body, and a distance sensor;

[0012] The controller is electrically connected to the lifting mechanism and is used to control the lifting of the lifting mechanism;

[0013] The correction body is connected to the power end of the lifting mechanism;

[0014] The distance measuring sensor is arranged on the side of the correction body, and is used to detect the distance between the correction body and the supporting protrusion, and feed back the detected distance to the control terminal of the manipulator. Its beneficial effect is that the correction body is driven to move by the lifting mechanism, and is used to limit the movable area in which the manipulator can move. The distance measuring sensor is used to detect the distance between the correction body and the supporting protrusion, and feed back the detected distance to the control terminal of the manipulator. The control terminal controls the movable range of the manipulator in the height direction according to the received data, so as to avoid the manipulator interfering with the top of the wafer loading device when grabbing the wafer.

[0015] In some embodiments, the calibration assembly further comprises a piezoelectric sensor electrically connected to the controller;

[0016] The piezoelectric sensor is arranged on the side of the calibration body, and the sensing end surface of the piezoelectric sensor is on the same horizontal plane as the bottom surface of the calibration body;

[0017] When the lifting mechanism drives the correction body to descend, the piezoelectric sensor can contact the supporting protrusion. The beneficial effect is that the piezoelectric sensor is used to detect whether the correction body contacts the supporting protrusion during the movement, and to detect whether the control sheet contacts the correction body when the correction is in working state.

[0018] In some embodiments, the correction assembly further includes a first connecting member;

[0019] The top of the first connecting member is connected to the power end of the lifting mechanism;

[0020] The correction body, the distance measuring sensor and the piezoelectric sensor are all arranged at the bottom of the first connecting member.

[0021] In some embodiments, the correction assembly further comprises an adjustment member;

[0022] The adjusting member is provided on the first connecting member and connected to the correction body, and is used to adjust the distance between the correction body and the first connecting member. The beneficial effect is that the adjusting member is provided to adjust the distance between the correction body and the first connecting member, so as to ensure that the sensing end surface of the piezoelectric sensor and the bottom surface of the correction body are on the same horizontal plane.

[0023] In some embodiments, the adjusting member has an adjusting portion, the adjusting portion is threadedly connected to the first connecting member, and the adjusting portion is fixedly connected to the correction body.

[0024] In some embodiments, a first receiving groove is formed at the bottom of the first connecting member;

[0025] When the adjusting member adjusts the distance between the correction body and the first connecting member, the correction body can be retracted into the first accommodating groove.

[0026] In some embodiments, the calibration device further comprises a guide post and a second connecting member;

[0027] The second connecting member is arranged on the top of the first connecting member;

[0028] The cover plate is provided with a guide hole;

[0029] The guide post is inserted into the guide hole, and one end of the guide post is fixedly connected to the second connecting member. The beneficial effect is that the guide post is provided to guide the correction body, so as to ensure that the correction body is lifted straight up and down to avoid shaking.

[0030] In some embodiments, the guide columns are disposed on both sides of the lifting mechanism.

[0031] In some embodiments, a second receiving groove is provided at the bottom of the cover plate;

[0032] In the non-calibration working state, the lifting mechanism drives the calibration assembly to retract into the second receiving groove. The beneficial effect is that by providing the second receiving groove at the bottom of the cover plate, the calibration assembly can be retracted into the second receiving groove when storing the calibration equipment, which is convenient for storing the calibration equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 A schematic diagram of the structure of the calibration device provided in the embodiment of the present invention installed on the loading chamber;

[0034] Figure 2 A front view of a correction device according to an embodiment of the present invention;

[0035] Figure 3 A cross-sectional view of the correction device of the embodiment provided by the present invention along the axial direction of the lifting mechanism;

[0036] Figure 4 A bottom view of a first connecting member of an embodiment provided by the present invention;

[0037] Figure 5 A top view of a correction device according to an embodiment of the present invention.

[0038] Reference numerals:

[0039] Loading chamber 11, supporting protrusion 12, cover plate 2, second accommodating groove 21, lifting mechanism 3, correction component 4, controller 41, correction body 42, ranging sensor 43, piezoelectric sensor 44, first connecting member 45, first accommodating groove 451, adjusting member 46, guide column 5, second connecting member 6. DETAILED DESCRIPTION

[0040] In order to make the purpose, technical scheme and advantages of the present invention clearer, the technical scheme in the embodiment of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be the usual meanings understood by people with general skills in the field to which the present invention belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Unless otherwise specified, the "connection" described in this article can be a direct connection or an indirect connection, that is, connected through an intermediate.

[0041] In view of the problems existing in the prior art, an embodiment of the present invention provides a calibration device for a wafer loading device, referring to Figure 1 and Figure 2 As shown, the wafer loading device includes a loading chamber 11 and a top cover, wherein the top cover is detachably arranged on the top of the loading chamber 11, and a supporting protrusion 12 is arranged in the loading chamber 11, wherein the supporting protrusion 12 is used to support the wafer, and the area between the uppermost supporting protrusion 12 and the bottom of the top cover is defined as an active area, and the manipulator can grab and transfer the wafer through the active area. Among them, the correction equipment includes a cover plate 2, wherein the cover plate 2 is used to cover the top of the loading chamber 11. A lifting mechanism 3 is arranged on the cover plate 2, and a correction component 4 is movably arranged on the cover plate 2, wherein the correction component 4 is connected to the power end of the lifting mechanism 3, and the lifting mechanism 3 can drive the correction component 4 to move up and down.

[0042] In the calibration working state, the top cover is first removed from the top of the loading chamber 11, and then the cover plate 2 is covered on the top of the loading chamber 11. The lifting mechanism 3 drives the calibration component 4 to descend to the active area. When the manipulator carries the control piece through the active area and places it on the supporting protrusion 12, and the control piece contacts the bottom of the calibration component 4 during the movement, the distance between the calibration component 4 and the supporting protrusion 12 is set as the maximum distance that the manipulator can move in height.

[0043] In this embodiment, the overall shape of the cover plate 2 can be designed according to the shape of the top cover. By designing the correction device to correct the running trajectory of the robot in the wafer loading device, it is avoided that the robot interferes with the inside of the wafer loading device when grabbing the wafer, thereby improving the reliability of wafer transfer and thus improving production efficiency.

[0044] In some embodiments, reference Figures 1 to 3 As shown, the correction component 4 includes a controller 41, a correction body 42 and a distance sensor 43. The controller 41 is arranged on the upper end surface of the cover plate 2 and is electrically connected to the lifting mechanism 3 to control the lifting of the lifting mechanism 3. The correction body 42 is located below the cover plate 2 and is connected to the power end of the lifting mechanism 3. The distance sensor 43 is arranged on the side of the correction body 42 to detect the distance between the correction body 42 and the supporting protrusion 12, and feed the detected distance back to the control terminal of the manipulator.

[0045] In this embodiment, when the calibration work is performed, the controller 41 controls the movement of the lifting mechanism 3, and the lifting mechanism 3 drives the calibration body 42 and the distance measuring sensor 43 to descend into the active area. Then the terminal device controls the manipulator to carry the control piece into the loading chamber 11. If the manipulator interferes with the calibration body 42 in the process of placing the control piece on the supporting protrusion 12, the controller 41 controls the lifting mechanism 3 to drive the calibration body 42 to rise to a certain height until the control piece contacts the bottom of the calibration component 4 during the movement, but does not affect the placement of the control piece on the supporting protrusion 12. At this time, the distance measuring sensor 43 feeds back the detected distance to the control terminal of the manipulator, and the control terminal sets the distance as the maximum distance that the manipulator can move in height, thereby avoiding interference between the wafer and the top cover when the manipulator grabs the wafer.

[0046] In some specific embodiments, the lifting mechanism 3 may include a motor and a telescopic rod. In some embodiments, the lifting mechanism 3 may also be a telescopic cylinder.

[0047] Continue to refer Figures 1 to 3As shown, in some embodiments, the calibration assembly 4 further includes a piezoelectric sensor 44 electrically connected to the controller 41, the piezoelectric sensor 44 is disposed on the side of the calibration body 42, and the sensing end surface of the piezoelectric sensor 44 is at the same level as the bottom surface of the calibration body 42. When the lifting mechanism 3 drives the calibration body 42 to descend, the piezoelectric sensor 44 can contact the supporting protrusion 12.

[0048] In this embodiment, when performing the calibration work, the controller 41 controls the movement of the lifting mechanism 3, and the lifting mechanism 3 drives the calibration body 42 and the piezoelectric sensor 44 to descend until the piezoelectric sensor 44 contacts the supporting protrusion 12. At this time, the controller 41 controls the lifting mechanism 3 to stop moving, and then the controller 41 controls the lifting mechanism 3 to retract, and the retraction distance is the same as the thickness of the wafer to be loaded. Then the terminal device controls the manipulator to carry the control piece into the loading chamber 11. If the manipulator interferes with the piezoelectric sensor 44 when placing the control piece on the supporting protrusion 12, the piezoelectric sensor 44 will feed back the detected information to the controller 41. The controller 41 controls the lifting mechanism 3 to drive the calibration body 42 to rise and fine-tune until the control piece contacts the piezoelectric sensor 44 during the movement, but does not affect the placement of the control piece on the supporting protrusion 12. At this time, the ranging sensor 43 feeds back the detected distance to the control terminal of the manipulator.

[0049] In some embodiments, the correction component 4 also includes a first connecting member 45, the top of the first connecting member 45 is connected to the power end of the lifting mechanism 3, and the correction body 42, the ranging sensor 43 and the piezoelectric sensor 44 are all arranged at the bottom of the first connecting member 45.

[0050] In this embodiment, the first connecting member 45 and the correction body 42 are both rectangular structures, the correction body 42 is coaxial with the center point of the first connecting member 45 , and the distance sensor 43 and the piezoelectric sensor 44 are located at the edge of the first connecting member 45 .

[0051] In some embodiments, the correction component 4 further includes an adjusting member 46 , which is disposed on the first connecting member 45 and connected to the correction body 42 , and is used to adjust the distance between the correction body 42 and the first connecting member 45 .

[0052] In this embodiment, the adjusting member 46 has an adjusting portion, the adjusting portion is threadedly connected to the first connecting member 45, and the adjusting portion is fixedly connected to the correction body 42. More specifically, a threaded hole is provided on the first connecting member 45, and an external thread structure matching the threaded hole is provided on the adjusting portion, the adjusting portion is threadedly connected to the threaded hole on the first connecting member 45, and the bottom is fixedly connected to the correction body 42, and the spacing between the first connecting member 45 and the correction body 42 is adjusted by rotating the adjusting member 46 to ensure that the sensing end surface of the piezoelectric sensor 44 and the bottom surface of the correction body 42 are on the same horizontal plane.

[0053] Furthermore, combined with Figure 4 As shown, a first receiving groove 451 is formed at the bottom of the first connecting member 45. The first receiving groove 451 is a square groove, and the length and width of the first receiving groove 451 are greater than the length and width of the correction body 42. When the adjusting member 46 is rotated to adjust the distance between the correction body 42 and the first connecting member 45, the correction body 42 can be retracted into the first receiving groove 451.

[0054] In some embodiments, reference Figure 3 and Figure 5 As shown, the calibration device further includes a guide column 5 and a second connecting member 6, wherein the second connecting member 6 is disposed on the top of the first connecting member 45, and the power mechanism is connected to the second connecting member 6. A guide hole is provided on the cover plate 2, the guide column 5 is passed through the guide hole, and one end of the guide column 5 is fixedly connected to the second connecting member 6.

[0055] In this embodiment, the guide column 5 is a ball guide column 5, and the bushing of the ball guide column 5 is embedded in the guide hole. The guide column 5 is provided to guide the correction body 42, so as to ensure that the correction body 42 is lifted straight up and down to avoid shaking.

[0056] In some specific embodiments, the guide posts 5 are disposed on both sides of the lifting mechanism 3 .

[0057] refer to Figure 3 As shown, in some embodiments, a second receiving groove 21 is opened at the bottom of the cover plate 2, the depth of the second receiving groove 21 is greater than the thickness of the correction component 4, and the length and width of the second receiving groove 21 are both greater than the length and width of the correction component 4.

[0058] In the non-calibration working state, the lifting mechanism 3 drives the calibration assembly 4 to retract into the second receiving groove 21. In this embodiment, by opening the second receiving groove 21 at the bottom of the cover plate 2, the calibration assembly 4 can be retracted into the second receiving groove 21 when the calibration equipment is stored, which is convenient for storing the calibration equipment.

[0059] The above is only a specific implementation of the embodiment of the present application, but the protection scope of the embodiment of the present application is not limited thereto, and any changes or replacements within the technical scope disclosed in the embodiment of the present application should be included in the protection scope of the embodiment of the present application. Therefore, the protection scope of the embodiment of the present application should be based on the protection scope of the claims.

Claims

1. A calibration device for a wafer loading device, the wafer loading device comprising a loading chamber and a top cover, the top cover being detachably arranged on the top of the loading chamber, a supporting protrusion being arranged in the loading chamber, the supporting protrusion being used to support the wafer, and a movable area being between the supporting protrusion and the bottom of the top cover, characterized in that: The calibration device comprises: A cover plate, used for covering the top of the loading cavity; A lifting mechanism provided on the cover plate; A correction component movably arranged on the cover plate, wherein the correction component is connected to a power end of the lifting mechanism; In the correction working state, the lifting mechanism drives the correction component to descend to the active area. When the manipulator carries the control piece through the active area and places it on the supporting protrusion, and the control piece contacts the bottom of the correction component during movement, the distance between the correction component and the supporting protrusion is set as the maximum distance that the manipulator can move in height.

2. The calibration device according to claim 1, characterized in that The calibration component includes a controller, a calibration body and a distance measuring sensor; The controller is electrically connected to the lifting mechanism and is used to control the lifting of the lifting mechanism; The correction body is connected to the power end of the lifting mechanism; The distance measuring sensor is arranged on the side of the correction body, and is used to detect the distance between the correction body and the supporting protrusion, and feed back the detected distance to the control terminal of the manipulator.

3. The calibration device according to claim 2, characterized in that The calibration assembly also includes a piezoelectric sensor electrically connected to the controller; The piezoelectric sensor is arranged on the side of the calibration body, and the sensing end surface of the piezoelectric sensor is on the same horizontal plane as the bottom surface of the calibration body; When the lifting mechanism drives the correction body to descend, the piezoelectric sensor may contact the supporting protrusion.

4. The calibration device according to claim 3, characterized in that The calibration assembly further includes a first connecting member; The top of the first connecting member is connected to the power end of the lifting mechanism; The correction body, the distance measuring sensor and the piezoelectric sensor are all arranged at the bottom of the first connecting member.

5. The calibration device according to claim 4, characterized in that The correction assembly also includes an adjustment member; The adjusting member is disposed on the first connecting member and connected to the correction body, and is used to adjust the distance between the correction body and the first connecting member.

6. The calibration device according to claim 5, characterized in that The adjusting member comprises an adjusting portion, the adjusting portion is threadedly connected to the first connecting member, and the adjusting portion is fixedly connected to the correction body.

7. The calibration device according to claim 5, characterized in that A first receiving groove is formed at the bottom of the first connecting member; When the adjusting member adjusts the distance between the correction body and the first connecting member, the correction body can be retracted into the first accommodating groove.

8. The calibration device according to any one of claims 4 to 7, characterized in that: Also includes a guide post and a second connecting member; The second connecting member is arranged on the top of the first connecting member; The cover plate is provided with a guide hole; The guide post is inserted into the guide hole, and one end of the guide post is fixedly connected to the second connecting member.

9. The calibration device according to claim 8, characterized in that: The guide columns are arranged on both sides of the lifting mechanism.

10. The calibration device according to claim 1, characterized in that A second receiving groove is provided at the bottom of the cover plate; In the non-correction working state, the lifting mechanism drives the correction component to retract into the second accommodating groove.

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