Texture-assisted electrochemical mechanical polishing device

Abstract

The utility model discloses a texture-assisted electrochemical mechanical polishing device, and belongs to the technical field of polishing devices.The texture-assisted electrochemical mechanical polishing device comprises a rack, a polishing mechanism, a movement mechanism and a placement mechanism, and the polishing mechanism comprises a polishing seat, a polishing motor, a polishing shaft and a polishing head; one end, far away from the polishing shaft, of the polishing head is arc-shaped and is provided with a texture group; the moving mechanism comprises an x-axis linear module, a y-axis linear module, a z-axis linear module and a polishing rotating assembly, the x-axis linear module is arranged on the rack and used for driving the placing mechanism to move in the x-axis direction, the placing mechanism is used for placing a workpiece to be polished, and the y-axis linear module is arranged on the rack and used for driving the z-axis linear module to move in the y-axis direction; the z-axis linear module is used for driving the rotating assembly to move in the z-axis direction. The arc-shaped surface polishing device has the effects of conveniently achieving polishing processing treatment on the workpiece with the arc-shaped surface and improving the applicability.

Description

Technical Field

[0001] The present application relates to the field of polishing devices, and in particular to a texture-assisted electrochemical mechanical polishing device. Background Art

[0002] Silicon carbide (SiC) is a non-metallic inorganic compound. Its molecular structure consists of one carbon atom and four silicon atoms connected by covalent bonds. It has a high atomic density and atomic crystal structure. Silicon carbide has a very low resistivity, which can achieve high energy conversion and high current density; in addition, silicon carbide also has high electrical and thermal conductivity, making it an ideal semiconductor material.

[0003] Since SiC single crystals are chemically inert and hardly react with acid or alkaline solutions, the polishing process of SiC single crystals is usually performed by electrochemical mechanical polishing. Compared with traditional metal chemical mechanical polishing, electrochemical mechanical polishing uses an external circuit to oxidize the material surface, thereby achieving low pressure, high controllability and good material removal efficiency for the workpiece.

[0004] In the prior art, an electrochemical mechanical polishing device for polishing hard and brittle materials such as SiC generally includes a placement seat, a spindle, a polishing head, and a motion assembly for driving the spindle to move horizontally, wherein the placement seat is used to place the workpiece to be polished, the polishing head is mounted on the spindle and is used to polish the workpiece, and after the workpiece is placed on the placement seat, the spindle is driven by the motion assembly to move horizontally so that the polishing head can polish the surface of the workpiece.

[0005] With respect to the above-mentioned prior art, the polishing head is mainly suitable for polishing the flat surface on the top of the workpiece, and it is difficult to realize the polishing process on the workpiece with a curved surface, and the applicability is poor. Utility Model Content

[0006] In order to facilitate the polishing process of workpieces with curved surfaces and improve applicability, the present application provides a texture-assisted electrochemical mechanical polishing device.

[0007] The present application provides a texture-assisted electrochemical mechanical polishing device that adopts the following technical solution:

[0008] A texture-assisted electrochemical mechanical polishing device comprises a frame, a polishing mechanism, a motion mechanism and a placement mechanism, wherein the polishing mechanism comprises a polishing seat, a polishing motor, a polishing shaft and a polishing head, wherein the polishing motor is mounted on the polishing seat and used to drive the polishing shaft to rotate, wherein the polishing head is coaxially fixedly mounted on the polishing shaft and used to polish a workpiece, wherein the end of the polishing head away from the polishing shaft is arranged in an arc shape and a texture group is arranged on the end of the polishing head away from the polishing shaft; wherein the motion mechanism comprises an x-axis linear module, a y-axis linear module, a z-axis linear module and a polishing rotating assembly, wherein the x-axis linear module is arranged on the frame and used to drive the placement mechanism to move along the x-axis direction, wherein the placement mechanism is used to place a workpiece to be polished, wherein the y-axis linear module is arranged on the frame and used to drive the z-axis linear module to move along the y-axis direction, wherein the z-axis linear module is used to drive the rotating assembly to move along the z-axis direction, and wherein the polishing rotating assembly is used to drive the polishing seat to rotate around the x-axis.

[0009] By adopting the above technical solution, when polishing the workpiece, the workpiece is first placed on the placement seat, and then the x-axis linear module drives the placement seat to move in the x-axis direction, and the y-axis linear module and the z-axis linear module drive the rotating component and the polishing seat to move in the y-axis and z-axis directions to achieve polishing of the flat surface on the top of the workpiece. When polishing the curved surface of the workpiece, the polishing rotating component drives the swing of the polishing seat so that the polishing head can polish the curved surface of the workpiece, which is convenient and fast. In addition, one end of the curved surface of the polishing head during the polishing process is conducive to ensuring the polishing quality of the curved surface of the workpiece, and the setting of the texture group is convenient for accommodating abnormally large abrasive particles or external inclusions, avoiding accidental scratches on the surface of hard and brittle components, and improving their material removal rate.

[0010] Optionally, the texture group includes micro-pits opened on the polishing head, and the micro-pits are evenly distributed in a plurality of groups around the axis of the polishing head.

[0011] By adopting the above technical solution, the arrangement of the micro-pits makes the structure of the texture group simple and convenient to process, which is convenient for processing and forming during the production of the polishing head.

[0012] Optionally, the texture group further includes micro grooves opened on the polishing head, and a plurality of the micro grooves are distributed along the radial direction of the polishing head, and each of the micro grooves is arranged in a ring shape with the ends closed.

[0013] By adopting the above technical solution, the provision of micro grooves is conducive to further improving the capacity of the texture group to accommodate abrasive particles or external inclusions, which is conducive to further ensuring the polishing quality of the workpiece.

[0014] Optionally, each group of micro-pits has a plurality of micro-pits distributed along the radial direction of the polishing head, and each of the micro-grooves and each group of micro-pits are distributed alternately in sequence.

[0015] By adopting the above technical solution, it is beneficial to ensure the structural strength of the polishing head and stably realize the polishing process of the workpiece while maximizing the capacity of the texture group to accommodate abrasive particles or external inclusions.

[0016] Optionally, the polishing rotation assembly includes a polishing rotating seat, a polishing rotating motor, a polishing worm and a polishing worm wheel. The polishing rotating seat is installed on the slider of the z-axis linear module, the polishing rotating motor is installed on the polishing rotating seat and is used to drive the polishing worm to rotate, the polishing worm wheel is rotatably installed on the polishing rotating seat and meshes with the polishing worm, the axis of the polishing worm wheel extends along the x-axis direction and the polishing worm wheel is fixedly installed on the polishing seat.

[0017] By adopting the above technical solution, when the polishing rotating motor drives the polishing worm to rotate, the polishing worm wheel drives the polishing seat to rotate around the x-axis. The self-locking effect between the polishing worm and the polishing worm wheel is beneficial to ensure the stability of the position of the polishing seat after rotation, thereby stably realizing the polishing process of the workpiece.

[0018] Optionally, the polishing rotating seat is provided with an installation groove, and the slider of the z-axis linear module is slidably engaged in the installation groove. The slider of the z-axis linear module is provided with a plurality of fixing holes distributed along the vertical direction. The polishing rotating seat is fixed to the slider of the z-axis linear module by a bolt that penetrates itself and threadedly engages with one of the fixing holes.

[0019] By adopting the above technical solution, the height position of the polishing rotating seat can be adjusted by sliding the polishing rotating seat and fixing the bolts in different fixing holes, which makes it easier for the polishing head to polish the workpiece at different initial height positions, which is conducive to further enhancing applicability.

[0020] Optionally, the placement mechanism includes a fixed seat, a placement seat and a placement rotation assembly, the fixed seat is fixedly mounted on the slider of the x-axis linear module, the placement rotation assembly includes a placement rotation motor, a placement worm and a placement worm wheel, the placement rotation motor is mounted on the fixed seat and is used to drive the placement worm to rotate, the placement worm wheel is rotatably mounted on the fixed seat and meshes with the placement worm, the axis of the placement worm wheel extends along the z-axis direction and the placement worm wheel is fixedly mounted on the placement seat, and the placement seat is used to place the workpiece to be polished.

[0021] By adopting the above technical solution, after the workpiece to be polished is placed on the placement seat, when the placement rotating motor drives the placement worm to rotate, the placement worm wheel drives the placement seat to rotate around the z-axis, thereby facilitating the rapid polishing of arc surfaces at different positions, which is conducive to further enhancing applicability, and the self-locking effect between the placement worm and the placement worm wheel is conducive to further ensuring the stability of the position of the placement seat after rotation.

[0022] Optionally, the polishing seat is provided with a mounting hole extending therethrough, and the polishing motor is fixedly mounted with a mounting ring, the mounting ring comprising a sleeve portion and a positioning portion, the sleeve portion is slidably fitted in the mounting hole, the positioning portion is fixedly mounted on the outer circumferential surface of the sleeve portion, and the mounting ring is fixed to the polishing seat by bolts.

[0023] By adopting the above technical solution, the setting of the mounting ring makes it easy to quickly and stably place the polishing motor in the position where it is located on the mounting seat, thereby quickly installing the polishing motor. At the same time, it plays a protective role during the installation of the polishing motor, making it less likely for the polishing motor to be worn due to friction with the inner wall of the mounting hole.

[0024] In summary, the present application includes at least one of the following beneficial technical effects:

[0025] 1. When polishing the curved surface of the workpiece, the polishing head can polish the curved surface of the workpiece by driving the swing of the polishing seat through the polishing rotating assembly, which is convenient and fast. In addition, one end of the curved surface of the polishing head during the polishing process is conducive to ensuring the polishing quality of the curved surface of the workpiece.

[0026] 2. The setting of the texture group during the polishing process is convenient for accommodating abnormally large abrasive particles or external inclusions, avoiding accidental scratches on the surface of hard and brittle components and improving their material removal rate.

[0027] 3. The setting of the mounting ring facilitates the quick and stable placement of the polishing motor in the position where it is located when the mounting seat is located, thereby quickly installing the polishing motor. At the same time, it plays a protective role during the installation of the polishing motor, making it less likely for the polishing motor to be worn due to friction with the inner wall of the mounting hole. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the overall structure of an embodiment of the present application.

[0029] Figure 2 It is a schematic diagram of the main structure of placing the rotating assembly in the embodiment of the present application.

[0030] Figure 3 yes Figure 2 A partial enlarged schematic diagram of part A.

[0031] Figure 4 It is a schematic diagram of the main structure of the polishing head in the embodiment of the present application.

[0032] Description of reference numerals:

[0033] 1. Frame; 101. Base plate; 102. Door frame; 2. X-axis linear module; 3. Y-axis linear module; 4. Z-axis linear module; 5. Fixed seat; 6. Placement seat; 7. Placement of rotating motor; 8. Placement of worm; 9. Placement of worm wheel; 10. Polishing rotating seat; 11. Polishing rotating motor; 12. Polishing worm; 13. Polishing worm wheel; 14. Mounting slide; 15. Fixed hole; 16. Polishing seat; 17. Polishing motor; 18. Polishing shaft; 19. Polishing head; 20. Mounting hole; 21. Mounting ring; 211. Sleeve part; 212. Positioning part; 22. Micro pit; 23. Micro groove. DETAILED DESCRIPTION

[0034] The following is combined with Figure 1-4 This application is described in further detail.

[0035] The present application discloses a texture-assisted electrochemical mechanical polishing device. Figure 1 The texture-assisted electrochemical mechanical polishing device includes a frame 1, a polishing mechanism, a moving mechanism and a placing mechanism, wherein the frame 1 includes a base plate 101 and a door frame 102 fixedly installed on the top of the base plate 101. In the embodiment of the present application, the base plate 101 is selected to be rectangular, and the length direction of the base plate 101 is the x-axis direction and the width direction is the y-axis direction.

[0036] Combination Figure 2 and Figure 3 The motion mechanism includes an x-axis linear module 2, a y-axis linear module 3, a z-axis linear module 4 and a polishing rotation assembly, wherein the x-axis linear module 2 is arranged on the top of the base plate and along the x-axis direction, and the placement mechanism is arranged on the slider of the x-axis linear module 2 so that the x-axis linear module 2 drives the placement mechanism to move along the x-axis direction. Specifically, the placement mechanism includes a fixed seat 5, a placement seat 6 and a placement rotation assembly, and the placement rotation assembly includes a placement rotation motor 7, a placement worm 8 and a placement worm wheel 9, wherein the fixed seat 5 is fixedly installed on the slider of the x-axis linear module 2, the placement rotation motor 7 is horizontally installed on one side of the fixed seat 5 and is used to drive the placement worm 8 to rotate, the placement worm wheel 9 is rotationally installed on the fixed seat 5 and meshes with the placement worm 8, and the axis of the placement worm wheel 9 extends along the z-axis direction, the placement seat 6 is coaxially fixedly installed on the placement worm wheel 9 and is used to place the workpiece to be polished, so that when the placement rotation motor 7 drives the placement worm 8 to rotate, the placement worm wheel 9 drives the placement seat 6 to rotate around the z-axis, thereby facilitating the rapid realization of polishing processing of arc surfaces at different positions.

[0037] Reference Figure 2 and Figure 3The y-axis linear module 3 is horizontally mounted on the gantry 102 and arranged along the y-axis direction, and the z-axis linear module 4 is mounted on the slider of the y-axis linear module 3 so that the y-axis linear module 3 drives the z-axis linear module 4 to move along the y-axis direction. The polishing rotating assembly includes a polishing rotating seat 10, a polishing rotating motor 11, a polishing worm 12 and a polishing worm wheel 13, wherein the polishing rotating seat 10 is installed on the slider of the z-axis linear module 4. Specifically, the polishing rotating seat 10 is provided with an installation groove 14 which is arranged through the vertical direction, and the slider of the z-axis linear module 4 is slidably engaged in the installation groove 14. The slider of the z-axis linear module 4 is provided with a plurality of fixing holes 15 which are evenly distributed along the vertical direction. The polishing rotating seat 10 is fixed to the slider of the z-axis linear module 4 by a bolt which passes through the polishing rotating seat 10 and is threadedly engaged with one of the fixing holes 15. By threading the bolt with different fixing holes 15, the height position of the polishing rotating seat 10 can be adjusted, which is convenient for the subsequent polishing processing of the workpiece at different initial height positions, and is conducive to further enhancing the applicability.

[0038] Refer to 1 and Figure 3 The polishing rotating motor 11 is horizontally installed on the polishing rotating seat 10, and the polishing worm 12 is fixedly installed on the output end of the polishing rotating motor 11 and rotatably cooperates with the polishing rotating seat 10, so that the polishing rotating motor 11 drives the polishing worm 12 to rotate, and the polishing worm wheel 13 is rotatably installed on the polishing rotating seat 10 and meshes with the polishing worm 12. The axis of the polishing worm wheel 13 extends along the x-axis direction, so that when the polishing worm 12 rotates, the polishing worm wheel 13 rotates around the x-axis. The self-locking effect between the polishing worm wheel 13 and the polishing worm 12 is conducive to ensuring the stability of the position of the polishing worm wheel 13 after rotation.

[0039] Reference Figure 3 and Figure 4 The polishing mechanism includes a polishing seat 16, a polishing motor 17, a polishing shaft 18 and a polishing head 19, wherein the polishing seat 16 is fixedly mounted on the polishing worm wheel 13, so that when the polishing worm wheel 13 rotates, the polishing seat 16 rotates together. The polishing seat 16 is provided with a mounting hole 20 that is set through, and a mounting collar 21 is arranged outside the polishing motor 17. The mounting collar 21 includes a sleeve portion 211 and a positioning portion 212, wherein the sleeve portion 211 is fixedly mounted on the outer peripheral surface of the polishing motor 17 and slidably fits in the mounting hole 20, and the positioning portion 212 is fixedly mounted on the outer peripheral surface of the sleeve portion 211. The sleeve portion 211 is fixedly fixed to the mounting hole 20 by a bolt that is threadedly fitted to the polishing seat 16, and the positioning portion 212 plays a role in positioning the polishing motor 17 during installation, so as to facilitate the rapid installation of the polishing motor 17.

[0040] Reference Figure 4The polishing shaft 18 is fixedly mounted on the output end of the polishing motor 17 so that the polishing motor 17 drives the polishing shaft 18 to rotate. The polishing head 19 is coaxially fixedly mounted on the end of the polishing shaft 18 away from the polishing motor 17 and is used to polish the workpiece. The end of the polishing head 19 away from the polishing shaft 18 is arranged in an arc shape and a texture group is arranged on the end of the polishing head 19 away from the polishing shaft 18 to accommodate abnormally large abrasive particles or external inclusions, avoid accidental scratches on the surface of hard and brittle components, and improve the material removal rate.

[0041] Continue to refer to Figure 4 Specifically, the texture group includes micro-pits 22 and micro-grooves 23, wherein the micro-pits 22 and micro-grooves 23 are both provided at one end of the polishing head 19 away from the polishing shaft 18, and multiple groups of micro-pits 22 are evenly distributed around the axis of the polishing head 19, and each group of micro-pits 22 is distributed along the radial direction of the polishing head 19. Multiple micro-grooves 23 are distributed along the radial direction of the polishing head 19, and each micro-groove 23 is arranged in a ring shape with its head and tail closed. Each micro-groove 23 and each group of micro-pits 22 are staggeredly distributed from the inside to the outside in sequence from the axial direction close to the polishing shaft 18, so as to ensure the structural strength of the polishing head 19 and stably realize the polishing process of the workpiece under the premise of maximizing the capacity of the texture group for abrasive particles or external inclusions.

[0042] The implementation principle of a texture-assisted electrochemical mechanical polishing device in an embodiment of the present application is as follows: when a workpiece needs to be polished, the workpiece is first placed on a placement seat 6, and then the x-axis linear module 2 drives the placement seat 6 to move in the x-axis direction, and the y-axis linear module 3 and the z-axis linear module 4 drive the rotating assembly and the polishing seat 16 to move in the y-axis and z-axis directions to achieve polishing of the flat surface on the top of the workpiece. When the curved surface of the workpiece is polished, the polishing rotating motor 11 drives the polishing seat 16 to swing and the placement rotating motor 7 drives the placement seat 6 to rotate, so that the polishing head 19 can achieve comprehensive polishing of the curved surface of the workpiece, which is convenient and fast. In addition, during the polishing process, one end of the curved surface of the polishing head 19 is conducive to ensuring the polishing quality of the curved surface of the workpiece, and the texture group composed of micro-pits 22 and micro-grooves 23 is convenient for accommodating abnormally large abrasive particles or external inclusions, avoiding accidental scratches on the surface of hard and brittle components and improving their material removal rate.

[0043] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A texture-assisted electrochemical mechanical polishing device, characterized in that: The invention comprises a frame (1), a polishing mechanism, a moving mechanism and a placing mechanism, wherein the polishing mechanism comprises a polishing seat (16), a polishing motor (17), a polishing shaft (18) and a polishing head (19), wherein the polishing motor (17) is mounted on the polishing seat (16) and is used to drive the polishing shaft (18) to rotate, and the polishing head (19) is coaxially fixedly mounted on the polishing shaft (18) and is used to polish a workpiece, and an end of the polishing head (19) away from the polishing shaft (18) is arranged in an arc shape and a texture group is arranged on an end of the polishing head (19) away from the polishing shaft (18); The motion mechanism comprises an x-axis linear module (2), a y-axis linear module (3), a z-axis linear module (4) and a polishing rotating assembly, wherein the x-axis linear module (2) is arranged on a frame (1) and is used to drive a placement mechanism to move along an x-axis direction, the placement mechanism is used to place a workpiece to be polished, the y-axis linear module (3) is arranged on the frame (1) and is used to drive the z-axis linear module (4) to move along the y-axis direction, the z-axis linear module (4) is used to drive the rotating assembly to move along the z-axis direction, and the polishing rotating assembly is used to drive the polishing seat (16) to rotate around the x-axis.

2. A texture-assisted electrochemical mechanical polishing device according to claim 1, characterized in that: The texture group comprises micro-pits (22) opened on the polishing head (19), and the micro-pits (22) are evenly distributed in a plurality of groups in the circumferential direction around the axis of the polishing head (19).

3. A texture-assisted electrochemical mechanical polishing device according to claim 2, characterized in that: The texture group further comprises micro grooves (23) opened on the polishing head (19), a plurality of micro grooves (23) are distributed along the radial direction of the polishing head (19), and each of the micro grooves (23) is arranged in a ring shape with the ends closed.

4. A texture-assisted electrochemical mechanical polishing device according to claim 3, characterized in that: Each group of micro-pits (22) has a plurality of micro-pits (22) distributed along the radial direction of the polishing head (19), and each of the micro-grooves (23) and each group of micro-pits (22) are distributed alternately in sequence.

5. The texture-assisted electrochemical mechanical polishing device according to claim 1, characterized in that: The polishing rotating assembly comprises a polishing rotating seat (10), a polishing rotating motor (11), a polishing worm (12) and a polishing worm wheel (13); the polishing rotating seat (10) is mounted on a slider of a z-axis linear module (4); the polishing rotating motor (11) is mounted on the polishing rotating seat (10) and is used to drive the polishing worm (12) to rotate; the polishing worm wheel (13) is rotatably mounted on the polishing rotating seat (10) and meshes with the polishing worm (12); the axis of the polishing worm wheel (13) extends along the x-axis direction and the polishing worm wheel (13) is fixedly mounted on the polishing seat (16).

6. A texture-assisted electrochemical mechanical polishing device according to claim 5, characterized in that: The polishing rotating seat (10) is provided with an installation groove (14), and the slider of the z-axis linear module (4) is slidably engaged in the installation groove (14). The slider of the z-axis linear module (4) is provided with a plurality of fixing holes (15) distributed along the vertical direction. The polishing rotating seat (10) is fixed to the slider of the z-axis linear module (4) by a bolt which is penetrated by the polishing rotating seat (10) and threadedly engaged with one of the fixing holes (15).

7. A texture-assisted electrochemical mechanical polishing device according to claim 1, characterized in that: The placement mechanism comprises a fixed seat (5), a placement seat (6) and a placement rotation assembly, wherein the fixed seat (5) is fixedly mounted on a slider of an x-axis linear module (2), and the placement rotation assembly comprises a placement rotation motor (7), a placement worm (8) and a placement worm wheel (9), wherein the placement rotation motor (7) is mounted on the fixed seat (5) and is used to drive the placement worm (8) to rotate, and the placement worm wheel (9) is rotationally mounted on the fixed seat (5) and meshes with the placement worm (8), wherein the axis of the placement worm wheel (9) extends along the z-axis direction and the placement worm wheel (9) is fixedly mounted on the placement seat (6), and the placement seat (6) is used to place a workpiece to be polished.

8. The texture-assisted electrochemical mechanical polishing device according to claim 1, characterized in that: The polishing seat (16) is provided with a mounting hole (20) extending therethrough; the polishing motor (17) is fixedly mounted with a mounting collar (21); the mounting collar (21) comprises a sleeve portion (211) and a positioning portion (212); the sleeve portion (211) is slidably fitted in the mounting hole (20); the positioning portion (212) is fixedly mounted on the outer peripheral surface of the sleeve portion (211); and the mounting collar (21) is fixed to the polishing seat (16) by bolts.

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