Structure for wide cluster beam deposition

Abstract

The utility model provides a structure for wide cluster beam deposition, which comprises a sputtering disc, a sputtering port is arranged at the inner end of the sputtering disc, a positioner is arranged at the outer end of the sputtering disc, a long limiter and a short limiter are arranged at the upper end of the sputtering port, positioning screws are arranged at the lower ends of the long limiter and the short limiter, and positioning nuts are arranged at the upper ends of the positioning screws. A movable groove is formed in the inner end of the positioning nut, a movable gear ring is arranged at the inner end of the movable groove, a tooth groove is formed in the outer end of the movable gear ring, a limiting groove is formed in the outer end of the tooth groove, sliding grooves are formed in the two ends of the movable groove, connecting rods are arranged at the inner ends of the sliding grooves, and clamping grooves and positioning rods are arranged at the inner ends of the connecting rods. On the premise that the structure of an original deposition system is not changed, the limiting stopper is designed and installed at the sputtering port, the deposition range is accurately regulated and controlled by regulating and controlling the position change of the limiting stopper, seamless splicing of double cluster beams is achieved, the production efficiency is improved, and the method is simple, controllable and low in cost and cannot generate other influences on the cluster deposition system.

Description

Technical Field

[0001] The utility model relates to the technical field of cluster beam deposition, in particular to a structure used for wide-width cluster beam deposition. Background Art

[0002] The sputtering disk is a component used to support the target material during the sputtering deposition process. It can achieve sputtering and deposition of materials through high-energy particle bombardment in a vacuum environment. The design of the sputtering disk is crucial to the efficiency of the sputtering process and the quality of the final deposited film. In the wide-width cluster beam deposition structure, the sputtering disk needs to be able to withstand the impact of high-speed particles while ensuring uniform transfer and deposition of materials. Cluster beam deposition technology is widely used in doping, etching, cleaning, smoothing and thin film deposition on the surface of workpieces. The slit of the dual-cluster beam deposition is rectangular. If there is no limiter, it can only be used with a single cluster deposition system, and the deposition range is unstable, making it difficult to accurately deposit on the required substrate surface.

[0003] In the prior art, during the use of cluster beam deposition:

[0004] ① The gas clusters produced by cluster ion sources through electron bombardment include several to thousands or more molecular aggregates. These gas clusters are large in size and are usually neutral or carry a small amount of charge, so they only act on a very shallow surface area;

[0005] ② The cluster beam deposition system has an efficient dual deposition sputtering chamber, but due to the influence of the sputtering port slit, it is impossible to achieve seamless connection of the dual cluster beams, the deposition range is unstable, and the deposition rate is low;

[0006] Therefore, we made improvements and proposed a structure for wide-width cluster beam deposition. Utility Model Content

[0007] The utility model aims to solve the problem that the current design of cluster beam deposition cannot install a limiter on the cluster beam path to accurately control the deposition range.

[0008] In order to achieve the above-mentioned utility model purpose, the utility model provides the following technical solutions:

[0009] A structure for wide-band cluster beam deposition is provided to improve the above problems.

[0010] The specific application is as follows:

[0011] A structure for wide-band cluster beam deposition comprises a sputtering disk, wherein the inner end of the sputtering disk is provided with a sputtering port, the outer end of the sputtering disk is provided with a positioner, the upper end of the sputtering port is provided with a long stopper and a short stopper, the lower ends of the long stopper and the short stopper are provided with a positioning screw, the upper end of the positioning screw is provided with a positioning nut, the inner end of the positioning nut is provided with a movable groove, the inner end of the movable groove is provided with a movable toothed ring, the outer end of the movable toothed ring is provided with a tooth groove, the outer end of the tooth groove is provided with a limiting groove, the two ends of the movable groove are provided with sliding grooves, the inner end of the sliding groove is provided with a connecting rod, the inner end of the connecting rod is provided with a clamping groove and a positioning rod, the outer end of the positioning rod is provided with a linkage spring, the inner end of the clamping groove is provided with a clamping block, and the upper end of the clamping block is provided with an electric rotating rod.

[0012] As the preferred technical solution of the present application, the positioning screw is fixed at the outer end of the sputtering port, and the positioning screw is wrapped around the inner end of the limit groove. The limit groove runs through the inner ends of the long limiter and the short limiter. The outer ends of the long limiter and the short limiter are connected to sensors, and scale lines are provided at both the upper and lower ends of the sputtering port.

[0013] As the preferred technical solution of the present application, the upper end of the positioning screw is movably connected to the positioning nut, the movable groove is embedded in the inner end of the positioning nut, the lower end of the movable groove passes through the lower end outer surface of the positioning nut, and the movable groove and the sliding groove are connected through.

[0014] As a preferred technical solution of the present application, the inner end of the movable groove is slidingly connected to the movable toothed ring, the outer end of the movable toothed ring is meshingly connected to the tooth groove, and the tooth groove is embedded in the inner end of the limiting groove.

[0015] As a preferred technical solution of the present application, the inner end of the slide groove is slidably connected to the connecting rod, the inner end of the connecting rod is snap-fittedly connected to the slot, the center of the connecting rod is penetrated by a positioning rod, and the positioning rod and the slide groove are fixedly connected.

[0016] As the preferred technical solution of the present application, the linkage spring is wrapped around the outer end of the positioning rod, the upper and lower ends of the linkage spring are respectively fixed on the inner surfaces of the lower ends of the connecting rod and the slide groove, the slot and the block are snap-fitted and connected, and the upper end of the block is fixedly connected to the electric rotating rod.

[0017] Compared with the prior art, the utility model has the following beneficial effects:

[0018] In the scheme of this application:

[0019] Without changing the structure of the original deposition system, a limiter is designed and installed at the sputtering port. By adjusting the position of the limiter, the deposition range can be accurately controlled to achieve seamless splicing of the dual cluster beams and improve production efficiency. This method is simple, controllable, low-cost and will not have other effects on the cluster deposition system. By adjusting the position of the limiter, the area and amount of deposition on the substrate can be accurately controlled, thereby improving production efficiency and output. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A schematic diagram of the overall upper structure of the structure for wide-band cluster beam deposition provided in the present application;

[0021] Figure 2 A schematic diagram of the overall lower structure of the structure for wide-width cluster beam deposition provided in the present application;

[0022] Figure 3 A schematic diagram of a side cross-sectional structure of a positioning screw of a structure for wide-width cluster beam deposition provided in the present application;

[0023] Figure 4 The structure for wide-width cluster beam deposition provided in this application Figure 3 A is a schematic diagram of the enlarged structure of the middle part;

[0024] Figure 5 A schematic diagram of a side cross-sectional structure of a limiting groove of a structure for wide-width cluster beam deposition provided in the present application;

[0025] Figure 6 The structure for wide-width cluster beam deposition provided in this application Figure 5 Schematic diagram of the enlarged structure of B.

[0026] Indicated in the figure:

[0027] 1. Sputtering disk; 2. Sputtering port; 3. Positioner; 4. Long limiter; 5. Short limiter; 6. Positioning screw; 7. Positioning nut; 8. Movable gear ring; 9. Tooth groove; 10. Movable groove; 11. Connecting rod; 12. Slot; 13. Block; 14. Positioning rod; 15. Linkage spring; 16. Limiting groove; 17. Electric rotating rod. DETAILED DESCRIPTION

[0028] To make the purpose, technical solution and advantages of the embodiment of the utility model clearer, the technical solution in the embodiment of the utility model will be described clearly and completely in conjunction with the accompanying drawings. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments.

[0029] Therefore, the following detailed description of the embodiments of the present invention is not intended to limit the scope of the present invention to be protected, but only represents some embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. It should be noted that the embodiments of the present invention and the features and technical solutions in the embodiments can be combined with each other without conflict.

[0030] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0031] like Figure 1-6 As shown, this embodiment proposes a structure for wide-band cluster beam deposition, including a sputtering disk 1, a sputtering port 2 is provided at the inner end of the sputtering disk 1, a positioner 3 is provided at the outer end of the sputtering disk 1, a long stopper 4 and a short stopper 5 are provided at the upper end of the sputtering port 2, a positioning screw 6 is provided at the lower end of the long stopper 4 and the short stopper 5, a positioning nut 7 is provided at the upper end of the positioning screw 6, a movable groove 10 is provided at the inner end of the positioning nut 7, a movable gear ring 8 is provided at the inner end of the movable groove 10, a tooth groove 9 is provided at the outer end of the movable gear ring 8, a limiting groove 16 is provided at the outer end of the tooth groove 9, a sliding groove is provided at both ends of the movable groove 10, a connecting rod 11 is provided at the inner end of the sliding groove, a clamping groove 12 and a positioning rod 14 are provided at the inner end of the connecting rod 11, a linkage spring 15 is provided at the outer end of the positioning rod 14, a clamping block 13 is provided at the inner end of the clamping block 13, and an electric rotating rod 17 is provided at the upper end of the clamping block 13.

[0032] The positioning screw 6 is fixed to the outer end of the sputtering port 2 , and the positioning screw 6 is wrapped around the inner end of the limiting groove 16 , and the limiting groove 16 runs through the inner ends of the long limiter 4 and the short limiter 5 .

[0033] The outer ends of the long limiter 4 and the short limiter 5 are connected to sensors, and scale lines are provided at the upper and lower ends of the sputtering port 2. Through the connection between the sensor and the scale lines, the electric rotating rod 17 pushes the movable gear ring 8 to rotate, and under the limitation of the tooth groove 9, the long limiter 4 and the short limiter 5 are pushed to the corresponding positions, which is convenient for adjusting the size of the sputtering port 2 and can facilitate wide-band cluster beam deposition.

[0034] The upper end of the positioning screw 6 is movably connected to the positioning nut 7, the movable groove 10 is embedded in the inner end of the positioning nut 7, the lower end of the movable groove 10 penetrates the lower end outer surface of the positioning nut 7, and the movable groove 10 is connected with the slide groove.

[0035] Four positioning screws 6 are respectively provided at the inner end of each long limiter 4, and two positioning screws 6 are respectively provided at the inner end of each short limiter 5. Two of the positioning screws 6 in the long limiter 4 are connected to the positioning nut 7 with a movable gear ring 8, and the positioning nut 7 is pushed to rotate by the electric rotating rod 17. The two positioning screws 6 of the short limit rod are both connected to the positioning nut 7 with a movable gear ring 8, and the remaining positioning nuts 7 are the positioning nuts 7 disclosed in the prior art, and there is no need to add components inside them.

[0036] The inner end of the movable groove 10 is slidably connected to the movable gear ring 8 , the outer end of the movable gear ring 8 is meshedly connected to the tooth groove 9 , and the tooth groove 9 is embedded and installed in the inner end of the limiting groove 16 .

[0037] The upper ends of the positioning screw rod 6 and the positioning nut 7 are movably connected via threads, and the movable groove 10 and the movable gear ring 8 are slidably connected.

[0038] The inner end of the slide slot is slidably connected to the connecting rod 11, and the inner end of the connecting rod 11 is snap-fittedly connected to the slot 12. The center of the connecting rod 11 is penetrated by a positioning rod 14, and the positioning rod 14 is fixedly connected to the slide slot.

[0039] The linkage spring 15 is wrapped around the outer end of the positioning rod 14, and the upper and lower ends of the linkage spring 15 are respectively fixed on the inner surface of the lower end of the connecting rod 11 and the slide groove, the card slot 12 and the card block 13 are card-engaged and connected, and the upper end of the card block 13 is fixedly connected to the electric rotating rod 17.

[0040] The electric rotating rod 17 drives the block 13 and the slot 12 to engage with each other. The electric rotating rod 17 moves downward to push the connecting rod 11 downward through the connection between the slot 12 and the block 13. Through the downward movement of the connecting rod 11, the linkage spring 15 is squeezed in the slide groove, driving the movable gear ring 8 to rotate. The rotation of the movable gear ring 8 drives the long limiter 4 or the short limiter 5 at the outer end of the tooth groove 9 to move.

[0041] When the present application is in use: when the size of the sputtering port 2 needs to be adjusted, the positioning nuts 7 on the long limiter 4 and the short limiter 5 are moved a certain distance relative to the positioning screw 6, and then the electric rotating rod 17 is energized to push the positioning nut 7 carrying the movable gear ring 8 to move, and the electric rotating rod 17 moves downward and pushes the connecting rod 11 downward through the connection between the card slot 12 and the card block 13. When the connecting rod 11 moves downward, the linkage spring 15 is squeezed in the slide groove, and the movable gear ring 8 is driven to rotate. The rotation of the movable gear ring 8 drives the long limiter 4 or the short limiter 5 at the outer end of the tooth groove 9 to move, and when the sensor is aligned with the set scale, the movable gear ring 8 is driven to rotate. When the degree lines correspond, stop the rotation of the electric rotating rod 17, move the electric rotating rod 17 upward, and then rotate all the positioning nuts 7 on the long limiter 4 and the short limiter 5 to position the long limiter 4 and the short limiter 5. The size of the sputtering port 2 for dual-cluster beam deposition can be accurately positioned, which is convenient for accurately positioning the deposition range. Under the premise of not changing the original deposition system structure, a limiter is designed and installed at the sputtering port 2. By adjusting the position change of the limiter, the deposition range can be accurately controlled to achieve seamless splicing of the dual-cluster beams, thereby improving production efficiency. This method is simple, controllable, low-cost and will not have other effects on the cluster deposition system.

[0042] The above embodiments are only used to illustrate the present invention and are not intended to limit the technical solutions described in the present invention. Although the present invention has been described in detail with reference to the above embodiments, the present invention is not limited to the above specific implementation methods. Therefore, any modification or equivalent replacement of the present invention; and all technical solutions and improvements thereof that do not depart from the spirit and scope of the present invention are included in the scope of the claims of the present invention.

Claims

1. A structure for wide-band cluster beam deposition, comprising a sputtering disk (1), characterized in that: The inner end of the sputtering disk (1) is provided with a sputtering port (2), the outer end of the sputtering disk (1) is provided with a positioner (3), the upper end of the sputtering port (2) is provided with a long stopper (4) and a short stopper (5), the lower ends of the long stopper (4) and the short stopper (5) are both provided with a positioning screw (6), the upper end of the positioning screw (6) is provided with a positioning nut (7), the inner end of the positioning nut (7) is provided with a movable groove (10), and the inner end of the movable groove (10) is provided with a movable gear ring (8), The outer end of the movable tooth ring (8) is provided with a tooth groove (9), the outer end of the tooth groove (9) is provided with a limit groove (16), both ends of the movable groove (10) are provided with a slide groove, the inner end of the slide groove is provided with a connecting rod (11), the inner end of the connecting rod (11) is provided with a clamping groove (12) and a positioning rod (14), the outer end of the positioning rod (14) is provided with a linkage spring (15), the inner end of the clamping groove (12) is provided with a clamping block (13), and the upper end of the clamping block (13) is provided with an electric rotating rod (17).

2. A structure for wide-band cluster beam deposition according to claim 1, characterized in that: The positioning screw (6) is fixed to the outer end of the sputtering port (2), and the positioning screw (6) is wrapped around the inner end of the limit groove (16). The limit groove (16) runs through the inner ends of the long limiter (4) and the short limiter (5). The outer ends of the long limiter (4) and the short limiter (5) are connected to sensors, and scale lines are provided at the upper and lower ends of the sputtering port (2).

3. The structure for wide-band cluster beam deposition according to claim 2, characterized in that: The upper end of the positioning screw (6) is movably connected to the positioning nut (7), the movable groove (10) is embedded and installed in the inner end of the positioning nut (7), the lower end of the movable groove (10) penetrates the outer surface of the lower end of the positioning nut (7), and the movable groove (10) is connected to the sliding groove.

4. The structure for wide-band cluster beam deposition according to claim 3, characterized in that: The inner end of the movable groove (10) is slidably connected to the movable toothed ring (8), the outer end of the movable toothed ring (8) is meshingly connected to the tooth groove (9), and the tooth groove (9) is embedded and installed in the inner end of the limiting groove (16).

5. The structure for wide-band cluster beam deposition according to claim 4, characterized in that: The inner end of the slide groove is slidably connected to the connecting rod (11), the inner end of the connecting rod (11) is snap-fittedly connected to the locking groove (12), the center of the connecting rod (11) is penetrated by a positioning rod (14), and the positioning rod (14) is fixedly connected to the slide groove.

6. The structure for wide-band cluster beam deposition according to claim 5, characterized in that: The linkage spring (15) is wrapped around the outer end of the positioning rod (14), and the upper and lower ends of the linkage spring (15) are respectively fixed to the inner surface of the lower end of the connecting rod (11) and the sliding groove, the clamping groove (12) and the clamping block (13) are clamped and connected, and the upper end of the clamping block (13) is fixedly connected to the electric rotating rod (17).

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