Flow guide ring and plasma processing device

Abstract

The utility model provides a flow guide ring and a plasma processing device, the flow guide ring comprises a flow guide ring body and an aperture adjusting mechanism, the flow guide ring body is provided with a flow guide hole, the aperture adjusting mechanism is provided with a gas flow channel corresponding to the flow guide hole, and the aperture adjusting mechanism can adjust the gas flow channel on the aperture adjusting mechanism. Therefore, the flow velocity of the gas flowing through the flow guide hole can be adjusted, and the conductance in the cavity of the plasma processing device can be adjusted.

Description

Technical Field

[0001] The present application belongs to the field of semiconductor manufacturing technology, and more specifically, relates to a guide ring and a plasma processing device. Background Art

[0002] In plasma etching, as the key dimensions of technology nodes continue to shrink, people have higher requirements for etching performance. The in-cavity conductance is related to the cavity vacuum volume, cavity inner diameter, molecular pump caliber and molecular pump power. High cavity conductance can also accelerate the gas exchange efficiency of reactants and products in the cavity, reduce the density load effect and depth load effect, and improve etching accuracy.

[0003] At present, there is a guide ring component inside the plasma etching chamber. The guide ring plays a role of restraining the plasma in the chamber, and the design of the guide ring also determines the size of the flow conductance in the chamber. Among them, the guide holes on the guide ring need to be designed according to different process applications. For example, under high RF power applications, the depth-to-width ratio of the guide holes should be increased to avoid plasma leakage, while in fine etching, the depth-to-width ratio of the guide holes needs to be reduced to improve the flow conductance. However, at present, in actual production applications, when the cavity design is fixed and the molecular pump model is selected, the size of the guide holes on the guide ring is also fixed, and its size cannot be adjusted. If you want to change the chamber conductance, you must open the cavity and replace the guide ring. Summary of the invention

[0004] The purpose of the embodiments of the present application is to provide a guide ring and a plasma processing device to solve the technical problem in the prior art that the diameter of the guide holes on the guide ring cannot be adjusted.

[0005] In order to achieve the above-mentioned purpose, the technical solution adopted in the present application is: to provide a guide ring, comprising:

[0006] The guide ring body is provided with a guide hole, and the guide hole runs through the guide ring body;

[0007] An aperture adjustment mechanism is arranged at one end of the guide ring body along the axial direction of the guide hole. The aperture adjustment mechanism is provided with a gas flow channel, which runs through the aperture adjustment mechanism, and the position of the gas flow channel corresponds to the position of the guide hole. The aperture adjustment mechanism adjusts the flow rate of the gas through the guide hole by adjusting the aperture of the gas flow channel.

[0008] According to the above technical solution, the aperture adjustment mechanism is provided with the gas flow channel, the gas flow channel is coaxially arranged with the guide hole, the aperture adjustment mechanism is fitted with one side of the guide ring body, and the aperture adjustment mechanism is arranged at the inlet end of the guide hole on the guide ring body, or the aperture adjustment mechanism is arranged at the outlet end of the guide hole on the guide ring body, and correspondingly, the gas enters the guide hole from the gas flow channel, or the gas enters the gas flow channel from the guide hole. The aperture adjustment mechanism can adjust the gas flow channel thereon to adjust the aperture of the guide hole, thereby adjusting the flow rate of the gas flowing through the guide hole, and further adjusting the flow conductance in the cavity of the plasma processing device.

[0009] Optionally, the aperture adjustment mechanism comprises:

[0010] A base, connected to the guide ring body;

[0011] A blade is rotatably connected to the base, and the blade has a first position and a second position relative to the base;

[0012] a driving plate, rotatably connected to the base and located at a side of the blade away from the base, the driving plate being used to drive the blade to move between the first position and the second position;

[0013] When the blade is located at the first position, the gas flow channel formed by the blade has a first aperture; when the blade is located at the second position, the gas flow channel formed by the blade has a second aperture;

[0014] A driving motor, used for driving the driving plate to rotate relative to the base;

[0015] Wherein, the diameter of the first aperture is greater than the diameter of the second aperture.

[0016] By adopting the above technical solution, the base and the driving plate are both provided with through holes, the through holes on the bottom plate and the driving plate are coaxially arranged to form the gas flow channel, the gas flow channel is coaxially arranged with the guide hole, and the base is fixedly connected to the guide ring body.

[0017] The driving plate rotates relative to the base under the drive of the driving motor. When the driving plate rotates, the driving plate drives the blade to rotate from the first position to the second position, or from the second position to the first position, and to any position between the first position and the second position.

[0018] When the blade is in the first position, the inner side of the blade forms the gas flow channel with a first aperture on the gas flow channel; when the blade is in the second position, the inner side of the blade forms the gas flow channel with a second aperture on the gas flow channel, wherein the first aperture is the same as the diameter of the guide hole, the diameter of the first aperture is equal to the diameter of the guide hole, and the diameter of the second aperture is smaller than the diameter of the first aperture.

[0019] The driving motor drives the driving plate to rotate relative to the base, and the driving plate drives the blades to rotate to any position between the first position and the second position when rotating, so as to adjust the aperture of the gas flow channel, and further adjust the flow rate and flow of the gas flowing through the guide hole.

[0020] Optionally, an adjusting rod is provided on the blade, an adjusting slot is provided on the driving plate, and the adjusting rod is slidably connected in the adjusting slot.

[0021] By adopting the above technical solution, when the driving motor drives the driving plate to rotate relative to the base, the adjusting rod slides in the adjusting slot, thereby driving the blade to rotate from the first position to the second position, or from the second position to the first position, and to any position between the first position and the second position.

[0022] Optionally, an extension direction of the adjustment slot is arranged at an angle to a radial direction of the driving plate.

[0023] By adopting the above technical solution, the extending direction of the adjusting groove is set at an angle with the radial direction of the driving plate, so that the adjusting rod can slide in the adjusting groove.

[0024] Optionally, a rotating shaft is provided on the blade, the rotating shaft is rotatably connected to the base, and the rotating shaft is spaced apart from the adjusting rod.

[0025] By adopting the above technical solution, the rotating shaft is fixedly connected to the side of the blade facing the base, and the rotating shaft is rotatably connected to the base. The driving plate drives the blade to rotate around the central axis of the rotating shaft through the adjusting rod, so that the blade rotates from the first position to the second position, or from the second position to the first position, and rotates to any position between the first position and the second position.

[0026] Optionally, an arc-shaped curved surface structure is provided on the inner side of the blade, and the number of the blades is multiple, and the multiple blades are spaced apart along the circumference of the base;

[0027] When the blades are located at the first position, parts of the inner side walls of the plurality of blades together form the first aperture;

[0028] When the blades are located at the second position, parts of the inner side walls of the plurality of blades together form the second aperture.

[0029] By adopting the above technical solution, when the driving plate rotates, it simultaneously drives the multiple blades to rotate relative to the base, and by setting the inner side of the blades to an arc-shaped curved surface structure, the inner side walls of a portion of each blade among the multiple blades and the inner side walls of the portions of other blades together form a circular hole structure, and the hole structure and the through holes on the base and the driving plate together constitute a gas flow channel.

[0030] The plurality of blades rotate between the first position and the second position at the same time, thereby adjusting the diameter of the hole structure formed between the inner walls of the plurality of blades to adjust the diameter of the gas flow channel. Since the gas flow channel is coaxially arranged with the guide hole, the flow rate of the gas flowing through the guide hole can be adjusted.

[0031] Optionally, there are multiple flow guide holes and multiple aperture adjustment mechanisms, and the multiple aperture adjustment mechanisms correspond one-to-one to the multiple flow guide holes. Each aperture adjustment mechanism is used to adjust the flow rate of the gas in the corresponding flow guide hole.

[0032] By adopting the above technical solution, a plurality of guide holes are arranged on the guide ring body 10, so that the gas can flow through multiple positions on the guide plate, and each of the guide holes corresponds to the aperture adjustment mechanism, and each of the aperture adjustment mechanisms is used to adjust the flow rate of the gas through the corresponding guide hole, so as to adjust the flow rate of the gas when passing through the guide holes at different positions.

[0033] Optionally, in the plurality of aperture adjustment mechanisms, the plurality of driving plates are driven to rotate respectively by the plurality of driving motors;

[0034] The plurality of driving motors correspond one-to-one to the plurality of aperture adjustment mechanisms, and each driving motor is used to drive the corresponding driving plate to rotate.

[0035] By adopting the above technical solution, among the multiple aperture adjustment mechanisms, each driving plate is driven separately by the corresponding driving motor, and the aperture adjustment mechanisms located at different positions can adjust the flow rate of the gas flowing through the corresponding guide holes as needed, so as to adjust the flow conductance at different positions in the cavity of the plasma processing device.

[0036] Optionally, in the plurality of aperture adjustment mechanisms, each of the drive motors drives at least N drive plates to rotate, wherein N is a positive integer greater than 1.

[0037] By adopting the above technical solution, the multiple driving plates of the multiple aperture adjustment mechanisms are driven simultaneously by the same driving motor, so that the same driving motor can adjust the aperture of the gas flow channel at the same time to achieve simultaneous change in the flow rate of the gas flowing through the multiple guide holes.

[0038] The beneficial effect of the guide ring provided in the present application is that: compared with the prior art, the guide ring provided in the present application includes a guide ring body and an aperture adjustment mechanism. The guide ring body is provided with a guide hole, and the aperture adjustment mechanism is provided with a gas flow channel corresponding to the guide hole. The aperture adjustment mechanism can adjust the gas flow channel thereon to adjust the aperture of the guide hole, thereby adjusting the flow rate of the gas flowing through the guide hole, and further realizing the adjustment of the flow conductance in the cavity of the plasma processing device.

[0039] In a second aspect, the present application provides a plasma processing device, comprising:

[0040] A guide ring, wherein the guide ring is the guide ring described in any one of the above items.

[0041] The beneficial effect of the guide ring provided in the present application is that: compared with the prior art, the plasma processing device provided in the present application includes the guide ring provided by any one of the above items, the guide ring includes a guide ring body and an aperture adjustment mechanism, the guide ring body is provided with a guide hole, the aperture adjustment mechanism is provided with a gas flow channel corresponding to the guide hole, and the aperture adjustment mechanism can adjust the gas flow channel thereon to adjust the aperture of the guide hole, thereby adjusting the flow rate of the gas flowing through the guide hole, and further realizing the adjustment of the flow conductance in the cavity of the plasma processing device. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0043] Figure 1 A schematic diagram of the structure of the guide ring provided in an embodiment of the present application;

[0044] Figure 2 A top view of the aperture adjustment mechanism provided in the embodiment of the present application Figure 1 ;

[0045] Figure 3A top view of the aperture adjustment mechanism provided in the embodiment of the present application Figure 2 ;

[0046] Figure 4 A side view of the aperture adjustment mechanism provided in an embodiment of the present application;

[0047] Figure 5 This is a schematic diagram of the structure when the blade is in the first position in the present application;

[0048] Figure 6 This is a schematic diagram of the structure when the blade is located at the second position in the present application;

[0049] Figure 7 A schematic diagram of the structure of a base provided in an embodiment of the present application;

[0050] Figure 8 A schematic diagram of the structure of a drive board provided in an embodiment of the present application;

[0051] Fig. 9 A cross-sectional view of an adjustment groove provided in an embodiment of the present application;

[0052] Fig.10 A cross-sectional view of an adjustment groove provided in another embodiment of the present application;

[0053] Fig.11 This is a schematic structural diagram of a guide ring body used in an embodiment of the present application;

[0054] Fig.12 A schematic diagram of the structure of a driving motor provided in an embodiment of the present application driving a blade to be in a first position through a driving plate;

[0055] Fig.13 A schematic diagram of the structure of a driving motor provided in an embodiment of the present application driving a blade to be in a second position through a driving plate;

[0056] Fig.14 for Fig.12 Schematic diagram of the distribution of multiple drive motors;

[0057] Fig.15 This is a schematic diagram of the structure when the driving motor provided in one embodiment of the present application drives the blade to be in the first position through the rack;

[0058] Fig.16 This is a schematic diagram of the distribution of multiple driving motors in another embodiment of the present application;

[0059] Fig.17 This is a structural schematic diagram of another embodiment of the present application when the driving motor is located at the first position through the driving gear blade;

[0060] Fig.18This is a schematic structural diagram of a guide ring body used in another embodiment of the present application;

[0061] Fig.19 A schematic diagram of a structure in which a driving motor provided in an embodiment of the present application drives a plurality of blades to rotate through a driving plate;

[0062] Fig. 20 for Fig.19 Schematic diagram of the distribution of multiple drive motors;

[0063] Fig.21 A schematic diagram of a structure in which a driving motor provided in another embodiment of the present application drives multiple blades to rotate through a rack;

[0064] Fig. 22 for Fig.21 Schematic diagram of the distribution of multiple drive motors;

[0065] Fig.23 A schematic structural diagram of a drive motor provided in another embodiment of the present application driving multiple blades to rotate via a gear ring.

[0066] Among them, the reference numerals in the figure are:

[0067] 10. Guide ring body; 11. Guide hole; 11a. Guide hole group; 20. Aperture adjustment mechanism; 20a. Gas flow channel; 21. Base; 211. First through hole; 212. Adapter hole; 22. Blade; 23. Drive plate; 231. Second through hole; 232. Adjustment slot; 233. Tooth structure; 24. Drive motor; 25. Adjustment rod; 26. Rotating shaft; 30. Screw; 31. Screw nut; 32. Connecting plate; 33. Rack; 34. Drive gear; 40. Gear ring. DETAILED DESCRIPTION

[0068] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0069] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0070] It should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0071] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0072] Please also read Figures 1 to 23 , the guide ring and plasma processing device provided in the embodiments of the present application are now described.

[0073] In a first aspect, the present application provides a guide ring, comprising a guide ring body 10 and an aperture adjustment mechanism 20 .

[0074] See also Figure 1 , Fig.11 and Fig.18 The guide ring body 10 is an annular structure, and a guide hole 11 is provided on the guide ring body 10. The guide hole 11 penetrates the guide ring body 10 along the thickness direction of the guide ring body 10. The guide hole 11 has an inlet end and an outlet end which are arranged oppositely along its axial direction.

[0075] See also Figures 1 to 3 The aperture adjustment mechanism 20 is arranged at one end of the guide ring body 10 along the axial direction of the guide hole 11. Specifically, the aperture adjustment mechanism 20 can be arranged at the inlet end of the guide hole 11. Of course, the aperture adjustment mechanism 20 can also be arranged at the outlet end of the guide hole 11. For the sake of convenience, in this application, the aperture adjustment mechanism 20 can be arranged at the inlet end of the guide hole 11 as an example.

[0076] The aperture adjustment mechanism 20 is formed with a gas flow channel 20a, which runs through the aperture adjustment mechanism 20, and the position of the gas flow channel 20a corresponds to and is connected to the position of the guide hole 11, and the position of the gas flow channel 20a is coaxially arranged with the guide hole 11. The aperture adjustment mechanism 20 adjusts the flow rate of the gas through the guide hole 11 by adjusting the aperture of the gas flow channel 20a.

[0077] The aperture adjustment mechanism 20 is fitted to one side of the guide ring body 10 close to the inlet end of the guide hole 11. Correspondingly, the gas enters the guide hole 11 from the gas flow channel 20a. The aperture adjustment mechanism 20 can adjust the aperture of the gas flow channel 20a arranged thereon, thereby adjusting the aperture of the guide hole 11, thereby adjusting the flow rate of the gas flowing through the guide hole 11, and further adjusting the flow conductance in the cavity of the plasma processing device.

[0078] Compared with the prior art, the guide ring provided in the present application includes a guide ring body 10 and an aperture adjustment mechanism 20. The guide ring body 10 is provided with a guide hole 11, and the aperture adjustment mechanism 20 is provided with a gas flow channel 20a corresponding to the guide hole 11. The aperture adjustment mechanism 20 can adjust the gas flow channel 20a thereon to adjust the aperture of the guide hole 11, thereby adjusting the flow rate of the gas flowing through the guide hole 11, and further realizing the adjustment of the flow conductance in the cavity of the plasma processing device.

[0079] In one embodiment of the present application, see Figures 2 to 8 The aperture adjustment mechanism 20 includes a base 21, blades 22, a driving plate 23 and a driving motor 24.

[0080] The base 21 is connected to one side of the guide ring body 10 close to the inlet end of the guide hole 11 . The base 21 is an annular structure and is provided with a first through hole 211 . The first through hole 211 is coaxially arranged with the guide hole 11 .

[0081] The blade 22 is rotatably connected to a side of the base 21 away from the guide ring body 10 , and the blade 22 has a first position and a second position relative to the base 21 .

[0082] The drive plate 23 is an annular structure and is provided with a second through hole 231. The second through hole 231 has the same diameter as the first through hole 211 and is coaxially arranged to form a gas flow channel 20a. The drive plate 23 is rotatably connected to the base 21 and is located on the side of the blade 22 away from the base 21.

[0083] The driving motor 24 is a servo motor, and the driving motor 24 is connected to the chamber in the plasma processing device. The driving motor 24 is used to drive the driving plate 23 to rotate relative to the base 21. When the driving plate 23 rotates, the blade 22 is driven to rotate from the first position to the second position, or from the second position to the first position, so as to rotate the blade 22 to any position between the first position and the second position as needed.

[0084] When the blade 22 rotates to the first position, the blade 22 forms a first aperture on the gas flow channel 20a; when the blade 22 is in the second position, the blade 22 forms a second aperture on the gas flow channel 20a, wherein the diameter of the first aperture is equal to the diameter of the guide hole 11, and the diameter of the first aperture is greater than the diameter of the second aperture.

[0085] The driving plate 23 rotates relative to the base 21 under the drive of the driving motor 24. When the driving plate 23 rotates, the driving plate 23 drives the blade 22 to rotate from the first position to the second position, or from the second position to the first position, or to any position between the first position and the second position.

[0086] The driving motor 24 drives the driving plate 23 to rotate relative to the base 21. When the driving plate 23 rotates, it drives the blade 22 to rotate to the first position and the second position, or to any position between the first position and the second position, so as to adjust the aperture of the gas flow channel 20a, thereby adjusting the diameter of the guide hole 11, and further adjusting the flow rate and flow of the gas flowing through the guide hole 11.

[0087] In one embodiment of the present application, see Figures 2 to 9 The blade 22 is provided with an adjusting rod 25 , the driving plate 23 is provided with an adjusting slot 232 , and the adjusting rod 25 is slidably connected in the adjusting slot 232 .

[0088] The adjustment rod 25 is a cylindrical rod-shaped structure and is disposed on the side of the blade 22 facing the driving plate 23 . The adjustment slot 232 penetrates the driving plate 23 along the thickness direction of the driving plate 23 , and the adjustment rod 25 is slidably connected in the adjustment slot 232 .

[0089] When the driving motor 24 drives the driving plate 23 to rotate relative to the base 21, the adjusting rod 25 slides in the adjusting slot 232, thereby driving the blade 22 to rotate from the first position to the second position, or from the second position to the first position, or to any position between the first position and the second position.

[0090] In another implementation of the application, see Fig.10 The adjustment groove 232 is arranged on the side of the driving plate 23 facing the blade 22, and along the thickness direction of the driving plate 23, the depth dimension of the adjustment groove 232 is smaller than the thickness dimension of the driving plate 23, and the end of the adjustment rod 25 away from the blade 22 is slidably connected in the adjustment groove 232.

[0091] In one implementation of this application, see Figure 3 and Figure 8 The extending direction of the adjusting slot 232 is set at an angle to the radial direction of the driving plate 23. By setting the extending direction of the adjusting slot 232 at an angle to the radial direction of the driving plate 23, the adjusting rod 25 can slide in the adjusting slot 232.

[0092] In another embodiment of the present application, the adjusting slot 232 is an arc-shaped structure. By setting the arc-shaped slot as an arc-shaped structure, the adjusting rod 25 can slide in the adjusting slot 232 easily.

[0093] In this application, please refer to Figure 4 , Figure 7 and Fig. 9 The blade 22 is rotatably connected to the base 21 via a rotating shaft 26 .

[0094] In one embodiment of the present application, the rotating shaft 26 is fixedly connected to the side of the blade 22 facing the base 21, and the side of the base 21 facing the blade 22 is provided with a transfer hole 212, and the end of the rotating shaft 26 away from the blade 22 is rotatably connected to the transfer hole 212, so as to realize the rotation connection between the blade 22 and the base 21. The rotating shaft 26 and the adjusting rod 25 are arranged at intervals. The driving plate 23 drives the blade 22 to rotate around the central axis of the rotating shaft 26 through the adjusting rod 25, so that the blade 22 rotates from the first position to the second position, or rotates from the second position to the first position, and rotates to any position between the first position and the second position.

[0095] In another embodiment of the present application, the rotating shaft 26 is fixedly connected to the side of the base 21 facing the blade 22, and a connecting hole 212 is provided on the side of the blade 22 facing the base 21, and the end of the rotating shaft 26 away from the base 21 is rotatably connected to the connecting hole 212, thereby realizing the rotatable connection between the blade 22 and the base 21.

[0096] In this application, please refer to Figure 3 , Figure 5 and Figure 6 , an arc-shaped curved surface structure is provided on the inner side of the blade 22, and the number of blades 22 is multiple, and the multiple blades 22 are spaced apart along the circumference of the base 21. When the blades 22 are all in the first position, parts of the inner side walls of the multiple blades 22 together form a first aperture. When the blades 22 are all in the second position, parts of the inner side walls of the multiple blades 22 together form a second aperture.

[0097] When the driving plate 23 rotates, it drives the multiple blades 22 to rotate relative to the base 21 at the same time. By setting the inner side of the blade 22 to an arc-shaped curved surface structure, the inner side wall of a portion of each blade 22 and the inner side walls of the other blades 22 form a circular hole structure together, and the hole structure is connected to the first through hole 211 and the second through hole 231 to jointly form a gas flow channel 20a.

[0098] The multiple blades 22 rotate between the first position and the second position at the same time, thereby adjusting the diameter of the hole structure formed between the inner walls of the multiple blades 22 to adjust the diameter of the gas flow channel 20a. Since the gas flow channel 20a is coaxially arranged with the guide hole 11, the flow rate of the gas flowing through the guide hole 11 can be adjusted.

[0099] In one implementation of this application, see Fig.11 The number of the guide holes 11 and the aperture adjustment mechanism 20 are both multiple, the multiple guide holes 11 are evenly spaced along the circumference of the guide ring body 10, the multiple aperture adjustment mechanisms 20 correspond one-to-one to the multiple guide holes 11, and each aperture adjustment mechanism 20 is used to adjust the flow rate of the gas in the corresponding guide hole 11.

[0100] A plurality of guide holes 11 are arranged on the guide ring body 10 so that the gas can flow through a plurality of positions on the guide ring body 10. Each guide hole 11 corresponds to an aperture adjustment mechanism 20. Each aperture adjustment mechanism 20 is used to adjust the flow rate of the gas through the corresponding guide hole 11, so as to adjust the flow rate of the gas through the guide holes 11 at different positions.

[0101] The plurality of guide holes 11 are evenly spaced along the circumference of the guide ring body 10, and each guide hole 11 is provided with an aperture adjustment mechanism 20. The driving plate 23 in each aperture adjustment mechanism 20 is driven to rotate by a corresponding driving motor 24.

[0102] In one embodiment of the present application, please refer to Figures 11 to 14 A screw rod 30 is connected to the motor shaft of the driving motor 24, a screw nut 31 is threadedly connected to the screw rod 30, and a connecting plate 32 is rotatably connected to the screw nut 31. The driving plate 23 is rotatably connected to the connecting plate 32. When the driving motor 24 rotates, it drives the screw rod 30 to rotate, and when the screw rod 30 rotates, it drives the screw nut 31 to move relative to the screw rod 30 along the axial direction of the screw rod 30. The screw nut 31 drives the driving plate 23 to rotate through the connecting plate 32, so as to adjust the aperture of the gas flow channel 20a on the aperture adjustment mechanism 20, and then adjust the aperture of the guide hole 11.

[0103] In another embodiment of the present application, please refer to Fig.15 and Fig.16The motor shaft of the driving motor 24 is connected with a screw rod 30, a screw rod nut 31 is threadedly connected to the screw rod 30, a rack 33 is connected to the screw rod nut 31, and a tooth structure 233 is provided on the outer wall of the driving plate 23, and the tooth structure 233 is meshed with the rack 33. When the driving motor 24 rotates, it drives the screw rod 30 to rotate, and when the screw rod 30 rotates, it drives the screw rod nut 31 to move relative to the screw rod 30 along the axial direction of the screw rod 30, and the screw rod nut 31 drives the driving plate 23 to rotate through the rack 33, so as to adjust the aperture of the gas flow channel 20a on the aperture adjustment mechanism 20, and then adjust the aperture of the guide hole 11.

[0104] In another embodiment of the present application, please refer to Fig.17 The motor shaft of the driving motor 24 is provided with a driving gear 34, and the outer wall of the driving plate 23 is provided with a tooth structure 233, which meshes with the driving gear 34. When the driving motor 24 rotates, the driving gear 34 is driven to rotate, and when the driving gear 34 rotates, the driving plate 23 is driven to rotate, so as to adjust the aperture of the gas flow channel 20a on the aperture adjustment mechanism 20, and further adjust the aperture of the guide hole 11.

[0105] It should be noted that since the drive motor 24 is a servo motor, the rotation angle of the motor shaft of the drive motor 24 can be controlled as needed to adjust the movement distance of the N lead screw nuts 31 on the lead screw 30, so that the lead screw nuts 31 can drive the rotation angle of the drive plate 23, thereby adjusting the gas flow channel 20a to the required aperture.

[0106] At the same time, the rotation angle of the driving motor 24 located at different positions can be adjusted as needed, thereby adjusting the rotation angle of the driving plate 23 corresponding to the driving motor 24, and then adjusting the gas flow channel 20a corresponding to the guide holes 11 located at different positions to the required aperture, so as to change the flow conductance in the cavity of the plasma processing device.

[0107] In another embodiment of the present application, each driving motor 24 drives at least N driving plates 23 to rotate, wherein N is a positive integer greater than 1.

[0108] For details, please refer to Fig.18 The multiple guide holes 11 are divided into X guide hole groups 11a, where X is a positive integer greater than or equal to 1, and the X guide hole groups 11a are evenly spaced along the circumference of the guide ring body 10. Each guide hole group 11a includes N guide holes 11, where N is a positive integer greater than 1, and the N guide holes 11 in each guide hole group 11a are evenly spaced along the radial direction of the guide ring body 10.

[0109] In one embodiment of the present application, see Fig.19 and Fig. 20The N guide holes 11 in the same guide hole group 11a are driven by the same driving motor 24. In the N guide holes 11 in the guide hole group 11a, each guide hole 11 is provided with an aperture adjustment mechanism 20. A lead screw 30 is connected to the motor shaft of the driving motor 24, and N lead screw nuts 31 corresponding to the number of the N guide holes 11 are threadedly connected to the lead screw 30, and a connecting plate 32 is rotatably connected to each lead screw nut 31.

[0110] Each of the N driving plates 23 is rotatably connected to a connecting plate 32 opposite thereto. The driving motor 24 drives the screw rod 30 to rotate when rotating, and the screw rod 30 drives the N screw nuts 31 to move relative to the screw rod 30 along the axial direction of the screw rod 30 when rotating. The N screw nuts 31 respectively and simultaneously drive the N driving plates 23 to rotate through the N connecting plates 32, so as to adjust the apertures of the N gas flow channels 20a on the N aperture adjustment mechanisms 20, and further adjust the apertures of the N guide holes 11.

[0111] In another embodiment of the present application, see Fig.21 and Fig. 22 The same driving motor 24 is used to drive the N guide holes 11 in the same guide hole group 11a. In the N guide holes 11 in the guide hole group 11a, each guide hole 11 is provided with an aperture adjustment mechanism 20. A lead screw 30 is connected to the motor shaft of the driving motor 24. N lead screw nuts 31 corresponding to the number of the N guide holes 11 are threadedly connected to the lead screw 30. A rack 33 is connected to each lead screw nut 31.

[0112] Among the N driving plates 23, a tooth structure 233 is provided on the outer wall of each driving plate 23, and the tooth structure 233 on each driving plate 23 is meshed with the corresponding rack 33. The driving motor 24 drives the screw rod 30 to rotate when rotating, and the screw rod 30 drives the N racks 33 to move relative to the screw rod 30 along the axial direction of the screw rod 30 when rotating. The N screw nuts 31 drive the N driving plates 23 to rotate respectively and simultaneously through the N racks 33, so as to adjust the aperture of the N gas flow channels 20a on the N aperture adjustment mechanisms 20, and then adjust the aperture of the N guide holes 11.

[0113] The rotation angle of the driving motor 24 located at different positions can be adjusted as needed, thereby adjusting the rotation angle of the N driving plates 23 corresponding to the driving motor 24, and further adjusting the gas flow channel 20a corresponding to the guide holes 11 located at different positions to the required aperture to change the flow conductance in the cavity of the plasma processing device.

[0114] In another embodiment of the present application, see Figures 19 to 22The same driving motor 24 is used to simultaneously drive 2N guide holes 11 in two guide hole groups 11a, wherein the two guide hole groups 11a and the 2N aperture adjustment mechanisms 20 corresponding to the two guide hole groups 11a are symmetrically arranged about the driving screw 30.

[0115] In another embodiment of the present application, see Fig.23 , N guide holes 11 are evenly spaced along the circumference of the guide ring body 10, that is, the N guide holes 11 are arranged in an annular shape on the guide ring body 10. Among the N guide holes 11, each guide hole 11 corresponds to an aperture adjustment mechanism 20. Since the N guide holes 11 are arranged in an annular shape on the guide ring body 10, the N aperture adjustment mechanisms 20 are also arranged in an annular shape on the guide ring body 10. Among the N aperture adjustment mechanisms 20, the outer side of the driving plate 23 in each aperture adjustment mechanism 20 is provided with a tooth structure 233, the motor shaft of the driving motor 24 is provided with a driving gear 34, and the guide ring body 10 is rotatably connected with an annular gear ring 40, and the inner side wall or the outer side wall of the gear ring 40 is provided with a gear structure, and the tooth structure on the gear ring 40 is simultaneously meshed with the tooth structure 233 on the outer side of the N driving plates 23, and the driving gear 34 is meshed with the gear ring 40.

[0116] When the driving motor 24 rotates, the gear ring 40 is driven to rotate through the driving gear 34. When the gear ring 40 rotates, it simultaneously drives the N driving plates 23 to rotate, so as to adjust the apertures of the N gas flow channels 20a at the same time, thereby adjusting the apertures of the N guide holes 11.

[0117] In a second aspect, the present application provides a plasma processing device, comprising a guide ring, wherein the guide ring is the guide ring provided by any one of the above embodiments.

[0118] Compared with the prior art, the plasma processing device provided in the present application includes a guide ring provided by any one of the above items, and the guide ring includes a guide ring body 10 and an aperture adjustment mechanism 20. The guide ring body 10 is provided with a guide hole 11, and the aperture adjustment mechanism 20 is provided with a gas flow channel 20a corresponding to the guide hole 11. The aperture adjustment mechanism 20 can adjust the gas flow channel 20a thereon to adjust the aperture of the guide hole 11, thereby adjusting the flow rate of the gas flowing through the guide hole 11, and further realizing the adjustment of the flow conductance in the cavity of the plasma processing device.

[0119] The above are only preferred embodiments of the present application and are not intended to limit the present application. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A guide ring, characterized in that: include: The guide ring body is provided with a guide hole, and the guide hole runs through the guide ring body; An aperture adjustment mechanism is arranged at one end of the guide ring body along the axial direction of the guide hole. The aperture adjustment mechanism is provided with a gas flow channel, which runs through the aperture adjustment mechanism, and the position of the gas flow channel corresponds to the position of the guide hole. The aperture adjustment mechanism adjusts the flow rate of the gas through the guide hole by adjusting the aperture of the gas flow channel.

2. The guide ring according to claim 1, characterized in that: The aperture adjustment mechanism comprises: A base, connected to the guide ring body; A blade is rotatably connected to the base, and the blade has a first position and a second position relative to the base; a driving plate, rotatably connected to the base and located at a side of the blade away from the base, the driving plate being used to drive the blade to move between the first position and the second position; When the blade is located at the first position, the gas flow channel formed by the blade has a first aperture; when the blade is located at the second position, the gas flow channel formed by the blade has a second aperture; A driving motor, used for driving the driving plate to rotate relative to the base; Wherein, the diameter of the first aperture is greater than the diameter of the second aperture.

3. The guide ring according to claim 2, characterized in that: The blade is provided with an adjusting rod, the driving plate is provided with an adjusting slot, and the adjusting rod is slidably connected in the adjusting slot.

4. The guide ring according to claim 3, characterized in that: The extending direction of the adjusting slot is arranged at an angle with the radial direction of the driving plate.

5. The guide ring according to claim 4, characterized in that: The blade is provided with a rotating shaft, the rotating shaft is rotatably connected to the base, and the rotating shaft is spaced apart from the adjusting rod.

6. The guide ring according to claim 5, characterized in that: An arc-shaped curved surface structure is provided on the inner side of the blade, and the number of the blades is multiple, and the multiple blades are spaced apart along the circumference of the base; When the blades are located at the first position, parts of the inner side walls of the plurality of blades together form the first aperture; When the blades are located at the second position, parts of the inner side walls of the plurality of blades together form the second aperture.

7. The guide ring according to claim 6, characterized in that: There are multiple flow guide holes and multiple aperture adjustment mechanisms, and the multiple aperture adjustment mechanisms correspond to the multiple flow guide holes one by one. Each aperture adjustment mechanism is used to adjust the flow rate of the gas in the corresponding flow guide hole.

8. The guide ring according to claim 7, characterized in that: In the plurality of aperture adjustment mechanisms, the plurality of drive plates are driven to rotate respectively by the plurality of drive motors; The plurality of driving motors correspond one-to-one to the plurality of aperture adjustment mechanisms, and each driving motor is used to drive the corresponding driving plate to rotate.

9. The guide ring according to claim 7, characterized in that: In the plurality of aperture adjustment mechanisms, each of the drive motors drives at least N of the drive plates to rotate, wherein N is a positive integer greater than 1.

10. A plasma processing device, characterized in that: include: A guide ring, wherein the guide ring is the guide ring according to any one of claims 1 to 9.

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