Paraffin-free adsorption template rotation flatness adjusting device

By designing a rotary flatness adjustment device for waxless adsorption templates, the adjustment and fixing of the flatness of the templates is achieved by using a lifting motor and a clamping motor, the problem of the flatness of the waxless polishing templates in the prior art is solved, and the polishing quality of the semiconductor wafer is improved.

CN222831544UActive Publication Date: 2025-05-06QINGDAO HUAXIN JINGDIAN TECH CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202420959529.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-07
Publication Date
2025-05-06
Estimated Expiration
2034-05-07

AI Technical Summary

Technical Problem

Existing semiconductor wafer surface polishing devices cannot adjust the flatness of the waxless polishing template, causing the template to shake and wear during use, resulting in a decrease in polishing quality.

Method used

A rotary flatness adjustment device for wax-free adsorption template is designed, including an adjustment mechanism and a clamping mechanism, and the flatness adjustment and fixation of the template is achieved through a lifting motor and a clamping motor.

Benefits of technology

The flatness of the waxless adsorption template is effectively adjusted, avoiding the shaking and wear of the template, and improving the polishing quality of the semiconductor wafer.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN222831544U_ABST
    Figure CN222831544U_ABST
Patent Text Reader

Abstract

The utility model discloses a wax-free adsorption template rotation flatness adjusting device which comprises an adjusting mechanism and a lifting motor installed in the adjusting mechanism, the top of the adjusting mechanism is provided with a clamping mechanism, one side of the top of the clamping mechanism is provided with a clamping motor, the adjusting mechanism comprises a supporting bottom plate, and the supporting bottom plate is provided with a clamping groove. Supporting columns are fixedly installed on the periphery of the outer side of the top of the supporting bottom plate, lifting fixing rods are fixedly installed on the periphery of the inner side of the top of the supporting bottom plate, a lifting top plate is fixedly installed on the tops of the lifting fixing rods, and the lifting motor is fixedly installed in the center of the top of the lifting top plate. By arranging the adjusting mechanism, lifting movement of a lifting sliding rod and the template placing platform can be achieved through a lifting motor, meanwhile, an adjusting rotating rod is driven to rotate by rotating an adjusting knob, and therefore the rotating angle of the template placing platform is increased; and the flatness of the template placing platform is judged according to the relative positions of the positioning blocks at the bottom of the template placing platform and the positioning holes.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor material processing, in particular to a wax-free adsorption template rotation flatness adjustment device. Background Art

[0002] A wax-free polishing template is required in the wax-free polishing process of semiconductor wafers. The wax-free polishing template mainly consists of two parts: a wax-free polishing template frame and an adsorption pad. The wax-free polishing template is adhered to a ceramic disk through the adhesive on the back of the wax-free polishing template.

[0003] Publication No. CN 212071562 U discloses a semiconductor wafer surface polishing device. After one side of the semiconductor wafer is polished, the output end limit blocks 1 and 2 of the cylinder 1 and the cylinder 2 extend out, and the wafer is clamped between the limit blocks 1 and 2. The hydraulic cylinder 1 drives the polishing head upward. At this time, the motor 1 starts to drive the mounting base to rotate 180 degrees, so that the bottom of the unpolished wafer becomes the top. The hydraulic cylinder 1 drives the polishing head downward to a position against the surface of the wafer, that is, the polishing of both sides of the wafer is completed, avoiding the secondary clamping of the wafer, which causes the semiconductor wafer surface to be damaged by collision. When polishing the wafer, the polishing liquid is cooled by the condenser and poured on the surface of the wafer from the nozzle through various pipes. Under the action of the polishing head, it is evenly coated on the surface of the wafer. The low-temperature polishing liquid is conducive to maintaining the stability of the surface temperature of the wafer during polishing, thereby avoiding the frictional heating of the polishing position of the wafer, which causes the problem of an oxide film on the surface of the wafer. However, the following problems still exist in the actual use of this patent:

[0004] Although the semiconductor wafer surface polishing device can realize the polishing of the semiconductor wafer surface, it is unable to adjust the flatness of the wax-free polishing template during polishing. During the use of the wax-free polishing template, there will be a certain amount of shaking and wear, which will cause the wax-free polishing template to be skewed. Failure to timely monitor and adjust the flatness of the wax-free polishing template will cause the semiconductor wafer to be damaged during polishing, thereby affecting the polishing quality of the semiconductor wafer.

[0005] A wax-free adsorption template rotation flatness adjustment device is proposed to solve the above-mentioned problems. Utility Model Content

[0006] The purpose of the utility model is to provide a wax-free adsorption template rotating flatness adjustment device to solve the problem that although the semiconductor wafer surface polishing device proposed in the above background technology can realize the polishing of the semiconductor wafer surface, it is unable to adjust the flatness of the wax-free polishing template during polishing, and there will be certain shaking and wear during the use of the wax-free polishing template, which will cause the wax-free polishing template to be skewed. The failure to monitor and adjust the flatness of the wax-free polishing template in time will cause the semiconductor wafer to be damaged during polishing, thereby affecting the polishing quality of the semiconductor wafer.

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a wax-free adsorption template rotation flatness adjustment device, comprising an adjustment mechanism, and a lifting motor installed inside the adjustment mechanism;

[0008] A clamping mechanism is provided on the top of the adjusting mechanism, and a clamping motor is provided on one side of the top of the clamping mechanism;

[0009] Also includes:

[0010] The adjustment mechanism comprises a supporting bottom plate, support columns are fixedly installed around the outer side of the top of the supporting bottom plate, and lifting and fixing rods are fixedly installed around the inner side of the top of the supporting bottom plate;

[0011] Wherein, a lifting top plate is fixedly installed on the top of the lifting fixing rod, and the lifting motor is fixedly installed at the top center position of the lifting top plate;

[0012] Among them, the output end of the lifting motor is fixedly connected with a lifting thread rod, and the middle part of the lifting thread rod is threadedly connected with a lifting thread bracket.

[0013] Preferably, a lifting sliding rod is fixedly installed on the top of the lifting threaded bracket, an adjustment support is fixedly installed on the top of the lifting sliding rod, a positioning hole is fixedly installed at the top center position of the adjustment support, an adjustment knob is rotatably connected to the adjustment support, and an adjustment threaded rod is fixedly connected to the inner side of the adjustment knob.

[0014] Preferably, the middle part of the adjusting threaded rod is threadedly connected with an adjusting threaded sleeve, the top of the adjusting threaded sleeve is rotatably connected with an adjusting rotating rod, the top of the adjusting rotating rod is rotatably connected with a rotating support, a template placing platform is fixedly installed on the top of the rotating support, and a winding bracket is fixedly installed at the bottom center position of the template placing platform.

[0015] Preferably, the bottom of the winding bracket is rotatably connected to a winding roller, one side of the winding roller is rotatably connected to a rotating handle, a limiting bracket is fixedly installed on the bottom of the winding bracket, a winding rope is wrapped around the outer side of the winding roller, a positioning block is fixedly installed on the end of the winding rope, and a fixed gear ring is fixedly installed on one side of the winding bracket.

[0016] Preferably, a fixed slide groove is opened on the side of the winding roller away from the rotating handle, and a fixed spring is slidably connected inside the fixed slide groove. The end of the fixed spring is rotatably connected to a fixed tooth portion, and a limiting baffle is fixedly installed on the end of the winding roller close to the fixed tooth portion, and the fixed tooth portion is meshingly connected to a fixed gear ring.

[0017] Preferably, the clamping mechanism includes a clamping workbench, the clamping workbench is fixedly installed on the top of the support column, a clamping fixing ring is fixedly installed on the top of the clamping workbench, the clamping motor is fixedly installed on one side of the clamping fixing ring, the output end of the clamping motor is fixedly connected with a clamping gear, one side of the clamping gear is meshingly connected with a clamping gear ring, and the clamping gear ring is rotatably connected to the clamping fixing ring.

[0018] Preferably, a plurality of clamping rotating grooves are provided inside the clamping gear ring, the clamping rotating grooves are rotatably connected inside with a clamping rotating sleeve, the clamping rotating sleeve is slidably connected inside with a clamping sliding rod, the end of the clamping sliding rod is rotatably connected with a clamping rotating shaft, a clamping arm is fixedly installed at one end of the clamping sliding rod away from the clamping rotating shaft, and the clamping rotating shaft is rotatably connected to the clamping workbench.

[0019] Compared with the prior art, the utility model has the following beneficial effects: the wax-free adsorption template rotation flatness adjustment device can not only realize the lifting and moving of the lifting sliding rod and the template placement platform by using the lifting motor through the setting of the adjustment mechanism, but also drive the adjustment rotating rod to rotate by turning the adjustment knob, thereby increasing the rotation angle of the template placement platform, judging the flatness of the template placement platform by the relative position of the positioning block and the positioning hole at the bottom of the template placement platform, and realizing the fixation of the wax-free adsorption template by using the clamping motor through the setting of the clamping mechanism, and the specific contents are as follows:

[0020] 1. By setting the adjustment mechanism, not only can the lifting motor be used to drive the lifting threaded rod to rotate, so that the lifting threaded bracket drives the lifting sliding rod and the template placement platform to lift and move, but also the adjusting threaded rod is driven to rotate by turning the adjusting knob, so that the adjusting threaded sleeve moves on the adjusting threaded rod, and drives the adjusting rotating rod to rotate, thereby increasing the rotation angle of the template placement platform, and judging the flatness of the template placement platform by the relative position of the positioning block and the positioning hole at the bottom of the template placement platform, thereby realizing the flatness adjustment of the template placement platform, and facilitating the adjustment of the flatness of the wax-free adsorption template, and the winding roller can be driven to rotate by turning the handle, thereby adjusting the height of the positioning block, and the characteristics of the meshing connection between the fixed tooth portion and the fixed tooth ring are used to realize the fixation of the winding rope and the positioning block, thereby avoiding the winding rope and the positioning block being too long, thereby affecting the judgment of the flatness;

[0021] 2. By setting up a clamping mechanism, the clamping motor can be used to drive the clamping gear to rotate, and the meshing action between the clamping gear and the clamping gear ring can be used to realize the rotation of the clamping gear ring. Through the characteristics of the sliding connection between the clamping rotating sleeve and the clamping sliding rod inside the clamping rotating groove, and under the action of the clamping rotating shaft, the rotation and sliding of the clamping sliding rod can be realized, and the relative rotation of the clamping arm can be used to realize the fixation of the wax-free adsorption template. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of the overall three-dimensional structure of the utility model;

[0023] Figure 2 It is a three-dimensional structural schematic diagram of the adjustment mechanism in the utility model;

[0024] Figure 3 It is a schematic diagram of the three-dimensional structure of the adjusting support in the utility model;

[0025] Figure 4 It is a schematic diagram of the three-dimensional structure of the template placement platform and the winding bracket in the utility model;

[0026] Figure 5 For this utility model Figure 4 A schematic diagram of the enlarged structure of the middle A area;

[0027] Figure 6 It is a schematic diagram of the three-dimensional structure of the clamping mechanism in the utility model.

[0028] In the figure: 1. Adjustment mechanism; 101. Support bottom plate; 102. Support column; 103. Lifting fixed rod; 104. Lifting top plate; 105. Lifting motor; 106. Lifting threaded rod; 107. Lifting threaded bracket; 108. Lifting sliding rod; 109. Adjustment support; 110. Positioning hole; 111. Adjustment knob; 112. Adjustment threaded rod; 113. Adjustment threaded sleeve; 114. Adjustment rotating rod; 115. Rotation support; 116. Template placement platform; 117. Winding bracket; 118. Winding roller; 1 19. Rotating handle; 120. Limit bracket; 121. Winding rope; 122. Positioning block; 123. Fixed gear ring; 124. Fixed slide groove; 125. Fixed spring; 126. Fixed tooth portion; 127. Limit baffle; 2. Clamping mechanism; 201. Clamping workbench; 202. Clamping fixed ring; 203. Clamping motor; 204. Clamping gear; 205. Clamping gear ring; 206. Clamping rotating groove; 207. Clamping rotating sleeve; 208. Clamping sliding rod; 209. Clamping rotating shaft; 210. Clamping arm. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the implementation regulations described are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0030] See also Figure 1-6The utility model provides a technical solution: a wax-free adsorption template rotation flatness adjustment device, comprising an adjustment mechanism 1, and a lifting motor 105 installed inside the adjustment mechanism 1, a clamping mechanism 2 is arranged on the top of the adjustment mechanism 1, and a clamping motor 203 is arranged on one side of the top of the clamping mechanism 2, the adjustment mechanism 1 comprises a supporting bottom plate 101, a supporting column 102 is fixedly installed around the top outer side of the supporting bottom plate 101, and a lifting fixing rod 103 is fixedly installed around the top inner side of the supporting bottom plate 101, wherein a lifting top plate 10 is fixedly installed on the top of the lifting fixing rod 103 4. The lifting motor 105 is fixedly installed at the top center of the lifting top plate 104, wherein the output end of the lifting motor 105 is fixedly connected with a lifting threaded rod 106, the middle part of the lifting threaded rod 106 is threadedly connected with a lifting threaded bracket 107, a lifting sliding rod 108 is fixedly installed around the top of the lifting threaded bracket 107, an adjusting support 109 is fixedly installed on the top of the lifting sliding rod 108, a positioning hole 110 is fixedly installed at the top center of the adjusting support 109, and an adjusting knob 111 is rotatably connected around the adjusting support 109. The adjusting knob 111 The inner side of the adjusting threaded rod 112 is fixedly connected, the middle part of the adjusting threaded rod 112 is threadedly connected with an adjusting threaded sleeve 113, the top of the adjusting threaded sleeve 113 is rotatably connected with an adjusting rotating rod 114, the top of the adjusting rotating rod 114 is rotatably connected with a rotating support 115, the top of the rotating support 115 is fixedly installed with a template placement platform 116, and the bottom center position of the template placement platform 116 is fixedly installed with a winding bracket 117. By setting the adjustment mechanism 1, not only can the lifting motor 105 be used to drive the lifting threaded rod 106 to rotate, but also the lifting threaded support 107 can be brought The movable lifting sliding rod 108 and the template placing platform 116 are lifted and lowered, and at the same time, the adjusting knob 111 is turned to drive the adjusting threaded rod 112 to rotate, so that the adjusting threaded sleeve 113 moves on the adjusting threaded rod 112, and drives the adjusting rotating rod 114 to rotate, thereby increasing the rotation angle of the template placing platform 116, and judging the flatness of the template placing platform 116 by the relative position of the positioning block 122 at the bottom of the template placing platform 116 and the positioning hole 110, thereby realizing the flatness adjustment of the template placing platform 116, which is convenient for adjusting the flatness of the wax-free adsorption template.

[0031] The bottom of the winding bracket 117 is rotatably connected to a winding roller 118, one side of the winding roller 118 is rotatably connected to a rotating handle 119, a limiting bracket 120 is fixedly installed at the bottom of the winding bracket 117, a winding rope 121 is wound around the outside of the winding roller 118, a positioning block 122 is fixedly installed at the end of the winding rope 121, a fixed gear ring 123 is fixedly installed on one side of the winding bracket 117, a fixed slide groove 124 is provided on the side of the winding roller 118 away from the rotating handle 119, and a fixed spring 125 is slidably connected to the inside of the fixed slide groove 124, The end of the fixed spring 125 is rotatably connected to the fixed tooth portion 126, and a limiting baffle 127 is fixedly installed on the end of the winding roller 118 near the fixed tooth portion 126. The fixed tooth portion 126 is meshingly connected with the fixed tooth ring 123. The winding roller 118 can be driven to rotate by rotating the handle 119, so as to adjust the height of the positioning block 122. The characteristics of the meshing connection between the fixed tooth portion 126 and the fixed tooth ring 123 are utilized to fix the winding rope 121 and the positioning block 122, so as to avoid the winding rope 121 and the positioning block 122 being too long, thereby affecting the flatness judgment.

[0032] The clamping mechanism 2 includes a clamping workbench 201, which is fixedly installed on the top of the support column 102. A clamping fixing ring 202 is fixedly installed on the top of the clamping workbench 201. A clamping motor 203 is fixedly installed on one side of the clamping fixing ring 202. A clamping gear 204 is fixedly connected to the output end of the clamping motor 203. A clamping gear ring 205 is meshedly connected to one side of the clamping gear 204. The clamping gear ring 205 is rotatably connected to the clamping fixing ring 202. A plurality of clamping rotating grooves 206 are provided inside the clamping rotating grooves 206. A clamping rotating sleeve 207 is rotatably connected inside the clamping rotating sleeve 207. A clamping sliding rod 208 is slidably connected inside the clamping sliding rod 208. The end portion is rotatably connected with a clamping rotating shaft 209, and a clamping arm 210 is fixedly installed at one end of the clamping sliding rod 208 away from the clamping rotating shaft 209. The clamping rotating shaft 209 is rotatably connected to the clamping workbench 201. By setting up the clamping mechanism 2, the clamping motor 203 can be used to drive the clamping gear 204 to rotate, and the meshing action between the clamping gear 204 and the clamping gear ring 205 is used to realize the rotation of the clamping gear ring 205. The clamping rotating sleeve 207 inside the clamping rotating groove 206 is slidably connected with the clamping sliding rod 208, and under the action of the clamping rotating shaft 209, the rotation and sliding of the clamping sliding rod 208 are realized, and the relative rotation of the clamping arm 210 is used to realize the fixation of the wax-free adsorption template.

[0033] Working principle: Before using the wax-free adsorption template rotation flatness adjustment device, you need to check the overall condition of the device to make sure it can work normally. Figure 1 - Figure 6As shown, first, place the wax-free adsorption template on the template placement platform 116, start the lifting motor 105 to drive the lifting threaded rod 106 to rotate, so that the lifting threaded bracket 107 drives the lifting sliding rod 108 and the template placement platform 116 to move up and down, and move the template placement platform 116 to the inside of the clamping workbench 201, and the winding roller 118 can be driven to rotate by turning the handle 119, so as to adjust the height of the positioning block 122, and the winding rope 121 and the positioning block 122 are fixed by utilizing the characteristics of the meshing connection between the fixed tooth portion 126 and the fixed gear ring 123, so as to avoid the winding rope 121 and the positioning block 122 being too long, thereby affecting the flatness judgment, and secondly, the adjusting threaded rod 112 is driven to rotate by turning the adjusting knob 111, so that the adjusting threaded sleeve 113 moves on the adjusting threaded rod 112, and drives Adjust the rotation of the rotating rod 114 to increase the rotation angle of the template placement platform 116, and judge the flatness of the template placement platform 116 by the relative position of the positioning block 122 at the bottom of the template placement platform 116 and the positioning hole 110, so as to achieve the flatness adjustment of the template placement platform 116, and facilitate the adjustment of the flatness of the wax-free adsorption template. Finally, use the clamping motor 203 to drive the clamping gear 204 to rotate, and use the meshing action between the clamping gear 204 and the clamping gear ring 205 to achieve the rotation of the clamping gear ring 205. Through the characteristics of the sliding connection between the clamping rotating sleeve 207 and the clamping sliding rod 208 inside the clamping rotating groove 206, and under the action of the clamping rotating shaft 209, the rotation and sliding of the clamping sliding rod 208 are achieved, and the relative rotation of the clamping arm 210 is used to achieve the fixation of the wax-free adsorption template.

[0034] Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art may still modify the technical solutions described in the aforementioned embodiments, or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention.

Claims

1. A wax-free adsorption template rotation flatness adjustment device, comprising an adjustment mechanism (1), and a lifting motor (105) installed inside the adjustment mechanism (1); A clamping mechanism (2) is provided on the top of the adjusting mechanism (1), and a clamping motor (203) is provided on one side of the top of the clamping mechanism (2); It is characterized in that Also includes: The adjustment mechanism (1) comprises a support base plate (101), support columns (102) are fixedly mounted around the outer periphery of the top of the support base plate (101), and lifting and fixing rods (103) are fixedly mounted around the inner periphery of the top of the support base plate (101); Wherein, a lifting top plate (104) is fixedly mounted on the top of the lifting fixing rod (103), and the lifting motor (105) is fixedly mounted at the top center position of the lifting top plate (104); The output end of the lifting motor (105) is fixedly connected to a lifting threaded rod (106), and the middle portion of the lifting threaded rod (106) is threadedly connected to a lifting threaded bracket (107).

2. The wax-free adsorption template rotation flatness adjustment device according to claim 1 is characterized in that: A lifting slide rod (108) is fixedly installed around the top of the lifting threaded bracket (107), an adjustment support (109) is fixedly installed on the top of the lifting slide rod (108), a positioning hole (110) is fixedly installed at the center position of the top of the adjustment support (109), an adjustment knob (111) is rotatably connected around the adjustment support (109), and an adjustment threaded rod (112) is fixedly connected to the inner side of the adjustment knob (111).

3. The wax-free adsorption template rotation flatness adjustment device according to claim 2 is characterized in that: The middle part of the adjusting threaded rod (112) is threadedly connected to an adjusting threaded sleeve (113), the top of the adjusting threaded sleeve (113) is rotatably connected to an adjusting rotating rod (114), the top of the adjusting rotating rod (114) is rotatably connected to a rotating support (115), a template placement platform (116) is fixedly mounted on the top of the rotating support (115), and a winding bracket (117) is fixedly mounted at the bottom center of the template placement platform (116).

4. The wax-free adsorption template rotation flatness adjustment device according to claim 3 is characterized in that: The bottom of the winding bracket (117) is rotatably connected to a winding roller (118), one side of the winding roller (118) is rotatably connected to a rotating handle (119), a limiting bracket (120) is fixedly installed at the bottom of the winding bracket (117), a winding rope (121) is wound around the outside of the winding roller (118), a positioning block (122) is fixedly installed at the end of the winding rope (121), and a fixed gear ring (123) is fixedly installed on one side of the winding bracket (117).

5. The wax-free adsorption template rotation flatness adjustment device according to claim 4 is characterized in that: A fixed slide groove (124) is provided on a side of the winding roller (118) away from the rotating handle (119); a fixed spring (125) is slidably connected inside the fixed slide groove (124); an end of the fixed spring (125) is rotatably connected to a fixed tooth portion (126); a limit baffle (127) is fixedly installed at the end of the winding roller (118) close to the fixed tooth portion (126); and the fixed tooth portion (126) is meshingly connected to the fixed tooth ring (123).

6. The wax-free adsorption template rotation flatness adjustment device according to claim 1, characterized in that: The clamping mechanism (2) comprises a clamping workbench (201), the clamping workbench (201) being fixedly mounted on the top of a support column (102), a clamping fixing ring (202) being fixedly mounted on the top of the clamping workbench (201), the clamping motor (203) being fixedly mounted on one side of the clamping fixing ring (202), a clamping gear (204) being fixedly connected to an output end of the clamping motor (203), a clamping gear ring (205) being meshingly connected to one side of the clamping gear (204), and the clamping gear ring (205) being rotationally connected to the clamping fixing ring (202).

7. The wax-free adsorption template rotation flatness adjustment device according to claim 6, characterized in that: A plurality of clamping rotating grooves (206) are provided inside the clamping gear ring (205), the clamping rotating grooves (206) are rotatably connected to a clamping rotating sleeve (207), the clamping rotating sleeve (207) is slidably connected to a clamping sliding rod (208), the end of the clamping sliding rod (208) is rotatably connected to a clamping rotating shaft (209), a clamping arm (210) is fixedly mounted on one end of the clamping sliding rod (208) away from the clamping rotating shaft (209), and the clamping rotating shaft (209) is rotatably connected to the clamping workbench (201).

Citation Information

Patent Citations

  • Semiconductor wafer surface polishing device

    CN212071562U