High-temperature chemical vapor deposition equipment

Abstract

The utility model is suitable for the technical field of semiconductor production, and provides high-temperature chemical vapor deposition equipment which comprises a vacuum container, a heat insulation part, a reaction container and a heater, compared with high-temperature chemical vapor deposition equipment in the prior art, the reaction container and the heater can be arranged in the accommodating space on the heat insulation part and pass through the accommodating space. Due to the arrangement of the heat insulation part, the outward transmission of heat is reduced, the stability and uniformity of the temperature environment in the reaction cavity are ensured, and the heat in the reaction cavity can be better accumulated, so that the temperature in the reaction cavity is easier to reach a higher temperature to meet the process requirements of large-size workpiece processing; meanwhile, the reaction container is arranged in the vacuum cavity of the vacuum container, the reaction container is provided with the reaction cavities which are not communicated with one another, the vacuum cavities and the reaction cavities can be vacuumized independently, and the purity of process gas in the reaction cavities is guaranteed. And the film deposition quality and uniformity of a large-size workpiece at a high temperature can be well ensured.

Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor production, and in particular relates to high-temperature chemical vapor deposition equipment. Background Art

[0002] Chemical vapor deposition equipment is a device that uses chemical reactions in the gas phase to deposit solid thin films. It is widely used in semiconductors, optoelectronics, nanomaterials and other fields. The working principle of high-temperature chemical vapor deposition equipment is to introduce raw gas into the reaction chamber and heat the reaction chamber through a heating unit, so that the raw gas in the reaction chamber undergoes a chemical reaction at high temperature to generate solid products and deposit on the surface of the product. However, most of the existing high-temperature chemical vapor deposition equipment has the problem of difficulty in ensuring the quality and uniformity of the film deposition of large-sized workpieces at high temperatures, which seriously affects the quality of the products. Utility Model Content

[0003] The utility model aims to provide a high-temperature chemical vapor deposition device, aiming to solve the technical problem in the prior art of ensuring the quality and uniformity of film deposition on large-sized workpieces at high temperatures.

[0004] The utility model is implemented as follows: a high temperature chemical vapor deposition device, comprising:

[0005] A vacuum container having a vacuum chamber;

[0006] A heat insulation part is arranged in the vacuum chamber, and the heat insulation part has a containing space;

[0007] A reaction container is arranged in the containing space, the reaction container has a reaction chamber which is not connected with the vacuum chamber, the reaction chamber is used to contain the product and is connected with an external process gas source pipeline; and

[0008] The heater is arranged in the containing space and located between the inner wall of the heat insulating portion and the outer wall of the reaction container, and the heater is used to heat the reaction container.

[0009] In an optional embodiment, the vacuum container has a first mounting port connected to the vacuum chamber, the insulation part has a second mounting port connected to the accommodating space, the first mounting port is located on the outside of the second mounting port, the sealing cover at the first mounting port is provided with a first support cover, and the cover at the second mounting port is provided with an insulation support seat, the insulation support seat is located on the inner side of the first support cover and connected to the first support cover, and the reaction container is arranged on the inner side of the insulation support seat and connected to the insulation support seat.

[0010] In an optional embodiment, the vacuum container includes a main body and a second support cover, the main body has a third mounting port, the second support cover sealing cover is arranged at the third mounting port, and the first mounting port is arranged at the second support cover, and the insulation part is connected to the second support cover.

[0011] In an optional embodiment, a first support group is arranged between the insulation part and the second support cover, the insulation part is spaced apart from the second support cover through the first support group, a second support group is arranged between the insulation support seat and the first support cover, and the insulation support seat is spaced apart from the first support cover through the second support group.

[0012] In an optional embodiment, the second support group includes a partition plate body, a first support column and a second support column, the first support column and the second support column are both multiple in number, the partition plate body is arranged between the thermal insulation support seat and the first support cover, multiple first support columns are all arranged between the partition plate body and the thermal insulation support seat, and multiple second support columns are all arranged between the partition plate body and the first support cover.

[0013] In an optional embodiment, a first connecting piece is further provided at the bottom of the vacuum container, a connecting channel is provided inside the first connecting piece, and the connecting channel is used to connect the reaction container with an external process gas source, the first connecting piece passes through the second support cover, and the first connecting piece and the second support cover are sealed and connected, one end of the first connecting piece is located in the vacuum container and is detachably connected to the reaction container, and the other end of the first connecting piece is located outside the vacuum container and is used to be connected to the external process gas source.

[0014] In an optional embodiment, a first connecting piece is further provided at the bottom of the vacuum container, a connecting channel is provided inside the first connecting piece, and the connecting channel is used to connect the reaction container with an external process gas source. The first connecting piece passes through the second support cover, and one end of the first connecting piece is located in the vacuum container and is detachably connected to the reaction container. The other end of the first connecting piece is located outside the vacuum container and is used to communicate with the external process gas source, and the first connecting piece and the second support cover are sealed.

[0015] In an optional embodiment, when the vacuum container is working, the pressure in the vacuum chamber is a first working pressure, and when the reaction container is working, the pressure in the reaction chamber is a second working pressure, and the first working pressure is greater than the second working pressure.

[0016] In an optional embodiment, the reaction container includes a first cover body, a second cover body and a cylinder body, both ends of the cylinder body have openings, the first cover body sealing cover is arranged at one of the openings, the second cover body sealing cover is arranged at the other opening, and the cylinder body includes a plurality of annular parts, the annular parts are arranged along the axis of the cylinder body, and two adjacent annular parts are sealed and connected.

[0017] In an optional embodiment, the heater includes a top heating group arranged above the reaction container, a bottom heating group arranged below the reaction container, and a peripheral heating group arranged around the reaction container, and the peripheral heating group includes a first heating group, a second heating group, and a third heating group arranged along the height direction of the reaction container.

[0018] The technical effect of the utility model relative to the prior art is: a heat-insulating part with a accommodating space is arranged in the vacuum cavity in the vacuum container, a reaction container is arranged in the accommodating space, the reaction container has a reaction cavity with vacuum cavities that are not connected to each other, and a heater is arranged between the heat-insulating part and the reaction container. When the vapor deposition of the solid film is carried out, the product is placed in the reaction cavity and the vacuum cavity and the reaction cavity are kept at a certain vacuum degree, and then the reaction container is heated by the heater to maintain the temperature in the reaction cavity at the temperature required by the process, and the process gas is introduced into the reaction container at the same time. Compared with the high-temperature chemical vapor deposition equipment in the prior art, the reaction container and the heater can be arranged in the accommodating space on the heat-insulating part, and the heat transfer to the vacuum cavity is reduced by the arrangement of the heat-insulating part, so as to ensure the stability and uniformity of the temperature environment in the reaction cavity, and the heat in the reaction cavity can be better accumulated, so that the temperature in the reaction cavity can be more easily reached to a higher temperature to meet the process requirements of large-size workpiece processing. At the same time, the reaction container has a reaction cavity with vacuum cavities that are not connected to each other, and the vacuum cavity and the reaction cavity can be evacuated separately, so as to ensure the purity of the process gas in the reaction cavity. The high-temperature chemical vapor deposition equipment provided by the embodiment of the utility model ensures the stability and uniformity of the temperature of the reaction chamber, and allows the interior of the reaction chamber to have a higher temperature to meet the process requirements of large-size workpiece processing, while also ensuring the purity of the process gas in the reaction chamber, thereby ensuring the quality and uniformity of the deposition film of large-size workpieces at high temperatures. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments of the utility model or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0020] Figure 1 It is a structural schematic diagram of a high temperature chemical vapor deposition device provided by an embodiment of the utility model;

[0021] Figure 2 It is a schematic cross-sectional structural diagram of a high temperature chemical vapor deposition device provided by an embodiment of the utility model;

[0022] Figure 3 It is a schematic cross-sectional structural diagram of a high temperature chemical vapor deposition device provided by an embodiment of the utility model when the first support cover and the vacuum container are in a separated state;

[0023] Figure 4 It is a schematic cross-sectional structural diagram of a high temperature chemical vapor deposition device provided by an embodiment of the utility model when the second support cover and the main body are in a separated state;

[0024] Figure 5 yes Figure 2 A schematic diagram of the enlarged structure at A in the middle;

[0025] Figure 6 It is a schematic diagram of the structure of the reaction container used in the embodiment of the utility model.

[0026] Description of reference numerals:

[0027] 1. Vacuum container; 11. Vacuum chamber; 12. Main body; 13. Second support cover; 14. First mounting port; 15. Third mounting port; 2. Insulation part; 21. Accommodation space; 22. Second mounting port; 3. Reaction container; 31. First cover body; 32. Second cover body; 33. Cylinder body; 331. Ring member; 4. First support cover; 5. Heater; 6. First support group; 7. Second support group; 71. Spacer body; 72. First support column; 73. Second support column; 8. Connecting electrode; 9. First connecting member; 10. Insulation support seat. DETAILED DESCRIPTION

[0028] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0029] In the description of the present invention, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0030] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0031] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0032] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments.

[0033] Please refer to Figure 1 to Figure 2 As shown, in an embodiment of the utility model, a high-temperature chemical vapor deposition device is provided, and the high-temperature chemical vapor deposition device includes a vacuum container 1, an insulation part 2, a reaction container 3 and a heater 5. The vacuum container 1 has a vacuum chamber 11. The insulation part 2 is arranged in the vacuum chamber 11, and the insulation part 2 has a storage space 21. The reaction container 3 is arranged in the storage space 21, and the reaction container 3 has a reaction chamber that is not connected to the vacuum chamber 11, and the reaction chamber is used to accommodate the product and is connected to the external gas source pipeline. The heater 5 is arranged in the storage space 21 and is located between the inner wall of the insulation part 2 and the outer wall of the reaction container 3. The heater 5 is used to heat the reaction container 3.

[0034] Specifically, the vacuum container 1 refers to a sealed container with a certain space inside. The vacuum container 1 can be surrounded by a metal plate, so that the vacuum container 1 itself has better strength. The heat insulation part 2 refers to a container with a certain space inside. The heat insulation part 2 can be surrounded by a heat insulation plate, wherein the heat insulation plate can be a single-layer structure or a multi-layer structure. When the heat insulation plate adopts a multi-layer structure, multiple layers of heat insulation materials can be arranged in sequence along the thickness direction of the heat insulation plate. The thickness and material of the heat insulation material can be adjusted according to the temperature requirements of the process. A protective layer can also be arranged on the outermost side of the heat insulation plate, and the protective layer can be made of stainless steel. The reaction container 3 refers to a sealed container with a certain accommodation space inside. The reaction container 3 can be composed of a high-temperature resistant material, such as graphite or ceramic. The reaction container 3 can be an integral structure or a split structure. The heater 5 refers to a device that can generate heat. The heating form of the heater 5 can be electric heating using electric energy as energy, such as an electric heater; the heating form of the heater 5 can also be combustion heating using fuel as energy. The external shape of the heater 5 can be plate-shaped, columnar or block-shaped.

[0035] In addition, the vacuum chamber 11 on the vacuum container 1 can be connected to the vacuum generating unit pipeline, and the reaction chamber in the reaction container 3 can also be connected to the vacuum generating unit pipeline. The vacuum generating unit can be a vacuum pump, a vacuum unit and other equipment. The vacuum generating unit is a conventional technical means for achieving vacuuming of a closed cavity. Its working principle and specific connection relationship are well known to those skilled in the art and will not be described in detail here.

[0036] In the high-temperature chemical vapor deposition equipment provided by the embodiment of the utility model, a heat-insulating part 2 having a containing space 21 is arranged in the vacuum chamber 11 in the vacuum container 1, a reaction container 3 is arranged in the containing space 21, the reaction container 3 has a reaction chamber that is not connected to the vacuum chamber 11, and a heater 5 is arranged between the heat-insulating part 2 and the reaction container 3. When performing the vapor deposition of the solid film, the product is placed in the reaction chamber and the vacuum chamber 11 and the reaction chamber are kept at a certain vacuum degree, and then the heater 5 is used to heat the reaction chamber 3 so that the temperature in the reaction chamber is maintained at the temperature required by the process, and the process gas is introduced into the reaction chamber 3. Compared with the high-temperature chemical vapor deposition equipment in the prior art, the reaction chamber 3 and the heater 5 can be arranged in the containing space 21 on the heat-insulating part 2, and the ratio of heat transfer to the vacuum chamber 11 is reduced by the arrangement of the heat-insulating part 2, so as to ensure the stability and uniformity of the temperature environment in the reaction chamber, and the heat in the reaction chamber can be better accumulated, so that the temperature in the reaction chamber can be more easily reached to a higher temperature to meet the process requirements of large-size workpiece processing. At the same time, the reaction container 3 has a reaction chamber that is not connected to the vacuum chamber 11, and the vacuum chamber 11 and the reaction chamber can be evacuated separately to ensure the purity of the process gas in the reaction chamber. The high-temperature chemical vapor deposition equipment provided by the embodiment of the utility model can ensure the stability and uniformity of the temperature of the reaction chamber, and make the interior of the reaction chamber have a higher temperature to meet the process requirements of large-sized workpiece processing, while also ensuring the purity of the process gas in the reaction chamber, thereby well ensuring the quality and uniformity of the deposition film of large-sized workpieces at high temperatures.

[0037] It should be noted that, in order to ensure the quality and uniformity of film deposition on large-sized workpieces, it is usually necessary to process large-sized workpieces under higher process temperatures and in a relatively stable environment. The high-temperature chemical vapor deposition equipment provided in this embodiment is provided with a heater 5 between the insulation part 2 and the reaction vessel 3. When the heater 5 heats the reaction vessel 3, the ratio of heat transfer to the vacuum chamber 11 can be reduced by the provision of the insulation part 2, so that the heat in the reaction chamber can be better accumulated, so that the temperature in the reaction chamber can more easily reach a higher temperature to meet the process requirements for processing large-sized workpieces. At the same time, there is also a vacuum chamber 11 on the outside of the insulation part 2 that is not interconnected with the reaction chamber, and a protective gas can be introduced into the vacuum chamber 11, so that even when the entire equipment is at a higher temperature, the protective gas can reduce the corrosion of the vacuum container by corrosive gases, thereby ensuring that the reaction environment in the reaction chamber can be in a high temperature state for a long time, thereby achieving the purpose of ensuring the quality and uniformity of film deposition on large-sized workpieces at high temperatures.

[0038] Furthermore, the reaction container 3 is made of high temperature resistant material, so that the working temperature of the high temperature chemical vapor deposition equipment can meet the process temperature requirement of more than 2000°C, and can reach up to 2400°C.

[0039] In an alternative embodiment, please refer to Figure 2 The vacuum container 1 can be connected to the inert gas source pipeline, and the reaction container 3 can also be connected to the inert gas source pipeline. When working, the inert gas is introduced into the vacuum chamber 11 and the reaction chamber respectively, which can improve the quality of the deposited film. The pressure inside the vacuum chamber 11 and the reaction chamber can also be adjusted by introducing the inert gas into the vacuum chamber 11 and the reaction chamber respectively and cooperating with the vacuum pumping unit.

[0040] In one embodiment, see Figure 2 and Figure 3 The vacuum container 1 has a first mounting port 14 connected to the vacuum chamber 11, and the insulation portion 2 has a second mounting port 22 connected to the accommodating space 21. The first mounting port 14 is located outside the second mounting port 22, and the shapes of the first mounting port 14 and the second mounting port 22 are both adapted to the cross-sectional shape of the reaction container 3. A first support cover 4 is provided at the sealing cover of the first mounting port 14, and a heat-insulating support seat 10 is provided at the second mounting port 22. The heat-insulating support seat 10 is located on the inner side of the first support cover 4 and is connected to the first support cover 4. The reaction vessel 3 is arranged above the heat-insulating support seat 10. The heat-insulating support seat 10 is arranged on the inner side of the first support cover 4 and is connected to the heat-insulating support seat 10. When the sealing cover of the first support cover 4 is arranged at the first mounting port 14, the heat-insulating support seat 10 is covered at the second mounting port 22 on the insulation part 2, and the reaction vessel 3 is located in the accommodating space 21 on the insulation part 2. When the first support cover 4 is separated from the vacuum container 1, the heat-insulating support seat 10 is also separated from the insulation part 2, and the reaction vessel 3 moves with the first support cover 4 and is moved out of the accommodating space 21 through the first mounting port 14 and the second mounting port 22.

[0041] Specifically, the first mounting port 14 refers to an opening structure arranged on the bottom surface of the vacuum container 1, and the second mounting port 22 refers to an opening structure arranged on the bottom surface of the reaction container 3. The shapes of the first mounting port 14 and the second mounting port 22 are both adapted to the cross-sectional shape of the reaction container 3, wherein the cross-sectional area of ​​the reaction container 3 refers to the cross-sectional area of ​​the reactor intercepted by a plane in the horizontal direction. The first support cover 4 refers to a plate-like component with a certain area, and the first support cover 4 can be connected to the vacuum container 1 by fasteners, clamping or threaded connection, and finally the sealing cover is arranged at the first mounting port 14. The heat-insulating support seat 10 refers to a heat-insulating part 2 with a certain area, and the heat-insulating support seat 10 can be composed of heat-insulating materials, and the heat-insulating support seat 10 can be a single-layer structure, and the heat-insulating support seat 10 can also be a multi-layer structure. When the heat-insulating support seat 10 is a multi-layer structure, multiple layers of heat-insulating materials can be sequentially arranged along the thickness direction of the heat-insulating support seat 10, and the thickness and material of the heat-insulating material can be adjusted according to the temperature requirements of the process. A protective layer can also be arranged on the outermost part of the heat-insulating material, and the protective layer can be made of stainless steel.

[0042] The first mounting port 14 is provided on the bottom surface of the vacuum container 1, and the first mounting port 14 is provided on the bottom of the heat insulation part 2, and the first mounting port 14 is located below the second mounting port 22. At the same time, the reaction container 3 is provided above the heat insulation support seat 10, and the heat insulation support seat 10 is provided above the first support cover 4. When the sealing cover of the first support cover 4 is provided at the first mounting port 14, the heat insulation support seat 10 will be provided at the second mounting port 22 on the heat insulation part 2 under the support of the first support cover 4, and the reaction container 3 is located in the accommodation space 21 on the heat insulation part 2. When the product needs to be placed in the reaction chamber or taken out from the reaction chamber during the production process, the first support cover 4 can be separated from the vacuum container 1 and moved downward, and the reaction container 3 and the heat insulation support seat 10 will also move with the first support cover 4, so that the reaction container 3 can be moved out of the accommodation space 21 and the vacuum chamber 11 through the first mounting port 14 and the second mounting port 22, so that the product can be placed in the reaction chamber or taken out from the reaction chamber more conveniently, thereby improving the production efficiency.

[0043] In an optional embodiment, a first lifting mechanism for adjusting the position of the first support cover 4 may be further provided below the vacuum container 1, and a driving end of the first lifting mechanism is connected to the first support cover 4. Specifically, the first lifting mechanism refers to a mechanism or component that can adjust the height of an object, and the first lifting mechanism may adopt a screw lifting structure or a hydraulic lifting mechanism. The first lifting mechanism may make the lifting of the first support cover 4 more convenient, thereby making it more convenient to place and take out the product.

[0044] Under the premise of the above-mentioned characteristic second mounting opening 22, please refer to Figure 3 and Figure 5 , a plurality of first step structures are arranged on the inner wall of the second installation opening 22, and the size of the first step structures gradually increases from top to bottom along the height direction, and a plurality of second step structures for cooperating with the first step structures are also arranged on the circumference of the heat insulation support seat 10, and the size of the plurality of second step structures gradually decreases from top to bottom along the height direction. By setting the first step structures and the second step structures, the heat insulation support seat 10 can be limited when the heat insulation support seat 10 is covered at the second installation opening 22, so that the installation position of the heat insulation support seat 10 is more accurate. At the same time, the heat insulation support seat 10 can also be supported by the first support cover 4 to abut more closely against the bottom surface of the heat insulation part 2.

[0045] In an optional embodiment, a support component for placing and fixing a workpiece is rotatably arranged in the reaction chamber in the reaction vessel 3, and a power device is also arranged outside the vacuum vessel 1. The power device is connected to the support component through a drive shaft, and the drive shaft is arranged through the first support cover 4 and can be rotated relative to the first support cover 4. The drive shaft is sealed with the first support cover 4. The drive shaft is also arranged through the insulation support seat 10 and can be rotated relative to the insulation support seat 10. The drive shaft and the insulation support seat 10 are also sealed. Connection. Specifically, the support component refers to a component with a certain volume, and the support component can be a block, plate or disc. The power device refers to a component that can output torque, and the drive shaft refers to a shaft body with a certain length. By rotating the support component in the reaction chamber of the reaction vessel 3. The power device outside the vacuum vessel 1 can be connected to the support component in the reaction chamber through the drive shaft, and drive the support component to rotate. During work, the workpiece can be placed and fixed on the support component, and rotate with the support component under the drive of the power device, thereby improving the uniformity of the film formation of the workpiece.

[0046] In addition, both the thermal insulation support seat 10 and the first support cover 4 are provided with mounting holes for the drive shaft to pass through, and a sealing device, such as a magnetic fluid sealing sleeve or a sealed bearing, can be provided between the drive shaft and the inner wall of the mounting hole, which can maintain sealing while the drive shaft rotates.

[0047] In one embodiment, see Figure 2 and Figure 4The vacuum container 1 includes a main body 12 and a second support cover 13. The main body 12 has a third mounting port 15. The sealing cover of the second support cover 13 is arranged at the third mounting port 15, and the first mounting port 14 is arranged on the second support cover 13. The heat insulation part 2 is connected to the second support cover 13. When the sealing cover of the second support cover 13 is arranged at the third mounting port 15, the heat insulation part 2 is located in the vacuum chamber 11. When the second support cover 13 is separated from the main body 12, the heat insulation part 2 can be removed from the vacuum chamber 11 through the third mounting port 15. Specifically, the second support cover 13 refers to a plate-like component with a certain area. The second support cover 13 can be connected to the main body 12 by fasteners, clamping or threaded connection, and finally the sealing cover is arranged at the third mounting port 15. By dividing the vacuum container 1 into two parts, the main body 12 and the second support cover 13, the sealing cover of the second support cover 13 is arranged at the third mounting port 15 on the bottom surface of the main body 12. At the same time, the heat insulation part 2 is connected and installed above the second support cover 13. In addition, the first mounting port 14 is provided on the second support cover 13, and the first support cover 4 is sealed and connected to the second support cover 13. When the sealing cover of the second support cover 13 is provided at the third mounting port 15, the heat insulation part 2 can be located in the vacuum chamber 11 under the support of the second support cover 13. When it is necessary to maintain the heat insulation part 2 and the heater 5 in the accommodating space 21, the second support cover 13 can be separated from the main body 12 and moved downward, and the heat insulation part 2 can be removed from the vacuum chamber 11 through the third mounting port 15, and after the maintenance is completed, the second support cover 13 can be driven to rise, so that the second support cover 13 is re-sealed and provided at the third mounting port 15. During the movement of the second support cover 13, the first support cover 4 can be installed on the second support cover 13, and the first support cover 4, the heat insulation support seat 10 and the reaction vessel 3 can also be removed from the second support cover 13, so that the maintenance of the heater 5 is more convenient.

[0048] In an alternative embodiment, see Figure 1 , a cooling water channel can be provided on the first support cover 4, wherein the water inlet and the water outlet of the cooling water channel are respectively connected to the cooling water circuit, the cooling water channel can be provided inside the first support cover 4, or the cooling water channel can be installed on the surface of the first support cover 4, and the setting of the cooling water channel can prevent the first support cover 4 from being overheated. A reinforcing rib plate is also provided on the first support cover 4, and the overall strength of the first support cover 4 can be increased by the reinforcing rib plate. A cooling water channel can be provided on the second support cover 13, wherein the water inlet and the water outlet of the cooling water channel are respectively connected to the cooling water circuit, the cooling water channel can be provided inside the second support cover 13, or the cooling water channel can be installed on the surface of the second support cover 13, wherein the setting of the cooling water channel can also prevent the second support cover 13 from being overheated.

[0049] In another optional embodiment, a second lifting mechanism for adjusting the position of the second support cover 13 may be provided below the vacuum container 1, and a driving end of the second lifting mechanism is connected to the second support cover 13. Specifically, the second lifting mechanism refers to a mechanism or component that can adjust the height of an object, and the second lifting mechanism may adopt a screw lifting structure or a hydraulic lifting mechanism. The second lifting mechanism may make the lifting of the second support cover 13 more convenient, thereby making the maintenance of the heater 5 and the heat insulation part 2 more convenient.

[0050] In one embodiment, see Figure 4 and Figure 5 , a first support group 6 is arranged between the heat insulation part 2 and the second support cover 13, and the heat insulation part 2 is spaced apart from the second support cover 13 through the first support group 6, and a second support group 7 is arranged between the heat insulation support seat 10 and the first support cover 4, and the heat insulation support seat 10 is spaced apart from the first support cover 4 through the second support group 7. Specifically, the first support group 6 refers to a component or assembly with a certain height, and the first support group 6 can be a single component, or the first support group 6 can be composed of a plurality of components. The second support group 7 refers to a component or assembly with a certain height, and the second support group 7 can be a single component, or the second support group 7 can be composed of a plurality of components. By arranging the first support group 6 between the heat insulation part 2 and the second support cover 13, the heat insulation part 2 can be spaced apart from the second support cover 13 through the first support group 6, so as to avoid the heat generated by the heater 5 in the heat insulation part 2 from being conducted to the second support cover 13, and the heat insulation effect of the heat insulation part 2 can be better. Similarly, by providing a second support group 7 between the thermal insulation support seat 10 and the first support cover 4, the thermal insulation support seat 10 can be spaced apart from the first support cover 4 through the second support group 7, thereby preventing the heat generated by the heater 5 in the thermal insulation part 2 from being conducted to the first support cover 4 through the thermal insulation support seat 10, thereby making the thermal insulation effect of the thermal insulation part 2 better, thereby improving the uniformity of the deposition film.

[0051] In an alternative embodiment, see Figure 4 The first support group 6 includes a plurality of support members, and the plurality of support members are arranged at intervals along a circular trajectory. The center of the circular trajectory can be located on a straight line passing through the axis of the insulation part 2. On the premise that the first support group 6 supports the insulation part 2, the force on the bottom surface of the insulation part 2 can be more uniform, so that the insulation part 2 can be installed more firmly and stably above the second support cover 13.

[0052] In one embodiment, see Figure 6, the second support group 7 includes a partition plate body 71, a first support column 72 and a second support column 73, the number of the first support column 72 and the second support column 73 are both multiple, the partition plate body 71 is arranged between the thermal insulation support seat 10 and the first support cover 4, multiple first support columns 72 are arranged between the partition plate body 71 and the thermal insulation support seat 10, and multiple second support columns 73 are arranged between the partition plate body 71 and the first support cover 4. Specifically, the second support column 73 and the first support column 72 both refer to columnar components with a certain height dimension. The partition plate body 71 refers to a plate-like component with a certain area, and multiple first support columns 72 are evenly arranged between the partition plate body 71 and the thermal insulation support seat 10, one end of the first support column 72 is connected to the thermal insulation support seat 10 and the other end is connected to the partition plate body 71. The first support column 72 can make the spacer plate body 71 and the thermal insulation support seat 10 spaced apart from each other, and at the same time, the contact area between the spacer plate body 71 and the thermal insulation support seat 10 can be reduced, thereby avoiding heat directly transferred from the thermal insulation support seat 10 to the spacer plate body 71. At the same time, a plurality of second support columns 73 are evenly arranged between the spacer plate body 71 and the first support cover 4, one end of the second support column 73 is connected to the spacer plate body 71 and the other end is connected to the first support cover 4. The second support column 73 can make the spacer plate body 71 and the first support cover 4 spaced apart from each other, and at the same time, the contact area between the spacer plate body 71 and the first support cover 4 can be reduced, thereby avoiding heat directly transferred from the spacer plate body 71 to the first support cover 4. The second support group 7 adopts the above structure, which can increase the thermal insulation capacity of the thermal insulation support seat 10 and the first support cover 4, avoid the loss of heat in the thermal insulation part 2, and ensure the stability and uniformity of the temperature environment in the reaction chamber.

[0053] In one embodiment, see Figure 2The heater 5 includes a plurality of electric heating elements. A connecting electrode 8 is provided at the bottom of the vacuum container 1. The connecting electrode 8 is used to connect the heater 5 to an external circuit. The connecting electrode 8 is provided through the second support cover 13. One end of the connecting electrode 8 is electrically connected to the electric heating element. The other end of the connecting electrode 8 is located outside the vacuum container 1. The connecting electrode 8 is insulated and sealed to the second support cover 13. Specifically, the electric heating element refers to a component or assembly that converts electrical energy into thermal energy. The electric heating element may be a heating wire, an electric heating tube, a PTC (Positive Temperature Coefficient) ceramic, etc. The connecting electrode 8 refers to a conductive component that connects the electric heating element to an external circuit. The connecting electrode 8 is provided through the second support cover 13. By providing the connecting electrode 8 at the bottom of the vacuum container 1, the connection between the heater 5 and the external power supply can be more convenient, and the structure of the entire high-temperature chemical vapor deposition equipment can also be simpler. At the same time, when the insulation part 2 and the heater 5 need to be maintained, the connecting electrode 8 can be removed together with the second support cover 13, so that the maintenance of the insulation part 2 and the heater 5 can be more convenient.

[0054] In an alternative embodiment, see Figure 5 , a mounting via is provided on the second support cover 13. When the second support cover 13 is made of a conductive material such as metal, an insulating sleeve may be provided between the outside of the connecting electrode 8 and the inner wall of the mounting via, wherein the material of the insulating sleeve may be ceramic, polymer material, etc. In addition, a sealing cover plate may be provided on the bottom surface of the second support cover 13 to ensure the sealed connection between the connecting electrode 8 and the second support cover 13. The connecting electrode 8 is provided through the sealing cover plate and is sealed and connected with the sealing cover plate by a tight fit, and then the connecting electrode 8 is passed through the mounting via on the second support cover 13, and the sealing cover plate is provided on the bottom surface of the second support cover 13 to achieve a sealed installation between the connecting electrode 8 and the second support cover 13, which can make the installation of the connecting electrode 8 more convenient and quick.

[0055] In one embodiment, see Figure 2 and Figure 5, a first connector 9 is also provided at the bottom of the vacuum container 1, a connecting channel is provided inside the first connector 9, and the connecting channel is used to connect the reaction container 3 with an external process gas source, the first connector 9 is provided through the second support cover 13, one end of the first connector 9 is located in the vacuum container 1, and is detachably connected to the reaction container 3, the other end of the first connector 9 is located outside the vacuum container 1, and is used to communicate with the external process gas source, and the first connector 9 is sealed and connected with the second support cover 13. Specifically, the first connector 9 refers to a columnar component with a certain length, and the connecting channel refers to a channel structure with a certain length, and the connecting channel is provided along the length direction of the first connector 9. When installing, the first connector 9 can be provided through the second support cover 13, so that one end of the connecting channel is located in the vacuum container 1, and can be movably connected with the inside of the reaction container 3 through a pipeline. The other end of the connecting channel is located outside the vacuum container 1, and can be connected with the process gas source through a pipeline, so that the process gas can enter the reaction chamber in the reaction container 3 through the connecting channel on the first connector 9, which can make it more convenient to introduce the process gas into the reaction chamber.

[0056] In an alternative embodiment, see Figure 2 and Figure 5 A second connector is also provided at the bottom of the vacuum container 1, and a connecting channel is also provided inside the second connector. The second connector is used to connect the vacuum chamber 11 with the outside. Specifically, the second connector refers to a columnar component with a certain length, and a connecting channel is also provided on the second connector. The vacuum chamber 11 is connected with the outside through the second connector, and an inert gas can be introduced into the vacuum chamber 11. The second connector can also be connected to the reaction chamber in the reaction container 3 through one end of the vacuum chamber 11, and the reaction container 3 can be evacuated through part of the second connector.

[0057] In addition, the first connecting member 9 and the second connecting member are both installed on the second support cover 13, and can be removed together with the second support cover 13 when maintaining the insulation part 2 and the heater 5, making the maintenance of the high-temperature chemical vapor deposition equipment more convenient. The structures of the first connecting member 9 and the second connecting member can be the same, which is convenient for mass production during the manufacturing process, thereby reducing the overall production cost of the high-temperature chemical vapor deposition equipment.

[0058] In one embodiment, see Figure 2When the vacuum container 1 is working, the pressure in the vacuum chamber 11 is the first working pressure, and when the reaction container 3 is working, the pressure in the reaction chamber is the second working pressure, and the first working pressure is greater than the second working pressure. Specifically, when performing vapor deposition, the first working pressure can be greater than the second working pressure, thereby preventing the corrosive gas generated in the reaction container 3 from escaping to the vacuum container 1 and corroding the inner wall of the vacuum container 1 and the heater 5, thereby extending the service life of the equipment.

[0059] In an alternative embodiment, see Figure 2 The ratio of the second working pressure to the first working pressure is 1:1.02 to 1:1.2. By controlling the ratio of the second working pressure to the first working pressure to be between 1:1.02 and 1:1.2, the corrosive gas in the reaction vessel 3 will not escape into the vacuum vessel 1, and at the same time, the pressure difference between the vacuum chamber 11 and the reaction chamber will not be too large, thereby reducing energy consumption.

[0060] In one embodiment, see Figure 6 The reaction vessel 3 comprises a first cover 31, a second cover 32 and a cylinder 33. Both ends of the cylinder 33 have openings. The first cover 31 is sealed at one of the openings, and the second cover 32 is sealed at the other opening. The cylinder 33 comprises a plurality of annular members 331, which are arranged along the axis of the cylinder 33, and two adjacent annular members 331 are sealed and connected. Specifically, the annular members 331 are sealed and connected in sequence to form the cylinder 33, and then the first cover 31 and the second cover 32 are sealed and covered at both ends of the cylinder 33 to form the entire reaction vessel 3, so that the disassembly and assembly of the reaction vessel 3 can be more convenient, and the placement and removal of the product in the reaction vessel 3 can be facilitated, thereby improving the production efficiency.

[0061] In an optional embodiment, the ring member 331 , the first cover body 31 and the second cover body 32 may be made of graphite, ceramic or other high temperature resistant materials, so that the reaction container 3 is safer to use.

[0062] In one embodiment, see Figure 2 The heater 5 includes a top heating group arranged above the reaction container 3, a bottom heating group arranged below the reaction container 3, and a peripheral heating group arranged around the reaction container 3, and the peripheral heating group includes a first heating group, a second heating group, and a third heating group arranged along the height direction of the reaction container 3. Specifically, by dividing the heater 5 into a top heating group, a bottom heating group, and a peripheral heating group, and the peripheral heating group includes a first heating group, a second heating group, and a third heating group arranged along the height direction of the reaction container 3, multiple heating groups can be controlled separately, making temperature control more convenient.

[0063] In an alternative embodiment, see Figure 2 A measuring port for installing a vacuum measuring unit or a temperature measuring unit is provided on the vacuum container 1, wherein the number of the measuring ports may be multiple, and the provision of the measuring ports may make it more convenient to measure the temperature and pressure in the vacuum cavity 11 of the vacuum container 1.

[0064] The above are only preferred embodiments of the present invention, and only specifically describe the technical principles of the present invention. These descriptions are only for the purpose of explaining the principles of the present invention, and cannot be interpreted as limiting the scope of protection of the present invention in any way. Based on the explanation here, any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention, and other specific implementation methods of the present invention that can be associated with by technicians in this field without creative labor, should be included in the scope of protection of the present invention.

Claims

1. A high temperature chemical vapor deposition device, characterized in that: include: A vacuum container having a vacuum chamber; A heat insulation part is arranged in the vacuum chamber, and the heat insulation part has a containing space; A reaction container is arranged in the containing space, the reaction container has a reaction chamber which is not connected with the vacuum chamber, the reaction chamber is used to contain the product and is connected with an external process gas source pipeline; as well as The heater is arranged in the containing space and located between the inner wall of the heat insulating portion and the outer wall of the reaction container, and the heater is used to heat the reaction container.

2. The high temperature chemical vapor deposition equipment according to claim 1, characterized in that: The vacuum container has a first mounting port connected to the vacuum chamber, the insulation part has a second mounting port connected to the accommodating space, the first mounting port is located on the outside of the second mounting port, the sealing cover at the first mounting port is provided with a first supporting cover, the cover at the second mounting port is provided with a thermal insulation support seat, the thermal insulation support seat is located on the inner side of the first supporting cover and connected to the first supporting cover, and the reaction container is arranged on the inner side of the thermal insulation support seat and connected to the thermal insulation support seat.

3. The high temperature chemical vapor deposition equipment according to claim 2, characterized in that: The vacuum container includes a main body and a second support cover, the main body has a third mounting port, the second support cover sealing cover is arranged at the third mounting port, the first mounting port is arranged at the second support cover, and the heat insulation part is connected to the second support cover.

4. The high temperature chemical vapor deposition equipment according to claim 3, characterized in that: A first support group is arranged between the insulation part and the second support cover, and the insulation part is spaced apart from the second support cover through the first support group. A second support group is arranged between the insulation support seat and the first support cover, and the insulation support seat is spaced apart from the first support cover through the second support group.

5. The high temperature chemical vapor deposition equipment according to claim 4, characterized in that: The second support group includes a partition plate body, a first support column and a second support column, the first support column and the second support column are both multiple in number, the partition plate body is arranged between the thermal insulation support seat and the first support cover, the multiple first support columns are all arranged between the partition plate body and the thermal insulation support seat, and the multiple second support columns are all arranged between the partition plate body and the first support cover.

6. The high temperature chemical vapor deposition equipment according to claim 5, characterized in that: The heater includes a plurality of electric heating elements. A connecting electrode is provided at the bottom of the vacuum container. The connecting electrode is used to connect the heater with an external circuit. The connecting electrode is provided through the second support cover. One end of the connecting electrode is electrically connected to the electric heating element. The other end of the connecting electrode is located outside the vacuum container. The connecting electrode and the second support cover are insulated and sealed.

7. The high temperature chemical vapor deposition equipment according to claim 5, characterized in that: A first connecting piece is also provided at the bottom of the vacuum container, and a connecting channel is provided inside the first connecting piece, and the connecting channel is used to connect the reaction container with an external process gas source. The first connecting piece passes through the second support cover, and the first connecting piece and the second support cover are sealed and connected. One end of the first connecting piece is located in the vacuum container and is detachably connected to the reaction container, and the other end of the first connecting piece is located outside the vacuum container and is used to be connected to the external process gas source.

8. The high temperature chemical vapor deposition apparatus according to any one of claims 1 to 7, characterized in that: When the vacuum container is working, the pressure in the vacuum chamber is a first working pressure, and when the reaction container is working, the pressure in the reaction chamber is a second working pressure, and the first working pressure is greater than the second working pressure.

9. The high temperature chemical vapor deposition apparatus according to any one of claims 1 to 7, characterized in that: The reaction container includes a first cover body, a second cover body and a cylinder body, both ends of the cylinder body have openings, the first cover body sealing cover is arranged at one of the openings, and the second cover body sealing cover is arranged at the other opening. The cylinder body includes a plurality of annular parts, and the annular parts are arranged along the axis of the cylinder body, and two adjacent annular parts are sealed and connected.

10. The high temperature chemical vapor deposition equipment according to any one of claims 1 to 7, characterized in that: The heater includes a top heating group arranged above the reaction container, a bottom heating group arranged below the reaction container, and a peripheral heating group arranged around the reaction container. The peripheral heating group includes a first heating group, a second heating group, and a third heating group arranged along the height direction of the reaction container.

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