Silicon wafer processing and cleaning equipment

Abstract

The utility model relates to the technical field of silicon wafer cleaning, in particular to silicon wafer processing and cleaning equipment. The cleaning device comprises a supporting frame, a storage box is installed on the upper surface of the supporting frame, a box door is installed on the upper surface of the storage box, a cleaning structure is arranged on the inner wall of the storage box and comprises a motor, the motor is fixedly connected with the storage box, the output end of the motor is fixedly connected with a screen frame, and the screen frame is fixedly connected with the storage box. A positioning column is rotatably connected to one side of the screen frame and fixedly connected with the storage box, water storage plates are fixedly connected to the two sides of the inner wall of the storage box correspondingly, a plurality of spray heads are fixedly connected to one side of each water storage plate, and a plurality of limiting grooves are formed in the two sides of the inner wall of the screen frame correspondingly. The two sides of the screen frame are each fixedly connected with two positioning plates, every two positioning plates form a group, and the inner walls of the positioning plates are rotationally connected with connecting rods. The problems that multiple silicon wafers cannot be cleaned at the same time and cleaning is not comprehensive enough are solved.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer cleaning, in particular to silicon wafer processing cleaning equipment. Background Art

[0002] There are two types of silicon wafer cleaning: wet cleaning and dry cleaning. The main purpose is to eliminate various pollutants adsorbed on the surface of the silicon wafer to avoid affecting the conversion efficiency of the battery. Silicon wafers are the cornerstone of semiconductor materials and are widely used in chemical, photovoltaic, chip and other fields.

[0003] In the prior art, when silicon wafers need to be cleaned, a small portion of the silicon wafers is first placed in a cleaning device, and then multiple screws are turned to fix the silicon wafers, and then the cleaning device is started to clean the silicon wafers. However, this operation will cause the following problems: only a small portion of the silicon wafers can be cleaned each time, which greatly reduces the efficiency of cleaning the silicon wafers, and turning multiple screws to fix the silicon wafers is cumbersome and time-consuming. Due to the high requirements for cleaning the silicon wafers, the parts blocked by the screws cannot make the silicon wafers clean more comprehensively, resulting in the silicon wafers needing to be cleaned again before they can be put into use. Utility Model Content

[0004] The utility model aims to solve the shortcomings of the prior art that multiple silicon wafers cannot be cleaned simultaneously and the cleaning is not comprehensive enough, and proposes a silicon wafer processing cleaning device.

[0005] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a silicon wafer processing and cleaning equipment, comprising a support frame, a storage box is installed on the upper surface of the support frame, a box door is installed on the upper surface of the storage box, a cleaning structure is provided on the inner wall of the storage box, and the cleaning structure comprises a motor, the motor and the storage box are fixedly connected, the output end of the motor is fixedly connected to a screen frame, one side of the screen frame is rotatably connected to a positioning column, the positioning column and the storage box are fixedly connected, both sides of the inner wall of the storage box are fixedly connected to water retention plates, one side of the water retention plates is fixedly connected to a plurality of nozzles, both sides of the inner wall of the screen frame are provided with a plurality of limiting grooves, both sides of the screen frame are fixedly connected to two positioning plates, every two positioning plates form a group, the inner wall of the positioning plate is rotatably connected to a connecting rod, the arc surface of the connecting rod is threadedly connected to a disc, and the arc surface of the connecting rod is fixedly connected to an auxiliary plate.

[0006] The effect achieved by the above components is that multiple silicon wafers can be cleaned conveniently by setting the cleaning structure, which greatly improves the efficiency of cleaning the silicon wafers.

[0007] Preferably, the arc surface of the disc is provided with anti-skid patterns, and the anti-skid patterns are evenly distributed on the disc.

[0008] The effect achieved by the above components is that the anti-slip pattern can increase the friction of the disc, thereby preventing the hands of personnel from slipping when rotating the disc.

[0009] Preferably, a soft pad is fixedly connected to one side of the disc, and the sizes of the soft pad and the disc are matched.

[0010] The effects achieved by the above components are: the cushion can increase the contact area of ​​the disc, thereby achieving a more stable fixation effect between the disc and the positioning plate.

[0011] Preferably, a protective block is fixedly connected to the lower surface of the support frame, and the protective block is a rubber block.

[0012] The effects achieved by the above components are: the protective block can prevent the support frame from directly contacting the ground, thereby avoiding wear of the support frame.

[0013] Preferably, an auxiliary structure is provided on one side of the storage box, and the auxiliary structure includes a fixed plate, and the fixed plate and the storage box are fixedly connected, and one side of the fixed plate is fixedly connected to a limiting rod, and the arc surface of the limiting rod is slidably connected to a clip, and slots are provided on both sides of the inner wall of the clip, and the inner wall of the slot is slidably connected to a connecting plate.

[0014] The effect achieved by the above components is: by setting up the auxiliary structure, personnel can easily use the clamps to put in or take out the silicon wafers, and when the connecting plate on the clamps becomes dirty, it can be replaced in time, avoiding the situation where the silicon wafers are dirty when taken out by hand.

[0015] Preferably, an elastic rope is fixedly connected to one side of the fixing plate, and the elastic rope is fixedly connected to the clip.

[0016] The effect achieved by the above components is that the elastic rope can limit the moving distance of the clip, thereby preventing the clip from being lost.

[0017] Preferably, one end of the limiting rod is fixedly connected with a guide cone, and the sizes of the guide cone and the limiting rod are matched.

[0018] The effect achieved by the above components is that since the volume of the guide cone is small, it is convenient for the clamp to be directly mounted on the limit rod.

[0019] In summary, the beneficial effects of the utility model are:

[0020] In the utility model, when it is necessary to clean the silicon wafers, a small part of the silicon wafers is first placed in the cleaning device, and then a plurality of screws are turned to fix the silicon wafers, and then the cleaning device is started to clean the silicon wafers. However, this operation will cause the following problems: only a small part of the silicon wafers can be cleaned each time, which greatly reduces the efficiency of cleaning the silicon wafers, and it is cumbersome and time-consuming to turn a plurality of screws to fix the silicon wafers. Since the requirements for cleaning the silicon wafers are high, the parts blocked by the screws cannot make the silicon wafers clean more comprehensively, so that the silicon wafers need to be cleaned again before they can be put into use. By setting up a cleaning structure, multiple silicon wafers can be easily cleaned, so that the silicon wafers are cleaned more comprehensively, and the silicon wafers can be quickly and conveniently placed in the mesh frame, which greatly improves the efficiency of cleaning the silicon wafers.

[0021] In the utility model, when the silicon wafer needs to be taken out after cleaning, taking it out directly by hand will dirty the surface of the silicon wafer, affecting the next use of the silicon wafer. By setting up an auxiliary structure, personnel can conveniently use the clamp to put in or take out the silicon wafer, and when the connecting plate on the clamp becomes dirty, it can be replaced in time, avoiding the situation that the silicon wafer will be dirty when taking it out by hand. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a three-dimensional structural schematic diagram of the utility model;

[0023] Figure 2 For this utility model Figure 1 Schematic diagram of the internal structure;

[0024] Figure 3 It is a structural schematic diagram of the cleaning structure of the utility model;

[0025] Figure 4 For this utility model Figure 3 A magnified image of point A;

[0026] Figure 5 It is a partial structural schematic diagram of the cleaning structure of the utility model;

[0027] Figure 6 It is a structural schematic diagram of the auxiliary structure of the utility model;

[0028] Figure 7 It is a partial structural schematic diagram of the auxiliary structure of the utility model.

[0029] Legend: 1. Support frame; 2. Storage box; 3. Cleaning structure; 301. Motor; 302. Screen frame; 303. Positioning column; 304. Water storage plate; 305. Nozzle; 306. Limiting groove; 307. Positioning plate; 308. Connecting rod; 309. Disc; 310. Protective block; 311. Anti-slip groove; 312. Cushion; 313. Auxiliary plate; 4. Box door; 5. Auxiliary structure; 51. Fixed plate; 52. Limiting rod; 53. Clip; 54. Slot; 55. Connecting plate; 56. Elastic rope; 57. Guide cone. DETAILED DESCRIPTION

[0030] Reference Figure 1 As shown, the utility model provides a technical solution: a silicon wafer processing and cleaning device, including a support frame 1, a storage box 2 is installed on the upper surface of the support frame 1, a box door 4 is installed on the upper surface of the storage box 2, a cleaning structure 3 is provided on the inner wall of the storage box 2, and an auxiliary structure 5 is provided on one side of the storage box 2.

[0031] The specific settings and functions of the cleaning structure 3 and the auxiliary structure 5 are described in detail below.

[0032] Reference Figure 2 , Figure 3 . Figure 4 and Figure 5As shown, in this embodiment: the cleaning structure 3 includes a motor 301, the motor 301 is fixedly connected to the storage box 2, the output end of the motor 301 is fixedly connected to the screen frame 302, one side of the screen frame 302 is rotatably connected to a positioning column 303, the positioning column 303 and the storage box 2 are fixedly connected, both sides of the inner wall of the storage box 2 are fixedly connected to water storage plates 304, one side of the water storage plates 304 is fixedly connected to a plurality of nozzles 305, both sides of the inner wall of the screen frame 302 are provided with a plurality of limiting grooves 306, both sides of the inner wall of the screen frame 302 are fixedly connected to two positioning plates 307, every two positioning plates 307 form a group, the inner wall of the positioning plate 307 is rotatably connected to a connecting rod 308, the arc surface of the connecting rod 308 is threadedly connected to a disc 309, the arc surface of the connecting rod 308 is fixedly connected to an auxiliary plate 313, and by setting the cleaning structure Multiple silicon wafers can be cleaned conveniently, which greatly improves the efficiency of cleaning the silicon wafers. The arc surface of the disk 309 is provided with anti-skid patterns 311, which are evenly distributed on the disk 309. The anti-skid patterns 311 can increase the friction of the disk 309, thereby preventing the hands of personnel from slipping when rotating the disk 309. A soft pad 312 is fixedly connected to one side of the disk 309. The soft pad 312 is adapted to the size of the disk 309. The soft pad 312 can increase the contact area of ​​the disk 309, thereby achieving a more stable effect of fixing the disk 309 and the positioning plate 307. A protective block 310 is fixedly connected to the lower surface of the support frame 1. The protective block 310 is a rubber block. The protective block 310 can prevent the support frame 1 from directly contacting the ground, thereby avoiding the wear of the support frame 1.

[0033] Reference Figure 6 and Figure 7 As shown, in this embodiment: the auxiliary structure 5 includes a fixing plate 51, the fixing plate 51 is fixedly connected to the storage box 2, one side of the fixing plate 51 is fixedly connected to a limit rod 52, the arc surface of the limit rod 52 is slidably connected to a clip 53, both sides of the inner wall of the clip 53 are provided with a card slot 54, the inner wall of the card slot 54 is slidably connected to a connecting plate 55, by setting the auxiliary structure 5, the personnel can conveniently use the clip 53 to put in or take out the silicon wafer, and when the connecting plate 55 on the clip 53 becomes dirty, it can be replaced in time to avoid In order to avoid the situation where the silicon wafer is dirty when taking it out by hand, an elastic rope 56 is fixedly connected to one side of the fixed plate 51, and the elastic rope 56 is fixedly connected to the clamp 53. The elastic rope 56 can limit the moving distance of the clamp 53, thereby preventing the clamp 53 from being lost. A guide cone 57 is fixedly connected to one end of the limiting rod 52. The sizes of the guide cone 57 and the limiting rod 52 are matched. Since the volume of the guide cone 57 is small, it is convenient for the clamp 53 to be directly put on the limiting rod 52.

[0034] Working principle: by setting the cleaning structure 3, first open the box door 4 to place the silicon wafer into the limit groove 306 of the net frame 302, then directly rotate the auxiliary plate 313 on the connecting rod 308 to block the silicon wafer, and then use the anti-skid pattern 311 to rotate the disk 309. The anti-skid pattern 311 can increase the friction of the disk 309, avoiding the situation that the hands of the personnel slip when rotating the disk 309, so that the disk 309 drives the soft pad 312 and the positioning plate 307 to be fixed, and the soft pad 312 can increase the contact area of ​​the disk 309, achieving The disc 309 and the positioning plate 307 are fixed more stably. At this time, the position of the auxiliary plate 313 is fixed. The motor 301 on the side of the storage box 2 on the start-up support frame 1 rotates. The rotation of the motor 301 drives the mesh frame 302 to rotate on the positioning column 303. At the same time, the water storage plate 304 sprays water through the nozzle 305, so that the nozzle 305 cleans the rotating silicon wafer in the mesh frame 302. The protective block 310 can prevent the support frame 1 from directly contacting the ground, thereby avoiding the wear of the support frame 1.

[0035] By setting up the auxiliary structure 5, when the silicon wafer is cleaned, the personnel will take down the clamp 53 from the limiting rod 52 on one side of the fixed plate 51. When the clamp 53 is taken down, the elastic rope 56 will limit the moving distance of the clamp 53, so as to avoid the loss of the clamp 53. The personnel then use the clamp 53 to take out the silicon wafer from the mesh frame 302. The clamp 53 is easy to get dirty after long-term use. At this time, the connecting plate 55 in the card slot 54 can be taken out for replacement. Among them, since the volume of the guide cone 57 is small, it is convenient for the clamp 53 to be directly put on the limiting rod 52.

[0036] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

Claims

1. A silicon wafer processing and cleaning device, comprising a support frame (1), characterized in that: A storage box (2) is mounted on the upper surface of the support frame (1), a box door (4) is mounted on the upper surface of the storage box (2), a cleaning structure (3) is provided on the inner wall of the storage box (2), the cleaning structure (3) comprises a motor (301), the motor (301) and the storage box (2) are fixedly connected, an output end of the motor (301) is fixedly connected to a screen frame (302), one side of the screen frame (302) is rotatably connected to a positioning column (303), the positioning column (303) and the storage box (2) are fixedly connected, and both sides of the inner wall of the storage box (2) are fixedly connected to A water retaining plate (304), one side of which is fixedly connected to a plurality of nozzles (305), both sides of the inner wall of the net frame (302) are provided with a plurality of limit grooves (306), both sides of the net frame (302) are fixedly connected to two positioning plates (307), each two positioning plates (307) form a group, the inner wall of the positioning plate (307) is rotatably connected to a connecting rod (308), the circular arc surface of the connecting rod (308) is threadedly connected to a disc (309), and the circular arc surface of the connecting rod (308) is fixedly connected to an auxiliary plate (313).

2. The silicon wafer processing and cleaning equipment according to claim 1, characterized in that: The circular arc surface of the circular disk (309) is provided with anti-skid patterns (311), and the anti-skid patterns (311) are evenly distributed on the circular disk (309).

3. The silicon wafer processing and cleaning equipment according to claim 1, characterized in that: A soft pad (312) is fixedly connected to one side of the circular disc (309), and the sizes of the soft pad (312) and the circular disc (309) are matched.

4. The silicon wafer processing and cleaning equipment according to claim 1, characterized in that: A protection block (310) is fixedly connected to the lower surface of the support frame (1), and the protection block (310) is a rubber block.

5. The silicon wafer processing and cleaning equipment according to claim 1, characterized in that: An auxiliary structure (5) is provided on one side of the storage box (2), the auxiliary structure (5) comprising a fixing plate (51), the fixing plate (51) being fixedly connected to the storage box (2), one side of the fixing plate (51) being fixedly connected to a limiting rod (52), the arc surface of the limiting rod (52) being slidably connected to a clip (53), both sides of the inner wall of the clip (53) being provided with a clamping groove (54), the inner wall of the clamping groove (54) being slidably connected to a connecting plate (55).

6. The silicon wafer processing and cleaning equipment according to claim 5, characterized in that: An elastic rope (56) is fixedly connected to one side of the fixing plate (51), and the elastic rope (56) is fixedly connected to the clip (53).

7. The silicon wafer processing and cleaning equipment according to claim 5, characterized in that: One end of the limiting rod (52) is fixedly connected to a guide cone (57), and the guide cone (57) and the limiting rod (52) have matching sizes.

Images