Double-sided winding magnetron sputtering coating machine

Abstract

The utility model discloses a double-sided winding magnetron sputtering coating machine, which relates to the technical field of vacuum coating, and comprises a vacuum system, a winding system, a pre-cleaning system and a sputtering coating system, the vacuum system is provided with a winding and unwinding cavity, a first pretreatment cavity, a second pretreatment cavity, a first sputtering cavity and a second sputtering cavity; a first coating roller is mounted in the first pretreatment cavity; a second coating roller is mounted in the second pretreatment cavity; the sputter coating system comprises a first sputtering device and a second sputtering device; the first sputtering device is mounted in the first sputtering cavity and is used for carrying out sputtering coating on the first surface of the coiled material which is conveyed to pass through; the second sputtering device is mounted in the second sputtering cavity and is used for carrying out sputtering coating on the second surface of the coiled material which is conveyed to pass through; the pre-cleaning system comprises a first cleaning device and a second cleaning device; the first cleaning device is mounted in the first pretreatment cavity; the second cleaning device is mounted in the second pretreatment cavity; and the coating efficiency and the product quality are improved, and the production cost is reduced.

Description

Technical Field

[0001] The present application relates to the field of vacuum coating technology, and in particular to a double-sided winding magnetron sputtering coating machine. Background Art

[0002] In recent years, with the development of science and technology, the demand for flexible material coating has been growing. At present, the coating mainly adopts evaporation coating, chemical vapor deposition, sputtering coating and other methods. Compared with evaporation coating, magnetron sputtering coating has the advantages of better film bonding, film density and uniformity; compared with chemical vapor deposition, it has a faster coating rate and more film types. Therefore, magnetron sputtering coating technology has been widely used in the preparation process of flexible thin films.

[0003] However, traditional magnetron sputtering coating machines for flexible materials are mostly single-sided coating machines without pre-treatment functions. For flexible substrates that need to be cleaned and coated on both sides, two independent coating operations are required. This requires opening the vacuum chamber when the other side is coated during the coating process, exposing the coil to the atmosphere to absorb water vapor. At the same time, the lack of pre-treatment function will seriously affect the film quality. The above defects undoubtedly greatly increase production costs and time, and affect product quality. Utility Model Content

[0004] In view of this, the purpose of the present application is to provide a double-sided winding magnetron sputtering coating machine to solve the technical problems of traditional magnetron sputtering coating machines that affect product quality and increase production costs due to single-sided coating and lack of pretreatment.

[0005] In order to achieve the above technical purpose, the present application provides a double-sided winding magnetron sputtering coating machine, including a vacuum system, a winding system, a pre-cleaning system and a sputtering coating system;

[0006] The vacuum system comprises a retractable and retractable chamber, a first pretreatment chamber, a second pretreatment chamber, a first sputtering chamber and a second sputtering chamber;

[0007] A first coating roller is installed in the first pretreatment chamber;

[0008] A portion of the first coating roller extends into the first sputtering chamber;

[0009] A second coating roller is installed in the second pretreatment chamber;

[0010] A portion of the second coating roller extends into the second sputtering chamber;

[0011] The winding system is used to convey the coil and make the second side of the coil adhere to the first coating roller and pass through the first coating roller, and make the first side of the coil adhere to the second coating roller and pass through the second coating roller;

[0012] The sputtering coating system includes a first sputtering device and a second sputtering device;

[0013] The first sputtering device is installed in the first sputtering chamber and is used to perform sputtering coating on the first surface of the coiled material being conveyed;

[0014] The second sputtering device is installed in the second sputtering chamber and is used to perform sputtering coating on the second surface of the coiled material being conveyed;

[0015] The pre-cleaning system comprises a first cleaning device and a second cleaning device;

[0016] The first cleaning device is installed in the first pretreatment chamber and is used to clean the first surface of the coiled material conveyed before coating;

[0017] The second cleaning device is installed in the second pretreatment chamber and is used to clean the second surface of the coiled material conveyed before coating.

[0018] Further, the vacuum system includes a vacuum chamber;

[0019] A first baffle, a second baffle, a third baffle and a fourth baffle are installed in the vacuum chamber;

[0020] The first baffle plate, the second baffle plate, the third baffle plate and the fourth baffle plate are used to separate the vacuum chamber into the retractable and rewinding chamber, the first pretreatment chamber, the second pretreatment chamber, the first sputtering chamber and the second sputtering chamber.

[0021] Furthermore, a cold trap is installed in the retractable winding chamber.

[0022] Further, it also includes a lighting system;

[0023] The lighting system is installed in the retractable and retractable reel cavity.

[0024] Further, a first baffle is provided in the first pretreatment chamber;

[0025] The first partition is used to separate the first pre-treatment chamber into a first treatment space and a first film roller space;

[0026] The first coating roller is installed in the first film roller space and partially extends to the first processing space;

[0027] The first cleaning device is installed in the first processing space;

[0028] A second partition is provided in the second pretreatment chamber;

[0029] The second partition is used to separate the second pre-treatment chamber into a second treatment space and a second film roller space;

[0030] The second coating roller is installed in the second film roller space and partially extends to the second processing space;

[0031] The second cleaning device is installed in the second processing space.

[0032] Further, the first sputtering device includes a first a-surface sputtering cathode, a second a-surface sputtering cathode and a third a-surface sputtering cathode;

[0033] The second sputtering device includes a first b-side sputtering cathode, a second b-side sputtering cathode and a third b-side sputtering cathode;

[0034] The first a-surface sputtering cathode, the second a-surface sputtering cathode and the third a-surface sputtering cathode are sequentially distributed around the outer circumference of the first coating roller;

[0035] The first b-side sputtering cathode, the second b-side sputtering cathode and the third b-side sputtering cathode are sequentially distributed around the outer circumference of the second coating roller.

[0036] Furthermore, the winding system comprises an unwinding roller, a winding roller and a guide roller group;

[0037] The guide roller group includes a first guide roller, a second guide roller, a third guide roller, a fourth guide roller, a fifth guide roller, a sixth guide roller, a seventh guide roller, an eighth guide roller, and a ninth guide roller which are arranged in sequence;

[0038] The first guide roller, the second guide roller and the third guide roller are arranged between the unwinding roller and the first coating roller;

[0039] The fourth guide roller, the fifth guide roller and the sixth guide roller are arranged between the first coating roller and the second coating roller;

[0040] The seventh guide roller, the eighth guide roller and the ninth guide roller are arranged between the second coating roller and the winding roller.

[0041] Furthermore, the winding system further comprises a detection roller group;

[0042] The detection roller group includes a first tension measuring roller, a second tension measuring roller and a monitoring roller;

[0043] The first tension measuring roller is disposed between the first guide roller and the second guide roller;

[0044] The second tension measuring roller is disposed between the eighth guide roller and the ninth guide roller;

[0045] The monitoring roller is arranged between the fourth guide roller and the fifth guide roller and is connected to an encoder connecting gear for monitoring the running length of the coil.

[0046] It can be seen from the above technical solutions that the double-sided winding magnetron sputtering coating machine designed in this application has the following beneficial effects:

[0047] By utilizing the cooperation of the winding system with the first coating roller and the second coating roller, both sides of the coil can be exposed during the process of conveying the coil, and then the first sputtering device and the second sputtering device are cooperated to realize double-sided coating during the coil conveying process; moreover, the coil before coating can be cleaned and pre-treated by the first cleaning device and the second cleaning device respectively; the coating efficiency and product quality are greatly improved, the production cost is reduced, and it has important economic value and social significance. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0049] Figure 1 A schematic diagram of the structure of a double-sided winding magnetron sputtering coating machine provided in this application;

[0050] Figure 2 A front view of a winding system of a double-sided winding magnetron sputtering coating machine provided in the present application;

[0051] Figure 3 A side view of a winding system of a double-sided winding magnetron sputtering coating machine provided in the present application;

[0052] Figure 4 A side view of a first guide roller of a double-sided winding magnetron sputtering coating machine provided in the present application;

[0053] In the figure: 1, vacuum chamber; 211, unwinding roller; 212, winding roller; 221, first guide roller; 222, second guide roller; 223, third guide roller; 224, fourth guide roller; 225, fifth guide roller; 226, sixth guide roller; 227, seventh guide roller; 228, eighth guide roller; 229, ninth guide roller; 231, first tension measuring roller; 232, second tension measuring roller; 241, first coating roller; 242, second coating roller; 251, monitoring roller; 252, encoder connecting gear; 311, first a-surface sputtering cathode; 312, second a-surface sputtering cathode; 313 , third a-side sputtering cathode; 321, first b-side sputtering cathode; 322, second b-side sputtering cathode; 323, third b-side sputtering cathode; 411, first cleaning device; 412, second cleaning device; 511, first baffle; 521, second baffle; 522, fourth baffle; 531, third baffle; 541, first partition; 542, second partition; 611, first lighting lamp; 612, second lighting lamp; 7, cold trap; 8, coil; 9, fixing bolt; 101, first cooling water inlet and outlet pipe; 102, second cooling water inlet and outlet pipe; 11, coating roller synchronization wheel. DETAILED DESCRIPTION

[0054] The technical solutions of the embodiments of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present application, not all of them. All other embodiments obtained by ordinary technicians in this field without creative work based on the embodiments in the embodiments of the present application are within the scope of protection of the embodiments of the present application.

[0055] In the description of the embodiments of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, which are only for the convenience of describing the embodiments of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the embodiments of the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.

[0056] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a replaceable connection, or an integral connection, it can be a mechanical connection, it can be an electrical connection, it can be a direct connection, it can be indirectly connected through an intermediate medium, and it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0057] The embodiment of the present application discloses a double-sided winding magnetron sputtering coating machine.

[0058] See also Figure 1 as well as Figure 3 , an embodiment of a double-sided winding magnetron sputtering coating machine provided in the embodiments of the present application includes:

[0059] Vacuum systems, take-up systems, pre-cleaning systems and sputtering coating systems.

[0060] The vacuum system is used to create and maintain a high vacuum environment during the coating process to ensure the quality and stability of the coating. The vacuum system is designed with a reel-and-roll chamber, a first pretreatment chamber, a second pretreatment chamber, a first sputtering chamber, and a second sputtering chamber. Five independent areas are designed to provide the vacuum environment required by the corresponding execution module in a targeted manner to reduce the situation where the vacuum conditions of the corresponding areas are interfered with each other.

[0061] A first coating roller 241 is installed in the first pretreatment chamber, and a portion of the first coating roller 241 extends into the first sputtering chamber, so that a portion of the web 8 on the first coating roller 241 can pass through the first sputtering chamber; a second coating roller 242 is installed in the second pretreatment chamber, and a portion of the second coating roller 242 extends into the second sputtering chamber, so that a portion of the web 8 on the second coating roller 242 can pass through the second sputtering chamber. Figure 3 As shown, the first coating roller 241 and the second coating roller 242 have the same structural design, and are both connected to the servo motor through the coating roller synchronous wheel 11 to realize the rotation work. At the same time, cooling water is provided to the internal cold water pipeline of the first coating roller 241 through the first cooling water inlet and outlet pipe opening 101 and the second cooling water inlet and outlet pipe opening 102, respectively, so as to realize the cooling function of the first coating roller 241 on the coil 8; the second coating roller 242 also has the third cooling water inlet and outlet pipe opening (not shown in the figure) and the fourth cooling water inlet and outlet pipe opening (not shown in the figure) like the first coating roller 241, to provide cooling water to the internal cold water pipeline of the second coating roller 242, so as to realize the cooling function of the second coating roller 242 on the coil 8.

[0062] The winding system is used to convey the coil 8, and to make the second side of the coil 8 close to the first coating roller 241 and pass through the first coating roller 241, and to make the first side of the coil 8 close to the second coating roller 242 and pass through the second coating roller 242. The winding system is used to realize the transmission of the coil 8, specifically, to continuously feed the flexible substrate to be coated into the sputtering chamber, and to wind and collect it after the sputtering coating is completed.

[0063] The sputtering coating system includes a first sputtering device and a second sputtering device; the first sputtering device is installed in a first sputtering chamber and is used to sputter coat the first side of the coil 8 being conveyed; the second sputtering device is installed in a second sputtering chamber and is used to sputter coat the second side of the coil 8 being conveyed.

[0064] The pre-cleaning system includes a first cleaning device 411 and a second cleaning device 412; the first cleaning device 411 is installed in the first pre-treatment chamber, and is used to clean the first side of the coil 8 conveyed before coating; the second cleaning device 412 is installed in the second pre-treatment chamber, and is used to clean the second side of the coil 8 conveyed before coating. The first cleaning device 411 and the second cleaning device 412 can be ion source cleaning devices, and according to the process requirements, an anode layer ion source, a Kaufman ion source, a radio frequency ion source, an ICP plasma source, etc. can be selected without limitation.

[0065] The double-sided winding magnetron sputtering coating machine designed in this application has the following beneficial effects:

[0066] By utilizing the cooperation of the winding system with the first coating roller 241 and the second coating roller 242, both sides of the coil 8 can be exposed during the process of conveying the coil 8, and then the first sputtering device and the second sputtering device are cooperated to realize double-sided coating of the coil 8 during the conveyance process; moreover, the coil 8 before coating can be cleaned and pre-treated by the first cleaning device 411 and the second cleaning device 412 respectively; the coating efficiency and product quality are greatly improved, the production cost is reduced, and it has important economic value and social significance.

[0067] The above is the first embodiment of a double-sided winding magnetron sputtering coating machine provided by the embodiment of the present application. The following is the second embodiment of a double-sided winding magnetron sputtering coating machine provided by the embodiment of the present application. For details, please refer to Figures 1 to 4 .

[0068] Based on the above implementation plan:

[0069] Furthermore, with respect to the design of the vacuum system, a vacuum chamber 1 is included.

[0070] A first baffle 511, a second baffle 521, a third baffle 531 and a fourth baffle 522 are installed in the vacuum chamber 1; the first baffle 511, the second baffle 521, the third baffle 531 and the fourth baffle 522 are used to separate the vacuum chamber 1 into a retractable and rewinding chamber, a first pretreatment chamber, a second pretreatment chamber, a first sputtering chamber and a second sputtering chamber.

[0071] like Figure 1 As shown, taking the vacuum chamber 1 as a cubic structure design, the first baffle 511 is arranged along the width direction, and the space on one side of the first baffle 511 is used as the retractable and rewinding chamber; the third baffle 531 is arranged in the space on the other side along the length direction of the vacuum chamber 1, and the second baffle 521 is arranged in the space on one side of the third baffle 531 along the width direction, and the fourth baffle 522 is arranged in the space on the other side along the width direction; the space on one side of the second baffle 521 close to the retractable and rewinding chamber forms the first pretreatment chamber, and the space on the other side forms the first sputtering chamber; the space on one side of the fourth baffle 522 close to the retractable and rewinding chamber forms the second pretreatment chamber, and the space on the other side forms the second sputtering chamber. In this way, the division of each chamber is realized, and the overall structure is more compact.

[0072] Furthermore, in order to reduce the impact of the large amount of surface water vapor, adsorbed gas, etc. released during the transmission of the coil 8 on the vacuum conditions of the vacuum chamber 1, a cold trap 7 is installed in the winding and unwinding chamber to improve the vacuum pumping capacity of the area and prevent the vacuum conditions of the pretreatment chamber and the sputtering chamber from being affected.

[0073] Furthermore, if Figure 1 As shown, it also includes a lighting system, which is installed in the reel cavity, so that the operator can observe the transmission of the coil 8 through the observation window during use. The lighting system is specifically designed to include a first lighting lamp 611 and a second lighting lamp 612, which are symmetrically arranged in the reel cavity without limitation.

[0074] Furthermore, a first partition 541 is provided in the first pretreatment chamber; the first partition 541 is used to separate the first pretreatment chamber into a first processing space and a first film roller space; the first coating roller 241 is installed in the first film roller space and partially extends to the first processing space; the first cleaning device 411 is installed in the first processing space; a second partition 542 is provided in the second pretreatment chamber; the second partition 542 is used to separate the second pretreatment chamber into a second processing space and a second film roller space; the second coating roller 242 is installed in the second film roller space and partially extends to the second processing space; the second cleaning device 412 is installed in the second processing space.

[0075] Specifically, the first cleaning device 411 and the second cleaning device 412 are respectively located at the side ends of the first coating roller 241 and the second coating roller 242, and are symmetrically distributed in the vacuum chamber 1. The first partition 541 and the second partition 542 form an effective pre-cleaning area to clean the surface of the coil 8 passing therethrough, so as to remove residual oil, water vapor and other attachments on the surface of the coil 8, thereby improving the growth of the film, optimizing the film structure and improving the adhesion of the film.

[0076] Furthermore, if Figure 1 As shown, the first sputtering device includes a first a-surface sputtering cathode 311, a second a-surface sputtering cathode 312, and a third a-surface sputtering cathode 313; the second sputtering device includes a first b-surface sputtering cathode 321, a second b-surface sputtering cathode 322, and a third b-surface sputtering cathode 323;

[0077] The first a-side sputtering cathode 311, the second a-side sputtering cathode 312 and the third a-side sputtering cathode 313 are sequentially distributed around the outer circumference of the first coating roller 241; the first b-side sputtering cathode 321, the second b-side sputtering cathode 322 and the third b-side sputtering cathode 323 are sequentially distributed around the outer circumference of the second coating roller 242.

[0078] Different targets can be placed in the first sputtering chamber and the second sputtering chamber to coat different film layers on both sides to avoid contamination of the film layers. Sputtering cathodes all use a DC planar target method to achieve a faster metal film coating speed while having the advantage of low cost; the target is made of high-purity metal or alloy and is the main source of coating materials.

[0079] Furthermore, the winding system includes an unwinding roller 211, a winding roller 212 and a guide roller group.

[0080] The guide roller group includes a first guide roller 221, a second guide roller 222, a third guide roller 223, a fourth guide roller 224, a fifth guide roller 225, a sixth guide roller 226, a seventh guide roller 227, an eighth guide roller 228, and a ninth guide roller 229 which are arranged in sequence.

[0081] The first guide roller 221, the second guide roller 222 and the third guide roller 223 are arranged between the unwinding roller 211 and the first coating roller 241; the fourth guide roller 224, the fifth guide roller 225 and the sixth guide roller 226 are arranged between the first coating roller 241 and the second coating roller 242; the seventh guide roller 227, the eighth guide roller 228 and the ninth guide roller 229 are arranged between the second coating roller 242 and the winding roller 212.

[0082] Furthermore, the winding system also includes a detection roller group.

[0083] The detection roller group includes a first tension measuring roller 231, a second tension measuring roller 232 and a monitoring roller 251; the first tension measuring roller 231 is arranged between the first guide roller 221 and the second guide roller 222; the second tension measuring roller 232 is arranged between the eighth guide roller 228 and the ninth guide roller 229; the monitoring roller 251 is arranged between the fourth guide roller 224 and the fifth guide roller 225, and is connected to the encoder connecting gear 252 for monitoring the running length of the coil 8.

[0084] In the present application, the unwinding roller 211, the first guide roller 221, the first tension measuring roller 231, the second guide roller 222, the third guide roller 223, the first coating roller 241, the fourth guide roller 224, the monitoring roller 251, the fifth guide roller 225, the sixth guide roller 226, the second coating roller 242, the seventh guide roller 227, the eighth guide roller 228, the second tension measuring roller 232, the ninth guide roller 229 and the winding roller 212 are sequentially connected and arranged. The unwinding roller 211, the first guide roller 221, the first tension measuring roller 231 and the second guide roller 222 form a first tension zone, the tension is monitored in real time by the first tension measuring roller 231, and the tension is adjusted by the rotation speed and direction of the unwinding roller 211 to ensure that the tension is within a controllable range. Similarly, the eighth guide roller 228, the second tension measuring roller 232, the ninth guide roller 229 and the winding roller 212 form a second tension zone, and the tension is monitored in real time by the second tension measuring roller 232, and the tension is adjusted by the rotation speed and direction of the winding roller 212 to ensure that the tension is within a controllable range. The monitoring roller 251 is meshed with the encoder connecting gear 252 to calculate the length of the coil 8 in real time and complete the relevant positioning work.

[0085] like Figure 4 As shown, each guide roller structure in the present application can be fixed by fixing bolts 9 without limitation.

[0086] The above is a detailed introduction to a double-sided winding magnetron sputtering coating machine provided by the present application. For a person skilled in the art, according to the idea of ​​the embodiments of the present application, there may be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A double-sided winding magnetron sputtering coating machine, characterized in that: Including vacuum system, winding system, pre-cleaning system and sputtering coating system; The vacuum system comprises a retractable and retractable chamber, a first pretreatment chamber, a second pretreatment chamber, a first sputtering chamber and a second sputtering chamber; A first coating roller (241) is installed in the first pretreatment chamber; A portion of the first coating roller (241) extends into the first sputtering chamber; A second coating roller (242) is installed in the second pretreatment chamber; A portion of the second coating roller (242) extends into the second sputtering chamber; The winding system is used to convey the coil (8) and to allow the second side of the coil (8) to be in contact with the first coating roller (241) and to be wound around the first coating roller (241), and to allow the first side of the coil (8) to be in contact with the second coating roller (242) and to be wound around the second coating roller (242); The sputtering coating system includes a first sputtering device and a second sputtering device; The first sputtering device is installed in the first sputtering chamber and is used to perform sputtering coating on the first surface of the coiled material (8) being transported; The second sputtering device is installed in the second sputtering chamber and is used to perform sputtering coating on the second surface of the coiled material (8) being transported; The pre-cleaning system comprises a first cleaning device (411) and a second cleaning device (412); The first cleaning device (411) is installed in the first pretreatment chamber and is used to clean the first surface of the coil (8) conveyed before coating; The second cleaning device (412) is installed in the second pretreatment chamber and is used to clean the second surface of the coil (8) conveyed before coating.

2. A double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: The vacuum system comprises a vacuum chamber (1); The vacuum chamber (1) is provided with a first baffle (511), a second baffle (521), a third baffle (531) and a fourth baffle (522); The first baffle plate (511), the second baffle plate (521), the third baffle plate (531) and the fourth baffle plate (522) are used to separate the vacuum chamber (1) into the retractable and rewinding chamber, the first pretreatment chamber, the second pretreatment chamber, the first sputtering chamber and the second sputtering chamber.

3. A double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: A cold trap (7) is installed in the reeling and unreeling chamber.

4. A double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: It also includes lighting systems; The lighting system is installed in the retractable and retractable reel cavity.

5. The double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: A first partition (541) is provided in the first pretreatment chamber; The first partition (541) is used to separate the first pre-treatment chamber into a first treatment space and a first film roller space; The first coating roller (241) is installed in the first film roller space and partially extends to the first processing space; The first cleaning device (411) is installed in the first processing space; A second partition plate (542) is provided in the second pretreatment chamber; The second partition plate (542) is used to separate the second pre-treatment chamber into a second treatment space and a second film roller space; The second coating roller (242) is installed in the second film roller space and partially extends to the second processing space; The second cleaning device (412) is installed in the second processing space.

6. The double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: The first sputtering device comprises a first a-plane sputtering cathode (311), a second a-plane sputtering cathode (312) and a third a-plane sputtering cathode (313); The second sputtering device comprises a first b-side sputtering cathode (321), a second b-side sputtering cathode (322) and a third b-side sputtering cathode (323); The first a-surface sputtering cathode (311), the second a-surface sputtering cathode (312), and the third a-surface sputtering cathode (313) are sequentially distributed around the outer circumference of the first coating roller (241); The first b-side sputtering cathode (321), the second b-side sputtering cathode (322), and the third b-side sputtering cathode (323) are distributed in sequence around the outer circumference of the second coating roller (242).

7. The double-sided winding magnetron sputtering coating machine according to claim 1, characterized in that: The winding system comprises an unwinding roller (211), a winding roller (212) and a guide roller group; The guide roller group comprises a first guide roller (221), a second guide roller (222), a third guide roller (223), a fourth guide roller (224), a fifth guide roller (225), a sixth guide roller (226), a seventh guide roller (227), an eighth guide roller (228), and a ninth guide roller (229) which are arranged in sequence; The first guide roller (221), the second guide roller (222), and the third guide roller (223) are arranged between the unwinding roller (211) and the first coating roller (241); The fourth guide roller (224), the fifth guide roller (225), and the sixth guide roller (226) are arranged between the first coating roller (241) and the second coating roller (242); The seventh guide roller (227), the eighth guide roller (228), and the ninth guide roller (229) are arranged between the second coating roller (242) and the winding roller (212).

8. The double-sided winding magnetron sputtering coating machine according to claim 7, characterized in that: The winding system also includes a detection roller group; The detection roller group comprises a first tension measuring roller (231), a second tension measuring roller (232) and a monitoring roller (251); The first tension measuring roller (231) is arranged between the first guide roller (221) and the second guide roller (222); The second tension measuring roller (232) is arranged between the eighth guide roller (228) and the ninth guide roller (229); The monitoring roller (251) is arranged between the fourth guide roller (224) and the fifth guide roller (225), and is connected to an encoder connecting gear (252) for monitoring the running length of the coiled material (8).

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