Laser direct writing multi-beam inscribing system

Abstract

The utility model provides a laser direct writing multi-beam inscribing system, which comprises a light source generating device, a light source splitting device, a beam regulating and controlling device, a multiplying power adjusting device, a reflecting and deflecting device and a beam focusing device, according to the laser direct-writing multi-beam inscribing system, an AOM spectroscope is adopted to divide laser beams emitted by a laser generator into multiple paths of light beams, multiple AOD dimming mirrors are adopted to carry out energy and polarization angle real-time processing on each path of light beams so that the light beams can meet the inscribing requirement, and all the AOD dimming mirrors are used for switching the opening and closing states of all the light beams so that the inscribing requirement can be met. And when the thinnest line needs to be inscribed, a single light beam is opened, and when the thick line needs to be inscribed, all light beams are opened, so that the inscribing efficiency is improved, and the equipment cost is reduced.

Description

Technical Field

[0001] The utility model relates to integrated circuit production equipment, in particular to a laser direct writing multi-beam writing system. Background Art

[0002] Patent document CN117539129A discloses a laser direct writing lithography system, which includes a laser mirror, a dispersion compensation module, a spectroscopic module and a writing module arranged in sequence, wherein the laser mirror generates a femtosecond laser to the dispersion compensation module, and the femtosecond laser emits a pulse beam with negative dispersion through the dispersion compensation module, and the pulse beam with negative dispersion is adjusted in polarization direction through the spectroscopic module, and the negative dispersion and the positive dispersion generated by the optical fiber array in the spectroscopic module are offset each other, and a multi-channel femtosecond pulse width writing beam is output, and the multi-channel femtosecond pulse width writing beam is collimated and projected through the writing module, and a multi-channel diffraction-limited writing spot is output for parallel writing, so as to achieve a writing beam pulse width of the femtosecond order, and improve the writing efficiency. However, this lithography system adopts a single beam system, which can only finally obtain a single diameter spot, that is, a single working laser beam, and its operating efficiency is low, and the operating stability also needs to be improved. Therefore, it is necessary to optimize the structure of this lithography system to overcome the above-mentioned defects. Utility Model Content

[0003] The utility model aims to provide a laser direct writing multi-beam writing system.

[0004] The technical solution adopted by the utility model to solve its technical problems is:

[0005] A laser direct writing multi-beam writing system, comprising:

[0006] A light source generating device, which is installed in the photolithography machine through a movable connection structure and can move in the photolithography machine, and generates light by the light source generating device;

[0007] A light source splitter, which is installed in the lithography machine through a movable connection structure and is adapted to the light source generating device. It can move together with the light source generating device in the lithography machine, and the light source splitter splits the light source generated by the light source generating device into a plurality of independent light beams;

[0008] A beam control device is installed in the lithography machine and is adapted to the light source splitter. The beam control device controls the light beam formed by the light source splitter.

[0009] A magnification adjustment device is installed in the photolithography machine and is adapted to the beam control device. The magnification adjustment device adjusts the light beam after being controlled by the beam control device to form light beams of different diameters.

[0010] A reflection and deflection device, which is installed in the photolithography machine and is adapted to the magnification adjustment device, and reflects the light beam adjusted by the magnification adjustment device to deflect its light path;

[0011] A beam focusing device is installed in the photolithography machine and is adapted to the reflection and deflection device. The beam focusing device focuses the light beam reflected by the reflection and deflection device.

[0012] Specifically, the light source generating device comprises:

[0013] A laser generator is installed in the photolithography machine through a movable connection structure, cooperates with an azimuth control mechanism, and is connected to a power source, can move in the photolithography machine, and generate a laser light source in the photolithography machine.

[0014] In one embodiment of the present invention, the wavelength of the laser light source generated by the laser generator is 355nm.

[0015] The light source spectrometer comprises:

[0016] AOM spectrometer is installed in the lithography machine through a movable connection structure. It cooperates with the azimuth control mechanism and is adapted to the light source generating device. It can move with the light source generating device in the lithography machine and divide the light source generated by the light source generating device into several independent light beams.

[0017] In one embodiment of the present invention, the AOM beam splitter splits the light source into five light beams.

[0018] The beam control device includes:

[0019] AOD dimming mirror, a group of AOD dimming mirrors are provided and installed in the lithography machine, each AOD dimming mirror corresponds to the light beam formed by the light source spectrometer, and can adjust the energy and polarization angle of each light beam respectively, and switch the opening and closing state of each light beam.

[0020] The magnification adjustment device includes:

[0021] A beam multiplier is installed in a photolithography machine and is adapted to a beam control device. It has a plurality of lens structures with different magnifications inside. The beam multiplier adjusts the light beam controlled by the beam control device to form light beams of different diameters.

[0022] In one embodiment of the present invention, the lens structures with different magnifications in the beam multiplier can process the light beam to obtain light beams with entrance pupil diameters of 20 μm, 50 μm and 100 μm respectively.

[0023] The reflection and refraction device comprises:

[0024] The beam reflector is installed in the photolithography machine and is connected to the magnification adjustment device. The beam reflector reflects the light beam adjusted by the magnification adjustment device to bend its light path.

[0025] The beam focusing device includes:

[0026] A focusing objective lens is installed in the photolithography machine and is adapted to the reflection and deflection device. The focusing objective lens focuses the light beam reflected by the reflection and deflection device.

[0027] In one embodiment of the utility model, the focusing objective lens is a 100x objective lens structure, composed of 15 fully transparent lenses, a double telecentric optical path, and a maximum light transmission diameter of the lens is less than 80 mm. It focuses the light beam reflected by the reflection and refracting device to form light beams with diameters of 0.2μm, 0.5μm and 1μm.

[0028] The advantages of the utility model are:

[0029] The laser direct writing multi-beam engraving system uses an AOM spectrometer to separate the laser beam emitted by the laser generator into multiple beams, and also uses multiple AOD dimming mirrors to perform real-time energy and polarization angle processing on each beam to meet the engraving requirements. Each AOD dimming mirror switches the on and off state of each beam. When the thinnest lines need to be engraved, a single beam is opened, and when thick lines are written, all beams are opened, which helps to improve engraving efficiency and reduce equipment costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a structural schematic diagram of the laser direct writing multi-beam engraving system proposed by the utility model. DETAILED DESCRIPTION

[0031] In order to make the purpose, technical scheme and advantages of the embodiment of the utility model clearer, the technical scheme in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. The components of the embodiment of the utility model generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiment of the utility model provided in the drawings is not intended to limit the scope of the utility model claimed for protection, but merely represents the selected embodiment of the utility model. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the utility model.

[0032] like Figure 1As shown, the laser direct writing multi-beam engraving system proposed by the utility model includes a light source generating device, a light source splitting device, a light beam regulating device, a magnification adjusting device, a reflection and deflecting device and a light beam focusing device. The light source generating device is installed in the photolithography machine through a movable connection structure and can move in the photolithography machine. The light source is generated by the light source generating device. The light source splitting device is installed in the photolithography machine through a movable connection structure and is adapted to the light source generating device. It can move together with the light source generating device in the photolithography machine. The light source generated by the light source generating device is divided into a plurality of independent light beams by the light source splitting device. The light beam regulating device is installed in the photolithography machine. and is adapted to the light source spectroscopic device, the light beam formed by the light source spectroscopic device is regulated by the light beam regulating device, the magnification adjustment device is installed in the lithography machine, and is adapted to the light beam regulating device, the magnification adjustment device adjusts the light beam regulated by the light beam regulating device to form light beams of different diameters, the reflection and deflecting device is installed in the lithography machine, and is adapted to the magnification adjustment device, the reflection and deflecting device reflects the light beam adjusted by the magnification adjustment device to deflect its optical path, the light beam focusing device is installed in the lithography machine, and is adapted to the reflection and deflecting device, the light beam reflected by the reflection and deflecting device is focused by the light beam focusing device.

[0033] In this embodiment, the light source generating device includes a laser generator 100, which is installed in the lithography machine through a movable connection structure, cooperates with the orientation control mechanism, and is connected to the power supply. It can move in the lithography machine and generate a laser light source in the lithography machine.

[0034] In this embodiment, the wavelength of the laser light source generated by the laser generator is 355 nm.

[0035] The light source spectrometer includes an AOM spectrometer 200, which is installed in the lithography machine through a movable connection structure. It cooperates with the orientation control mechanism and is adapted to the light source generating device. It can move with the light source generating device in the lithography machine and divide the light source generated by the light source generating device into several independent light beams.

[0036] In one embodiment of the present invention, the AOM beam splitter splits the light source into five light beams.

[0037] The light beam control device includes an AOD dimming mirror 300. A group of AOD dimming mirrors are provided and installed in the lithography machine. Each AOD dimming mirror corresponds to a light beam formed by the light source spectrometer. The energy and polarization angle of each light beam can be controlled respectively, and the opening and closing states of each light beam can be switched.

[0038] The magnification adjustment device includes a beam multiplier 400, which is installed in the lithography machine and adapted to the beam control device. It has a plurality of lens structures with different magnifications inside. The beam multiplier adjusts the light beam controlled by the beam control device to form light beams of different diameters.

[0039] In this embodiment, the lens structures with different magnifications in the beam multiplier can process the light beam to obtain light beams with entrance pupil diameters of 20 μm, 50 μm and 100 μm respectively.

[0040] The reflection and deflection device includes a beam reflector 500, which is installed in the photolithography machine and connected to the magnification adjustment device. The beam reflector reflects the light beam adjusted by the magnification adjustment device to deflect its optical path.

[0041] The light beam focusing device comprises a focusing lens 600, which is installed in the photolithography machine and is adapted to the reflection and deflection device. The focusing lens focuses the light beam reflected by the reflection and deflection device.

[0042] In this embodiment, the focusing objective lens is a 100x objective lens structure, composed of 15 fully transparent lenses, with a double telecentric optical path. The maximum light transmission diameter of the lens is less than 80mm, which focuses the light beam reflected by the reflection and refracting device to form light beams with diameters of 0.2μm, 0.5μm and 1μm.

[0043] The method for using the above-mentioned laser direct writing multi-beam writing system comprises the following steps:

[0044] S1, the laser generator moves in the set direction under the control of the control system, adjusts the focal length according to the writing requirements, and emits a laser beam with a wavelength of 355nm;

[0045] S2, the AOM beam splitter moves together with the laser generator, so that the laser beam emitted by the laser generator enters the AOM beam splitter, and the AOM beam splitter separates it into 5 beams;

[0046] S3, each light beam output from the AOM spectrometer enters each AOD dimming mirror, which processes its energy and polarization angle in real time to meet the writing requirements, and each AOD dimming mirror switches the on and off state of each light beam. When the thinnest line needs to be written, the 4 light beams are closed, and when the thick line needs to be written, all the light beams are opened;

[0047] S4, the light beam output from the AOD dimming mirror enters the beam multiplier, and the three groups of multipliers in the beam multiplier are switched as needed. After the light beam is processed by switching different multipliers, light beams with entrance pupil diameters of 20μm, 50μm and 100μm are obtained respectively;

[0048] S5, the light beam output from the beam multiplier reaches the beam reflector and is reflected by the beam reflector;

[0049] S6, the light beam output from the beam reflector enters the focusing objective lens, and is focused by the focusing objective lens to form light beams with diameters of 0.2 μm, 0.5 μm and 1 μm.

[0050] In the description of the present utility model, it should be noted that when terms such as "upper", "lower", "inner", "outer", "left", "right" and the like indicating orientation or positional relationship appear, it should be understood that the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the utility model product is usually placed when in use, or the orientation or positional relationship commonly understood by those skilled in the art, is only for the convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, when terms such as "first" and "second" appear, they are only used to distinguish the description, and cannot be understood as indicating or implying relative importance. In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and limited, terms such as "installation", "setting", and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements. For those skilled in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

Claims

1. A laser direct writing multi-beam writing system, characterized in that: include: A light source generating device, which is installed in the photolithography machine through a movable connection structure and can move in the photolithography machine, and generates light by the light source generating device; A light source splitter, which is installed in the lithography machine through a movable connection structure and is adapted to the light source generating device. It can move together with the light source generating device in the lithography machine, and the light source splitter splits the light source generated by the light source generating device into a plurality of independent light beams; A beam control device is installed in the lithography machine and is adapted to the light source splitter. The beam control device controls the light beam formed by the light source splitter. A magnification adjustment device is installed in the photolithography machine and is adapted to the beam control device. The magnification adjustment device adjusts the light beam after being controlled by the beam control device to form light beams of different diameters. A reflection and deflection device, which is installed in the photolithography machine and is adapted to the magnification adjustment device, and reflects the light beam adjusted by the magnification adjustment device to deflect its light path; A beam focusing device is installed in the photolithography machine and is adapted to the reflection and deflection device. The beam focusing device focuses the light beam reflected by the reflection and deflection device.

2. A laser direct writing multi-beam writing system according to claim 1, characterized in that: The light source generating device comprises: A laser generator is installed in the photolithography machine through a movable connection structure, cooperates with an azimuth control mechanism, and is connected to a power source, can move in the photolithography machine, and generate a laser light source in the photolithography machine.

3. The laser direct writing multi-beam writing system according to claim 1, characterized in that: The light source spectrometer comprises: AOM spectrometer is installed in the lithography machine through a movable connection structure. It cooperates with the azimuth control mechanism and is adapted to the light source generating device. It can move with the light source generating device in the lithography machine and divide the light source generated by the light source generating device into several independent light beams.

4. The laser direct writing multi-beam writing system according to claim 1, characterized in that: The beam control device includes: AOD dimming mirror, a group of AOD dimming mirrors are provided and installed in the lithography machine, each AOD dimming mirror corresponds to the light beam formed by the light source spectrometer, and can adjust the energy and polarization angle of each light beam respectively, and switch the opening and closing state of each light beam.

5. The laser direct writing multi-beam writing system according to claim 1, characterized in that: The magnification adjustment device includes: A beam multiplier is installed in a photolithography machine and is adapted to a beam control device. It has a plurality of lens structures with different magnifications inside. The beam multiplier adjusts the light beam controlled by the beam control device to form light beams of different diameters.

6. The laser direct writing multi-beam writing system according to claim 1, characterized in that: The reflection and refraction device comprises: The beam reflector is installed in the photolithography machine and is connected to the magnification adjustment device. The beam reflector reflects the light beam adjusted by the magnification adjustment device to bend its light path.

7. The laser direct writing multi-beam writing system according to claim 1, characterized in that: The beam focusing device includes: A focusing objective lens is installed in the photolithography machine and is adapted to the reflection and deflection device. The focusing objective lens focuses the light beam reflected by the reflection and deflection device.

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