Tray structure for silicon wafer annealing

Abstract

The utility model discloses a tray structure for silicon wafer annealing, which comprises a tray, fixing nets are arranged at the top and the bottom of the tray, the fixing net located at the bottom is fixedly connected with the tray, the fixing net located at the top is tightly attached to the tray, and a plurality of supporting strips are arranged on the front side and the rear side of an inner cavity of the tray. The left side of the inner cavity of the tray is fixedly connected with a rail. According to the utility model, a silicon wafer is placed between the supporting strips, and the sliding convex blocks, the sliding blocks and the clamping blocks are matched for use, so that the clamping blocks can drive the moving plate to move backwards, and then the supporting strips move to proper positions to support and fix the silicon wafer, thereby ensuring that the silicon wafer does not incline during annealing, and achieving the purpose of adopting a movable structure. According to the tray for silicon wafer degradation, silicon wafers are positioned, it is guaranteed that the silicon wafers of different specifications can be clamped, the weight of the tray is reduced due to the grid shape, the heat capacity is reduced, the temperature rising and cooling speed is increased, and the usability of the tray for silicon wafer degradation and the silicon wafer annealing quality are guaranteed.

Description

Technical Field

[0001] The utility model belongs to the technical field of silicon slice processing, in particular to a tray structure for silicon slice annealing. Background Art

[0002] Silicon wafers contain oxygen, which absorbs impurities. Annealing the silicon wafers can improve the flatness of the wafers, eliminate local warping and unevenness, and make the surface of the silicon wafers smoother, which is beneficial to subsequent photolithography, etching and other processes.

[0003] When silicon wafers are annealed, a tray is used. The tray can provide uniform support for the silicon wafers, ensuring that the silicon wafers are in a horizontal state in the annealing furnace, and avoiding deformation or cracking due to local uneven force. Therefore, we need to design a tray structure and a grid structure for silicon wafer annealing. A movable structure is used to position the silicon wafers, ensuring that silicon wafers of different specifications can be clamped. The grid structure reduces the weight of the tray itself, reduces the heat capacity, speeds up the heating and cooling speeds, and ensures the usability of the tray for silicon wafer degradation and the quality of silicon wafer annealing. Utility Model Content

[0004] The utility model aims to provide a tray structure for annealing silicon wafers, which adopts a movable structure to position silicon wafers, thereby ensuring that silicon wafers of different specifications can be clamped, and the grid shape reduces the weight of the tray itself, reduces the heat capacity, accelerates the heating and cooling speed, and ensures the usability of the tray for silicon wafer degradation and the quality of silicon wafer annealing, so as to solve the above-mentioned background technical problems.

[0005] The utility model solves the above-mentioned technical problem with the following technical solutions: a tray structure for annealing silicon wafers, comprising a tray, the top and bottom of the tray are both provided with fixed nets, the fixed net at the bottom is fixedly connected to the tray, and the fixed net at the top is tightly fitted with the tray, a plurality of support bars are both provided on the front and rear sides of the tray inner cavity, a track is fixedly connected to the left side of the tray inner cavity, the top and bottom of the track inner cavity are fixedly connected to the limit bar, a sliding protrusion is slidably connected to the inner wall of the limit bar, a slide rail is fixedly connected to the right side of the top of the track, a clamping block is provided on the top of the slide rail, a connecting plate is fixedly connected to the rear side of the top of the clamping block, a cone rod is penetrated on the front and rear sides of the surface of the connecting plate, the cone rod is slidably connected to the connecting plate, the bottom of the cone rod is tightly fitted with the top of the track, a moving plate is fixedly connected to the right side of the sliding protrusion, the top of the left side of the moving plate is fixedly connected to the clamping block, the moving plate is fixedly connected to the front multiple support bars, and the multiple support bars at the rear side are fixedly connected to the tray.

[0006] Preferably, a slidable sliding rod is provided through the surface of the track, a spring is sleeved on the surface of the sliding rod, and two ends of the spring are fixedly connected to the sliding protrusion and the track respectively.

[0007] Preferably, a sliding block is slidably connected to the inner wall of the slide rail, and the sliding block is fixedly connected to the clamping block.

[0008] Preferably, the surfaces of the two conical rods are threadedly connected with nuts, and the bottoms of the nuts are tightly fitted with the tops of the connecting plates.

[0009] Preferably, a handle groove is provided on the right side of the tray, and the inner cavity of the handle groove is rotatably connected to a handle via a rotating shaft.

[0010] Preferably, a hole for the sliding rod to pass through is provided on the front side of the track, a square groove is provided on the right side of the tray, and a silicon wafer is placed between the front and rear support bars.

[0011] 1. The beneficial effects of the utility model are as follows: the utility model places the silicon wafer between the support bars, and through the coordinated use of the sliding protrusion, the slider and the clamping block, the clamping block drives the movable plate to move backward, and then the support bar moves to a suitable position to support and fix the silicon wafer, ensuring that the silicon wafer will not tilt during annealing, so that the movable structure can be used to position the silicon wafer, ensuring that silicon wafers of different specifications can be clamped, and the grid shape reduces the weight of the tray itself, reduces the heat capacity, speeds up the heating and cooling speed, and ensures the usability of the tray for silicon wafer degradation and the quality of silicon wafer annealing.

[0012] 2. The utility model uses a slider and a clamping block in coordination, so that when the clamping block drives the moving plate to move, the slider guides the clamping block, ensuring that the clamping block will not deviate when sliding, thereby improving the stability of the clamping block during use.

[0013] 3. The utility model sets a nut so that when the cone rod stops moving at the top of the track, the nut limits the cone rod, thereby preventing the cone rod from shaking at the top of the track and improving the stability of the cone rod during use.

[0014] 4. The utility model uses the handle groove and the handle in coordination, so that the handle plays a role of applying force when the user moves the tray, thereby ensuring the user's operation of the tray. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] in:

[0016] Figure 1 A schematic diagram of a front view of an embodiment of the utility model;

[0017] Figure 2This is a three-dimensional schematic diagram of a handle groove and a handle in one embodiment of the utility model;

[0018] Figure 3 This is a three-dimensional schematic diagram of a moving plate and a supporting bar according to an embodiment of the utility model;

[0019] Figure 4 This is a three-dimensional schematic diagram of a sliding protrusion and a clamping block in one embodiment of the utility model;

[0020] Figure 5 It is a top plan schematic diagram of an embodiment of the utility model.

[0021] In the accompanying drawings, the components represented by the reference numerals are listed as follows:

[0022] 1. Tray, 2. Fixed net, 3. Support bar, 4. Track, 5. Limit bar, 6. Sliding protrusion, 7. Sliding rod, 8. Spring, 9. Slide rail, 10. Slider, 11. Clamping block, 12. Connecting plate, 13. Conical rod, 14. Nut, 15. Handle groove, 16. Handle, 17. Moving plate. DETAILED DESCRIPTION

[0023] Hereinafter, embodiments of a tray structure for annealing silicon wafers according to the present invention will be described with reference to the accompanying drawings.

[0024] Figure 1-5A tray structure for annealing silicon wafers according to an embodiment of the utility model is shown, which includes a tray 1, a fixed net 2 is arranged on the top and bottom of the tray 1, the fixed net 2 at the bottom is fixedly connected to the tray 1, and the fixed net 2 at the top is tightly fitted to the tray 1, a plurality of support bars 3 are arranged on the front and rear sides of the inner cavity of the tray 1, a track 4 is fixedly connected to the left side of the inner cavity of the tray 1, a limit bar 5 is fixedly connected to the top and bottom of the inner cavity of the track 4, a sliding protrusion 6 is slidably connected to the inner wall of the limit bar 5, a slidable sliding rod 7 is arranged through the surface of the track 4, a spring 8 is sleeved on the surface of the sliding rod 7, and both ends of the spring 8 They are fixedly connected to the sliding protrusion 6 and the track 4 respectively. The right side of the top of the track 4 is fixedly connected with a slide rail 9. A clamping block 11 is arranged on the top of the slide rail 9. A slider 10 is slidably connected to the inner wall of the slide rail 9. The slider 10 is fixedly connected to the clamping block 11. Through the coordinated use of the slider 10 and the clamping block 11, the slider 10 guides the clamping block 11 when the clamping block 11 drives the moving plate 17 to move, ensuring that the clamping block 11 will not deviate when sliding, thereby improving the stability of the clamping block 11 during use. A connecting plate 12 is fixedly connected to the rear side of the top of the clamping block 11. The connecting plate 12 Cone rods 13 are provided on both the front and rear sides of the surface, and the cone rods 13 are slidably connected to the connecting plate 12, and the bottom of the cone rods 13 is tightly fitted with the top of the track 4. The surfaces of the two cone rods 13 are threadedly connected with nuts 14, and the bottom of the nuts 14 is tightly fitted with the top of the connecting plate 12. Through the setting of the nuts 14, when the cone rods 13 stop moving at the top of the track 4, the nuts 14 play a role in limiting the cone rods 13, avoiding the cone rods 13 from shaking at the top of the track 4, and improving the stability of the cone rods 13 in use. A moving plate 17 is fixedly connected to the right side of the sliding protrusion 6. The moving plate 17 The top on the left side is fixedly connected to the clamping block 11, the moving plate 17 is fixedly connected to multiple support bars 3 on the front side, and multiple support bars 3 on the rear side are fixedly connected to the tray 1. A handle groove 15 is provided on the right side of the tray 1, and the inner cavity of the handle groove 15 is rotatably connected to the handle 16 through a rotating shaft. Through the coordinated use of the handle groove 15 and the handle 16, the handle 16 plays a force-applying role when the user displaces the tray 1, thereby ensuring the user's operation of the tray 1. A hole for the sliding rod 7 to pass through is provided on the front side of the track 4, and a square groove is provided on the right side of the tray 1, and a silicon wafer is placed between the front and rear support bars 3.

[0025] Working principle: When the utility model is used, the user places multiple silicon wafers between multiple support bars 3. At this time, the front support bar 3 needs to be tightly fitted with the silicon wafer. Then the user moves the moving plate 17, and the moving plate 17 drives the sliding protrusion 6 on the left to slide. Then the sliding protrusion 6 slides backward between the inner walls of the limit bar 5, so that the sliding rod 7 moves backward in the inner cavity of the track 4, and the spring 8 elastically lengthens, so that the clamping block 11 at the top moves, and at the same time, the clamping block 11 drives the top slider 10 to slide backward in the inner wall of the slide rail 9. , and then the moving plate 17 drives the support bar 3 to move until it is tightly fitted with the silicon wafer and stops moving, so that the connecting plate 12 drives the cone rod 13 to stop moving, and then the nut 14 is turned, and the cone rod 13 will slide downward on the surface of the connecting plate 12 until the bottom of the cone rod 13 is tightly fitted with the top of the track 4, and the nut 14 is turned, and the nut 14 will fit tightly with the connecting plate 12, so that the cone rod 13 is stable, ensuring that the moving plate 17 will not move, and the upper fixed net 2 is placed on the top of the tray 1, and the handle 16 is held to transfer the tray 1 to an appropriate position for annealing.

[0026] In summary, the tray structure for annealing silicon wafers places the silicon wafers between the support bars 3, and through the coordinated use of the sliding protrusion 6, the slider 10 and the clamping block 11, the clamping block 11 drives the movable plate 17 to move backward, and then the support bar 3 moves to a suitable position to support and fix the silicon wafer, ensuring that the silicon wafer will not tilt during annealing, and the movable structure can be used to position the silicon wafer, ensuring that silicon wafers of different specifications can be clamped, and the grid shape reduces the weight of the tray itself, reduces the heat capacity, speeds up the heating and cooling speed, and ensures the usability of the tray for silicon wafer degradation and the quality of silicon wafer annealing.

Claims

1. A tray structure for silicon wafer annealing, characterized in that: The invention comprises a tray (1): the top and bottom of the tray (1) are both provided with a fixed net (2), the fixed net (2) at the bottom is fixedly connected to the tray (1), and the fixed net (2) at the top is tightly fitted to the tray (1), a plurality of support bars (3) are both provided on the front and rear sides of the inner cavity of the tray (1), a track (4) is fixedly connected to the left side of the inner cavity of the tray (1), a limit bar (5) is fixedly connected to the top and bottom of the inner cavity of the track (4), a sliding protrusion (6) is slidably connected to the inner wall of the limit bar (5), a slide rail (9) is fixedly connected to the right side of the top of the track (4), and the top of the slide rail (9) is provided with a A clamping block (11) is arranged, and a connecting plate (12) is fixedly connected to the rear side of the top of the clamping block (11), and cone rods (13) are arranged through the front and rear sides of the surface of the connecting plate (12), and the cone rod (13) is slidably connected to the connecting plate (12), and the bottom of the cone rod (13) is tightly fitted with the top of the track (4), and a moving plate (17) is fixedly connected to the right side of the sliding protrusion (6), and the top of the left side of the moving plate (17) is fixedly connected to the clamping block (11), and the moving plate (17) is fixedly connected to a plurality of support bars (3) on the front side, and a plurality of support bars (3) on the rear side are fixedly connected to the tray (1).

2. A tray structure for annealing a silicon wafer according to claim 1, characterized in that: A slidable sliding rod (7) is provided through the surface of the track (4), a spring (8) is sleeved on the surface of the sliding rod (7), and two ends of the spring (8) are respectively fixedly connected to the sliding protrusion (6) and the track (4).

3. A tray structure for annealing a silicon wafer according to claim 2, characterized in that: The inner wall of the slide rail (9) is slidably connected with a slider (10), and the slider (10) is fixedly connected to a clamping block (11).

4. A tray structure for annealing a silicon wafer according to claim 3, characterized in that: The surfaces of the two conical rods (13) are both threadedly connected with nuts (14), and the bottom of the nuts (14) is tightly fitted with the top of the connecting plate (12).

5. A tray structure for annealing silicon wafers according to claim 4, characterized in that: A handle groove (15) is provided on the right side of the tray (1), and the inner cavity of the handle groove (15) is rotatably connected to a handle (16) via a rotating shaft.

6. A tray structure for annealing a silicon wafer according to claim 5, characterized in that: The front side of the track (4) is provided with a hole for the sliding rod (7) to pass through, the right side of the tray (1) is provided with a square groove, and a silicon wafer is placed between the front and rear support bars (3).

Images