Filtering and impurity centralized collecting device for silicon wafer additive processing

By designing a silicon wafer additive processing device including filter assembly, suction assembly, flush assembly and drive assembly, the cumbersome problem of manually cleaning the filter in the prior art is solved, automatic flushing and blind spot cleaning are achieved, and work efficiency and cleaning effect are improved.

CN222969280UActive Publication Date: 2025-06-13NICCA CHEM CHINA CO LTD
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Patent Information

Application Number
CN202422237550.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-09-12
Publication Date
2025-06-13
Estimated Expiration
2034-09-12

AI Technical Summary

Technical Problem

During the processing of existing silicon wafer additives, impurities on the filter screen are easy to accumulate and require manual disassembly and cleaning. The process is cumbersome and a waste of time and manpower.

Method used

A centralized collection device for filtering and impurities including filtering components, suction components, flushing components and drive components is designed. Automatic flushing and impurities absorption are achieved through vacuum pumps and water pumps, and the motor drives synchronous rotation to ensure no blind spots to clean.

Benefits of technology

It realizes the effect of automatic flushing without disassembling the filter, reduces cleaning difficulty, improves work efficiency, and ensures no blind spots of the filter through synchronous rotation, and improves the cleaning effect.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a filtering and impurity centralized collecting device for silicon wafer additive processing, which relates to the technical field of additive processing and comprises a base, and a filtering component, an air suction component, a flushing component and a driving component are arranged at the top of the base close to the middle. The filter assembly comprises a filter cartridge. According to the filtering and impurity centralized collecting device for silicon wafer additive processing, a cleaning agent in the water tank is pumped by starting the water pump and sprayed out from the spraying pipe to flush the bottom face of the filter screen, meanwhile, the vacuum pump is started to enable the suction nozzle to generate negative pressure, the flushed impurities are sucked away above the filter screen, the impurities are sucked into the collecting trolley, and the cleaning agent is collected through the collecting trolley. Therefore, the effect of automatic flushing without disassembling the filter screen is achieved, the cleaning difficulty is reduced, the efficiency is improved, in the cleaning process, a motor is started to drive two second synchronous wheels to rotate, then a suction nozzle and a spraying pipe rotate synchronously, the effect of cleaning the filter screen without dead corners is achieved, and the cleaning effect is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of additive processing, in particular to a filtering and impurity centralized collection device for silicon wafer additive processing. Background Art

[0002] Silicon wafer additives play a crucial role in the production, processing, and subsequent treatment of silicon wafers. They can improve the surface quality of silicon wafers, enhance processing accuracy, optimize electrical properties, etc. During the processing of silicon wafer additives, various impurities often exist. If these impurities are not removed in time, they will have a serious impact on the quality of silicon wafer additives.

[0003] When the existing silicon wafer additives are processed, the filtered impurities are prone to accumulate on the filter screen, and it is often necessary to manually disassemble the filter screen for cleaning. The process is very cumbersome, wasting time, manpower, and material resources. Therefore, the utility model provides a filtering and impurity centralized collection device for silicon wafer additive processing. Summary of the Utility Model

[0004] Aiming at the deficiencies of the prior art, the utility model provides a filtering and impurity centralized collection device for silicon wafer additive processing, which solves the problem that it is necessary to manually disassemble the filter screen for cleaning, the process is very cumbersome, and it wastes time, manpower, and material resources.

[0005] To achieve the above purposes, the utility model is realized through the following technical solutions: A filtering and impurity centralized collection device for silicon wafer additive processing, including a base. A filtering component, an air suction component, a flushing component, and a driving component are arranged at a position close to the middle of the top of the base. The filtering component includes a filtering cylinder, and the filtering cylinder is installed on the top of the base close to the middle through legs. A filter screen is arranged on the inner wall of the filtering cylinder. The air suction component includes a rotating air pipe, and a suction nozzle is fixedly communicated with the bottom end of the rotating air pipe. The flushing component includes a rotating water pipe, and a spray pipe is fixedly communicated with the top end of the rotating water pipe.

[0006] The filtering cylinder is fixedly installed at a position close to the middle of the top of the base, and a maintenance door is installed on the outside of the filtering cylinder through a hinge.

[0007] The air suction component further includes a limiting cover fixedly installed at a position close to the right side of the top of the base. An air suction pipe is fixedly communicated with the top of the limiting cover. A vacuum pump is arranged on the air suction pipe, and the vacuum pump is installed on the top of the limiting cover. The end of the air suction pipe is communicated with the rotating air pipe through a rotary joint. The rotating air pipe movably penetrates through the top of the filtering cylinder and extends to the inside. The suction nozzle is arranged above the filter screen. A collection trolley is arranged inside the limiting cover.

[0008] The flushing assembly further includes a water tank, which is installed on the top of the base near the rear side through legs. A water outlet pipe is fixedly connected to the bottom of the water tank. A water pump is installed on the water outlet pipe, and the water pump is installed on the top of the base. The end of the water outlet pipe is connected to a rotating water pipe through a rotary joint. The rotating water pipe movably penetrates through the bottom of the filter cylinder and extends to the inside. A spray pipe is fixedly connected to the end of the rotating water pipe, and the spray pipe is arranged below the filter net.

[0009] The driving assembly includes a motor fixedly installed on the top of the base near the left side. A rotating shaft is installed at the output end of the motor, and the rotating shaft is installed on the outer wall of the filter cylinder through a bearing seat.

[0010] Two first synchronous pulleys are fixedly installed on the outer wall of the rotating shaft. Synchronous belts are arranged outside both of the two first synchronous pulleys. Second synchronous pulleys are arranged inside both of the two synchronous belts. One of the second synchronous pulleys is fixedly sleeved on the outer wall of the rotating air pipe, and the other second synchronous pulley is fixedly sleeved on the outer wall of the rotating water pipe.

[0011] Beneficial effects

[0012] The utility model provides a filtering and impurity centralized collection device for silicon wafer additive processing. Compared with the prior art, it has the following beneficial effects:

[0013] (1) For the filtering and impurity centralized collection device for silicon wafer additive processing, by starting the water pump to extract the cleaning agent in the water tank and spraying it out from the spray pipe to flush the bottom surface of the filter net. At the same time, starting the vacuum pump makes the suction nozzle generate negative pressure to suck away the impurities flushed out above the filter net and suck the impurities into the collection cart, thereby realizing the effect of automatically flushing the filter net without disassembly, reducing the cleaning difficulty and improving the efficiency. And during the cleaning process, by starting the motor to drive the two second synchronous pulleys to rotate, the suction nozzle and the spray pipe are synchronously rotated, achieving the effect of cleaning the filter net without dead angles and improving the cleaning effect.

[0014] (2) For the filtering and impurity centralized collection device for silicon wafer additive processing, when the impurities in the collection cart are full, the collection cart can be pulled out from the limit cover through the handle on the collection cart, which is convenient for centralized treatment of the impurities. And it is convenient to repair and maintain the inside of the filter cylinder through the inspection door. Description of the drawings

[0015] Figure 1 is a three-dimensional external view schematic diagram of the utility model;

[0016] Figure 2 is a three-dimensional external view schematic diagram of the filtering assembly of the utility model;

[0017] Figure 3It is a partial structural schematic diagram of the present utility model;

[0018] Figure 4 It is a three-dimensional external view schematic diagram of the collection trolley of the present utility model.

[0019] In the figure: 1, base; 2, filtering component; 21, filtering cylinder; 22, maintenance door; 23, filter screen; 3, air suction component; 31, limit cover; 32, suction pipe; 33, rotating air pipe; 34, suction nozzle; 35, vacuum pump; 36, collection trolley; 4, flushing component; 41, water tank; 42, water outlet pipe; 43, water pump; 44, rotating water pipe; 45, spray pipe; 5, driving component; 51, motor; 52, rotating shaft; 53, first synchronous pulley; 54, synchronous belt; 55, second synchronous pulley. Specific embodiments

[0020] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0021] The present utility model provides two technical solutions:

[0022] Figures 1 - 4 The first implementation manner is shown: For a filtering and impurity centralized collection device for silicon wafer additives processing, it includes a base 1. A filtering component 2, an air suction component 3, a flushing component 4 and a driving component 5 are arranged at a position near the middle on the top of the base 1; The filtering component 2 includes a filtering cylinder 21. The filtering cylinder 21 is installed on the top of the base 1 near the middle through legs. A filter screen 23 is arranged on the inner wall of the filtering cylinder 21; The air suction component 3 includes a rotating air pipe 33. The bottom end of the rotating air pipe 33 is fixedly communicated with a suction nozzle 34; The flushing component 4 includes a rotating water pipe 44. The top end of the rotating water pipe 44 is fixedly communicated with a spray pipe 45.

[0023] The filtering cylinder 21 is fixedly installed at a position near the middle on the top of the base 1. A maintenance door 22 is installed on the outside of the filtering cylinder 21 through a hinge. It is convenient to perform maintenance on the inside of the filtering cylinder 21 through the maintenance door 22. And a feed pipe for adding silicon wafer additives and a discharge pipe for discharging silicon wafer additives are also arranged on the filtering cylinder 21.

[0024] The air intake assembly 3 further includes a limit cover 31 fixedly installed at the top of the base 1 near the right side. The top of the limit cover 31 is fixedly communicated with an air suction pipe 32. A vacuum pump 35 is provided on the air suction pipe 32, and the vacuum pump 35 is installed on the top of the limit cover 31. The end of the air suction pipe 32 is communicated with a rotating air pipe 33 through a rotary joint. The rotating air pipe 33 movably penetrates through the top of the filter cartridge 21 and extends to the inside. The suction nozzle 34 is arranged above the filter net 23. A collection cart 36 is arranged inside the limit cover 31. The air suction pipe 32 can convey the negative pressure generated by the vacuum pump 35. The rotary joint enables the rotating air pipe 33 to be flexibly communicated with the air suction pipe 32. The rotating air pipe 33 penetrates through the filter cartridge 21 to place the suction nozzle 34 above the filter net 23 to suck impurities. The collection cart 36 inside the limit cover 31 facilitates the centralized collection of impurities.

[0025] The flushing assembly 4 further includes a water tank 41. The water tank 41 is installed at the top of the base 1 near the rear side through a support leg. The bottom of the water tank 41 is fixedly communicated with a water outlet pipe 42. A water pump 43 is installed on the water outlet pipe 42, and the water pump 43 is installed on the top of the base 1. The end of the water outlet pipe 42 is connected with a rotating water pipe 44 through a rotary joint. The rotating water pipe 44 movably penetrates through the bottom of the filter cartridge 21 and extends to the inside. The end of the rotating water pipe 44 is fixedly communicated with a spray pipe 45, and the spray pipe 45 is arranged below the filter net 23. The water tank 41 can store the cleaning agent, and a filling port for adding the cleaning agent is also arranged on the water tank 41. The water outlet pipe 42 can output the cleaning agent, and the water pump 43 on it can extract the cleaning agent. The rotary joint enables the rotating water pipe 44 to be flexibly connected with the water outlet pipe 42. The spray pipe 45 is arranged below the filter net 23 and can flush the filter net 23 from bottom to top.

[0026] Figures 1 - 4 The second embodiment is shown. The main difference from the first embodiment is that: the driving assembly 5 includes a motor 51 fixedly installed at the top of the base 1 near the left side. The output end of the motor 51 is installed with a rotating shaft 52, and the rotating shaft 52 is installed on the outer wall of the filter cartridge 21 through a bearing seat. Two first synchronous pulleys 53 are fixedly installed on the outer wall of the rotating shaft 52. Synchronous belts 54 are arranged on the outer sides of the two first synchronous pulleys 53. Second synchronous pulleys 55 are arranged on the inner sides of the two synchronous belts 54. One of the second synchronous pulleys 55 is fixedly sleeved on the outer wall of the rotating air pipe 33, and the other second synchronous pulley 55 is fixedly sleeved on the outer wall of the rotating water pipe 44. The motor 51 can provide power to the rotating shaft 52. The two first synchronous pulleys 53 on the rotating shaft 52 cooperate with the synchronous belts 54, and at the same time, through the mutual cooperation of the two second synchronous pulleys 55, the rotating air pipe 33 and the rotating water pipe 44 can be respectively driven to rotate, so that the air intake and flushing components move synchronously to achieve cleaning without dead corners.

[0027] At the same time, the content not described in detail in this specification belongs to the prior art well-known to those skilled in the art.

[0028] During operation, by starting the water pump 43, the cleaning agent in the water tank 41 is extracted and sprayed out from the nozzles on the spray pipe 45. At the same time, the vacuum pump 35 is started, and the negative pressure generated acts on the suction nozzle 34 through the suction pipe 32. The cleaning agent sprayed out from the spray pipe 45 flushes the filter screen 23 from bottom to top, causing impurities to loosen and detach from the pores of the filter screen 23. With the negative pressure on the suction nozzle 34, the flushed impurities can be sucked into the collection trolley 36 for centralized collection, thus achieving the effect of automatic flushing without disassembling the filter screen 23, greatly reducing the cleaning difficulty and improving the work efficiency. During the cleaning process, by starting the motor 51 to drive the two second synchronous wheels 55 to rotate, the suction nozzle 34 and the spray pipe 45 are synchronously rotated, achieving the effect of cleaning the filter screen 23 without dead angles and improving the cleaning effect. When the collection trolley 36 is full of impurities, the collection trolley 36 can be pulled out from the limit cover 31 through the handle on the collection trolley 36, facilitating the centralized treatment of the impurities.

[0029] It should be noted that in this text, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or elements inherent to such process, method, article or device.

[0030] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A filtering and impurity collection device for silicon wafer additive processing, comprising a base (1), characterized in that: A filter assembly (2), an air suction assembly (3), a flushing assembly (4) and a driving assembly (5) are provided near the middle of the top of the base (1); The filter assembly (2) comprises a filter cartridge (21), the filter cartridge (21) being mounted at a position close to the middle of the top of the base (1) via legs, and a filter screen (23) being provided on the inner wall of the filter cartridge (21); The air suction component (3) comprises a rotating air pipe (33), and the bottom end of the rotating air pipe (33) is fixedly connected to a suction nozzle (34); The flushing assembly (4) comprises a rotating water pipe (44), the top end of which is fixedly connected to a spray pipe (45).

2. The filtering and impurity collection device for silicon wafer additive processing according to claim 1 is characterized in that: The filter cartridge (21) is fixedly mounted at a position close to the middle of the top of the base (1), and an inspection door (22) is mounted on the outer side of the filter cartridge (21) via a hinge.

3. The filtering and impurity collection device for silicon wafer additive processing according to claim 1 is characterized in that: The suction assembly (3) further comprises a limiting cover (31) fixedly mounted on the top of the base (1) near the right side, the top of the limiting cover (31) being fixedly connected to a suction pipe (32), the suction pipe (32) being provided with a vacuum pump (35), and the vacuum pump (35) being mounted on the top of the limiting cover (31), the end of the suction pipe (32) being connected to a rotating air pipe (33) via a rotating joint, the rotating air pipe (33) movably passing through the top of the filter cartridge (21) and extending to the inner side, the suction nozzle (34) being arranged above the filter screen (23), and a collecting trolley (36) being arranged inside the limiting cover (31).

4. The filtering and impurity collection device for silicon wafer additive processing according to claim 1 is characterized in that: The flushing assembly (4) further comprises a water tank (41), the water tank (41) being mounted on the top of the base (1) near the rear side via legs, the bottom of the water tank (41) being fixedly connected to a water outlet pipe (42), the water outlet pipe (42) being mounted with a water pump (43), and the water pump (43) being mounted on the top of the base (1), the end of the water outlet pipe (42) being connected to a rotating water pipe (44) via a rotating joint, the rotating water pipe (44) movably passing through the bottom of the filter cartridge (21) and extending to the inner side, the end of the rotating water pipe (44) being fixedly connected to a spray pipe (45), and the spray pipe (45) being arranged below the filter screen (23).

5. The filtering and impurity collection device for silicon wafer additive processing according to claim 1 is characterized in that: The driving assembly (5) comprises a motor (51) fixedly mounted on the top of the base (1) near the left side, a rotating shaft (52) being mounted on the output end of the motor (51), and the rotating shaft (52) being mounted on the outer wall of the filter cartridge (21) via a bearing seat.

6. The filtering and impurity collection device for silicon wafer additive processing according to claim 5, characterized in that: Two first synchronous wheels (53) are fixedly mounted on the outer wall of the rotating shaft (52), and synchronous belts (54) are arranged outside the two first synchronous wheels (53). Second synchronous wheels (55) are arranged inside the two synchronous belts (54), and one of the second synchronous wheels (55) is fixedly sleeved on the outer wall of the rotating air pipe (33), and the other second synchronous wheel (55) is fixedly sleeved on the outer wall of the rotating water pipe (44).